JPH1140655A - Substrate rotation holding device and rotational substrate processor - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a substrate rotation holding device, having a high holding force with respect to vertical oscillation and a rotational substrate processor equipped with this device. SOLUTION: Plural rotational holding pins 5 are attached to the upper face of a rotating member 2 along a circumference which is axial to a rotary axis A. The rotational holding pin 5 is composed of a cylindrical supporting part 6 and a reverse conical trapezoidal holding part 7 having a smaller diameter than that of the supporting part 6. The supporting part 6 is attached to the rotation member 2 so as to be movable, and the holding part 7 is provided on the upper face of the supporting part 6 so as to be eccentric to the rotary axis. The outer peripheral face of the holding part 7 is allowed to abut to the outer peripheral edge face of a substrate 100, according to the rotation of the supporting part 6, so that a force for holding the substrate 100 in a horizontal direction and a force for pressing down the substrate 100 can act.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

[0001] 1. Field of the Invention [0002] The present invention relates to a substrate rotation holding device for rotating a substrate while horizontally holding the substrate, and a rotary substrate processing apparatus provided with the same.

[0002]

2. Description of the Related Art In a rotary substrate processing apparatus such as a rotary coating apparatus and a rotary developing apparatus, it is necessary to rotate a substrate such as a semiconductor wafer while holding it horizontally. Generally, a suction-type spin chuck that sucks and holds the back surface of a substrate by vacuum suction is used. However, in the suction-type spin chuck, strong suction is performed in order to surely hold the substrate by suction, so that a suction mark remains on the back surface of the substrate. There is a problem that the suction mark on the back surface of the substrate causes a focus error during the exposure processing.

Therefore, a mechanical spin chuck that supports the back surface of a substrate and transmits a rotational force to the substrate while holding the outer peripheral end surface of the substrate has been proposed. As a holding pin used for such a mechanical spin chuck, a rotary holding pin has been proposed.

FIGS. 10 (a), 10 (b) and 10 (c) are a plan view, a side view and a perspective view showing an example of a rotary holding pin used in a mechanical spin chuck.

[0005] As shown in FIG.
Consists of a columnar supporting portion 31 and a columnar holding portion 32. The holding part 32 is provided eccentrically on the support part 31. The rotary holding pin 30 is mounted on a rotary member (rotary stage) so as to be rotatable about a vertical axis in directions indicated by arrows x and y.

When the rotary holding pin 30 rotates in the direction of arrow x, the outer peripheral surface of the holding portion 32 comes into contact with the outer peripheral end surface of the substrate 100, and the substrate 100 is held in the horizontal direction. Conversely, when the rotary holding pin 30 rotates in the direction of arrow y, the substrate 1
00 is released.

[0007]

In the rotary holding pin 30 shown in FIG. 10, since the holding force against the vertical vibration is low, when the substrate is rotated, an abnormal noise is generated depending on the rotation speed, or the substrate is moved up and down. May vibrate.

An object of the present invention is to provide a substrate rotating and holding apparatus having a high holding force against vertical vibration and a rotary substrate processing apparatus having the same.

[0009]

Means for Solving the Problems and Effects of the Invention A substrate rotation holding device according to a first aspect of the present invention is a substrate rotation holding device for rotating a substrate while holding the substrate horizontally. The member is disposed along the outer peripheral portion of the substrate placed on the rotating member, and is movable between a substrate holding position in contact with the outer peripheral end surface of the substrate and a substrate open position separated from the outer peripheral end surface of the substrate. A plurality of holding members, each of which has a tapered holding portion whose diameter gradually increases upward.

In the substrate rotating and holding apparatus according to the present invention, when each holding member moves to the substrate holding position, the outer peripheral surface of the tapered holding portion whose diameter gradually increases upward comes into contact with the outer peripheral end surface of the substrate. . As a result, a force for holding the substrate in the horizontal direction acts and a force for pressing the substrate downward acts. Therefore, the holding force against vertical vibration is increased, and generation of abnormal noise and vertical vibration of the substrate are prevented.

A substrate rotation holding device according to a second aspect of the present invention is a substrate rotation holding device for rotating a substrate while horizontally holding the substrate. The rotation member is driven to rotate in a horizontal posture, and a vertical shaft is attached to the rotation member. A plurality of holding members that are rotatably mounted around and abut against the outer peripheral end surface of the substrate with the rotation, and each of the plurality of holding members has a tapered shape that gradually increases in diameter upward. It has a holding portion.

In the substrate rotating and holding apparatus according to the present invention, the outer periphery of the tapered holding portion whose diameter gradually increases upward by rotating each holding member in one direction around a vertical axis. The surface contacts the outer peripheral end surface of the substrate. As a result, a force for holding the substrate in the horizontal direction acts and a force for pressing the substrate downward acts. Therefore,
The holding force against vertical vibration is increased, and generation of abnormal noise and vertical vibration of the substrate are prevented.

Further, when each of the holding members is rotated in the opposite direction about the vertical axis and the outer peripheral surface of the holding portion is separated from the outer peripheral end surface of the substrate, the substrate can be carried out upward.

According to a third aspect of the present invention, there is provided the substrate rotating and holding apparatus according to the second aspect of the present invention, wherein each of the plurality of holding members is rotatable about a vertical axis. The holding portion is provided eccentrically with respect to the rotation axis of the support portion so as to contact the outer peripheral end surface of the substrate with the rotation of the support portion.

In this case, when the supporting portion of each holding member rotates in one direction around the axis in the vertical direction, the outer peripheral surface of the tapered holding portion gradually increasing in diameter toward the upper side causes the outer peripheral surface of the substrate to become larger. The outer peripheral surface of the holding portion is separated from the outer peripheral end surface of the substrate by contacting the end surface and rotating the support portion of each holding member in the opposite direction about the vertical axis.

A substrate rotation holding device according to a fourth aspect of the present invention is a substrate rotation holding device for rotating a substrate while horizontally holding the substrate, wherein the rotation member is driven to rotate in a horizontal posture, and a vertical shaft is attached to the rotation member. A plurality of holding members that are rotatably mounted around and that come into contact with the outer peripheral end surface of the substrate with the rotation, and each of the plurality of holding members extends vertically toward one side surface extending in the vertical direction. And a holding portion having the other side surface extending inclining outward.

In the substrate rotating and holding apparatus according to the present invention, when each holding member rotates in one direction about a vertical axis, the side surface extending obliquely outward toward the upper side of the holding portion is formed on the substrate. Abuts on the outer peripheral end face of. Thereby,
A force for holding the substrate in the horizontal direction acts and a force for pressing the substrate downward acts. Therefore, the holding force against vertical vibration is increased, and generation of abnormal noise and vertical vibration of the substrate are prevented.

Further, when each holding member rotates in the opposite direction and the side surface of the holding portion extending in the vertical direction faces the outer peripheral end surface of the substrate, the substrate can be carried out upward.

According to a fifth aspect of the present invention, there is provided the substrate rotating and holding apparatus according to the fourth aspect of the present invention, wherein each of the plurality of holding members is rotatable about a vertical axis. The holding portion is further provided on the supporting portion so as to abut on the outer peripheral end surface of the substrate on the other side surface that extends obliquely upward with the rotation of the supporting portion. Things.

In this case, the supporting portion of each holding member pivots in one direction about the axis in the vertical direction, so that the side surface extending obliquely outward toward the upper side of the holding portion contacts the outer peripheral end surface of the substrate. When the support portion of each holding member contacts and rotates in the opposite direction about the axis in the vertical direction, the vertically extending side surface of the holding portion faces the outer peripheral end surface of the substrate.

A rotary substrate processing apparatus according to a sixth aspect of the present invention
A substrate rotation holding device according to any one of the first to fifth aspects of the invention, a driving unit that rotationally drives a rotating member of the substrate rotation holding device, and a processing unit that performs a predetermined process on a substrate held by the substrate rotation holding device It is provided with.

In the rotary substrate processing apparatus according to the present invention, since the substrate rotation holding apparatus according to any one of the first to fifth aspects is provided, a high holding force against vertical vibration can be obtained. Therefore, abnormal noise and vertical vibration of the substrate do not occur during the rotation of the substrate, and the substrate can be processed in a favorable state.

[0023]

FIG. 1 is a schematic sectional view of a rotary substrate processing apparatus using a substrate rotation holding apparatus according to a first embodiment of the present invention, and FIG. 2 is a schematic plan view of the substrate rotation holding apparatus of FIG. It is.

In FIGS. 1 and 2, the substrate rotation holding device 1 includes a rotation member 2 having a circular plate shape. Rotating member 2
Is horizontally fixed to the tip of the shaft 4 of the motor 3,
It is driven to rotate around a vertical rotation axis A. A plurality of rotary holding pins 5 are mounted on the upper surface of the rotating member 2 along a circumference coaxial with the rotation axis A.

The rotary holding pin 5 has a cylindrical support portion 6,
And a holding portion 7 having an inverted truncated cone shape having a diameter smaller than that of the supporting portion 6. As shown in FIG.
Is attached to the rotation member 2 so as to be rotatable around a rotation shaft 6a coaxial with the central axis. The holding unit 7 is provided on the upper surface of the support unit 6 so as to be eccentric with respect to the rotation shaft 6a. Due to the rotation of the support part 6, the outer peripheral surface of the holding part 7 is
0 is in contact with the outer peripheral end face.

As shown in FIG. 1, below the rotating member 2, a ring-shaped magnet 9 is disposed coaxially with the rotation axis A so as to be vertically movable. Further, a cup 50 is arranged to be vertically movable so as to surround the periphery of the substrate rotation holding device 1.
Above the rotating member 1, a processing liquid discharge nozzle 20 for discharging a processing liquid such as a developing liquid or a resist liquid is provided so as to be movable in the vertical and horizontal directions.

FIG. 3 is a perspective view showing a rotary holding pin and a magnet holding portion attached to a lower portion thereof. As shown in FIG. 3, a circular magnet holding portion 11 is attached to a lower portion of the support portion 6 of the rotary holding pin 5 via a rotary shaft body 10 coaxial with the rotation shaft 6a. A rod-shaped permanent magnet 12 is built in the center of the magnet holding unit 11.

In this embodiment, the rotary holding pin 5 corresponds to a holding member, the motor 3 corresponds to a driving unit, and the processing liquid discharge nozzle 20 corresponds to a processing unit.

FIGS. 4 and 5 are views for explaining the structure and operation of the substrate rotation holding device 1 of FIGS. 1 and 2. FIG. 4A is a partial sectional view of the rotation type holding pin and its peripheral portion. (B) is a plan view of the rotary holding pin. FIG.
(C) is a diagram showing the force acting on the substrate by the rotary holding pin.

As shown in FIGS. 4 (a) and 5 (a), the rotary shaft 10 of the rotary holding pin 5 is
And is rotatably supported by the rotating member 2 via the. The rotation bearing 13 is provided with, for example, a bearing mechanism to suppress the rotation friction.

Before and after the processing of the substrate 100, as shown in FIG. 4A, the ring-shaped magnet 9 is located below and below the rotating member 2. At this time, the line of magnetic force B formed by the ring-shaped magnet 9 is directed from the outside of the rotating member 2 toward the center at the height where the permanent magnets 12 are arranged. Therefore, the N pole of the permanent magnet 12 is
It is sucked in the direction toward the center. As a result, FIG.
As shown in (b), the rotary holding pin 5 rotates in the direction of the arrow X, and the outer peripheral surface of the holder 7 moves away from the outer peripheral end surface of the substrate 100.

When processing the substrate 100, FIG.
As shown in the figure, the ring-shaped magnet 9 rises and approaches the rotating member 2. Therefore, the S pole of the permanent magnet 12 is attracted to the N pole of the ring-shaped magnet 9. Thereby, as shown in FIG. 5B, the rotary holding pin 5 rotates in the direction of the arrow Y, and the outer peripheral surface of the holding portion 7 comes into contact with the outer peripheral end surface of the substrate 100. In this case, since the holding portion 7 has an inverted truncated cone shape,
As shown in FIG. 5 (c), together with the force f ₁ which holds the substrate 100 in the horizontal direction acts, the substrate 100 force f ₂ acts to suppress downward, their resultant force f ₃ is applied to the substrate 100 .

As described above, in the present embodiment, the substrate 100 is held in the horizontal direction by the holding portion 7 having the shape of an inverted truncated cone of the rotary holding pin 5 and pressed down, so that the holding against the vertical vibration is achieved. Strength increases. As a result, when the substrate 100 rotates, abnormal noise is generated and the substrate 100
Up and down vibration is prevented.

FIGS. 6A and 6B are a plan view and a front view, respectively, of a rotary holding pin used in a substrate rotation holding device according to a second embodiment of the present invention. FIG. 7 is a perspective view showing the rotary holding pin of FIG. 6 and a magnet holding portion attached to a lower portion thereof.

As shown in FIGS. 6 and 7, the rotary holding pin 15 is composed of a cylindrical support portion 16 and its support portion 1.
It comprises a holding portion 17 having a diameter smaller than 6. As in the first embodiment, the support portion 16 is attached to the rotating member 2 shown in FIGS. 1 and 2 so as to be rotatable around a rotating shaft 6a coaxial with the center axis thereof.

The holding portion 17 has one side surface 17a extending in the vertical direction and the other side surface 17b extending outward and inclined upward. The bottom surface of the holding part 17 is circular and the top surface is elliptical. The holding unit 17
It is provided on the upper surface of the support 16 substantially coaxially with the rotation shaft 6a. The side surface 17b of the holding portion 17 is formed by the rotation of the support portion 16.
Contacts the outer peripheral end surface of the substrate 100.

As shown in FIG. 7, similarly to the first embodiment, a circular magnet is provided below the support portion 16 of the rotary holding pin 15 via the rotary shaft 10 coaxial with the rotary shaft 6a. The holding unit 11 is attached. A rod-shaped permanent magnet 12 is built in the center of the magnet holding unit 11. In this embodiment, the rotary holding pin 15 corresponds to a holding member.

FIGS. 8 and 9 are diagrams for explaining the structure and operation of the substrate rotation holding device using the rotary holding pins of FIGS. 6 and 7, and FIG. FIG. 3B is a partial cross-sectional view of the portion, and FIG.

As shown in FIGS. 8A and 9A, the rotary shaft 10 of the rotary holding pin 15 is
3 rotatably supported by the rotating member 2. The rotating bearing 13 is provided with, for example, a bearing mechanism for suppressing the rotating friction.

Before and after the processing of the substrate 100, as shown in FIG. 8A, the ring-shaped magnet 9 is located below the rotating member 2 and separated therefrom. At this time, the line of magnetic force B formed by the ring-shaped magnet 9 is directed from the outside of the rotating member 2 toward the center at the height where the permanent magnets 12 are arranged. Therefore, the N pole of the permanent magnet 12 is
It is sucked in the direction toward the center. As a result, FIG.
As shown in (b), the rotary holding pin 15 rotates in the direction of arrow X, and the side face 17 of the holding portion 17 extending in the vertical direction.
(A) faces the outer peripheral end surface of the substrate 100. Thereby, the substrate 100 can be lifted upward, and conversely,
The substrate 100 can be placed between the holding portions 17 of the plurality of rotary holding pins 15.

When processing the substrate 100, FIG.
As shown in the figure, the ring-shaped magnet 9 rises and approaches the rotating member 2. Therefore, the S pole of the permanent magnet 12 is attracted to the N pole of the ring-shaped magnet 12. Thereby, FIG. 9 (b)
As shown in FIG. 7, the rotary holding pin 15 rotates in the direction of arrow Y, and the side surface 17 b that slopes outward toward the upper side of the holding portion 17 contacts the outer peripheral end surface of the substrate 100. as a result,
A force for holding the substrate 100 in the horizontal direction acts and a force for pressing the substrate 100 downward acts.

As described above, the substrate 100 is held in the horizontal direction by the inclined side surface 17b of the holding portion 17 of the plurality of rotary holding pins 15, and is pressed downward.
High holding force against vertical vibration can be obtained. As a result, generation of abnormal noise and vertical vibration of the substrate 100 during rotation of the substrate 100 are prevented.

In the above embodiment, all of the rotary holding pins 5 and 15 mounted on the rotating member 2 have the holding portion 7 shown in FIGS. 1 to 5 or the holding portion 17 shown in FIGS. 6 to 9. Although the case has been described, any of the rotary holding pins attached to the rotating member 2 may have the holding portion 7 of FIGS. 1 to 5 or the holding portion 17 of FIGS. 6 to 9.

The substrate rotation holding apparatus 1 of the first and second embodiments is not limited to a rotary developing apparatus for developing a substrate, but also a rotary coating apparatus for applying a coating liquid such as a resist liquid to the substrate. The present invention can be applied to various types of rotary substrate processing apparatuses, such as an apparatus and a rotary substrate cleaning apparatus for cleaning the surface of a substrate.

The substrate rotation holding apparatus of the present invention is not limited to a semiconductor wafer, and is applicable to a substrate processing apparatus for processing various substrates such as a glass substrate for a liquid crystal display, a glass substrate for a photomask, and a glass substrate for an optical disk. can do.

[Brief description of the drawings]

FIG. 1 is a schematic sectional view of a rotary substrate processing apparatus using a substrate rotation holding device according to a first embodiment of the present invention.

FIG. 2 is a schematic plan view of the substrate rotation holding device of FIG.

FIG. 3 is a perspective view of a rotary holding pin and a magnet holding portion used in the substrate rotation holding device of FIG. 1;

FIGS. 4A and 4B are a partial sectional view and a plan view showing a state in which a holding portion of a rotary holding pin in the first embodiment is separated from an outer peripheral end surface of a substrate.

FIG. 5 is a partial cross-sectional view and a plan view showing a state in which a holding portion of the rotary holding pin in the first embodiment is in contact with an outer peripheral end surface of the substrate, and a diagram showing a force acting on the substrate by the rotary holding pin. is there.

FIG. 6 is a plan view and a front view of a rotary holding pin used in a substrate rotation holding device according to a second embodiment of the present invention.

FIG. 7 is a perspective view of a rotary holding pin and a magnet holding section in a second embodiment.

FIGS. 8A and 8B are a partial sectional view and a plan view showing a state in which a holding portion of a rotary holding pin according to a second embodiment is separated from an outer peripheral end surface of a substrate.

FIGS. 9A and 9B are a partial sectional view and a plan view showing a state where a holding portion of a rotary holding pin according to a second embodiment is in contact with an outer peripheral end surface of a substrate.

FIG. 10 is a plan view, a front view, and a perspective view of a rotary holding pin used in a conventional substrate rotation holding device.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 Substrate rotation holding apparatus 2 Rotating member 5, 15 Rotary holding pin 6, 16 Supporting part 7, 17 Holding part 17a, 17b Side A Rotating axis 6a Rotating axis

Claims (6)

[Claims] 1. A substrate rotation holding device for rotating a substrate while horizontally holding the substrate, wherein the rotation member is driven to rotate in a horizontal posture, and the rotation member is arranged along an outer peripheral portion of the substrate placed on the rotation member. And a plurality of holding members movable between a substrate holding position in contact with an outer peripheral end surface of the substrate and a substrate open position separated from the outer peripheral end surface of the substrate, wherein each of the plurality of holding members is And a tapered holding portion whose diameter gradually increases upward. 2. A substrate rotation holding device for rotating a substrate while holding it horizontally, comprising: a rotation member driven to rotate in a horizontal posture; and a rotation member attached to the rotation member so as to be rotatable around a vertical axis. A plurality of holding members that come into contact with the outer peripheral end surface of the substrate with the rotation, and each of the plurality of holding members has a tapered inverted truncated cone-shaped holding portion whose diameter gradually increases upward. A substrate rotation holding device comprising: 3. Each of the plurality of holding members further includes a supporting portion attached to the rotating member so as to be rotatable around a vertical axis, and each of the holding portions is configured to rotate the supporting portion. 3. The substrate rotation holding device according to claim 2, wherein the substrate rotation holding device is provided eccentrically with respect to a rotation axis of the support portion so as to contact an outer peripheral end surface of the substrate. 4. A substrate rotation holding device for rotating a substrate while holding it horizontally, comprising: a rotation member for driving to rotate in a horizontal posture; and a rotation member attached to the rotation member so as to be rotatable around a vertical axis. A plurality of holding members abutting on an outer peripheral end surface of the substrate with the rotation, wherein each of the plurality of holding members has one side surface extending in the vertical direction and the other side extending obliquely outward and upward. A substrate rotation holding device, comprising: a holding portion having a side surface. 5. Each of the plurality of holding members further includes a supporting portion attached to the rotating member so as to be rotatable around a vertical axis, and each of the holding portions is configured to rotate the supporting portion. 5. The substrate rotation holding device according to claim 4, wherein the supporting portion is provided so that the other side surface extending obliquely outward toward the upper side abuts on the outer peripheral end surface of the substrate. 6. The substrate rotation holding device according to claim 1, a driving unit for driving the rotation member of the substrate rotation holding device to rotate, and a substrate held by the substrate rotation holding device. A rotating substrate processing apparatus, comprising: processing means for performing a predetermined process.