JP2001203145A - Aligner - Google Patents

Abstract

PROBLEM TO BE SOLVED: To surely prevent a human body from coming in, to eliminate the need for installing a device at every opening of a chamber and to fledxibly correspond to the design change of the chamber. SOLUTION: In an aligner, a device main body is stored in a space detached by the chamber 1. A human body detection sensor 7, detecting that a part of the human body entering a prescribed space SA is installed, so that the detection space SA matches the detached space by the chamber 1. When the human body sensor 7 detects the the human body, a safe processing comprising a processing for stopping the operation of the device main body 2 is conducted.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor device, a liquid crystal display, a plasma display, a thin film magnetic head, an imaging device (CCD), a micro device such as a micro machine, and an exposure apparatus used for manufacturing a photomask (reticle). About.

[0002]

2. Description of the Related Art In a lithography process for manufacturing a micro device or the like, an image of a pattern formed on a reticle serving as a mask is converted into a semiconductor wafer or a glass plate coated with a photoresist through a projection optical system. An exposure apparatus for transferring the image on a photosensitive substrate is used. As this exposure apparatus, a step-and-repeat type exposure apparatus (stepper) is frequently used, but recently, a step-and-scan method in which exposure is performed by synchronously scanning a reticle and a wafer with respect to a projection optical system. Exposure apparatuses have also been used.

[0003] Such an exposure apparatus is configured by housing an apparatus main body in an environmental chamber (environmental air-conditioning apparatus) for temperature / humidity control, dust prevention and the like. The chamber is provided with a plurality of openings for operation and maintenance by an operator, and the openings are provided with opening and closing doors (including pivoting, sliding, detachable, and other types of doors and lids). The opening is closed by the opening.

[0004] It is not preferable from the viewpoint of safety that a part or all of a human body enters the chamber through the opening during operation of the apparatus. When the switch of this switch is opened and a contact of this switch is opened, a process such as stopping the operation of the main body of the apparatus is carried out on the assumption that a human body may enter.

As a countermeasure other than providing such a switch, a countermeasure using a so-called curtain sensor is known. The curtain sensor arranges a plurality of light projecting units and light receiving units at appropriate intervals so as to face each other along the left and right or upper and lower edges of the opening of the chamber, and creates a curtain by a plurality of parallel light beams. When at least one of them is shut off, it is determined that the human body has entered the chamber. As the detection light, infrared light or the like harmless to the human body is used.

[0006]

However, in the case of using the above-mentioned switch of the prior art, it is only possible to indirectly know that the human body may enter, and it is not possible to know that the human body has actually entered. It is not detecting. For this reason, if the switch is tampered with or a tool for invalidating the switch is forgotten to be removed, it cannot be detected.

In this respect, the curtain sensor can directly detect the entry of the human body. Therefore, although the switch is used, it does not have the above-mentioned disadvantages. However, when the detection area (the area of the opening) is large, It is necessary to increase the number of light beams, and a projection of a human body such as a finger may enter between the light beams. It is necessary to arrange the light beam every time, and there is a disadvantage that the number of sensors is increased.

[0008] In addition, since it is necessary to provide a switch and a curtain sensor for each of the openings of the chamber, the number of switches or sensors is increased, and the shape of the chamber and the position of the opening are changed. If it is changed, it is necessary to change the arrangement or the number of switches or sensors, and there is a problem of lack of flexibility.

The present invention has been made in view of such problems of the prior art, and can surely prevent the invasion of the human body, does not need to be installed at each opening of the chamber, and can be used for changing the design of the chamber. An object of the present invention is to provide an exposure apparatus capable of flexibly coping with the exposure.

[0010]

Hereinafter, in the examples shown in this section, for ease of understanding, each constituent element of the present invention will be described with typical reference numerals shown in the drawings of the embodiments. The configuration of the present invention or each component requirement is not limited to those restricted by these reference numerals.

An exposure apparatus according to the present invention for achieving the above object is an exposure apparatus in which an apparatus main body (2) is housed in a space isolated by a chamber (1). A human body detection sensor (7) for detecting that a part of the human body has entered is provided such that the detection space substantially coincides with the isolated space defined by the chamber, and when the human body detection sensor detects the entry of the human body, A predetermined safety process is performed.

According to the present invention, since the human body detection sensor is provided so that its detection space substantially coincides with the space separated by the chamber, it is not necessary to provide a sensor for each opening of the chamber. Further, there is no blind spot (a portion between light rays) unlike a conventional curtain sensor, and it is possible to reliably detect the entry of a human body.

Further, even when the position of the opening of the chamber is changed, it can be dealt with without any change or with a small change. In addition, when the shape of the chamber is changed, it can be dealt with by adopting a human body detection sensor capable of changing the detection space.

In this case, an earthquake detection sensor (2) for detecting vibration of a floor or the like on which the apparatus main body (2) is installed.
And 4) the safety processing can be performed when the earthquake detection sensor detects shaking exceeding a predetermined value, or a monitoring device that monitors the occurrence of a failure in the device main body. (25) may be provided so that the safety processing is performed when occurrence of a failure is detected by the monitoring device.

By doing so, a device for performing safety processing when an intrusion of a human body is detected can be used also as a device for performing safety processing when an earthquake or a failure occurs. , The system can be simplified as compared with the case where each is provided.

The safety processing is not particularly limited, and includes various types of safety processing. Power supply to a drive system for transporting and positioning an object to be processed such as a substrate is stopped, and a braking system is provided in the drive system. When the apparatus is incorporated, the operation may be considered. When the apparatus main body is installed on the vibration isolator, the operation of the vibration isolator may be stopped. In the case of performing gas purging, the gas supply may be stopped. .

[0017]

FIG. 1 is a perspective view showing a part of an exposure apparatus according to an embodiment of the present invention, FIG. 2 is a side sectional view thereof, FIG. 3 is a front view thereof, and FIG. 4 is an embodiment of the present invention. And FIG. 5 is a block diagram showing a configuration of a safety processing circuit according to an embodiment of the present invention.

The exposure apparatus according to this embodiment includes an apparatus main body (optical system) 2 for performing exposure processing, a wafer (photosensitive substrate) as an exposure target, and a transfer target inside an environmental chamber (environmental air-conditioning apparatus) 1. It is configured to house a transport device 3 that transports a reticle on which a pattern is formed (see FIG. 2).

Although not shown, the exposure apparatus supplies a main control unit (control unit) for controlling the operation of motors and other actuators of the apparatus main body 2 and the transporting apparatus 3, and supplies a predetermined purge gas to the apparatus main body 2. And an operation device such as an engineering workstation (EWS) having an input / output device for managing the operation status of the exposure apparatus.

The environmental chamber 1 is provided with an air conditioner (not shown) for controlling the temperature and purifying the inside of the chamber. The air conditioner is installed in the environmental chamber 1 or an air conditioner chamber adjacent thereto, and air whose temperature is adjusted by the air conditioner is supplied to the duct and the HE for dust removal installed inside the environmental chamber 1.
The air is blown into the chamber 1 through a PA filter and a chemical filter for removing sulfate ions, ammonium ions, and the like. A suction port is arranged on the opposite side of the outlet in the chamber 1, and the clean air blown into the chamber 1 passes through the suction port and the duct.
It returns to the air conditioner.

A plurality of openings 4 penetrating inside and outside are formed in the front and side surfaces of the environmental chamber 1.
Alternatively, a detachable opening / closing door (panel) 6 is attached, and can be opened so that a maintenance worker or an operator can access the apparatus main body 2 or the transport apparatus 3 at the time of maintenance or other necessity. Such doors 5,6
The type is not limited to a rotating type or a detachable type, and a sliding type or another type of door or lid may be adopted. The chamber 1 is made of a metal such as stainless steel, steel, aluminum, copper, or brass, or another material having an electromagnetic shielding function.

Next, the configuration of the apparatus main body (optical system) 2 will be outlined. The apparatus main body 2 housed in the chamber 1
In this embodiment, a step-and-scan type reduction projection exposure apparatus is used. This reduction projection exposure apparatus, in a state where a part of the pattern on the reticle as a mask is reduced projection exposure on a wafer coated with a resist as a photosensitive substrate via a projection optical system, the reticle and the wafer,
By synchronously moving with respect to the projection optical system, a reduced image of the pattern on the reticle is sequentially transferred to each shot area on the wafer, and a semiconductor device is formed on the wafer.

KrF excimer laser (wavelength 248 nm)
A laser beam pulsed from an exposure light source that oscillates is held on a reticle stage via an illumination optical system having a beam shaping / modulation optical system, an optical integrator, an aperture stop, a relay lens, a condenser lens, and the like. A rectangular illumination area on the reticle is illuminated with a uniform illuminance distribution. The projection magnification α (α is, for example, ４ ，, ５) of the pattern in the illumination area on the reticle via the projection optical system.
) Is projected and exposed on a photoresist-coated wafer.

The wafer is held by suction on a wafer stage via a wafer holder, and the reticle stage and the wafer stage are driven under the control of the main controller so that the wafer and the reticle can move in the same or opposite directions according to the projection magnification. By performing synchronous movement at the speed ratio, the pattern on the reticle is transferred to the shot area of the wafer. The apparatus main body 2 is installed on a base plate installed on the floor via a vibration isolator or the like.

[0025] As the exposure light, other KrF excimer laser, a mercury lamp i line (wavelength 365 nm), ArF excimer laser beam (wavelength 193 nm), _{F 2} laser beam (wavelength 157 nm), or a harmonic like such as YAG laser Can be used. When exposure light having a wavelength equal to or less than that of the ArF excimer laser light is used, a so-called gas purge in which part or all of the optical path of the illumination optical system or the projection optical system is replaced with an inert gas such as nitrogen or helium. Is performed.

Although not shown, the transfer device 3 has a reticle transfer system and a wafer transfer system. A reticle transfer system is provided relatively on the front side of the chamber 1 and a wafer transfer system is provided on the lower side. Is housed. These transfer devices 3 are devices for automatically transferring a reticle or a wafer.

The wafer transfer system has a robot hand having a hand unit for sucking and holding a wafer, and this robot hand can move in the chamber 1. The robot hand receives a wafer from a wafer cassette or a wafer mounting table installed in the chamber 1, transports the wafer to a transfer position with the apparatus main body 2, and stores the wafer received at the transfer position with the apparatus main body in a wafer cassette or the like. can do. Further, a part of the openings 4 formed on the left and right side surfaces of the chamber 1 is opened,
Coater (resist coating device) and developer (developing device)
The wafer can be transferred between the device and the device. In addition, replacement of the reticle and the cassette storing the reticle, replacement of the wafer and the cassette storing the wafer, and other maintenance work are performed by opening the corresponding open / close doors 5 and 6.

An EWS operation panel (keyboard or display device) is provided inside one of the front doors 5 in the environmental chamber 1. An operator or the like opens this door 5 to open it. Perform necessary input operations.

At the lower right corner on the front side of the environmental chamber 1, a human body detection sensor 7 is provided. The human body detection sensor 7 is a sensor for detecting when a part or the whole of a human body has entered a predetermined detection space (detection area).

As the human body detecting sensor 7, for example,
By detecting weak infrared rays generated by the human body, a sensor that detects the entry of the human body can be used. In addition, the human body detection sensor 7 detects the temperature of the human body,
A device that detects a sound wave emitted from a human body, or a device that detects an electromagnetic wave emitted from a human body, or the like may be used alone or in combination. In this embodiment, as shown in FIGS. 1, 2 and 4, a human body detection sensor 7 having a detection space SA substantially along the front and inside of both sides of the environmental chamber 1 is used.

In this embodiment, a single human body detection sensor 7 is used. However, a plurality of human body detection sensors are combined in accordance with the shape of the detection space so that detection can be performed substantially along the inside of the environmental chamber 1. A space may be formed. If there is a surface without an opening door among the surfaces (front, side, and back) of the environmental chamber 1, the surface is determined by the human body detection sensor 7.
Need not be along the surface of the environmental chamber 1.

It is preferable that the human body detection sensor 7 be capable of mechanically or electrically adjusting the sensitivity, the shape of the detection space, and the like. When the detection space of the human body detection sensor 7 reaches the outside of the environmental chamber 1, the human body may detect the human body only when approaching and malfunction, and the detection space of the human body detection sensor 7 may become environmentally harmful. If the inside of the chamber 1 is away from the inner surface, it may not be possible to detect the human body even though it has entered, and neither is preferable.
This is because if the sensitivity and the like can be adjusted, they can be adjusted so that they substantially match. However, as long as it has a detection space along a predetermined inner surface of the chamber 1, such a function of adjusting sensitivity or the like may not be provided.

Next, with reference to FIG. 5, an outline of a safety processing circuit when a human body is detected by a human body detection sensor will be described. This safety processing circuit is roughly divided into a sensor unit having a human body detection sensor 7 and a sensor control unit 8, and a safety control unit having a safety determination unit 9 and a monitoring warning unit 10 as a part of a main control device of the apparatus main body 2. It is composed of

The human body detection sensor 7 is connected to a sensor control section 8 via a signal line. The signal transmission between the human body detection sensor 7 and the sensor control unit 8 is not limited to a signal line as an electric cable, but may be a signal transmission by radio waves or optical means.

The sensor control unit 8 includes a sensor I / O 11, a control unit CPU 12, a sensor adjustment circuit 13, and the like. To improve the reliability of the circuit, the sensor I / O 11 and the control unit CPU 12 are duplicated. The configuration is taken. Matching or mismatching of the output of each control unit CPU 12 is represented by X
The monitoring warning unit 10 is notified via the OR circuit (monitoring device) 14.

When the signal from the XOR circuit 14 of the sensor control unit 8 indicates a mismatch, the monitoring warning unit 10 determines that a failure has occurred in the sensor control unit 8 and notifies the operator or the like of the failure. In order to notify the occurrence, predetermined safety processing such as turning on a warning lamp, sounding a warning buzzer, displaying on a display device, warning by voice, or turning off the power as necessary is executed.

The output of the control unit CPU 12 of the sensor control unit 8 controls the operation of the relays K1 and K2 of the safety determination unit 9 of the safety control unit via the switch circuit 15. Relay K1,
K2 is turned on when energized and turned off when not energized. The operation of relays K1 and K2 controls the operation of relay K3. That is, when both of the relays K1 and K2 are turned on (energized), the relay K3 is operated. At this time, the relay K3 is turned on and the motor drive control unit 16 can supply power to the motor 17. During normal operation, this state is established. Here, the motor 17 is
For example, it is a motor for operating the robot arm of the transfer device 3 or moving the robot arm. The relays K1, K2, and K3 are off in the failure mode.

During normal operation, the motor drive control unit 16
It is controlled via a control circuit section 18 based on a command from an operator or a host computer, and supplies power to the motor 17 in response to this to operate the robot arm.
When a part or all of the human body enters the detection space SA of the human body detection sensor 7, the switch circuit 15 is disconnected,
The relays K1 and K2 are turned off, and the relay K3 is turned off. Thus, power supply to the motor 17 is interrupted and the motor 17 is stopped irrespective of a command from the control circuit unit 18.

When a failure has occurred in the sensor control unit 8, one of the two switch elements of the switch circuit 15 is turned off, and therefore, the relay K1 or the relay K2 is turned off. K3 is also turned off, and the power supply to the motor 17 is cut off.

When the motor 17 is provided with a forced braking device 19 such as an electromagnetic brake, the power supply to the motor 17 is cut off, and at the same time, the forced braking device 19 is operated to forcibly brake the motor 17. Can be. The electromagnetic brake is a device that electromagnetically presses a brake pad against a rotating shaft of the motor 17 or the like to brake by a frictional force. If the transmission of power can be cut off by a clutch,
The clutch may be disconnected. Motor 1
7 may be controlled so as to electrically apply the brake.

In this embodiment, the motor 17 is
The motor for driving the transfer device 3 is merely an example, and may be a drive motor (linear motor) of a stage device for moving a wafer or a reticle of the device main body 2 or another actuator. Further, the device to be stopped for ensuring safety is not limited to such a motor, and when the device main body 2 is installed via a vibration isolator, the operation of the vibration isolator is stopped, and the illumination optical system is stopped. And any other measures for ensuring safety, such as stopping supply of purge gas to the projection optical system.

As a vibration isolator on which the apparatus main body 2 is mounted,
A passive type in which the device body 2 is supported on a base plate by a spring element or a damper element, and an active type for suppressing vibration of low frequency components which are difficult to remove with the passive type are used together. It may be something. The active type vibration damping device detects vibration generated in the device main body 2 by an acceleration sensor, controls operation of an actuator interposed between the base plate and the device main body 2 based on the detected value, and To actively reduce the vibration. The safety process in this case includes a process of stopping the supply of the working fluid (air or the like) to the damper to fix the apparatus main body 2 or stopping the operation of the damping actuator.

FIG. 6 is a block diagram showing a safety processing circuit of an exposure apparatus according to another embodiment of the present invention, and corresponds to FIG. 5 of the above-described embodiment. Components that are substantially the same as those of the above-described embodiment will be denoted by the same reference numerals, and description thereof will be omitted.

That is, in this embodiment, in addition to the human body detection sensor 7, a conventional detection method using a switch and a detection method using a curtain sensor are used in combination. A switch 20 is provided in an arbitrary opening 4 of the environmental chamber 1 to open or connect a contact according to opening and closing or detaching of the opening and closing doors 5 and 6 for closing the opening 4, and the information of the contact is determined by a safety determining unit. 9 to send.

Further, a plurality of light projecting portions 21 are arranged in one side edge of an arbitrary opening 4 of the environmental chamber 1 in an array, and a plurality of light receiving portions 22 are provided on the other side edge so as to respectively correspond thereto. Is provided as a curtain sensor, and a detection signal from the light receiving unit 22 is sent to the safety discriminating unit 9 and the monitoring warning unit 10 via a sensor control unit 23 having substantially the same configuration as the sensor control unit 8.

Opening 4 of environmental chamber 1
Sensors (human body detection sensor 7, switch sensor 20, curtain sensors 21 and 22) according to the purpose and shape of
In this case, efficient detection can be performed by selecting an appropriate one from the viewpoints of cost, ease of design change, etc., with safety first.

In this embodiment, signals from an earthquake sensor (acceleration sensor) 24 for detecting floor vibration and a monitoring device (part of the main control device) 25 for monitoring a failure of the device are input to the safety discriminating section 9. are doing.

When an earthquake occurs or some trouble occurs in the apparatus, safety processing such as stopping the drive motor of the apparatus main body 2 and the transport apparatus 3 and stopping the vibration isolator should be performed. Since this safety processing is almost the same processing as when a human body enters, it is not efficient to separately provide devices for safety processing (the safety determination unit 9, the monitoring warning unit 10, etc.).

Therefore, in this embodiment, the earthquake sensor 2
4 and the failure information 25 of the apparatus are input to the safety discriminating unit 9 to be applied to the case where a human body enters, the case where an earthquake of a predetermined seismic intensity or higher occurs, and the case where a failure of the apparatus to stop the apparatus occurs. The safety processing is performed by using the safety processing circuits 9 and 10 described above.

The acceleration sensor 24 for detecting an earthquake can be provided on a base plate on which the apparatus main body 2 is installed, or on a floor on which the base plate is installed. At this time, the acceleration sensor 24 may be provided inside the apparatus main body 2 or outside thereof. In the case of an apparatus provided with an active vibration isolator, an acceleration sensor for detecting the vibration is provided in the apparatus main body 2, so that the apparatus does not need to separately provide a sensor for detecting an earthquake. Body 2
May be input to the safety determination unit 9.

The embodiments described above are described for facilitating the understanding of the present invention, and are not described for limiting the present invention. Therefore, each element disclosed in the above embodiment is intended to include all design changes and equivalents belonging to the technical scope of the present invention.

For example, in the above embodiment, the steps
Although the description has been given of the reduction projection type exposure apparatus of the AND scan method, the entire surface of the reticle pattern is irradiated with exposure illumination light while the reticle and the wafer are stationary, and the wafer on which the reticle pattern is to be transferred. Similarly, a step-up-repeat type reduction projection exposure apparatus (stepper) for batch exposure of the above one partitioned area (shot area), and an exposure apparatus of a mirror projection type, proximity type, contact type, etc. The present invention can be applied.

The present invention is also applicable to a step-and-stitch type reduction projection type exposure apparatus. In this exposure apparatus, a circuit pattern to be formed on a substrate (for example, a reticle substrate) is enlarged by a reciprocal multiple of the reduction ratio, the enlarged pattern is divided into a plurality of parts, each of which is formed on a plurality of reticles. Each pattern of the reticle is projected in a reduced size, and is connected and transferred on a substrate.
When transferring the pattern of each reticle onto the substrate, either a scanning exposure method or a static exposure method may be adopted.
Further, the connecting portion may not be provided between a plurality of patterns transferred adjacently on the substrate. That is, step and
In the stitch method, a reticle pattern is transferred to a plurality of exposure regions that partially overlap each other on a substrate regardless of the presence or absence of a pattern connection portion.

Further, a semiconductor device, a liquid crystal display,
Plasma display, thin film magnetic head, image sensor (C
The present invention is applicable not only to an exposure apparatus used for manufacturing a micro device such as a CD) and a micro machine, but also to an exposure apparatus for transferring a circuit pattern onto a glass substrate or a silicon wafer for manufacturing a reticle or a mask. Applicable. That is, the present invention is applicable irrespective of the exposure method and application of the exposure apparatus.

The light source of the exposure apparatus to which the present invention is applied is not particularly limited, and a KrF excimer laser (wavelength 24
8 nm) and an ArF excimer laser (wavelength 193n)
m), _{F 2} laser (wavelength 157 nm), Kr ₂ laser (wavelength 146 nm), KrAr laser (wavelength 134n
m), Ar ₂ laser (wavelength 126 nm) or the like can be used.

Further, for example, a single-wavelength laser in the infrared or visible range oscillated from a DFB semiconductor laser or a fiber laser is amplified by a fiber amplifier doped with erbium (or both erbium and ytterbium). It is also possible to use a harmonic whose wavelength has been converted to ultraviolet light using a nonlinear optical crystal. Note that an ytterbium-doped fiber laser is used as the single-wavelength oscillation laser.

A reduction projection exposure apparatus using a soft X-ray having a wavelength of about 10 nm as a light source, an X-ray projection apparatus using a light of about 1 nm as a light source
Line exposure apparatus, electron beam (E
The present invention can also be applied to an exposure apparatus that performs exposure and drawing on a photosensitive substrate using B) or an ion beam.

Incidentally, the above-described exposure apparatus includes an illumination optical system, a reticle stage, a wafer stage, a projection optical system,
After the components such as the alignment device are electrically, mechanically or optically connected and assembled, the device main body 2 manufactured by performing comprehensive adjustment (electrical adjustment, operation confirmation, etc.) is mounted on the vibration isolator. And a transfer device 3 having a reticle transfer system and a wafer transfer system, which are mounted on a base plate, in an environmental chamber 1 in which a human body detection sensor 7 is mounted at a predetermined position. It is manufactured by adjusting the sensitivity and the attitude of the environmental chamber 1 so that the detection space substantially matches the predetermined inner surface of the environmental chamber 1. It is desirable that the exposure apparatus be manufactured in a clean room in which the temperature, the degree of cleanliness, and the like are controlled.

The micro device has a step of designing the function and performance of the device, a step of manufacturing a reticle based on the design step, a step of manufacturing a wafer from a silicon material, and a step of manufacturing a reticle by the exposure apparatus of the above-described embodiment. It is manufactured through a step of exposing and transferring a pattern onto a wafer, a device assembling step (including a dicing step, a bonding step, and a package step), an inspection step, and the like.

[0060]

As described above, according to the present invention,
There is an effect that the invasion of the human body can be reliably prevented, and it is not necessary to install the apparatus at each opening of the chamber, and it is possible to flexibly cope with a design change of the chamber.

[Brief description of the drawings]

FIG. 1 is a perspective view showing a part of an exposure apparatus according to an embodiment of the present invention.

FIG. 2 is a side sectional view of the exposure apparatus according to the embodiment of the present invention.

FIG. 3 is a front view of the exposure apparatus according to the embodiment of the present invention.

FIG. 4 is a plan view showing a human body detection sensor and its detection space employed in the exposure apparatus according to the embodiment of the present invention.

FIG. 5 is a block diagram illustrating a configuration of a safety processing circuit of the exposure apparatus according to the embodiment of the present invention.

FIG. 6 is a block diagram illustrating a configuration of a safety processing circuit of an exposure apparatus according to another embodiment of the present invention.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 ... Environmental chamber 2 ... Device main body 3 ... Conveying device 4 ... Opening 5,6 ... Opening / closing door 7 ... Human body detection sensor SA ... Detection space of a human body detection sensor 8 ... Sensor control part 9 ... Safety discrimination part K1-K3 ... Relay 10: Monitoring warning unit 16: Motor drive control unit 17: Motor

Claims (3)

[Claims] 1. An exposure apparatus comprising an apparatus main body housed in a space separated by a chamber, wherein a human body detection sensor for detecting that a part of a human body has entered a predetermined detection space is provided. An exposure apparatus, which is provided so as to substantially coincide with an isolated space defined by a chamber, and performs a predetermined safety process when a human body is detected by the human body detection sensor. 2. An exposure apparatus according to claim 1, further comprising an earthquake detection sensor, wherein the safety processing is performed when the earthquake detection sensor detects a shaking exceeding a predetermined value. 3. The apparatus according to claim 1, further comprising a monitoring device that monitors the occurrence of a failure in the device main body, wherein the safety process is performed when the occurrence of the failure is detected by the monitoring device. Exposure equipment.