JPH11200023A - 真空蒸着装置 - Google Patents
真空蒸着装置Info
- Publication number
- JPH11200023A JPH11200023A JP1790998A JP1790998A JPH11200023A JP H11200023 A JPH11200023 A JP H11200023A JP 1790998 A JP1790998 A JP 1790998A JP 1790998 A JP1790998 A JP 1790998A JP H11200023 A JPH11200023 A JP H11200023A
- Authority
- JP
- Japan
- Prior art keywords
- shutter
- vacuum
- evaporation
- opening
- mask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Physical Vapour Deposition (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1790998A JPH11200023A (ja) | 1998-01-13 | 1998-01-13 | 真空蒸着装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1790998A JPH11200023A (ja) | 1998-01-13 | 1998-01-13 | 真空蒸着装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH11200023A true JPH11200023A (ja) | 1999-07-27 |
| JPH11200023A5 JPH11200023A5 (enExample) | 2005-08-18 |
Family
ID=11956887
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1790998A Pending JPH11200023A (ja) | 1998-01-13 | 1998-01-13 | 真空蒸着装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH11200023A (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2012079295A1 (zh) * | 2010-12-16 | 2012-06-21 | Pan Chongguang | 一种采用荫罩技术生产线制造器件的方法及系统 |
-
1998
- 1998-01-13 JP JP1790998A patent/JPH11200023A/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2012079295A1 (zh) * | 2010-12-16 | 2012-06-21 | Pan Chongguang | 一种采用荫罩技术生产线制造器件的方法及系统 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20041217 Effective date: 20041217 Free format text: JAPANESE INTERMEDIATE CODE: A821 |
|
| A621 | Written request for application examination |
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| A521 | Written amendment |
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| A977 | Report on retrieval |
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| A131 | Notification of reasons for refusal |
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| A02 | Decision of refusal |
Effective date: 20071115 Free format text: JAPANESE INTERMEDIATE CODE: A02 |