JPH11200038A - マグネトロンスパッタ装置及びその方法 - Google Patents

マグネトロンスパッタ装置及びその方法

Info

Publication number
JPH11200038A
JPH11200038A JP10001432A JP143298A JPH11200038A JP H11200038 A JPH11200038 A JP H11200038A JP 10001432 A JP10001432 A JP 10001432A JP 143298 A JP143298 A JP 143298A JP H11200038 A JPH11200038 A JP H11200038A
Authority
JP
Japan
Prior art keywords
target
magnetron sputtering
filament
hollow cathode
anode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10001432A
Other languages
English (en)
Japanese (ja)
Other versions
JPH11200038A5 (enExample
Inventor
Masahide Yokoyama
政秀 横山
Kenji Maruyama
賢治 丸山
Hiroshi Hayata
博 早田
Masahiro Yamamoto
昌裕 山本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP10001432A priority Critical patent/JPH11200038A/ja
Publication of JPH11200038A publication Critical patent/JPH11200038A/ja
Publication of JPH11200038A5 publication Critical patent/JPH11200038A5/ja
Pending legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
JP10001432A 1998-01-07 1998-01-07 マグネトロンスパッタ装置及びその方法 Pending JPH11200038A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10001432A JPH11200038A (ja) 1998-01-07 1998-01-07 マグネトロンスパッタ装置及びその方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10001432A JPH11200038A (ja) 1998-01-07 1998-01-07 マグネトロンスパッタ装置及びその方法

Publications (2)

Publication Number Publication Date
JPH11200038A true JPH11200038A (ja) 1999-07-27
JPH11200038A5 JPH11200038A5 (enExample) 2005-08-04

Family

ID=11501297

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10001432A Pending JPH11200038A (ja) 1998-01-07 1998-01-07 マグネトロンスパッタ装置及びその方法

Country Status (1)

Country Link
JP (1) JPH11200038A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100948547B1 (ko) * 2007-12-11 2010-03-18 한국원자력연구원 고진공 마그네트론 스퍼터링 건

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100948547B1 (ko) * 2007-12-11 2010-03-18 한국원자력연구원 고진공 마그네트론 스퍼터링 건

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