JP2003188544A - High density printed wiring board and manufacturing method therefor - Google Patents

High density printed wiring board and manufacturing method therefor

Info

Publication number
JP2003188544A
JP2003188544A JP2001387884A JP2001387884A JP2003188544A JP 2003188544 A JP2003188544 A JP 2003188544A JP 2001387884 A JP2001387884 A JP 2001387884A JP 2001387884 A JP2001387884 A JP 2001387884A JP 2003188544 A JP2003188544 A JP 2003188544A
Authority
JP
Japan
Prior art keywords
metal foil
printed wiring
wiring board
manufacturing
density printed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001387884A
Other languages
Japanese (ja)
Inventor
Yukio Nakamura
幸雄 中村
Fumio Ishigami
富美男 石上
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Showa Denko Materials Co Ltd
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP2001387884A priority Critical patent/JP2003188544A/en
Publication of JP2003188544A publication Critical patent/JP2003188544A/en
Pending legal-status Critical Current

Links

Landscapes

  • Laser Beam Processing (AREA)
  • Production Of Multi-Layered Print Wiring Board (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To provide a manufacturing method of a high density printed wiring board which is superior in metal foil direct laser beam machining property and in reliability without largely increasing the energy of a laser. <P>SOLUTION: In the metal foil direct laser punching work of a metal foil-clad laminated board and a printed wiring board, metal foil on a surface is etched and it is thinned to not more than 7 μm. Then, a surface processing whose surface roughness of an etching system is not more than 4 μm is performed. Thus, the high density printed wiring board superior in metal foil direct laser beam machining property and reliability and the manufacturing method can be obtained. <P>COPYRIGHT: (C)2003,JPO

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、電気・電子機器等
に使用される高密度プリント配線板及びその製造方法に
関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a high-density printed wiring board used for electric / electronic devices and the like and a method for manufacturing the same.

【0002】[0002]

【従来の技術】従来プリント配線板の製造に用いられる
多層板は、例えばガラスクロス等の基材にエポキシ樹脂
組成物等の熱硬化性樹脂組成物を含浸した後、加熱乾燥
して半硬化させることによってプリプレグを作製し、こ
のプリプレグを所要枚数重ねると共に、銅箔等の金属箔
をその片側又は両側に配して積層し、加熱加圧して成形
を行うことによって金属箔張り積層板を作製する。そし
て、その金属箔張り積層板の表面の金属箔をエッチング
して、表面に導体回路及びプリント配線板を製造すると
き用いるガイドマークを形成した内層基板を作製した
後、必要に応じて粗化処理を行い、次いでその導体回路
等を形成した内層用基板に、上記と同様にして製造した
プリプレグをその片側又は両側に所要枚数重ねると共
に、必要に応じて金属箔をその片側又は両側に配して積
層し、加熱加圧して形成することによって製造を行って
いる。
2. Description of the Related Art Conventionally, a multilayer board used for manufacturing a printed wiring board is obtained by impregnating a base material such as glass cloth with a thermosetting resin composition such as an epoxy resin composition, followed by heating and drying to semi-cure. A prepreg is produced by stacking the required number of prepregs, and a metal foil such as a copper foil is placed on one side or both sides of the prepreg to be laminated, and heated and pressed to form a metal foil-clad laminate. . Then, the metal foil on the surface of the metal foil-clad laminate is etched to prepare an inner layer substrate having guide marks used for manufacturing a conductor circuit and a printed wiring board on the surface, and then roughening treatment is performed as necessary. Then, the required number of prepregs manufactured in the same manner as described above are stacked on the inner layer substrate on which the conductor circuits and the like are formed, and the metal foil is arranged on one side or both sides as necessary. Manufacturing is carried out by stacking and heating and pressing to form.

【0003】また、この多層板を用いてプリント配線板
を製造する方法としては、内層用基板に形成したガイド
マークを用い、このガイド穴を基準にドリルマシン及び
レーザマシンにて多層板に穴あけをした後、このドリル
マシン及びレーザマシンであけられた穴の壁面にスルー
ホールめっきを施すと共に、外層の金属箔にエッチング
を施して外層の導体回路を形成する方法により製造され
ている。
Further, as a method of manufacturing a printed wiring board using this multilayer board, a guide mark formed on an inner layer substrate is used, and a hole is drilled in the multilayer board by a drill machine and a laser machine based on this guide hole. After that, the wall surface of the hole formed by the drill machine and the laser machine is plated with through holes, and the outer layer metal foil is etched to form the outer layer conductor circuit.

【0004】これらの金属箔張り積層板やプリプレグの
作製に用いられる基材は、平織りで織られたガラスクロ
スであり、60〜200μmの厚みが一般的である。ま
た、含浸性向上等のために、開繊処理を施したガラスク
ロスが用いられている。
The base material used for the production of these metal foil-clad laminates and prepregs is glass cloth woven with plain weave, and generally has a thickness of 60 to 200 μm. Further, a glass cloth that has been subjected to a fiber-opening treatment is used in order to improve impregnation properties and the like.

【0005】多層プリント配線板は、高密度化の方向へ
と進み、多層プリント配線板の配線回路の細線化に伴
い、IVH(Interstitial Via Hole )及びSVH(Su
rfaceVia Hole )等の層間接続用の穴径も細径化が進ん
でいる。そのため、穴明けに使用されるドリル径の細径
化が図られている。しかし、ドリル径の細径化により、
穴曲がり、ドリル折れ、ドリル寿命の低下が顕在化して
いる。そこで多層プリント配線板では、小径加工に優れ
たレーザ穴明け機が多く使用されるようになってきた。
レーザ穴明け加工では、コンフォーマルやラージウィン
ドウ等のように、予め銅箔にエッチングして穴を形成し
た後、レーザ穴明け加工する工法が主流となっている。
しかし、内層銅箔の位置ずれ、上下の穴位置ずれ等を生
じやすく、接続不良、表裏のランドが形成できない等の
欠点がある。そこで、金属箔と絶縁層を同時に穴あけ加
工する金属箔ダイレクトレーザ加工の採用が進んできて
おり、レーザ光の吸収を高めるために、表面の金属箔を
黒化処理を行う手法がある。しかし、黒化処理は処理の
ライフが短く、針状結晶の傷及び長時間保管した場合の
変色・変質するため時間的制約がある。また、極薄銅箔
を使用することも試みられているが、ロープロファイル
のため引き剥がし強度が低下し、細線パターンの剥がれ
る等の問題があった。また、貫通スルーホールを施す際
に、表層の銅箔が厚い場合や直接レーザマシンに装着し
て穴明け加工をした場合には、レーザ加工時に発生する
熱により、ストレートな穴形状が得られにくい問題があ
った。
[0005] Multilayer printed wiring boards are moving toward higher densities, and as wiring circuits of multilayer printed wiring boards become thinner, IVH (Interstitial Via Hole) and SVH (Su).
The diameter of the hole for interlayer connection such as rfaceVia Hole) is also becoming smaller. Therefore, the diameter of the drill used for drilling has been reduced. However, due to the smaller diameter of the drill,
Hole bending, drill breakage, and shortened drill life are becoming apparent. Therefore, in the multilayer printed wiring board, a laser drilling machine excellent in small-diameter processing has been widely used.
In laser drilling, a method in which a copper foil is preliminarily etched to form a hole, and then laser drilling is performed, such as conformal and large windows, is predominant.
However, there are drawbacks such as misalignment of the inner copper foil, misalignment of the upper and lower holes, and the like, poor connection, and inability to form lands on the front and back. Therefore, metal foil direct laser processing for simultaneously punching a metal foil and an insulating layer has been adopted, and there is a method of performing blackening treatment on the surface metal foil in order to enhance absorption of laser light. However, the blackening treatment has a short treatment life, and there is a time limitation because the needle-like crystals are scratched and discolored or deteriorated when stored for a long time. Further, it has been attempted to use an ultra-thin copper foil, but the peeling strength is lowered due to the low profile, and there is a problem that the fine line pattern is peeled off. Also, when the through-hole is formed, if the surface copper foil is thick or if it is directly mounted on the laser machine and drilled, it is difficult to obtain a straight hole shape due to the heat generated during laser processing. There was a problem.

【0006】[0006]

【発明が解決しようとする課題】本発明は、上記問題点
を改善するため成されたもので、その目的とするところ
は、金属箔張り積層板及びプリント配線板において、金
属箔ダイレクトレーザ加工性及び信頼性に優れ、高密度
化に対応したプリント配線板及びその製造方法を提供す
ることにある。
SUMMARY OF THE INVENTION The present invention has been made to solve the above problems, and an object of the present invention is to provide a metal foil direct laser processability in a metal foil-clad laminate and a printed wiring board. Another object of the present invention is to provide a printed wiring board which is excellent in reliability and is compatible with high density, and a manufacturing method thereof.

【0007】[0007]

【課題を解決するための手段】前記課題を解決するため
に検討した結果、金属箔張り積層板及びプリント配線板
の金属箔ダイレクトレーザ穴明け加工において、一般的
なプロファイルを持つ金属箔をエッチングにて7μm以
下まで薄型化し、さらにエッチング系の表面粗さ4μm
以下の表面処理を施すことにより、金属箔ダイレクトレ
ーザ加工性に優れ、引き剥がし強度向上により細線化・
高密度化に対応できることを見出した。また、貫通銅箔
レーザ加工性の場合、同様に金属箔をエッチングにて7
μm以下まで薄型化し、さらにエッチング系の表面粗さ
4μm以下の表面処理を施してから、金属張り積層板の
下側に加工部分を事前にくり貫いた厚さ1.0mm以上
の治具板を挿入した上でダイレクトレーザ加工をするこ
とで、ストレートな穴形状を得られ、貫通金属箔ダイレ
クトレーザ加工性に優れることを見出し、課題を解決し
た。
[Means for Solving the Problems] As a result of studies for solving the above problems, as a result of etching a metal foil having a general profile in metal foil direct laser drilling of metal foil-clad laminates and printed wiring boards. Down to 7 μm or less, and surface roughness of etching system is 4 μm
By performing the following surface treatment, the metal foil direct laser processability is excellent, and the peeling strength is improved to make it thinner.
We have found that it can be used for higher density. Also, in the case of through copper foil laser processability, the metal foil is similarly etched by etching.
A jig plate with a thickness of 1.0 mm or more that has been machined in advance to the lower side of the metal-clad laminate after the surface has been thinned to less than μm and the surface roughness of the etching system has been reduced to 4 μm or less. We solved the problem by finding that a straight hole shape can be obtained by inserting and then performing direct laser processing, and that the through-hole metal foil direct laser processing property is excellent.

【0008】本発明の請求項1に係るプリント配線板の
製造方法は、金属箔張り積層板の金属箔をエッチングし
て表面に導体回路を形成した内層用基板と、厚み20〜
150μmのガラスクロスに熱硬化性樹脂組成物を含浸
して作製するプリプレグとを積層した後、加熱加圧して
製造する多層板の製造方法において、層間を導通させる
スルーホールを形成し易くするために、表面の金属箔を
エッチングして金属箔を薄くし、レーザ光の吸収率が高
まる表面処理を金属箔に施すことで、レーザ光のエネル
ギーを大幅に上げる必要が無く、効率良くスルーホール
を得ることを特徴とするプリント配線板及びその製造方
法。
The method for manufacturing a printed wiring board according to claim 1 of the present invention is an inner layer substrate having a conductor circuit formed on the surface by etching the metal foil of a metal foil-clad laminate, and a thickness of 20 to 20.
In order to facilitate formation of a through hole for conducting layers in a method for producing a multilayer board produced by laminating a prepreg produced by impregnating a 150 μm glass cloth with a thermosetting resin composition and then heating and pressing By etching the metal foil on the surface to thin the metal foil and applying a surface treatment that increases the absorption rate of laser light to the metal foil, it is not necessary to significantly increase the energy of laser light, and through holes can be efficiently obtained. A printed wiring board and a method for manufacturing the same.

【0009】本発明の請求項2に係るプリント配線板の
製造方法は、請求項1記載のプリント配線板の製造方法
において、金属箔張り積層板及びプリント配線板の金属
箔には、キャリア付き極薄金属箔(3〜5μm)でな
く、一般金属箔を用いることで材料コストを抑え、樹脂
との接着力は極薄金属箔よりも高くでき、細線パターン
の剥がれ等を防止できる。また一般金属箔の表面をエッ
チングして7μm以下に薄型化することで、効率良く金
属箔ダイレクトレーザ穴加工ができることを特徴とす
る。
A method of manufacturing a printed wiring board according to a second aspect of the present invention is the method of manufacturing a printed wiring board according to the first aspect, wherein the metal foil-clad laminate and the metal foil of the printed wiring board have electrodes with carriers. By using a general metal foil instead of a thin metal foil (3 to 5 μm), the material cost can be suppressed, the adhesive force with the resin can be made higher than that of the ultrathin metal foil, and peeling of the fine line pattern can be prevented. Further, it is characterized in that the metal foil direct laser hole processing can be efficiently performed by etching the surface of a general metal foil to reduce the thickness to 7 μm or less.

【0010】本発明の請求項3、4に係るプリント配線
板の製造方法は、請求項1記載のプリント配線板の製造
方法において、一般金属箔の表面をエッチングにより厚
み精度良く薄型化した後に、硫酸系水溶液や硫酸/過酸
化水素水溶液やギ酸水溶液等により、表面粗さが4μm
以下の防錆処理皮膜を有する表面処理を施すことで、表
面処理のライフを延ばすことができ、かつ傷及び処理劣
化の変色等による加工ばらつきを向上できる。この表面
処理は黒色である必要はなく、表面の4μm以下の凹凸
によりレーザ光が処理表面で乱反射し、光吸収し易くす
ることができ、金属箔ダイレクトレーザ加工が可能にな
ることを特徴とする。
A method for manufacturing a printed wiring board according to claims 3 and 4 of the present invention is the method for manufacturing a printed wiring board according to claim 1, wherein after the surface of the general metal foil is thinned by etching with high accuracy in thickness, Surface roughness of 4 μm due to sulfuric acid aqueous solution, sulfuric acid / hydrogen peroxide aqueous solution, formic acid aqueous solution, etc.
By performing the following surface treatment having a rust preventive treatment film, it is possible to extend the life of the surface treatment and improve processing variations due to discoloration due to scratches and treatment deterioration. This surface treatment does not need to be black, and the laser light is diffusely reflected on the treated surface due to the unevenness of 4 μm or less on the surface, and it is easy to absorb the light, and the metal foil direct laser processing is possible. .

【0011】本発明の請求項5に係るプリント配線板の
製造方法は、請求項1記載のプリント配線板の製造方法
によるものである。金属箔(銅等)は、CO2 レーザ、
YAGレーザは殆ど吸収されないことは知られている。
それに伴い、金属箔ダイレクトレーザ加工は、コンフォ
ーマルレーザ加工に比べショット数を増加させる、もし
くはレーザ光のエネルギーを高く設定する必要がある。
従って、高密度プリント配線板は、レーザ光の照射によ
る熱影響を受ける。そこで、ガラス転移温度が160℃
以上の熱硬化性樹脂組成物を用いる、更に場合によって
は適量の無機充填材を配合することで、穴周辺の熱劣
化、耐熱性や接続信頼性を向上させることができること
を特徴とする。
A method for manufacturing a printed wiring board according to a fifth aspect of the present invention is the method for manufacturing a printed wiring board according to the first aspect. CO2 laser, metal foil (copper, etc.)
It is known that YAG lasers are hardly absorbed.
Along with this, in the metal foil direct laser processing, it is necessary to increase the number of shots or set the energy of laser light to be higher than that in the conformal laser processing.
Therefore, the high-density printed wiring board is thermally affected by the irradiation of laser light. Therefore, the glass transition temperature is 160 ° C.
The above thermosetting resin composition is used, and in some cases, an appropriate amount of an inorganic filler is mixed, whereby thermal deterioration around the hole, heat resistance and connection reliability can be improved.

【0012】本発明の請求項6に係るプリント配線板の
製造方法は、請求項1記載のプリント配線板の製造方法
において、銅箔ダイレクトレーザ加工によりストレート
な貫通スルーホールを得るためには、レーザマシン条件
の最適化と共に、基板のボトム部分において発生し易い
レーザ光の反射による熱、蓄積される熱を低減すること
が重要となる。そこで、まず表面の金属箔の厚さを7μ
m以下にすることで、ボトム側の金属箔が穴明けされ易
い状態にし、レーザ加工部分を事前にくり貫いた当て板
をプリント配線板の下側に挿入することで反射による
熱、蓄積される熱を開放することができることを特徴と
する。
A method for manufacturing a printed wiring board according to claim 6 of the present invention is the method for manufacturing a printed wiring board according to claim 1, wherein in order to obtain a straight through hole by copper foil direct laser processing, a laser is used. With optimization of machine conditions, it is important to reduce heat generated by reflection of laser light and heat accumulated in the bottom portion of the substrate. Therefore, the thickness of the metal foil on the surface should first be 7μ.
When the thickness is less than or equal to m, the bottom side metal foil is likely to be pierced, and the heat generated by reflection is accumulated by inserting the backing plate with the laser-processed part preliminarily bored into the lower side of the printed wiring board. It is characterized by being able to release heat.

【0013】[0013]

【発明の実施の形態】本発明に係るプリント配線板は、
厚み20〜150μmの平織りのガラスクロスに熱硬化
性樹脂組成物を含浸した後金属箔と積層し、次いで加熱
加圧して作製する金属箔張り積層板の金属箔をエッチン
グして、表面に銅箔回路を形成した内層用基板と、厚み
20〜150μmのガラスクロスに熱硬化性樹脂組成物
を含浸して作製するプリプレグとを所定枚数積層した
後、加熱加圧して得られる。
BEST MODE FOR CARRYING OUT THE INVENTION A printed wiring board according to the present invention is
A plain weave glass cloth having a thickness of 20 to 150 μm is impregnated with a thermosetting resin composition, laminated with a metal foil, and then heated and pressed to etch the metal foil of a metal foil-clad laminate, which is a copper foil on the surface. It is obtained by stacking a predetermined number of a circuit-formed inner layer substrate and a prepreg prepared by impregnating a glass cloth having a thickness of 20 to 150 μm with a thermosetting resin composition, and then heating and pressing.

【0014】金属箔張り積層板及びプリプレグの作製に
用いる基材は、非ガラス系繊維、ガラス不織布またはガ
ラスクロス等を用いることができる。そのうち、ガラス
クロスにおいては高開繊処理されており、通気度が20
cm3 /cm2 /sec以下であることが望ましい。一
般のガラスクロスは縦糸と横糸の交点の隙間が大きく、
交点とその間の隙間部分とでは、小径レーザ加工時に、
真円性、穴内壁粗さ、穴曲がり等にばらつきを生じ易
い。
As the base material used for producing the metal foil-clad laminate and the prepreg, non-glass fiber, glass non-woven fabric or glass cloth can be used. Among them, the glass cloth has been subjected to high fiber opening treatment and has an air permeability of 20.
It is desirable that it is not more than cm3 / cm2 / sec. In general glass cloth, the gap between the warp and weft threads is large,
At the intersection and the gap between them, during small-diameter laser processing,
Variations in circularity, inner wall roughness of holes, bending of holes, etc. are likely to occur.

【0015】本発明に用いられる熱硬化性樹脂組成物と
しては、金属箔張り積層板の製造に用いる熱硬化性樹脂
組成物及びプリプレグの製造に用いる熱硬化性樹脂組成
物共に、エポキシ樹脂系、フェノール樹脂系、ポリイミ
ド樹脂系、不飽和ポリエステル樹脂系、ポリフェニルエ
ーテル樹脂系等の単独、変性物、混合物のように、熱硬
化性樹脂全般を用いることができる。なお、金属箔張り
積層板の製造に用いる熱硬化性樹脂組成物及びプリプレ
グの製造に用いる熱硬化性樹脂組成物の種類は同じでも
よく、異なっていてもよい。
As the thermosetting resin composition used in the present invention, both the thermosetting resin composition used for producing the metal foil-clad laminate and the thermosetting resin composition used for producing the prepreg are epoxy resin-based, Thermosetting resins in general can be used, such as phenol resin type, polyimide resin type, unsaturated polyester resin type, polyphenyl ether resin type, etc., alone, modified products, and mixtures. The types of the thermosetting resin composition used for producing the metal foil-clad laminate and the thermosetting resin composition used for producing the prepreg may be the same or different.

【0016】この熱硬化性樹脂組成物中には、熱硬化性
樹脂を必須として含有し、必要に応じてその熱硬化性樹
脂の硬化剤、硬化促進剤、無機充填材及び溶剤等を含有
することができる。なお、エポキシ樹脂等のように自己
硬化性の低い熱硬化性樹脂は、その樹脂を硬化するため
の硬化剤等も含有することが必要である。
The thermosetting resin composition contains a thermosetting resin as an essential component, and if necessary, a curing agent for the thermosetting resin, a curing accelerator, an inorganic filler and a solvent. be able to. A thermosetting resin having a low self-hardening property such as an epoxy resin needs to contain a curing agent or the like for curing the resin.

【0017】なお、熱硬化性樹脂組成物が、エポキシ樹
脂系の場合、電気特性及び接着性のバランスが良好であ
り好ましい。エポキシ樹脂系の樹脂組成物に含有するエ
ポキシ樹脂としては、例えばビスフェノールA型エポキ
シ樹脂、ビスフェノールF型エポキシ樹脂、ビスフェノ
ールS型エポキシ樹脂、フェノールノボラック型エポキ
シ樹脂、ビスフェノールAノボラック型エポキシ樹脂、
ビスフェノールFノボラック型エポキシ樹脂、クレゾー
ルノボラック型エポキシ樹脂、ジアミノジフェニルメタ
ン型エポキシ樹脂、及びこれらのエポキシ樹脂構造体中
の水素原子の一部をハロゲン化することにより、難燃化
したエポキシ樹脂等が挙げられる。また、このエポキシ
樹脂系の樹脂組成物に含有する硬化剤としては、例えば
ジシアンジアミド、脂肪族ポリアミド等のアミド系硬化
剤や、アンモニア、トリエチルアミン、ジエチルアミン
等のアミン系硬化剤や、フェノールノボラック樹脂、ク
レゾールノボラック樹脂、p−キシレン−ノボラック樹
脂等のフェノール系硬化剤や、酸無水物類等が挙げられ
る。
When the thermosetting resin composition is an epoxy resin type, it is preferable because it has a good balance of electrical characteristics and adhesiveness. Examples of the epoxy resin contained in the epoxy resin-based resin composition include bisphenol A type epoxy resin, bisphenol F type epoxy resin, bisphenol S type epoxy resin, phenol novolac type epoxy resin, bisphenol A novolac type epoxy resin,
Examples thereof include bisphenol F novolac type epoxy resin, cresol novolac type epoxy resin, diaminodiphenylmethane type epoxy resin, and epoxy resin flame-retarded by halogenating a part of hydrogen atoms in these epoxy resin structures. . Examples of the curing agent contained in the epoxy resin-based resin composition include amide-based curing agents such as dicyandiamide and aliphatic polyamide, amine-based curing agents such as ammonia, triethylamine, and diethylamine, phenol novolac resin, and cresol. Examples include phenolic curing agents such as novolac resins and p-xylene-novolac resins, and acid anhydrides.

【0018】なお、上記熱硬化性樹脂組成物に含有する
ことができる無機充填材としては、シリカ、炭酸カルシ
ウム、水酸化アルミニウム、タルク、クレー等の無機質
粉末充填材や、ガラス繊維、パルプ繊維、合成繊維、セ
ラミック繊維等の繊維質充填材が挙げられ、また、上記
熱硬化性樹脂組成物に含有することができる溶剤として
は、N,N−ジメチルホルムアミド等のアミド類、エチ
レングリコールモノメチルエーテル等のエーテル類、ア
セトン、メチルエルケトトン等のケトン類、メタノー
ル、エタノール等のアルコール類、ベンゼン、トルエン
等の芳香族炭化水素類等が挙げられる。
The inorganic filler which can be contained in the thermosetting resin composition includes inorganic powder fillers such as silica, calcium carbonate, aluminum hydroxide, talc and clay, glass fiber, pulp fiber, Examples of the solvent that can be contained in the thermosetting resin composition include amides such as N, N-dimethylformamide, ethylene glycol monomethyl ether, and the like. Ethers, ketones such as acetone and methyl erketoton, alcohols such as methanol and ethanol, aromatic hydrocarbons such as benzene and toluene, and the like.

【0019】この熱硬化性樹脂組成物をガラスクロスに
含浸する方法としては、特に限定するものではなく、一
般の方法が適用可能である。なお、熱硬化性樹脂組成物
をガラスクロスに含浸した後、必要に応じて加熱乾燥し
ていてもよい。
The method of impregnating the glass cloth with the thermosetting resin composition is not particularly limited, and a general method can be applied. After impregnating the glass cloth with the thermosetting resin composition, it may be dried by heating if necessary.

【0020】本発明に用いられる金属箔としては、銅、
アルミニウム、真鍮、ニッケル等の単独、合金、複合の
金属箔を用いることができ、金属箔の代わりに金属箔が
積層成形された片面金属張り積層板、両面金属張り積層
板を用いることもできる。なお、この金属箔は、金属箔
張り積層板の作製のみに用いることに限定するものでは
なく、内層用基板とプリプレグとを積層したその積層物
の片側または両側に積層して用いてもよい。この金属箔
の厚みとしては、金属箔張り積層板の作製に用いる場合
0.003〜0.070mmが一般的であり、内層用基
板とプリプレグとを積層したその積層物の片側または両
側に積層する場合は、0.03〜0.035mmが一般
的である。
The metal foil used in the present invention is copper,
Single, alloy, or composite metal foils of aluminum, brass, nickel, etc. can be used, and a single-sided metal-clad laminate or double-sided metal-clad laminate in which metal foils are laminated and molded can be used instead of the metal foil. The metal foil is not limited to being used only for producing a metal foil-clad laminate, and may be used by laminating it on one side or both sides of the laminate in which the inner layer substrate and the prepreg are laminated. The thickness of this metal foil is generally 0.003 to 0.070 mm when it is used for producing a metal foil-clad laminate, and is laminated on one side or both sides of the laminate in which the inner layer substrate and the prepreg are laminated. In this case, 0.03 to 0.035 mm is common.

【0021】金属箔張り積層板を製造するときの加熱加
圧する条件、及び内層用基板とプリプレグとを積層した
後、加熱加圧する条件としては、熱硬化性樹脂組成物が
硬化剤する条件で適宜調整して加熱加圧すればよいが、
加圧の圧力が高いと導体回路の寸法収縮のばらつきが大
きくなる場合があるため、成形性を満足する範囲内で、
できるだけ低圧で加圧することが好ましい。なお、加熱
加圧を300Torr以下の減圧雰囲気下で行うと、成
形性が良好となり好ましい。
The conditions for heating and pressurizing the metal foil-clad laminate and the conditions for heating and pressurizing after laminating the inner layer substrate and the prepreg are appropriately selected depending on the condition that the thermosetting resin composition is a curing agent. It may be adjusted and heated and pressed, but
If the pressure applied is high, the dimensional shrinkage of the conductor circuit may vary greatly, so within the range that satisfies the formability,
It is preferable to pressurize as low as possible. It is preferable to heat and pressurize under a reduced pressure atmosphere of 300 Torr or less because the moldability becomes good.

【0022】金属箔張り積層板表面の金属箔をエッチン
グする方法としては、特に限定するものではなく、金属
箔及びそのエッチングに用いるエッチングレジストによ
り、一般の方法が適用可能である。
The method for etching the metal foil on the surface of the metal foil-clad laminate is not particularly limited, and a general method can be applied depending on the metal foil and the etching resist used for the etching.

【0023】[0023]

【実施例】実施例1 熱硬化性樹脂組成物として、下記のエポキシ樹脂2種
類、硬化剤、硬化促進剤及び溶剤よりなるエポキシ樹脂
系樹脂組成物を使用した。 ・エポキシ樹脂1:ビスフェノールAノボラック型エポ
キシ樹脂(大日本インキ化学工業株式会社製、商品名エ
ピクロンN868を使用した)50重量部。 ・エポキシ樹脂2:ブロム化ビスフェノールAエポキシ
樹脂(住友化学工業株式会社製、商品名ESB−400
を使用した)50重量部。 ・硬化剤:ビスフェノールAノボラック樹脂(ジャパン
エポキシレジン株式会社製、商品名YLH−129)4
0重量部。 ・硬化促進剤:1−シアノエチル−2−フェニルイミダ
ゾール1重量部。 ・溶剤:メチルエチルケトンを90重量部。
Example 1 As a thermosetting resin composition, an epoxy resin resin composition comprising the following two kinds of epoxy resins, a curing agent, a curing accelerator and a solvent was used. Epoxy resin 1: 50 parts by weight of bisphenol A novolac type epoxy resin (using Epicron N868 manufactured by Dainippon Ink and Chemicals, Inc.). Epoxy resin 2: brominated bisphenol A epoxy resin (manufactured by Sumitomo Chemical Co., Ltd., trade name ESB-400
50 parts by weight). -Curing agent: Bisphenol A novolac resin (manufactured by Japan Epoxy Resin Co., Ltd., trade name YLH-129) 4
0 parts by weight. -Curing accelerator: 1 part by weight of 1-cyanoethyl-2-phenylimidazole. -Solvent: 90 parts by weight of methyl ethyl ketone.

【0024】この樹脂組成物をガラスクロス(#108
0タイプ:重量48g/m2 )に、乾燥後の熱硬化性樹
脂組成物の量が、熱硬化性樹脂組成物及びガラスクロス
の合計100重量部に対し、62重量部となるように調
整して含浸した後、最高温度165℃で乾燥してプリプ
レグを作製した。
This resin composition was mixed with glass cloth (# 108
0 type: weight 48 g / m <2>) and the amount of the thermosetting resin composition after drying was adjusted to 62 parts by weight based on 100 parts by weight of the total amount of the thermosetting resin composition and the glass cloth. After impregnation, it was dried at a maximum temperature of 165 ° C. to prepare a prepreg.

【0025】次いで、得られた所定枚数のプリプレグの
両側に厚み18μmの銅箔を配して積層した後、この積
層物を金属プレートで挟み、最高温度180℃、圧力
3.0MPaで90分加熱加圧して成形して両面銅張り
積層板を作製した。
Next, a copper foil having a thickness of 18 μm is arranged on both sides of the predetermined number of the obtained prepregs and laminated, and the laminate is sandwiched between metal plates and heated at a maximum temperature of 180 ° C. and a pressure of 3.0 MPa for 90 minutes. It was pressed and molded to prepare a double-sided copper-clad laminate.

【0026】次いで、得られた両面銅張り積層板に表面
処理を施し、両側にプリプレグを配して積層した後、1
2μmの一般銅箔を両側に配して金属プレートで挟み、
最高温度180℃、圧力2.5MPaで80分加熱加圧
して成形して4層板を作製した。
Next, the double-sided copper-clad laminate thus obtained is subjected to a surface treatment, prepregs are arranged on both sides and laminated, and then 1
Place 2μm general copper foil on both sides and sandwich between metal plates,
A four-layer board was produced by heating and pressing at a maximum temperature of 180 ° C. and a pressure of 2.5 MPa for 80 minutes for molding.

【0027】得られた4層板の表面をエッチングにより
5〜6μm程度薄くし、さらにギ酸系溶液により粗化処
理を施し、その表面には有機皮膜等の防錆皮膜を形成さ
せた。その表面からダイレクトレーザ加工をレーザマシ
ン(LAVIA−1200住友重機械工業社製)を用い
て、パルス幅50μs、パルスエネルギー9mj、ショ
ット数6ショットの条件でIVHを形成した。さらに、
加工穴にめっきした上で多層プリント配線板を作成し、
ホットオイル試験にて信頼性を確認した。
The surface of the obtained four-layer plate was thinned by etching to about 5 to 6 μm, and further roughened with a formic acid solution to form a rust preventive film such as an organic film on the surface. Using the laser machine (LAVIA-1200 Sumitomo Heavy Industries, Ltd.) for direct laser processing from the surface, IVH was formed under the conditions of pulse width 50 μs, pulse energy 9 mj, and shot number 6 shots. further,
After plating the processed holes, create a multilayer printed wiring board,
Reliability was confirmed by a hot oil test.

【0028】実施例2 ガラスクロス(#2116タイプ:重量104g/m2
)に、乾燥後の熱硬化性樹脂組成物の量が、熱硬化性
樹脂組成物及びガラスクロスの合計100重量部に対
し、43重量部となるように調整して含浸した後、最高
温度165℃で乾燥してプリプレグを作製したものを用
い、4枚重ね両側に厚み18μmの銅箔を配して積層し
た後、この積層物を金属プレートで挟み、最高温度18
0℃、圧力3.0MPaで90分加熱加圧して成形して
板厚0.4の両面銅張り積層板を作製した。その後、表
面をエッチングにより薄くし、さらに硫酸水溶液により
粗化処理を施し、その表面には有機皮膜等の防錆皮膜を
形成させた。その表面からダイレクトレーザ加工をレー
ザマシン(LC−1C21 日立ビアメカニクス社製)
を用いて、パルス幅40μs、周波数500Hz、ショ
ット数10ショットの条件で、両面板の下側にレーザ加
工部分を事前にくり貫いた厚さ1.0mmの治具板を挿
入する方法で、レーザ加工によりIVHを形成。さら
に、加工穴にめっきした後に断面観察を行った。
Example 2 Glass cloth (# 2116 type: weight 104 g / m 2
), The amount of the thermosetting resin composition after drying was adjusted to 43 parts by weight with respect to 100 parts by weight of the total amount of the thermosetting resin composition and the glass cloth, and after impregnation, the maximum temperature was 165. Using a prepreg prepared by drying at ℃, 4 sheets were laminated and copper foil with a thickness of 18 μm was placed on both sides, and the laminate was sandwiched between metal plates to obtain a maximum temperature of 18
A double-sided copper-clad laminate having a plate thickness of 0.4 was prepared by heating and pressuring at 0 ° C. and a pressure of 3.0 MPa for 90 minutes. After that, the surface was thinned by etching and further roughened with a sulfuric acid aqueous solution to form a rust preventive film such as an organic film on the surface. Laser machine (LC-1C21 made by Hitachi Via Mechanics) for direct laser processing from the surface
Using a laser with a pulse width of 40 μs, a frequency of 500 Hz, and a number of shots of 10 shots, a jig plate having a thickness of 1.0 mm, which is formed by previously cutting a laser-processed portion under the double-sided plate, is inserted. Form IVH by processing. Further, a cross-section was observed after plating the processed hole.

【0029】比較例1 表面処理に黒化処理皮膜を用いることと表面の銅箔に極
薄銅箔(キャリア付き5μm銅箔)を使用すること以外
は、実施例1と同様の方法で多層プリント配線板作成
し、ホットオイル試験を行い信頼性を確認した。
Comparative Example 1 Multilayer printing was carried out in the same manner as in Example 1 except that a blackening treatment film was used for the surface treatment and an ultrathin copper foil (5 μm copper foil with carrier) was used as the copper foil on the surface. A wiring board was prepared and a hot oil test was conducted to confirm the reliability.

【0030】比較例2 使用するプリプレグの樹脂に一般FR−4の樹脂を用い
ること以外は、実施例1と同様の方法で多層プリント配
線板を作成し、ホットオイル試験を行い信頼性を確認し
た。
Comparative Example 2 A multilayer printed wiring board was prepared in the same manner as in Example 1 except that the resin of general FR-4 was used as the resin of the prepreg used, and the hot oil test was conducted to confirm the reliability. .

【0031】比較例3 表面の銅箔をエッチングせずに、12μmで表面処理を
行うこと以外は、実施例1と同様の方法で多層プリント
配線板を作成し、ホットオイル試験を行い信頼性を確認
した。
Comparative Example 3 A multilayer printed wiring board was prepared in the same manner as in Example 1 except that the surface treatment was carried out at 12 μm without etching the copper foil on the surface, and a hot oil test was conducted to confirm the reliability. confirmed.

【0032】比較例4 表面の銅箔をエッチングせずに、12μmで表面処理を
行うこと以外は、実施例2と同様の方法で断面観察を行
った。
Comparative Example 4 A cross section was observed in the same manner as in Example 2 except that the surface treatment was performed at 12 μm without etching the copper foil on the surface.

【0033】比較例5 両面板の下側にレーザ加工部分を事前にくり貫いた厚さ
1.0mm以上の治具板を挿入しないこと以外は、実施
例2と同様の方法で断面観察を行った。
Comparative Example 5 Cross-section observation was carried out in the same manner as in Example 2 except that a jig plate having a thickness of 1.0 mm or more, which had a laser-processed portion previously hollowed out, was not inserted below the double-sided plate. It was

【0034】評価、結果 実施例1〜2及び比較例1〜5で得られたプリント配線
板、両面板について引き剥がし強度、表面処理ライフ試
験、信頼性試験、レーザ加工性等を評価した。
Evaluation, Results The printed wiring boards and double-sided boards obtained in Examples 1-2 and Comparative Examples 1-5 were evaluated for peeling strength, surface treatment life test, reliability test, laser workability and the like.

【0035】結果は表1に示した通り、実施例1は比較
例1〜3と比べ、引き剥がし強度、表面処理のライフ、
レーザ加工性、信頼性が良好となることが確認された。
また、実施例2は比較例4〜5と比較して、レーザ加工
性が良好となることが確認された。
The results are shown in Table 1. As compared with Comparative Examples 1 to 3, Example 1 has peeling strength, life of surface treatment,
It was confirmed that the laser processability and reliability were good.
Further, it was confirmed that the laser working property of Example 2 was better than that of Comparative Examples 4 to 5.

【0036】[0036]

【表1】 <レーザ加工性評価基準>IVH及びスルーホールの断
面を光学顕微鏡により観察した。 ○:良好な穴形状。 △:穴は明いているが、内壁粗さが大きい。 ×:穴明けできていない。 <ホットオイル試験評価基準>デイジーチェーンパター
ンにより、ホットオイル試験<260℃10s←→30
℃10s>において導通抵抗値の変化率が10%以上に
達するまでのサイクル数をカウントした。 ○:180サイクルOK △:120サイクルNG <表面処理のライフ>各表面処理をした状態で、室温に
放置して変色が始まるまでの時間を目視観察した。 ○:1週間以上放置しても変化無し。 ×:3日間で変色が始まった。
[Table 1] <Laser Machinability Evaluation Criteria> The cross sections of IVH and through holes were observed with an optical microscope. ◯: Good hole shape. Δ: The hole is clear, but the inner wall roughness is large. X: The hole has not been drilled. <Hot oil test evaluation criteria> Hot oil test <260 ° C 10s ← → 30 by daisy chain pattern
The number of cycles until the change rate of the conduction resistance value reached 10% or more at 10 ° C> 10 ° C was counted. ◯: 180 cycles OK Δ: 120 cycles NG <Life of surface treatment> With each surface treatment, it was left to stand at room temperature and the time until discoloration started was visually observed. ○: No change even if left for one week or more. X: Discoloration started within 3 days.

【0037】[0037]

【発明の効果】以上の説明から明らかなように、本発明
は金属銅張り積層板及びプリント配線板の非貫通の金属
箔ダイレクトレーザ穴あけ加工において、一般金属箔を
エッチングにて7μm以下まで薄型化し、さらに、表面
粗さ4μm以下のエッチング系の表面処理を施すことを
特徴とし、また、貫通の金属箔レーザ加工性の場合、金
属張り積層板の下側に加工部分を事前にくり貫いた厚さ
1.0mm以上の治具板を挿入することを特徴として、
金属箔ダイレクトレーザ加工性、信頼性に優れ、高密度
化に対応したプリント配線板及びその製造方法が提供さ
れる。本発明に従って製造したプリント配線板は、信頼
性も高く、小径加工も可能となり、高密度化、高信頼性
化、コスト低減に貢献できる。
EFFECTS OF THE INVENTION As is clear from the above description, according to the present invention, in a non-penetrating metal foil direct laser drilling process for a metal copper clad laminate and a printed wiring board, a general metal foil is thinned to 7 μm or less by etching. Furthermore, it is characterized in that an etching-type surface treatment with a surface roughness of 4 μm or less is performed. Further, in the case of a metal foil laser processability of a through hole, a thickness of a processed part previously cut into the lower side of the metal-clad laminate Characterized by inserting a jig plate of 1.0 mm or more
Provided are a printed wiring board which is excellent in metal foil direct laser processability and reliability and is compatible with high density, and a manufacturing method thereof. The printed wiring board manufactured according to the present invention has high reliability and can be processed with a small diameter, which can contribute to high density, high reliability, and cost reduction.

Claims (6)

【特許請求の範囲】[Claims] 【請求項1】繊維基材を含む絶縁樹脂層を有する多層プ
リント配線板または金属箔銅張り積層板の層間を導通さ
せる小径スルーホールを形成し易くするために、表面の
金属箔をエッチングして薄型化し、レーザ光の吸収率が
高くなる表面処理を金属箔に施すことで、金属箔表面か
らレーザによる穴明け加工を行うことで、小径スルーホ
ールを得ることを特徴とするプリント配線板及びその製
造方法。
1. A metal foil on a surface of a multilayer printed wiring board having an insulating resin layer containing a fibrous base material or a metal foil copper-clad laminate is etched to facilitate formation of a small-diameter through hole for connecting layers. A printed wiring board characterized by obtaining a small-diameter through hole by subjecting a metal foil to a thin treatment and performing a surface treatment on the metal foil so as to increase the absorption rate of laser light, thereby performing a perforating process with a laser from the metal foil surface. Production method.
【請求項2】エッチングされた金属箔の厚みは、7μm
以下であることを特徴とする請求項1記載の高密度プリ
ント配線板及びその製造方法。
2. The thickness of the etched metal foil is 7 μm.
The high-density printed wiring board according to claim 1 and the method for manufacturing the same, wherein:
【請求項3】金属箔の表面処理は、粗化形状を持つエッ
チング系の処理であることを特徴とする請求項1記載の
高密度プリント配線板及びその製造方法。
3. The high-density printed wiring board according to claim 1, and the method for producing the same, wherein the surface treatment of the metal foil is an etching treatment having a roughened shape.
【請求項4】金属箔の表面処理は、表面粗さが4μm以
下であることを特徴とする請求項1記載の高密度プリン
ト配線板及びその製造方法。
4. The high-density printed wiring board according to claim 1, wherein the surface treatment of the metal foil has a surface roughness of 4 μm or less, and a method for manufacturing the same.
【請求項5】熱硬化性樹脂組成物のガラス転移温度(T
g)が160℃以上であることを特徴とする請求項1記
載の高密度プリント配線板及びその製造方法。
5. The glass transition temperature (T
2. The high-density printed wiring board according to claim 1, wherein g) is 160 ° C. or higher, and the method for producing the same.
【請求項6】貫通銅箔ダイレクトレーザ加工の場合は、
プリント配線板の下側に加工部分を事前にくり貫いた厚
さ1.0mm以上の治具板を挿入することを特徴とする
請求項1記載の高密度プリント配線板及びその製造方
法。
6. In the case of through copper foil direct laser processing,
The high-density printed wiring board according to claim 1, and a method for manufacturing the same, wherein a jig plate having a thickness of 1.0 mm or more, which is formed by cutting a processed portion in advance, is inserted under the printed wiring board.
JP2001387884A 2001-12-20 2001-12-20 High density printed wiring board and manufacturing method therefor Pending JP2003188544A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
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Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001387884A JP2003188544A (en) 2001-12-20 2001-12-20 High density printed wiring board and manufacturing method therefor

Publications (1)

Publication Number Publication Date
JP2003188544A true JP2003188544A (en) 2003-07-04

Family

ID=27596577

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Link
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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005150211A (en) * 2003-11-12 2005-06-09 Hitachi Chem Co Ltd Multilayer wiring board and its manufacturing method
JP2009123986A (en) * 2007-11-16 2009-06-04 Fujitsu Ltd Method for manufacturing multi-layer circuit board
JP2016127251A (en) * 2014-12-26 2016-07-11 京セラ株式会社 Printed-circuit board and method for manufacturing the same

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10178253A (en) * 1996-12-17 1998-06-30 Santa Keikinzoku Kogyo Kk Laminated body for wiring board and its manufacture
JPH1158061A (en) * 1997-08-12 1999-03-02 Murata Mfg Co Ltd Laser beam machine for flexible material and its machining method
JPH11121931A (en) * 1997-10-17 1999-04-30 Nippon Carbide Ind Co Inc Printed wiring board and its manufacture
JP2000091750A (en) * 1998-09-16 2000-03-31 Ibiden Co Ltd Method for forming through hole, multilayered printed wiring board and manufacture thereof and through hole forming substrate
JP2001044597A (en) * 1999-07-29 2001-02-16 Mitsubishi Gas Chem Co Inc Copper clad plate having excellent carbon dioxide laser boring properties
JP2001313471A (en) * 2000-02-24 2001-11-09 Matsushita Electric Works Ltd Method for forming viahole of wiring board

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10178253A (en) * 1996-12-17 1998-06-30 Santa Keikinzoku Kogyo Kk Laminated body for wiring board and its manufacture
JPH1158061A (en) * 1997-08-12 1999-03-02 Murata Mfg Co Ltd Laser beam machine for flexible material and its machining method
JPH11121931A (en) * 1997-10-17 1999-04-30 Nippon Carbide Ind Co Inc Printed wiring board and its manufacture
JP2000091750A (en) * 1998-09-16 2000-03-31 Ibiden Co Ltd Method for forming through hole, multilayered printed wiring board and manufacture thereof and through hole forming substrate
JP2001044597A (en) * 1999-07-29 2001-02-16 Mitsubishi Gas Chem Co Inc Copper clad plate having excellent carbon dioxide laser boring properties
JP2001313471A (en) * 2000-02-24 2001-11-09 Matsushita Electric Works Ltd Method for forming viahole of wiring board

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005150211A (en) * 2003-11-12 2005-06-09 Hitachi Chem Co Ltd Multilayer wiring board and its manufacturing method
JP2009123986A (en) * 2007-11-16 2009-06-04 Fujitsu Ltd Method for manufacturing multi-layer circuit board
JP2016127251A (en) * 2014-12-26 2016-07-11 京セラ株式会社 Printed-circuit board and method for manufacturing the same

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