JPH11121931A - Printed wiring board and its manufacture - Google Patents

Printed wiring board and its manufacture

Info

Publication number
JPH11121931A
JPH11121931A JP29959897A JP29959897A JPH11121931A JP H11121931 A JPH11121931 A JP H11121931A JP 29959897 A JP29959897 A JP 29959897A JP 29959897 A JP29959897 A JP 29959897A JP H11121931 A JPH11121931 A JP H11121931A
Authority
JP
Japan
Prior art keywords
layer
hole
laser
forming
thin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP29959897A
Other languages
Japanese (ja)
Other versions
JP3678562B2 (en
Inventor
Keiichi Kishimoto
圭一 岸本
Masaki Uemae
昌己 上前
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Carbide Industries Co Inc
Original Assignee
Nippon Carbide Industries Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Carbide Industries Co Inc filed Critical Nippon Carbide Industries Co Inc
Priority to JP29959897A priority Critical patent/JP3678562B2/en
Publication of JPH11121931A publication Critical patent/JPH11121931A/en
Application granted granted Critical
Publication of JP3678562B2 publication Critical patent/JP3678562B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Production Of Multi-Layered Print Wiring Board (AREA)

Abstract

PROBLEM TO BE SOLVED: To prevent electrical connection failure due to air accumulation, abnormal deposition, or the like from occurring, by making laser irradiate a wider area than a thin-layer part, forming a hole to get to a lower-layer conductor layer at a thin-layer part and an insulation resin layer, and then electrically connecting an upper layer metal foil and a lower layer conductor layer via the hole. SOLUTION: A dry film is laminated on an upper-layer copper foil 3 of a laminated resin body with a copper foil, a pattern is exposed to a position where a via hole is preferably formed by UV irradiation, and development and half etching are made, thus forming a thin-layer part 8. Then, a carbon dioxide gas laser device is positioned and set, laser 4 with a diameter W1 that is larger than a dimension W2 of the thin-layer part 8 is applied, the thin-layer part 8 and an epoxy resin 1 are melted, vaporized, and dissolved for forming a hole 5, and a dry film is peeled. Then, the inside of the hole 5 is subjected to smearing treatment, and a copper plating for electrically connecting an upper layer copper foil 3 and a lower layer copper foil 2 via the hole 5 is performed, thus forming a via hole 6 and hence achieving reliable electrical connection.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、プリント配線板及びそ
の製造方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a printed wiring board and a method for manufacturing the same.

【0002】[0002]

【従来の技術】近年、電子機器の小型化に伴い、プリン
ト配線板の小型化、高密度化、軽量化、高信頼性などが
求められている。これらの要求のためにプリント配線板
素材そのもの以外に導体幅、導体間隙、スルホール、ビ
アホールなどの微細化、小型化、信頼性などが求められ
ている。なかでもビアホールは、インナービアホール、
ブラインドビアホールとして微細化、小型化、電気接続
の信頼性等が求められている。従来ビアホールの形成方
法としてドリルによる孔加工、レーザによる孔加工が提
案されている。例えば、レーザによる孔加工として特開
昭58−64097、特開昭61−95792などの公
報である。
2. Description of the Related Art In recent years, as electronic devices have become smaller, there has been a demand for smaller, higher density, lighter weight, higher reliability printed circuit boards. For these requirements, in addition to the printed wiring board material itself, miniaturization, miniaturization, reliability, and the like of the conductor width, conductor gap, through hole, via hole, and the like are required. Among them, the via hole is the inner via hole,
For the blind via hole, miniaturization, miniaturization, reliability of electrical connection, and the like are required. Conventionally, drilling and laser drilling have been proposed as via hole forming methods. For example, JP-A-58-64097 and JP-A-61-95792 disclose laser drilling.

【0003】特開昭58−64097号公報には、概ね
電気的接続すべき導体層のうちの最下層より上の導体層
に予め孔(レーザのビーム径より少し小さな孔をエッチ
ングにより形成しておく)を明けておき、上から前記孔
を介してレーザを照射し(基板表面を走査し)、最上層
から前記最下層までの導体層間の樹脂層を除去する多層
印刷回路基板の製造方法が開示されている。
Japanese Unexamined Patent Application Publication No. 58-64097 discloses that a hole (slightly smaller than the laser beam diameter) is formed in a conductor layer above the lowermost layer of a conductor layer to be electrically connected by etching in advance. ), A laser is irradiated from above through the holes (substrate surface is scanned), and the resin layer between the conductor layers from the uppermost layer to the lowermost layer is removed. It has been disclosed.

【0004】特開昭61−95792号公報には、概ね
金属箔除去部分を覆う光照射面積をもつレーザ光によっ
て孔開けする(レーザ光の照射面積を金属箔除去部分よ
り大きくする)印刷配線板の製造方法が開示されてい
る。
Japanese Patent Application Laid-Open No. 61-95792 discloses a printed wiring board in which holes are made by a laser beam having a light irradiation area which covers a metal foil removed portion (the laser light irradiation area is made larger than the metal foil removed portion). Is disclosed.

【0005】[0005]

【発明が解決しようとする課題】前記公報などに記載の
ように予め導体層に孔を明けておき、該孔よりも広い面
積にレーザを照射する又は該孔より広範囲にレーザを走
査して照射する方法においては、導体層の該孔がレーザ
光の照射のマスクとなり樹脂層を除去する効果がある。
しかしながら、予め導体層に穴を明ける工程では、孔径
の精度が良くない問題がある。また、レーザによる孔あ
け工程では、照射したレーザが下層の導体層で反射して
樹脂層を更に除去して樹脂層における穴をより大きくす
る。更に、下層の導体層で反射したレーザが上層の導体
層の裏面で反射して樹脂層を除去して上層の導体層の裏
面の近傍の樹脂層における穴をより大きく、広くする。
上層の導体層の裏面の近傍の樹脂層における穴が上層の
導体層の孔よりも大きくなり、ビアホールの電気接続の
工程において空気溜まり、異常析出などによる電気接続
不良となる重大な問題がある。
As described in the above publications, a hole is previously formed in a conductor layer, and a laser is irradiated to an area larger than the hole or a laser is scanned over a wider area than the hole. In this method, the holes in the conductor layer serve as a mask for laser beam irradiation, and have an effect of removing the resin layer.
However, in the step of previously drilling holes in the conductor layer, there is a problem that the accuracy of the hole diameter is not good. In the laser drilling step, the irradiated laser is reflected by the lower conductor layer and the resin layer is further removed to make the hole in the resin layer larger. Further, the laser beam reflected by the lower conductor layer is reflected by the back surface of the upper conductor layer to remove the resin layer, thereby making the hole in the resin layer near the back surface of the upper conductor layer larger and wider.
The hole in the resin layer near the back surface of the upper conductor layer becomes larger than the hole in the upper conductor layer, and there is a serious problem that air is trapped in the electric connection process of the via hole and an electric connection failure occurs due to abnormal deposition or the like.

【0006】[0006]

【課題を解決するための手段】本発明は、金属箔及び絶
縁樹脂層を積層した基板に回路パターンを形成するプリ
ント配線板及びその製造方法において、上層金属箔を部
分的に選択除去して薄層部を形成する工程、該薄層部よ
り広い面積にレーザを照射して下層導体層に達する孔を
該薄層部及び絶縁樹脂層に形成する工程、該孔を介して
該上層金属箔及び該下層導体層を電気接続する工程と、
サブトラクティブ方法により該上層金属箔に回路パター
ンを形成する工程より成ることである。上層金属箔3に
寸法W2で該上層金属箔の厚みより薄くされた薄層部8
が形成される工程では、該上層金属箔の厚さの全部を孔
開けするのに比較して途中で孔開けを中止して薄層部を
形成するため該薄層部の寸法W2のサイズが精度良く均
一に形成できる。また、レーザを照射して孔を形成する
工程では、レーザのエネルギーで該薄層部8のほぼ中心
部より溶融・気化が始まって穴があき、前記薄層部のほ
ぼ中心部の該穴より絶縁樹脂層1が溶融・気化・分解し
て孔を形成する過程で薄層部がレーザのビームに対する
マスクとなりレーザの照射の径より小さい径から穴あけ
が開始され下層導体層2に孔5が到達するときには薄層
部がほぼ全域的に溶融・気化され、上層金属箔の近傍
に、より大きい孔が形成されることがないので電気接続
の工程での空気溜まり、異常析出などによる電気接続不
良がない、などの問題を解決した精確であり、信頼性の
高いプリント配線板及びその製造方法を提供することで
ある。
SUMMARY OF THE INVENTION The present invention relates to a printed wiring board for forming a circuit pattern on a substrate on which a metal foil and an insulating resin layer are laminated, and a method for manufacturing the same. Forming a layer portion, forming a hole in the thin layer portion and the insulating resin layer by irradiating a laser to an area larger than the thin layer portion and reaching the lower conductive layer, the upper metal foil through the hole, Electrically connecting the lower conductor layer;
Forming a circuit pattern on the upper metal foil by a subtractive method. A thin layer portion 8 of the upper metal foil 3 having a dimension W2 smaller than the thickness of the upper metal foil.
Is formed in the step of forming the thin layer portion, and the size of the dimension W2 of the thin layer portion is reduced in comparison with forming the entire thickness of the upper metal foil by forming the thin layer portion. It can be formed accurately and uniformly. Further, in the step of forming a hole by irradiating a laser, melting and vaporization start from a substantially central portion of the thin layer portion 8 by laser energy to form a hole, and a hole is formed at a substantially central portion of the thin layer portion. In the process of forming holes by melting, vaporizing, and decomposing the insulating resin layer 1, the thin layer portion becomes a mask for a laser beam, drilling is started from a diameter smaller than the diameter of laser irradiation, and the holes 5 reach the lower conductor layer 2. When the thin layer is melted and vaporized almost entirely, no large holes are formed in the vicinity of the upper metal foil. It is an object of the present invention to provide an accurate and highly reliable printed wiring board that has solved the problems such as no printed wiring board and a method for manufacturing the same.

【0007】以下、本発明に係るプリント配線板及びそ
の製造方法について詳述する。図1(a)図1(b)
は、本発明に係るプリント配線板及びその製造方法を示
す一実施態様切断面図である。図2は、従来の実施態様
を示す切断面図である。
Hereinafter, a printed wiring board according to the present invention and a method for manufacturing the same will be described in detail. 1 (a) and 1 (b)
1 is a cross-sectional view of one embodiment showing a printed wiring board according to the present invention and a method for manufacturing the same. FIG. 2 is a sectional view showing a conventional embodiment.

【0008】本発明に係るプリント配線板及びその製造
方法は、一般的に金属箔及び絶縁樹脂層を積層した基板
において、ホール形成所望位置の上層金属箔を部分的に
選択除去して薄層部を形成し、該薄層部より広い面積に
レーザを照射することにより該薄層部及び絶縁樹脂層に
孔あけして下層導体層に達する孔を形成し、該孔を介し
て該上層金属箔及び該下層導体層を電気接続し、サブト
ラクティブ方法により金属箔に回路パターンを形成した
ものである。尚、必要に応じて表面保護する塗膜を形成
する。
In a printed wiring board and a method of manufacturing the same according to the present invention, a thin layer portion is generally formed by selectively removing an upper metal foil at a desired position for forming a hole on a substrate on which a metal foil and an insulating resin layer are laminated. And irradiating a laser to an area larger than the thin layer portion to form a hole in the thin layer portion and the insulating resin layer to form a hole reaching the lower conductor layer, and the upper metal foil through the hole. And a circuit pattern formed on a metal foil by a subtractive method by electrically connecting the lower conductor layer. In addition, a coating film for protecting the surface is formed as necessary.

【0009】また、本発明に係るプリント配線板及びそ
の製造方法は、図1に示す構造を必ずしも採る必要がな
く、プリント配線板の必要に応じて層数を任意の複数層
としてもよく、ホール[スルホール(2層間スルホー
ル、多層間スルホールなど)、ビアホール(2層間ビア
ホール、多層間ビアホール、ブラインドビアホール、イ
ンナービアホールなど)]を所望位置に形成すればよ
く、回路パターンは所望設計回路によりパターン化して
アディティブ方法で形成すればよい。
Further, the printed wiring board and the method of manufacturing the same according to the present invention do not necessarily need to adopt the structure shown in FIG. 1, and the printed wiring board may have any number of layers as needed, [Sulholes (two-layer through holes, multi-layer through holes, etc.) and via holes (two-layer via holes, multi-layer via holes, blind via holes, inner via holes, etc.)] may be formed at desired positions. It may be formed by an additive method.

【0010】本発明に係るプリント配線板及びその製造
方法の絶縁樹脂層は、特に限定されるものではない。一
般的にプリント配線板に使用されている樹脂を主成分と
するものでよく、樹脂を不織布・織布に含浸させたもの
でもよく、有機・無機の充填材を樹脂に充填したもので
もよく、また、これらが複合されたものでもよい。
[0010] The insulating resin layer of the printed wiring board and the method of manufacturing the same according to the present invention is not particularly limited. A resin mainly used for a printed wiring board may be used as a main component, a resin impregnated in a nonwoven fabric or a woven fabric may be used, or a resin filled with an organic or inorganic filler may be used. Further, these may be combined.

【0011】本発明に係るプリント配線板及びその製造
方法の金属箔は、特に限定されるものではない。一般的
にプリント配線板に使用される銅、ステンレス、ニクロ
ム、タングステン、アルミニウムなどの箔でよい。好ま
しくは銅の箔である。また、金属箔の厚さは7〜50μ
mが好ましい。更に好ましくは、7〜40μmである。
特に好ましくは、7〜25μmである。このような厚み
の金属箔は、製造、ハンドリングなどが容易であり入手
がし易い。
The printed wiring board according to the present invention and the metal foil used in the method for manufacturing the same are not particularly limited. A foil such as copper, stainless steel, nichrome, tungsten, and aluminum generally used for a printed wiring board may be used. Preferably, it is a copper foil. Moreover, the thickness of the metal foil is 7 to 50μ.
m is preferred. More preferably, it is 7 to 40 μm.
Particularly preferably, it is 7 to 25 μm. The metal foil having such a thickness is easy to manufacture and handle, and is easily available.

【0012】本発明に係るプリント配線板及びその製造
方法の上層金属箔を部分的に選択除去して薄層部を形成
する方法は、特に限定されるものではない。金属箔表面
にエッチング・マスクとなる層を形成し、孔の形成所望
位置の該エッチング・マスクを除去して該エッチングマ
スクの除去されている部分の金属箔をエッチング液によ
りエッチングして薄層部を形成する。エッチング・マス
クとしてスクリーン印刷方法、写真方法などによるエッ
チングレジストまたは、半田、Ni−Auなどによる金
属層エッチングレジストなどが例示できる。薄層部の金
属箔の残り厚さは、元の金属箔の5〜50%であること
が好ましい。更に好ましくは、5〜40%である。この
ような厚さであればレーザによる金属箔の孔がシャープ
である。また、元の金属箔の全厚さをエッチングするの
に比較して途中で中止して薄層部を形成するためにエッ
チング径が精確である。
The method of forming the thin layer portion by partially removing the upper metal foil of the printed wiring board and the method of manufacturing the same according to the present invention is not particularly limited. A layer serving as an etching mask is formed on the surface of the metal foil, the etching mask at a desired position for forming a hole is removed, and the metal foil at a portion where the etching mask is removed is etched with an etching solution to form a thin layer portion. To form Examples of the etching mask include an etching resist by a screen printing method, a photographic method, or the like, or a metal layer etching resist by solder, Ni-Au, or the like. The remaining thickness of the metal foil in the thin layer portion is preferably 5 to 50% of the original metal foil. More preferably, it is 5 to 40%. With such a thickness, the hole in the metal foil by the laser is sharp. Further, compared to etching the entire thickness of the original metal foil, the etching diameter is accurate because it is stopped halfway and a thin layer portion is formed.

【0013】本発明に係るプリント配線板及びその製造
方法の孔の形成方法は、レーザによる方法であり該レー
ザの種類を特に限定するものではない。高エネルギーな
炭酸ガスレーザ、紫外線レーザ、Xeレーザ、エキシマ
レーザ、YAGレーザ、Arレーザなどが例示できる。
好ましくは、炭酸ガスレーザ、紫外線レーザである。更
に好ましくは、樹脂が炭化現象することなく分解して孔
開けする紫外線レーザである。このようなレーザを用い
ることにより、より小さな径の孔を素早く精確にあける
ことができる。また、エッチングにより薄層部が形成さ
れ該薄層部の表面が凹凸状態となりレーザのエネルギー
をよく吸収する効果がある。薄層部以外の金属箔表面で
はレーザが反射されてほとんど溶融しなく、レーザは該
薄層部の凹凸状態でエネルギーが吸収されて溶融・気化
する。即ち、該薄層部以外の金属箔がマスクとなり孔が
形成される。
The method of forming holes in the printed wiring board and the method of manufacturing the same according to the present invention is a method using a laser, and the type of the laser is not particularly limited. Examples thereof include a high energy carbon dioxide laser, an ultraviolet laser, a Xe laser, an excimer laser, a YAG laser, and an Ar laser.
Preferably, a carbon dioxide laser and an ultraviolet laser are used. More preferably, it is an ultraviolet laser in which the resin is decomposed and perforated without carbonization. By using such a laser, holes of smaller diameter can be quickly and accurately drilled. Further, a thin layer portion is formed by etching, and the surface of the thin layer portion becomes uneven, which has an effect of well absorbing laser energy. The laser is reflected and hardly melted on the surface of the metal foil other than the thin layer, and the laser is melted and vaporized by absorbing energy in the uneven state of the thin layer. That is, holes are formed using the metal foil other than the thin layer portion as a mask.

【0014】本発明に係るプリント配線板及びその製造
方法の孔を介して電気接続する方法は、特に限定される
ものではない。好ましくは、金属メッキにより上層金属
箔及び下層導体層を電気接続する方法または、導電性物
質(金属フィラを混練した樹脂・接着剤、導電性樹脂な
ど)を該孔に塗布・充填して電気接続する方法などであ
る。更に好ましくは、金属メッキによる電気接続する方
法である。
The method for electrically connecting via the holes in the printed wiring board and the method for manufacturing the same according to the present invention is not particularly limited. Preferably, a method of electrically connecting the upper metal foil and the lower conductor layer by metal plating, or applying and filling a conductive substance (a resin or an adhesive mixed with a metal filler, a conductive resin, etc.) to the holes to make the electrical connection. And how to do it. More preferably, a method of electrical connection by metal plating is used.

【0015】本発明に係るプリント配線板及びその製造
方法の回路パターンの形成方法は、サブトラクティブ方
法であり、工程などを特に限定するものではない。エッ
チング液としては、塩化第二銅、塩化第二鉄などが好ま
しい。更に好ましくは、エッチングファクター(アスペ
クト比)が大きい塩化第二鉄である。
The method of forming a circuit pattern in the printed wiring board and the method of manufacturing the same according to the present invention is a subtractive method, and the steps are not particularly limited. As the etchant, cupric chloride, ferric chloride and the like are preferable. More preferably, ferric chloride has a large etching factor (aspect ratio).

【0016】[0016]

【実施例】以下、本発明に係るプリント配線板及びその
製造方法の実施例を説明する。尚、本発明に係るプリン
ト配線板及びその製造方法は以下の実施例に限られるも
のではない。
DESCRIPTION OF THE PREFERRED EMBODIMENTS Embodiments of the printed wiring board according to the present invention and a method for manufacturing the same will be described below. The printed wiring board and the method for manufacturing the same according to the present invention are not limited to the following embodiments.

【0017】(実施例1)先ず、エポキシ樹脂の両面に
厚さ18μmの銅箔をラミネートした銅張両面版にサブ
トラクティブ方法にて回路パターンを形成し、銅箔を黒
化処理し、化学還元処理した。
(Example 1) First, a circuit pattern is formed by a subtractive method on a copper-clad double-sided slab in which a copper foil of 18 μm thickness is laminated on both sides of an epoxy resin, the copper foil is blackened, and a chemical reduction is performed. Processed.

【0018】次に、銅箔付樹脂体(約50μmの絶縁樹
脂層1(エポキシ樹脂)を付着させた厚み約18μmの
銅箔3(上層金属箔))を前記の銅張両面版に配置・位
置合わせを行い積層した。(圧力25Kg、温度180
度、時間120分)
Next, a resin body with copper foil (about 18 μm thick copper foil 3 (upper layer metal foil) having an insulating resin layer 1 (epoxy resin) of about 50 μm adhered) is placed on the copper-clad double-sided plate. The alignment was performed and the layers were stacked. (Pressure 25 kg, temperature 180
Degree, time 120 minutes)

【0019】次に、積層した銅箔付樹脂体の上層銅箔3
(上層金属箔)にドライフィルムをラミネートし、ビア
ホール形成所望位置にパターンを紫外線照射により露光
し、現像し、塩化第二鉄でハーフエッチングして薄層部
8(直径約0.2mm、銅箔の厚み約5μm)を形成し
た。該薄層部8の表面は、凹凸があり、粗面であり、レ
ーザエネルギーの吸収が高い状態であった。
Next, the upper copper foil 3 of the laminated resin body with copper foil
Laminate a dry film on the (upper layer metal foil), expose the pattern at the desired position for forming a via hole by irradiating ultraviolet rays, develop, and half-etch with ferric chloride to form a thin layer portion 8 (diameter of about 0.2 mm, copper foil) Of about 5 μm). The surface of the thin layer portion 8 was uneven and rough, and was in a state of high absorption of laser energy.

【0020】次に、炭酸ガスレーザ装置の加工テーブル
に位置決めセットし、薄層部8のW2(直径約0.2m
mの薄層)よりも大きい径のレーザ(寸法W1が約0.
3mmのビーム径)を照射して該薄層部8及びエポキシ
樹脂1を溶融・気化・分解して孔5を形成する孔加工
し、前記ドライフィルムの剥離を行った。この剥離処理
は該薄層部8を形成した後に行ってもよいが、孔を全て
形成して後に剥離処理を行えばレーザ加工中における飛
散物がドライフィルムの上に乗り該ドライフィルムの剥
離と共に除去できる。(ほぼ同様に薄層部8にレーザを
照射し、レーザを途中で停止して該薄層部を観察したと
ころ該薄層部の中心部に穴が開きその周りは溶融状態で
あった。レーザのビームのエネルギーが中心部が高く、
周りより薄い薄層部の熱伝導が小さい、などが考えられ
る。)
Next, it is positioned and set on a processing table of a carbon dioxide laser device, and W2 (diameter of about 0.2 m) of the thin layer portion 8 is set.
m (thin layer) with a diameter larger than the laser (dimension W1 is about 0.3 mm).
The thin film 8 and the epoxy resin 1 were melted, vaporized, and decomposed to form a hole 5 by irradiating the thin film 8 with a beam diameter of 3 mm, and the dry film was peeled off. This peeling process may be performed after the thin layer portion 8 is formed, but if the peeling process is performed after all the holes are formed, the scattered matter during the laser processing rides on the dry film and the peeling of the dry film occurs. Can be removed. (Similarly, the thin layer portion 8 was irradiated with a laser, the laser was stopped halfway, and the thin layer portion was observed. When the thin layer portion was observed, a hole was opened in the center of the thin layer portion and the periphery was in a molten state. The energy of the beam is high in the center,
It is conceivable that the heat conduction of the thin layer portion thinner than the surroundings is small. )

【0021】次に、過マンガン酸カリウム法により該孔
5の内部のスミア処理を行い、該孔を介して上層銅箔3
および下層銅箔2(下層導体層2)を電気接続する銅メ
ッキ(無電解銅メッキ+電解銅メッキ)を施してビアホ
ール6を形成した。
Next, the inside of the hole 5 is subjected to a smearing treatment by the potassium permanganate method, and the upper copper foil 3 is passed through the hole.
Then, copper plating (electroless copper plating + electrolytic copper plating) for electrically connecting the lower copper foil 2 (lower conductor layer 2) was performed to form a via hole 6.

【0022】次に、ドライフィルムをラミネートし、パ
ターンを焼き付け、現像し、銅箔を塩化第二鉄にてエッ
チングし、剥離して回路パターンを形成し、表面の銅箔
を保護するレジストを半田付け領域を除いて形成し、ビ
アホール付きのプリント配線板を製作した。
Next, the dry film is laminated, the pattern is baked, developed, and the copper foil is etched with ferric chloride, peeled off to form a circuit pattern, and a resist for protecting the copper foil on the surface is soldered. A printed wiring board with via holes was formed except for the attachment area.

【0023】このように製作されたプリント配線板は孔
が薄層部の寸法W2より大きくなることがなく上層銅箔
および下層銅箔がビアホールによる信頼性の高い電気接
続がなされていた。
In the printed wiring board manufactured as described above, the holes were not larger than the dimension W2 of the thin layer portion, and the upper copper foil and the lower copper foil were electrically connected to each other by the via holes with high reliability.

【0024】[0024]

【発明の効果】本発明に係るプリント配線板及びその製
造方法によれば、上層金属箔を部分的に選択除去して薄
層部を形成する工程において、厚さ全体を除去する孔開
けに比較して薄層部に形成された孔は精確である。ま
た、該薄層部の表面が凹凸状態でレーザのエネルギー吸
収が良好な状態である。また、寸法W2で形成した薄層
部よりも広い面積の寸法W1のレーザを照射することに
より該薄層部の中心部より溶融・気化が始まり絶縁樹脂
層も中心部より溶融・気化・分解が始まり寸法W2にな
るときには下層導体層に達する孔が形成され、上層金属
箔の近傍に異常な孔が形成されることなく電気接続が良
好であり、精確であり、信頼性の高いプリント配線板及
びその製造方法を提供できる。
According to the printed wiring board and the method of manufacturing the same of the present invention, in the step of selectively removing the upper layer metal foil to form a thin layer portion, compared with the hole forming for removing the entire thickness. The holes formed in the thin layer are thus accurate. In addition, the surface of the thin layer portion is in an uneven state and the laser energy absorption is good. Further, by irradiating a laser having a dimension W1 having a larger area than the thin layer portion formed with the dimension W2, melting and vaporization start from the center of the thin layer portion, and the insulating resin layer also melts, vaporizes and decomposes from the central portion. When the starting dimension W2 is reached, a hole reaching the lower conductor layer is formed, and an electrical connection is good, accurate, and highly reliable without forming an abnormal hole near the upper metal foil. The manufacturing method can be provided.

【0025】[0025]

【図面の簡単な説明】[Brief description of the drawings]

図1は、本発明に係るプリント配線板及びその製造方法
を示す一実施態様切断面図である。図1(a)は、レー
ザの照射の態様切断面図であり、図1(b)は、ビアホ
ール形成の態様切断面図である。図2は、従来の実施態
様を示す切断面図である。
FIG. 1 is a sectional view of one embodiment showing a printed wiring board according to the present invention and a method for manufacturing the same. FIG. 1A is a sectional view of a mode of laser irradiation, and FIG. 1B is a sectional view of a mode of via hole formation. FIG. 2 is a sectional view showing a conventional embodiment.

【0026】[0026]

【符号の説明】[Explanation of symbols]

1 絶縁樹脂層 2 下層導体層 3 上層金属箔 4 レーザ 5 孔 6 ビアホール 7 窓 8 薄層部 DESCRIPTION OF SYMBOLS 1 Insulating resin layer 2 Lower conductor layer 3 Upper metal foil 4 Laser 5 Hole 6 Via hole 7 Window 8 Thin layer part

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 金属箔及び絶縁樹脂層を積層した基板に
回路パターンを形成するプリント配線板及びその製造方
法において、上層金属箔を部分的に選択除去して薄層部
を形成する工程、該薄層部より広い面積にレーザを照射
して下層導体層に達する孔を該薄層部及び絶縁樹脂層に
形成する工程、該孔を介して該上層金属箔及び該下層導
体層を電気接続する工程と、サブトラクティブ方法によ
り該上層金属箔に回路パターンを形成する工程より成る
ことを特徴とするプリント配線板及びその製造方法。
1. A printed wiring board for forming a circuit pattern on a substrate on which a metal foil and an insulating resin layer are laminated, and a method for manufacturing the same, wherein a thin layer portion is formed by selectively removing an upper metal foil partially. Forming a hole in the thin layer portion and the insulating resin layer by irradiating a laser to an area larger than the thin layer portion in the thin layer portion and the insulating resin layer, and electrically connecting the upper metal foil and the lower conductor layer through the hole; And a step of forming a circuit pattern on the upper metal foil by a subtractive method.
JP29959897A 1997-10-17 1997-10-17 Printed wiring board and manufacturing method thereof Expired - Fee Related JP3678562B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP29959897A JP3678562B2 (en) 1997-10-17 1997-10-17 Printed wiring board and manufacturing method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP29959897A JP3678562B2 (en) 1997-10-17 1997-10-17 Printed wiring board and manufacturing method thereof

Publications (2)

Publication Number Publication Date
JPH11121931A true JPH11121931A (en) 1999-04-30
JP3678562B2 JP3678562B2 (en) 2005-08-03

Family

ID=17874717

Family Applications (1)

Application Number Title Priority Date Filing Date
JP29959897A Expired - Fee Related JP3678562B2 (en) 1997-10-17 1997-10-17 Printed wiring board and manufacturing method thereof

Country Status (1)

Country Link
JP (1) JP3678562B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003188544A (en) * 2001-12-20 2003-07-04 Hitachi Chem Co Ltd High density printed wiring board and manufacturing method therefor

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003188544A (en) * 2001-12-20 2003-07-04 Hitachi Chem Co Ltd High density printed wiring board and manufacturing method therefor

Also Published As

Publication number Publication date
JP3678562B2 (en) 2005-08-03

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