JPH11150369A - Manufacture of multilayer printed wiring board - Google Patents

Manufacture of multilayer printed wiring board

Info

Publication number
JPH11150369A
JPH11150369A JP31505197A JP31505197A JPH11150369A JP H11150369 A JPH11150369 A JP H11150369A JP 31505197 A JP31505197 A JP 31505197A JP 31505197 A JP31505197 A JP 31505197A JP H11150369 A JPH11150369 A JP H11150369A
Authority
JP
Japan
Prior art keywords
hole
insulating adhesive
copper foil
wiring board
printed wiring
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP31505197A
Other languages
Japanese (ja)
Inventor
Kuniji Suzuki
邦司 鈴木
Minoru Shimada
稔 島田
Hideyuki Yasushiro
秀幸 安代
Yoshihiro Tamura
義広 田村
Koichi Tsuyama
宏一 津山
Toshimi Ujiie
年美 氏家
Kunio Kawaguchi
邦雄 川口
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Showa Denko Materials Co Ltd
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP31505197A priority Critical patent/JPH11150369A/en
Publication of JPH11150369A publication Critical patent/JPH11150369A/en
Pending legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To provide a method of manufacturing a multilayer printed wiring board where an excellent electrical connection can be made. SOLUTION: A copper foil-attached insulating adhesive film 3 is composed of a copper foil 1 and a semi-cured insulating adhesive layer 2 provided to the roughened surface of the copper foil 1, a hole 4 is bored to serve as a non-through-hole for interlayer connection, the copper foil-attached insulating adhesive film 3 is placed on a previously prepared inner circuit board 5 bringing the insulating adhesive layer 2 into contact with it, a sheet 6 which becomes plastically fluid in a lamination process is laminated on the outer side of the copper foil 1 of the copper foil-attached insulating adhesive film 3 and thermocompressed into one piece, insulating adhesive layer resin 7 oozing out into the hole 4 which serves as a non-through-hole is removed off by laser irradiation, a through-hole 11 is bored, the laminate is subjected to a smear removing treatment, and the inner wall of the non-through-hole 4 is plated to electrically connect the inner circuit 12 and the copper foil 1 together.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、多層プリント配線
板の製造方法に関する。
[0001] The present invention relates to a method for manufacturing a multilayer printed wiring board.

【0002】[0002]

【従来の技術】電子機器の軽薄短小化、高機能化に伴
い、配線板には高密度化が要求されてきている。このた
め、配線板は配線層数を増やす多層化、同一層内の配線
収容量を増やすための微細配線化、層間の接続を行うた
めの接続穴の微細化が行われてきた。
2. Description of the Related Art As electronic devices have become lighter, thinner, smaller, and more sophisticated, wiring boards have been required to have higher densities. For this reason, wiring boards have been multi-layered to increase the number of wiring layers, miniaturized to increase the wiring capacity in the same layer, and miniaturized connection holes for connecting between layers.

【0003】その方法として、特開平6−196862
号公報に記載されているように、金属箔とBステージの
接着剤を一体化した接着剤付き金属箔に予め穴をあけた
後、配線形成した内層配線板と積層接着して、多層化
し、必要に応じ、貫通穴の形成、穴内の導体化、エッチ
ングによる配線形成によって、IVH付多層配線板を製
造する方法がある。
As a method therefor, Japanese Patent Laid-Open Publication No.
As described in the publication, after a hole is made in advance in a metal foil with an adhesive in which a metal foil and an adhesive of a B stage are integrated, the metal foil is laminated and adhered to an inner wiring board on which a wiring is formed, thereby forming a multilayer. As necessary, there is a method of manufacturing a multilayer wiring board with an IVH by forming a through hole, forming a conductor in the hole, and forming a wiring by etching.

【0004】また、内層回路板上に絶縁性樹脂層を形成
し、所望の位置にレーザー照射を行い、その後銅めっき
により表面回路と内層回路を電気的に接続する方法ある
いは、銅箔の片面に絶縁性接着層を設けた銅箔付き絶縁
性接着フィルムを内層回路板と積層接着し、所望の位置
の銅箔をエッチングして窓穴を形成し、その後レーザー
照射により絶縁性樹脂層を除去し、めっきにより表面回
路と内層回路を電気的に接続する方法が知られている。
Further, a method of forming an insulating resin layer on an inner circuit board, irradiating a laser to a desired position, and then electrically connecting the surface circuit and the inner circuit by copper plating, or a method of forming a copper foil on one side. The insulating adhesive film with copper foil provided with the insulating adhesive layer is laminated and bonded to the inner circuit board, the copper foil at a desired position is etched to form a window hole, and then the insulating resin layer is removed by laser irradiation. A method of electrically connecting a surface circuit and an inner layer circuit by plating is known.

【0005】[0005]

【発明が解決しようとする課題】特開平6−19682
号公報に記載されている方法で多層配線板を製造する場
合、接着剤付き金属箔の接着剤層で、内層配線板の配線
部分を完全に埋める必要があるが、一方、予めあけた穴
内への樹脂しみ出しは、小さいことが望ましい。そこ
で、積層物と積層治具(鏡板)との間に、積層時に流動
するシート等を挿入することにより、積層時の接着剤樹
脂の流動に先立ち、このシート材料が穴内を充填して樹
脂のしみ出しを抑えることにより、予めあけた穴内への
樹脂しみ出しを抑制することができる。また、この方法
は、積層物表面の圧力を均一化する効果もあるため、内
層配線の間隙部へも接着剤樹脂が流動し、この結果ボイ
ドの発生も抑制される。
SUMMARY OF THE INVENTION Japanese Patent Application Laid-Open No. Hei 6-19682
In the case of manufacturing a multilayer wiring board by the method described in Japanese Patent Application Publication, it is necessary to completely fill the wiring portion of the inner wiring board with an adhesive layer of a metal foil with an adhesive. Is preferably small. Therefore, by inserting a sheet or the like flowing at the time of lamination between the laminate and the laminating jig (end plate), the sheet material fills the holes before the flow of the adhesive resin at the time of lamination and the resin is filled. By suppressing the exudation, it is possible to suppress the exudation of the resin into the previously drilled hole. In addition, this method also has an effect of equalizing the pressure on the surface of the laminate, so that the adhesive resin flows into the gaps between the inner wiring layers, and as a result, generation of voids is suppressed.

【0006】このような多層プリント配線板の製造方法
において、非貫通穴の穴径が大きい場合には、絶縁性接
着層樹脂の浸み出しが少ない為、または上記塑性流動シ
ートで浸み出しを防止することにより、充分な電気的接
続が可能であった。しかしながら、さらに高密度化した
多層プリント配線板では、非貫通穴の穴径を、例えば3
00μm以下とするような要求が高くなってきており、
このような小さな穴径になると、塑性流動するシートに
よる絶縁性接着層の浸み出し防止だけでは不充分であ
り、充分な電気的接続が不可能となっていた。
In such a method for manufacturing a multilayer printed wiring board, when the diameter of the non-through hole is large, the seepage of the resin of the insulating adhesive layer is small, or the seepage using the plastic flow sheet is performed. By preventing this, a sufficient electrical connection was possible. However, in a multilayer printed wiring board having a higher density, the hole diameter of the non-through hole is set to, for example, 3
There is a growing demand for the thickness to be less than 00 μm,
With such a small hole diameter, it is not sufficient to prevent the insulative adhesive layer from seeping out by the plastically flowing sheet, and it is impossible to make a sufficient electrical connection.

【0007】また、内層回路板上に絶縁性樹脂層を形成
し、所望の位置にレーザー照射を行い、その後銅めっき
により表面回路と内層回路を電気的に接続する方法で
は、絶縁性樹脂層とめっき銅との密着力が弱い為、耐熱
性が低いものとなっている。これを改善する為、銅箔の
片面に絶縁性樹脂層を設けた銅箔付き絶縁性接着フィル
ムを内層回路と積層接着し、所望の位置の銅箔をエッチ
ングして窓穴を形成し、その後レーザー照射により絶縁
性樹脂層を除去し、めっきにより表面回路と内層回路を
電気的に接続する方法があるが、個別パネル毎に窓穴を
形成しなければならない為、回路形成時のネガの寸法変
化による窓穴位置のばらつきや、現像残りによる窓穴形
成不良に起因する電気的接続不良の課題があった。
Further, in a method of forming an insulating resin layer on an inner circuit board, irradiating a desired position with a laser, and thereafter electrically connecting the surface circuit and the inner circuit by copper plating, a method of forming an insulating resin layer on the inner circuit board is described. Since the adhesion to the plated copper is weak, the heat resistance is low. In order to improve this, an insulating adhesive film with copper foil provided with an insulating resin layer on one side of the copper foil is laminated and bonded to the inner layer circuit, the copper foil at the desired position is etched to form a window hole, and then There is a method of removing the insulating resin layer by laser irradiation and electrically connecting the surface circuit and the inner layer circuit by plating. However, since a window hole must be formed for each individual panel, the dimensions of the negative when forming the circuit There has been a problem of variation in the position of the window hole due to the change, and poor electrical connection due to the poor formation of the window hole due to residual development.

【0008】本発明は、電気的接続に優れた多層プリン
ト配線板の製造方法を提供するものである。
The present invention provides a method for manufacturing a multilayer printed wiring board having excellent electrical connection.

【0009】[0009]

【課題を解決するための手段】本発明の多層プリント配
線板の製造方法は、銅箔1の粗化面に半硬化状態の絶縁
性接着層2を設けた銅箔付き絶縁性接着フィルム3に、
層間接続の為の非貫通穴となる穴4をあけ、その銅箔付
き絶縁性接着フィルム3をその絶縁性接着層2が予め準
備した内層回路板5に接するように重ね、前記銅箔付き
絶縁性接着フィルム3の銅箔1の外側に、積層過程で塑
性流動するシート6を重ね、加熱加圧して積層一体化
し、非貫通穴となる穴4に浸み出した絶縁性接着層樹脂
7を、レーザー照射により除去し、貫通穴11をあけた
後、スミア処理を行い、そして、非貫通穴となる穴4内
壁にめっきを行って、内層回路12と銅箔1とを電気的
に接続することを特徴とする。
The method of manufacturing a multilayer printed wiring board according to the present invention is directed to a method of manufacturing an insulating adhesive film with a copper foil having a semi-cured insulating adhesive layer provided on a roughened surface of a copper foil. ,
A hole 4 serving as a non-through hole for interlayer connection is opened, and the insulating adhesive film 3 with copper foil is overlapped so that the insulating adhesive layer 2 is in contact with an inner circuit board 5 prepared in advance. A sheet 6 that plastically flows in the laminating process is superimposed on the outer side of the copper foil 1 of the adhesive film 3, laminated by laminating by heating and pressing, and the insulating adhesive layer resin 7 leached out into the hole 4 to be a non-through hole. After removing by laser irradiation and drilling the through hole 11, smearing is performed, and plating is performed on the inner wall of the hole 4 to be a non-through hole to electrically connect the inner layer circuit 12 and the copper foil 1. It is characterized by the following.

【0010】[0010]

【発明の実施の形態】(銅箔)本発明の銅箔付き絶縁性
接着フィルム3に用いる銅箔1には、電解銅箔または圧
延銅箔の、厚さ5μm〜70μmのものが使用できる。
この厚さが5μm未満であると、取り扱い性に劣り、7
0μmを超えると、銅箔のエッチング加工精度が低下す
る。また、厚さ5μmのような薄い銅箔を使用するとき
は、取り扱い性を向上させる為に、キャリア層によって
支持されたものを使用することができる。
DESCRIPTION OF THE PREFERRED EMBODIMENTS (Copper Foil) As the copper foil 1 used for the insulating adhesive film 3 with a copper foil of the present invention, an electrolytic copper foil or a rolled copper foil having a thickness of 5 μm to 70 μm can be used.
When the thickness is less than 5 μm, the handleability is poor, and
If it exceeds 0 μm, the accuracy of etching the copper foil is reduced. When a thin copper foil having a thickness of 5 μm is used, a material supported by a carrier layer can be used to improve the handleability.

【0011】(絶縁性接着剤)本発明に用いる半硬化状
態の絶縁性接着層には、分子量が100,000以上の
ハロゲン化高分子量エポキシ重合体と、架橋剤と、多官
能エポキシ樹脂とを構成成分とする熱硬化性エポキシ樹
脂組成物を用いることができる。この分子量が100,
000以上のハロゲン化高分子量エポキシ重合体は、二
官能エポキシ樹脂とハロゲン化二官能フェノール類を、
エポキシ基/フェノール性水酸基=1/0.9〜1/
1.1とし、触媒の存在下、沸点が130℃以上のアミ
ド系またはケトン系溶媒中、反応固形分濃度50重量%
以下で、加熱して重合させて得られる。架橋剤として
は、イソシアネート類を他の活性水素を持つ化合物でマ
スク(ブロック)したマスクイソシアネート類を用いる
ことができる。多官能エポキシ樹脂としては、分子内に
二個以上のエポキシ基を持つ化合物であればどのような
ものでもよく、フェノール型エポキシ樹脂、脂環式エポ
キシ樹脂、エポキシ化ポリブタジエン、グリシジルエス
テル型エポキシ樹脂、グリシジルアミン型エポキシ樹
脂、イソシアヌレート型エポキシ樹脂、可とう性エポキ
シ樹脂などから選択して用いることができる。
(Insulating Adhesive) The semi-cured insulating adhesive layer used in the present invention comprises a halogenated high molecular weight epoxy polymer having a molecular weight of 100,000 or more, a crosslinking agent, and a polyfunctional epoxy resin. A thermosetting epoxy resin composition as a constituent component can be used. This molecular weight is 100,
000 or more halogenated high molecular weight epoxy polymer, difunctional epoxy resin and halogenated bifunctional phenols,
Epoxy group / phenolic hydroxyl group = 1 / 0.9-1 /
1.1, in the presence of a catalyst, in an amide-based or ketone-based solvent having a boiling point of 130 ° C. or more, a reaction solid concentration of 50% by weight.
Below, it obtains by heating and superposing | polymerizing. As the cross-linking agent, masked isocyanates obtained by masking (blocking) isocyanates with a compound having another active hydrogen can be used. As the polyfunctional epoxy resin, any compound having two or more epoxy groups in a molecule may be used, and a phenol type epoxy resin, an alicyclic epoxy resin, an epoxidized polybutadiene, a glycidyl ester type epoxy resin, A glycidylamine type epoxy resin, an isocyanurate type epoxy resin, a flexible epoxy resin, or the like can be used.

【0012】(銅箔付き絶縁性接着フィルム)この熱硬
化性エポキシ樹脂組成物を、銅箔のマット面側に半硬化
状態の絶縁性接着層として設けるには、上記した、分子
量が100,000以上のハロゲン化高分子量エポキシ
重合体と、架橋剤と、多官能エポキシ樹脂とを混合して
接着剤ワニスとし、ブレードコータ、ナイフコータ、ス
クイズコータ等の後計量系コーティング方式や、リバー
スロールコータ、キスロールコータ、キャストコータ、
スプレーコータ、押し出しコータ等の前計量系コーティ
ング方式によって塗布し、溶剤を蒸発させながら樹脂を
半硬化させる。
(Insulating Adhesive Film with Copper Foil) In order to provide this thermosetting epoxy resin composition as a semi-cured insulating adhesive layer on the matte side of a copper foil, the above-mentioned molecular weight of 100,000 is required. The above-mentioned halogenated high molecular weight epoxy polymer, a cross-linking agent, and a polyfunctional epoxy resin are mixed to form an adhesive varnish, a blade meter, a knife coater, a squeeze coater, and the like, a post-metering system coating method, a reverse roll coater, and a kiss. Roll coater, cast coater,
It is applied by a pre-metering coating method such as a spray coater or an extrusion coater, and the resin is semi-cured while evaporating the solvent.

【0013】また、上記の接着剤ワニスを、ポリエチレ
ンテレフタレートフィルム等の支持フィルム上に塗布
し、溶剤を蒸発させながら樹脂を半硬化させその支持フ
ィルムを剥離して、フィルム化したものを銅箔マット面
に貼り合わせることもでき、さらに、2回以上に塗布・
乾燥を行って形成したり、2枚以上のフィルム化された
接着剤を用いて形成することもできる。
Further, the adhesive varnish is coated on a support film such as a polyethylene terephthalate film, the resin is semi-cured while evaporating the solvent, and the support film is peeled off. It can be attached to the surface, and it can be applied more than twice.
It can also be formed by drying or using two or more film-forming adhesives.

【0014】(非貫通穴の穴あけ)銅箔付き絶縁性接着
フィルムの穴あけは、ドリルによる穴あけまたは、金型
による打ち抜き等で行う。ドリル穴あけでは、銅箔の厚
さによって変わるが、5枚以上重ねての穴あけが可能で
ある。
(Drilling of non-through holes) Drilling of the insulating adhesive film with copper foil is performed by drilling or punching with a die. In drilling, five or more holes can be drilled, depending on the thickness of the copper foil.

【0015】(塑性流動するシート)本発明では、穴あ
けした銅箔付き絶縁性接着フィルムの穴塞がりの防止の
為に、加圧加熱して積層一体化する工程において、銅箔
付き絶縁性接着フィルムの銅箔の上に、さらに加圧加熱
して積層一体化する過程で塑性流動するシートを重ねて
行うのであって、この加圧加熱して積層一体化する過程
で塑性流動するシートに、コア層とそのコア層を両面か
ら挟む外層からなる3層の構造であり、かつコア層の軟
化点が130℃以下であるものを使用することが好まし
い。
(Plastic Flowing Sheet) In the present invention, in the step of applying pressure and heating and laminating and integrating the insulating adhesive film with copper foil, in order to prevent the opening of the holed insulating adhesive film with copper foil, On the copper foil, a sheet that plastically flows in the process of further pressing and heating and laminating and integrating is performed, and the sheet that plastically flows in the process of pressing and heating and laminating and integrating, It is preferable to use one having a three-layer structure composed of a layer and an outer layer sandwiching the core layer from both sides, and having a softening point of the core layer of 130 ° C. or less.

【0016】この方法によって、銅箔付き絶縁性接着フ
ィルムの絶縁性接着層樹脂が流動を開始する前に、上記
の加圧加熱して積層一体化する過程で塑性流動するシー
トが先に流動を開始し、銅箔付き絶縁性接着フィルムに
あけられた穴に流動し、穴を塞ぐので、絶縁性接着層樹
脂自身の流動による穴塞がりを抑制する。
According to this method, before the insulative adhesive layer resin of the insulative adhesive film with copper foil starts to flow, the sheet that plastically flows in the above-mentioned step of heating under pressure and laminating and integrating firstly flows. Since the flow starts and flows into the holes formed in the insulating adhesive film with a copper foil and closes the holes, the hole closing due to the flow of the insulating adhesive layer resin itself is suppressed.

【0017】この加圧加熱して積層一体化する過程で塑
性流動するシートは、当然ながら、積層一体化の後に容
易に剥離除去できるものでなくてはならない。
The sheet which plastically flows in the process of laminating and integrating by pressurizing and heating must of course be one which can be easily peeled and removed after laminating and integrating.

【0018】この目的に合う3層構造のフィルムとして
は、コア層と外層からなる3層の構造で、コア層は銅箔
付き絶縁性接着フィルムの絶縁性接着剤の軟化点よりも
低いもの、好ましくは130℃以下、より好ましくは1
15℃以下のポリエチレン、エチレン系コポリマ、ビニ
ル系ポリマ、アクリル系ポリマ、脂肪族ポリエステルあ
るいはポリアミド等の熱可塑性樹脂シートをコアに用
い、外層には離形性に優れたフッ素系ポリマや、シリコ
ン系ポリマ、高強度ポリオレフィンを用いることが好ま
しい。
The three-layer film suitable for this purpose has a three-layer structure comprising a core layer and an outer layer, wherein the core layer is lower than the softening point of the insulating adhesive of the insulating adhesive film with copper foil. Preferably 130 ° C. or less, more preferably 1 ° C.
A thermoplastic resin sheet such as polyethylene, ethylene-based copolymer, vinyl-based polymer, acrylic-based polymer, aliphatic polyester or polyamide having a temperature of 15 ° C. or less is used for the core, and the outer layer is made of a fluorine-based polymer or silicon-based material having excellent releasability. It is preferable to use polymers and high-strength polyolefins.

【0019】(内層回路板)本発明の内層回路板として
は、ガラスエポキシ銅張積層板や紙フェノール銅張積層
板、コンポジット銅張積層板、ポリイミド銅張積層板等
が使用できる。これらの銅張積層板にドリルで貫通穴を
あけた後、銅めっきを行い、不要な箇所の銅をエッチン
グ除去して、貫通穴付きの内層用配線板を製造できる。
また、このような方法に必ずしも限定されるものではな
く、めっき用触媒を内部に含有する絶縁基板、あるいは
絶縁基板の表面に無電解めっき用接着剤を塗布した基板
に、穴をあけ、回路を形成しない箇所にめっきレジスト
を形成し、めっきを行うことによって作製した、貫通穴
を有する内層板も使用できる。
(Inner Circuit Board) As the inner circuit board of the present invention, a glass epoxy copper-clad laminate, a paper phenol copper-clad laminate, a composite copper-clad laminate, a polyimide copper-clad laminate, or the like can be used. After drilling through holes in these copper-clad laminates, copper plating is performed, and unnecessary portions of copper are removed by etching, whereby an inner wiring board having through holes can be manufactured.
Further, the method is not necessarily limited to such a method, and a hole is formed in an insulating substrate containing a plating catalyst therein or a substrate having an electroless plating adhesive applied to the surface of the insulating substrate to form a circuit. An inner layer plate having a through hole, which is produced by forming a plating resist in a portion where it is not formed and performing plating, can also be used.

【0020】(絶縁性接着層樹脂の除去)非貫通穴内に
しみ出した絶縁性接着層樹脂の除去は、レーザーの照射
により行う。レーザー照射条件は、絶縁性接着層樹脂の
種類によりレーザー照射による除去性が変化するため、
使用する絶縁性接着層樹脂の種類によって予め実験的に
求める。さらにこのレーザー照射条件は、絶縁性接着層
樹脂の残さによる接続信頼性への影響の度合いと、後述
する、アルカリ性過マンガン酸溶液による処理の条件と
の関係が密接なので、これを考慮して設定する必要があ
る。これも実験的に求めておくことが必要である。照射
するレーザーには、CO2レーザーの他に、YAGレー
ザーも、用いることができる。
(Removal of Insulating Adhesive Layer Resin) The removal of the insulating adhesive layer resin that has oozed into the non-through hole is performed by laser irradiation. Laser irradiation conditions vary depending on the type of resin used for the insulating adhesive layer.
It is determined experimentally in advance depending on the kind of the insulating adhesive layer resin to be used. Furthermore, the laser irradiation conditions are set in consideration of the close relationship between the degree of the influence of the residue of the insulating adhesive layer resin on the connection reliability and the conditions of the treatment with an alkaline permanganate solution described later. There is a need to. This must also be determined experimentally. As the laser for irradiation, a YAG laser can be used in addition to the CO 2 laser.

【0021】(スミア処理)レーザー照射による絶縁性
接着層樹脂の除去を行った後に、内層銅箔表面に薄膜の
樹脂残さが発生するので、接続信頼性を高めるためには
スミア処理を行うことを必要とする。このときのスミア
処理に用いる溶液としては、アルカリ性過マンガン酸溶
液を用いることができる。クロム酸等の処理液でも除去
可能である。いずれの場合でも、その後に中和処理が必
要となる。
(Smear treatment) After the resin of the insulating adhesive layer is removed by laser irradiation, resin residue of a thin film is generated on the surface of the inner copper foil. Therefore, in order to improve connection reliability, it is necessary to perform smear treatment. I need. As a solution used for the smear treatment at this time, an alkaline permanganate solution can be used. It can be removed even with a processing solution such as chromic acid. In any case, a neutralization treatment is required thereafter.

【0022】アルカリ性過マンガン酸溶液による処理液
と中和処理液としては、市販のスミア処理溶液で充分で
あり、スミア処理の初期工程に樹脂の膨潤剤を含んだも
のが望ましい。このような膨潤剤としては、アルコール
系の溶剤を含んだ水溶液がある。アルカリ性過マンガン
酸溶液の処理液は、過マンガン酸ナトリウム:50〜7
0g/l、水酸化ナトリウム濃度:30〜50g/lの
範囲で所望の効果が得られる。中和処理液としては、塩
酸ヒドロキシルアミン、硫酸ヒドロキシルアミン、硫酸
ヒドラジン、塩化錫(II)等があり、濃度として、
0.01〜0.2ml/lの範囲が好ましい。
As the treatment solution with the alkaline permanganate solution and the neutralization treatment solution, a commercially available smear treatment solution is sufficient, and a solution containing a resin swelling agent in the initial step of smear treatment is desirable. As such a swelling agent, there is an aqueous solution containing an alcohol-based solvent. The treatment solution of the alkaline permanganate solution is sodium permanganate: 50 to 7
The desired effect can be obtained in the range of 0 g / l and the concentration of sodium hydroxide: 30 to 50 g / l. Examples of the neutralizing solution include hydroxylamine hydrochloride, hydroxylamine sulfate, hydrazine sulfate, tin (II) chloride, and the like.
A range of 0.01 to 0.2 ml / l is preferred.

【0023】絶縁性接着層樹脂の種類の違いにより、レ
ーザー照射による絶縁性接着層樹脂の除去後、内層銅箔
表面に形成される薄膜の樹脂残さの、スミア処理溶液へ
の溶解性が低下する場合があり、そのような場合には、
2回以上のスミア処理を行うことによって、レーザー照
射による樹脂残さをさらに良好に除去できる。
After the removal of the insulating adhesive layer resin by laser irradiation, the solubility of the resin residue of the thin film formed on the surface of the inner copper foil in the smear treatment solution decreases due to the difference in the type of the insulating adhesive layer resin. And in such cases,
By performing the smear treatment twice or more, the resin residue due to the laser irradiation can be more favorably removed.

【0024】(エキシマレーザーによる樹脂残さの除
去)レーザー照射によって絶縁性接着層樹脂を除去した
後、アルカリ性過マンガン酸溶液で処理する前に、さら
にエキシマレーザーを使用して、レーザー照射後の絶縁
性接着層樹脂の残さの除去を行えば、アルカリ性過マン
ガン酸溶液による処理の回数を減らすことができる。
(Removal of Resin Residue by Excimer Laser) After the resin of the insulating adhesive layer is removed by laser irradiation, and before the treatment with an alkaline permanganate solution, the insulating property after the laser irradiation is further increased by using an excimer laser. If the residue of the adhesive layer resin is removed, the number of treatments with the alkaline permanganate solution can be reduced.

【0025】[0025]

【実施例】実施例1 図1(a)に示すように、銅箔付き絶縁性接着フィルム
3として、厚さ18μm銅箔の粗化面に厚さ50μmの
エポキシ系絶縁性接着剤を塗布し、半硬化状態にしたM
CF−3000E(日立化成工業株式会社製、商品名)
を準備する。この絶縁性接着剤は、直径0.3mmのド
リル穴あけをした後、厚さ1.6mmの銅張り積層板に
25kgf/cm2の条件で真空プレスして積層接着
し、穴内に浸み出した距離が80μm位である。この銅
箔付き絶縁性接着フィルム3に、直径0.25mmの非
貫通となる穴4をドリルで穴あけした。次に、厚さ18
μmの銅箔を両面に張り合わせた、厚さ0.6mmのガ
ラスエポキシ両面銅張積層板の不要な銅箔をエッチング
除去して、回路を形成した内層回路板5を作製し、その
両面に、前述の穴あけした銅箔付き絶縁性接着フィルム
3を、その絶縁性接着層2が内層回路板5に接するよう
に重ね、さらに銅箔付き絶縁性接着フィルム3の銅箔1
の面に、塑性流動するシート6として、コア層の厚さが
90μmその両面の外層の厚さが30μmで3層構造の
厚さ150μmのオピュランシート(三井石油化学工業
株式会社製、商品名)を重ね、温度170℃、圧力2.
5MPaで60分間加圧加熱して積層一体化した後、塑
性流動するシート6を剥がして、図1(b)に示す多層
板を作製した。次に、図1(c)に示すように、非貫通
穴に浸み出した絶縁性接着層樹脂7を、レーザー加工機
であるGS−500(住友重機械工業株式会社製、商品
名)で、エネルギー強度20KV、パルス幅1μs、シ
ョット数5ショットの条件でレーザー照射をして除去し
た。次に、図1(d)に示すように、直径0.3mmの
貫通穴11をドリルで穴あけし、さらにアルカリ性過マ
ンガン酸溶液(過マンガン酸カリウム60g/l、水酸
化ナトリウム濃度40g/l)に液温60℃で3分間浸
漬処理し、続いて、中和液であるエンプレートMLB4
98(メルテックス株式会社製、商品名)に液温20℃
で5分間浸漬処理し、さらにこのアルカリ性過マンガン
酸溶液による処理と中和液による処理をもう一度行っ
た。その後、図1(e)に示すように、厚さ12μmの
銅めっき13を行い、不要な箇所の銅をエッチングし
て、外層配線を形成して、表層に非貫通穴を有する高密
度の多層プリント配線板を作製した。この多層プリント
配線板において、非貫通穴の大きさは、開口部の直径が
0.23mmであり、底部の直径が0.18mmであっ
て、(260℃のホットオイル10秒浸漬)/(20℃
の水20秒浸漬)を1サイクルとするホットオイル試験
で、50サイクルの試験を行った後でも、電気抵抗が1
0%上昇することはなかった。また、(−65℃での気
中冷却を30分間)/(125℃での気中加熱を30分
間)を1サイクルとする、MIL−107試験で、20
0サイクルの試験を行った後でも、電気抵抗の上昇が1
0%を超えることはなかった。
EXAMPLE 1 As shown in FIG. 1 (a), as an insulating adhesive film 3 with a copper foil, an epoxy insulating adhesive having a thickness of 50 μm was applied to a roughened surface of a copper foil having a thickness of 18 μm. , Semi-cured M
CF-3000E (trade name, manufactured by Hitachi Chemical Co., Ltd.)
Prepare The insulating adhesive was drilled into a hole having a diameter of 0.3 mm, then vacuum-pressed on a 1.6 mm-thick copper-clad laminate under the condition of 25 kgf / cm 2 , laminated and bonded, and leached into the hole. The distance is about 80 μm. A non-penetrating hole 4 having a diameter of 0.25 mm was drilled in the insulating adhesive film 3 with a copper foil. Next, the thickness 18
Unnecessary copper foil of a glass epoxy double-sided copper-clad laminate having a thickness of 0.6 mm, in which a copper foil of μm is laminated on both sides, is etched away to produce an inner layer circuit board 5 on which a circuit is formed. The above-mentioned insulating adhesive film 3 with a copper foil is laid so that the insulating adhesive layer 2 is in contact with the inner circuit board 5, and the copper foil 1 of the insulating adhesive film 3 with a copper foil is further laminated.
As a sheet 6 that flows plastically, an opulan sheet (trade name, manufactured by Mitsui Petrochemical Industry Co., Ltd.) having a core layer thickness of 90 μm, an outer layer on both sides of 30 μm and a three-layer structure of 150 μm thickness is used. 1. Stack, temperature 170 ° C, pressure 2.
After pressurizing and heating at 5 MPa for 60 minutes to laminate and integrate, the plastically flowing sheet 6 was peeled off to produce a multilayer board shown in FIG. 1 (b). Next, as shown in FIG. 1 (c), the insulating adhesive layer resin 7 leached into the non-through holes is removed by a laser processing machine GS-500 (trade name, manufactured by Sumitomo Heavy Industries, Ltd.). Laser irradiation was performed under the conditions of an energy intensity of 20 KV, a pulse width of 1 μs, and the number of shots was 5 shots. Next, as shown in FIG. 1 (d), a through-hole 11 having a diameter of 0.3 mm was drilled, and further an alkaline permanganate solution (potassium permanganate 60 g / l, sodium hydroxide concentration 40 g / l). Immersion treatment at a liquid temperature of 60 ° C. for 3 minutes, followed by a neutralizing solution, Enplate MLB4
98 (manufactured by Meltex Co., Ltd., trade name) at a liquid temperature of 20 ° C
For 5 minutes, and the treatment with the alkaline permanganate solution and the treatment with the neutralizing solution were performed again. Thereafter, as shown in FIG. 1E, copper plating 13 having a thickness of 12 μm is performed, copper in unnecessary portions is etched to form an outer wiring, and a high-density multilayer having a non-through hole in a surface layer is formed. A printed wiring board was manufactured. In this multilayer printed wiring board, the size of the non-through hole is such that the diameter of the opening is 0.23 mm, the diameter of the bottom is 0.18 mm, and (260 ° C. hot oil immersion for 10 seconds) / (20 ° C
Immersion in water for 20 seconds), the electrical resistance is still 1 after a 50-cycle hot oil test.
It did not rise by 0%. Further, in the MIL-107 test, one cycle of (air cooling at −65 ° C. for 30 minutes) / (air heating at 125 ° C. for 30 minutes) is 20 cycles.
Even after the 0-cycle test, the increase in electrical resistance is 1
It did not exceed 0%.

【0026】実施例2 非貫通穴に浸み出した絶縁性接着層樹脂7のレーザー照
射除去後に、エキシマレーザー加工機であるNLE−1
A21/10C(日立精工株式会社製、商品名)での、
エキシマレーザー照射(平均出力50W、スキャン速度
200mm/分)を行ったこと以外、実施例1と同様に
行い、多層プリント配線板を得た。この多層プリント配
線板においては、(260℃のホットオイル10秒浸
漬)/(20℃の水20秒浸漬)を1サイクルとするホ
ットオイル試験で、50サイクルの試験を行った後で
も、電気抵抗が10%上昇することはなかった。また、
(−65℃での気中冷却を30分間)/(125℃での
気中加熱を30分間)を1サイクルとする、MIL−1
07試験で、200サイクルの試験を行った後でも、電
気抵抗の上昇が10%を超えることはなかった。
Example 2 After removing the insulating adhesive layer resin 7 leached into the non-through hole by laser irradiation, the excimer laser processing machine NLE-1 was used.
A21 / 10C (Hitachi Seiko Co., Ltd., trade name)
A multilayer printed wiring board was obtained in the same manner as in Example 1 except that irradiation with an excimer laser (average output: 50 W, scan speed: 200 mm / min) was performed. In this multi-layer printed wiring board, even after a test of 50 cycles in a hot oil test in which (soaked in hot oil at 260 ° C. for 10 seconds) / (soaked in water at 20 ° C. for 20 seconds), the electric resistance was maintained. Did not rise by 10%. Also,
MIL-1 having a cycle of (air cooling at −65 ° C. for 30 minutes) / (air heating at 125 ° C. for 30 minutes) as one cycle.
In the 07 test, the increase in the electric resistance did not exceed 10% even after performing the test for 200 cycles.

【0027】実施例3 銅箔付き絶縁性接着フィルム3として、厚さ18μm銅
箔の粗化面に厚さ50μmのエポキシ系絶縁性接着剤を
塗布し、半硬化状態にしたMCF−3000E[HF]
(日立化成工業株式会社製、商品名)を用いた以外実施
例1と同様の操作を行い、多層プリント配線板を得た。
この多層プリント配線板においては、(260℃のホッ
トオイル10秒浸漬)/(20℃の水20秒浸漬)を1
サイクルとするホットオイル試験で、50サイクルの試
験を行った後でも、電気抵抗が10%上昇することはな
かった。また、(−65℃での気中冷却を30分間)/
(125℃での気中加熱を30分間)を1サイクルとす
る、MIL−107試験で、200サイクルの試験を行
った後でも、電気抵抗の上昇が10%超えることはなか
った。
Example 3 As an insulating adhesive film 3 with a copper foil, an epoxy insulating adhesive having a thickness of 50 μm was applied to a roughened surface of a copper foil having a thickness of 18 μm to form a semi-cured MCF-3000E [HF ]
A multilayer printed wiring board was obtained by performing the same operation as in Example 1 except that (trade name, manufactured by Hitachi Chemical Co., Ltd.) was used.
In this multilayer printed wiring board, (immersion in hot oil at 260 ° C. for 10 seconds) / (immersion in water at 20 ° C. for 20 seconds) is 1
The electrical resistance did not increase by 10% even after performing the 50-cycle test in the hot oil test as a cycle. Also, (air cooling at −65 ° C. for 30 minutes) /
In the MIL-107 test in which one cycle (heating in the air at 125 ° C. for 30 minutes) was performed for one cycle, the increase in electric resistance did not exceed 10% even after performing the test for 200 cycles.

【0028】比較例1 レーザー照射を行わず、浸み出した絶縁性接着層樹脂の
除去を行わなかったこと以外、実施例1と同様の操作を
行い、表層に非貫通穴を有する高密度の多層プリント配
線板を得た。この多層プリント配線板において、非貫通
穴の大きさは、開口部の直径が0.23mmであり、底
部の直径が0.05mmであって、(260℃のホット
オイル10秒浸漬)/(20℃の水20秒浸漬)を1サ
イクルとするホットオイル試験で、20サイクルの試験
を行った後に断線した。
COMPARATIVE EXAMPLE 1 The same operation as in Example 1 was performed except that laser irradiation was not performed and the leached insulating adhesive layer resin was not removed. A multilayer printed wiring board was obtained. In this multilayer printed wiring board, the size of the non-through hole is such that the diameter of the opening is 0.23 mm, the diameter of the bottom is 0.05 mm, and (immersion in hot oil at 260 ° C. for 10 seconds) / (20 In a hot oil test with 1 cycle of immersion in water at 20 ° C. for 20 seconds, the wire was disconnected after 20 cycles of the test.

【0029】[0029]

【発明の効果】以上に説明したとおり、本発明の多層プ
リント配線板の製造方法により、接続信頼性の良好な、
表層に非貫通穴を有する高密度の多層プリント配線板の
製造が可能である。
As described above, according to the method for manufacturing a multilayer printed wiring board of the present invention, good connection reliability can be obtained.
High-density multilayer printed wiring boards having non-through holes in the surface layer can be manufactured.

【図面の簡単な説明】[Brief description of the drawings]

【図1】(a)〜(e)は、それぞれ本発明の一実施例
における多層プリント配線板の各製造工程を示す断面図
である。
FIGS. 1A to 1E are cross-sectional views illustrating respective manufacturing steps of a multilayer printed wiring board according to an embodiment of the present invention.

【符号の説明】[Explanation of symbols]

1.銅箔 2.絶縁性接着層 3.銅箔付き絶縁性接着フィルム 4.非貫通穴とな
る穴 5.内層回路板 6.塑性流動する
シート 7.絶縁性接着層樹脂 11.貫通穴 12.内層回路 13.銅めっき
1. Copper foil 2. 2. Insulating adhesive layer 3. Insulating adhesive film with copper foil 4. Holes that become non-through holes Inner layer circuit board 6. 6. Plastically flowing sheet 10. Insulating adhesive layer resin Through hole 12. Inner layer circuit 13. Copper plating

───────────────────────────────────────────────────── フロントページの続き (72)発明者 田村 義広 茨城県下館市大字小川1500番地 日立化成 工業株式会社下館工場内 (72)発明者 津山 宏一 茨城県下館市大字小川1500番地 日立化成 工業株式会社下館工場内 (72)発明者 氏家 年美 茨城県下館市大字小川1500番地 日立化成 工業株式会社下館工場内 (72)発明者 川口 邦雄 茨城県下館市大字小川1500番地 日立化成 工業株式会社下館工場内 ────────────────────────────────────────────────── ─── Continuing on the front page (72) Inventor Yoshihiro Tamura 1500 Oji Ogawa, Shimodate City, Ibaraki Prefecture Inside the Shimodate Plant of Hitachi Chemical Co., Ltd. (72) Koichi Tsuyama 1500 Oji Ogawa Shimodate City, Ibaraki Prefecture Hitachi Chemical Co., Ltd. Inside the Shimodate Factory (72) Inventor Tomi Ujiya 1500 Ogawa, Oji, Shimodate City, Ibaraki Prefecture Inside the Shimodate Factory, Hitachi Chemical Co., Ltd. (72) Kunio Kawaguchi 1500 Oji Ogawa, Shimodate City, Ibaraki Prefecture, Shimodate Factory, Hitachi Chemical

Claims (6)

【特許請求の範囲】[Claims] 【請求項1】銅箔(1)の粗化面に、半硬化状態の絶縁性
接着層(2)を設けた銅箔付き絶縁性接着フィルム(3)に層
間接続の為の非貫通穴となる穴(4)をあけ、その銅箔付
き絶縁性接着フィルム(3)をその絶縁性接着層(2)が予め
準備した内層回路板(5)に接するように重ね、前記銅箔
付き絶縁性接着フィルム(3)の銅箔(1)の外側に、積層過
程で塑性流動するシート(6)を重ね、加熱加圧して積層
一体化し、非貫通穴となる穴(4)に浸み出した絶縁性接
着層樹脂(7)を、レーザー照射により除去し、貫通穴(1
1)をあけた後、スミア処理を行い、そして非貫通穴とな
る穴(4)の内壁にめっきを行って、内層回路(12)と銅箔
(1)とを電気的に接続することを特徴とする多層プリン
ト配線板の製造方法。
A non-through hole for interlayer connection is formed in an insulating adhesive film with copper foil provided with a semi-cured insulating adhesive layer on a roughened surface of the copper foil. A hole (4) is formed, and the insulating adhesive film with copper foil (3) is overlapped so that the insulating adhesive layer (2) is in contact with the prepared inner layer circuit board (5). On the outside of the copper foil (1) of the adhesive film (3), a sheet (6) that plastically flows in the laminating process was overlaid, laminated by laminating by heating and pressurizing, and leached into the hole (4) to be a non-through hole The insulating adhesive layer resin (7) is removed by laser irradiation, and the through-hole (1) is removed.
After drilling 1), perform smearing, and plating the inner wall of the hole (4), which will be a non-through hole, with the inner layer circuit (12) and copper foil
(1) A method for producing a multilayer printed wiring board, wherein the method is electrically connected to (1).
【請求項2】絶縁性接着層(2)として、数平均分子量が
100,000以上のハロゲン化高分子量エポキシ重合
体と、架橋剤と、多官能エポキシ樹脂とを構成成分とす
る、熱硬化性エポキシ樹脂組成物を用いることを特徴と
する請求項1に記載の多層プリント配線板の製造方法。
2. A thermosetting thermosetting resin composition comprising a halogenated high molecular weight epoxy polymer having a number average molecular weight of 100,000 or more, a crosslinking agent, and a polyfunctional epoxy resin as an insulating adhesive layer (2). The method for producing a multilayer printed wiring board according to claim 1, wherein an epoxy resin composition is used.
【請求項3】非貫通穴となる穴(4)の穴径が、300μ
m以下であることを特徴とする請求項1または2に記載
の多層プリント配線板の製造方法。
3. The non-through hole (4) has a hole diameter of 300 μm.
3. The method for manufacturing a multilayer printed wiring board according to claim 1, wherein m is equal to or less than m. 4.
【請求項4】前記積層過程で塑性流動するシート(6)
が、コア層とそのコア層を両面から挟む外層からなる三
層の構造であり、かつコア層の軟化点が130℃以下で
あることを特徴とする請求項1〜3のうちいずれかに記
載の多層プリント配線板の製造方法。
4. A sheet (6) plastically flowing in the laminating process.
Has a three-layer structure consisting of a core layer and an outer layer sandwiching the core layer from both sides, and the softening point of the core layer is 130 ° C. or lower, wherein the core layer has a softening point of 130 ° C. or less. Of manufacturing a multilayer printed wiring board.
【請求項5】レーザー照射による絶縁性接着層樹脂(7)
の除去後、さらにエキシマレーザーの照射を行うことを
特徴とする請求項1〜4のうちいずれかに記載の多層プ
リント配線板の製造方法。
5. Insulating adhesive layer resin by laser irradiation (7)
The method for producing a multilayer printed wiring board according to any one of claims 1 to 4, wherein excimer laser irradiation is further performed after the removal.
【請求項6】レーザー照射による絶縁性接着層樹脂(7)
の除去後のスミア処理を、2回以上行うことを特徴とす
る請求項1〜5のうちいずれかに記載の多層プリント配
線板の製造方法。
6. Insulating adhesive layer resin by laser irradiation (7)
The method for manufacturing a multilayer printed wiring board according to any one of claims 1 to 5, wherein the smear treatment after the removal is performed twice or more.
JP31505197A 1997-11-17 1997-11-17 Manufacture of multilayer printed wiring board Pending JPH11150369A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP31505197A JPH11150369A (en) 1997-11-17 1997-11-17 Manufacture of multilayer printed wiring board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP31505197A JPH11150369A (en) 1997-11-17 1997-11-17 Manufacture of multilayer printed wiring board

Publications (1)

Publication Number Publication Date
JPH11150369A true JPH11150369A (en) 1999-06-02

Family

ID=18060852

Family Applications (1)

Application Number Title Priority Date Filing Date
JP31505197A Pending JPH11150369A (en) 1997-11-17 1997-11-17 Manufacture of multilayer printed wiring board

Country Status (1)

Country Link
JP (1) JPH11150369A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8754337B2 (en) 2009-04-01 2014-06-17 Sumitomo Bakelite Co., Ltd. Printed wiring board fabrication method, printed wiring board, multilayer printed wiring board, and semiconductor package
CN109511225A (en) * 2018-09-25 2019-03-22 通元科技(惠州)有限公司 A kind of semi-metal hole Wiring board processing method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8754337B2 (en) 2009-04-01 2014-06-17 Sumitomo Bakelite Co., Ltd. Printed wiring board fabrication method, printed wiring board, multilayer printed wiring board, and semiconductor package
CN109511225A (en) * 2018-09-25 2019-03-22 通元科技(惠州)有限公司 A kind of semi-metal hole Wiring board processing method

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