JPH11135408A - 露光装置及びその扉開閉制御方法 - Google Patents

露光装置及びその扉開閉制御方法

Info

Publication number
JPH11135408A
JPH11135408A JP9311529A JP31152997A JPH11135408A JP H11135408 A JPH11135408 A JP H11135408A JP 9311529 A JP9311529 A JP 9311529A JP 31152997 A JP31152997 A JP 31152997A JP H11135408 A JPH11135408 A JP H11135408A
Authority
JP
Japan
Prior art keywords
door
exposure apparatus
main body
opening
apparatus main
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9311529A
Other languages
English (en)
Japanese (ja)
Other versions
JPH11135408A5 (enExample
Inventor
Takahiro Horikoshi
崇広 堀越
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP9311529A priority Critical patent/JPH11135408A/ja
Publication of JPH11135408A publication Critical patent/JPH11135408A/ja
Publication of JPH11135408A5 publication Critical patent/JPH11135408A5/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G03F7/70741—Handling masks outside exposure position, e.g. reticle libraries

Landscapes

  • Engineering & Computer Science (AREA)
  • Library & Information Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP9311529A 1997-10-27 1997-10-27 露光装置及びその扉開閉制御方法 Pending JPH11135408A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9311529A JPH11135408A (ja) 1997-10-27 1997-10-27 露光装置及びその扉開閉制御方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9311529A JPH11135408A (ja) 1997-10-27 1997-10-27 露光装置及びその扉開閉制御方法

Publications (2)

Publication Number Publication Date
JPH11135408A true JPH11135408A (ja) 1999-05-21
JPH11135408A5 JPH11135408A5 (enExample) 2005-07-07

Family

ID=18018341

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9311529A Pending JPH11135408A (ja) 1997-10-27 1997-10-27 露光装置及びその扉開閉制御方法

Country Status (1)

Country Link
JP (1) JPH11135408A (enExample)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002203775A (ja) * 2000-12-28 2002-07-19 Nikon Corp 露光装置
JP2002353097A (ja) * 2001-05-22 2002-12-06 Nikon Corp 除電装置及び露光装置
CN112835267A (zh) * 2019-11-25 2021-05-25 佳能株式会社 曝光装置以及物品制造方法
WO2022052614A1 (zh) * 2020-09-11 2022-03-17 长鑫存储技术有限公司 曝光机台的门板密闭监测系统、方法、装置、介质和设备

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002203775A (ja) * 2000-12-28 2002-07-19 Nikon Corp 露光装置
JP2002353097A (ja) * 2001-05-22 2002-12-06 Nikon Corp 除電装置及び露光装置
CN112835267A (zh) * 2019-11-25 2021-05-25 佳能株式会社 曝光装置以及物品制造方法
WO2022052614A1 (zh) * 2020-09-11 2022-03-17 长鑫存储技术有限公司 曝光机台的门板密闭监测系统、方法、装置、介质和设备
US12203312B2 (en) 2020-09-11 2025-01-21 Changxin Memory Technologies, Inc. System, method, and device for monitoring closed state of cover of exposure machine, medium, and equipment

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