JPH1152575A - 化学増幅型ポジ型フォトレジスト組成物 - Google Patents

化学増幅型ポジ型フォトレジスト組成物

Info

Publication number
JPH1152575A
JPH1152575A JP9208864A JP20886497A JPH1152575A JP H1152575 A JPH1152575 A JP H1152575A JP 9208864 A JP9208864 A JP 9208864A JP 20886497 A JP20886497 A JP 20886497A JP H1152575 A JPH1152575 A JP H1152575A
Authority
JP
Japan
Prior art keywords
resin
acid
bis
weight
alkali
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9208864A
Other languages
English (en)
Japanese (ja)
Other versions
JPH1152575A5 (enExample
Inventor
Yasunori Kamiya
保則 上谷
Kazuki Takemoto
一樹 武元
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Chemical Co Ltd
Original Assignee
Sumitomo Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Chemical Co Ltd filed Critical Sumitomo Chemical Co Ltd
Priority to JP9208864A priority Critical patent/JPH1152575A/ja
Publication of JPH1152575A publication Critical patent/JPH1152575A/ja
Publication of JPH1152575A5 publication Critical patent/JPH1152575A5/ja
Pending legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
JP9208864A 1997-08-04 1997-08-04 化学増幅型ポジ型フォトレジスト組成物 Pending JPH1152575A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9208864A JPH1152575A (ja) 1997-08-04 1997-08-04 化学増幅型ポジ型フォトレジスト組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9208864A JPH1152575A (ja) 1997-08-04 1997-08-04 化学増幅型ポジ型フォトレジスト組成物

Publications (2)

Publication Number Publication Date
JPH1152575A true JPH1152575A (ja) 1999-02-26
JPH1152575A5 JPH1152575A5 (enExample) 2005-03-17

Family

ID=16563392

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9208864A Pending JPH1152575A (ja) 1997-08-04 1997-08-04 化学増幅型ポジ型フォトレジスト組成物

Country Status (1)

Country Link
JP (1) JPH1152575A (enExample)

Cited By (55)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1014193A1 (en) * 1998-12-23 2000-06-28 Shipley Company LLC Photoresist compositions suitable for deep-UV wavelength imaging
US6303265B1 (en) * 1998-07-02 2001-10-16 Fuji Photo Film Co., Ltd. Positive photoresist composition for exposure to far ultraviolet light
JP2004086122A (ja) * 2001-10-15 2004-03-18 Mitsubishi Chemicals Corp 青紫色レーザー感光性レジスト材層を有する画像形成材及びそのレジスト画像形成方法
JP2009145871A (ja) * 2000-11-29 2009-07-02 Shin Etsu Chem Co Ltd レジスト材料及びパターン形成方法
US7611822B2 (en) 2007-07-25 2009-11-03 Sumitomo Chemical Company, Limited Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same
EP2169021A1 (en) 2008-09-25 2010-03-31 Fujifilm Corporation Ink composition, inkjet recording method, and printed material
WO2011037036A1 (ja) * 2009-09-24 2011-03-31 Jsr株式会社 感放射線性樹脂組成物
JP2011170151A (ja) * 2010-02-19 2011-09-01 Sumitomo Chemical Co Ltd レジスト組成物
US8062829B2 (en) 2008-03-03 2011-11-22 Sumitomo Chemical Company, Limited Chemically amplified resist composition and chemically amplified resist composition for immersion lithography
US8232039B2 (en) 2008-11-14 2012-07-31 Sumitomo Chemical Company, Limited Polymer and resist composition comprising the same
US8318404B2 (en) 2009-06-12 2012-11-27 Sumitomo Chemical Company, Limited Salt and photoresist composition containing the same
US8378016B2 (en) 2005-12-27 2013-02-19 Sumitomo Chemical Company, Limited Chemically amplified positive resist composition
US8431325B2 (en) 2009-09-02 2013-04-30 Sumitomo Chemical Company, Limited Compound, resin, resist composition and method for producing resist pattern
US8563217B2 (en) 2011-02-25 2013-10-22 Sumitomo Chemical Company, Limited Resist composition and method for producing resist pattern
US8563219B2 (en) 2011-02-25 2013-10-22 Sumitomo Chemical Company, Limited Resist composition and method for producing resist pattern
US8563218B2 (en) 2011-02-25 2013-10-22 Sumitomo Chemical Company, Limited Resist composition and method for producing resist pattern
US8568956B2 (en) 2011-02-25 2013-10-29 Sumitomo Chemical Company, Limited Resist composition and method for producing resist pattern
US8574811B2 (en) 2010-08-30 2013-11-05 Sumitomo Chemical Company, Limited Resist composition and method for producing resist pattern
US8574812B2 (en) 2011-02-25 2013-11-05 Sumitomo Chemical Company, Limited Resist composition and method for producing resist pattern
US8592129B2 (en) 2009-08-31 2013-11-26 Sumitomo Chemical Company, Limited Resin, resist composition and method for producing resist pattern
US8592132B2 (en) 2011-02-25 2013-11-26 Sumitomo Chemical Company, Limited Resist composition and method for producing resist pattern
US8609317B2 (en) 2009-07-14 2013-12-17 Sumitomo Chemical Company, Limited Salt and photoresist composition containing the same
US8614046B2 (en) 2009-07-14 2013-12-24 Sumitomo Chemical Company, Limited Salt and photoresist composition containing the same
US8614048B2 (en) 2010-09-21 2013-12-24 Sumitomo Chemical Company, Limited Resin, resist composition and method for producing resist pattern
US8652753B2 (en) 2011-07-19 2014-02-18 Sumitomo Chemical Company, Limited Resist composition and method for producing resist pattern
US8663900B2 (en) 2011-07-19 2014-03-04 Sumitomo Chemical Company, Limited Resist composition and method for producing resist pattern
US8663899B2 (en) 2011-07-19 2014-03-04 Sumitomo Chemical Company, Limited Resist composition and method for producing resist pattern
US8685618B2 (en) 2011-07-19 2014-04-01 Sumitomo Chemical Company, Limited Resist composition and method for producing resist pattern
US8709699B2 (en) 2011-07-19 2014-04-29 Sumitomo Chemical Company, Limited Resist composition and method for producing resist pattern
US8728707B2 (en) 2011-07-19 2014-05-20 Sumitomo Chemical Company, Limited Resist composition and method for producing resist pattern
US8735047B2 (en) 2011-07-19 2014-05-27 Sumitomo Chemical Company, Limited Resist composition and method for producing resist pattern
US8735044B2 (en) 2009-05-28 2014-05-27 Sumitomo Chemical Company, Limited Salt and photoresist composition containing the same
US8835095B2 (en) 2011-02-25 2014-09-16 Sumitomo Chemical Company, Limited Resist composition and method for producing resist pattern
US8859182B2 (en) 2011-02-25 2014-10-14 Sumitomo Chemical Company, Limited Resist composition and method for producing resist pattern
US8916330B2 (en) 2009-06-24 2014-12-23 Sumitomo Chemical Company, Limited Chemically amplified photoresist composition and method for forming resist pattern
US8921029B2 (en) 2011-07-19 2014-12-30 Sumitomo Chemical Company, Limited Resist composition and method for producing resist pattern
US8940473B2 (en) 2011-02-25 2015-01-27 Sumitomo Chemical Company, Limited Resist composition and method for producing resist pattern
US8951709B2 (en) 2010-10-26 2015-02-10 Sumitomo Chemical Company, Limited Resist composition and method for producing resist pattern
WO2015064601A1 (ja) * 2013-10-30 2015-05-07 富士フイルム株式会社 感光性樹脂組成物、硬化膜の製造方法、硬化膜、液晶表示装置および有機ｅｌ表示装置
US9052591B2 (en) 2011-07-19 2015-06-09 Sumitomo Chemical Company, Limited Resist composition and method for producing resist pattern
US9051405B2 (en) 2009-06-23 2015-06-09 Sumitomo Chemical Company, Limited Resin and resist composition
US9063414B2 (en) 2010-07-28 2015-06-23 Sumitomo Chemical Company, Limited Photoresist composition
US9221785B2 (en) 2009-06-12 2015-12-29 Sumitomo Chemical Company, Limited Salt and photoresist composition containing the same
US9229320B2 (en) 2010-08-03 2016-01-05 Sumitomo Chemical Company, Limited Resist composition and method for producing resist pattern
US9260407B2 (en) 2010-11-15 2016-02-16 Sumitomo Chemical Company, Limited Salt and photoresist composition comprising the same
WO2016027546A1 (ja) * 2014-08-22 2016-02-25 富士フイルム株式会社 感活性光線性又は感放射線性樹脂組成物、感活性光線性又は感放射線性膜、パターン形成方法、電子デバイスの製造方法及び電子デバイス
US9291893B2 (en) 2010-10-26 2016-03-22 Sumitomo Chemical Company, Limited Resist composition and method for producing resist pattern
JP2016089085A (ja) * 2014-11-07 2016-05-23 株式会社Adeka 組成物
US9405187B2 (en) 2010-06-29 2016-08-02 Sumitomo Chemical Company, Limited Salt, acid generator and resist composition
US9429841B2 (en) 2011-07-19 2016-08-30 Sumitomo Chemical Company, Limited Resist composition and method for producing resist pattern
US9671693B2 (en) 2010-12-15 2017-06-06 Sumitomo Chemical Company, Limited Resist composition and method for producing resist pattern
JP2020140202A (ja) * 2019-02-27 2020-09-03 信越化学工業株式会社 レジスト材料及びパターン形成方法
TWI790706B (zh) * 2020-08-13 2023-01-21 日商信越化學工業股份有限公司 阻劑材料及圖案形成方法
US11880135B2 (en) 2019-10-15 2024-01-23 Rohm And Haas Electronic Materials Llc Photoresist compositions and pattern formation methods
WO2024034422A1 (ja) * 2022-08-10 2024-02-15 東京応化工業株式会社 レジスト組成物及びレジストパターン形成方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0616730A (ja) * 1992-06-30 1994-01-25 Fujitsu Ltd α，β−不飽和ニトリルを有する脂環式多環族とメタクリレート誘導体との共重合体
JPH07508840A (ja) * 1992-07-13 1995-09-28 クラリアント・ゲーエムベーハー ポジ型放射線感応性混合物およびそれを使用して製造した記録材料
JPH0922115A (ja) * 1995-07-07 1997-01-21 Fuji Photo Film Co Ltd 化学増幅型ポジレジスト組成物
JPH0990637A (ja) * 1995-07-14 1997-04-04 Fujitsu Ltd レジスト組成物及びレジストパターンの形成方法
JPH09160244A (ja) * 1995-12-01 1997-06-20 Japan Synthetic Rubber Co Ltd 感放射線性組成物

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0616730A (ja) * 1992-06-30 1994-01-25 Fujitsu Ltd α，β−不飽和ニトリルを有する脂環式多環族とメタクリレート誘導体との共重合体
JPH07508840A (ja) * 1992-07-13 1995-09-28 クラリアント・ゲーエムベーハー ポジ型放射線感応性混合物およびそれを使用して製造した記録材料
JPH0922115A (ja) * 1995-07-07 1997-01-21 Fuji Photo Film Co Ltd 化学増幅型ポジレジスト組成物
JPH0990637A (ja) * 1995-07-14 1997-04-04 Fujitsu Ltd レジスト組成物及びレジストパターンの形成方法
JPH09160244A (ja) * 1995-12-01 1997-06-20 Japan Synthetic Rubber Co Ltd 感放射線性組成物

Cited By (63)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6303265B1 (en) * 1998-07-02 2001-10-16 Fuji Photo Film Co., Ltd. Positive photoresist composition for exposure to far ultraviolet light
EP1014193A1 (en) * 1998-12-23 2000-06-28 Shipley Company LLC Photoresist compositions suitable for deep-UV wavelength imaging
US6852466B2 (en) 1998-12-23 2005-02-08 Shipley Company, L.L.C. Photoresist compositions particularly suitable for short wavelength imaging
JP2009145871A (ja) * 2000-11-29 2009-07-02 Shin Etsu Chem Co Ltd レジスト材料及びパターン形成方法
JP2004086122A (ja) * 2001-10-15 2004-03-18 Mitsubishi Chemicals Corp 青紫色レーザー感光性レジスト材層を有する画像形成材及びそのレジスト画像形成方法
US8378016B2 (en) 2005-12-27 2013-02-19 Sumitomo Chemical Company, Limited Chemically amplified positive resist composition
US7611822B2 (en) 2007-07-25 2009-11-03 Sumitomo Chemical Company, Limited Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same
US8062829B2 (en) 2008-03-03 2011-11-22 Sumitomo Chemical Company, Limited Chemically amplified resist composition and chemically amplified resist composition for immersion lithography
EP2169021A1 (en) 2008-09-25 2010-03-31 Fujifilm Corporation Ink composition, inkjet recording method, and printed material
US8232039B2 (en) 2008-11-14 2012-07-31 Sumitomo Chemical Company, Limited Polymer and resist composition comprising the same
US8735044B2 (en) 2009-05-28 2014-05-27 Sumitomo Chemical Company, Limited Salt and photoresist composition containing the same
US9221785B2 (en) 2009-06-12 2015-12-29 Sumitomo Chemical Company, Limited Salt and photoresist composition containing the same
US8318404B2 (en) 2009-06-12 2012-11-27 Sumitomo Chemical Company, Limited Salt and photoresist composition containing the same
US9051405B2 (en) 2009-06-23 2015-06-09 Sumitomo Chemical Company, Limited Resin and resist composition
US10766992B2 (en) 2009-06-23 2020-09-08 Sumitomo Chemical Company, Limited Resin and resist composition
US8916330B2 (en) 2009-06-24 2014-12-23 Sumitomo Chemical Company, Limited Chemically amplified photoresist composition and method for forming resist pattern
US8614046B2 (en) 2009-07-14 2013-12-24 Sumitomo Chemical Company, Limited Salt and photoresist composition containing the same
US8609317B2 (en) 2009-07-14 2013-12-17 Sumitomo Chemical Company, Limited Salt and photoresist composition containing the same
US9268226B2 (en) 2009-08-31 2016-02-23 Sumitomo Chemical Company, Limited Resin, resist composition and method for producing resist pattern
US8592129B2 (en) 2009-08-31 2013-11-26 Sumitomo Chemical Company, Limited Resin, resist composition and method for producing resist pattern
US8431325B2 (en) 2009-09-02 2013-04-30 Sumitomo Chemical Company, Limited Compound, resin, resist composition and method for producing resist pattern
US8895223B2 (en) 2009-09-24 2014-11-25 Jsr Corporation Radiation-sensitive resin composition
WO2011037036A1 (ja) * 2009-09-24 2011-03-31 Jsr株式会社 感放射線性樹脂組成物
JP2011170151A (ja) * 2010-02-19 2011-09-01 Sumitomo Chemical Co Ltd レジスト組成物
US9405187B2 (en) 2010-06-29 2016-08-02 Sumitomo Chemical Company, Limited Salt, acid generator and resist composition
US9063414B2 (en) 2010-07-28 2015-06-23 Sumitomo Chemical Company, Limited Photoresist composition
US9229320B2 (en) 2010-08-03 2016-01-05 Sumitomo Chemical Company, Limited Resist composition and method for producing resist pattern
US8574811B2 (en) 2010-08-30 2013-11-05 Sumitomo Chemical Company, Limited Resist composition and method for producing resist pattern
US8614048B2 (en) 2010-09-21 2013-12-24 Sumitomo Chemical Company, Limited Resin, resist composition and method for producing resist pattern
US8951709B2 (en) 2010-10-26 2015-02-10 Sumitomo Chemical Company, Limited Resist composition and method for producing resist pattern
US9291893B2 (en) 2010-10-26 2016-03-22 Sumitomo Chemical Company, Limited Resist composition and method for producing resist pattern
US9260407B2 (en) 2010-11-15 2016-02-16 Sumitomo Chemical Company, Limited Salt and photoresist composition comprising the same
US9671693B2 (en) 2010-12-15 2017-06-06 Sumitomo Chemical Company, Limited Resist composition and method for producing resist pattern
US8563219B2 (en) 2011-02-25 2013-10-22 Sumitomo Chemical Company, Limited Resist composition and method for producing resist pattern
US8592132B2 (en) 2011-02-25 2013-11-26 Sumitomo Chemical Company, Limited Resist composition and method for producing resist pattern
US8835095B2 (en) 2011-02-25 2014-09-16 Sumitomo Chemical Company, Limited Resist composition and method for producing resist pattern
US8563217B2 (en) 2011-02-25 2013-10-22 Sumitomo Chemical Company, Limited Resist composition and method for producing resist pattern
US8563218B2 (en) 2011-02-25 2013-10-22 Sumitomo Chemical Company, Limited Resist composition and method for producing resist pattern
US8940473B2 (en) 2011-02-25 2015-01-27 Sumitomo Chemical Company, Limited Resist composition and method for producing resist pattern
US8568956B2 (en) 2011-02-25 2013-10-29 Sumitomo Chemical Company, Limited Resist composition and method for producing resist pattern
US8574812B2 (en) 2011-02-25 2013-11-05 Sumitomo Chemical Company, Limited Resist composition and method for producing resist pattern
US8859182B2 (en) 2011-02-25 2014-10-14 Sumitomo Chemical Company, Limited Resist composition and method for producing resist pattern
US9052591B2 (en) 2011-07-19 2015-06-09 Sumitomo Chemical Company, Limited Resist composition and method for producing resist pattern
US9429841B2 (en) 2011-07-19 2016-08-30 Sumitomo Chemical Company, Limited Resist composition and method for producing resist pattern
US8663899B2 (en) 2011-07-19 2014-03-04 Sumitomo Chemical Company, Limited Resist composition and method for producing resist pattern
US8663900B2 (en) 2011-07-19 2014-03-04 Sumitomo Chemical Company, Limited Resist composition and method for producing resist pattern
US8652753B2 (en) 2011-07-19 2014-02-18 Sumitomo Chemical Company, Limited Resist composition and method for producing resist pattern
US8709699B2 (en) 2011-07-19 2014-04-29 Sumitomo Chemical Company, Limited Resist composition and method for producing resist pattern
US8735047B2 (en) 2011-07-19 2014-05-27 Sumitomo Chemical Company, Limited Resist composition and method for producing resist pattern
US8921029B2 (en) 2011-07-19 2014-12-30 Sumitomo Chemical Company, Limited Resist composition and method for producing resist pattern
US8685618B2 (en) 2011-07-19 2014-04-01 Sumitomo Chemical Company, Limited Resist composition and method for producing resist pattern
US8728707B2 (en) 2011-07-19 2014-05-20 Sumitomo Chemical Company, Limited Resist composition and method for producing resist pattern
JPWO2015064601A1 (ja) * 2013-10-30 2017-03-09 富士フイルム株式会社 感光性樹脂組成物、硬化膜の製造方法、硬化膜、液晶表示装置および有機ｅｌ表示装置
WO2015064601A1 (ja) * 2013-10-30 2015-05-07 富士フイルム株式会社 感光性樹脂組成物、硬化膜の製造方法、硬化膜、液晶表示装置および有機ｅｌ表示装置
JPWO2016027546A1 (ja) * 2014-08-22 2017-04-27 富士フイルム株式会社 感活性光線性又は感放射線性樹脂組成物、感活性光線性又は感放射線性膜、パターン形成方法、電子デバイスの製造方法及び電子デバイス
US10649329B2 (en) 2014-08-22 2020-05-12 Fujifilm Corporation Active light sensitive or radiation sensitive resin composition, active light sensitive or radiation sensitive film, pattern forming method, method for manufacturing electronic device, and electronic device
WO2016027546A1 (ja) * 2014-08-22 2016-02-25 富士フイルム株式会社 感活性光線性又は感放射線性樹脂組成物、感活性光線性又は感放射線性膜、パターン形成方法、電子デバイスの製造方法及び電子デバイス
JP2016089085A (ja) * 2014-11-07 2016-05-23 株式会社Adeka 組成物
JP2020140202A (ja) * 2019-02-27 2020-09-03 信越化学工業株式会社 レジスト材料及びパターン形成方法
US11822239B2 (en) 2019-02-27 2023-11-21 Shin-Etsu Chemical Co., Ltd. Resist composition and patterning process
US11880135B2 (en) 2019-10-15 2024-01-23 Rohm And Haas Electronic Materials Llc Photoresist compositions and pattern formation methods
TWI790706B (zh) * 2020-08-13 2023-01-21 日商信越化學工業股份有限公司 阻劑材料及圖案形成方法
WO2024034422A1 (ja) * 2022-08-10 2024-02-15 東京応化工業株式会社 レジスト組成物及びレジストパターン形成方法

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