JPH1092912A - Substrate rotation holding apparatus and rotary substrate processing apparatus - Google Patents

Abstract

PROBLEM TO BE SOLVED: To smoothly rotate a substrate, having the center of which aligned with a rotary center, without producing particles. SOLUTION: A rotary stage 2 mounts rotary holding pins 7a along the marginal edge of a substrate 100 and stopper-attached rotary holding pins 7b facing at the holding pins 7a rotatably mounted on the stage 2 through bearings 8 with the holding pins 7b rotatably mounted on the stage 2 through stopper- attached bearings 28. At holding of the substrate 100 pin members of the pins 7a press the peripheral end face of the substrate 100 by a magnetic force from an annular magnet 11 and lock pins stop the holding pins 7b from rotating to stop the substrate 100 at a centering position.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

[0001] 1. Field of the Invention [0002] The present invention relates to a substrate rotation holding device for rotating a substrate while horizontally holding the substrate, and a rotary substrate processing apparatus provided with the same.

[0002]

2. Description of the Related Art A rotary substrate processing apparatus such as a rotary coating apparatus and a rotary developing apparatus includes a substrate rotation holding device for rotating a substrate such as a semiconductor wafer while holding the substrate horizontally. As the substrate rotation holding device, a suction-type spin chuck that sucks and holds the back surface of a substrate by vacuum suction is generally used. However, in the suction-type spin chuck, strong suction is performed to surely hold the substrate by suction, so that a suction mark is left on the back surface of the substrate. There is a problem that the suction mark on the back surface of the substrate causes a focus error during the exposure processing. Further, when cleaning the back surface of the substrate, the suction portion of the spin chuck on the back surface of the substrate cannot be sufficiently cleaned, and the back surface of the substrate is contaminated with particles.
Particles adhering to the back surface of the substrate cause a problem that the surface of another substrate is contaminated in a later process.

Therefore, a mechanical spin chuck that supports the back surface of a substrate and transmits a rotational force to the substrate while holding the outer peripheral end surface of the substrate has been proposed. The mechanical spin chuck is mounted on a rotating stage that is driven to rotate in a horizontal position.
A plurality of support pins for vertically supporting the back surface of the substrate, and a plurality of holding pins for contacting the outer peripheral end surface of the substrate to regulate the horizontal position of the substrate and transmit the rotational force to the substrate are fixed.

[0004] Between each holding pin and the outer peripheral end face of the substrate,
A slight gap is provided to facilitate loading and unloading of the substrate. When the mechanical spin chuck is driven to rotate about a vertical axis, some of the plurality of holding pins are pressed against the outer peripheral end surface of the substrate, and the center of the substrate is slightly eccentric from the center of rotation. Rotates together with the mechanical spin chuck.

However, in this mechanical spin chuck, since the substrate rotates with the center of the substrate being slightly eccentric from the center of rotation, vibration occurs due to imbalance of the load.
The vibration may affect other substrate processing units. In addition, since some of the plurality of holding pins are in contact with the outer peripheral end surface of the substrate, the end surface of the substrate and the holding pins rub against each other when the substrate is taken out, so that particles are easily generated. Further, when the end face of the substrate bites into the holding pin due to the rotation of the substrate, there is a possibility that the substrate is not properly transported or the substrate is damaged.

Further, when this mechanical spin chuck is used in a rotary developing device, the developing solution laid on the substrate tends to spill down along the holding pins which are in contact with the outer peripheral end surface of the substrate. As a result, the developer on the substrate becomes uneven, and the developing process becomes non-uniform. Further, it is necessary to add a developing solution to compensate for the spilled developing solution, and the consumption of the developing solution increases.

In view of the above, there has been further proposed a mechanical spin chuck in which a part of the plurality of holding pins is formed using a movable pin which can be separated from and attached to the outer peripheral end surface of the substrate. In this mechanical spin chuck, a plurality of fixing pins that define the horizontal position of the substrate in contact with the outer peripheral end face so that the center of the substrate coincides with the center of rotation are arranged along the outer periphery of the substrate. A movable pin is formed along the outer periphery of the substrate, the movable pin being formed to be movable between a position in contact with the outer peripheral end surface and a position separated from the outer peripheral end surface and contacting the outer peripheral end surface of the substrate with a predetermined pressing force. In this mechanical spin chuck, since the center of the substrate is regulated by the fixing pin so as to coincide with the center of rotation, the above-described problem due to the eccentricity of the substrate does not occur.

[0008]

However, in this mechanical spin chuck, the substrate must be placed on the spin chuck so that the outer periphery of the substrate does not come into contact with the fixing pins. Become. In addition, when the substrate is taken out, sliding between the fixed holding pins and the end surface of the substrate may occur, and particles may be generated.

Further, when used in a rotary developing device, similarly to the mechanical spin chuck described above, when a developing solution is filled on a substrate, the developer is transferred through holding pins in contact with the outer peripheral end surface of the substrate. As a result, the developing solution is spilled, resulting in uneven development and an increase in consumption of the developing solution.

SUMMARY OF THE INVENTION It is an object of the present invention to rotate a substrate in a state where the center of the substrate coincides with the center of rotation, and to smoothly take out the substrate without generating particles. And a rotary substrate processing apparatus having the same.

[0011]

Means for Solving the Problems and Effects of the Invention A substrate rotation holding device according to a first aspect of the present invention is a substrate rotation holding device for rotating a substrate while horizontally holding the substrate. A rotating member that is rotationally driven in a posture, and is separated from the outer peripheral end surface of the substrate and a substrate holding position that is distributed and arranged at a position equidistant from the rotation center of the rotational member and abuts the outer peripheral end surface of the substrate to hold the substrate in the horizontal direction A plurality of first holding members movable between a substrate releasing position and a plurality of first holding members movable at positions equidistant from the rotation center of the rotating member, and the substrate is positioned at a position where the center of the substrate coincides with the rotation center of the rotating member. A plurality of second holding members movable between a substrate holding position for holding the substrate horizontally while being stopped in contact with the outer peripheral end surface and a substrate releasing position separated from the outer peripheral end surface of the substrate; Holding members and multiple The second holding member is obtained by a moving means for moving between the substrate holding position and the substrate releasing position.

A substrate rotation holding apparatus according to a second aspect of the present invention is the substrate rotation holding apparatus according to the first aspect, wherein a plurality of first holding members are arranged along one outer peripheral semicircle of the substrate. Are arranged along the other outer semicircle.

According to a third aspect of the present invention, there is provided a substrate rotating and holding apparatus according to the first or second aspect of the present invention, wherein each of the plurality of first holding members and the plurality of second holding members is vertically mounted. A support portion rotatably attached to the rotating member about a rotation axis in the direction, and eccentrically provided with respect to the rotation axis of the support portion so as to contact the outer peripheral end surface of the substrate with the rotation of the support portion. And a plurality of second holding members. It further includes a stop member for stopping the movement.

According to a fourth aspect of the present invention, there is provided the substrate rotating and holding apparatus according to the third aspect of the present invention, wherein the moving means is attached to each of the plurality of first holding members. A magnet member, a second magnet member attached to each of the support portions of the plurality of second holding members, and a plurality of first holding members and a plurality of first holding members arranged close to and away from the first magnet member and the second magnet member. And a third magnet member for driving the holding member. The magnetic force of the second magnet member is set to be larger than the magnetic force of the first magnet member.

According to a fifth aspect of the present invention, there is provided a substrate rotation holding apparatus including the substrate rotation holding apparatus according to any one of the first to fourth inventions. In the substrate rotation holding apparatus according to the first to fourth inventions and the rotary substrate processing apparatus according to the fifth invention, the plurality of first holding members and the second holding members that hold the substrate in the horizontal direction are provided on the outer periphery of the substrate. By being configured to be movable to the substrate release position separated from the end face, it is possible to prevent the end face of the substrate from sliding between the first and second holding members by moving the substrate to the substrate release position when the substrate is taken out, Thereby, generation of particles can be prevented. In addition, when the substrate rotating and holding device is used in a rotary developing device, the developing solution on the substrate is spilled down along the first and second holding members even when liquid development is performed on the substrate. Can be prevented.

Furthermore, the plurality of second holding members can be stopped at a position where the center of the substrate coincides with the rotation center of the rotating member, so that the substrate can be stopped at an eccentric position without stopping at the center of the substrate. The substrate can be moved and held at a position where the rotation center of the rotating member coincides. Thus, the substrate can be rotated without causing vibration due to the eccentricity of the substrate.

In particular, in the substrate rotating and holding apparatus according to the second aspect of the present invention, since the plurality of first holding members and the plurality of second holding members are arranged to face each other, the center of the substrate becomes the center of rotation of the rotating member. When the first holding member presses the substrate in the horizontal direction against the second holding member stopped at a position corresponding to the above, the substrate can be held so that the center of the substrate coincides with the rotation center of the rotating member. .

In the substrate rotating and holding apparatus according to the third invention, the stop member of the second holding member stops the rotation of the second holding member at a predetermined position, and at this position, the center of the substrate is rotated by the rotating member. The substrate is held horizontally so that it matches the center. Thus, the substrate can be rotated while being held at the proper position.

In particular, in the substrate rotation holding device according to the fourth invention, the first holding member and the second holding member are driven by the magnetic force from the third magnet member, respectively. Therefore, generation of particles is prevented by driving the first and second holding members without forming a mechanical sliding portion. In addition, by driving using the magnetic force, it is possible to apply a predetermined driving force to the first and second holding members that rotate together with the rotating member. Further, by setting the magnetic force of the second magnet member to be larger than the magnetic force of the first magnet member, the second holding member that stops the substrate at a predetermined position moves by receiving a pressing force from the first holding member. Is prevented, so that the substrate can be held in a proper position.

[0020]

Embodiments of the present invention will be described below. Here, a description will be given of a rotary developing device as an example of a rotary substrate processing device provided with the substrate rotation holding device of the present invention. FIG. 1 is a sectional view of a rotary developing device according to an embodiment of the present invention. FIG. 2 is a plan view of a main part of the rotary developing device of FIG.

In FIG. 1, a rotary developing device includes a substrate 1
A rotation holding unit 1 is provided for holding 00 horizontally. The rotation holding unit 1 is fixed to a tip of a shaft 4 of the motor 3, holds the substrate 100 by rotation of the motor 3, and is driven to rotate around a vertical axis. Above the rotation holding unit 1, a developing nozzle 17 for discharging a developing solution is provided so as to be movable in the vertical and horizontal directions. The developing nozzle 17 stands by at a position deviated from above the substrate 100 before and after the developing process, and moves above the central portion of the substrate 100 during the developing process. A cup 16 is arranged around the rotation holding unit 1 so as to be vertically movable.

The shaft 4 of the motor 3 is formed of a hollow body, and has a back rinse nozzle 15 for back surface cleaning inside.
Is inserted. The back rinse 15 is provided on the substrate 10
The cleaning liquid is discharged to the center of the back surface of the substrate 100 to clean contaminants on the back surface of the substrate 100.

In the above-mentioned rotary developing device, the rotation holding portion 1 and the magnet support member 12 including the annular magnet 11 constitute a substrate rotation holding device. The rotation holder 1 includes a circular plate-shaped rotation stage 2. The rotary stage 2 is horizontally fixed to the tip of the shaft 4 of the motor 3 and is driven to rotate about a vertical axis. An annular support 5 is fixed on the upper surface of the rotary stage 2.
Are provided with a plurality of substrate support pins 6 for supporting the back surface of the substrate 100.

An annular wall 10 is provided on the periphery of the rotary stage 2. Further, the rotary stage 2 is formed with a through hole 13 through which the lifting pin 14 passes. The lift pins 14 move up and down through the through holes 13 to move the substrate 100 up and down.

An annular magnet 11 is provided below the rotation holding unit 1. The annular magnet 11 is fixed to a magnet support member 12 provided to be vertically movable by a driving device (not shown).

A plurality of rotation holding pins 7a and a plurality of rotation holding pins 7b with stoppers for regulating the horizontal position of the substrate 100 are provided on the rotation stage 2 with respect to the rotation stage 2 via bearings 8 and bearings 28 with stoppers, respectively. It is rotatably mounted. As shown in FIG. 2, the plurality of rotation holding pins 7 a are arranged on one outer peripheral end surface side (left side in the figure) of the substrate 100, and the plurality of rotation holding pins 7 with stoppers are provided.
b is disposed on the other outer peripheral end surface side (right side in the figure) of the substrate 100 so as to face the rotation holding pin 7a. Moreover, the plurality of rotation holding pins 7a and the rotation holding pins 7 with stoppers are provided.
b is arranged such that its rotation center is dispersed at an equal distance from the rotation center P of the rotation stage 2.

FIG. 3A is a perspective view of the rotation holding pin 7a. As shown in FIG. 3A, the rotation holding pin 7a is
It comprises a columnar support 21, a columnar (rod-shaped) pin member (holding part) 22, a connecting shaft 23, and a magnet housing 24. The pin member 22 is provided on the upper surface of the support portion 21.
Is provided eccentrically with respect to the center. Magnet storage part 2
4 is fixed to the lower part of the support part 21 via the connecting shaft part 23. The rod-shaped permanent magnet 9 is housed in the magnet housing 24. The connection shaft portion 23 is rotatably attached to a bearing 8 fixed to the rotary stage 2 via a bearing 30. Therefore, the rotation holding pin 7a can freely rotate about the vertical axis Q passing through the center of the connecting shaft portion 23 as shown by the arrow R1.

FIG. 3B is a perspective view of the rotation holding pin 7b with a stopper. As shown in FIG. 3B, the rotation holding pin 7b with the stopper includes a columnar support portion 21, a columnar (rod-like) pin member (holding portion) 22, a connecting shaft portion 23, a magnet housing portion 24, and Lock pin (stop member) 1
Consists of nine. The members other than the lock pin 19 are configured in the same manner as the rotation holding pin 7a. Lock pin 19
Are formed so as to protrude upward from the upper surface of the magnet housing portion 24.

The connecting shaft 23 is rotatably mounted on a bearing 28 with a stopper fixed to the rotary stage 2 via a bearing 30. A notch 29 is formed in the lower part of the cylindrical bearing 28 with a stopper. The notch 29 is formed in a fan shape at a predetermined angle about the rotation axis Q, and comes into contact with the lock pin 19 to stop the rotation of the stopper-equipped rotation holding pin 7b. Contact wall surfaces 29a and 29b. The notch 29 of the bearing 28 with the stopper allows the rotation holding pin 7 b with the stopper to lock the lock pin 19.
Can rotate as shown by an arrow R2 within a range where it comes into contact with the second contact wall surface 29b from a position where it contacts the first contact wall surface 29a.

Here, the rotary stage 2 constitutes the rotating member of the present invention, the rotation holding pin 7a constitutes a first holding member, and the rotation holding pin 7b with stopper constitutes a second holding member. Further, the permanent magnet 9 of the rotation holding pin 7a, the permanent magnet 9 of the rotation holding pin 7b with stopper, and the annular magnet 11 are the first magnet member and the second magnet member of the moving means of the present invention, respectively.
A magnet member and a third magnet member are configured.

Next, the substrate 1 in the rotation holding unit 1 is described.
The operation of holding and releasing 00 will be described. FIG. 4 is an explanatory diagram of a substrate releasing operation of the rotation holding pin with stopper, and FIG. 5 is an explanatory diagram of a substrate holding operation of the rotation holding pin with stopper. FIG. 6 is an explanatory view of the operation of releasing the substrate by the rotation holding pin, and FIG. 7 is an explanatory view of the operation of holding the substrate by the rotation holding pin. 4 to 6, (a) is a partial cross-sectional view of the rotation holding pin 7b with a stopper, the rotation holding pin 7a and its peripheral portion, and (b) is a rotation holding pin 7b with a stopper, a rotation holding pin a. FIG. Further, FIG.
FIG. 5C is a cross-sectional view taken along the line A in FIG.
FIG. 6 is a sectional view taken along line C in FIG.

First, the releasing operation of the substrate 100 at the time of delivery of the substrate 100 and after the filling of the developing solution will be described with reference to FIGS. FIG. 4 (a) and FIG.
As shown in (a), at this time, the annular magnet 11 is located below and below the rotary stage 2. The lines of magnetic force B formed by the annular magnet 11 correspond to the permanent magnets 9 of the rotation holding pin 7b with the stopper and the rotation holding pin 7a.
Are directed from the outside of the rotary stage 2 toward the center at the height at which it is installed.

Therefore, the rotation holding pin 7 with the stopper
In b, the N pole of the permanent magnet 9 is attracted in the direction toward the center of the rotary stage 2. Thereby, as shown in FIG. 4B, the rotation holding pin 7 b with the stopper rotates in the direction of the arrow X, and the outer peripheral surface of the pin member 22 separates from the outer peripheral end surface of the substrate 100. Then, as shown in FIG. 4C, the lock pin 19 is connected to the first contact wall surface 2 of the stopper 28 with the stopper.
The rotation of the rotation holding pin 7b with the stopper is stopped at the position where the rotation holding pin 7b comes into contact with the stopper 9a. In this state, the pin member 22 is
Stop at a position separated from the outer peripheral end surface of the outer peripheral surface of the motor.

Further, in the rotation holding pin 7a shown in FIG.
Similarly, the N pole of the permanent magnet 9 is attracted in a direction toward the center of the rotary stage 2. Thereby, as shown in FIG. 6B, the rotation holding pin 7a rotates in the arrow X direction, and the outer peripheral surface of the pin member 22 separates from the outer peripheral end surface of the substrate 100.
Then, the rotation of the rotation holding pin 7a stops in a state where the magnetic force from the annular magnet 11 and the magnetic force of the permanent magnet 9 are balanced.

By the above operation, all the rotation holding pins 7a and the rotation holding pins 7b with stoppers are
Stop at a position distant from the outer peripheral end face. by this,
The substrate 100 can be taken out without the outer peripheral end surface of the substrate 100 sliding with the pin member 22. In addition, during the liquid development, the liquid developer on the surface of the substrate 100 does not overflow along the separated pin member 22 without overflowing.
00.

Next, the holding operation of the substrate 100 will be described with reference to FIG.
This will be described with reference to FIG. FIG. 5 (a) and FIG.
As shown in (a), the annular magnet 11 rises and approaches the rotating stage 2. Therefore, the S pole of the permanent magnet 9 of each of the rotation holding pin 7b with the stopper and the rotation holding pin 7a is attracted to the N pole of the annular magnet 11.

Accordingly, the rotation holding pin 7 with stopper
In FIG. 5B, as shown in FIG. 5B, the pin member 22 rotates in the direction of arrow Y, and the outer peripheral surface of the pin member 22 contacts the outer peripheral end surface of the substrate 100. At this time, as shown in FIG. 5C, the lock pin 19 is moved to the second contact wall surface 29 of the stopper 28 with the stopper.
b. As a result, the rotation of the rotation holding pin 7b with the stopper is stopped. In this stop position, the pin member 2
The second abutment of the stopper-equipped bearing 28 is performed such that the second abutment 2 abuts on the outer peripheral end surface of the substrate 100 and the center of the substrate 100 coincides with the center of rotation of the rotary stage 2 (hereinafter referred to as a centering position). The positions of the wall surface 29b and the lock pin 19 are adjusted.

On the other hand, in the case of the rotation holding pin 7a, as shown in FIG.
As shown in (2), the outer peripheral surface of the pin member 22 contacts the outer peripheral end surface of the substrate 100, and presses and holds the substrate 100 in the horizontal direction.

By the above operation, the substrate 1 shown in FIG.
00 is held at the centering position by a plurality of rotation holding pins 7b with stoppers for stopping the substrate 100 at the centering position and a plurality of rotation holding pins 7a for pressing the outer peripheral end surface of the substrate 100 and moving the substrate 100 in the horizontal direction. You. Then, it is rotationally driven by the motor 3. Here, the permanent magnet 9 of the rotation holding pin 7b with a stopper is
It is necessary to use a magnet having a stronger magnetic force than the permanent magnet 9 of a. For example, a permanent magnet having a large magnetic force and a strong magnetic force, or a permanent magnet having a high magnetic flux density may be used. To increase the attractive force between the ring-shaped magnet 11 and the ring-shaped magnet 11, the gap between the ring-shaped permanent magnet 9 and the ring-shaped magnet 11 of the pin 7a is fixed. It may be arranged closer than the above. Accordingly, the rotation holding pin 7b with the stopper can hold the substrate 100 at the centering position against the horizontal pressing force from the rotation holding pin 7a.

The substrate rotation holding device used for the rotary developing device in the above embodiment can be used for a rotary coating device or a rotary cleaning device.

[Brief description of the drawings]

FIG. 1 is a sectional view of a rotary developing device according to an embodiment of the present invention.

FIG. 2 is a plan view of a main part of the rotary developing device of FIG.

FIG. 3 is a perspective view of a rotation holding pin (a) and a rotation holding pin with stopper (b) in the rotary developing device of FIG.

FIG. 4 is a partial cross-sectional view and a plan view showing a state where a pin member of a rotation holding pin with a stopper is separated from an outer peripheral end surface of a substrate.

5A and 5B are a partial sectional view and a plan view showing a state where a pin member of a rotation holding pin with a stopper is in contact with an outer peripheral end surface of a substrate.

FIGS. 6A and 6B are a partial sectional view and a plan view showing a state where a pin member of a rotation holding pin is separated from an outer peripheral end surface of a substrate.

FIGS. 7A and 7B are a partial sectional view and a plan view showing a state in which a pin member of a rotation holding pin is in contact with an outer peripheral end surface of a substrate.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 Rotation holding part 2 Rotation stage 6 Substrate support pin 7a Rotation holding pin 7b Rotation holding pin with stopper 8 Bearing 9 Permanent magnet 11 Ring magnet 12 Magnet support member 19 Lock pin 21 Support part 22 Pin member 23 Connection shaft part 24 Magnet Storage portion 28 Bearing with stopper 29 Notch portion 29a First contact wall surface 29b Second contact wall surface

Claims (5)

[Claims] 1. A substrate rotation holding device for rotating a substrate while horizontally holding the substrate, wherein the rotation member supports a lower surface of the substrate and is driven to rotate in a horizontal posture, and is equidistant from a rotation center of the rotation member. And a plurality of first movable parts that are movable between a substrate holding position that abuts on the outer peripheral end surface of the substrate and holds the substrate in the horizontal direction and a substrate release position that is separated from the outer peripheral end surface of the substrate. Holding member, and distributed at positions equidistant from the rotation center of the rotating member, and stopped in a state in which the center of the substrate is in contact with the outer peripheral end surface of the substrate at a position coinciding with the rotation center of the rotating member. A plurality of second holding members movable between a substrate holding position for holding the substrate in a horizontal direction and a substrate release position separated from an outer peripheral end surface of the substrate; the plurality of first holding members and the plurality of first holding members. 2 hold Substrate rotation holding apparatus characterized by comprising a moving means for moving the timber between the substrate releasing position and the board holding position. 2. The method according to claim 1, wherein the plurality of first holding members are arranged along one outer circumferential semicircle of the substrate, and the plurality of second holding members are arranged along the other outer semicircle. The substrate rotation holding device according to claim 1. 3. A support portion attached to the rotating member so as to be rotatable around a vertical rotation axis, wherein each of the plurality of first holding members and the plurality of second holding members is; A holding portion provided eccentrically with respect to the rotation axis of the support portion so as to contact an outer peripheral end surface of the substrate with the rotation of the substrate, wherein the plurality of second holding members are located at the center of the substrate. A stop member for stopping the rotation of the supporting portion so that the holding portion stops at a position coinciding with the rotation center of the rotating member in a state in which the holding portion contacts the outer peripheral end surface of the substrate. The substrate rotation holding device according to claim 1 or 2. 4. The moving means includes: a first magnet member attached to the support of each of the plurality of first holding members; and a moving unit attached to the support of each of the plurality of second holding members. A second magnet member, the plurality of first holding members and the second
The substrate rotation according to claim 3, further comprising a third magnet member that drives a holding member, wherein a magnetic force of the second magnet member is set to be larger than a magnetic force of the first magnet member. Holding device. 5. A rotary substrate processing apparatus comprising the substrate rotation holding device according to claim 1.