JPH11150198A5 - - Google Patents
Info
- Publication number
- JPH11150198A5 JPH11150198A5 JP1997333453A JP33345397A JPH11150198A5 JP H11150198 A5 JPH11150198 A5 JP H11150198A5 JP 1997333453 A JP1997333453 A JP 1997333453A JP 33345397 A JP33345397 A JP 33345397A JP H11150198 A5 JPH11150198 A5 JP H11150198A5
- Authority
- JP
- Japan
- Prior art keywords
- region
- nonvolatile memory
- impurity
- drain region
- active region
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9333453A JPH11150198A (ja) | 1997-11-18 | 1997-11-18 | 不揮発性メモリ及び電子機器 |
| US09/192,745 US6686623B2 (en) | 1997-11-18 | 1998-11-16 | Nonvolatile memory and electronic apparatus |
| US10/694,477 US7535053B2 (en) | 1997-11-18 | 2003-10-27 | Nonvolatile memory and electronic apparatus |
| US12/427,140 US8222696B2 (en) | 1997-11-18 | 2009-04-21 | Semiconductor device having buried oxide film |
| US13/549,914 US8482069B2 (en) | 1997-11-18 | 2012-07-16 | Nonvolatile memory and electronic apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9333453A JPH11150198A (ja) | 1997-11-18 | 1997-11-18 | 不揮発性メモリ及び電子機器 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH11150198A JPH11150198A (ja) | 1999-06-02 |
| JPH11150198A5 true JPH11150198A5 (https=) | 2005-06-23 |
Family
ID=18266262
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9333453A Withdrawn JPH11150198A (ja) | 1997-11-18 | 1997-11-18 | 不揮発性メモリ及び電子機器 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH11150198A (https=) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4919549B2 (ja) * | 2000-07-21 | 2012-04-18 | 株式会社半導体エネルギー研究所 | 不揮発性メモリ及び半導体装置 |
| US6724037B2 (en) | 2000-07-21 | 2004-04-20 | Semiconductor Energy Laboratory Co., Ltd. | Nonvolatile memory and semiconductor device |
| TWI606512B (zh) * | 2012-12-27 | 2017-11-21 | 三菱綜合材料股份有限公司 | 電漿蝕刻裝置用矽構件及電漿蝕刻裝置用矽構件之製造方法 |
-
1997
- 1997-11-18 JP JP9333453A patent/JPH11150198A/ja not_active Withdrawn
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