JPH1124285A - レジスト用現像液 - Google Patents

レジスト用現像液

Info

Publication number
JPH1124285A
JPH1124285A JP17211597A JP17211597A JPH1124285A JP H1124285 A JPH1124285 A JP H1124285A JP 17211597 A JP17211597 A JP 17211597A JP 17211597 A JP17211597 A JP 17211597A JP H1124285 A JPH1124285 A JP H1124285A
Authority
JP
Japan
Prior art keywords
resist
developing solution
developer
block copolymer
ethylene oxide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17211597A
Other languages
English (en)
Japanese (ja)
Inventor
Takehiro Yoshikawa
雄裕 吉川
Mitsutoshi Yoshida
光利 吉田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
KURARIANTO JAPAN KK
Original Assignee
KURARIANTO JAPAN KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by KURARIANTO JAPAN KK filed Critical KURARIANTO JAPAN KK
Priority to JP17211597A priority Critical patent/JPH1124285A/ja
Priority to PCT/JP1998/002667 priority patent/WO1999000707A1/fr
Publication of JPH1124285A publication Critical patent/JPH1124285A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP17211597A 1997-06-27 1997-06-27 レジスト用現像液 Pending JPH1124285A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP17211597A JPH1124285A (ja) 1997-06-27 1997-06-27 レジスト用現像液
PCT/JP1998/002667 WO1999000707A1 (fr) 1997-06-27 1998-06-17 Revelateur pour agents de reserve

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17211597A JPH1124285A (ja) 1997-06-27 1997-06-27 レジスト用現像液

Publications (1)

Publication Number Publication Date
JPH1124285A true JPH1124285A (ja) 1999-01-29

Family

ID=15935841

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17211597A Pending JPH1124285A (ja) 1997-06-27 1997-06-27 レジスト用現像液

Country Status (2)

Country Link
JP (1) JPH1124285A (fr)
WO (1) WO1999000707A1 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006115013A1 (fr) * 2005-04-22 2006-11-02 Tokyo Ohka Kogyo Co., Ltd. Composition de revelateur, procede pour la fabriquer et procede de formation d'un motif de resist

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001107081A (ja) 1999-10-06 2001-04-17 Mitsubishi Electric Corp 半導体装置用洗浄剤および半導体装置の製造方法
JP2002351094A (ja) * 2001-05-22 2002-12-04 Fuji Photo Film Co Ltd 現像液組成物及び画像形成方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60111246A (ja) * 1983-11-21 1985-06-17 Fuji Photo Film Co Ltd 感光性平版印刷版の現像液
JPS61167948A (ja) * 1985-01-21 1986-07-29 Mitsubishi Chem Ind Ltd ポジ型感光性組成物用現像液
JPH01129250A (ja) * 1987-11-16 1989-05-22 Tama Kagaku Kogyo Kk ポジ型フォトレジスト用現像液
JP2543742B2 (ja) * 1988-04-07 1996-10-16 富士写真フイルム株式会社 ポジ型フオトレジスト用現像液
JP2915167B2 (ja) * 1991-05-23 1999-07-05 株式会社トクヤマ ホトレジスト用現像液
JPH06332195A (ja) * 1993-05-19 1994-12-02 Fuji Photo Film Co Ltd 画像形成方法
JP2937801B2 (ja) * 1994-03-31 1999-08-23 東京応化工業株式会社 レジスト用現像原液

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006115013A1 (fr) * 2005-04-22 2006-11-02 Tokyo Ohka Kogyo Co., Ltd. Composition de revelateur, procede pour la fabriquer et procede de formation d'un motif de resist
KR100899320B1 (ko) 2005-04-22 2009-05-26 도오꾜오까고오교 가부시끼가이샤 현상액 조성물 및 그 제조 방법, 그리고 레지스트 패턴의형성 방법

Also Published As

Publication number Publication date
WO1999000707A1 (fr) 1999-01-07

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