JPH1131639A5 - - Google Patents

Info

Publication number
JPH1131639A5
JPH1131639A5 JP1997185454A JP18545497A JPH1131639A5 JP H1131639 A5 JPH1131639 A5 JP H1131639A5 JP 1997185454 A JP1997185454 A JP 1997185454A JP 18545497 A JP18545497 A JP 18545497A JP H1131639 A5 JPH1131639 A5 JP H1131639A5
Authority
JP
Japan
Prior art keywords
wafer
dummy
cleaning
reaction chamber
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1997185454A
Other languages
English (en)
Japanese (ja)
Other versions
JPH1131639A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP18545497A priority Critical patent/JPH1131639A/ja
Priority claimed from JP18545497A external-priority patent/JPH1131639A/ja
Publication of JPH1131639A publication Critical patent/JPH1131639A/ja
Publication of JPH1131639A5 publication Critical patent/JPH1131639A5/ja
Pending legal-status Critical Current

Links

JP18545497A 1997-07-10 1997-07-10 半導体製造装置 Pending JPH1131639A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18545497A JPH1131639A (ja) 1997-07-10 1997-07-10 半導体製造装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18545497A JPH1131639A (ja) 1997-07-10 1997-07-10 半導体製造装置

Publications (2)

Publication Number Publication Date
JPH1131639A JPH1131639A (ja) 1999-02-02
JPH1131639A5 true JPH1131639A5 (cg-RX-API-DMAC7.html) 2005-02-24

Family

ID=16171085

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18545497A Pending JPH1131639A (ja) 1997-07-10 1997-07-10 半導体製造装置

Country Status (1)

Country Link
JP (1) JPH1131639A (cg-RX-API-DMAC7.html)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3377996B1 (ja) 2001-12-27 2003-02-17 東京エレクトロン株式会社 熱処理用ボート及び縦型熱処理装置
JP4227098B2 (ja) * 2002-07-05 2009-02-18 東京エレクトロン株式会社 基板処理装置のクリーニング方法および基板処理装置
CN103377906A (zh) * 2012-04-17 2013-10-30 上海华虹Nec电子有限公司 氮氧化硅薄膜的制造方法
JP2014045168A (ja) * 2012-07-30 2014-03-13 Tokyo Electron Ltd 不純物拡散方法
US10000863B2 (en) * 2015-02-03 2018-06-19 Sumco Corporation Method for cleaning single crystal pulling apparatus, cleaning tool for use therein, and method for manufacturing single crystal

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