JPH11260688A5 - - Google Patents

Info

Publication number
JPH11260688A5
JPH11260688A5 JP1998059660A JP5966098A JPH11260688A5 JP H11260688 A5 JPH11260688 A5 JP H11260688A5 JP 1998059660 A JP1998059660 A JP 1998059660A JP 5966098 A JP5966098 A JP 5966098A JP H11260688 A5 JPH11260688 A5 JP H11260688A5
Authority
JP
Japan
Prior art keywords
optical
optical element
exposure apparatus
sensor
exposure light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1998059660A
Other languages
English (en)
Japanese (ja)
Other versions
JPH11260688A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP10059660A priority Critical patent/JPH11260688A/ja
Priority claimed from JP10059660A external-priority patent/JPH11260688A/ja
Publication of JPH11260688A publication Critical patent/JPH11260688A/ja
Publication of JPH11260688A5 publication Critical patent/JPH11260688A5/ja
Pending legal-status Critical Current

Links

JP10059660A 1998-03-11 1998-03-11 投影露光装置 Pending JPH11260688A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10059660A JPH11260688A (ja) 1998-03-11 1998-03-11 投影露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10059660A JPH11260688A (ja) 1998-03-11 1998-03-11 投影露光装置

Publications (2)

Publication Number Publication Date
JPH11260688A JPH11260688A (ja) 1999-09-24
JPH11260688A5 true JPH11260688A5 (enExample) 2007-04-12

Family

ID=13119588

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10059660A Pending JPH11260688A (ja) 1998-03-11 1998-03-11 投影露光装置

Country Status (1)

Country Link
JP (1) JPH11260688A (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1321824B1 (en) * 2000-11-23 2007-09-05 ASML Netherlands B.V. Lithographic apparatus and integrated circuit device manufacturing method
TW567400B (en) * 2000-11-23 2003-12-21 Asml Netherlands Bv Lithographic projection apparatus, integrated circuit device manufacturing method, and integrated circuit device manufactured by the manufacturing method
EP1319982A1 (en) * 2001-12-12 2003-06-18 ASML Netherlands B.V. Lithographic apparatus , device manufacturing method, and computer program
JP2006332197A (ja) * 2005-05-24 2006-12-07 Nikon Corp 鏡筒、露光装置及び光学素子の検出方法並びにデバイスの製造方法
JP4528337B2 (ja) 2008-03-03 2010-08-18 キヤノン株式会社 露光装置およびデバイス製造方法
JP2011014707A (ja) 2009-07-01 2011-01-20 Canon Inc 露光装置およびデバイス製造方法
WO2021160463A1 (de) * 2020-02-11 2021-08-19 Carl Zeiss Smt Gmbh Projektionsobjektiv eines lithographiesystems und verfahren zur überwachung eines projektionsobjektivs eines lithographiesystems

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