US20050156497A1 - Decomposition apparatus of organic compound, decomposition method thereof, excimer UV lamp and excimer emission apparatus - Google Patents
Decomposition apparatus of organic compound, decomposition method thereof, excimer UV lamp and excimer emission apparatus Download PDFInfo
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- US20050156497A1 US20050156497A1 US11/075,263 US7526305A US2005156497A1 US 20050156497 A1 US20050156497 A1 US 20050156497A1 US 7526305 A US7526305 A US 7526305A US 2005156497 A1 US2005156497 A1 US 2005156497A1
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- organic compound
- excimer lamp
- decomposition apparatus
- decomposition
- gas
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- 238000000354 decomposition reaction Methods 0.000 title claims abstract description 116
- 150000002894 organic compounds Chemical class 0.000 title claims abstract description 99
- 238000000034 method Methods 0.000 title abstract description 13
- 239000007788 liquid Substances 0.000 claims abstract description 66
- -1 dioxin (polychlorinated dibenzo-para-dioxin Chemical class 0.000 claims abstract description 11
- 238000007599 discharging Methods 0.000 claims description 51
- 239000000463 material Substances 0.000 claims description 43
- 239000003054 catalyst Substances 0.000 claims description 39
- 230000003139 buffering effect Effects 0.000 claims description 32
- 229910052751 metal Inorganic materials 0.000 claims description 24
- 239000002184 metal Substances 0.000 claims description 24
- 239000012530 fluid Substances 0.000 claims description 17
- 150000003254 radicals Chemical class 0.000 claims description 11
- 230000035699 permeability Effects 0.000 claims description 10
- 150000003071 polychlorinated biphenyls Chemical class 0.000 claims description 10
- 239000003989 dielectric material Substances 0.000 claims description 9
- UOORRWUZONOOLO-OWOJBTEDSA-N (E)-1,3-dichloropropene Chemical compound ClC\C=C\Cl UOORRWUZONOOLO-OWOJBTEDSA-N 0.000 claims description 5
- UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 claims description 5
- SCYULBFZEHDVBN-UHFFFAOYSA-N 1,1-Dichloroethane Chemical compound CC(Cl)Cl SCYULBFZEHDVBN-UHFFFAOYSA-N 0.000 claims description 5
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 claims description 5
- 229950005499 carbon tetrachloride Drugs 0.000 claims description 5
- 239000000203 mixture Substances 0.000 claims description 5
- UOORRWUZONOOLO-UHFFFAOYSA-N telone II Natural products ClCC=CCl UOORRWUZONOOLO-UHFFFAOYSA-N 0.000 claims description 5
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 claims description 5
- 230000001737 promoting effect Effects 0.000 claims description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 3
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 abstract 2
- XSTXAVWGXDQKEL-UHFFFAOYSA-N Trichloroethylene Chemical group ClC=C(Cl)Cl XSTXAVWGXDQKEL-UHFFFAOYSA-N 0.000 abstract 1
- 235000010290 biphenyl Nutrition 0.000 abstract 1
- 239000004305 biphenyl Substances 0.000 abstract 1
- UBOXGVDOUJQMTN-UHFFFAOYSA-N trichloroethylene Natural products ClCC(Cl)Cl UBOXGVDOUJQMTN-UHFFFAOYSA-N 0.000 abstract 1
- 239000007789 gas Substances 0.000 description 87
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 41
- 229910001873 dinitrogen Inorganic materials 0.000 description 26
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 21
- 238000011282 treatment Methods 0.000 description 10
- 230000006866 deterioration Effects 0.000 description 7
- 239000010453 quartz Substances 0.000 description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 7
- 238000001179 sorption measurement Methods 0.000 description 6
- 239000000843 powder Substances 0.000 description 5
- 229910001220 stainless steel Inorganic materials 0.000 description 5
- 239000010935 stainless steel Substances 0.000 description 5
- 229910052799 carbon Inorganic materials 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- 239000003990 capacitor Substances 0.000 description 3
- 238000010276 construction Methods 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- 238000003911 water pollution Methods 0.000 description 3
- 125000006414 CCl Chemical group ClC* 0.000 description 2
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 2
- 239000005751 Copper oxide Substances 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 238000003915 air pollution Methods 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 229910000431 copper oxide Inorganic materials 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000005611 electricity Effects 0.000 description 2
- 229910001338 liquidmetal Inorganic materials 0.000 description 2
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 2
- 239000000395 magnesium oxide Substances 0.000 description 2
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 125000004430 oxygen atom Chemical group O* 0.000 description 2
- 238000004080 punching Methods 0.000 description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 208000037805 labour Diseases 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 150000002896 organic halogen compounds Chemical class 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 238000004064 recycling Methods 0.000 description 1
- 239000010802 sludge Substances 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/22—Gases
- H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
- H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
-
- A—HUMAN NECESSITIES
- A62—LIFE-SAVING; FIRE-FIGHTING
- A62D—CHEMICAL MEANS FOR EXTINGUISHING FIRES OR FOR COMBATING OR PROTECTING AGAINST HARMFUL CHEMICAL AGENTS; CHEMICAL MATERIALS FOR USE IN BREATHING APPARATUS
- A62D3/00—Processes for making harmful chemical substances harmless or less harmful, by effecting a chemical change in the substances
- A62D3/10—Processes for making harmful chemical substances harmless or less harmful, by effecting a chemical change in the substances by subjecting to electric or wave energy or particle or ionizing radiation
- A62D3/17—Processes for making harmful chemical substances harmless or less harmful, by effecting a chemical change in the substances by subjecting to electric or wave energy or particle or ionizing radiation to electromagnetic radiation, e.g. emitted by a laser
- A62D3/176—Ultraviolet radiations, i.e. radiation having a wavelength of about 3nm to 400nm
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J19/12—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electromagnetic waves
- B01J19/122—Incoherent waves
- B01J19/123—Ultra-violet light
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/30—Treatment of water, waste water, or sewage by irradiation
- C02F1/32—Treatment of water, waste water, or sewage by irradiation with ultraviolet light
- C02F1/325—Irradiation devices or lamp constructions
-
- A—HUMAN NECESSITIES
- A62—LIFE-SAVING; FIRE-FIGHTING
- A62D—CHEMICAL MEANS FOR EXTINGUISHING FIRES OR FOR COMBATING OR PROTECTING AGAINST HARMFUL CHEMICAL AGENTS; CHEMICAL MATERIALS FOR USE IN BREATHING APPARATUS
- A62D2101/00—Harmful chemical substances made harmless, or less harmful, by effecting chemical change
- A62D2101/20—Organic substances
- A62D2101/22—Organic substances containing halogen
-
- A—HUMAN NECESSITIES
- A62—LIFE-SAVING; FIRE-FIGHTING
- A62D—CHEMICAL MEANS FOR EXTINGUISHING FIRES OR FOR COMBATING OR PROTECTING AGAINST HARMFUL CHEMICAL AGENTS; CHEMICAL MATERIALS FOR USE IN BREATHING APPARATUS
- A62D2203/00—Aspects of processes for making harmful chemical substances harmless, or less harmful, by effecting chemical change in the substances
- A62D2203/10—Apparatus specially adapted for treating harmful chemical agents; Details thereof
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J2219/0873—Materials to be treated
- B01J2219/0875—Gas
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J2219/0873—Materials to be treated
- B01J2219/0877—Liquid
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J2219/0873—Materials to be treated
- B01J2219/0892—Materials to be treated involving catalytically active material
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2101/00—Nature of the contaminant
- C02F2101/30—Organic compounds
- C02F2101/36—Organic compounds containing halogen
- C02F2101/363—PCB's; PCP's
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2201/00—Apparatus for treatment of water, waste water or sewage
- C02F2201/32—Details relating to UV-irradiation devices
- C02F2201/328—Having flow diverters (baffles)
Definitions
- the present invention relates to a decomposition apparatus of an organic compound by emission of an ultraviolet (UV) light which is irradiated from an excimer lamp, a decomposition method thereof and an excimer lamp and an excimer emission apparatus which may suitable be used for the decomposition apparatus and the decomposition method.
- UV ultraviolet
- An organic compound causing air pollution or water pollution can be decomposed or eliminated by an activated carbon adsorption treatment, an oxidation decomposition treatment, an activated sludge treatment, a bio-oxidation treatment or the like.
- the activated carbon adsorption treatment may suitable be used for the elimination of the organic compound causing water pollution.
- the activated carbon makes it necessary to recycle; a handling of the activated carbon is not easy since the activated carbon is of powdery; an apparatus of the activated carbon adsorption treatment is of comparatively large scale; a recycling treatment of the activated carbon and maintenance of the apparatus need much labors and costs.
- An object of the present invention is therefore to provide a decomposition apparatus by emission of a UV light which is irradiated from an excimer lamp, a decomposition method thereof and an excimer lamp and an excimer emission apparatus which may suitable be used for a decomposition apparatus and a decomposition method of an organic compound.
- a decomposition apparatus for decomposing an organic compound fluid such as a gas of an organic compound, a liquid thereof, a gas containing an organic compound and a liquid containing an organic compound is decomposed.
- the decomposition apparatus comprises an excimer lamp emitting UV light for decomposing the organic compound, a decomposition container provided with an excimer lamp for decomposing the organic compound in the organic compound fluid.
- two or more decomposition container each having the excimer lamp may be jointed for flowing the fluid in the container to other container in order, and the organic compound in the fluid can be effectively decomposed.
- the container is provided with a flow rate buffering material for slowing down a flow rate of the fluid. It is preferable that a contact part between the fluid and a catalyst gas for promoting decomposition of the organic compound is equipped to the decomposition container.
- the excimer lamp which may suitable be used for the decomposition apparatus, comprises a discharging vessel made of a dielectric material with excellent permeability of a UV light, an inner tube equipped on the inside of the discharging vessel, a protect tube equipped on the outside of the discharging vessel, an outer electrode equipped in the position between the protect tube and the discharging vessel, an inner electrode equipped on the inside of the inner tube, a filling gas filled up in the discharging vessel and a power supply for applying a voltage between the outer electrode and the inner electrode.
- a decomposition apparatus for decomposing an organic compound in second mode of the present invention comprises an excimer emission body equipped with an inner electrode, a metal container equipped to the outside of the excimer emission body for filling up at least one selected from a liquid of an organic compound and a liquid containing organic compound, and a power supply for applying a high frequency voltage between the inner electrode and the metal container, and a UV light irradiated from the excimer emission body to the liquid in the metal container allows to generate OH radical and O radical into the liquid, and the radical cuts some bond of the organic compound so that the organic compound in the liquid is decomposed easily.
- the excimer emission body comprises a discharging vessel made of a dielectric material with excellent permeability of a UV light, an inner tube equipped on the inside of the discharging vessel, an inner electrode equipped on the inside of the inner tube and a filling gas filled up in the discharging vessel. It is preferable that the power supply applies a high frequency voltage from 1 to 20 MHz to the metal container and the inner electrode.
- the organic compound used may be selected from flon, dioxin (polychlorinated dibenzo-para-dioxin), PCB (polychlorinated biphenyl), trichloroethylene, tetrachloroethylene, dichloromethane, tetrachloromethane, 1,2-dichloroethane, 1,1-dichloroethane, cis-1,2-dichloroethane, 1,1,1-trichloroethane, 1,3-dichloropropene and the mixture thereof. It is preferable that the UV light of wavelength of 222 nm or below may suitable be used.
- a decomposition method for decomposing an organic compound of the present invention may be used in the decomposition apparatus described above, and comprises steps of flowing a fluid which is selected from a gas of an organic compound, a liquid thereof, a gas containing an organic compound and a liquid containing an organic compound during the emission of a UV light which is irradiated from the excimer lamp, and decomposing the organic compound in fluid during its flowing.
- the fluid flows slowly in a flow rate buffering material during the emission of UV light.
- the fluid contacts a catalyst for promoting the decomposition of an organic compound during the emission of UV light.
- the organic compound used may be selected from flon, dioxin (polychlorinated dibenzo-para-dioxin), PCB (polychlorinated biphenyl), trichloroethylene, tetrachloroethylene, dichloromethane, tetrachloromethane, 1,2-dichloroethane, 1,1-dichloroethane, cis-1,2-dichloroethane, 1,1,1-trichloroethane, 1,3-dichloropropene and the mixture thereof. It is preferable that the UV light of wave length of 222 nm or below may suitable be used.
- An excimer lamp which may suitable be used for the decomposition apparatus and the decomposition method described above, comprises a discharging vessel made of a dielectric material with excellent permeability of UV light, an inner tube equipped on the inside of the discharging vessel, an outer electrode equipped on the outside of the discharging vessel, an inner electrode equipped on the inside of the inner tube and a filling gas filled up in the discharging vessel, and a UV light is preferably irradiated from the excimer lamp by which a high frequency voltage is applied between the outer electrode and the inner electrode from 1 to 20 MHz.
- the inner tube is cooled by a nitrogen gas flowed in the inner tube.
- d/D ratio in which the “d” is an inner diameter of the inner tube and the “D” is an outer diameter of the inner electrode, is of from 1.1 to 3.0
- L/D ratio in which the “L” is a length of the inner electrode and the “D” is an outer diameter of the inner electrode, is of from 10 to below 30.
- An U-shaped inner tube of at least one or above, as the inner tube, may be equipped on the inside of the discharging vessel.
- An excimer emission apparatus comprises the excimer lamp described above, a power supply for applying a high frequency voltage from 1 to 20 MHz between the outer electrode and the inner electrode and a circulating cooling apparatus by the nitrogen gas to cool the inner tube.
- d/D ratio in which the “d” is an inner diameter of the inner tube and the “D” is an outer diameter of the inner electrode, is of from 1.1 to 3.0
- L/D ratio in which the “L” is a length of the inner electrode and the “D” is an outer diameter of the inner electrode, is of from 10 to below 30.
- FIG. 1 shows a schematic view illustrating a first embodiment of a decomposition apparatus (A) of the present invention.
- FIG. 2 shows a schematic view illustrating a second embodiment of a decomposition apparatus (B) of the present invention.
- FIG. 3 shows a schematic longitudinal cross sectional view illustrating an embodiment of an excimer lamp used for the decomposition apparatus of the present invention.
- FIG. 4 shows a schematic view illustrating a third embodiment of a decomposition apparatus (C) of the present invention.
- FIG. 5 shows a schematic view illustrating a fourth embodiment of a decomposition apparatus (D) of the present invention attached the excimer lamp.
- FIG. 6 shows a schematic perspective view illustrating an embodiment of an excimer lamp used for the decomposition apparatus (C) in FIG. 4 .
- FIG. 7 shows a schematic view illustrating a fifth embodiment of a decomposition apparatus (E) of the present invention.
- FIG. 8 shows a schematic view illustrating a sixth embodiment of a decomposition apparatus (F) of the present invention in.
- FIG. 9 shows a schematic view illustrating a seventh embodiment of a decomposition apparatus (G) of the present invention.
- FIG. 10 shows a schematic perspective view illustrating an embodiment of a flow rate buffering material.
- FIG. 11 shows a schematic view illustrating an embodiment of a manner of flowing of the liquid to the flow rate buffering material.
- FIG. 12 shows a schematic view illustrating an eighth embodiment of a decomposition apparatus (H) of the present invention.
- FIG. 13 shows a schematic perspective view illustrating an embodiment of a part of the inlet side of gas in the decomposition apparatus (H) shown in FIG. 12 .
- FIG. 14 shows a schematic longitudinal cross sectional view illustrating an embodiment of the flow rate buffering material for the gas in FIG. 12 .
- FIG. 15 shows a schematic view illustrating a ninth embodiment of an decomposition apparatus (I) of the present invention.
- FIG. 16 shows a schematic longitudinal cross sectional view illustrating a tenth embodiment of a decomposition apparatus (J) of the present invention.
- FIG. 17 shows a schematic longitudinal cross sectional view illustrating an embodiment of a excimer lamp of the present invention.
- FIG. 18 shows a schematic cross sectional view illustrating an embodiment of the relationship between the inner tube and the inner electrode of the excimer lamp of the present invention.
- FIG. 19 shows an schematic longitudinal cross sectional view illustrating an embodiment of an excimer lamp of the present invention.
- FIG. 20 shows an schematic longitudinal cross sectional view illustrating an embodiment of an excimer lamp of the present invention.
- FIG. 21 shows a schematic cross sectional view illustrating an embodiment of the relationship between the inner tube and the inner electrode of the excimer lamp of the present invention.
- FIG. 22 shows a schematic cross sectional view illustrating an embodiment of the relationship between the inner tube and the inner electrode of the excimer lamp of the present invention.
- FIG. 23 shows a schematic cross sectional view illustrating an embodiment of the relationship between the inner tube and the inner electrode of the excimer lamp of the present invention.
- FIG. 24 shows a schematic longitudinal cross sectional view illustrating an embodiment of the excimer lamp of the present invention.
- FIG. 25 shows a schematic cross sectional view in perpendicular direction to lengthwise direction illustrating an embodiment of the excimer lamp as shown in FIG. 24 .
- FIG. 26 shows a schematic cross sectional view illustrating an embodiment of the U-shape inner tube used for the excimer lamp of the present invention.
- FIG. 27 shows a schematic longitudinal cross sectional view illustrating an embodiment of an excimer lamp of the present invention.
- FIG. 28 shows a schematic cross sectional view illustrating an embodiment of an excimer lamp in FIG. 27 .
- FIG. 29 shows a schematic view illustrating an embodiment of an excimer generating apparatus of the present invention.
- FIG. 1 shows a schematic view illustrating a first embodiment of a decomposition apparatus of the present invention.
- the decomposition apparatus A comprises an excimer lamp 1 and a decomposition container 2 .
- the excimer lamp 1 is equipped to the decomposition container 2 to immerse in a liquid 3 of at least one selected from a liquid of an organic compound and a liquid containing an organic compound.
- the organic compound in liquid 3 is decomposed by emission of UV light irradiated from the excimer lamp 1 .
- the organic compound may suitable be selected from flon, dioxin (polychlorinated dibenzo-para-dioxin), PCB (polychlorinated biphenyl), trichloroethylene, tetrachloroethylene, dichloromethane, tetrachloromethane, 1,2-dichloroethane, 1,1-dichloroethane, cis-1,2-dichloroethane, 1,1,1-trichloroethane, 1,3-dichloropropene and the mixture thereof. All of the organic compound described above pollutes air or water and has a strong bond between carbon and chlorine.
- the organic compound in the liquid 3 can be decomposed easily by emission of the UV light irradiated from the excimer lamp 1 according to the present invention.
- the decomposition apparatus can decompose an organic halogen compound containing halogens element such as fluorine element or bromine element besides the organic compound described above.
- the form of the container 2 is not limited to that of the container 2 in FIG. 1 . It is preferable to use the container 2 in which the material thereof is unreactive to the liquid 3 and the UV light irradiated from the excimer lamp 1 for example stainless steel or the like.
- the container 2 may be provided with an attachment hole 10 of the excimer lamp 1 , an exhaust hole 5 of a decomposed gas 4 and an exhaust tube with carbon filter to exhaust gas.
- the container 2 may be provided with a mixer which is a stirrer with a stirrer chip 9 or a propeller mixer, to decompose efficiently.
- FIG. 2 shows a schematic view illustrating a second embodiment of a decomposition apparatus (B) of the present invention.
- two or more containers 2 each having the excimer lamp 1 may be joints for flowing the fluid in one container to the other container in order.
- the liquid 3 is emitted by light irradiated from the excimer lamp 1 during flowing in the container 2 so that the organic compound in the liquid 3 is decomposed continuously and efficiently. According to the decomposition apparatus (B), the efficiency of decomposition and the quantity of decomposition treatment of the organic compound can be improved.
- FIG. 3 shows a schematic longitudinal cross sectional view illustrating an embodiment of an excimer lamp used for the decomposition apparatus of the present invention.
- the excimer lamp 1 is equipped to the container 2 to immerse in the liquid 3 .
- the excimer lamp 1 comprises a discharging vessel made of a dielectric material with excellent permeability of UV light, an inner tube equipped on the inside of the discharging vessel, an outer electrode equipped on the outside of the discharging vessel, an inner electrode equipped on the inside of the inner tube and a filling gas filled up in the discharging vessel, and a UV light is preferably irradiated from the excimer lamp 1 by which a high frequency voltage is applied between the outer electrode and the inner electrode from 1 to 20 MHz.
- a power supply (no illustrating in figures) for applying a voltage of the high frequency between the outer electrode 34 and the inner electrode 35 of the excimer lamp 1 , is equipped to the decomposition apparatus.
- the irradiated UV light is emitted in all directions from a surface of the excimer lamp 1 by the applying voltage.
- the detail of constitution of the excimer lamp 1 will be explained afterwards.
- the excimer lamp 1 may be provided with a supporting member 38 comprising a attachment member 37 for fitting the excimer lamp 1 to the container 2 .
- the excimer lamp 1 may be attached anywhere and may be possible to desorb.
- the excimer lamp 1 can irradiate the UV light of the different wavelength such as 172 nm, 222 nm and 308 nm based on a kind of the filling gas.
- the UV light of wavelength of 222 nm or below for example 172 nm and 222 nm, to the organic compound.
- the organic compound is decomposed by which the exited oxygen atoms attacks the position of the bond so that a decomposed material such as CO 2 , H 2 O or the like is generated.
- a decomposed material such as CO 2 , H 2 O or the like is generated.
- the decomposed material is released from the liquid 3 as the decomposition gas 4 and is exhausted through the exhaust tube 5 of the container 2 .
- FIG. 4 and FIG. 5 show a schematic view illustrating third and fourth embodiments of a decomposition apparatus C, D equipped with the excimer lamp unit 41 , 51 , which has excimer lamp, for emitting the liquid 3 into the container 42 , 52 .
- the excimer lamp unit 41 , 51 of at least one or above are equipped on the sides of the containers 42 , 52 .
- FIG. 6 shows a schematic perspective view illustrating an embodiment of an excimer lamp unit 41 used for the decomposition apparatus C in FIG. 4 .
- the excimer lamp unit 41 has the excimer lamp 1 in a protect box 61 with one open window 62 and can be attached to the position 43 of the container 42 by an attachment member 63 .
- the organic compound in the liquid 3 is decomposed by emission of the UV light irradiated from the excimer lamp 1 .
- At least one ring-shape excimer lamp unit 51 is equipped to the cylinderic container 52 .
- FIG. 7 shows a schematic view illustrating a fifth embodiment of a decomposition apparatus E to decompose the organic compound in gas 72 , which is evaporated by heat of the liquid 3 , by emission of the UV light irradiated from the excimer lamp unit 71 which has excimer lamp.
- the kind of the heat apparatus 72 , the position of the attachment thereof and the heating manner of the heat apparatus are not particularly limited. It is preferable that the excimer lamp 71 is equipped on the top plate of the container 72 to emit the gas 74 which may be either the gas of organic compound or the gas containing the organic compound.
- FIG. 8 shows a schematic view illustrating a sixth embodiment of a decomposition apparatus F in which a route of a catalyst gas for promoting the decomposition of the organic compound is equipped to the container 82 .
- the amount of flowing of the catalyst gas 86 is controlled by the flow control valve 89 equipped to the exit of the catalyst gas cylinder 80 .
- the gas 74 evaporated from liquid comprising the organic compound, and catalyst gas 86 is contacted at a contact part 88 of the route 84 of the catalyst gas.
- the contact part 88 can be equipped with a contact material such as a net-shape material.
- the catalyst gas 86 and the gas 74 can be contacted at just outside of the route 84 of the catalyst gas.
- the catalyst gas 86 may be circulated as shown in FIG. 8 .
- a contact material with a catalyst powder may be equipped to the contact part 88 instead of the catalyst gas 86 . Consequently, under the condition described above, the gas 74 is easily decomposed by emission of the UV light irradiated from the excimer lamp unit 71 .
- the decomposed gas 85 is exhausted from the exhaust part 5 with the carbon filter 8 . According to the decomposition apparatus, the efficiency of decomposition of the organic compound can be improved.
- the catalyst gas 86 or powder it is preferable to use that of titanium oxide, magnesium oxide or the like, and the titanium in the titanium oxide or the magnesium in the magnesium oxide attacks the bonded part of C—Cl in particular so that the bonded part of that is cut easily.
- FIG. 9 shows a schematic view illustrating a seventh embodiment of a decomposition apparatus G.
- the organic compound is decomposed by emission of the UV light during the liquid 3 of the organic compound flows down in the flow rate buffering material 93 which is equipped on the position in the neighborhood of the surface of excimer lamp unit 91 which has excimer lamp, in the container.
- the amount of flowing of the liquid 3 is controlled by the flow control valve 96 equipped to the flowing tube 95 .
- the liquid 3 flows down slowly through the flow rate buffering material 93 from the inlet 97 to the container 92 .
- the organic compound in the liquid 3 is decomposed by emission of the UV light irradiated from the excimer lamp unit 91 .
- a treated liquid 101 is restored to the standing container 99 , and is pumped by the circulation pump 104 equipped to the circulation tube 102 to restore in the container 94 , and the organic compound in the liquid 3 is decomposed again thereafter.
- the liquid flows down slowly in the flow rate buffering material 93 by the control of the flow control valve 96 , the organic compound in the liquid 3 can be decomposed efficiently by emission of the UV light.
- FIG. 10 shows a schematic perspective view illustrating an embodiment of a flow rate buffering material.
- (a) shows the net-like flow rate buffering material 105
- (b) shows the asbestos-shape flow rate buffering material 106 .
- the liquid 3 flows down in the flow rate buffering material 93 , as shown in FIG. 11 , the liquid 3 passes the flow rate control valve 96 and the inlet tube 97 , is separated by a separated tube 111 and flows down in the wide flow rate buffering material 93 .
- the efficiency of decomposition of the organic compound is improved since a large amount of the liquid 3 can flow down in the flow rate buffering material 93 .
- the catalyst gas 86 may flow into the decomposition apparatus G to improve the efficiency of decomposition of the organic compound.
- the decomposed gas 4 and the catalyst gas 86 may be exhausted from the outlet 5 by absorption of the pump 103 .
- a contact material with the catalyst powder described above may be equipped to the flow rate buffering material 93 instead of the catalyst gas 86 .
- the material of the catalyst gas 86 and powder is the same as that described above.
- FIG. 12 shows a schematic view illustrating an eighth embodiment of a decomposition apparatus H for decomposing the gas 120 which is either the gas of the organic compound or the gas containing the organic compound.
- the organic compound in the gas 120 is decomposed by emission of UV light irradiated from the excimer lamp unit 121 , which has excimer lamp, during flowing up in the flow rate buffering material 126 which is equipped on the position in the neighborhood of the surface of the excimer lamp unit 121 in the container 122 .
- the gas 120 may flow up slowly in the flow rate buffering material 126 by the control of the flow rate control valve 125 or the adsorption pump 124 .
- the flow rate buffering material 126 is the same as that described above.
- the organic compound in the gas 120 can be decomposed by the control of the flow rate.
- the gas 120 flows with the same catalyst gas as that described above and passes in the flow rate buffering material with the same catalyst powder as that described above.
- FIG. 13 shows a schematic perspective view illustrating an embodiment of a part on the inlet side of gas 120 in the decomposition apparatus H shown in FIG. 12 .
- the upper part of the container 120 is equipped with a cylinder 131 of the gas 120 , an inlet tube 133 of the gas 120 , a flow rate control valve 132 of the gas 120 , a cylinder 134 of the catalyst gas 86 , an inlet tube 136 of the catalyst gas 86 , and a flow rate control valve 135 of the catalyst gas 86 .
- FIG. 14 shows a schematic longitudinal cross sectional view illustrating an embodiment of the flow rate buffering material 126 used in FIG. 12 .
- (a) is the hound's-tooth-shape flow rate buffering material 126 a which is provided with the hindrance plate 141 of hound's-tooth in the container 122
- (b) is the net-shape flow rate buffering material 126 b which is provided with the net-shape member 142 of wave-shape in the container 122 .
- the flow rate buffering material 126 used in FIG. 14 may be used in the same manner as that of the flow rate buffering material 105 , 106 as shown in FIG. 10 .
- FIG. 15 shows a schematic view illustrating a ninth embodiment of a decomposition apparatus I provided with the route 150 of the catalyst gas in the decomposition apparatus shown in FIG. 12 .
- the route 150 of the catalyst gas is equipped to the container in the neighborhood of the flow rate buffering material 126 so that the catalyst gas promotes the decomposition of the organic compound in the gas 86 on the contacting part 151 .
- the catalyst gas 120 and the gas 86 flows to the container through the different route. Therefore, in order to mix the gas 86 and the catalyst gas 120 in the container, it is preferable that a pressure of the catalyst gas 86 in the route 150 of the catalyst gas is slightly higher than that of the gas 3 in the route of the gas 3 .
- the catalyst gas 120 flows from holes of the contacting part 151 to the flow rate buffering material 126 .
- the decomposed gas 123 is exhausted through the adsorption pump 124 .
- the catalyst gas 120 except the catalyst gas flowed in the flow rate buffering material 126 , is exhausted through the outlet part 153 of the catalyst gas.
- the catalyst gas 120 exhausted through an outlet part 153 may be used again by the circulation.
- the flowing direction of the catalyst gas 120 may be opposed to the direction of flow of the gas 86 .
- the other numericals are the same as those in figures described above.
- the decomposition apparatus of the first mode of the present invention since the UV light irradiated from excimer lamp or excimer lamp unit is emitted to the liquid or the gas containing the organic compound, the organic compound in the liquid or the gas can be decomposed easily by the simple decomposition apparatus and method.
- the decomposition apparatus and method are effective to decompose the organic chloride compound polluting the air or water, to purify the environment.
- FIG. 16 shows a schematic longitudinal cross sectional view illustrating another embodiment of a decomposition apparatus J.
- the decomposition apparatus J comprises an excimer emission body 161 equipped with an inner electrode 35 , a metal container 162 equipped to the outside of the excimer emission body 161 for filling up at least one selected from a liquid of an organic compound and a liquid containing organic compound, and a power supply for applying a high frequency voltage between the inner electrode 35 and the metal container 162 .
- the UV light is irradiated from the excimer emission body 136 by the applying of the voltage of the suitable frequency between the inner electrode 35 and the metal container 162 so that UV light is emitted to the liquid 3 .
- the metal container 162 acts as the outer electrode shown in FIG. 3 so that the applying of voltage between the metal container 162 and the inner electrode 35 generates the high frequency discharge to irradiate the UV light.
- the UV light of wavelength of 222 nm or below is not generated the ozone in the liquid 3 or air, the UV light allows to generate the high reactive OH radical or O radical in the liquid 3 .
- the radical cuts some bond of the organic compound so that the organic compound in the liquid 3 is decomposed efficiently to the decomposed material of CO 2 , H 2 O and so.
- the excimer emission body 161 comprises the discharging vessel 31 made of the dielectric material with excellent permeability of UV light, the inner tube 32 equipped on the inside of the discharging vessel 31 , the inner electrode 35 equipped on the inside of the inner tube 32 and the filling gas 36 filled up in the discharging vessel 31 .
- the form of the excimer emission body 161 is not limited in particularly.
- the excimer emission body 161 is the same as that of the excimer lamp 1 of the decomposition apparatus of the first mode described above, except the displacement of the outer electrode 34 to the metal container 162 and to be not equipped with the protect tube 33 .
- the decomposition apparatus shown in FIG. 3 is provided with the outer electrode 34 to the outer side of the discharging vessel 31 in usual.
- the decomposition apparatus J shown in FIG. 16 is provided with the metal container 162 filled up the liquid on the outer side of the excimer emission body 161 .
- the metal container 162 acts as the outer electrode.
- the UV light is emitted to the liquid 3 efficiently because of without the outer electrode, and therefore, the decomposition apparatus can improve the efficiency of decomposition of the organic compound.
- the component part equipped to the excimer emission body 161 is described below.
- a nitrogen gas 164 may flow on the inside of the inner tube 32 of the excimer emission body 161 to cool.
- the kind of the nitrogen gas 164 is not limited particularly.
- the commercial nitrogen gas may be used.
- the inner tube 32 can be cooled sufficiently by flowing of the nitrogen gas 164 at a low temperature cooled by the heat exchanger (no illustrating in figures).
- the circulating cooling apparatus (no illustrating in figures) of the nitrogen gas is equipped to the decomposition apparatus J for supplying the nitrogen gas 164 .
- the inner tube 32 can be prevented from deterioration so that the lifetime of the excimer emission body 161 can be improved.
- the metal container 162 it is preferable to use the stainless steel or the like which has a high conductivity and high corrosion resistance to the liquid 3 containing the organic compound.
- the metal container 162 has the property of shielding (so-called: EMI shield property) on the high frequency electromagnetic wave irradiated from the excimer emission body 161 .
- the voltage between the metal container 162 and the inner electrode 35 is of any frequency to irradiate the suitable amount of emission of UV light. It is preferable to apply the high wavelength voltage from 1 to 20 MHz. The detailed explanation is described below. A position and a manner of attachment of the excimer generator 161 are not limited.
- the construction of the decomposition apparatus can be simple.
- the UV light is not hindered by the outer electrode, the liquid is emitted by the UV light sufficiently.
- the large amount of OH radical or O radical generates in the liquid, the bond of the organic compound is cut efficiently so that the organic compound is decomposed easily.
- FIG. 17 shows a schematic longitudinal cross sectional view illustrating an embodiment of an excimer lamp of the present invention.
- the excimer lamp 171 such as explained in FIG. 3 , comprises the discharging vessel 31 made of a dielectric material with excellent permeability of UV light, the inner tube 32 equipped on the inside of the discharging vessel 31 , the outer electrode 34 equipped on the outside of the discharging vessel 31 , the inner electrode 35 equipped on the inside of the inner tube 32 and the filling gas 36 filled up in the discharge vessel 31 .
- the UV light is preferably irradiated from the excimer lamp 171 by which a high frequency voltage is applied between the outer electrode and inner electrode 32 from 1 to 20 MHz.
- the UV light is emitted from the excimer lamp 171 to the liquid.
- a protect tube (no illustrating in figures) may be equipped on the outside of the discharging vessel 31 .
- the outer electrode 34 may be equipped to the position between the protect tube and the discharging electrode 34 .
- the discharging vessel and the protect tube may be made of dielectric material with permeability of the UV light. It is preferable to use a quartz or a synthetic quartz with a high permeability.
- the filling gas 36 is filled in the discharging vessel 31 for discharging the excimer lamp 171 .
- the wavelength of the UV light varies by the kind of the filling gas.
- As the filling gas 36 it is preferable to use the gas of He, Xe, Kr, Ar, ArF, ArCl, KrF, XeF, XeCl, XeBr, F 2 —Kr—He or the like.
- a pressure and a kind of gas in the discharging vessel 31 are determined by the suitable condition to obtain a required wavelength and a required amount of irradiation of UV light. It is preferable to fill the pressure of from 10 to 60 kPa. The other things are explained in FIG. 3 .
- the inner tube 32 also uses a quartz or a synthetic quartz with dielectric. It is preferable that the inner tube 32 is equipped to the center of the discharging vessel 131 so that the excimer lamp can be uniformly emitted the UV light on the around of the inner tube 32 . As shown in FIG. 16 , the nitrogen gas 164 flows in the inner tube 32 . Since the inner tube 32 is cooled by the nitrogen gas 164 , the deterioration of the inner tube 31 can be prevented and is the same as that of the discharging vessel 31 so that the lifetime of the excimer lamp can be improved.
- FIG. 18 shows a schematic cross sectional view illustrating an embodiment of the relationship between the inner tube and the inner electrode of the excimer lamp of the present invention.
- d/D ratio which the “d” is an inner diameter of the inner tube and the “D” is an outer diameter of the inner electrode 35 , is from 1.1 to 3.0 for flowing the nitrogen gas 164 in the inner tube 32 easily.
- the d/D ratio is below 1.1, the space between the inner tube 32 and the inner electrode is not enough so that the nitrogen gas 164 can not flow in the inner tube 32 and the inner tube 32 can not be enough cooled by the nitrogen gas 164 .
- the d/D ratio is above 3.0, the nitrogen gas 164 flows easily so that the inner tube 32 is cooled sufficiently.
- the outer diameter of the inner tube becomes thick and that of the excimer lamp becomes thick, too, or the excimer lamp can not be discharged uniformly since the outer diameter of the inner electrode 35 becomes thin. Therefore, the d/D ratio is limited from 1.1 to 3.0.
- the inner electrode 31 it is preferable to use stainless steel, aluminum, aluminum alloy, copper, copper oxide, alloy containing of copper, alloy containing copper oxide or the like.
- the inner electrode 35 does contact the filling gas 36 so that the high frequency discharge happens on all parts of the inner tube 32 .
- FIG. 19 and FIG. 20 show an schematic longitudinal cross sectional view illustrating an embodiment of an excimer lamp of the present invention, respectively.
- FIG. 21 to FIG. 23 show a schematic cross sectional view illustrating an embodiment of the relationship between the inner tube and the inner electrode of the excimer lamp of the present invention.
- both ends of the inner tube 192 are open, it is preferable to use the rod-shaped inner electrode 35 .
- the inner tube 192 can be cooled sufficiently because of flowing easily the nitrogen gas 164 from one end side to the other end side.
- one end of the inner tube 35 is closed, it is preferable to use the hollow pipe-shape inner electrode 211 (as shown in FIG. 21 ).
- the inner tube 32 can be cooled sufficiently since the nitrogen gas 164 flows from the inside of the electrode 211 to the outside of the electrode 211 .
- d/D ratio in which the “d” is a inner diameter of the inner tube 32 and the “D” is an outer diameter of the hollow pipe-shape inner electrode 211 , is in the range of that described above.
- the rod-shape inner electrode When one end of the inner tube 32 is closed, the rod-shape inner electrode may be used. As shown in FIG. 22 , the insertion tube 221 may be inserted to the suitable position along the inner electrode 35 so that the nitrogen gas 164 can flow in the inner tube 32 easily. Furthermore, as shown in FIG. 23 , the inner electrode 231 of the flat-shape may be used for separating the inlet-side and the outlet-side of the nitrogen gas 164 so that the nitrogen gas 164 can flow in the inner tube 32 easily.
- L/D ratio in which the “L” is a length of the inner electrode 35 , 211 , 221 and the “D” is an outer diameter of the inner electrode, is of from 10 to below 30.
- the length L of the inner electrode is in proportion to that of the excimer lamp 1 , 161 , 171 , 191 , 201 , and the length of the inner electrode is determined by that of the excimer lamp.
- the inner tube When the L/D is below 10, the inner tube is cooled sufficiently by the nitrogen gas flowed in the inner tube since the outer diameter of the inner electrode and the excimer lamp becomes thick. Consequently, the efficiency of emission of the UV light is not improved since the surface area of the excimer lamp decreases.
- the L/D is 30 or above, the inner tube becomes longer, and the nitrogen gas cannot flow sufficiently in the inner tube so that the inner tube is not cooled sufficiently. Therefore, the L/D is limited from 10 to 30 below.
- the outer electrode 34 it is preferable to use a material made of stainless steel, aluminum or the like. Any electrode of punching metal shape, mesh shape or net shape may be equipped around of the discharging vessel 31 .
- the electrode of rod shape or oblong shape may be equipped lengthwise of the discharging vessel 31 .
- the shield property of the excimer lamp is improved on an electromagnetic wave of high frequency (so-called: EMI shield).
- EMI shield electromagnetic wave of high frequency
- the electrode of the rod shape or the oblong shape the UV light is emitted from the surface of the excimer lamp sufficiently since a large amount of the UV light can irradiate from the excimer lamp.
- a protect tube may be provided on the outer side of the outer electrode 34 , if necessary, and a nitrogen gas may introduced into the space between the protect tube and the discharging vessel 31 .
- the frequency of voltage applied to the excimer lamp is of from 1 to 20 MHz, particularly of from 5 to 16 MHz, furthermore preferably of from 11 to 15 MHz.
- the high frequency voltage outputted from the power supply 163 is of from 0.1 to 10 V, particularly of from 0.1 to 5 V.
- the voltage When the voltage is below 0.1 V, the large amount of the UV light can not irradiate since the high frequency discharge can not happen between the outer electrode 34 and the inner electrode 35 sufficiently.
- the voltage When the voltage is above 10V, the amount of the UV light saturates so that the irradiation efficiency of the UV light does not increase and the excimer lamp does not save electricity.
- the excimer lamp of the present invention since the inner tube is cooled by flowing the nitrogen gas, the deterioration of the inner tube can be prevented and is the same as that of the discharging vessel so that the lifetime of the excimer lamp can be improved.
- the excimer lamp which can irradiate the UV light of wave length of 222 nm or below, can prevent the deterioration of the inner tube.
- the nitrogen gas used can be treated safely and the construction of the excimer lamp can be simple.
- FIG. 24 shows a schematic longitudinal cross sectional view illustrating an embodiment of the excimer lamp of the present invention.
- the excimer lamp 241 is equipped with the U-shape inner tube 242 on the inner side of the discharging vessel 31 .
- FIG. 25 shows a schematic cross sectional view illustrating an embodiment of the excimer lamp as shown in FIG. 24 .
- FIG. 26 shows a schematic cross sectional view illustrating an embodiment of the U-shape inner tube 242 used for the excimer lamp of the present invention.
- At least one U-shape inner tube 242 is equipped on the inside of the discharging vessel 31 .
- the inner tube 242 is usually made of the quartz, the synthetic quartz or the like, having dielectric property. Since the inner electrode 243 is equipped on the inside of the inner tube 242 , the discharging vessel 31 with the inner tube 242 is almost the same as that of a discharging vessel with two inner electrodes so that the opportunity of high frequency discharge in the excimer lamp increases. The increase of the opportunity of high frequency discharge can extremely improve the irradiation efficiency of the UV light.
- the inner electrode 243 As the inner electrode 243 as shown in FIG. 26 ( a ), it is preferable to use the liquid metal 244 , especially mercury.
- the liquid metal 244 can flow in the U-shape inner tube 242 easily so that the U-shape inner electrode and the excimer lamp become thin.
- the inner electrode 243 may be the electrode 245 of the net-shape.
- the electrode 245 of net-shape metal 245 it is preferable to use that made of the copper wire.
- FIG. 27 shows a schematic longitudinal cross sectional view illustrating an embodiment of an excimer lamp 271 of the present invention.
- FIG. 28 shows a schematic cross sectional view illustrating an embodiment of an excimer lamp 271 in FIG. 27 .
- the excimer lamp 271 is equipped with the two U-shape inner tubes 242 to the inside of the discharging vessel 31 so that the opportunity of the high frequency discharge between the outer electrode and the inner tube 242 increases. Consequently, the irradiation efficiency of the UV light can be improved.
- FIG. 29 shows a schematic view illustrating an embodiment of an excimer emission apparatus 291 of the present invention.
- the excimer emission apparatus 291 comprises the excimer lamp of the present invention described above (for example, the numerical number is 201 ), a high frequency power supply 163 for applying the voltage from 1 to 20 MHz between the outer electrode 35 and the inner electrode 35 , a circulating cooling apparatus 292 for flowing the nitrogen gas in the inner tube 32 .
- the detail explanation of the excimer lamp is described above.
- the nitrogen gas circulates in the inner tube 32 to cool it. Since the deterioration of the inner tube cooled by UV light and the heat becomes slowly, the degree of deterioration of the inner tube can be the same as that of the discharging vessel 31 . Consequently, the lifetime of the excimer lamp can be improved.
- the high frequency power supply 163 can apply the voltage of the high frequency from 1 to 20 MHz between the outer electrode 34 and the inner electrode 35 of the excimer lamp 20 .
- the construction of the excimer lamp is not limited that of shown in FIG. 29 .
- the high frequency power supply 163 is provided at a power supply apparatus 293 as a main element.
- the high frequency power supply 163 may comprises the other component, for example, a matching controller 294 , variable capacitors C 1 , C 2 or the like.
- the power supply apparatus 293 as shown in FIG. 29 comprises the high frequency power supply 163 , the matching controller 294 , inductances L 1 , L 2 and the variable capacitors C 1 , C 2 , as fundamental element.
- the alternating power supply 295 applies an electrical power of approximately 100V to the power supply apparatus 293 .
- the high frequency power supply 163 converts the electrical power to that of the predetermined frequency from 1 to 20 MHz.
- the frequency converted is output from the high frequency power supply 163 . It is preferable that the voltage of the high frequency described above is of from 0.1 to 10 V, particularly of from 0.1 to 5V.
- the control of the variable capacitor C 1 by the matching controller 294 matches the impedance Z 1 outputted from the high frequency power supply 163 with the impedance Z 2 inputted on the excimer lamp 201 . Consequently, In the circuit in the power supply apparatus 293 shown in FIG. 29 , the excimer lamp 201 irradiates the UV light at a high efficiency.
- the excimer lamp 201 In the excimer emission apparatus of the present invention, the excimer lamp 201 generates the high frequency discharge by applying the electrical power from 25 to 30 W with the high frequency of 13.56 MHz, to irradiate 10 mW/cm 2 of the UV light from the excimer lamp 201 .
- the excimer lamp In a prior excimer emission apparatus, the excimer lamp generates the dielectric barrier discharge by applying the electrical power of 50W with the voltage from 1 to 10 kV of any frequency from 40 to 300 kHz, to irradiate 10 mW/cm 2 of the UV light from the prior excimer lamp. Therefore, the excimer emission apparatus of the present invention converts the input energy to the UV light efficiently so that the generation of heat of the excimer lamp decreases.
- the lifetime of the prior excimer lamp consequently, is shorter than that of the excimer lamp of the present invention since the prior excimer lamp generates more the deterioration due to generation of heat than that of present invention
Abstract
A decomposition apparatus is provided that includes an excimer lamp emitting UV light for decomposing an organic compound and a decomposition container provided with the excimer lamp for decomposing the organic compound in a liquid or a gas. In the decomposition apparatus, since the UV light irradiated from the excimer lamp is emitted to the liquid or the gas, the organic compound in the liquid or the gas can be decomposed easily by the simple decomposition apparatus and method. The decomposition apparatus and method are effective to decompose the organic compound, such as dioxin (polychlorinated dibenzo-para-dioxin), PCB (polychiorinated biphenyl), trichloroethylene or the like, polluting the air or water to purify the environment.
Description
- The present invention relates to a decomposition apparatus of an organic compound by emission of an ultraviolet (UV) light which is irradiated from an excimer lamp, a decomposition method thereof and an excimer lamp and an excimer emission apparatus which may suitable be used for the decomposition apparatus and the decomposition method.
- An organic compound causing air pollution or water pollution can be decomposed or eliminated by an activated carbon adsorption treatment, an oxidation decomposition treatment, an activated sludge treatment, a bio-oxidation treatment or the like. Among the treatments described above, the activated carbon adsorption treatment may suitable be used for the elimination of the organic compound causing water pollution.
- As the problem of the activated carbon adsorption treatment, a high-priced activated carbon is generally used and therefore the activated carbon makes it necessary to recycle; a handling of the activated carbon is not easy since the activated carbon is of powdery; an apparatus of the activated carbon adsorption treatment is of comparatively large scale; a recycling treatment of the activated carbon and maintenance of the apparatus need much labors and costs.
- Recently, we are in dilemma how to solve the problem described above. Therefore, a method and an apparatus for decomposing easily the organic compound causing air pollution or water pollution at a low cost is requested.
- The present invention was made in view of the above-mentioned circumstances. An object of the present invention is therefore to provide a decomposition apparatus by emission of a UV light which is irradiated from an excimer lamp, a decomposition method thereof and an excimer lamp and an excimer emission apparatus which may suitable be used for a decomposition apparatus and a decomposition method of an organic compound.
- For the purpose of attainment of the above-mentioned object of the present invention, a decomposition apparatus for decomposing an organic compound fluid such as a gas of an organic compound, a liquid thereof, a gas containing an organic compound and a liquid containing an organic compound is decomposed. The decomposition apparatus comprises an excimer lamp emitting UV light for decomposing the organic compound, a decomposition container provided with an excimer lamp for decomposing the organic compound in the organic compound fluid. In the decomposition apparatus of the present invention, two or more decomposition container each having the excimer lamp may be jointed for flowing the fluid in the container to other container in order, and the organic compound in the fluid can be effectively decomposed. In case of the above-mentioned apparatus, it is preferable that the container is provided with a flow rate buffering material for slowing down a flow rate of the fluid. It is preferable that a contact part between the fluid and a catalyst gas for promoting decomposition of the organic compound is equipped to the decomposition container. The excimer lamp, which may suitable be used for the decomposition apparatus, comprises a discharging vessel made of a dielectric material with excellent permeability of a UV light, an inner tube equipped on the inside of the discharging vessel, a protect tube equipped on the outside of the discharging vessel, an outer electrode equipped in the position between the protect tube and the discharging vessel, an inner electrode equipped on the inside of the inner tube, a filling gas filled up in the discharging vessel and a power supply for applying a voltage between the outer electrode and the inner electrode.
- A decomposition apparatus for decomposing an organic compound in second mode of the present invention comprises an excimer emission body equipped with an inner electrode, a metal container equipped to the outside of the excimer emission body for filling up at least one selected from a liquid of an organic compound and a liquid containing organic compound, and a power supply for applying a high frequency voltage between the inner electrode and the metal container, and a UV light irradiated from the excimer emission body to the liquid in the metal container allows to generate OH radical and O radical into the liquid, and the radical cuts some bond of the organic compound so that the organic compound in the liquid is decomposed easily. It is preferable that the excimer emission body comprises a discharging vessel made of a dielectric material with excellent permeability of a UV light, an inner tube equipped on the inside of the discharging vessel, an inner electrode equipped on the inside of the inner tube and a filling gas filled up in the discharging vessel. It is preferable that the power supply applies a high frequency voltage from 1 to 20 MHz to the metal container and the inner electrode.
- The organic compound used may be selected from flon, dioxin (polychlorinated dibenzo-para-dioxin), PCB (polychlorinated biphenyl), trichloroethylene, tetrachloroethylene, dichloromethane, tetrachloromethane, 1,2-dichloroethane, 1,1-dichloroethane, cis-1,2-dichloroethane, 1,1,1-trichloroethane, 1,3-dichloropropene and the mixture thereof. It is preferable that the UV light of wavelength of 222 nm or below may suitable be used.
- A decomposition method for decomposing an organic compound of the present invention may be used in the decomposition apparatus described above, and comprises steps of flowing a fluid which is selected from a gas of an organic compound, a liquid thereof, a gas containing an organic compound and a liquid containing an organic compound during the emission of a UV light which is irradiated from the excimer lamp, and decomposing the organic compound in fluid during its flowing. In this case, it is preferable that the fluid flows slowly in a flow rate buffering material during the emission of UV light. And, it is preferable that the fluid contacts a catalyst for promoting the decomposition of an organic compound during the emission of UV light. The organic compound used may be selected from flon, dioxin (polychlorinated dibenzo-para-dioxin), PCB (polychlorinated biphenyl), trichloroethylene, tetrachloroethylene, dichloromethane, tetrachloromethane, 1,2-dichloroethane, 1,1-dichloroethane, cis-1,2-dichloroethane, 1,1,1-trichloroethane, 1,3-dichloropropene and the mixture thereof. It is preferable that the UV light of wave length of 222 nm or below may suitable be used.
- An excimer lamp, which may suitable be used for the decomposition apparatus and the decomposition method described above, comprises a discharging vessel made of a dielectric material with excellent permeability of UV light, an inner tube equipped on the inside of the discharging vessel, an outer electrode equipped on the outside of the discharging vessel, an inner electrode equipped on the inside of the inner tube and a filling gas filled up in the discharging vessel, and a UV light is preferably irradiated from the excimer lamp by which a high frequency voltage is applied between the outer electrode and the inner electrode from 1 to 20 MHz. In this case, it is preferable that the inner tube is cooled by a nitrogen gas flowed in the inner tube. It is preferable that d/D ratio, in which the “d” is an inner diameter of the inner tube and the “D” is an outer diameter of the inner electrode, is of from 1.1 to 3.0, and that L/D ratio, in which the “L” is a length of the inner electrode and the “D” is an outer diameter of the inner electrode, is of from 10 to below 30.
- An U-shaped inner tube of at least one or above, as the inner tube, may be equipped on the inside of the discharging vessel.
- An excimer emission apparatus comprises the excimer lamp described above, a power supply for applying a high frequency voltage from 1 to 20 MHz between the outer electrode and the inner electrode and a circulating cooling apparatus by the nitrogen gas to cool the inner tube. In this case, it is preferable that d/D ratio, in which the “d” is an inner diameter of the inner tube and the “D” is an outer diameter of the inner electrode, is of from 1.1 to 3.0, and that L/D ratio, in which the “L” is a length of the inner electrode and the “D” is an outer diameter of the inner electrode, is of from 10 to below 30.
-
FIG. 1 shows a schematic view illustrating a first embodiment of a decomposition apparatus (A) of the present invention. -
FIG. 2 shows a schematic view illustrating a second embodiment of a decomposition apparatus (B) of the present invention. -
FIG. 3 shows a schematic longitudinal cross sectional view illustrating an embodiment of an excimer lamp used for the decomposition apparatus of the present invention. -
FIG. 4 shows a schematic view illustrating a third embodiment of a decomposition apparatus (C) of the present invention. -
FIG. 5 shows a schematic view illustrating a fourth embodiment of a decomposition apparatus (D) of the present invention attached the excimer lamp. -
FIG. 6 shows a schematic perspective view illustrating an embodiment of an excimer lamp used for the decomposition apparatus (C) inFIG. 4 . -
FIG. 7 shows a schematic view illustrating a fifth embodiment of a decomposition apparatus (E) of the present invention. -
FIG. 8 shows a schematic view illustrating a sixth embodiment of a decomposition apparatus (F) of the present invention in. -
FIG. 9 shows a schematic view illustrating a seventh embodiment of a decomposition apparatus (G) of the present invention. -
FIG. 10 shows a schematic perspective view illustrating an embodiment of a flow rate buffering material. -
FIG. 11 shows a schematic view illustrating an embodiment of a manner of flowing of the liquid to the flow rate buffering material. -
FIG. 12 shows a schematic view illustrating an eighth embodiment of a decomposition apparatus (H) of the present invention. -
FIG. 13 shows a schematic perspective view illustrating an embodiment of a part of the inlet side of gas in the decomposition apparatus (H) shown inFIG. 12 . -
FIG. 14 shows a schematic longitudinal cross sectional view illustrating an embodiment of the flow rate buffering material for the gas inFIG. 12 . -
FIG. 15 shows a schematic view illustrating a ninth embodiment of an decomposition apparatus (I) of the present invention. -
FIG. 16 shows a schematic longitudinal cross sectional view illustrating a tenth embodiment of a decomposition apparatus (J) of the present invention. -
FIG. 17 shows a schematic longitudinal cross sectional view illustrating an embodiment of a excimer lamp of the present invention. -
FIG. 18 shows a schematic cross sectional view illustrating an embodiment of the relationship between the inner tube and the inner electrode of the excimer lamp of the present invention. -
FIG. 19 shows an schematic longitudinal cross sectional view illustrating an embodiment of an excimer lamp of the present invention. -
FIG. 20 shows an schematic longitudinal cross sectional view illustrating an embodiment of an excimer lamp of the present invention. -
FIG. 21 shows a schematic cross sectional view illustrating an embodiment of the relationship between the inner tube and the inner electrode of the excimer lamp of the present invention. -
FIG. 22 shows a schematic cross sectional view illustrating an embodiment of the relationship between the inner tube and the inner electrode of the excimer lamp of the present invention. -
FIG. 23 shows a schematic cross sectional view illustrating an embodiment of the relationship between the inner tube and the inner electrode of the excimer lamp of the present invention. -
FIG. 24 shows a schematic longitudinal cross sectional view illustrating an embodiment of the excimer lamp of the present invention. -
FIG. 25 shows a schematic cross sectional view in perpendicular direction to lengthwise direction illustrating an embodiment of the excimer lamp as shown inFIG. 24 . -
FIG. 26 shows a schematic cross sectional view illustrating an embodiment of the U-shape inner tube used for the excimer lamp of the present invention. -
FIG. 27 shows a schematic longitudinal cross sectional view illustrating an embodiment of an excimer lamp of the present invention. -
FIG. 28 shows a schematic cross sectional view illustrating an embodiment of an excimer lamp inFIG. 27 . -
FIG. 29 shows a schematic view illustrating an embodiment of an excimer generating apparatus of the present invention. - The present invention will now be explained with reference to figures.
- A decomposition apparatus for decomposing an organic compound in first mode of the present invention will be explained.
FIG. 1 shows a schematic view illustrating a first embodiment of a decomposition apparatus of the present invention. InFIG. 1 , the decomposition apparatus A comprises anexcimer lamp 1 and adecomposition container 2. Theexcimer lamp 1 is equipped to thedecomposition container 2 to immerse in aliquid 3 of at least one selected from a liquid of an organic compound and a liquid containing an organic compound. The organic compound inliquid 3 is decomposed by emission of UV light irradiated from theexcimer lamp 1. - The organic compound may suitable be selected from flon, dioxin (polychlorinated dibenzo-para-dioxin), PCB (polychlorinated biphenyl), trichloroethylene, tetrachloroethylene, dichloromethane, tetrachloromethane, 1,2-dichloroethane, 1,1-dichloroethane, cis-1,2-dichloroethane, 1,1,1-trichloroethane, 1,3-dichloropropene and the mixture thereof. All of the organic compound described above pollutes air or water and has a strong bond between carbon and chlorine. However, the organic compound in the
liquid 3 can be decomposed easily by emission of the UV light irradiated from theexcimer lamp 1 according to the present invention. The decomposition apparatus can decompose an organic halogen compound containing halogens element such as fluorine element or bromine element besides the organic compound described above. - The form of the
container 2 is not limited to that of thecontainer 2 inFIG. 1 . It is preferable to use thecontainer 2 in which the material thereof is unreactive to theliquid 3 and the UV light irradiated from theexcimer lamp 1 for example stainless steel or the like. Thecontainer 2 may be provided with anattachment hole 10 of theexcimer lamp 1, anexhaust hole 5 of a decomposedgas 4 and an exhaust tube with carbon filter to exhaust gas. Thecontainer 2 may be provided with a mixer which is a stirrer with astirrer chip 9 or a propeller mixer, to decompose efficiently. -
FIG. 2 shows a schematic view illustrating a second embodiment of a decomposition apparatus (B) of the present invention. In the decomposition apparatus B as shown inFIG. 2 , two ormore containers 2 each having theexcimer lamp 1 may be joints for flowing the fluid in one container to the other container in order. In the decomposition apparatus B, theliquid 3 is emitted by light irradiated from theexcimer lamp 1 during flowing in thecontainer 2 so that the organic compound in theliquid 3 is decomposed continuously and efficiently. According to the decomposition apparatus (B), the efficiency of decomposition and the quantity of decomposition treatment of the organic compound can be improved. -
FIG. 3 shows a schematic longitudinal cross sectional view illustrating an embodiment of an excimer lamp used for the decomposition apparatus of the present invention. As shown inFIG. 1 andFIG. 2 , theexcimer lamp 1 is equipped to thecontainer 2 to immerse in theliquid 3. Theexcimer lamp 1 comprises a discharging vessel made of a dielectric material with excellent permeability of UV light, an inner tube equipped on the inside of the discharging vessel, an outer electrode equipped on the outside of the discharging vessel, an inner electrode equipped on the inside of the inner tube and a filling gas filled up in the discharging vessel, and a UV light is preferably irradiated from theexcimer lamp 1 by which a high frequency voltage is applied between the outer electrode and the inner electrode from 1 to 20 MHz. A power supply (no illustrating in figures) for applying a voltage of the high frequency between theouter electrode 34 and theinner electrode 35 of theexcimer lamp 1, is equipped to the decomposition apparatus. The irradiated UV light is emitted in all directions from a surface of theexcimer lamp 1 by the applying voltage. The detail of constitution of theexcimer lamp 1 will be explained afterwards. Theexcimer lamp 1 may be provided with a supportingmember 38 comprising aattachment member 37 for fitting theexcimer lamp 1 to thecontainer 2. Theexcimer lamp 1 may be attached anywhere and may be possible to desorb. - The
excimer lamp 1 can irradiate the UV light of the different wavelength such as 172 nm, 222 nm and 308 nm based on a kind of the filling gas. To the decomposition of the organic compound, it is preferable to emit the UV light of wavelength of 222 nm or below, for example 172 nm and 222 nm, to the organic compound. By the emission of UV light of wavelength of 222 nm or below, many exited oxygen atom is generated directly from oxygen in the liquid or air and have a strong oxidation force. Furthermore, since the UV light has the strong photon energy, a bond such as C—C, C—O, C—H and C—Cl of the organic compound is cut easily, the organic compound is decomposed by which the exited oxygen atoms attacks the position of the bond so that a decomposed material such as CO2, H2O or the like is generated. InFIG. 1 , the decomposed material is released from theliquid 3 as thedecomposition gas 4 and is exhausted through theexhaust tube 5 of thecontainer 2. -
FIG. 4 andFIG. 5 show a schematic view illustrating third and fourth embodiments of a decomposition apparatus C, D equipped with theexcimer lamp unit container FIG. 4 andFIG. 5 , theexcimer lamp unit containers -
FIG. 6 shows a schematic perspective view illustrating an embodiment of anexcimer lamp unit 41 used for the decomposition apparatus C inFIG. 4 . Theexcimer lamp unit 41 has theexcimer lamp 1 in aprotect box 61 with oneopen window 62 and can be attached to theposition 43 of thecontainer 42 by anattachment member 63. According to the decomposition apparatus, the organic compound in theliquid 3 is decomposed by emission of the UV light irradiated from theexcimer lamp 1. - As shown in the decomposition apparatus D of
FIG. 5 , at least one ring-shapeexcimer lamp unit 51 is equipped to thecylinderic container 52. -
FIG. 7 shows a schematic view illustrating a fifth embodiment of a decomposition apparatus E to decompose the organic compound ingas 72, which is evaporated by heat of theliquid 3, by emission of the UV light irradiated from theexcimer lamp unit 71 which has excimer lamp. The kind of theheat apparatus 72, the position of the attachment thereof and the heating manner of the heat apparatus are not particularly limited. It is preferable that theexcimer lamp 71 is equipped on the top plate of thecontainer 72 to emit thegas 74 which may be either the gas of organic compound or the gas containing the organic compound. -
FIG. 8 shows a schematic view illustrating a sixth embodiment of a decomposition apparatus F in which a route of a catalyst gas for promoting the decomposition of the organic compound is equipped to thecontainer 82. The amount of flowing of thecatalyst gas 86 is controlled by theflow control valve 89 equipped to the exit of thecatalyst gas cylinder 80. Thegas 74 evaporated from liquid comprising the organic compound, andcatalyst gas 86 is contacted at acontact part 88 of theroute 84 of the catalyst gas. Thecontact part 88 can be equipped with a contact material such as a net-shape material. When a pressure of thecatalyst gas 86 in theroute 84 is slightly higher than that of thegas 74 in the container 58, thecatalyst gas 86 and thegas 74 can be contacted at just outside of theroute 84 of the catalyst gas. Thecatalyst gas 86 may be circulated as shown inFIG. 8 . A contact material with a catalyst powder may be equipped to thecontact part 88 instead of thecatalyst gas 86. Consequently, under the condition described above, thegas 74 is easily decomposed by emission of the UV light irradiated from theexcimer lamp unit 71. The decomposedgas 85 is exhausted from theexhaust part 5 with thecarbon filter 8. According to the decomposition apparatus, the efficiency of decomposition of the organic compound can be improved. - As the
catalyst gas 86 or powder, it is preferable to use that of titanium oxide, magnesium oxide or the like, and the titanium in the titanium oxide or the magnesium in the magnesium oxide attacks the bonded part of C—Cl in particular so that the bonded part of that is cut easily. -
FIG. 9 shows a schematic view illustrating a seventh embodiment of a decomposition apparatus G. As the decomposition apparatus G, the organic compound is decomposed by emission of the UV light during theliquid 3 of the organic compound flows down in the flowrate buffering material 93 which is equipped on the position in the neighborhood of the surface ofexcimer lamp unit 91 which has excimer lamp, in the container. The amount of flowing of theliquid 3 is controlled by theflow control valve 96 equipped to the flowingtube 95. The liquid 3 flows down slowly through the flowrate buffering material 93 from theinlet 97 to thecontainer 92. The organic compound in theliquid 3 is decomposed by emission of the UV light irradiated from theexcimer lamp unit 91. When the organic compound can not be decomposed sufficiently, a treated liquid 101 is restored to the standingcontainer 99, and is pumped by thecirculation pump 104 equipped to thecirculation tube 102 to restore in thecontainer 94, and the organic compound in theliquid 3 is decomposed again thereafter. When the liquid flows down slowly in the flowrate buffering material 93 by the control of theflow control valve 96, the organic compound in theliquid 3 can be decomposed efficiently by emission of the UV light. - As the flow
rate buffering material 93, it is preferable that the unreactive material on the UV light and theliquid 3, for example quartz, glass fiber, stainless steel or the like, is used and is worked in a net-shape, an asbestos-shape or a bundle-shape.FIG. 10 shows a schematic perspective view illustrating an embodiment of a flow rate buffering material. InFIG. 10 , (a) shows the net-like flowrate buffering material 105, (b) shows the asbestos-shape flowrate buffering material 106. - When the liquid 3 flows down in the flow
rate buffering material 93, as shown inFIG. 11 , the liquid 3 passes the flowrate control valve 96 and theinlet tube 97, is separated by a separatedtube 111 and flows down in the wide flowrate buffering material 93. By the flow rate buffering material described above, the efficiency of decomposition of the organic compound is improved since a large amount of the liquid 3 can flow down in the flowrate buffering material 93. - In
FIG. 9 , thecatalyst gas 86 may flow into the decomposition apparatus G to improve the efficiency of decomposition of the organic compound. Thecatalyst gas 86 described above, which promotes the decomposition of the organic compound in theliquid 3, and theliquid 3 is contacted at the flowrate buffering material 93. The decomposedgas 4 and thecatalyst gas 86 may be exhausted from theoutlet 5 by absorption of thepump 103. A contact material with the catalyst powder described above may be equipped to the flowrate buffering material 93 instead of thecatalyst gas 86. The material of thecatalyst gas 86 and powder is the same as that described above. -
FIG. 12 shows a schematic view illustrating an eighth embodiment of a decomposition apparatus H for decomposing thegas 120 which is either the gas of the organic compound or the gas containing the organic compound. The organic compound in thegas 120 is decomposed by emission of UV light irradiated from theexcimer lamp unit 121, which has excimer lamp, during flowing up in the flowrate buffering material 126 which is equipped on the position in the neighborhood of the surface of theexcimer lamp unit 121 in thecontainer 122. - For improving the efficiency of decomposition of the organic compound, the
gas 120 may flow up slowly in the flowrate buffering material 126 by the control of the flowrate control valve 125 or theadsorption pump 124. The flowrate buffering material 126 is the same as that described above. When the decomposition apparatus is not equipped with the flowrate buffering material 126, the organic compound in thegas 120 can be decomposed by the control of the flow rate. - In order to improve the efficiency of decomposition of the organic compound in the gas, it is preferable that the
gas 120 flows with the same catalyst gas as that described above and passes in the flow rate buffering material with the same catalyst powder as that described above. -
FIG. 13 shows a schematic perspective view illustrating an embodiment of a part on the inlet side ofgas 120 in the decomposition apparatus H shown inFIG. 12 . The upper part of thecontainer 120 is equipped with acylinder 131 of thegas 120, aninlet tube 133 of thegas 120, a flow rate control valve 132 of thegas 120, acylinder 134 of thecatalyst gas 86, aninlet tube 136 of thecatalyst gas 86, and a flowrate control valve 135 of thecatalyst gas 86. -
FIG. 14 shows a schematic longitudinal cross sectional view illustrating an embodiment of the flowrate buffering material 126 used inFIG. 12 . InFIG. 14 , (a) is the hound's-tooth-shape flowrate buffering material 126 a which is provided with thehindrance plate 141 of hound's-tooth in thecontainer 122, (b) is the net-shape flowrate buffering material 126 b which is provided with the net-shape member 142 of wave-shape in thecontainer 122. The flowrate buffering material 126 used inFIG. 14 may be used in the same manner as that of the flowrate buffering material FIG. 10 . -
FIG. 15 shows a schematic view illustrating a ninth embodiment of a decomposition apparatus I provided with the route 150 of the catalyst gas in the decomposition apparatus shown inFIG. 12 . The route 150 of the catalyst gas is equipped to the container in the neighborhood of the flowrate buffering material 126 so that the catalyst gas promotes the decomposition of the organic compound in thegas 86 on the contactingpart 151. In the decomposition apparatus I, thecatalyst gas 120 and thegas 86 flows to the container through the different route. Therefore, in order to mix thegas 86 and thecatalyst gas 120 in the container, it is preferable that a pressure of thecatalyst gas 86 in the route 150 of the catalyst gas is slightly higher than that of thegas 3 in the route of thegas 3. Thecatalyst gas 120 flows from holes of the contactingpart 151 to the flowrate buffering material 126. The decomposedgas 123 is exhausted through theadsorption pump 124. Thecatalyst gas 120, except the catalyst gas flowed in the flowrate buffering material 126, is exhausted through theoutlet part 153 of the catalyst gas. Thecatalyst gas 120 exhausted through anoutlet part 153 may be used again by the circulation. The flowing direction of thecatalyst gas 120 may be opposed to the direction of flow of thegas 86. The other numericals are the same as those in figures described above. - According to the decomposition apparatus of the first mode of the present invention described above, since the UV light irradiated from excimer lamp or excimer lamp unit is emitted to the liquid or the gas containing the organic compound, the organic compound in the liquid or the gas can be decomposed easily by the simple decomposition apparatus and method. The decomposition apparatus and method are effective to decompose the organic chloride compound polluting the air or water, to purify the environment.
- Next, a decomposition apparatus for decomposing the organic compound in the second mode of the present invention will be explained below.
FIG. 16 shows a schematic longitudinal cross sectional view illustrating another embodiment of a decomposition apparatus J. InFIG. 16 , the decomposition apparatus J comprises anexcimer emission body 161 equipped with aninner electrode 35, ametal container 162 equipped to the outside of theexcimer emission body 161 for filling up at least one selected from a liquid of an organic compound and a liquid containing organic compound, and a power supply for applying a high frequency voltage between theinner electrode 35 and themetal container 162. - The UV light is irradiated from the
excimer emission body 136 by the applying of the voltage of the suitable frequency between theinner electrode 35 and themetal container 162 so that UV light is emitted to theliquid 3. Themetal container 162 acts as the outer electrode shown inFIG. 3 so that the applying of voltage between themetal container 162 and theinner electrode 35 generates the high frequency discharge to irradiate the UV light. Although the UV light of wavelength of 222 nm or below is not generated the ozone in theliquid 3 or air, the UV light allows to generate the high reactive OH radical or O radical in theliquid 3. The radical cuts some bond of the organic compound so that the organic compound in theliquid 3 is decomposed efficiently to the decomposed material of CO2, H2O and so. - The
excimer emission body 161 comprises the dischargingvessel 31 made of the dielectric material with excellent permeability of UV light, theinner tube 32 equipped on the inside of the dischargingvessel 31, theinner electrode 35 equipped on the inside of theinner tube 32 and the fillinggas 36 filled up in the dischargingvessel 31. The form of theexcimer emission body 161 is not limited in particularly. Theexcimer emission body 161 is the same as that of theexcimer lamp 1 of the decomposition apparatus of the first mode described above, except the displacement of theouter electrode 34 to themetal container 162 and to be not equipped with theprotect tube 33. The decomposition apparatus shown inFIG. 3 is provided with theouter electrode 34 to the outer side of the dischargingvessel 31 in usual. However, the decomposition apparatus J shown inFIG. 16 is provided with themetal container 162 filled up the liquid on the outer side of theexcimer emission body 161. Themetal container 162 acts as the outer electrode. The UV light is emitted to theliquid 3 efficiently because of without the outer electrode, and therefore, the decomposition apparatus can improve the efficiency of decomposition of the organic compound. The component part equipped to theexcimer emission body 161 is described below. - A
nitrogen gas 164 may flow on the inside of theinner tube 32 of theexcimer emission body 161 to cool. The kind of thenitrogen gas 164 is not limited particularly. The commercial nitrogen gas may be used. Theinner tube 32 can be cooled sufficiently by flowing of thenitrogen gas 164 at a low temperature cooled by the heat exchanger (no illustrating in figures). The circulating cooling apparatus (no illustrating in figures) of the nitrogen gas is equipped to the decomposition apparatus J for supplying thenitrogen gas 164. Theinner tube 32 can be prevented from deterioration so that the lifetime of theexcimer emission body 161 can be improved. - As the
metal container 162, it is preferable to use the stainless steel or the like which has a high conductivity and high corrosion resistance to theliquid 3 containing the organic compound. Themetal container 162 has the property of shielding (so-called: EMI shield property) on the high frequency electromagnetic wave irradiated from theexcimer emission body 161. - The voltage between the
metal container 162 and theinner electrode 35 is of any frequency to irradiate the suitable amount of emission of UV light. It is preferable to apply the high wavelength voltage from 1 to 20 MHz. The detailed explanation is described below. A position and a manner of attachment of theexcimer generator 161 are not limited. - According to the decomposition apparatus described above, as the
metal container 162 acts as the outer electrode and the container for filling theliquid 3, the construction of the decomposition apparatus can be simple. As the UV light is not hindered by the outer electrode, the liquid is emitted by the UV light sufficiently. As the large amount of OH radical or O radical generates in the liquid, the bond of the organic compound is cut efficiently so that the organic compound is decomposed easily. - Next, an excimer lamp and an excimer emission apparatus used for the decomposition apparatus or the decomposition method of the organic compound described above will be explained by the reference in figures.
- An excimer lamp will be explained below.
FIG. 17 shows a schematic longitudinal cross sectional view illustrating an embodiment of an excimer lamp of the present invention. Theexcimer lamp 171, such as explained inFIG. 3 , comprises the dischargingvessel 31 made of a dielectric material with excellent permeability of UV light, theinner tube 32 equipped on the inside of the dischargingvessel 31, theouter electrode 34 equipped on the outside of the dischargingvessel 31, theinner electrode 35 equipped on the inside of theinner tube 32 and the fillinggas 36 filled up in thedischarge vessel 31. The UV light is preferably irradiated from theexcimer lamp 171 by which a high frequency voltage is applied between the outer electrode andinner electrode 32 from 1 to 20 MHz. The UV light is emitted from theexcimer lamp 171 to the liquid. A protect tube (no illustrating in figures) may be equipped on the outside of the dischargingvessel 31. Theouter electrode 34 may be equipped to the position between the protect tube and the dischargingelectrode 34. The discharging vessel and the protect tube may be made of dielectric material with permeability of the UV light. It is preferable to use a quartz or a synthetic quartz with a high permeability. - The filling
gas 36 is filled in the dischargingvessel 31 for discharging theexcimer lamp 171. The wavelength of the UV light varies by the kind of the filling gas. As the fillinggas 36, it is preferable to use the gas of He, Xe, Kr, Ar, ArF, ArCl, KrF, XeF, XeCl, XeBr, F2—Kr—He or the like. A pressure and a kind of gas in the dischargingvessel 31 are determined by the suitable condition to obtain a required wavelength and a required amount of irradiation of UV light. It is preferable to fill the pressure of from 10 to 60 kPa. The other things are explained inFIG. 3 . - The
inner tube 32 also uses a quartz or a synthetic quartz with dielectric. It is preferable that theinner tube 32 is equipped to the center of the dischargingvessel 131 so that the excimer lamp can be uniformly emitted the UV light on the around of theinner tube 32. As shown inFIG. 16 , thenitrogen gas 164 flows in theinner tube 32. Since theinner tube 32 is cooled by thenitrogen gas 164, the deterioration of theinner tube 31 can be prevented and is the same as that of the dischargingvessel 31 so that the lifetime of the excimer lamp can be improved. -
FIG. 18 shows a schematic cross sectional view illustrating an embodiment of the relationship between the inner tube and the inner electrode of the excimer lamp of the present invention. It is preferable that d/D ratio, which the “d” is an inner diameter of the inner tube and the “D” is an outer diameter of theinner electrode 35, is from 1.1 to 3.0 for flowing thenitrogen gas 164 in theinner tube 32 easily. When the d/D ratio is below 1.1, the space between theinner tube 32 and the inner electrode is not enough so that thenitrogen gas 164 can not flow in theinner tube 32 and theinner tube 32 can not be enough cooled by thenitrogen gas 164. When the d/D ratio is above 3.0, thenitrogen gas 164 flows easily so that theinner tube 32 is cooled sufficiently. In this case, however, it is not preferable that the outer diameter of the inner tube becomes thick and that of the excimer lamp becomes thick, too, or the excimer lamp can not be discharged uniformly since the outer diameter of theinner electrode 35 becomes thin. Therefore, the d/D ratio is limited from 1.1 to 3.0. - As the
inner electrode 31, it is preferable to use stainless steel, aluminum, aluminum alloy, copper, copper oxide, alloy containing of copper, alloy containing copper oxide or the like. Theinner electrode 35 does contact the fillinggas 36 so that the high frequency discharge happens on all parts of theinner tube 32. -
FIG. 19 andFIG. 20 show an schematic longitudinal cross sectional view illustrating an embodiment of an excimer lamp of the present invention, respectively.FIG. 21 toFIG. 23 show a schematic cross sectional view illustrating an embodiment of the relationship between the inner tube and the inner electrode of the excimer lamp of the present invention. - When both ends of the
inner tube 192 are open, it is preferable to use the rod-shapedinner electrode 35. As a result, theinner tube 192 can be cooled sufficiently because of flowing easily thenitrogen gas 164 from one end side to the other end side. When one end of theinner tube 35 is closed, it is preferable to use the hollow pipe-shape inner electrode 211 (as shown inFIG. 21 ). As a result, theinner tube 32 can be cooled sufficiently since thenitrogen gas 164 flows from the inside of theelectrode 211 to the outside of theelectrode 211. When the form of the inner electrode is the hollow pipe-shaped, it is preferable that d/D ratio, in which the “d” is a inner diameter of theinner tube 32 and the “D” is an outer diameter of the hollow pipe-shapeinner electrode 211, is in the range of that described above. - When one end of the
inner tube 32 is closed, the rod-shape inner electrode may be used. As shown inFIG. 22 , the insertion tube 221 may be inserted to the suitable position along theinner electrode 35 so that thenitrogen gas 164 can flow in theinner tube 32 easily. Furthermore, as shown inFIG. 23 , theinner electrode 231 of the flat-shape may be used for separating the inlet-side and the outlet-side of thenitrogen gas 164 so that thenitrogen gas 164 can flow in theinner tube 32 easily. - It is preferable that L/D ratio, in which the “L” is a length of the
inner electrode excimer lamp - When the L/D is below 10, the inner tube is cooled sufficiently by the nitrogen gas flowed in the inner tube since the outer diameter of the inner electrode and the excimer lamp becomes thick. Consequently, the efficiency of emission of the UV light is not improved since the surface area of the excimer lamp decreases.
- When the L/D is 30 or above, the inner tube becomes longer, and the nitrogen gas cannot flow sufficiently in the inner tube so that the inner tube is not cooled sufficiently. Therefore, the L/D is limited from 10 to 30 below.
- As the
outer electrode 34, it is preferable to use a material made of stainless steel, aluminum or the like. Any electrode of punching metal shape, mesh shape or net shape may be equipped around of the dischargingvessel 31. The electrode of rod shape or oblong shape may be equipped lengthwise of the dischargingvessel 31. When the electrode of punching metal shape, mesh shape or net shape is used, the shield property of the excimer lamp is improved on an electromagnetic wave of high frequency (so-called: EMI shield). When the electrode of the rod shape or the oblong shape is used, the UV light is emitted from the surface of the excimer lamp sufficiently since a large amount of the UV light can irradiate from the excimer lamp. - In the excimer lamp, a protect tube may be provided on the outer side of the
outer electrode 34, if necessary, and a nitrogen gas may introduced into the space between the protect tube and the dischargingvessel 31. - The amount of the UV light increases with the applying of high frequency voltage so that the efficiency of irradiation of the UV light increases. Therefore, since the thermal efficiency of the excimer lamp and the irradiation efficiency of UV light is high, the excimer lamp can save electricity and is of economical. It is preferable that the frequency of voltage applied to the excimer lamp is of from 1 to 20 MHz, particularly of from 5 to 16 MHz, furthermore preferably of from 11 to 15 MHz. In this case, it is preferable that the high frequency voltage outputted from the
power supply 163 is of from 0.1 to 10 V, particularly of from 0.1 to 5 V. When the voltage is below 0.1 V, the large amount of the UV light can not irradiate since the high frequency discharge can not happen between theouter electrode 34 and theinner electrode 35 sufficiently. When the voltage is above 10V, the amount of the UV light saturates so that the irradiation efficiency of the UV light does not increase and the excimer lamp does not save electricity. - According to the excimer lamp of the present invention, since the inner tube is cooled by flowing the nitrogen gas, the deterioration of the inner tube can be prevented and is the same as that of the discharging vessel so that the lifetime of the excimer lamp can be improved. The excimer lamp, which can irradiate the UV light of wave length of 222 nm or below, can prevent the deterioration of the inner tube. The nitrogen gas used can be treated safely and the construction of the excimer lamp can be simple.
-
FIG. 24 shows a schematic longitudinal cross sectional view illustrating an embodiment of the excimer lamp of the present invention. Theexcimer lamp 241 is equipped with the U-shapeinner tube 242 on the inner side of the dischargingvessel 31.FIG. 25 shows a schematic cross sectional view illustrating an embodiment of the excimer lamp as shown inFIG. 24 .FIG. 26 shows a schematic cross sectional view illustrating an embodiment of the U-shapeinner tube 242 used for the excimer lamp of the present invention. - At least one U-shape
inner tube 242 is equipped on the inside of the dischargingvessel 31. Theinner tube 242 is usually made of the quartz, the synthetic quartz or the like, having dielectric property. Since theinner electrode 243 is equipped on the inside of theinner tube 242, the dischargingvessel 31 with theinner tube 242 is almost the same as that of a discharging vessel with two inner electrodes so that the opportunity of high frequency discharge in the excimer lamp increases. The increase of the opportunity of high frequency discharge can extremely improve the irradiation efficiency of the UV light. - As the
inner electrode 243 as shown inFIG. 26 (a), it is preferable to use theliquid metal 244, especially mercury. Theliquid metal 244 can flow in the U-shapeinner tube 242 easily so that the U-shape inner electrode and the excimer lamp become thin. As shown inFIG. 26 (b), theinner electrode 243 may be theelectrode 245 of the net-shape. As theelectrode 245 of net-shape metal 245, it is preferable to use that made of the copper wire. -
FIG. 27 shows a schematic longitudinal cross sectional view illustrating an embodiment of anexcimer lamp 271 of the present invention.FIG. 28 shows a schematic cross sectional view illustrating an embodiment of anexcimer lamp 271 inFIG. 27 . Theexcimer lamp 271 is equipped with the two U-shapeinner tubes 242 to the inside of the dischargingvessel 31 so that the opportunity of the high frequency discharge between the outer electrode and theinner tube 242 increases. Consequently, the irradiation efficiency of the UV light can be improved. - Last, an excimer emission apparatus of the present invention will be explained as follows.
-
FIG. 29 shows a schematic view illustrating an embodiment of anexcimer emission apparatus 291 of the present invention. Theexcimer emission apparatus 291 comprises the excimer lamp of the present invention described above (for example, the numerical number is 201), a highfrequency power supply 163 for applying the voltage from 1 to 20 MHz between theouter electrode 35 and theinner electrode 35, a circulatingcooling apparatus 292 for flowing the nitrogen gas in theinner tube 32. The detail explanation of the excimer lamp is described above. - The nitrogen gas circulates in the
inner tube 32 to cool it. Since the deterioration of the inner tube cooled by UV light and the heat becomes slowly, the degree of deterioration of the inner tube can be the same as that of the dischargingvessel 31. Consequently, the lifetime of the excimer lamp can be improved. - The high
frequency power supply 163 can apply the voltage of the high frequency from 1 to 20 MHz between theouter electrode 34 and theinner electrode 35 of the excimer lamp 20. The construction of the excimer lamp is not limited that of shown inFIG. 29 . In the case of theexcimer emission apparatus 291 as shown inFIG. 29 , the highfrequency power supply 163 is provided at apower supply apparatus 293 as a main element. The highfrequency power supply 163 may comprises the other component, for example, a matchingcontroller 294, variable capacitors C1, C2 or the like. - The
power supply apparatus 293 as shown inFIG. 29 comprises the highfrequency power supply 163, the matchingcontroller 294, inductances L1, L2 and the variable capacitors C1, C2, as fundamental element. The alternatingpower supply 295 applies an electrical power of approximately 100V to thepower supply apparatus 293. The highfrequency power supply 163 converts the electrical power to that of the predetermined frequency from 1 to 20 MHz. The frequency converted is output from the highfrequency power supply 163. It is preferable that the voltage of the high frequency described above is of from 0.1 to 10 V, particularly of from 0.1 to 5V. The control of the variable capacitor C1 by the matchingcontroller 294 matches the impedance Z1 outputted from the highfrequency power supply 163 with the impedance Z2 inputted on theexcimer lamp 201. Consequently, In the circuit in thepower supply apparatus 293 shown inFIG. 29 , theexcimer lamp 201 irradiates the UV light at a high efficiency. - In the excimer emission apparatus of the present invention, the
excimer lamp 201 generates the high frequency discharge by applying the electrical power from 25 to 30 W with the high frequency of 13.56 MHz, to irradiate 10 mW/cm2 of the UV light from theexcimer lamp 201. However, in a prior excimer emission apparatus, the excimer lamp generates the dielectric barrier discharge by applying the electrical power of 50W with the voltage from 1 to 10 kV of any frequency from 40 to 300 kHz, to irradiate 10 mW/cm2 of the UV light from the prior excimer lamp. Therefore, the excimer emission apparatus of the present invention converts the input energy to the UV light efficiently so that the generation of heat of the excimer lamp decreases. The lifetime of the prior excimer lamp, consequently, is shorter than that of the excimer lamp of the present invention since the prior excimer lamp generates more the deterioration due to generation of heat than that of present invention.
Claims (14)
1. A decomposition apparatus for decomposing an organic compound fluid such as a gas of an organic compound, a liquid thereof, a gas containing an organic compound, and a liquid containing an organic compound, which comprises:
an excimer lamp emitting UV light for decomposing said organic compound, and
a decomposition container provided with an excimer lamp for decomposing said organic compound in said organic compound fluid.
2. A decomposition apparatus as claimed in claim 1 , wherein two or more decomposition containers each having said excimer lamp are jointed for flowing said fluid in one container to the other container in order.
3. A decomposition apparatus as claimed in claim 1 , wherein said container is equipped with a flow rate buffering material for slowing down a flow rate of said fluid.
4. A decomposition apparatus as claimed in claim 1 , wherein said decomposition container is equipped with a contact part between said fluid and a catalyst gas for promoting decomposition of the organic compound.
5. A decomposition apparatus as claimed in claim 1 , wherein an organic compound to be decomposed selected from fan, dioxin (polychlorinated dibenzo-para-dioxin), PCB (polychlorinated biphenyl), trichloroethylene, tetrachloroethylene, dichloromethane, tetrachloromethane, 1,2-dichloroethane, 1,1-dichloroethane, cis-1,2-dichloroethane, 1,1,1-trichloroethane, 1,3-dichloropropene and a mixture thereof.
6. A decomposition apparatus as claimed in claim 1 , wherein said excimer lamp comprises:
a discharging vessel made of a dielectric material with excellent permeability of UV light,
an inner tube equipped on the inside of the discharging vessel, a protect tube equipped on the outside of the discharging vessel,
an outer electrode equipped in the position between the protect tube and the discharging vessel,
an inner electrode equipped on the inside of the inner tube,
a filling gas filled up in said discharging vessel, and
a power supply for applying a voltage between said outer electrode and said inner electrode.
7. A decomposition apparatus as claimed in claim 6 , wherein said excimer lamp comprises:
said power supply applying a high frequency voltage from 1 to 20 MHz to a metal container and the inner electrode.
8. A decomposition apparatus as claimed in claim 1 , wherein a wave length of UV light is of 222 nm or below.
9. A decomposition apparatus of an organic compound fluid such as a gas of an organic compound, a liquid thereof, a gas containing an organic compound and a liquid containing an organic compound, which comprises:
an excimer emission body equipped with an inner electrode,
a metal container equipped to the outside of said excimer emission body for filling up at least one selected from a liquid of an organic compound and a liquid containing organic compound a power supply for applying a high frequency voltage between the inner electrode and the metal container, and
a UV light irradiated from said excimer emission body to said liquid in said metal container allows to generate OH radical and 0 radical in the liquid, and
the radical cutting some bond of the organic compound so that the organic compound in the liquid is decomposed easily.
10. A decomposition apparatus as claimed in claim 9 , wherein said excimer emission body comprises:
a discharging vessel made of a dielectric material with excellent permeability of UV light,
an inner tube equipped on the inside of said discharging vessel, an inner electrode equipped on the inside of said inner tube, and a filling gas filled up in said discharging vessel.
11. A decomposition apparatus as claimed in claim 9 , wherein said excimer lamp comprises:
said power supply applying a high frequency voltage from 1 to 20 MHz to the metal container and the inner electrode.
12. A decomposition apparatus as claimed in claim 9 , wherein an organic compound is selected from flon, dioxin (polychlorinated dibenzo-para-dioxin), PCB (polychlorinated biphenyl), trichloroethylene, tetrachloroethylene, dichloromethane, tetrachloromethane, 1,2-dichloroethane, 1,1-dichloroethane, cis-1,2-dichloroethane, 1,1,1-trichloroethane, 1,3-dichloropropene and a mixture thereof.
13. A decomposition apparatus as claimed in claim 9 , wherein a wave length of UV light is of 222 nm or below.
14-24. (canceled)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/075,263 US20050156497A1 (en) | 1997-02-12 | 2005-03-09 | Decomposition apparatus of organic compound, decomposition method thereof, excimer UV lamp and excimer emission apparatus |
Applications Claiming Priority (11)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP02807197A JP3822303B2 (en) | 1997-02-12 | 1997-02-12 | Method and apparatus for decomposing organic compounds |
JPPO9-28071 | 1997-02-12 | ||
JP36094097A JPH11191396A (en) | 1997-12-26 | 1997-12-26 | Excimer lamp and excimer emission device |
JPP09-360940 | 1997-12-26 | ||
JPP10-127195 | 1998-05-11 | ||
JP12719598A JP3282798B2 (en) | 1998-05-11 | 1998-05-11 | Excimer lamp and excimer light emitting device |
JP13622998A JPH11319816A (en) | 1998-05-19 | 1998-05-19 | Apparatus for decomposing organic compound and method for decomposing organic compound utilizing the same |
JPP10-136229 | 1998-05-19 | ||
US09/132,215 US6194821B1 (en) | 1997-02-12 | 1998-08-11 | Decomposition apparatus of organic compound, decomposition method thereof, excimer UV lamp and excimer emission apparatus |
US09/695,043 US6888041B1 (en) | 1997-02-12 | 2000-10-25 | Decomposition apparatus of organic compound, decomposition method thereof, excimer UV lamp and excimer emission apparatus |
US11/075,263 US20050156497A1 (en) | 1997-02-12 | 2005-03-09 | Decomposition apparatus of organic compound, decomposition method thereof, excimer UV lamp and excimer emission apparatus |
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US09/695,043 Division US6888041B1 (en) | 1997-02-12 | 2000-10-25 | Decomposition apparatus of organic compound, decomposition method thereof, excimer UV lamp and excimer emission apparatus |
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US20050156497A1 true US20050156497A1 (en) | 2005-07-21 |
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US09/695,043 Expired - Fee Related US6888041B1 (en) | 1997-02-12 | 2000-10-25 | Decomposition apparatus of organic compound, decomposition method thereof, excimer UV lamp and excimer emission apparatus |
US11/075,263 Abandoned US20050156497A1 (en) | 1997-02-12 | 2005-03-09 | Decomposition apparatus of organic compound, decomposition method thereof, excimer UV lamp and excimer emission apparatus |
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US09/695,043 Expired - Fee Related US6888041B1 (en) | 1997-02-12 | 2000-10-25 | Decomposition apparatus of organic compound, decomposition method thereof, excimer UV lamp and excimer emission apparatus |
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US20070132384A1 (en) * | 2005-12-14 | 2007-06-14 | Zsolt Nemeth | Dielectric barrier discharge lamp |
WO2008125375A1 (en) * | 2007-04-16 | 2008-10-23 | Continental Automotive Gmbh | Apparatus for the activation of a polymerizable substance |
US20100047137A1 (en) * | 2008-08-22 | 2010-02-25 | Applied Materials, Inc. | Uv assisted polymer modification and in situ exhaust cleaning |
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FR2840189B1 (en) * | 2002-05-30 | 2005-03-11 | Jean Pierre Gemon | HYDRAULIC RETRACTOR |
US20030230477A1 (en) * | 2002-06-14 | 2003-12-18 | Fink Ronald G. | Environmental air sterilization system |
US7776284B2 (en) * | 2006-04-19 | 2010-08-17 | Kusatsu Electric Co., Ltd. | Apparatus of catalyst-circulation type for decomposing waste plastics and organics, and system thereof |
JP5190897B2 (en) * | 2008-08-20 | 2013-04-24 | 草津電機株式会社 | Method for decomposing waste plastics and organic substances using titanium oxide granules with optimum particle characteristics |
DE102012017779A1 (en) * | 2012-09-07 | 2014-03-13 | Karlsruher Institut für Technologie | Dielectric barrier discharge lamp |
WO2017073396A1 (en) * | 2015-10-28 | 2017-05-04 | 東京エレクトロン株式会社 | Substrate processing method, substrate processing apparatus, substrate processing system and storage medium |
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