JP2002353097A - Destaticizing apparatus and exposure apparatus - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a destaticizing apparatus which can surely destaticize a substrate, while maintaining safety, and to provide an exposure apparatus. SOLUTION: The exposure device S comprises an exposure apparatus body EX for irradiating a photosensitive substrate P with an exposure light EL, a chamber C1 for housing the body EX and having openable and closable doors 20 and 21, a soft X-ray ionizer 10 for irradiating the substrate P with soft X-rays in the chamber C1 and a lamp 70 provided out of the chamber C1, to display the body EX and the operating state of the ionizer 10.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a static eliminator for removing static electricity charged on a member using soft X-rays and an exposure apparatus having the static eliminator.

[0002]

2. Description of the Related Art Conventionally, various exposure apparatuses have been used in a photolithography process for manufacturing a liquid crystal display element, a semiconductor element, a thin film magnetic head, and the like. A mask or reticle (hereinafter, referred to as “mask”) is illuminated, and an image of a pattern formed on the mask is projected via a projection optical system onto a photosensitive substrate having a surface coated with a photosensitive agent such as a photoresist. An exposure apparatus that performs exposure is generally used. Such an exposure apparatus includes an exposure apparatus main body that exposes a pattern of a mask onto a photosensitive substrate, a mask transport system that loads and unloads a mask with respect to the exposure apparatus main body, and a photosensitive substrate that loads and unloads a photosensitive substrate with respect to the exposure apparatus body. It is composed of a plurality of devices such as a substrate transport system for unloading, a control system for controlling the operation of the exposure apparatus body and the transport system, and these are housed in a chamber and air-conditioned by an air-conditioning system. The chamber accommodating the exposure apparatus main body has a chamber door for allowing access to the exposure apparatus main body at the time of maintenance and the like, and a mask replacement door provided near a mask holder for replacing a mask. ing.

In performing the exposure process, the photosensitive substrate is transferred to a temperature control holder for performing temperature control by a substrate transfer system, and is temperature-controlled. Then, the photosensitive substrate is transferred to a substrate holder of an exposure apparatus main body. Exposure light is emitted while being placed. Then, the photosensitive substrate that has been subjected to the exposure processing is carried out of the substrate holder. At the time of carrying out, there is a case where peeling charging occurs between the substrate holder and the photosensitive substrate. Similarly, the photosensitive substrate may be charged when it is carried out of the temperature control holder. There is a problem that foreign matter such as dust adheres to the charged photosensitive substrate or that the element is broken down. Therefore, it is necessary to remove static electricity charged on the photosensitive substrate.

When removing static electricity charged on a substrate,
2. Description of the Related Art In recent years, a static eliminator for irradiating a substrate with soft X-rays to ionize a gas around the substrate to eliminate static electricity has been used. The static eliminator using soft X-rays is arranged near the substrate holder or the temperature control holder in the chamber, and irradiates the photosensitive substrate with soft X-rays to neutralize the photosensitive substrate.

[0005] A static eliminator using soft X-rays is advantageous in that precise static elimination is possible and induced charges are hardly generated in the surroundings, but has a risk of adversely affecting the human body. Therefore, an exposure apparatus having a static eliminator using soft X-rays employs a so-called interlock mechanism in which the operation of the static eliminator is stopped when the chamber door or the mask replacement door provided in the chamber is opened. ing.

Conventionally, in the above-described exposure apparatus, when the chamber door is opened, almost all of the operation of the exposure apparatus main body, the mask transport system, the substrate transport system, the static eliminator, etc., which are housed in the chamber, are performed. Is set to stop. On the other hand, when the mask replacement door is opened, only the operation of the static eliminator is stopped. That is, when only the mask replacement door is opened, the static eliminator is stopped to avoid danger to the human body, but the exposure apparatus body, the mask transport system, and the substrate transport system are required to improve productivity. It is set not to stop.

[0007]

As described above, when only the mask replacement door is opened, the exposure apparatus main body and the transport system operate, but the static eliminator stops. Device manufacturing (exposure processing) continues without being performed. That is, there is a risk that the device manufacturing process may proceed or elements may be broken down in a state where foreign matter such as dust adheres to the photosensitive substrate, resulting in a decrease in productivity. Therefore, by grasping whether or not the static eliminator provided in the chamber is operating, if the static eliminator is stopped, it is possible to efficiently perform the recovery process and the like to perform the static elimination process reliably. Conventionally, there has been no effective means for safely checking the operation state of the static eliminator.

[0008] The present invention has been made in view of such circumstances, and a static eliminator capable of reliably performing a static elimination process on a substrate while maintaining safety, and providing a desired quality by using the static eliminator. It is an object of the present invention to provide an exposure apparatus which can manufacture devices having high productivity.

[0009]

In order to solve the above-mentioned problems, the present invention employs the following structure corresponding to FIGS. 1 to 6 shown in the embodiments. The static elimination device (1) of the present invention
0, 35) is a static eliminator for irradiating a predetermined member (P) with soft X-rays to eliminate static electricity of the predetermined member (P).
An irradiation unit (11, 3) that irradiates a predetermined member (P) with soft X-rays
6) and a display unit (70) provided outside the static eliminator (10, 35) and displaying the operation status of the irradiation units (11, 36).

According to the present invention, the operation of the irradiating section for irradiating soft X-rays can be confirmed by the display section provided outside the static eliminator. Therefore, it is possible to safely check the operation of the irradiation unit without approaching the irradiation unit. Further, if the operation of the irradiation unit is stopped, a predetermined process such as a return process can be efficiently performed. Therefore, static elimination processing for the member can be reliably performed.

The exposure apparatus (S) of the present invention accommodates an exposure apparatus main body (EX) for irradiating a substrate (P) with exposure light (EL), and an openable and closable door portion (EX). 20,
21), an irradiation apparatus (10, 11, 35, 36) for irradiating the substrate (P) with soft X-rays, and an exposure apparatus provided outside the chamber (C1). , Exposure apparatus body (EX) and irradiation device (1
(0, 11, 35, 36).

According to the present invention, the operation status of the exposure apparatus main body and the soft X-ray irradiation apparatus can be confirmed by a display device provided outside the chamber.
Therefore, it is possible to safely check the operation of the irradiation device without approaching the irradiation device. Further, if the operation of the irradiation device is stopped, a predetermined process such as a return process can be efficiently performed. Therefore, static elimination processing can be reliably performed on the substrate, and a device having desired quality can be manufactured with high productivity.

[0013]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, a static elimination apparatus and an exposure apparatus according to the present invention will be described with reference to the drawings. FIGS. 1A and 1B are schematic configuration diagrams showing a device manufacturing system including an exposure apparatus of the present invention, wherein FIG. 1A is a diagram viewed from above, and FIG. 1B is a side view. 2 is a schematic configuration diagram of the exposure apparatus (exposure device main body) viewed from the side, FIG. 3 is a schematic configuration diagram of the temperature control device viewed from the side, and FIG. 4 is a block diagram illustrating a control system. In the following description, the direction of the optical axis of the projection optical system in the exposure apparatus main body is defined as a Z direction, and directions orthogonal to the Z direction are defined as an X direction and a Y direction, respectively. The rotation directions around the respective axes are denoted by θZ, θX, and θY.

In FIG. 1, a device manufacturing system SY
S exposes the photosensitive substrate P by irradiating the substrate (glass plate) with a coater (coating device) C for applying a resist (photosensitive agent) and the substrate (photosensitive substrate) P coated with the resist with exposure light. Exposure apparatus body EX, and a developer (developing apparatus) D for developing the exposed photosensitive substrate P
And The exposure apparatus main body EX is housed in the chamber C1, and includes a coater C and a developer D (hereinafter, referred to as a developer C).
"Coater / Developer C / D") is chamber C
2 housed. Chamber C1 and chamber C2
Openings K1 and K2 are formed in portions facing each other. A first door (shutter) T1 that can be opened and closed is provided in the opening K1 on the chamber C1 side, and an opening K2 on the chamber C2 side. Is a second door (shutter) T2 that can be opened and closed.
Is provided.

In the chamber C2, the substrate P coated with the resist in the coater C is transferred to the exposure apparatus main body EX through the openings K1 and K2, and the exposure apparatus main body EX is opened.
Receiving the photosensitive substrate P after the exposure processing from the side
Is provided. Chamber C
In 1, a transfer device (substrate transfer system) for transporting the photosensitive substrate P coated with a resist and before the exposure processing to the exposure apparatus main body EX and transporting the exposed photosensitive substrate P from the exposure apparatus main body EX. H1 is provided. A temperature controller E for controlling the temperature of the photosensitive substrate P is provided in the chamber C1. The exposure apparatus S includes an exposure apparatus main body EX and a chamber C1 that houses the exposure apparatus main body EX.

Each of the transfer devices H1 and H2 is constituted by, for example, an articulated robot arm, and is provided with a suction holding section for suction holding the photosensitive substrate P at a tip portion. Each of the transfer devices H1 and H2 is a vacuum pump (not shown) connected to the suction holding unit.
The photosensitive substrate P is sucked and held / released by driving / stopping. Each of the transfer devices H1 and H2 is provided so as to be pivotable in the θZ direction and to be able to expand and contract joints, so that the held photosensitive substrate P can be transferred to an arbitrary position.

When the photosensitive substrate P is transported between the chambers C1 and C2 via the openings K1 and K2, it is transported via the temperature control device E. That is, the coater / developer C
The transfer device H2 on the / D side transfers the photosensitive substrate P received from the coater C via the openings K1 and K2 provided in the chambers C1 and C2, respectively.
Transport to The photosensitive substrate P transported to the temperature control device E is placed on the photosensitive substrate P for a predetermined time to control the temperature. The transport device H1 on the side of the exposure apparatus main body EX transports the photosensitive substrate P whose temperature has been adjusted by the temperature adjusting apparatus E to the exposure apparatus main body EX. The photosensitive substrate P after the exposure processing is exposed to the exposure apparatus main body EX by the transfer device H1.
And is mounted on the temperature control device E. Transfer device H2
Holds the exposed photosensitive substrate P placed on the temperature controller E and transports it to the developer D.

As shown in FIG. 2, the exposure apparatus main body EX includes:
The area of an illumination optical system IL that illuminates the mask M held by the mask holder MH with the exposure light (illumination light for exposure) EL and the area of an opening that is arranged in the illumination optical system IL and that allows the exposure light EL to pass therethrough is adjusted. A blind portion BL defining an illumination range of the lever M with respect to the mask M by the exposure light EL;
The image of the pattern of the mask M illuminated with L
The apparatus includes a projection optical system PL for projecting upward, a substrate holder PH for holding the photosensitive substrate P, and a substrate stage PST for supporting the substrate holder PH.

The illumination optical system IL includes an exposure light source 1, an elliptical mirror 2 for condensing a light beam emitted from the light source 1, and a light beam condensed by the elliptical mirror 2 and deflected by the first deflecting mirror 3. The input lens 4 converts the light beam into a uniform light beam, the fly-eye integrator 5 adjusts the light beam passing through the input lens 4 into a light beam having a substantially uniform illuminance distribution, and converts the light beam into exposure light EL. The exposure light EL from the fly-eye integrator 5 is collected and the mask M
And a condenser lens system 7 for illuminating the lens with uniform illuminance. Here, a mercury lamp is used as the exposure light source 1 in the present embodiment, and the exposure light EL is a g-line which is a wavelength required for exposure by a wavelength filter (not shown) arranged in the illumination optical system IL. (436 nm), h-line (40
5 nm), i-line (365 nm) and the like.

The mask holder MH has vacuum suction portions at four corners on its upper surface, and the mask M is held on the mask holder MH via the vacuum suction portion. The mask holder MH has an opening corresponding to the pattern area where the pattern of the mask M is formed, and can be finely moved in the X, Y, and θZ directions by a driving mechanism (not shown). The mask M is positioned so that the center of the region (mask center) passes through the optical axis AX of the projection optical system PL.

The substrate stage PST includes a substrate table PT on which a substrate holder PH is mounted, an X stage PX moving in the X direction integrally with the substrate table PT, and a Y stage with the X stage PX mounted. Y stage PY
And a base plate B that supports the Y stage PY. Each of the X stage PX and the Y stage PY is an X stage driving device such as a servomotor and a Y stage driving device PSTD (not shown in FIG. 2, see FIG. 4).
Move by. Further, the substrate stage PST is provided so as to be movable in the Z direction and the θZ direction, and is also provided so as to be movable in a direction inclined with respect to the optical axis AX. Position adjustment including leveling adjustment of the flexible substrate P is enabled.

The substrate holder PH has a groove for vacuum suction connected to a vacuum pump (not shown), and holds the photosensitive substrate P by vacuum suction. The substrate holder PH is provided with a plurality of lift pins (not shown) so that the photosensitive substrate P can be moved up and down with respect to the substrate holder PH. While the substrate holder PH is holding the photosensitive substrate P by vacuum suction,
The lift pins are stored in pin storage holes provided in the substrate holder PH. Then, the lift pins are connected to the photosensitive substrate P
Is raised while supporting the lower surface (the surface in the -Z direction) of the photosensitive substrate P, the photosensitive substrate P rises with respect to the substrate holder PH.

The position in the XY direction of the substrate holder PH on which the photosensitive substrate P is placed is detected by a laser interference system. The laser interference system uses the X of the substrate table PT.
X consisting of a plane mirror extending in the Y direction at the side end
The measuring mirror irradiates a length measuring beam to each of the moving mirror, the Y moving mirror formed of a plane mirror extending in the X direction at the end on the Y side of the substrate table PT, and the measuring beam to the X moving mirror and the Y moving mirror. Based on the substrate table PT (that is, the substrate holder P
An X-axis laser interferometer and a Y-axis laser interferometer (both not shown) for measuring the position of H) are provided. The position of the photosensitive substrate P placed on the substrate holder PH in the Z direction is detected by a multipoint focus position detection system, which is one of the oblique incidence type focus detection systems. The respective detection results of the laser interferometer and the multipoint focus position detection system are output to the control unit CONT. The control device CONT drives the substrate stage PST via the stage driving device based on the detection results of the laser interference system and the multipoint focus position detection system, and controls the position of the photosensitive substrate P.

In the vicinity of the substrate stage PST, a soft X-ray ionizer (static elimination device, irradiation device) 10 is provided. The soft X-ray ionizer 10 is provided with a +
Soft X-ray irradiator (irradiator, irradiator) 1 arranged on Y side and irradiating soft X-ray toward photosensitive substrate (predetermined member) P
1 and an ionizer controller 12 for controlling the output and operation of soft X-rays. The soft X-ray irradiator 11 is fixed on the + Y side of the substrate table PT, and
(Substrate holder PH). Soft X-ray irradiator 1
The soft X-ray emitted from 1 is irradiated toward the photosensitive substrate P or the mounting surface of the substrate holder H on which the photosensitive substrate P is mounted.

The soft X-ray ionizer 10 is a static eliminator using soft X-rays having a wavelength of 1.3 × 10 ^{−4 to} 4.1 × 10 ⁻⁴ μm different from the exposure light EL. The ionization effect of the soft X-ray generates high-concentration ions in a space within the irradiation range, thereby instantaneously removing static electricity from the charged object. When soft X-rays are emitted from the soft X-ray irradiation unit 11, soft X-rays are emitted.
Electrons are repelled from stable atoms and molecules on and around the optical path of the line to generate positive ions.
Then, the ejected electrons adhere to stable atoms and molecules to generate negative ions. Since the positive ions and the negative ions generated in such a uniform balance are generated in the vicinity of the soft X-ray and around the optical path, the positive ions and the negative ions generated in the vicinity of the photosensitive substrate P or The negative ions absorb the electric charge of the photosensitive substrate P and remove the charge of the photosensitive substrate P. on the other hand,
Other product ions return to the original stable state.

The ionizer control unit 12 controls the output and operation of soft X-rays, and includes a safety circuit, various display units and operation input units.
ON / OFF control as to whether or not soft X-rays are emitted from the camera. Further, the ionizer control unit 12 is connected to a control device CONT which is a main controller.

As shown in FIGS. 1 and 3, the temperature controller E
By mounting the photosensitive substrate P, the photosensitive substrate P
Temperature control holder 31 for adjusting the temperature to a predetermined temperature, temperature control holder 31
, Lift pins 32 for moving the photosensitive substrate P up and down
And a soft X-ray ionizer (static elimination device, irradiation device) 35 for irradiating the photosensitive substrate P with soft X-rays. The soft X-ray ionizer 35 is disposed on the + X side of the temperature control holder 31 and emits soft X-rays toward the photosensitive substrate P.
The apparatus includes a line irradiation unit (irradiation unit, irradiation device) 36 and an ionizer control unit 37 that controls the output and operation of soft X-rays.
The soft X-ray emitted from the soft X-ray irradiator 36 is irradiated toward the photosensitive substrate P or the mounting surface of the temperature control holder 31 on which the photosensitive substrate P is mounted.

As shown in FIGS. 1 and 2, the exposure apparatus main body E
A plurality of openings are formed on the −Y side of the chamber C1 containing X, and each of the openings is provided with an openable and closable chamber door (door part) 20 (20A, 20B, 20C);
A mask replacement door (door part) 21 (21A, 21B) is provided. An opening is also formed on the −Y side of the chamber C2 that houses the coater / developer C / D, and a second chamber door 23 that can be opened and closed is provided in this opening.

As shown in FIG. 1B, the chamber door 20
Are provided below (−Z direction) the −Y side surface of the chamber C1. The chamber door 20 allows access to the inside of the chamber C1 at the time of maintenance, for example, and is opened at the time of access. Of these, the chamber door 20A is provided near the temperature controller E, and the temperature controller E can be accessed by opening the chamber door 20A. Chamber door 20B,
The exposure apparatus main body 20C is provided near the exposure apparatus main body EX, and can access the exposure apparatus main body EX by opening the chamber doors 20B and 20C.

Each of the mask replacement doors 21 is provided above the + Y side surface (in the + Z direction) of the chamber C1. As shown in FIG. 2, the mask replacement door 21 is provided near the mask holder MH and allows access to a mask library (not shown) arranged in the chamber C1. Can be opened at the time.

The second chamber door 23 is connected to the
It is provided below the Y side surface (-Z direction). The second chamber door 23 allows access to the inside of the chamber C2 at the time of maintenance, for example, and is opened when accessing the coater / developer C / D.

Here, as shown in FIGS. 1 and 2, each of the chamber door 20 and the mask replacement door 21 is provided on the −Y side of the chamber C1, and the soft X-ray ionizer 10 is provided.
Is arranged at a position facing the soft X-ray irradiator 11. At this time, the chamber door 20, the mask replacement door 21, and the soft X-ray irradiator 11 are in a spatial relationship communicating spatially via the internal space of the chamber C <b> 1.
Similarly, the chamber door 20 and the mask replacement door 21 and the soft X-ray irradiator 36 of the temperature controller E have a spatial relationship in which they are spatially communicated via the internal space of the chamber C1.

Each of the chamber doors 20 has a chamber door sensor 40 for detecting whether the chamber door 20 is open or closed.
(40A, 40B, 40C) are provided. The door sensor 40 detects whether or not the chamber door 20 is open, and outputs a detection signal to the ionizer controllers 12 and 37. The ionizer controllers 12 and 37 are provided with door sensors 40A to
Based on the detection result of 40C, the chamber doors 20A to 20A
If it is determined that at least one of C is open, the soft X-ray irradiators 11 and 36 do not emit soft X-rays.
At this time, even when soft X-rays are being emitted from the soft X-ray irradiation units 11 and 36, the chamber doors 20A to 20A-2
If it is determined that at least one of the OCs is open,
The ionizer controllers 12, 37 stop emitting soft X-rays. That is, the soft X-ray irradiators 11 and 36 (soft X-ray ionizers 10 and 35) perform the irradiation operation in conjunction with the opening and closing of the chamber door 20.

Further, each detection signal of the chamber door sensor 40 provided in each of the chamber doors 20 is also output to a control device CONT, a stage driving device, a mask transport system, a substrate transport system, and the like. I have. These control devices, drive systems, and transport systems are door sensors 40A to 40C.
If it is determined that at least one of the chamber doors 20A to 20C is open based on the detection result of
Stop driving. That is, the exposure apparatus body EX also performs the exposure operation in conjunction with the opening and closing of the chamber door 20.

Each of the mask replacement doors 21 is provided with a mask replacement door sensor 41 (41A, 41B, 41C) for detecting the open / close state of the mask replacement door 21. The door sensor 41 detects whether the mask replacement door 21 is open and outputs a detection signal to the ionizer control unit 1.
2 and 37. The ionizer controllers 12, 37 are:
If it is determined that at least one of the mask replacement doors 21A, 21B is open based on the detection results of the door sensors 41A, 41B, the soft X-ray
Do not emit lines. At this time, even if soft X-rays are being emitted from the soft X-ray irradiation units 11 and 36,
If it is determined that at least one of the mask replacement doors 21A, 21B is open, the ionizer control units 12, 37
Stops soft X-ray emission. That is, the soft X-ray irradiator 1
Reference numerals 1 and 36 perform the irradiation operation in conjunction with opening and closing of the mask replacement door 21. On the other hand, the mask replacement door 2
When only 1 is opened, the operation of the exposure apparatus main body EX, the mask transport system, and the substrate transport system is set not to stop.

That is, in the exposure apparatus S, the chamber door 20
When the is opened, an interlock mechanism is employed in which almost all of the devices such as the exposure apparatus main body EX, the mask transport system, the substrate transport system, and the soft X-ray ionizers 10 and 35 which are housed in the chamber C1 are stopped. Have been. On the other hand, when the mask replacement door 21 is opened, only the operation of the soft X-ray ionizers 10 and 35 is set to stop, and in order to avoid the danger to the human body, the charge removal processing (soft X-ray ionizer) is performed. The line irradiation operation is stopped, but the exposure process is not stopped to improve productivity.

As described above, the soft X-ray ionizers 10, 35
Operate according to the open / close state of the chamber door 20 and the mask replacement door 21. The control device CONT stops the soft X-ray ionizers 10 and 35 when at least one of the plurality of chamber doors 20 and the mask replacement doors 21 is open, and all the doors are closed. In the state, the soft X-ray ionizers 10, 35 are operated.

As shown in FIG. 1B, the chamber door 20
Is provided with a lock unit (door opening / closing control unit) 50 for controlling opening / closing of the chamber door 20. The lock unit 50 operates based on an instruction from the control unit CONT, and holds the chamber door 20 closed while the soft X-ray ionizers 10, 35 are operating. That is, while the soft X-ray irradiators 11 and 36 are irradiating soft X-rays under the ionizer controllers 12 and 37, the ionizer controller 1
The control device CONT connected to 2 and 37 regulates the opening of the chamber door 20 using the lock unit 50. The lock unit 50 is formed of, for example, an electromagnet, and holds the chamber door 20 in a closed state when electric power is applied.

Similarly, each of the mask replacement doors 21 is provided with a lock unit (door open / close control unit) 51 for controlling opening and closing of the mask replacement door 21. The lock unit 51
The operation is performed based on an instruction from the control unit CONT, and the mask replacement door 21 is kept closed while the soft X-ray ionizers 10, 35 are operating.

As shown in FIGS. 1 and 2, an exposure apparatus main body EX and a soft X-ray ionizer 1 are provided outside a chamber C1.
Lamps for displaying the operation status of 0, 35 (display unit,
(A display device) 70 is provided. In the present embodiment, the lamp 70 includes a first lamp 70A and a second lamp 70.
B are provided. Each of the lamps 70A and 70B is connected to a control unit CONT connected to the ionizer control units 12 and 36, and operates based on an instruction from the control unit CONT.

The lamps 70A and 70B are
When the mask replacement door 21 is closed, the soft X-ray irradiators 11, 36 (soft X-ray ionizers 10, 35)
Displays the operation status of. The first lamp 70A is provided with a soft X-ray irradiator 36 provided on the temperature control holder 31 of the temperature controller E.
Are turned on in the operating state, and are turned off when the soft X-ray irradiating section 36 is stopped. The second lamp 70B is turned on when the soft X-ray irradiator 11 provided on the substrate holder PH of the exposure apparatus main body EX is in operation,
The soft X-ray irradiator 11 is set to be turned off when stopped. When the chamber door 20 or the mask replacement door 21 is open, the lamps 70A and 70B change the operation status of the soft X-ray irradiators 11 and 36 to the chamber door 20 and the mask replacement door, as described later. The display content is different from the display content in the state in which 21 is closed. That is, the display contents of the lamps 70A and 70B are changed according to the open / close state of the chamber door 20 and the mask replacement door 21.

Incidentally, the soft X-ray irradiators 11 and 36 are set to operate at a predetermined timing. For example, the soft X-ray irradiator 11 provided in the substrate holder PH of the exposure apparatus main body EX performs an irradiation operation when the photosensitive substrate P exposed by the exposure apparatus main body EX is carried out of the substrate holder PH. Specifically, when the photosensitive substrate P is carried out of the substrate holder PH, the soft X-ray irradiator 11 uses the lift pins provided on the substrate holder PH to move the substrate holder P
The soft X-ray is irradiated toward the photosensitive substrate P at a timing away from the mounting surface of H. In other words, the soft X-ray irradiating unit 11 moves the soft X-rays toward the photosensitive substrate P so that the peeling charge generated on the photosensitive substrate P when the photosensitive substrate P is separated from the mounting surface of the substrate holder PH is removed. Is irradiated. Similarly, the soft X-ray irradiator 3 provided on the temperature control holder 31 of the temperature control device E
Reference numeral 6 performs an irradiation operation when the photosensitive substrate P whose temperature has been adjusted by the temperature adjustment device E is carried out from the temperature adjustment holder 31. Specifically, when the photosensitive substrate P is carried out of the temperature control holder 31,
The soft X-rays are emitted toward the photosensitive substrate P at a timing at which the lift pins 32 provided on the temperature control holder 31 leave the mounting surface of the temperature control holder 31.

At this time, the second lamp 70B is controlled by the timing at which the soft X-ray
It is set to start blinking from a point in time when a predetermined time has elapsed. In other words, the second lamp 70B can display that the soft X-ray irradiator 11 is in an operable state at the timing of irradiating the soft X-ray, and by blinking,
It is possible to display a "static elimination processing reserved state" in which the soft X-ray irradiating section 11 will soon emit soft X-rays. Similarly, the first lamp 70A outputs the soft X-ray
Blinking is set to start at a point in time when the line is irradiated and a predetermined time earlier. That is,
The first lamp 70A can display that the soft X-ray irradiator 36 is in an operable state with respect to the timing of irradiating the soft X-ray, and by blinking, the soft X-ray irradiator 36
It is possible to display a “static-reservation processing reserved state” in which soft X-rays are soon to be irradiated. As described above, the lamps 70A and 70B can display a state before the soft X-ray irradiators 11 and 36 irradiate the photosensitive substrate P with soft X-rays.

Further, the lamp 70 can display the operation status of the exposure apparatus main body EX. That is, for example, when the exposure apparatus main body EX is exposing the pattern of the mask M onto the photosensitive substrate P, the lamps 70A and 70B blink at predetermined time intervals. Displays the operation status of. The exposure apparatus main body E
The X operation status display lamps are the first lamp 70A and the second lamp 70A.
It may be provided separately from the lamp 70B.

Next, a method for exposing the photosensitive substrate P by the exposure apparatus S having the above-described configuration will be described. Here, a description will be given of a state where all of the chamber door 20 and the mask replacement door 21 are closed and a state where the mask replacement door 21 is open.

{State in which All Doors are Closed} First, the operation in a state in which the chamber door 20 and the mask replacement door 21 are all closed will be described with reference to FIG. Since all of the doors 20 and 21 are closed, the first lamp 70A and the second lamp 70B
Is off.

The substrate P to which the photosensitive agent has been applied by the coater / developer C / D is transferred by the transfer device H2 to the temperature control device E in the chamber C1. The photosensitive substrate P has a temperature controller E
Is placed on the temperature control holder 31 and temperature is controlled (step S
1).

After a predetermined time from the start of temperature control, the first lamp 70A, which has been turned off, starts blinking (step S).
2). The first lamp 70A blinks to indicate that the soft X-ray irradiating unit 36 will soon emit soft X-rays (reservation state for static elimination processing). The operator operates the first lamp 7
By displaying 0A, it can be recognized that the soft X-ray irradiating section 36 will soon emit soft X-rays. The first lamp 70
As described above, the timing at which A starts blinking is a timing set in advance with respect to the timing at which the soft X-ray irradiating unit 36 irradiates soft X-rays, and the control device CON
Indicated by T.

The photosensitive substrate P whose temperature has been adjusted is lifted by the lift pins 32 of the temperature adjusting device E (step S3).
At this time, the photosensitive substrate P is separated from the temperature control holder 31 to separate the photosensitive substrate P from the electrostatic charge (separation charge).
Occurs.

When the photosensitive substrate P and the temperature control holder 31 are separated from each other, the control unit CONT irradiates the photosensitive substrate P with soft X-rays from the soft X-ray irradiator 36. By irradiation with soft X-rays, the gas near the photosensitive substrate P is ionized,
The static electricity charged on the photosensitive substrate P is removed. At this time, the soft X-ray irradiator 36 emits soft X-rays, so that the blinking first lamp 70A is turned on (step S4). The first lamp 70A, when turned on, displays that the soft X-ray irradiator 36 is irradiating soft X-rays (static elimination processing state). The operator operates the first lamp 7
By displaying 0A, it is possible to recognize that the soft X-ray irradiating unit 36 is performing the soft X-ray irradiating operation.

After the soft X-ray irradiation by the soft X-ray irradiator 36 has been performed for a predetermined time, the controller CONT
The irradiation of soft X-rays from is stopped. The lit first lamp 70A is turned off (step S5). As described above, the first lamp 70A displays a state before and after the soft X-ray irradiator 36 irradiates the photosensitive substrate P with the soft X-ray. The soft X-ray irradiator 36 irradiates soft X-rays while measuring the charge amount of the photosensitive substrate P with a charge amount measuring device, and when the charge amount becomes equal to or less than a predetermined value, the soft X-ray irradiator 36 emits soft X-rays. You may make it stop.

The photosensitive substrate P, whose temperature has been adjusted by the temperature adjusting device E, is held on its back surface by the transport device H1, and is exposed to the exposure apparatus main body EX.
Is transferred to the substrate holder PH. When the photosensitive substrate P is transferred to the substrate holder PH, the lift pins provided on the substrate holder PH are raised. That is, the lift pins project from the upper surface of the substrate holder PH, and receive the photosensitive substrate P before the exposure processing, which is transported by the transport device H1. The transport device H1 holding the back surface of the photosensitive substrate P retreats after supporting the photosensitive substrate P with the lift pins. And
The photosensitive substrate P is placed on the substrate holder PH by lowering the lift pins that have received the photosensitive substrate P. The photosensitive substrate PH placed on the substrate holder PH is held by vacuum suction. Then, after driving the substrate stage PST to position the photosensitive substrate P, the controller CONT irradiates the photosensitive substrate P with exposure light EL. The pattern of the mask M illuminated with the exposure light EL by the illumination optical system IL is transferred to the photosensitive substrate P via the projection optical system PL (step S6).

After a predetermined time from the start of the exposure processing, the second lamp 70B starts blinking (step S7). The second lamp 70B blinks to indicate that the soft X-ray irradiator 11 is about to irradiate the soft X-ray soon (static elimination operation reserved state). The operator can recognize from the display of the second lamp 70B that the soft X-ray irradiator 11 will soon emit soft X-rays. As described above, the timing at which the second lamp 70B starts blinking is a timing set in advance with respect to the timing at which the soft X-ray irradiator 11 emits soft X-rays, and is instructed by the control device CONT. Is done.

When the desired pattern is formed on the photosensitive substrate P, the control unit CONT stops the irradiation of the photosensitive substrate P with the exposure light EL. Thus, the exposure processing on the photosensitive substrate P is completed (Step S8). The timing at which the second lamp 70B starts blinking is
It may be set after the exposure processing is completed.

The control device CONT includes a substrate stage PST
To drive the substrate holder P on which the photosensitive substrate P is placed.
H is moved to a substrate transfer position with respect to the transport device H1. In order to unload the photosensitive substrate P from the substrate holder PH, the controller CONT is provided with the photosensitive substrate P on the substrate holder PH so that the transport device H1 can hold the back surface of the photosensitive substrate P. It is raised by a lift pin (step S9). At this time, separation between the photosensitive substrate P and the substrate holder PH causes electrostatic charging (peeling charging) to occur on the photosensitive substrate P.

The controller CONT raises the photosensitive substrate P from the substrate holder PH with the lift pins, and simultaneously irradiates the soft X-rays from the soft X-ray irradiator 11 to the photosensitive substrate P via the ionizer controller 12. I do. By irradiation with soft X-rays, the gas near the photosensitive substrate P is ionized,
The static electricity charged on the photosensitive substrate P is removed. At this time, the soft X-ray irradiator 11 emits soft X-rays, so that the blinking second lamp 70B is turned on (step S10). The second lamp 70B, when turned on, displays that the soft X-ray irradiator 11 is irradiating soft X-rays (static elimination processing state). The operator can recognize from the display of the second lamp 70B that the soft X-ray irradiator 11 is irradiating the soft X-ray.

After the soft X-ray irradiation by the soft X-ray irradiator 11 has been performed for a predetermined time, the controller CONT
The irradiation of soft X-rays from is stopped. The lit second lamp 70B is turned off (step S11). in this way,
The second lamp 70B is configured such that the soft X-ray irradiator 11 has a photosensitive substrate P
Shows the status before and after the soft X-ray irradiation. The soft X-ray irradiator 11 irradiates soft X-rays while measuring the charge amount of the photosensitive substrate P with a charge amount measuring device, and when the charge amount becomes a predetermined value or less, the soft X-ray irradiator 11 emits soft X-rays. You may make it stop.

When the static electricity charged on the photosensitive substrate P is removed in this way, the transport device H1 accesses the space between the photosensitive substrate P lifted by the lift pins of the substrate holder PH and the substrate holder PH. Then, the back surface of the photosensitive substrate P is held. The transport device H1 unloads the held photosensitive substrate P from the substrate holder PH (Step S12). In addition,
The timing of stopping the soft X-ray irradiation can be set after the photosensitive substrate P is unloaded from the substrate holder PH by the transfer device H1.

The photosensitive substrate P unloaded from the substrate holder PH by the transfer device H1 is transferred to the transfer device H2 on the coater / developer C / D side via the temperature control device E, where it is subjected to development processing. Thus, a series of processing ends.

{State in which Mask Replacement Door is Open} In the series of processes described above, the operator may open the mask replacement door 21 and perform a mask replacement operation. When performing the mask replacement operation, the operator needs the lamps 70A and 70A.
Check B. Then, the lamps 70A and 70B are turned off, that is, the soft X-ray irradiation units 11 and 36
In a state where the line irradiation operation is not performed, the operator can open the mask replacement door 21 and perform the mask replacement operation safely.

While the mask replacement work is being performed by opening the mask replacement door 21, when it is almost time to start the static elimination process, the lamp 70, which has been turned off, starts blinking, and the message “Reservation for static elimination process” is started. "State" is displayed. The operator confirming the blinking lamp 70 interrupts the mask replacement operation and closes the mask replacement door 21. That is, the flashing lamp 70 allows the operator to:
Since it is possible to recognize that the soft X-ray irradiation units 11 and 36 will start the soft X-ray irradiation operation soon, by closing the mask replacement door 21, a series of soft X-ray irradiation operations is not interrupted. Processing can be continued and productivity can be improved. Then, the soft X-ray irradiators 11, 3
Since the lamp 70 is turned off when the static elimination process 6 is completed, the operator can safely resume the interrupted mask replacement work by checking the turned off lamp 70.

On the other hand, while the mask replacement door 21 is being opened and the mask replacement operation is being performed, the lamp 70 which has been turned off starts blinking at the time when the static elimination process is to be started soon. Even if it indicates that it is
The operator can continue the mask changing operation.
In this case, since the mask replacement door 21 is open, the soft X-ray ionizers 10 and 35 do not perform the soft X-ray irradiation operation. At this time, the soft X-ray ionizers 10, 35
Indicates a state of waiting for a soft X-ray irradiation operation (a state of waiting for static elimination processing). The soft X-ray irradiating unit has a different display content from the flashing when the mask replacement door 21 is closed (that is, the flashing in the “static elimination processing reserved state”), such as by increasing the time interval of the flashing. 11 and 36 are in an operable state, and indicate that they are in a “static elimination processing waiting state”. Then, when the mask replacement work is completed and the mask replacement door 21 is closed, the soft X-ray irradiation units 11 and 36 that have been in the “waiting for static elimination process” start irradiating soft X-rays.
A charge removal process is performed on the photosensitive substrate P. The flashing lamp 70 is turned on when the soft X-ray irradiators 11 and 36 emit soft X-rays. "Waiting state for static elimination processing"
In this case, the operation of the soft X-ray ionizers 10, 36 is temporarily stopped in the sequence program, which is different from the interlock state in which the power is stopped.
Therefore, the operation of the soft X-ray ionizers 10, 36 is restarted by closing the mask replacement door 21.

While the lamp 70 is on, the mask replacement door 21
Is opened (in this case, it is assumed that the lock unit 51 is not provided), the charge removal processing is interrupted. in this case,
The lamp 70 changes and displays the display contents, such as blinking at a different time interval from the “static elimination processing reserved state” and the “static elimination processing wait state”. Then, during the charge removal processing, the mask replacement door 21 is opened to interrupt the charge removal processing, and the mask replacement door 21 is opened.
, The exposure apparatus S returns from the interrupted state. For example, if the charge removal process is interrupted while the photosensitive substrate P is being lifted by the lift pins provided on the holder, after the mask replacement door 21 is closed, the charge removal process starts after the mask pin is lifted by the lift pins. Will be resumed. Then, when the mask replacement door 21 is closed and the charge removing process is restarted, the lamp 70 is turned on.

As described above, the respective operating states of the exposure apparatus main body EX and the soft X-ray ionizers 10 and 35 for irradiating soft X-rays are confirmed by the lamp 70 provided outside the chamber C1. Can be. Therefore, the soft X-ray irradiators 11, 35 of the soft X-ray ionizers 10, 35
Safe soft X-ray ionizer 10,3 without approaching
5 can be confirmed. Further, if the operation of the soft X-ray ionizers 10 and 35 is stopped, predetermined processing such as return processing can be performed efficiently. Therefore, the charge removal process for the photosensitive substrate P can be reliably performed, and a device having desired quality can be manufactured with high productivity.

Further, by providing the lamp 70 for displaying the operation of the soft X-ray irradiators 11, 36, the operator can
When the mask replacement door 21 is opened to perform the mask replacement work, it is possible to recognize whether or not soft X-rays are being irradiated by the display of the lamp 70, and to perform the work after confirming safety. Further, the operator can recognize that the soft X-ray irradiators 11 and 36 are in the process of neutralizing the photosensitive substrate P by checking the lamp 70 that is turned on. The replacement door 21 is not opened.
Therefore, since the static elimination process is not interrupted, the static elimination process for the photosensitive substrate P can be reliably performed, and a device having a desired quality can be manufactured with high productivity.

Further, since the lamps 70A and 70B blink, the operator can recognize that the soft X-ray irradiators 11 and 36 will soon irradiate soft X-rays, so that the lamps 70A and 70B blink. Then, the operation of opening the mask replacement door 21 can be waited. Therefore, safety can be improved. Further, since the static elimination process is not interrupted, stagnation of the process can be prevented. Therefore, the static elimination process and the exposure process can be performed efficiently.

The lock portions 50 and 51 for controlling opening and closing according to the irradiation of the soft X-ray irradiation portions 11 and 36 are provided on the chamber door 20 and the mask replacement door 21 respectively.
While the soft X-ray irradiators 11, 36 are irradiating soft X-rays, the door can be held so that the door cannot be opened from the outside. Therefore, safety can be improved and interruption of the charge removal processing can be prevented.

The soft X-ray irradiation units 11 and 36 are
In addition, since the operation is performed according to the opening / closing state of the mask replacement door 21, the leakage of soft X-rays to the outside of the chamber C1 can be prevented. Therefore, safety can be improved.

The soft X-ray irradiation operation by the soft X-ray irradiation units 11 and 36 is performed when the photosensitive substrate P separates from the substrate holder PH and the temperature control holder 31. As described above, by not constantly irradiating the soft X-ray, the life of the soft X-ray irradiators 11 and 36 can be extended. Also, the soft X-ray irradiator 11,
36 operates only at a predetermined timing, so that the safety is higher than that which operates constantly.

In the above embodiment, the timing at which each of the first lamp 70A and the second lamp 70B starts blinking is in relation to the timing at which the soft X-ray irradiators 11 and 36 start irradiating soft X-rays. When a predetermined operation (for example, an operation of mounting the photosensitive substrate P on the substrate holder or the temperature control holder) before the irradiation with the soft X-ray is performed, which is set at a point in time when the predetermined time has elapsed. May be set. Alternatively, a sensor capable of detecting whether or not the photosensitive substrate P is mounted on the substrate holder PH (or the temperature control holder 31) is provided without being set on the sequence program. When it is detected that the photosensitive substrate P is placed on the PH, the blinking of the lamp 70 may be started.

In the above embodiment, whether or not the soft X-ray ionizers 10, 35 are irradiating soft X-rays is determined by the lamp 70.
When the lamp is displayed by the control unit CONT based on the signals (monitor signals) from the ionizer control units 12 and 37, the lamp 70 is displayed at a position facing the soft X-ray irradiation units 11 and 36. A sensor capable of detecting X-rays is provided, and when this sensor detects soft X-rays, the lamp 70 may display that soft X-rays are being irradiated from the soft X-ray irradiation units 11 and 36. Good.

In the above embodiment, the lamp 70
Is turned on / off / blinking (changing the blinking interval)
Displays the status of "static elimination process", "static elimination process reserved", "static elimination process waiting", and "static elimination non-process status". Of course can be displayed by changing the blinking interval. Further, the display unit (display device) is not limited to a lamp, and may be constituted by other display devices such as a liquid crystal display. In addition,
In this case, if characters or symbols are displayed, the meaning of the lamp color can be understood at a glance without knowing the meaning.

In the above embodiment, the soft X-ray ionizers 10 and 35 are stopped when the chamber door 20 or the mask replacement door 21 is open. Or
An actuator capable of changing the direction of the soft X-ray irradiators 11 and 36 may be provided to direct soft X-rays in a direction that does not leak out of the chamber.

The soft X-ray irradiators 11 and 36 may be provided with an actuator capable of changing the directions of the soft X-ray irradiators 11 and 36, and the soft X-ray optical path may be oscillated during the charge removal processing. . By doing so, the photosensitive substrate P can be evenly discharged.

During the irradiation operation of the soft X-ray irradiators 11, 36, the first door T1 of the chamber C1 and the chamber C2
When the second door portion T2 is opened, the chambers C1 and C
2 is communicated through the openings K1 and K2, so that the soft X-ray may reach the chamber C2 side. Therefore, the second chamber door 23 provided in the chamber C2
Is opened, the soft X-ray ionizers 10, 35 are maintained while the operation of the exposure apparatus body EX is maintained, similarly to the mask replacement door 21.
Can be configured to stop only the operation of. For example, when the operator attempts to open the second chamber door 23 for maintenance of the coater / developer C / D, the lamp 70 (or a lamp provided separately) is used.
The second chamber door 23 can be safely opened by confirming the display. Also, the second chamber door 23
When the lamp 70 starts blinking with the door opened, the operator does not interrupt the static elimination process by closing the second chamber door 23. As described above, the soft X-ray irradiators 11 and 36 are connected to the chamber C1, and open / close the second chamber door 23 of the chamber C2 that houses the coater / developer C / D that is a peripheral device of the exposure apparatus main body EX. Can work accordingly. And the lamp 70 is
The operation status of the soft X-ray irradiation units 11 and 36 can be displayed according to the opening / closing status of the second chamber door 23.

When the second chamber door 23 is opened, the soft X
It has been explained that the line ionizers 10 and 35 are stopped.
When the second chamber door 23 is opened, at least one of the shutters T1 and T2 provided in the openings K1 and K2 may be closed. By doing so, it is possible to avoid the risk that the soft X-rays leak from the chamber C1 side to the chamber C2 side without stopping the operation of the soft X-ray ionizers 10, 35. In this case, the shutters T1 and T2 are provided at the openings K1 and K2 of the chambers C1 and C2, respectively.
The shutter T1 can be provided only in the opening K1 of the first chamber, and the shutter T can be provided only in the opening K2 of the chamber C2.
It is also possible to provide 2. However, since the transfer device H2 for transferring the substrate P between the chamber C1 and the chamber C2 is provided in the chamber C2, the transfer operation of the transfer device H2 and the shutter T2 are provided by providing a shutter on the chamber C2 side. It is possible to easily perform the interlocking control with the opening / closing operation.

Further, the second chamber door 23 of the chamber C2
Also, while the soft X-ray ionizers 10, 35 are operating, the second
A lock unit (door open / close control unit) that holds the chamber door 23 in a closed state can be provided. On the other hand, when the second chamber door 23 of the chamber C2 is closed, for example, an operator who is performing maintenance on the coater / developer C / D may be trapped in the chamber C2. In this case, a human body sensor may be provided in the chamber C2 so that the lock unit does not operate when the human body sensor detects a human body (that is, the second chamber door 23 is not closed).

A soft X-ray ionizer may be provided in the chamber C2 in which the coater / developer C / D is provided.
At this time, if the mask replacement door 21 or the chamber door 20 of the chamber C1 accommodating the exposure apparatus main body EX is opened during the operation of the soft X-ray ionizer in the chamber C2, the soft X-ray in the chamber C2 is opened. Stop the ionizer. Further, by using the open / close sensors of the chamber door 20 of the exposure apparatus and the open / close sensor of the chamber door 23 of the C / D apparatus as safety plugs (keys), further safety can be ensured. That is, in order to open the chamber door, the safety plug must be removed. When the safety plug is removed, the door can be regarded as open from the viewpoint of the device control system. Therefore, at the moment when the safety plug is removed to open the chamber door, the soft X-ray ionizers 10, 35 are stopped, and even if the door is accidentally closed while working in the chamber as long as the worker carries the safety plug. , Soft X
The line ionizers 10, 35 cannot operate, and the safety of the worker is ensured. In the embodiment, the operation of the soft X-ray ionizer mainly used in the static eliminator has been described. However, in addition to the soft X-ray ionizer, for example, the same mechanism as described above is provided for a mechanism using a laser to improve safety. Can be secured. That is, in order to ensure human safety from the laser, the same method as described above should be applied to the case where the laser must be stopped by the chamber door of the exposure apparatus and, if necessary, the chamber door of the C / D apparatus. Accordingly, it is possible to operate the apparatus with good productivity while ensuring safety.

The static eliminator having the soft X-ray irradiator and the lamp (display unit) according to the above embodiment can be applied to various manufacturing apparatuses other than the exposure apparatus, which require static elimination.

The display device (lamp) according to the above-described embodiment not only displays whether or not the soft X-ray irradiating section for static elimination is irradiating soft X-rays. It is also possible to display whether or not the exposure device for forming the title) is irradiating the titler exposure light. That is, the display device according to the present embodiment includes:
The present invention can be applied to display the operation of an irradiation device that irradiates a beam that adversely affects the human body.

As the exposure apparatus body EX of the above embodiment,
The present invention can be applied to a scanning type exposure apparatus that exposes the pattern of the mask M by synchronously moving the mask M and the substrate P, and exposes the pattern of the mask M while keeping the mask M and the substrate P stationary. The present invention can also be applied to a step-and-repeat type exposure apparatus that sequentially moves the substrate P stepwise.

The application of the exposure apparatus main body EX is not limited to an exposure apparatus for a liquid crystal for exposing a liquid crystal display element pattern to a square glass plate, but may be, for example, an exposure apparatus for manufacturing a semiconductor or a thin film magnetic head. It can be widely applied to an exposure apparatus for manufacturing.

Light source 1 of exposure apparatus main body EX of this embodiment
Indicates not only g-line (436 nm), h-line (405 nm) and i-line (365 nm) but also a KrF excimer laser (2
48 nm), ArF excimer laser (193 nm), F
_Two lasers (157 nm) can also be used.

The magnification of the projection optical system PL may be not only a reduction system but also an equal magnification or an enlargement system.

As the projection optical system PL, when far ultraviolet rays such as an excimer laser are used, a material that transmits far ultraviolet rays such as quartz or fluorite is used as a glass material. When an F ₂ laser or X-ray is used, a catadioptric system is used. Alternatively, use a refraction optical system.

When a linear motor is used for the substrate stage PST or mask stage, either an air levitation type using an air bearing or a magnetic levitation type using Lorentz force or reactance force may be used. The stage may be of a type that moves along a guide or a guideless type that does not have a guide.

When a plane motor is used as the stage driving device, one of the magnet unit (permanent magnet) and the armature unit is connected to the stage, and the other of the magnet unit and the armature unit is connected to the moving surface of the stage. (Base).

The reaction force generated by the movement of the substrate stage PST may be mechanically released to the floor (ground) by using a frame member as described in Japanese Patent Application Laid-Open No. 8-166475. The present invention is also applicable to an exposure apparatus having such a structure.

The reaction force generated by the movement of the mask stage supporting the mask holder MH is described in Japanese Patent Application Laid-Open No. 8-33022.
As described in Japanese Patent Application Publication No. 4 (1994), a frame member may be used to mechanically escape to the floor (ground). The present invention is also applicable to an exposure apparatus having such a structure.

As described above, the exposure apparatus according to the embodiment of the present invention converts various subsystems including the components described in the claims of the present application into predetermined mechanical accuracy, electrical accuracy,
It is manufactured by assembling to maintain optical accuracy. Before and after this assembly, adjustments to achieve optical accuracy for various optical systems, adjustments to achieve mechanical accuracy for various mechanical systems, and various electric systems to ensure these various accuracy Are adjusted to achieve electrical accuracy. The process of assembling the various subsystems into the exposure apparatus includes mechanical connection, wiring connection of an electric circuit, and piping connection of a pneumatic circuit between the various subsystems. It goes without saying that there is an assembling process for each subsystem before the assembling process from these various subsystems to the exposure apparatus. When the process of assembling the various subsystems into the exposure apparatus is completed, comprehensive adjustment is performed, and various precisions of the entire exposure apparatus are secured. It is desirable that the manufacture of the exposure apparatus be performed in a clean room in which the temperature, cleanliness, and the like are controlled.

As shown in FIG. 6, in the semiconductor device, a step 201 for designing the function and performance of the device and a step 20 for manufacturing a mask based on the design step
2. Step 20 of manufacturing a substrate which is a base material of the device
3. A substrate processing step 204 of exposing a mask pattern to a substrate by the exposure apparatus of the above-described embodiment, a device assembling step (including a dicing step, a bonding step, and a package step) 205, and an inspection step 20
6 and so on.

[0092]

According to the first aspect of the present invention, the operation of the irradiation unit for irradiating soft X-rays can be confirmed by the display unit provided outside the static eliminator. It is possible to safely check the operation of the irradiation unit without approaching. Further, if the operation of the irradiation unit is stopped, a predetermined process such as a return process can be efficiently performed, so that the static elimination process for the member can be reliably performed.

According to the second aspect of the present invention, the display changes the display content according to the open / close state of the door.
The operator can reliably perform the optimal processing according to the opening / closing state of the door. Therefore, the processing efficiency can be improved without causing the processing to stay.

According to the third aspect of the present invention, since the door opening / closing control section for controlling the opening / closing of the door section according to the irradiation of the irradiating section is provided, the soft X-ray irradiating section is externally connected during the irradiating operation. Can be held so that the door cannot be opened. Therefore, safety can be improved, and interruption of the charge removal processing due to opening of the door can be prevented.

According to the fourth aspect of the present invention, since the irradiating section operates according to the opening / closing state of the door section, it is possible to prevent the soft X-ray from leaking to the outside of the chamber, thereby improving safety. can do.

According to the fifth aspect of the present invention, the operation status of the exposure apparatus main body and the soft X-ray irradiating apparatus can be confirmed by the display device provided outside the chamber. The operation of the irradiation device can be safely checked without approaching the irradiation device. Further, if the operation of the irradiation apparatus is stopped, predetermined processing such as return processing can be performed efficiently, so that static elimination processing can be reliably performed on the substrate, and a device having a desired quality can be produced with high productivity. It can be manufactured by the nature.

According to the sixth aspect of the present invention, the exposure apparatus main body and the irradiation apparatus perform their respective operations in conjunction with the opening and closing of the door. By stopping the operation of the irradiation device, accurate exposure processing can be performed while maintaining safety.

According to the seventh aspect of the present invention, the substrate after the exposure processing is irradiated with soft X-rays, and the status before and after the irradiation operation is displayed on the display device, so that the operator can perform the exposure processing and the irradiation. Since the status of the static elimination process can be grasped, it is possible to perform an optimal process according to the status. Therefore, stable and accurate exposure processing can be efficiently performed while maintaining safety.

[Brief description of the drawings]

FIG. 1 is a schematic configuration diagram showing an exposure apparatus of the present invention, where (a) is a view as viewed from above and (b) is a side view.

FIG. 2 is a schematic configuration diagram showing an embodiment of the exposure apparatus of the present invention.

FIG. 3 is a schematic configuration diagram illustrating an embodiment of a temperature control device according to the present invention.

FIG. 4 is a block diagram showing a control system of the exposure apparatus of the present invention.

FIG. 5 is a flowchart illustrating an example of the operation of the exposure apparatus of the present invention.

FIG. 6 is a flowchart illustrating an example of a semiconductor device manufacturing process.

[Explanation of symbols]

10, 35 Soft X-ray ionizer (static elimination device, irradiation device) 11, 36 Soft X-ray irradiation portion (irradiation portion, irradiation device) 20A, 20B, 20C Chamber door (door portion) 21A, 21B Mask replacement door (door portion) 23 23 Second chamber door (door part) 50, 51 Lock part (door open / close control part) 70A, 70B Lamp (display part, display device) C1, C2 Chamber CONT control device (door open / close control part) EX exposure apparatus body ( Exposure device) P Photosensitive substrate (substrate, predetermined member) S Exposure device SYS Device manufacturing system

Claims (7)

[Claims] 1. A static eliminator for irradiating a predetermined member with soft X-rays to eliminate static electricity from said predetermined member, comprising: an irradiator for irradiating said predetermined member with soft X-rays; And a display unit for displaying an operation state of the irradiation unit. 2. The static eliminator according to claim 1, further comprising an openable / closable door at a position spatially communicating with the irradiation unit, wherein the display unit displays the openable / closed state according to the open / closed state of the door. A static eliminator characterized by changing contents. 3. The static eliminator according to claim 1, further comprising a door opening / closing control unit that controls opening / closing of the door unit, wherein the door opening / closing control unit is configured to control the opening and closing of the door in response to irradiation of the irradiation unit. A static eliminator characterized by controlling opening and closing of a part. 4. The static eliminator according to claim 2, wherein the irradiating section operates in accordance with a state of opening and closing of the door. 5. An exposure apparatus comprising: an exposure apparatus main body for irradiating a substrate with exposure light; and a chamber accommodating the exposure apparatus main body and having a door that can be opened and closed, wherein the substrate is irradiated with soft X-rays. An exposure device, which is provided outside the chamber and displays a status of operation of the exposure device body and the illumination device. 6. The exposure apparatus according to claim 5, wherein the exposure apparatus main body and the irradiation apparatus perform respective exposure operations and irradiation operations in conjunction with opening and closing of the door. apparatus. 7. The exposure apparatus according to claim 5, wherein the irradiation apparatus irradiates the substrate exposed by the exposure apparatus main body and before and after irradiating the display apparatus with the substrate. An exposure apparatus for displaying the status of the exposure.