JPH11191396A - エキシマランプおよびエキシマ発光装置 - Google Patents
エキシマランプおよびエキシマ発光装置Info
- Publication number
- JPH11191396A JPH11191396A JP36094097A JP36094097A JPH11191396A JP H11191396 A JPH11191396 A JP H11191396A JP 36094097 A JP36094097 A JP 36094097A JP 36094097 A JP36094097 A JP 36094097A JP H11191396 A JPH11191396 A JP H11191396A
- Authority
- JP
- Japan
- Prior art keywords
- excimer
- discharge vessel
- excimer lamp
- discharge
- internal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000002834 transmittance Methods 0.000 claims abstract description 8
- 229910052751 metal Inorganic materials 0.000 claims description 17
- 239000002184 metal Substances 0.000 claims description 17
- 229910001338 liquidmetal Inorganic materials 0.000 claims description 14
- 239000003989 dielectric material Substances 0.000 claims description 6
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 claims description 3
- 229910052753 mercury Inorganic materials 0.000 claims description 3
- 239000004973 liquid crystal related substance Substances 0.000 claims 1
- 238000007599 discharging Methods 0.000 abstract description 2
- 239000007789 gas Substances 0.000 description 23
- 230000004888 barrier function Effects 0.000 description 14
- 239000003990 capacitor Substances 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 230000002349 favourable effect Effects 0.000 description 3
- 150000002894 organic compounds Chemical class 0.000 description 3
- 230000002093 peripheral effect Effects 0.000 description 3
- 238000007789 sealing Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 125000004430 oxygen atom Chemical group O* 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 235000012431 wafers Nutrition 0.000 description 2
- -1 ArCl Chemical class 0.000 description 1
- 125000006414 CCl Chemical group ClC* 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 229910052743 krypton Inorganic materials 0.000 description 1
- DNNSSWSSYDEUBZ-UHFFFAOYSA-N krypton atom Chemical compound [Kr] DNNSSWSSYDEUBZ-UHFFFAOYSA-N 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 238000006552 photochemical reaction Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Discharge Lamps And Accessories Thereof (AREA)
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP36094097A JPH11191396A (ja) | 1997-12-26 | 1997-12-26 | エキシマランプおよびエキシマ発光装置 |
| CA 2244645 CA2244645A1 (en) | 1997-12-26 | 1998-08-10 | Decomposition apparatus of organic compound, decomposition method thereof, excimer uv lamp and excimer emission apparatus |
| US09/132,215 US6194821B1 (en) | 1997-02-12 | 1998-08-11 | Decomposition apparatus of organic compound, decomposition method thereof, excimer UV lamp and excimer emission apparatus |
| DE1998136619 DE19836619A1 (de) | 1997-12-26 | 1998-08-12 | Vorrichtung und Verfahren zur Zersetzung einer organischen Verbindung, Excimer-UV-Lampe und Excimer-Emissions-Vorrichtung |
| US09/695,043 US6888041B1 (en) | 1997-02-12 | 2000-10-25 | Decomposition apparatus of organic compound, decomposition method thereof, excimer UV lamp and excimer emission apparatus |
| US11/075,263 US20050156497A1 (en) | 1997-02-12 | 2005-03-09 | Decomposition apparatus of organic compound, decomposition method thereof, excimer UV lamp and excimer emission apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP36094097A JPH11191396A (ja) | 1997-12-26 | 1997-12-26 | エキシマランプおよびエキシマ発光装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH11191396A true JPH11191396A (ja) | 1999-07-13 |
| JPH11191396A5 JPH11191396A5 (enExample) | 2005-07-28 |
Family
ID=18471546
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP36094097A Pending JPH11191396A (ja) | 1997-02-12 | 1997-12-26 | エキシマランプおよびエキシマ発光装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH11191396A (enExample) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000133209A (ja) * | 1998-10-27 | 2000-05-12 | Iwasaki Electric Co Ltd | 無電極電界放電エキシマランプ装置 |
| KR100539359B1 (ko) * | 1999-12-28 | 2005-12-27 | 쿼크 시스템즈 가부시키가이샤 | 엑시머 조사 장치 |
| CN113990735A (zh) * | 2021-11-20 | 2022-01-28 | 广东星普节能光电有限公司 | 一种准分子灯及加工方法 |
| JP2022182682A (ja) * | 2021-05-28 | 2022-12-08 | 株式会社オーク製作所 | 放電ランプ、紫外線照射装置、オゾン発生装置および放電ランプの製造方法 |
-
1997
- 1997-12-26 JP JP36094097A patent/JPH11191396A/ja active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000133209A (ja) * | 1998-10-27 | 2000-05-12 | Iwasaki Electric Co Ltd | 無電極電界放電エキシマランプ装置 |
| KR100539359B1 (ko) * | 1999-12-28 | 2005-12-27 | 쿼크 시스템즈 가부시키가이샤 | 엑시머 조사 장치 |
| JP2022182682A (ja) * | 2021-05-28 | 2022-12-08 | 株式会社オーク製作所 | 放電ランプ、紫外線照射装置、オゾン発生装置および放電ランプの製造方法 |
| CN113990735A (zh) * | 2021-11-20 | 2022-01-28 | 广东星普节能光电有限公司 | 一种准分子灯及加工方法 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20041222 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20041222 |
|
| A871 | Explanation of circumstances concerning accelerated examination |
Effective date: 20041222 Free format text: JAPANESE INTERMEDIATE CODE: A871 |
|
| A975 | Report on accelerated examination |
Free format text: JAPANESE INTERMEDIATE CODE: A971005 Effective date: 20050124 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20050222 |
|
| A02 | Decision of refusal |
Effective date: 20050621 Free format text: JAPANESE INTERMEDIATE CODE: A02 |