JP2002329773A - Spin processing equipment - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a spin processing equipment in which a substrate is surly clamped by an eccentrically rotating clamp pin. SOLUTION: The equipment comprises a rotationally driven rotary member 11, a plurality of rotary shafts 20 rotatably provided at the periphery of the rotary member with a fixed interval in the circumferential direction and each axial line of the rotary shafts inwardly tilts in the radial direction against the upper surface side of the rotary member, a control motor 4 that rotates the rotary member in a fixed direction, a clamp pin 21 whose axial line is almost parallel to the axial line of the rotary member is provided at the eccentric position of the rotary shaft of the top end of the rotary shaft member and clamps the substrate by eccentric rotation, a catch face 22a which supports the peripheral portion of the substrate, and a supporting member 22 integrated with the clamp pin by rectangularly crossing the catch face to the axial line of the rotary shaft member.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a spin processing apparatus for performing a cleaning process while rotating a substrate, followed by a drying process.

[0002]

2. Description of the Related Art For example, in a manufacturing process of a semiconductor device, there are a film forming process and a photo process for forming a circuit pattern on a disk-shaped semiconductor wafer as a substrate. In these processes, after processing such as development and etching is performed on the substrate, cleaning and drying are repeatedly performed.

[0003] A spin processing apparatus is used to perform processing such as washing and drying of the substrate. This spin processing device has a cup body. A rotating body driven by a rotating motor is provided in the cup body. A plurality of rotating shafts are provided in the peripheral portion of the rotating body at predetermined intervals in the circumferential direction so as to be rotatable with their axes perpendicular to the rotating surface of the rotating body.

A clamp pin protrudes eccentrically from the upper end surface of the rotary shaft, and a support member having a tapered receiving surface inclined with respect to the rotary surface of the rotary body is integrally formed on the clamp pin. Is provided.

[0005] The plurality of rotating shafts are driven to rotate in the same direction by driving means. Therefore, after the lower surface of the peripheral portion of the substrate is engaged with the receiving surface, the rotation shaft is rotated in a predetermined direction to rotate the clamp pin eccentrically. Because of the contact, the substrate can be integrally clamped to the rotating body.

After performing a predetermined process on the substrate clamped to the rotating body, the substrate can be released from the clamped state by rotating the rotary shaft in a direction opposite to the predetermined direction. The removed substrate can be taken out of the rotating body.

[0007]

By the way, when a plurality of rotating shafts are rotated in a predetermined direction to clamp the substrate on the rotating body, the substrate is relatively moved while its peripheral edge slides on the receiving surface of the plurality of holding parts. And the outer peripheral surface is engaged with the crankpin.

However, when the peripheral edge of the substrate rises above the receiving surface, if there is a difference in the frictional resistance between each receiving surface and the substrate, the time required for the peripheral edge of the substrate to move (upward) each receiving surface. Will be different.

For example, when the substrate is supported by four to six receiving surfaces, if the amount of movement of the substrate at one end in the radial direction is larger than the amount of movement at the other end in the radial direction, the amount of movement is large. One end in the radial direction of the substrate rises from the receiving surface.

When the amount of floating at one end of the substrate becomes large and exceeds the upper end of the clamp pin, the other end of the substrate in the radial direction may not be clamped by the clamp pin.

In particular, when the dimensions of the crankpin, which protrudes upward with respect to the upper surface of the substrate when the substrate is clamped, become large, the cleaning liquid collides with the protruding portion and rebounds, or the airflow is disturbed. Effect. Therefore, since the length of the crank pin is made as short as possible, if one end in the radial direction of the substrate rises during clamping, the rising end of the substrate may easily come off the crank pin.

An object of the present invention is to provide a spin processing apparatus capable of securely clamping a substrate without coming off the crankpin.

[0013]

According to a first aspect of the present invention, there is provided a spin processing apparatus for processing a substrate by rotating a disk-shaped substrate. A plurality of rotating shafts provided rotatably at intervals and having their axes inclined inward in the radial direction with respect to the upper surface side of the rotating body; a driving means for rotating the rotating shaft in a predetermined direction; An axis line is provided at an eccentric position at the upper end of the rotating shaft body so as to be substantially parallel to the axis line of the rotating shaft body, and a clamp pin that clamps the substrate by eccentric rotation and a receiving surface that supports a peripheral portion of the substrate are provided. And a support portion provided integrally with the clamp pin such that the receiving surface is substantially perpendicular to the axis of the rotary shaft.

According to a second aspect of the present invention, the extension line of the axis of the plurality of rotating shafts intersects at one point above a center point of the substrate supported on the receiving surface. In the processing unit.

According to a third aspect of the present invention, the upper surface of the rotating body is covered with a cover, and the cover has an opening through which the upper end surface of the rotating shaft is exposed, and is exposed through the opening. 2. The spin processing apparatus according to claim 1, wherein an upper end surface of the rotating shaft body is formed as an inclined surface which is flush with a plate surface of the cover when the clamp pin clamps the substrate. It is in.

According to the present invention, since the rotary shaft is provided with the axis inclined with the crankpin, the portion of the crankpin located above the support portion for supporting the substrate is relatively inclined during clamping. It moves obliquely downward from above to clamp the substrate. Therefore, even if one end in the radial direction of the substrate floats from the receiving surface, the peripheral edge of that portion can be reliably clamped.

[0017]

An embodiment of the present invention will be described below with reference to the drawings.

FIG. 1 shows a spin processing apparatus according to a first embodiment of the present invention. The spin processing apparatus has a cup body 1 shown by a chain line in FIG. A through hole 2 is drilled at the center of the bottom of the cup body 1 in the radial direction, and a plurality of discharge pipes 1a are connected to the peripheral part at predetermined intervals in the circumferential direction.

The through-hole 2 is provided with a cylindrical power transmission body 3. This power transmission body 3 is rotationally driven by a control motor 4 as a drive source. The control motor 4 includes a cylindrical stator 5 and a cylindrical rotor 6 rotatably inserted into the stator 5.

The power transmission body 3 has a lower end joined to an upper end surface of the rotor 6 and is fixed by screws 7. Therefore, the power transmission body 3 rotates integrally with the rotor 6.

A rotating body 11 is attached to an upper end of the power transmitting body 3 protruding into the cup body 1. The rotating body 11 is formed by joining a disc-shaped lower plate 12 and an upper plate 13, and a central portion between the lower plate 12 and the upper plate 13 is provided with a through-hole communicating with the internal space of the power transmission body 3. A hole 14 is formed.

On the upper surface of the peripheral portion of the upper plate 13 of the rotary body 11, six support cylinders 15 are integrally provided at predetermined intervals in the circumferential direction, for example, at intervals of 60 degrees. A through hole 16 is formed in a portion of the lower plate 12 corresponding to the support cylinder portion 15. The support cylinder portion 15 and the through hole 16 are formed at a predetermined angle θ with respect to the upper surface of the rotating surface of the rotating body 11.
Are inclined inward in the radial direction.

Bushes 17a and 17b are fitted into the support cylinder 15 and the through hole 16, respectively.
The rotating shaft 18 is rotatably supported by the a and 17b. That is, the rotating shaft body 18 is similar to the above-described support tubular portion 15.
It is inclined at an angle θ with respect to the rotation plane of the rotating body 11. The rotating shaft body 18 has a shaft portion 19 supported by the bushes 17a and 17b, and a head portion 20 formed at the upper end of the shaft portion 19 and having a larger diameter than the shaft portion 19.

The upper end surface of the head 20 has a rotating shaft 18
A crank pin 21 is provided at a position eccentric from the center of rotation of the rotary shaft 18 with its axis parallel to the axis of the rotary shaft body 18.

A support portion 22 having a receiving surface 22a is formed at a middle portion of the crank pin 21 so as to integrally protrude toward the side. The receiving surface 22a is shown in FIG.
As shown in (b), it is perpendicular to the axis O of the rotating shaft body 18 and is inclined at the same angle θ as the inclination angle of the rotating shaft body 18 with respect to the horizontal plane.

A disk-shaped substrate W such as a semiconductor wafer is placed on a receiving surface 22a of a support portion 22 provided on each rotary shaft 18.
Is provided so that the lower surface of the peripheral portion is engaged and mounted on the receiving surface 22a. In this state, when each rotating shaft 18 is rotated clockwise as indicated by an arrow in FIG.
Since 1 rotates eccentrically, the peripheral portion of the substrate W rises along the receiving surface 22 a of the support portion 22, and a portion 21 a of the crank pin 21 protruding above the support portion 22 abuts on the outer peripheral surface thereof. As a result, the substrate W has six rotating shafts 18.
And is integrally clamped to the rotating body 11 by the clamp pin 21.

In this embodiment, the portion 21a of the clamp pin 21 projecting above the support portion 22 is cylindrical, but the projecting portion 21a may have an inverted tapered shape.

As shown by the arrow in FIG. 3B, when the rotary shaft 18 is rotated in the counterclockwise direction, which is the opposite direction, the crank pin 21 separates from the outer peripheral surface of the substrate W, and The peripheral portion of the substrate W is the receiving surface 22 of the support portion 22.
It descends relatively along a. Thereby, the clamped state of the substrate W by the six rotating shafts 18 is released.

As shown in FIG. 5, six rotating shafts 18 are provided.
An extension line L of the axis O (only four shown) intersects at a point D above the rotation center point C of the substrate W held by the rotating body 11. The receiving surfaces 22a of the six support portions 22 circumscribe a spherical surface B having a radius R. Therefore, the peripheral portion of the substrate W is held in a state of being inscribed in the six receiving surfaces 22a, that is, the spherical surface B.

The lower end of the shaft portion 19 of the rotary shaft body 18 protrudes toward the lower surface of the rotary body 11, and the protruding end portion thereof has a child gear 25.
Is fitted. The child gear 25 fitted to the shaft portion 19 of each rotary shaft body 18 meshes with the parent gear 26. The master gear 26 is rotatably held by the power transmission body 3 via a bearing 27.

The master gear 26 is urged in a predetermined rotation direction, for example, counterclockwise by a spring 28 provided on the outer peripheral surface of the power transmission body 3. As a result, the child gear 25 rotates counterclockwise, and the rotation thereof
The substrate W is integrally clamped to the rotating body 11 by each of the clamp pins 21 by the eccentric rotation of the clamp pins 21 in conjunction with.

To release the holding state of the substrate W, the parent gear 26 is rotated clockwise against the urging force of the spring 28 by a release mechanism (not shown). Specifically, the release mechanism prevents the parent gear 26 from rotating, and in this state, the rotating body 11 is rotated clockwise by the control motor 4. Accordingly, the rotating shaft 18 rotates counterclockwise, so that the state of holding the substrate W by the clamp pins 21 is released.

A holding cylinder 31 is inserted into the power transmission body 3. A nozzle head 32 is attached to the upper end of the holding cylinder 31. In this nozzle head 32,
A first nozzle body 33 that sprays a cleaning liquid toward the center of the lower surface of the substrate W held by the rotating body 11 and a second nozzle body 34 that similarly sprays a gas such as nitrogen gas are provided.

The upper surface and the outer peripheral surface of the rotating body 11 are covered with a turbulence prevention cover 35. The turbulence prevention cover 35 has an opposing wall 36 facing the lower surface of the substrate W held by the rotating body 11, and a peripheral wall 37 provided substantially perpendicular to the peripheral edge of the opposing wall 36.

The cleaning liquid and the gas sprayed from the first and second nozzle bodies 33 and 34 are applied to the opposite wall 36 on the substrate W.
A through hole 38 is formed to reach the lower surface of the hole.

The heads 20 of the six rotating shafts 18 erected on the upper surface of the rotating body 11 are exposed through through holes 41 formed in the facing wall 36 of the turbulence prevention cover 35. I have. The upper end surface 20a of the head 20 is, as shown in FIG.
Are clamped to form an inclined surface which is flush with the upper surface of the opposing wall portion 36 of the turbulence prevention cover 35.

A third nozzle body for injecting the cleaning liquid onto the substrate W and a clean unit (both not shown) for supplying a dry gas are disposed above the rotating body 11 similarly to the lower surface side. .

The substrate W is held on a rotating body 11, and this rotating body 11 is rotated by several tens to several hundreds of rpm. p. The cleaning liquid is supplied to the upper and lower surfaces of the substrate W while rotating at a low speed of m. When the cleaning liquid has been supplied for a predetermined time, the supply is stopped, and then the rotating body 11 is moved to 1000 rpm. p. The substrate W is rotated at a high speed of not less than m and a gas is jetted to the central portion of the lower surface of the substrate W.

As a result, the cleaning liquid adhering to the upper and lower surfaces of the substrate W is removed by the centrifugal force and air current generated when the substrate W is rotated at a high speed by the rotating body 11.
Flows outward in the radial direction, and scatters from its outer peripheral edge.

The cleaning liquid adhering to the central portions of the upper and lower surfaces of the substrate W is hardly removed because no centrifugal force acts on the cleaning liquid. It is swept radially outward.

Since the cleaning liquid flushed from the center of the substrate W is subjected to a centrifugal force, the cleaning liquid is scattered from the peripheral edge of the substrate W by the centrifugal force. The mixed fluid of the cleaning liquid and the gas scattered from the periphery of the substrate W collides with the inner peripheral surface of the cup body 1, and is sucked and discharged to the discharge pipe 1a connected to the bottom.

When processing an unprocessed substrate W in the spin processing apparatus having the above-described configuration, the substrate W is supplied to the rotating body 11 by a robot (not shown). As shown in FIG. 4A, the substrate W supplied to the rotating body 11 is supported on the receiving surface 22a of the supporting portion 22 at the lower surface of the peripheral portion.

Next, in order to hold the substrate W integrally with the rotating body 11, when the rotating shaft 18 is rotated clockwise as indicated by an arrow in FIG. 3A, the rotating shaft 18 is eccentrically provided on the rotating shaft 18. The clamp pin 21 eccentrically rotates.

When the clamp pin 21 rotates eccentrically,
As shown in FIG. 4B, the lower surface of the peripheral portion of the substrate W supported on the receiving surface 22a of the supporting portion 22 slides on the receiving surface 22a and relatively rises up the receiving surface 22a, so that the outer peripheral surface is formed. Is a portion 21 protruding from the receiving surface 22a of the clamp pin 21.
a. Thereby, the substrate W is integrally clamped to the rotating body 11 by the six crank pins 21.

Crank pin 21 and this clamp pin 2
The rotating shaft body 18 provided with 1 is provided so that its axis is inclined at an angle θ with respect to the rotating surface of the rotating body 11. Therefore, the portion 21 a of the crank pin 21 projecting upward from the receiving surface 22 a is rotated by the rotation of the rotating shaft 18 to make the portion shown in FIG.
(A), as indicated by an arrow, the substrate W relatively moves from obliquely upward to obliquely downward to engage the peripheral edge of the substrate W.

When the protruding portion 21a of the crank pin 21 moves from obliquely upward to obliquely downward, for example, a difference occurs in the frictional resistance between the substrate W and each of the receiving surfaces 22a. Even if the protruding portion 21a rises from the edge 22a, the protruding portion 21a engages with the edge so as to approach the edge from above.

Therefore, even if a portion of the substrate W rises from the receiving surface 22a, the projecting portion 21a
Is securely engaged with the peripheral edge of the substrate W and clamps the substrate W.

Receiving surface 2 of each support portion 22 supporting the substrate W
2a is circumscribed on the spherical surface B having a radius R, the periphery of the substrate W supported by these receiving surfaces 22a is inscribed on the spherical surface B, and the receiving surface 22a is circumscribed on the spherical surface B. While rotating.

If the substrate W is inscribed in the spherical surface B, even if the substrate W supported by the plurality of receiving surfaces 22a is inclined with respect to the horizontal plane H as shown in FIG. It moves inscribed in the arc of B.

The projecting portion 21a of the clamp pin 21 projects radially inward from the arc of the spherical surface B. Therefore, when the substrate W moves on the arc of the spherical surface B at the time of clamping, the peripheral portion of the substrate W is securely clamped by the protruding portion 21.

That is, even if the substrate W supplied to the rotating body 11 is supported in an inclined state by the receiving surface 22a,
Each of the receiving surfaces 22a circumscribes the spherical surface B and rotates in a state of being circumscribed.
The substrate W supported by 2a can be reliably clamped.

In this way, the length of the protruding portion 21a of the crank pin 21 can be minimized, so that the clamp pin 21 is placed on the upper surface of the substrate W in the clamped state.
Can be set so that it hardly projects. Thus, it is possible to prevent the cleaning liquid attached to the substrate W during the drying process of the substrate W from bouncing off on the crankpin 21 or generating a turbulent air flow.

By forming the upper end surface 20a of the rotary shaft body 18 on an inclined surface, the substrate W can be clamped in a clamped state.
As shown in FIG. 1, the upper end surface 20 a of the rotating shaft 18 was made flush with the upper surface of the facing wall 36 of the cover 35.

Therefore, when the cleaning liquid is dropped from the lower surface of the substrate W onto the upper surface of the opposite wall portion 36 of the cover 35 when the substrate W is clamped and dried, the cleaning liquid scattered from the upper surface is not covered by the rotating shaft 18. Therefore, it is possible to prevent the light from being reflected by the rotating shaft body 20 and re-adhering to the back surface of the substrate W.

The present invention is not limited to the above-described embodiment. For example, the number of rotating shafts provided on the rotating body may be four instead of six. Any number that can be supported can be used.

[0056]

As described above, according to the present invention, the rotating shaft provided with the crankpin is provided with the axis inclined with respect to the rotating surface of the rotating body.

For this reason, at the time of clamping, the portion of the crankpin located above the supporting portion for supporting the substrate moves relatively obliquely downward from obliquely upward to clamp the substrate. Even if the portion floats from the receiving surface of the support portion that supports the peripheral edge of the substrate, the peripheral edge of that portion can be reliably clamped.

[Brief description of the drawings]

FIG. 1 is a cross-sectional view of a spin processing apparatus according to an embodiment of the present invention with a substrate clamped.

FIG. 2 is a cross-sectional view of the spin processing apparatus in a state where a clamp of a substrate is released.

3A is a diagram illustrating a state in which a clamp of a substrate is released, and FIG. 3B is a diagram illustrating a state in which the substrate is clamped.

FIG. 4A is a view showing a state before clamping a substrate having a peripheral portion mounted on a receiving surface, and FIG. 4B is a view showing a state in which the substrate is also clamped.

FIG. 5 is a diagram for explaining a state in which a receiving surface of each support circumscribes a spherical surface.

[Explanation of symbols]

 4 ... Control motor (drive means) 11 ... Rotating member 18 ... Rotating shaft member 21 ... Clamp pin 22 ... Support part 22a ... Receiving part W ... Substrate

 ──────────────────────────────────────────────────続 き Continued on front page F term (reference) 3L113 AA04 AB08 AC45 AC46 AC53 AC63 BA34 CB34 DA07 5F031 CA02 HA08 HA09 HA24 HA29 HA59 MA23 MA26 PA14

Claims (3)

[Claims] 1. A spin processing apparatus for processing a disk-shaped substrate by rotating the same, comprising: a rotating body that is driven to rotate; A plurality of rotating shafts provided to be inclined inward in the radial direction with respect to the upper surface side; a driving means for rotating the rotating shaft in a predetermined direction; and A clamp pin that is provided substantially parallel to the axis of the rotating shaft and clamps the substrate by eccentric rotation; and a receiving surface that supports a peripheral portion of the substrate. And a support part provided integrally with the clamp pin so as to be substantially perpendicular to the axis of the spin processing apparatus. 2. The spin processing apparatus according to claim 1, wherein the extension lines of the axes of the plurality of rotating shafts intersect at one point above a center point of the substrate supported on the receiving surface. 3. An upper surface of the rotating body is covered with a cover, and an opening is formed in the cover so that an upper end surface of the rotating shaft is exposed, and the rotating shaft is exposed from the opening. 2. The spin processing apparatus according to claim 1, wherein an upper end surface is formed on an inclined surface that is flush with a plate surface of the cover when the crank pin clamps the substrate.