JPH11512381A5 - - Google Patents
Info
- Publication number
- JPH11512381A5 JPH11512381A5 JP1997512025A JP51202597A JPH11512381A5 JP H11512381 A5 JPH11512381 A5 JP H11512381A5 JP 1997512025 A JP1997512025 A JP 1997512025A JP 51202597 A JP51202597 A JP 51202597A JP H11512381 A5 JPH11512381 A5 JP H11512381A5
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US360895P | 1995-09-12 | 1995-09-12 | |
| US60/003,608 | 1995-09-12 | ||
| PCT/US1996/014428 WO1997010183A1 (en) | 1995-09-12 | 1996-09-11 | Containment vessel for producing fused silica glass |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPH11512381A JPH11512381A (ja) | 1999-10-26 |
| JPH11512381A5 true JPH11512381A5 (enExample) | 2004-09-24 |
| JP3850880B2 JP3850880B2 (ja) | 2006-11-29 |
Family
ID=21706678
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP51202597A Expired - Lifetime JP3850880B2 (ja) | 1995-09-12 | 1996-09-11 | 溶融シリカガラス製造用閉じ込め容器 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US5698484A (enExample) |
| EP (1) | EP0850201B1 (enExample) |
| JP (1) | JP3850880B2 (enExample) |
| DE (1) | DE69629119T2 (enExample) |
| WO (1) | WO1997010183A1 (enExample) |
Families Citing this family (31)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0850199B1 (en) * | 1995-09-12 | 2005-12-28 | Corning Incorporated | Method and Furnace for the Production of Silica Glass containing less striae |
| EP0964832B1 (de) * | 1997-03-07 | 2001-05-23 | Schott ML GMBH | Vorform aus synthetischem kieselglas und vorrichtung zu ihrer herstellung |
| DE69816758T2 (de) * | 1997-05-20 | 2004-06-03 | Heraeus Quarzglas Gmbh & Co. Kg | Synthetisches quarzglas zur verwendung in uv-strahlung und verfahren zu seiner herstellung |
| US6044664A (en) * | 1997-09-29 | 2000-04-04 | Nikon Corporation | Synthetic silica glass manufacturing apparatus |
| GB9815357D0 (en) * | 1998-07-15 | 1998-09-16 | Tsl Group Plc | Improvements in and relating to the manufacture of synthetic vitreous silica ingot |
| US6574991B1 (en) * | 1998-08-13 | 2003-06-10 | Corning Incorporated | Pure fused silica, furnace and method |
| US6782716B2 (en) * | 1999-02-12 | 2004-08-31 | Corning Incorporated | Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass |
| US6783898B2 (en) | 1999-02-12 | 2004-08-31 | Corning Incorporated | Projection lithography photomask blanks, preforms and method of making |
| US6242136B1 (en) | 1999-02-12 | 2001-06-05 | Corning Incorporated | Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass |
| US6682859B2 (en) * | 1999-02-12 | 2004-01-27 | Corning Incorporated | Vacuum ultraviolet trasmitting silicon oxyfluoride lithography glass |
| US6319634B1 (en) * | 1999-03-12 | 2001-11-20 | Corning Incorporated | Projection lithography photomasks and methods of making |
| US6265115B1 (en) | 1999-03-15 | 2001-07-24 | Corning Incorporated | Projection lithography photomask blanks, preforms and methods of making |
| CN1387499A (zh) * | 1999-09-10 | 2002-12-25 | 康宁股份有限公司 | 纯的熔凝二氧化硅,窑炉和方法 |
| US6410192B1 (en) | 1999-11-15 | 2002-06-25 | Corning Incorporated | Photolithography method, photolithography mask blanks, and method of making |
| US6176588B1 (en) | 1999-12-14 | 2001-01-23 | Corning Incorporated | Low cost light weight mirror blank |
| US6367288B1 (en) * | 1999-12-29 | 2002-04-09 | Corning Incorporated | Method and apparatus for preventing burner-hole build-up in fused silica processes |
| US6314766B1 (en) | 2000-01-19 | 2001-11-13 | Corning Incorporated | Apparatus for minimizing air infiltration in the production of fused silica glass |
| US6988378B1 (en) | 2000-07-27 | 2006-01-24 | Corning Incorporated | Light weight porous structure |
| US6387511B1 (en) | 2000-07-27 | 2002-05-14 | Corning Incorporated | Light weight porous structure |
| US7797966B2 (en) * | 2000-12-29 | 2010-09-21 | Single Crystal Technologies, Inc. | Hot substrate deposition of fused silica |
| US20020083739A1 (en) * | 2000-12-29 | 2002-07-04 | Pandelisev Kiril A. | Hot substrate deposition fiber optic preforms and preform components process and apparatus |
| US20020083740A1 (en) * | 2000-12-29 | 2002-07-04 | Pandelisev Kiril A. | Process and apparatus for production of silica grain having desired properties and their fiber optic and semiconductor application |
| US20020174684A1 (en) * | 2001-05-23 | 2002-11-28 | Danielson Paul S. | Fused silica furnace and method |
| JP2005503316A (ja) * | 2001-09-27 | 2005-02-03 | コーニング インコーポレイテッド | 石英ガラス生産のための改善された方法及び炉 |
| DE10359102A1 (de) * | 2003-12-17 | 2005-07-21 | Carl Zeiss Smt Ag | Optische Komponente umfassend ein Material mit einer vorbestimmten Homogenität der thermischen Längsausdehnung |
| DE102004015766B4 (de) * | 2004-03-23 | 2016-05-12 | Asahi Glass Co., Ltd. | Verwendung eines SiO2-TiO2-Glases als strahlungsresistentes Substrat |
| US20070137252A1 (en) * | 2005-12-21 | 2007-06-21 | Maxon John E | Reduced striae low expansion glass and elements, and a method for making same |
| US20100154474A1 (en) * | 2005-12-21 | 2010-06-24 | Lorrie Foley Beall | Reduced striae low expansion glass and elements, and a method for making same |
| US20070137253A1 (en) * | 2005-12-21 | 2007-06-21 | Beall Lorrie F | Reduced striae low expansion glass and elements, and a method for making same |
| GB0605461D0 (en) * | 2006-03-17 | 2006-04-26 | Saint Gobain Quartz Plc | Manufacture of large articles in synthetic vitreous silica |
| KR101918360B1 (ko) | 2016-11-25 | 2018-11-13 | 한국수력원자력 주식회사 | 균일한 용융고화체 형성을 위한 몰드 지지장치 및 균일한 용융고화체 형성방법 |
Family Cites Families (34)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR1363233A (fr) * | 1963-04-16 | 1964-06-12 | Corning Glass Works | Procédé de fabrication de masses pleines, notamment de verres et céramiques, et appareil de mise en oeuvre |
| US3806570A (en) * | 1972-03-30 | 1974-04-23 | Corning Glass Works | Method for producing high quality fused silica |
| US3859073A (en) * | 1973-10-19 | 1975-01-07 | Corning Glass Works | Method of producing glass by flame hydrolysis |
| US4135901A (en) * | 1974-12-18 | 1979-01-23 | Sumitomo Electric Industries, Ltd. | Method of manufacturing glass for optical waveguide |
| US3930819A (en) * | 1975-02-06 | 1976-01-06 | Fabrication De Maquinas, S.A. | Press molded hot glassware handling apparatus |
| US3966446A (en) * | 1975-10-23 | 1976-06-29 | Bell Telephone Laboratories, Incorporated | Axial fabrication of optical fibers |
| US4017288A (en) * | 1975-12-15 | 1977-04-12 | Bell Telephone Laboratories, Incorporated | Method for making optical fibers with helical gradations in composition |
| US4065280A (en) * | 1976-12-16 | 1977-12-27 | International Telephone And Telegraph Corporation | Continuous process for manufacturing optical fibers |
| US4231774A (en) * | 1978-04-10 | 1980-11-04 | International Telephone And Telegraph Corporation | Method of fabricating large optical preforms |
| US4263031A (en) * | 1978-06-12 | 1981-04-21 | Corning Glass Works | Method of producing glass optical filaments |
| US4203744A (en) * | 1979-01-02 | 1980-05-20 | Corning Glass Works | Method of making nitrogen-doped graded index optical waveguides |
| FR2446264A1 (fr) * | 1979-01-10 | 1980-08-08 | Quartz & Silice | Procede de preparation d'une preforme pour guide d'onde optique |
| US4363647A (en) * | 1981-05-14 | 1982-12-14 | Corning Glass Works | Method of making fused silica-containing material |
| US4568370A (en) * | 1982-09-29 | 1986-02-04 | Corning Glass Works | Optical fiber preform and method |
| DE3240355C1 (de) * | 1982-11-02 | 1983-11-17 | Heraeus Quarzschmelze Gmbh, 6450 Hanau | Verfahren zur Herstellung eines laenglichen Glaskoerpers mit inhomogener Brechungsindexverteilung |
| US5221309A (en) * | 1984-05-15 | 1993-06-22 | Sumitomo Electric Industries, Ltd. | Method for producing glass preform for optical fiber |
| JPH0618234B2 (ja) * | 1985-04-19 | 1994-03-09 | 日本電信電話株式会社 | 半導体基板の接合方法 |
| US5028246A (en) * | 1986-02-03 | 1991-07-02 | Ensign-Bickford Optical Technologies, Inc. | Methods of making optical waveguides |
| US4935046A (en) * | 1987-12-03 | 1990-06-19 | Shin-Etsu Handotai Company, Limited | Manufacture of a quartz glass vessel for the growth of single crystal semiconductor |
| US5086352A (en) * | 1989-06-09 | 1992-02-04 | Shin-Etsu Quartz Products Co., Ltd. | Optical members and blanks or synthetic silica glass and method for their production |
| JPH0825763B2 (ja) * | 1990-04-26 | 1996-03-13 | 信越石英株式会社 | すす状シリカ体の製造方法、その装置及び該シリカ体を用いた合成石英ガラス |
| US5152819A (en) * | 1990-08-16 | 1992-10-06 | Corning Incorporated | Method of making fused silica |
| US5043002A (en) * | 1990-08-16 | 1991-08-27 | Corning Incorporated | Method of making fused silica by decomposing siloxanes |
| US5410428A (en) * | 1990-10-30 | 1995-04-25 | Shin-Etsu Quartz Products Co. Ltd. | Optical member made of high-purity and transparent synthetic silica glass and method for production thereof or blank thereof |
| US5364433A (en) * | 1991-06-29 | 1994-11-15 | Shin-Etsu Quartz Products Company Limited | Optical member of synthetic quartz glass for excimer lasers and method for producing same |
| JP2566349B2 (ja) * | 1991-10-02 | 1996-12-25 | 信越化学工業株式会社 | 合成石英ガラス部材の製造方法 |
| JP2814795B2 (ja) * | 1991-10-25 | 1998-10-27 | 株式会社ニコン | 石英ガラスの製造方法 |
| JPH05273426A (ja) * | 1991-12-06 | 1993-10-22 | Sumitomo Electric Ind Ltd | 光導波膜の作製方法およびこれを用いた光導波路の作製方法 |
| JP2985540B2 (ja) * | 1992-11-27 | 1999-12-06 | 株式会社ニコン | 石英ガラスの製造方法 |
| JP2814866B2 (ja) * | 1993-02-10 | 1998-10-27 | 株式会社ニコン | 石英ガラスの製造方法 |
| JP2814867B2 (ja) * | 1993-02-10 | 1998-10-27 | 株式会社ニコン | 石英ガラスの製造方法 |
| JP3656855B2 (ja) * | 1993-04-23 | 2005-06-08 | 株式会社ニコン | 光リソグラフィー用石英ガラス部材 |
| JP3334219B2 (ja) * | 1993-02-19 | 2002-10-15 | 住友電気工業株式会社 | ガラス母材の製造装置および製造方法 |
| US5332702A (en) * | 1993-04-16 | 1994-07-26 | Corning Incorporated | Low sodium zircon refractory and fused silica process |
-
1996
- 1996-09-11 EP EP96930773A patent/EP0850201B1/en not_active Expired - Lifetime
- 1996-09-11 US US08/712,296 patent/US5698484A/en not_active Expired - Lifetime
- 1996-09-11 WO PCT/US1996/014428 patent/WO1997010183A1/en not_active Ceased
- 1996-09-11 JP JP51202597A patent/JP3850880B2/ja not_active Expired - Lifetime
- 1996-09-11 DE DE69629119T patent/DE69629119T2/de not_active Expired - Lifetime