JPH11133207A - Optical thin film and refelction preventive article - Google Patents

Abstract

PROBLEM TO BE SOLVED: To obtain the reflection preventive optical thin film easy in manufacture and superior in abrasion and scratching resistance by using a specified compound subjected to hardening treatment. SOLUTION: The reflection preventive optical thin film is made of the hardened compound represented by the formula in which Rf is an alkylene group containing F atoms; (a) is 0 or 1; and (b) is 0, 1, 2, or 3. Rf may be a straight car branched alkylene group, and a part or all of the H atoms are substituted by the F atoms. The preferable alkylene group to be used is a straight chain one from the point of easiness of manufacture and all the H atoms are, preferably, substituted by the F atoms in the case of perfluoroalkylene in order to obtain the optical thin film as low as possible in the reflective index. It is favorable from the point of the easiness of manufacture that (a) is 0 or 1, and if (b) exceeds 3, the hardness of the optical thin film tends to become insufficient.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an anti-reflection film for various display devices such as an anti-reflection film for a cathode ray tube of a television or a liquid crystal display device, an anti-reflection filter for a CRT monitor, a case for exhibition, a show window, and a painting. Forehead, window glass,
The present invention relates to an optical thin film suitably used for an antireflection film of an optical lens, an eyeglass lens and the like, and an antireflection article using the same.

[0002]

2. Description of the Related Art An antireflection article such as an antireflection filter used for a display device or the like has a low refractive index optical thin film provided on a substrate in a single layer, or a high refractive index and low refractive index optical thin film. In many cases, the anti-reflection layer is formed by alternately providing multiple layers.

A method for obtaining such an optical thin film is as follows.
In general, an inorganic substance is laminated on a substrate by vapor deposition, sputtering, or the like, and the antireflection film thus obtained has low reflection and excellent scratch resistance. However, in the method of performing antireflection treatment by vapor deposition or sputtering of an inorganic substance, although a high-performance antireflection layer can be obtained, productivity is poor because a large-scale apparatus requiring vacuum is used, and the production cost is high.
Further, in these methods, the substrate is heated to 80 ° C. or more during vapor deposition or sputtering, so that the usable substrates are limited in terms of heat resistance and the like.

Recently, there has been known a method of dissolving a low-refractive-index organic substance in a solvent, coating the substrate with a low-refractive-index organic substance to form a low-refractive-index organic thin film to form an antireflection film. It became so. Such a solution coating method is disclosed, for example, in JP-A-4-355401 and JP-A-6-355601.
No. -18705. The low refractive index substance used in these solution coating methods is a resin having a high fluorine content, and exhibits excellent antireflection characteristics. In addition, since these form a thin film by solution coating, it is possible to form an anti-reflection film with high productivity, unlike the method of performing anti-reflection treatment by vapor deposition or sputtering of an inorganic substance.

However, the organic thin film made of a fluorine-containing resin described in JP-A-4-355401 or JP-A-6-18705 has a high productivity because it can be solution-coated, and has an excellent reflection due to a low refractive index. Although they exhibit prevention properties, these cured fluorine-containing resins have low cross-linking densities and thus have low surface hardness and poor abrasion resistance. Furthermore, since heat curing is required after coating, usable substrates are limited in terms of heat resistance and the like.

As a fluorine-containing resin having a high surface hardness and a high crosslink density, a cured product of perfluorodivinyl ether disclosed in US Pat. No. 3,310,606 can be mentioned. An optical thin film cannot be obtained because it needs to be molded below.

On the other hand, JP-A-8-239430 proposes a fluorine-containing di (meth) acrylate having a specific chemical structure. However, these compounds generally have low polarity and have a problem in adhesion to the lower layer. In addition, the production requires time and labor in the esterification and purification steps.

[0008]

SUMMARY OF THE INVENTION The present invention is to solve the above-mentioned disadvantages of the prior art, and provides an optical thin film having a low reflectance and excellent scratch resistance and an antireflection article using the same. The purpose is to:

[0009]

In order to achieve the above object, the present invention has the following arrangement.

"(1) General formula

Embedded image (Where Rf is a fluorine-containing alkylene group;
1, b represents an integer of 0 to 3. An optical thin film obtained by curing the compound represented by the formula (1).

(2) An antireflective article comprising the optical thin film according to (1) provided on a transparent substrate. "

[0012]

BEST MODE FOR CARRYING OUT THE INVENTION The compound (hereinafter referred to as compound A) used in the optical thin film of the present invention has a general formula

Embedded image (Where Rf is a fluorine-containing alkylene group;
1, b represents an integer of 0 to 3. ). Rf may be any of a linear or branched alkylene group. Part or all of the hydrogen bonded to carbon is replaced with fluorine.

In the present invention, a linear alkylene group is preferably used because of its ease of production. In order to obtain an optical thin film having a lower refractive index, perfluoro groups in which all hydrogens are substituted with fluorine are used. This is the case for an alkylene group.

The compound most preferably used in the present invention has the general formula

Embedded image Indicated by a represents an integer of 0 to 1 and b represents an integer of 0 to 3. A is 0 or 1 for ease of manufacture. If b exceeds 3, the refractive index tends to increase, and the hardness of the optical thin film tends to be insufficient. m is an integer of 2 or more and 14 or less. Among them, the case where the value of m is 4 or more and 12 or less is preferable. If m is less than 2, it is difficult to obtain a material having a low refractive index, and if it is more than 15, the hardness of the optical thin film tends to be insufficient. Representative examples of compound A are shown below.

[0015]

Embedded image In the present invention, a compound other than compound A, which can be polymerized with compound A, can be added for the purpose of improving or adjusting the performance of the optical thin film, such as the refractive index, hardness, and adhesion (hereinafter, referred to as compound B). .

Representative examples are shown below. Examples of epoxy compounds include aliphatic, alicyclic, and aromatic monofunctional epoxy compounds, propylene glycol diglycidyl ether, hexahydrobisphenol A diglycidyl ether, bisphenol A diglycidyl ether, phthalic acid diglycidyl ester, and dimer acid dimer. Bifunctional epoxy compounds such as glycidyl ester, triglycidyl isocyanurate, tetraglycidyl diaminodiphenylmethane,
3 such as cresol novolak polyglycidyl ether
Functional or higher epoxy compounds, epoxy group-containing silane compounds, fluorine-containing epoxy compounds and the like can be mentioned.

As compounds having a double bond, aliphatic, alicyclic and aromatic mono (meth) acrylates having a high boiling point,
2,2,2-trifluoroethyl (meth) acrylate, 2,2,3,3-tetrafluoropropyl (meth)
Acrylate, 2,2,3,4,4,4-hexafluorobutyl (meth) acrylate, monofunctional (meth) acrylate containing fluorine such as β- (perfluorooctyl) ethyl (meth) acrylate, triethylene glycol di (Meth) acrylate, polyethylene glycol di (meth) acrylate, neopentyl glycol di (meth) acrylate, 1,6-hexanediol di (meth) acrylate, trimethylolpropane tri (meth) acrylate, pentaerythritol tri (meth) acrylate
There are polyfunctional (meth) acrylates such as acrylate, pentaerythritol tetra (meth) acrylate, and dipentaerythritol hexa (meth) acrylate.

Other examples of the compound having a double bond include:
Examples thereof include allyl ether, allyl ester, allyl urethane, unsaturated cycloacetal, vinyl ether, and vinyl group-containing silane compounds.

Examples of the compound having both an epoxy group and a double bond in one molecule include epoxy esters and (meth) acryloyl which have been reacted with (meth) acrylic acid in a form that leaves the epoxy group of the polyfunctional epoxy compound. Oxymethylene cyclohexene oxide and the like.

A silane compound such as epoxy silane and vinyl silane is also used for increasing the hardness of the optical thin film.

The compound B may be used alone or in combination, but is particularly preferably a fluorine-containing compound. When a compound having a double bond is used, it is preferable to use a compound having both an epoxy group and a double bond in one molecule in order to increase the hardness of the optical thin film.

The mixture of compound A and compound B is preferably compatible in order to obtain a highly transparent optical thin film.

The compounding ratio of the compound A and the compound B varies depending on the purpose of adding the compound B.
Is 50% by weight or more and Compound B is 50% by weight or less. Above all, compound A 60% by weight or more, compound B4
0% by weight or less is more preferable. 50% by weight of compound B
When the ratio exceeds 1, the refractive index at the D line tends to be 1.45 or more, and the antireflection performance, which is the original purpose, tends to decrease. In addition, there is also a tendency that the hardness of the optical thin film becomes lower than a practical level.

The following compounds are preferably used for curing (also referred to as polymerization) the compound A or a mixture of the compound A and the compound B.

Examples of the epoxy group curing agent include compounds of amine type, acid anhydride type, phenol type, mercaptan type, hydrazide type, imidazole type, and cation imparting type. From the length of pot life and the speed of curing speed,
Among these curing agents, a cation-imparting system is particularly preferably used. Among them, a photodegradation cation imparting system is suitable, and aromatic diazonium salts, diallyliodonium salts,
Triallylsulfonium salts, triallylselenium salts,
Triarylpyrylium salts, benzylpyridinium thiocyanates, dialkylphenacylsulfonium salts, dialkylhydroxyphenylsulfonium salts, dialkylhydroxyphenylphosphonium salts, metallocene compounds and the like.

For the polymerization of double bonds, azo and organic peroxide compounds are used as thermal radical polymerization initiators, and aromatic ketone and aromatic ketone-amine compounds are used as photoradical polymerization initiators. Examples of the photodecomposition cationic polymerization initiator include the above-described compounds of the photodecomposition cation imparting system described as the curing agent for the epoxy group. In the present invention, a photoradical polymerization initiator is suitably used in view of the length of the pot life, the high polymerization rate, and the hardness of the optical thin film.

In addition, metal chelate compounds such as aluminum, iron and copper, for example, aluminum acetylacetonate, aluminum bisethylacetoacetate monoacetylacetonate, aluminum di-n-butoxide monoethylacetoacetate, aluminum di-i-i
Compounds such as so-propoxide monomethyl acetoacetate are used as curing agents for silane compounds and epoxy compounds.

The above-mentioned curing agents and polymerization initiators are used alone or in combination, and are usually used in an amount of 0.00% with respect to a compound having an epoxy group, a compound having a double bond and a silane compound.
It is used in an amount of about 5 to 20% by weight.

The compounds A and B, the curing agent and the polymerization initiator are usually dissolved in alcohols, ketones, esters, dimethylformamide, hydrocarbons and the like, and used as a coating solution (coating solution). However, when a cation-imparting photopolymerization initiator is used, a solvent having a strong polarity such as alcohols or water cannot be generally used because it becomes a polymerization inhibitor of the photopolymerization initiator. The concentration of the coating liquid should be determined according to the coating conditions (coating method, thickness, etc.) of the optical thin film, but is usually about 0.1 to 30% by weight. When a silane compound is used, it is usually preferable to add a necessary amount of water in advance and hydrolyze it.

In addition, a leveling agent for uniform coating and a coupling agent for imparting adhesion may be added to the coating liquid.

Next, a method for obtaining the optical thin film of the present invention will be described. First, a coating liquid is uniformly applied to a transparent substrate by a method such as spin coating, dip coating, die coating, spray coating, bar coating, roll coating, curtain flow coating, and the solvent is removed. Subsequently, the coating film is cured to a practical level by heating or light irradiation. Among them, a method of curing by ultraviolet irradiation using a low-pressure or high-pressure mercury lamp, a xenon lamp or the like is a preferable embodiment of the present invention from the viewpoint of high productivity. In the double bond polymerization, the reaction is preferably performed under an inert gas atmosphere.

Glass, polycarbonate resin, acrylic resin, polyethylene terephthalate resin, norbornene resin, vinyl chloride resin, styrene resin, diethylene glycol are preferably used as the material of the transparent substrate provided with antireflection performance by the optical thin film of the present invention. It is a transparent material such as diallyl carbonate resin and has a higher refractive index than at least the optical thin film. If the refractive index of the transparent substrate is lower than the refractive index of the optical thin film, the desired anti-reflection performance cannot be obtained.

When the transparent substrate is a resin, scratch resistance may be required depending on the application. In order to enhance the scratch resistance of the resin substrate, a hard coat layer is usually provided on the surface by a wet coating method.

As the hard coat layer, a coating film containing or not containing ultrafine particles of a metal compound such as silicon oxide, antimony oxide, selenium oxide and titanium oxide in an organic or inorganic binder or a mixed binder of both is generally used. It is used for As the organic binder, an epoxy resin cured product or a radical cross-linked polymerized resin,
Examples of the inorganic binder include a hydrolysis-hardened product of a silane-based compound, but are not particularly limited in the present invention.

The thickness of the hard coat layer is usually about 0.5 to 10 μm, so that the balance between the provision of the scratch resistance function and the other properties (for example, prevention of cracks) is achieved.

If the refractive index of the hard coat layer is significantly different from that of the transparent substrate, so-called interference fringes become conspicuous. To prevent this, the refractive index of the hard coat layer is set to the refractive index of the transparent substrate. It is preferable to control within ± 0.02 of the above.

When it is desired to use a transparent resin for the substrate and obtain an antireflective article having scratch resistance, the optical thin film is provided on the transparent substrate provided with the hard coat layer as described above.

In the optical thin film of the present invention, when a light beam enters a substrate having the thin film, the light beam causes interference at a boundary having a different refractive index. For example, when a transparent optical thin film is provided on a transparent substrate, part of the incident reflected light is reflected at the boundary between air and the thin film, part is reflected at the thin film-substrate interface, and the reflected light as a whole is Becomes the interference light. The interference light results in a reduction or increase in the reflectivity of the substrate. The optical thin film is thin enough to cause interference of light, and the reflectance of the substrate depends on the refractive index and the thickness of the optical thin film.

In the present invention, the use of the optical thin film is not particularly limited. However, when providing an optical thin film having a low refractive index for the purpose of reducing the reflectance, the thickness of the optical thin film is λ / 4.
A multiple of n is preferred. Here, λ indicates the wavelength of light, and n
Is the refractive index of the thin film. When the wavelength of the light exists with a certain width, λ indicates the central wavelength of the light. The wavelength of light to be used in the present invention is visible light in many cases, and the center wavelength is preferably set to 500 to 550 nm, which is usually felt by humans.

When an optical thin film having a low refractive index is provided, its thickness depends on the refractive index of the film, but is preferably 70 to 200 n.
m, more preferably 80 to 120 nm, even more preferably 90 to 110 nm. Optical film thickness is 7
If it is less than 0 nm, the reduction of the reflectance due to light interference with visible light may be insufficient. If the thickness of the optical thin film exceeds 200 nm, the reflectivity almost depends only on the reflection at the interface between the air and the thin film, so that the reflectivity tends to be insufficiently reduced due to light interference with visible light.

It is known that the anti-reflection effect of the optical thin film can be enhanced by laminating multilayer films having different refractive indexes according to the optical film thickness. Also in the present invention, if a high refractive index layer higher than the refractive index of the transparent substrate or the hard coat layer is provided between the transparent substrate or the hard coat layer and the optical thin film, the performance of the antireflective article can be further improved. It is possible. In this case, the refractive index of the high refractive index layer is required to be 1.56 or more, preferably 1.6 or more, more preferably 1.7 or more, as measured at 20 ° C. by D line.

The high refractive index layer is formed by forming a conductive compound such as ITO into a film by a vacuum deposition method or a sputtering method, or by using an organic or inorganic binder or a mixed binder of both.
Antimony oxide, selenium oxide, titanium oxide, tin oxide,
Ultra-fine particles of metal compounds with high refractive index such as antimony-doped tin oxide, phosphorus-doped tin oxide, zinc oxide, zinc antimonate, tin-doped indium oxide,
In some cases, a thin film is formed without being dispersed. Although not limiting the present invention, as the organic binder,
A cured product of an epoxy resin or a resin subjected to radical cross-linking polymerization is used. As the inorganic binder, a hydrolyzed cured product of a silane-based compound is used.

Although the thickness of the high refractive index layer depends on the refractive index of the film, it is specifically 90 to 400 nm, more preferably 1 to 400 nm.
The range is 10 to 180 nm.

The ultrafine particles used in the high refractive index layer, tin oxide, antimony-doped tin oxide, phosphorus-doped tin oxide, zinc antimonate has a conductivity as indium tin oxide, 10 ¹⁰ the high refractive index layer itself -10Ω /
It is preferable to have a degree of conductivity of about □ because the antireflective article can be provided with an antistatic function and further an electromagnetic wave shielding function.

[0045]

EXAMPLES The present invention will be described in detail with reference to examples, but is not limited thereto.

Example 1 A coating solution A having the following composition was prepared.

[0047]

Embedded image 90 parts by weight of methyl isobutyl ketone Spin coating of the coating solution A onto a 2 mm thick PMMA plate,
Treated in oven at 10 ° C for 10 minutes. 500 with high pressure mercury lamp
Irradiation was performed at 0 mJ / cm ² to obtain a cured film having a thickness of 95 nm.
The refractive index of the obtained film is nd = 1.41 (beam profile reflectance measurement method), and the single-sided reflectance at 540 nm is 1.3% (spectrophotometer method, the back surface is painted black to eliminate reflection on the back surface). The surface reflectance of the sample piece was defined as one-sided reflectance).

Reference Example 1 The single-sided reflectance at 540 nm of the above-mentioned PMMA plate without any coating was 3.5%.

Example 2 A coating solution B having the following composition was prepared.

[0050]

Embedded image 90 parts by weight of methyl isobutyl ketone The coating solution B was spin-coated on a polycarbonate plate having a thickness of 2 mm and treated in an oven at 80 ° C. for 10 minutes. Irradiation was performed with a high-pressure mercury lamp at 5000 mJ / cm ² to obtain a cured film having a thickness of 95 nm.

The refractive index of the obtained film is nd = 1.39,5
The single-sided reflectance at 40 nm was 1.0%.

Reference Example 2 The single-sided reflectance at 540 nm of the uncoated polycarbonate plate was 5.2%.

Example 3 A coating solution C having the following composition was prepared.

[0054]

Embedded image 90% by weight of methyl isobutyl ketone Spin coating of the coating solution C onto a 2 mm thick PMMA plate,
Treated in oven at 10 ° C for 10 minutes. 500 with high pressure mercury lamp
Irradiation was performed at 0 mJ / cm ² to obtain a cured film having a thickness of 95 nm.

The refractive index of the obtained film is nd = 1.40,5
The single-sided reflectance at 40 nm was 1.2%.

Example 4 A coating solution D having the following composition was prepared.

[0057]

Embedded image Pentaerythritol triacrylate 2 parts by weight

Embedded image 90 parts by weight of methyl isobutyl ketone The coating liquid D was spin-coated on a polycarbonate plate having a thickness of 2 mm and treated in an oven at 80 ° C. for 10 minutes. Under a N2 seal, irradiate 5000 mJ / cm ² with a high pressure mercury lamp to
A 5 nm cured film was obtained.

The refractive index of the obtained film is nd = 1.43,5
The single-sided reflectance at 40 nm was 1.6%.

Example 5 A coating liquid E was prepared by adding a methoxy group equivalent amount of water and a trace amount of hydrochloric acid to the following composition to hydrolyze the methoxy group.

[0060]

Embedded image Aluminum acetylacetonate 0.3 parts by weight Methyl isobutyl ketone 240 parts by weight The coating solution E was dip-coated on a 2 mm-thick polycarbonate plate and treated in an oven at 80 ° C. for 10 minutes. After irradiation with a high-pressure mercury lamp at 5000 mJ / cm ² , after-curing was performed in an oven at 130 ° C. for 3 hours to obtain a cured film having a thickness of 95 nm.

The refractive index of the obtained film is nd = 1.44,5
The single-sided reflectance at 40 nm was 1.8%. Further, the scratch resistance was good.

Example 6 A coating liquid F was prepared by adding water equivalent to a methoxy group and a small amount of hydrochloric acid to the following composition to hydrolyze the methoxy group.

[0063]

Embedded image 90 parts by weight of methyl isobutyl ketone The coating solution F was spin-coated on a polycarbonate plate having a thickness of 2 mm and treated in an oven at 80 ° C. for 10 minutes. Under a N ₂ seal, irradiate 8000 mJ / cm ² with a high pressure mercury lamp,
A 5 nm cured film was obtained.

The refractive index of the obtained film is nd = 1.44,5
The single-sided reflectance at 40 nm was 1.8%. Further, the scratch resistance was good.

Examples 7 to 12 A polycarbonate plate having a thickness of 2 mm (refractive index nd = 1.5
9), an antimony pentoxide ultrafine particle, γ-glycidoxypropyltrimethoxysilane, bisphenol A epoxy resin as a main component, aluminum acetylacetonate as a curing catalyst, refractive index nd = 1.59, thickness A thermosetting hard coat layer having a thickness of 3 μm was provided.

In the same manner as in Examples 1 to 6, coating solutions A, B, C,
D, E and F were applied to the substrate with the hard coat layer and cured, and the results shown in Table 1 were obtained. All exhibited high abrasion resistance.

[0067]

[Table 1] Examples 13 to 18 To the substrate with a hard coat layer used in Examples 7 to 12,
A layer mainly composed of antimony-doped ultrafine tin oxide particles and pentaerythritol triacrylate was formed, and radical-crosslinking and curing were performed to form a conductive layer. This film has a thickness of 150
nm, refractive index nd = 1.70, surface resistance 3 × 10 ⁸ Ω
/ □.

To the substrate having the hard coat layer and the conductive layer,
Coating liquids A, B, C, D, E, and F were applied and cured in the same manner as in Examples 1 to 6, and the results in Table 2 were obtained. All exhibited high abrasion resistance.

[0069]

[Table 2] Example 19 An ITO film having a thickness of 145 nm was provided on a glass plate having a refractive index nd of 1.53 and a thickness of 2 mm by a vacuum evaporation method. The surface resistance of this film is 2 × 10Ω / □.

A coating solution G having the following composition was prepared.

[0071]

Embedded image 90 parts by weight of methyl isobutyl ketone The coating liquid G is spin-coated on the substrate with the ITO film,
Treated in oven at 10 ° C for 10 minutes. 500 with high pressure mercury lamp
Irradiation was performed at 0 mJ / cm ² to obtain a cured film having a thickness of 95 nm.

The refractive index of the obtained film was nd = 1.40,5
The single-sided reflectance at 40 nm was 0.6%.

Example 20 A paint H having the following composition was prepared.

[0074]

Embedded image "Sun-Aid" SI100L (cationic polymerization initiator, manufactured by Sanshin Chemical Industry Co., Ltd.) 0.1 parts by weight 95 parts by weight of butyl acetate A 2 mm-thick polycarbonate plate is dip-coated with the coating material H, and an oven at 80 ° C. for 30 minutes. Processed. Irradiation was performed with a high-pressure mercury lamp at 2000 mJ / cm ² to obtain a cured film having a thickness of 95 mm. The refractive index of the obtained film is nd = 1.40, 54
The single-sided reflectance at 0 nm was 1.1%.

Example 21 Paint I having the following composition was prepared.

[0076]

Embedded image "Sun-Aid" SI100L 0.1 parts by weight 95 parts by weight of butyl acetate The coating material I was dip-coated on a polycarbonate plate having a thickness of 2 mm, and treated in an oven at 80 ° C for 30 minutes. Irradiation was performed with a high-pressure mercury lamp at 2000 mJ / cm ² to obtain a cured film having a thickness of 95 mm. The refractive index of the obtained film is nd = 1.41, 54
The single-sided reflectance at 0 nm was 1.2%.

The surface hardness of the coating film was higher than that of Example 20.

Example 22 A paint J having the following composition was prepared.

[0079]

Embedded image "Sun-Aid" SI100L 0.1 parts by weight 95 parts by weight of butyl acetate A 2 mm-thick polycarbonate plate was dip-coated with paint J and treated in an oven at 80 ° C for 30 minutes. Irradiation was performed with a high-pressure mercury lamp at 2000 mJ / cm ² to obtain a cured film having a thickness of 95 mm. The refractive index of the obtained film is nd = 1.41, 54
The single-sided reflectance at 0 nm was 1.2%.

The surface hardness of the coating film was higher than that of Example 20.

Examples 23 to 25 Coating liquids G, H, and I were applied to the substrates having the hard coat layer and the conductive layer used in Examples 13 to 18 in the same manner as in Examples 20 to 22, and cured. The result was obtained. All exhibited high abrasion resistance.

[0082]

[Table 3] Example 26 Paint K having the following composition was prepared.

[0083]

Embedded image CI2921 (cationic polymerization initiator, manufactured by Nippon Soda Co., Ltd.) 0.1 parts by weight 95 parts by weight of butyl acetate A polycarbonate plate having a thickness of 2 mm is dip-coated with paint K and treated in an oven at 130 ° C. for 2 hours. Thickness 90
nm cured film was obtained. The refractive index of the obtained film is nd = 1.
The single-sided reflectance at 41 and 540 nm was 1.2%.

Example 27 A coating material L having the following composition was prepared.

[0085]

Embedded image γ-glycidoxypropyltrimethoxysilane 1 part by weight Aluminum acetylacetonate 0.25 part by weight N-propyl alcohol 95 parts by weight The paint L is dip-coated on a 2 mm-thick polycarbonate plate, and is heated in a 130 ° C. oven for 2 hours. Process to a thickness of 90
nm cured film was obtained. The refractive index of the obtained film is nd = 1.
The single-sided reflectance at 42 and 540 nm was 1.4%.

Examples 28 to 29 Coating liquids K and L were applied and cured to the substrates having the hard coat layer and the conductive layer used in Examples 13 to 18 in the same manner as in Examples 26 and 27, and the results shown in Table 4 were obtained. Obtained. All exhibited high abrasion resistance.

[0087]

[Table 4]

[0088]

According to the present invention, it is possible to provide an antireflection optical thin film excellent in abrasion resistance and an antireflection article using the same, which can be easily produced.

Claims (10)

[Claims] 1. A compound of the general formula (Where Rf is a fluorine-containing alkylene group and a is 0 to 0)
1 and b represent an integer of 0 to 3). 2. Rf is-(CF ₂ ) _m- (where m
2 is an integer of 2 or more and 14 or less). 3. The optical thin film according to claim 1, wherein Rf is — (CF ₂ ) _n — (where n is an integer of 4 or more and 12 or less). 4. The optical thin film according to claim 1, wherein a D-line refractive index at 20 ° C. is 1.45 or less. 5. The optical thin film according to claim 1, wherein the optical thin film is cured by light. 6. An anti-reflection article comprising a transparent substrate provided with the optical thin film according to claim 1. 7. The method according to claim 1, wherein the transparent substrate has a refractive index of ±
The anti-reflective article according to claim 6, wherein a hard coat layer having a refractive index within 0.02 is provided. 8. The method according to claim 8, wherein the transparent substrate has a refractive index of ±
7. A hard coat layer having a refractive index within 0.02 and a high refractive index layer having a higher refractive index than the hard coat layer are further provided thereon.
The antireflective article according to the above. 9. The antireflective article according to claim 6, wherein the transparent substrate is provided with a high refractive index layer having a refractive index higher than the refractive index of the substrate. 10. The high refractive index layer is provided with conductivity by conductive ultrafine particles.
10. The antireflective article according to any one of 9 above.