JPH11260688A - 投影露光装置 - Google Patents

投影露光装置

Info

Publication number
JPH11260688A
JPH11260688A JP10059660A JP5966098A JPH11260688A JP H11260688 A JPH11260688 A JP H11260688A JP 10059660 A JP10059660 A JP 10059660A JP 5966098 A JP5966098 A JP 5966098A JP H11260688 A JPH11260688 A JP H11260688A
Authority
JP
Japan
Prior art keywords
optical
optical element
exposure apparatus
change
sensor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10059660A
Other languages
English (en)
Japanese (ja)
Other versions
JPH11260688A5 (enExample
Inventor
Masayuki Murayama
正幸 村山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP10059660A priority Critical patent/JPH11260688A/ja
Publication of JPH11260688A publication Critical patent/JPH11260688A/ja
Publication of JPH11260688A5 publication Critical patent/JPH11260688A5/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70066—Size and form of the illuminated area in the mask plane, e.g. reticle masking blades or blinds

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP10059660A 1998-03-11 1998-03-11 投影露光装置 Pending JPH11260688A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10059660A JPH11260688A (ja) 1998-03-11 1998-03-11 投影露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10059660A JPH11260688A (ja) 1998-03-11 1998-03-11 投影露光装置

Publications (2)

Publication Number Publication Date
JPH11260688A true JPH11260688A (ja) 1999-09-24
JPH11260688A5 JPH11260688A5 (enExample) 2007-04-12

Family

ID=13119588

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10059660A Pending JPH11260688A (ja) 1998-03-11 1998-03-11 投影露光装置

Country Status (1)

Country Link
JP (1) JPH11260688A (enExample)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1209526A1 (en) * 2000-11-23 2002-05-29 Asm Lithography B.V. Litographic apparatus and integrated circuit device manufacturing method
US7012265B2 (en) 2000-11-23 2006-03-14 Asml Netherlands B.V. Lithographic apparatus, integrated circuit device manufacturing method, and integrated circuit device manufactured thereby
JP2006332197A (ja) * 2005-05-24 2006-12-07 Nikon Corp 鏡筒、露光装置及び光学素子の検出方法並びにデバイスの製造方法
CN100367112C (zh) * 2001-12-12 2008-02-06 Asml荷兰有限公司 平版印刷装置，器件的制造方法
JP2009212241A (ja) * 2008-03-03 2009-09-17 Canon Inc 露光装置およびデバイス製造方法
US8497978B2 (en) 2009-07-01 2013-07-30 Canon Kabushiki Kaisha Exposure apparatus and method of manufacturing device
WO2021160463A1 (de) * 2020-02-11 2021-08-19 Carl Zeiss Smt Gmbh Projektionsobjektiv eines lithographiesystems und verfahren zur überwachung eines projektionsobjektivs eines lithographiesystems

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1209526A1 (en) * 2000-11-23 2002-05-29 Asm Lithography B.V. Litographic apparatus and integrated circuit device manufacturing method
EP1321824A3 (en) * 2000-11-23 2003-07-02 ASML Netherlands B.V. Lithographic apparatus and integrated circuit device manufacturing method
US7012265B2 (en) 2000-11-23 2006-03-14 Asml Netherlands B.V. Lithographic apparatus, integrated circuit device manufacturing method, and integrated circuit device manufactured thereby
KR100566758B1 (ko) * 2000-11-23 2006-03-31 에이에스엠엘 네델란즈 비.브이. 리소그래피장치, 집적회로 디바이스 제조방법 및 그것으로제조된 집적회로 디바이스
CN100367112C (zh) * 2001-12-12 2008-02-06 Asml荷兰有限公司 平版印刷装置，器件的制造方法
JP2006332197A (ja) * 2005-05-24 2006-12-07 Nikon Corp 鏡筒、露光装置及び光学素子の検出方法並びにデバイスの製造方法
JP2009212241A (ja) * 2008-03-03 2009-09-17 Canon Inc 露光装置およびデバイス製造方法
US8223316B2 (en) 2008-03-03 2012-07-17 Canon Kabushiki Kaisha Exposure apparatus and device manufacturing method
US8497978B2 (en) 2009-07-01 2013-07-30 Canon Kabushiki Kaisha Exposure apparatus and method of manufacturing device
WO2021160463A1 (de) * 2020-02-11 2021-08-19 Carl Zeiss Smt Gmbh Projektionsobjektiv eines lithographiesystems und verfahren zur überwachung eines projektionsobjektivs eines lithographiesystems

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