JPH1192990A5 - - Google Patents

Info

Publication number
JPH1192990A5
JPH1192990A5 JP1997269302A JP26930297A JPH1192990A5 JP H1192990 A5 JPH1192990 A5 JP H1192990A5 JP 1997269302 A JP1997269302 A JP 1997269302A JP 26930297 A JP26930297 A JP 26930297A JP H1192990 A5 JPH1192990 A5 JP H1192990A5
Authority
JP
Japan
Prior art keywords
medium
pretreatment method
container
plating
plating pretreatment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1997269302A
Other languages
English (en)
Japanese (ja)
Other versions
JP3945872B2 (ja
JPH1192990A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from JP26930297A external-priority patent/JP3945872B2/ja
Priority to JP26930297A priority Critical patent/JP3945872B2/ja
Priority to KR1019980037903A priority patent/KR100538301B1/ko
Priority to US09/153,895 priority patent/US6123984A/en
Priority to EP98117559A priority patent/EP0913497B1/en
Priority to DE69823952T priority patent/DE69823952T2/de
Publication of JPH1192990A publication Critical patent/JPH1192990A/ja
Publication of JPH1192990A5 publication Critical patent/JPH1192990A5/ja
Publication of JP3945872B2 publication Critical patent/JP3945872B2/ja
Application granted granted Critical
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP26930297A 1997-09-16 1997-09-16 めっき前処理方法 Expired - Fee Related JP3945872B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP26930297A JP3945872B2 (ja) 1997-09-16 1997-09-16 めっき前処理方法
KR1019980037903A KR100538301B1 (ko) 1997-09-16 1998-09-15 기판도금방법및장치
DE69823952T DE69823952T2 (de) 1997-09-16 1998-09-16 Verfahren zum Plattieren
EP98117559A EP0913497B1 (en) 1997-09-16 1998-09-16 Method for plating a substrate
US09/153,895 US6123984A (en) 1997-09-16 1998-09-16 Method and apparatus for plating a substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP26930297A JP3945872B2 (ja) 1997-09-16 1997-09-16 めっき前処理方法

Publications (3)

Publication Number Publication Date
JPH1192990A JPH1192990A (ja) 1999-04-06
JPH1192990A5 true JPH1192990A5 (enExample) 2004-10-14
JP3945872B2 JP3945872B2 (ja) 2007-07-18

Family

ID=17470460

Family Applications (1)

Application Number Title Priority Date Filing Date
JP26930297A Expired - Fee Related JP3945872B2 (ja) 1997-09-16 1997-09-16 めっき前処理方法

Country Status (5)

Country Link
US (1) US6123984A (enExample)
EP (1) EP0913497B1 (enExample)
JP (1) JP3945872B2 (enExample)
KR (1) KR100538301B1 (enExample)
DE (1) DE69823952T2 (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001027357A1 (en) * 1999-10-12 2001-04-19 Semitool, Inc. Method and apparatus for executing plural processes on a microelectronic workpiece at a single processing station
US20050205111A1 (en) * 1999-10-12 2005-09-22 Ritzdorf Thomas L Method and apparatus for processing a microfeature workpiece with multiple fluid streams
JP4660661B2 (ja) * 2000-02-22 2011-03-30 コスモ石油株式会社 プラスチックのメッキ前処理方法、メッキ方法、メッキ物の製造方法及びメッキ装置
AU2001275795A1 (en) * 2000-08-24 2002-03-04 Hiroe Asai Electrochemical treating method such as electroplating and electrochemical reaction device therefor
CN101147909B (zh) 2002-05-20 2010-06-09 松下电器产业株式会社 清洗方法
WO2004044281A2 (en) * 2002-11-12 2004-05-27 The Regents Of The University Of California Nano-porous fibers and protein membranes
US7217749B2 (en) * 2003-01-20 2007-05-15 Northern Technologies International Corporation Process for infusing an alkali metal nitrite into a synthetic resinous material
US7217750B2 (en) * 2003-01-20 2007-05-15 Northern Technologies International Corporation Process for incorporating one or more materials into a polymer composition and products produced thereby
JP2004225152A (ja) * 2003-01-27 2004-08-12 Tokyo Electron Ltd 基板処理方法および半導体装置の製造方法
CN101459050B (zh) * 2007-12-14 2013-03-27 盛美半导体设备（上海）有限公司 电化学或化学沉积金属层前预浸润晶片表面的方法和装置
US10221488B2 (en) * 2015-09-18 2019-03-05 General Electric Company Supercritical water method for treating internal passages

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2719782B2 (ja) * 1987-08-19 1998-02-25 イビデン株式会社 多層プリント配線板の製造方法
JPH02209729A (ja) * 1989-02-09 1990-08-21 Matsushita Electric Ind Co Ltd 半導体装置の製造方法及び異物除去装置
JPH03127832A (ja) * 1989-10-13 1991-05-30 Matsushita Electric Ind Co Ltd 半導体装置の製造方法及び乾燥装置
KR930019861A (ko) * 1991-12-12 1993-10-19 완다 케이. 덴슨-로우 조밀상 기체를 이용한 코팅 방법
JPH07283219A (ja) * 1994-04-13 1995-10-27 Sanyo Electric Co Ltd 半導体装置および半導体装置の製造方法および半導体装 置の製造装置
JPH09139374A (ja) * 1995-11-15 1997-05-27 Hitachi Ltd 表面処理方法および装置ならびにこれにより得られた素子

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