JPH11135408A - Aligner and method for controlling opening/closing of door - Google Patents

Abstract

PROBLEM TO BE SOLVED: To open chamber doors at appropriate timings, and avoid inconveniences such as stop of a device which is ascribable to opening of the doors in an aligner provided with a chamber or the like having a given number of doors, by arranging a display device for displaying allowance for door opening. SOLUTION: An aligner 10 includes an aligner body 14 for irradiating a mask R with an aligning beam emitted from a beam source to transfer a pattern formed on the mask R to a sensitive substrate W, a chamber 12 accommodating the aligner body 14 and having one or more doors 22 24, and a display device 34 for displaying allowance of the opening of doors. Since the arranged display device 34 displays the opening allowance only when there is no hindrance, to open, the doors may be opened at appropriate timings. In the case the reticle door 22 or the wafer door 24 is opened during the operation of the aligner 10 without a door-opening-demand button 30 being pushed, aligning operation is instantly stopped.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an exposure apparatus and a door opening / closing control method, and more particularly, to an exposure apparatus for irradiating a mask with an exposure beam from a beam source and transferring a pattern formed on the mask onto a sensitive substrate. The present invention relates to an exposure apparatus including an apparatus main body and a chamber for accommodating the exposure apparatus main body, and a method for controlling opening and closing of a door of the chamber.

[0002]

2. Description of the Related Art In an exposure apparatus such as a stepper used in a lithography process in the manufacture of a semiconductor device, a liquid crystal display device, or the like, a pattern of a mask or a reticle (hereinafter, collectively referred to as a "reticle") is formed on a substrate such as a wafer or a glass plate. An exposure apparatus main body that is transferred onto a wafer (hereinafter, referred to as a “wafer”) is usually installed in an ultra-clean room, and the interior space is highly dust-proof, and an environmental chamber (hereinafter, referred to as a high-precision temperature control). , "Chamber").

In such an exposure apparatus, for example, when a reticle is set in a reticle cassette or when a reticle set in the reticle cassette is taken out, etc.
It is necessary to open the door of the chamber.However, if a conventional exposure apparatus opens the door during operation, the operation of the exposure apparatus will start at the moment when the control system of the apparatus recognizes that the door has been opened. Even in such a case, an interlock control method in which the operation of the apparatus is stopped has been adopted.

[0004]

In the exposure apparatus employing the above-described conventional interlock control method, there is an inconvenience that if the timing of opening the door of the chamber is bad, various problems will occur. That is, when the door is opened, the operation of the exposure apparatus stops at the moment of opening, for example,
If the door is inadvertently opened while the pattern is being transferred to a certain shot area on the wafer (during the exposure), the operation stops in an insufficiently exposed state, and a defective exposure shot occurs. Will be processed. In this case, there is a disadvantage that one wafer on which an exposure failure shot has occurred becomes useless and the operation is restarted from the beginning after the operation is restarted, so that the throughput is obviously reduced.

The present invention has been made in view of the disadvantages of the related art, and a first object of the present invention is to provide an exposure apparatus capable of opening a chamber door at an appropriate timing.

It is a second object of the present invention to provide a door opening / closing control method capable of avoiding in advance the inconvenience caused by stopping the apparatus by opening the door of the chamber.

[0007]

According to the first aspect of the present invention, a mask (R) is irradiated by an exposure beam from a beam source, and a pattern formed on the mask is transferred onto a sensitive substrate (W). An exposure apparatus main body (14) and a chamber (12) that houses the exposure apparatus main body and has at least one door (22, 24). A display device (34) is provided.

According to this, since the display device for displaying the permission to open the door is provided, the permission to open the door is displayed on the display device only when there is no problem in opening the door. The door can be opened at an appropriate timing when the opening permission is displayed.

In this case, it is determined whether or not the exposure beam is being emitted, and when the emission of the exposure beam is stopped, the display device (34). A display control device (40) for displaying permission to open the doors (22, 24) may be further provided. In such a case, when the emission of the exposure beam is stopped, the display control device displays the permission to open the door using the display device, so that the exposure permission may be displayed when the exposure is being performed. In other words, it is possible to prevent the door from being accidentally opened during the exposure, thereby causing inconvenience such as damaging the sensitive substrate.

In the exposure apparatus according to the first aspect, the alignment system (ALG) for irradiating the sensitive substrate with an alignment beam in order to align the sensitive substrate may be further provided as in the third aspect of the present invention. A display control device (40) for determining whether or not the alignment beam is being irradiated, and displaying permission to open the door by the display device when the alignment beam is not being irradiated. May be. In such a case, when the alignment beam is not irradiated, the display control device displays a permission to open the door using the display device. Therefore, the door is opened during the alignment, and the alignment measurement is restarted from the beginning. Inconveniences such as a decrease in throughput and a decrease in alignment measurement accuracy can be avoided.

Further, in the exposure apparatus according to the first aspect, the doors (22, 2
4) a detecting device (26, 28) for detecting the opening / closing state;
The exposure apparatus main body (1) according to the detection result of the detection apparatus
A control device (40) for controlling the operation of 4) may be further provided. In such a case, for example, when the permission to open the door is not displayed on the display device, the detection device detects this when the door is opened, and the control device detects the opening of the door in accordance with the detection result. Control to stop the operation can be performed.

Further, in the exposure apparatus according to the first aspect, the doors (22, 2
Open request input device (3) for inputting the open request of 4)
0) and; when a request to open the door is input by the opening request input device, the operation state of the exposure apparatus main body (14) is detected, and the display device is displayed in accordance with the operation state of the exposure apparatus main body. A display control device (40) for displaying permission or prohibition of opening of the door according to (34) may be further provided. In such a case, when a door opening request is input by the opening request input device and the operation state of the exposure apparatus main body is a state in which the opening of the door may be permitted, the display control device uses the display device. Is displayed, and if the operation state of the exposure apparatus main body cannot permit the opening of the door, the display control device displays the inhibition of the opening of the door using the display device. Therefore, by opening the door only when the permission to open the door is displayed, the door can be opened at an appropriate timing.

Further, in the exposure apparatus according to the first aspect, the doors (22, 2
Open request input device (3) for inputting the open request of 4)
0) and; when a request to open the door is input from the opening request input device, the operation of the exposure apparatus main body (14) is continued until a predetermined state is reached, and when the predetermined state is reached, A control device (40) for interrupting the operation of the exposure apparatus main body; display control for displaying permission to open the door by the display device (34) when the operation of the exposure apparatus main body is interrupted by the control device. An apparatus (40) may be further provided. In such a case, when a request to open the door is input by the opening request input device, the control device does not immediately stop the operation of the exposure apparatus main body, but in a predetermined state, for example, a state in which even if the operation is interrupted, the operation is not affected later. And the operation of the exposure apparatus main body is interrupted when the operation reaches the predetermined state. In this case, when the operation of the exposure apparatus main body is interrupted by the control device, the display control device uses the display device to display a permission to open the door. Therefore, it is possible to avoid inconveniences such as the failure of one substrate due to the inadvertent interruption of the operation of the exposure apparatus main body. To open the door.

Further, in the exposure apparatus according to the first aspect, the doors (22,
4) a detecting device (26, 28) for detecting the opening / closing state;
A restart request input device (32) for inputting a restart request of the operation of the exposure apparatus main body when the operation of the exposure apparatus main body (14) is interrupted; and the door being closed by the detection device. And a control device (40) for restarting the operation of the exposure apparatus main body when a request to restart the operation of the exposure apparatus main body is input from the restart request input device.

In such a case, when a request to restart the operation of the exposure apparatus main body is input from the restart request input device and the detection device detects that the door is closed, the control device controls the exposure device main body. Operation resumes. Therefore, when the operation of the exposure apparatus is interrupted, the operation can be restarted as necessary.

The invention described in claim 8 is the first invention.
2. The exposure apparatus according to claim 1, wherein a detection device (26, 28) for detecting an opening / closing state of the door (22, 24); and an opening request input device (30) for inputting a request to open the door.
And when the door opening request is input from the opening request input device, the operation of the exposure apparatus main body (14) is continued until a predetermined state is reached, and when the predetermined state is reached, A control device (40) for storing the operation state of the exposure apparatus main body and suspending the operation after the operation state is stored; and a restart for inputting a request to restart the operation of the exposure apparatus main body when the operation of the exposure apparatus main body is suspended. A request input device (32), wherein the control device (40) detects that the door is closed by the detection device, and sends a request to restart the operation of the exposure apparatus body to the restart request input. The operation of the exposure apparatus main body is restarted from the operation next to the stored operation when input from the apparatus.

According to this, when a door opening request is input by the opening request input device, the control device does not immediately stop the operation of the exposure apparatus main body, but does not immediately affect the operation of the exposure device main body even if it is interrupted. The operation is continued until the state is not given, and when the operation reaches the predetermined state, the operation state of the exposure apparatus main body at that time is stored and then the operation is interrupted. During the interruption of the operation of the exposure apparatus main body, when the detection device detects that the door is closed, and when a request to restart the operation of the exposure apparatus main body is input from the restart request input device, the control is performed. The apparatus restarts the operation of the exposure apparatus main body from the operation next to the stored operation. Therefore, according to the invention described in claim 8,
Similarly to the invention according to claim 6, it is possible to avoid the occurrence of inconvenience such as the failure of one substrate due to inadvertent interruption of the operation of the exposure apparatus body, and it is not necessary to restart the operation from the beginning. It is possible to avoid unnecessary decrease in throughput. In this case,
Similarly to the invention described in claim 7, when the operation of the exposure apparatus main body is suspended, the display control device may use the display device to display the permission to open the door. By doing so, it is possible to open the door at an appropriate timing by opening the door when the permission to open the door is displayed.

According to a ninth aspect of the present invention, there is provided an exposure apparatus body (14) for irradiating a mask (R) with an exposure beam from a beam source and transferring a pattern formed on the mask onto a sensitive substrate (W). And a door opening / closing control method used in an exposure apparatus (10) including a chamber (12) having at least one door (22, 24), in which the exposure apparatus body is housed. According to the operation state of 14), permission to open the door is given to the chamber (1).
It is characterized in that it is displayed outside 2).

According to this, permission to open the door is displayed outside the chamber in accordance with the operation state of the exposure apparatus main body.
Opening permission can be displayed only when the operation state of the exposure apparatus body is such that the door can be opened. Therefore, by opening the door only when the opening permission is displayed, the door can be opened at an appropriate timing, and the above-described inconveniences caused by the stop of the apparatus due to the opening of the chamber door are provided. Can be avoided in advance.

In this case, various suitable timings for displaying the release permission may be considered. For example, the display may be performed when the exposure beam is not emitted as in the invention according to claim 10. Is desirable. Accordingly, it is possible to prevent occurrence of exposure failure due to opening of the door during exposure.

According to an eleventh aspect of the present invention, there is provided an exposure apparatus body (14) for irradiating a mask (R) with an exposure beam from a beam source and transferring a pattern formed on the mask onto a sensitive substrate (W). And a door opening / closing control method used in an exposure apparatus (10) including a chamber (12) that houses the exposure apparatus body (14) and has at least one door (22, 24). It is characterized in that the door can be opened according to the operation state of the apparatus main body. According to this, for example, only when there is no problem even if the door is opened, it is possible to open the door, and when there is a problem when opening the door, it is impossible to open the door, so at an appropriate timing Only the door can be opened.

[0022]

DESCRIPTION OF THE PREFERRED EMBODIMENTS One embodiment of the present invention will be described below with reference to FIG.
This will be described with reference to FIG.

FIG. 1 shows an exposure apparatus 10 according to one embodiment.
Is schematically shown. The exposure apparatus 10 is installed in an ultra-clean room, has a highly dustproof interior space, and has a highly accurate temperature controlled chamber 12.
And an exposure apparatus main body 14 housed inside the chamber 12 and transferring the pattern of the reticle R as a mask onto a wafer W as a sensitive substrate.

As the exposure apparatus main body 14, a so-called step-and-scan type reduction projection exposure apparatus is used. The exposure apparatus body 14 includes a light source such as an ArF excimer laser, a KrF excimer laser,
₂ Illumination system 15 including an exposure light source as a beam source such as an excimer laser, reticle stage RST, projection optical system P
L, a wafer stage WST, and the like.

The reticle R is sucked and held on the reticle stage RST by vacuum suction or the like, and is driven by a drive system (not shown) in a direction perpendicular to the plane of FIG. Similarly, wafer W is suction-held on wafer stage WST via a wafer holder (not shown) by vacuum suction or the like, and is driven by a drive system (not shown) in a horizontal plane orthogonal to the plane of FIG. 1. I have.

As the projection optical system PL, a reduction optical system having a projection magnification of, for example, 1/4 is used. On the side surface of the projection optical system PL, an alignment beam (not shown) on the wafer W is irradiated with an alignment beam in order to align the wafer W, and the position of the alignment mark is detected based on the reflected light. The system ALG is fixed. In the chamber 12, the reticle loader 1 is also provided.
6, a reticle cassette 18 and a wafer loader 20 are also stored.

The reticle door 2 is located in the chamber 12 at a position slightly above the center in the height direction and opposed to the reticle cassette 18.
2 are provided. The chamber 12 has a wafer door 2 at a position near the wafer loader 20 near the bottom.
4 is also provided. In the vicinity of the reticle door 22 and the wafer door 24, a reticle door open / close detector 26 and a wafer door open / close detector 28 are provided as detection devices for detecting the open / closed state of these doors 22, 24, respectively. Further, on the outer surface of the chamber 12, a door opening request button 30 as an opening request input device, an operation restart request button 32 as a restart request input device, a door opening permission / display as a display device are provided.
A prohibition display panel 34 is provided. Here, the door opening permission / prohibition display panel 34 is configured by a small liquid crystal display panel.

Next, the operation of the exposure step in the exposure apparatus 10 will be briefly described.

First, a wafer W to be exposed (one wafer may be used, but usually a plurality of wafers, and the following description is made on the assumption that there are a plurality of wafers) is placed in a wafer cassette (not shown).
Is opened and set on the wafer loader 20. Next, the reticle door 22 is opened, and the reticle R on which the pattern to be exposed is drawn is set in the reticle cassette 18. In addition,
A method for opening and closing the reticle door 22 during operation of the apparatus will be described later in detail.

Next, reticle R is set on reticle stage RST by reticle loader 16. Similarly, wafer W is set on wafer stage WST by wafer loader 20.

Next, a reticle microscope (not shown) and a wafer stage W (not shown) are controlled by a main controller 40 (see FIG. 2) described later.
After preparation work such as reticle alignment and baseline measurement is performed according to a predetermined procedure using a reference plate (not shown) on the ST and an alignment system ALG, an EGA (enhanced global alignment) is performed using an alignment optical system ALG. ) Is performed. After the completion of the alignment measurement, an exposure operation of a step-and-scan method is performed. That is, the reticle stage RST and the wafer stage WST are synchronously scanned in opposite directions along the scanning direction (the direction orthogonal to the paper surface of FIG. 1), and the illumination system 15 is synchronized in the middle at a constant speed.
Then, a predetermined slit area on the reticle R is irradiated with an exposure beam (generated by an exposure light source), and a pattern formed on the reticle R is sequentially transferred to a shot area on the wafer W, thereby performing scanning exposure. When the transfer of the reticle pattern to one shot area is completed, wafer stage WST steps by one shot in the non-scanning direction, and scanning exposure is performed on the next shot area in the scanning direction opposite to the previous one. Stepping and scanning exposure are sequentially repeated, and a required number of shot patterns are transferred onto the wafer W. This step-and-scan exposure operation is executed by a stage control system, an exposure control system, and the like under the control of the main controller 40.

When the exposure of one wafer W is completed, the exposed wafer W is returned to a wafer cassette (not shown) by the wafer loader 20. In the same manner, for the other wafers W, the operations after the operation of setting the above-mentioned wafer W on wafer stage WST are repeated.

In this case, when changing the pattern to be transferred, the reticle R set on the reticle stage RST is returned to the reticle cassette 18 by the reticle loader 16, and another reticle R set on the reticle cassette 18 is changed. The reticle is set on the reticle stage RST by the reticle loader 16, and the above operation is repeated.

Next, a method of controlling the opening and closing of the door during the operation of the exposure apparatus body 14 will be described in detail. Prior to the description of this control method, a main configuration of a control system related to door opening / closing control will be briefly described with reference to FIG.

This control system is mainly composed of a main controller 40 composed of a computer. A reticle door open / close detector 26, a wafer door open / close detector 28, a door open request button 30 and an operation restart request button 32 are connected to the input stage of the main controller 40.
A door opening permission / prohibition display panel 34 is connected to the 0 output stage. The main controller 40 controls the operation of each unit during the operation of the above-described exposure process.

Next, the opening / closing control of the door during operation of the apparatus will be described with reference to the flowchart of FIG. The control algorithm starts when the operation of the exposure apparatus 10 (exposure apparatus main body 14) is started.

First, at step 100, "door opening prohibition" is displayed on the door opening permission / prohibition display panel 34.

In the next step 102, it is determined whether or not the door opening request button 30 has been pressed, thereby waiting for a door opening request to be made. And door open request button 3
If 0 is pressed and the determination in step 102 is affirmed, the flow advances to step 104 to stop emission of both the exposure light (illumination beam) from the illumination system 15 and the alignment beam from the alignment system ALG. It is determined whether or not the exposure light and the alignment beam are both in the emission stop state. Then, when both the exposure light and the alignment beam are in the emission stop state and the determination in step 104 is affirmed, the process proceeds to the next step 106. For this reason, in the present embodiment, when the door open request button 30 is pressed during exposure (scanning exposure) of a certain shot area on the wafer W, the apparatus stops at that moment and the wafer W has an exposure failure. In the case where the occurrence does not result in a failure or the door opening request button 30 is pressed during the alignment, the apparatus is stopped at that moment and the alignment measurement result is not deteriorated.

At step 106, the operation state of the apparatus at that time is stored in an internal memory (not shown), and after the operation of the apparatus is stopped, the routine proceeds to step 110, where "door open permission" is displayed on the door open permission / prohibition display panel 34. Is displayed.

In the next step 112, it is determined whether at least one of the reticle door 22 and the wafer door 24 has been opened by monitoring the output states of the reticle door open / close detector 26 and the wafer door open / close detector 28. If this determination is denied, the routine proceeds to step 114, where it is determined whether or not a predetermined time has elapsed from the start of the "door open permission" display. That is, by repeating steps 112 and 114, while the "door open permission" is displayed for a certain period of time, it waits until at least one of the reticle door 22 and the wafer door 24 is opened. This is done when there is a door opening request and the door opening permission is displayed (step 102 →
Even in step 104 → step 106 → step 110 → step 112), the operator inadvertently presses the door open button 30 or the door open button 3
Since the user may change his mind after pressing 0, if the user waits for an excessively long time, the throughput is reduced more than necessary. This is to prevent such a situation from occurring in advance. Therefore, "door open permission"
If a certain period of time has passed since the display of
After restarting the operation at step 20, the process returns to step 100, and the “door opening permission” is displayed on the door opening permission / prohibition display panel 34.
Is displayed, and thereafter the above-described processing / judging operation is repeated.

The restart of the operation in step 120 is as follows.
Based on the information stored in the internal memory in step 106, the operation is performed from the next operation at the time of the stop. Therefore, when the operation is stopped at the end of the exposure of a certain shot area on the wafer W, the operation is restarted from the exposure operation of the next shot area, and the operation is stopped after the detection of a certain alignment mark during alignment. If so, the operation is restarted from the operation of detecting the next alignment mark. Therefore, in the present embodiment, for example, when the door opening request button 30 is pressed during the alignment and the apparatus is stopped, and the door is not opened during a certain waiting time and the operation is restarted, it is necessary to restart the alignment measurement from the beginning. In this respect, too, the unnecessary reduction of the throughput is prevented.

On the other hand, the doors (reticle door 22, wafer door 24)
Is opened, and if the determination in step 112 is affirmative, the process proceeds to step 116,
The output states of the reticle door open / close detector 26 and the wafer door open / close detector 28 are monitored to wait for both the reticle door 22 and the wafer door 24 to be in the “closed” state, and both the reticle door 22 and the wafer door 24 are closed. After confirming that the operation has been performed, the process proceeds to step 118. Step 118
Then, it is determined whether or not the operation restart request button 32 has been pressed to wait for an operation restart request. Then, the operation restart request button 32 is pressed, and
When the determination is affirmative, the routine proceeds to step 120, where the operation is resumed from the next operation at the time of the stop based on the information stored in the internal memory in step 106, and then the routine returns to step 100.

As is apparent from the above description, in this embodiment, the display control device and the control device are realized by the computer constituting the main control device 40 and its software (see FIG. 3).

Next, the opening and closing of the reticle door 22 during operation will be described, for example, when a reticle R is newly set in the reticle cassette 18 during the exposure operation, or when the reticle R set in the reticle cassette 18 is taken out. Will be described.

First, the operator looks at the door opening permission / prohibition display panel 34. Here, when the door opening permission is displayed (Step 110), the door 22 may be opened as it is. On the other hand, when the door opening prohibition is displayed (Step 100), the operator presses the door opening request button 30 (Step 102 → Step 104). Thus, for example, if a certain shot on the wafer W is being scanned and exposed, the exposure operation is interrupted when the exposure of the shot being completed is completed (steps 104 and 106), and the door opening permission / prohibition display panel is displayed. 34, a door open permission is displayed (step 110).

After confirming the display of "door open permission", the operator opens the reticle door 22 and sets the reticle R in the reticle cassette 18 (or takes out the reticle R). Thereafter, the operator closes the reticle door 22, confirms that the door 22 is closed, and presses the operation restart request button 32.

Thus, the operation of the exposure apparatus is restarted,
The door opening prohibition is displayed on the door opening permission / prohibition display panel 34 (step 116 → step 118, → step 1).
20 → Step 100).

Although not particularly described in the above description, a case where the reticle door 22 or the wafer door 24 is opened without pressing the door open request button 30 during the operation of the exposure apparatus 10 is described. Is similar to the conventional example in that the exposure operation is instantaneously stopped (having an interlock function).

As described above, according to the exposure apparatus 10 of the present embodiment, when the doors 22 and 24 need to be opened during the operation, the operator simply presses the door open request button 30 and the exposure apparatus 10 By stopping the operation at an appropriate timing on the side and pressing the operation restart request button 32, the operation can be restarted from the next operation at the time of the stop. Accordingly, even when the exposure apparatus 10 is in operation, even if the operation is interrupted and the operation involving opening and closing of the door is performed, the wafer is destroyed due to the occurrence of exposure failure, or the operation is restarted from the beginning, so that the throughput becomes unnecessary. There is no lowering.

In the above-described embodiment, the case where "door open permission" is displayed when the exposure light and the alignment beam are both stopped is described. However, the present invention is not limited to this. May be displayed on the screen.

In addition to this, the main control unit is controlled at an appropriate timing such that opening of the door does not adversely affect the apparatus, for example, during a certain period of time when the wafer is replaced, regardless of whether or not an operator requests a door to be opened. It is also possible for 40 to judge without permission and display “door open permission”.

In the above embodiment, the main controller 40
Describes a case in which “door opening permission” or “door opening prohibition” is displayed on the door opening permission / prohibition display panel 34 in accordance with the operation state of the exposure apparatus.
Alternatively, the main controller 40 may set the lock mechanism of the predetermined door to the release state or the non-release state according to the operation state of the exposure apparatus.

Further, in the above embodiment, the case where the liquid crystal display panel is used as the display device has been described. However, the present invention is not limited to this. Of course, a small CRT display may be used, or one or two types of lamps may be used. May be used. When only one type of lamp is used, the lamp may be turned on only when opening is permitted, or may be turned on only when opening is prohibited.

In the above embodiment, the case where the door opening request button 30 is provided as the opening request input device and the operation resumption request button 32 is provided as the resuming request input device has been described. For example, it is of course possible to use a keyboard or the like.

In the above embodiment, the case where the main body of the exposure apparatus is a scanning exposure apparatus of the step-and-scan type has been described. However, the present invention is not limited to this. Even in this case, the present invention can be suitably applied as long as the apparatus must be emergency stopped when the chamber door is suddenly opened and closed.

[0056]

As described above, according to the first to eighth aspects of the present invention, there is provided an unprecedented excellent exposure apparatus in which the door of the chamber can be opened at an appropriate timing. be able to.

According to each of the ninth to eleventh aspects of the present invention, there is provided a door opening / closing control method capable of avoiding inconvenience caused by stopping the apparatus by opening a chamber door in advance.

[Brief description of the drawings]

FIG. 1 is a view schematically showing a configuration of an exposure apparatus according to one embodiment.

FIG. 2 is a block diagram illustrating a main configuration of a control system related to door opening / closing control.

FIG. 3 is a flowchart showing a main control algorithm of the main control device of FIG. 2;

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 10 Exposure apparatus 12 Chamber 14 Exposure apparatus main body 22 Reticle door 24 Wafer door 26 Reticle door open / close detector (detection apparatus) 28 Wafer door open / close detector (detection apparatus) 30 Door open request button (open request input apparatus) 32 Operation restart request Button (restart request input device) 34 Door open / close display panel (display device) 40 Main controller (display controller, controller) R Reticle (mask) W Wafer (sensitive substrate) ALG alignment system

Claims (11)

[Claims] 1. An exposure apparatus main body that irradiates a mask with an exposure beam from a beam source and transfers a pattern formed on the mask onto a sensitive substrate, the exposure apparatus main body is housed, and at least one door is provided. An exposure apparatus, comprising: a chamber having: a display device that displays permission to open the door. 2. A display control device for judging whether or not the exposure beam is being emitted, and when the emission of the exposure beam is stopped, displaying a permission to open the door by the display device is further provided. The exposure apparatus according to claim 1, wherein: 3. An alignment system for irradiating the sensitive substrate with an alignment beam to align the sensitive substrate, wherein it is determined whether or not the alignment beam has been irradiated, and the alignment beam has been irradiated. The exposure apparatus according to claim 1, further comprising a display control device that displays permission to open the door by the display device when the display device does not exist. 4. A detection device for detecting an opening / closing state of the door; and a control device for controlling an operation of the exposure device main body according to a detection result of the detection device. Item 1. The exposure apparatus according to Item 1. 5. An opening request input device for inputting a request to open the door, and detecting an operation state of the exposure apparatus main body when the request to open the door is input from the opening request input device. 2. The exposure apparatus according to claim 1, further comprising: a display control device that displays permission or prohibition of opening of the door by the display device according to an operation state of the exposure device main body. 6. An opening request input device for inputting the door opening request; and when the door opening request is input from the opening request input device, the operation of the exposure apparatus main body is set to a predetermined state. A control device that interrupts the operation of the exposure apparatus main body when the predetermined state is reached; and the display device controls the door when the operation of the exposure apparatus main body is interrupted by the control device. 2. The exposure apparatus according to claim 1, further comprising a display control device for displaying a permission to open the device. 7. A detection device for detecting the opening / closing state of the door; a restart request input device for inputting a restart request for the operation of the exposure apparatus main body when the operation of the exposure apparatus main body is interrupted; A control device for detecting that the door is closed by the detection device and resuming the operation of the exposure apparatus main body when a request to restart the operation of the exposure apparatus main body is input from the restart request input device. The exposure apparatus according to claim 1, further comprising: 8. A detection device for detecting an opening / closing state of the door; an opening request input device for inputting a request to open the door; and a case where a request to open the door is input from the opening request input device. A control device for continuing the operation of the exposure apparatus main body until a predetermined state is reached, and storing the operation state of the exposure apparatus main body at that time when the predetermined state is reached; A restart request input device for inputting a restart request of the operation of the exposure apparatus main body when the operation of the main body is interrupted, wherein the control device detects that the door is closed by the detection device. And when the request to restart the operation of the exposure apparatus main body is input from the restart request input device, restarting the operation of the exposure apparatus main body from the operation following the stored operation. An apparatus according to claim 1, symptoms. 9. An exposure apparatus main body for irradiating a mask with an exposure beam from a beam source and transferring a pattern formed on the mask onto a sensitive substrate, and the exposure apparatus main body is housed and at least one door is provided. A door opening / closing control method used for an exposure apparatus having a chamber having: a door opening / closing control method, wherein a permission to open the door is displayed outside the chamber in accordance with an operation state of the exposure apparatus main body. . 10. The door opening / closing control method according to claim 9, wherein the display is performed when the exposure beam is not emitted. 11. An exposure apparatus main body for irradiating a mask with an exposure beam from a beam source and transferring a pattern formed on the mask onto a sensitive substrate, and the exposure apparatus main body is housed and at least one door is provided. A door opening / closing control method used in an exposure apparatus having a chamber having: a door opening / closing control method, wherein the door can be opened in accordance with an operation state of the exposure apparatus main body.