JP3850880B2 - 溶融シリカガラス製造用閉じ込め容器 - Google Patents

溶融シリカガラス製造用閉じ込め容器 Download PDF

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Publication number
JP3850880B2
JP3850880B2 JP51202597A JP51202597A JP3850880B2 JP 3850880 B2 JP3850880 B2 JP 3850880B2 JP 51202597 A JP51202597 A JP 51202597A JP 51202597 A JP51202597 A JP 51202597A JP 3850880 B2 JP3850880 B2 JP 3850880B2
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JP
Japan
Prior art keywords
substrate
blank
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center
homogeneity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP51202597A
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English (en)
Japanese (ja)
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JPH11512381A (ja
JPH11512381A5 (enExample
Inventor
イー マクソン，ジョン
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Corning Inc
Original Assignee
Corning Inc
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Filing date
Publication date
Application filed by Corning Inc filed Critical Corning Inc
Publication of JPH11512381A publication Critical patent/JPH11512381A/ja
Publication of JPH11512381A5 publication Critical patent/JPH11512381A5/ja
Application granted granted Critical
Publication of JP3850880B2 publication Critical patent/JP3850880B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1407—Deposition reactors therefor
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1415—Reactant delivery systems
    • C03B19/1423—Reactant deposition burners
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1453—Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1484—Means for supporting, rotating or translating the article being formed
    • C03B19/1492—Deposition substrates, e.g. targets
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/50—Multiple burner arrangements
    • C03B2207/52—Linear array of like burners
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S501/00—Compositions: ceramic
    • Y10S501/90—Optical glass, e.g. silent on refractive index and/or ABBE number
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S65/00—Glass manufacturing
    • Y10S65/08—Quartz

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Thermal Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Glass Compositions (AREA)
  • Glass Melting And Manufacturing (AREA)
JP51202597A 1995-09-12 1996-09-11 溶融シリカガラス製造用閉じ込め容器 Expired - Lifetime JP3850880B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US360895P 1995-09-12 1995-09-12
US60/003,608 1995-09-12
PCT/US1996/014428 WO1997010183A1 (en) 1995-09-12 1996-09-11 Containment vessel for producing fused silica glass

Publications (3)

Publication Number Publication Date
JPH11512381A JPH11512381A (ja) 1999-10-26
JPH11512381A5 JPH11512381A5 (enExample) 2004-09-24
JP3850880B2 true JP3850880B2 (ja) 2006-11-29

Family

ID=21706678

Family Applications (1)

Application Number Title Priority Date Filing Date
JP51202597A Expired - Lifetime JP3850880B2 (ja) 1995-09-12 1996-09-11 溶融シリカガラス製造用閉じ込め容器

Country Status (5)

Country Link
US (1) US5698484A (enExample)
EP (1) EP0850201B1 (enExample)
JP (1) JP3850880B2 (enExample)
DE (1) DE69629119T2 (enExample)
WO (1) WO1997010183A1 (enExample)

Families Citing this family (31)

* Cited by examiner, † Cited by third party
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DE69635662T2 (de) * 1995-09-12 2006-08-10 Corning Inc. Verfahren und Ofen zur Herstellung von Quarzglas mit reduziertem Gehalt an Schlieren
DE59800763D1 (de) * 1997-03-07 2001-06-28 Schott Ml Gmbh Vorform aus synthetischem kieselglas und vorrichtung zu ihrer herstellung
DE69816758T2 (de) * 1997-05-20 2004-06-03 Heraeus Quarzglas Gmbh & Co. Kg Synthetisches quarzglas zur verwendung in uv-strahlung und verfahren zu seiner herstellung
US6044664A (en) * 1997-09-29 2000-04-04 Nikon Corporation Synthetic silica glass manufacturing apparatus
GB9815357D0 (en) * 1998-07-15 1998-09-16 Tsl Group Plc Improvements in and relating to the manufacture of synthetic vitreous silica ingot
US6574991B1 (en) * 1998-08-13 2003-06-10 Corning Incorporated Pure fused silica, furnace and method
US6265115B1 (en) 1999-03-15 2001-07-24 Corning Incorporated Projection lithography photomask blanks, preforms and methods of making
US6319634B1 (en) 1999-03-12 2001-11-20 Corning Incorporated Projection lithography photomasks and methods of making
US6783898B2 (en) 1999-02-12 2004-08-31 Corning Incorporated Projection lithography photomask blanks, preforms and method of making
US6242136B1 (en) 1999-02-12 2001-06-05 Corning Incorporated Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass
US6682859B2 (en) * 1999-02-12 2004-01-27 Corning Incorporated Vacuum ultraviolet trasmitting silicon oxyfluoride lithography glass
US6782716B2 (en) * 1999-02-12 2004-08-31 Corning Incorporated Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass
KR20020029790A (ko) * 1999-09-10 2002-04-19 알프레드 엘. 미첼슨 순수 용융 실리카, 용융로 및 용융방법
US6410192B1 (en) 1999-11-15 2002-06-25 Corning Incorporated Photolithography method, photolithography mask blanks, and method of making
US6176588B1 (en) 1999-12-14 2001-01-23 Corning Incorporated Low cost light weight mirror blank
US6367288B1 (en) * 1999-12-29 2002-04-09 Corning Incorporated Method and apparatus for preventing burner-hole build-up in fused silica processes
US6314766B1 (en) 2000-01-19 2001-11-13 Corning Incorporated Apparatus for minimizing air infiltration in the production of fused silica glass
US6387511B1 (en) 2000-07-27 2002-05-14 Corning Incorporated Light weight porous structure
US6988378B1 (en) 2000-07-27 2006-01-24 Corning Incorporated Light weight porous structure
US7797966B2 (en) * 2000-12-29 2010-09-21 Single Crystal Technologies, Inc. Hot substrate deposition of fused silica
US20020083740A1 (en) * 2000-12-29 2002-07-04 Pandelisev Kiril A. Process and apparatus for production of silica grain having desired properties and their fiber optic and semiconductor application
US20020083739A1 (en) * 2000-12-29 2002-07-04 Pandelisev Kiril A. Hot substrate deposition fiber optic preforms and preform components process and apparatus
US20020174684A1 (en) * 2001-05-23 2002-11-28 Danielson Paul S. Fused silica furnace and method
EP1441992A1 (en) * 2001-09-27 2004-08-04 Corning Incorporated Improved methods and furnaces for fused silica production
DE10359102A1 (de) * 2003-12-17 2005-07-21 Carl Zeiss Smt Ag Optische Komponente umfassend ein Material mit einer vorbestimmten Homogenität der thermischen Längsausdehnung
DE102004015766B4 (de) * 2004-03-23 2016-05-12 Asahi Glass Co., Ltd. Verwendung eines SiO2-TiO2-Glases als strahlungsresistentes Substrat
US20070137253A1 (en) * 2005-12-21 2007-06-21 Beall Lorrie F Reduced striae low expansion glass and elements, and a method for making same
US20100154474A1 (en) * 2005-12-21 2010-06-24 Lorrie Foley Beall Reduced striae low expansion glass and elements, and a method for making same
US20070137252A1 (en) * 2005-12-21 2007-06-21 Maxon John E Reduced striae low expansion glass and elements, and a method for making same
GB0605461D0 (en) * 2006-03-17 2006-04-26 Saint Gobain Quartz Plc Manufacture of large articles in synthetic vitreous silica
KR101918360B1 (ko) 2016-11-25 2018-11-13 한국수력원자력 주식회사 균일한 용융고화체 형성을 위한 몰드 지지장치 및 균일한 용융고화체 형성방법

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FR1363233A (fr) * 1963-04-16 1964-06-12 Corning Glass Works Procédé de fabrication de masses pleines, notamment de verres et céramiques, et appareil de mise en oeuvre
US3806570A (en) * 1972-03-30 1974-04-23 Corning Glass Works Method for producing high quality fused silica
US3859073A (en) * 1973-10-19 1975-01-07 Corning Glass Works Method of producing glass by flame hydrolysis
US4135901A (en) * 1974-12-18 1979-01-23 Sumitomo Electric Industries, Ltd. Method of manufacturing glass for optical waveguide
US3930819A (en) * 1975-02-06 1976-01-06 Fabrication De Maquinas, S.A. Press molded hot glassware handling apparatus
US3966446A (en) * 1975-10-23 1976-06-29 Bell Telephone Laboratories, Incorporated Axial fabrication of optical fibers
US4017288A (en) * 1975-12-15 1977-04-12 Bell Telephone Laboratories, Incorporated Method for making optical fibers with helical gradations in composition
US4065280A (en) * 1976-12-16 1977-12-27 International Telephone And Telegraph Corporation Continuous process for manufacturing optical fibers
US4231774A (en) * 1978-04-10 1980-11-04 International Telephone And Telegraph Corporation Method of fabricating large optical preforms
US4263031A (en) * 1978-06-12 1981-04-21 Corning Glass Works Method of producing glass optical filaments
US4203744A (en) * 1979-01-02 1980-05-20 Corning Glass Works Method of making nitrogen-doped graded index optical waveguides
FR2446264A1 (fr) * 1979-01-10 1980-08-08 Quartz & Silice Procede de preparation d'une preforme pour guide d'onde optique
US4363647A (en) * 1981-05-14 1982-12-14 Corning Glass Works Method of making fused silica-containing material
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DE3240355C1 (de) * 1982-11-02 1983-11-17 Heraeus Quarzschmelze Gmbh, 6450 Hanau Verfahren zur Herstellung eines laenglichen Glaskoerpers mit inhomogener Brechungsindexverteilung
US5221309A (en) * 1984-05-15 1993-06-22 Sumitomo Electric Industries, Ltd. Method for producing glass preform for optical fiber
JPH0618234B2 (ja) * 1985-04-19 1994-03-09 日本電信電話株式会社 半導体基板の接合方法
US5028246A (en) * 1986-02-03 1991-07-02 Ensign-Bickford Optical Technologies, Inc. Methods of making optical waveguides
US4935046A (en) * 1987-12-03 1990-06-19 Shin-Etsu Handotai Company, Limited Manufacture of a quartz glass vessel for the growth of single crystal semiconductor
EP0401845B2 (en) * 1989-06-09 2001-04-11 Heraeus Quarzglas GmbH & Co. KG Optical members and blanks of synthetic silica glass and method for their production
JPH0825763B2 (ja) * 1990-04-26 1996-03-13 信越石英株式会社 すす状シリカ体の製造方法、その装置及び該シリカ体を用いた合成石英ガラス
US5152819A (en) * 1990-08-16 1992-10-06 Corning Incorporated Method of making fused silica
US5043002A (en) * 1990-08-16 1991-08-27 Corning Incorporated Method of making fused silica by decomposing siloxanes
US5410428A (en) * 1990-10-30 1995-04-25 Shin-Etsu Quartz Products Co. Ltd. Optical member made of high-purity and transparent synthetic silica glass and method for production thereof or blank thereof
WO1993000307A1 (fr) * 1991-06-29 1993-01-07 Shin-Etsu Quartz Products Company Limited Element optique en quartz de synthese pour laser a excimere et realisation de cet element
JP2566349B2 (ja) * 1991-10-02 1996-12-25 信越化学工業株式会社 合成石英ガラス部材の製造方法
JP2814795B2 (ja) * 1991-10-25 1998-10-27 株式会社ニコン 石英ガラスの製造方法
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JP2814867B2 (ja) * 1993-02-10 1998-10-27 株式会社ニコン 石英ガラスの製造方法
JP2814866B2 (ja) * 1993-02-10 1998-10-27 株式会社ニコン 石英ガラスの製造方法
JP3656855B2 (ja) * 1993-04-23 2005-06-08 株式会社ニコン 光リソグラフィー用石英ガラス部材
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Also Published As

Publication number Publication date
JPH11512381A (ja) 1999-10-26
EP0850201A4 (en) 1998-12-02
EP0850201A1 (en) 1998-07-01
WO1997010183A1 (en) 1997-03-20
DE69629119T2 (de) 2004-04-15
DE69629119D1 (de) 2003-08-21
EP0850201B1 (en) 2003-07-16
US5698484A (en) 1997-12-16

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