JPH09173945A - Rotary type substrate treating device - Google Patents

Rotary type substrate treating device

Info

Publication number
JPH09173945A
JPH09173945A JP33701995A JP33701995A JPH09173945A JP H09173945 A JPH09173945 A JP H09173945A JP 33701995 A JP33701995 A JP 33701995A JP 33701995 A JP33701995 A JP 33701995A JP H09173945 A JPH09173945 A JP H09173945A
Authority
JP
Japan
Prior art keywords
substrate
holding
pin
plate
pins
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP33701995A
Other languages
Japanese (ja)
Other versions
JP3343012B2 (en
Inventor
Manabu Yabe
学 矢部
Original Assignee
Dainippon Screen Mfg Co Ltd
大日本スクリーン製造株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dainippon Screen Mfg Co Ltd, 大日本スクリーン製造株式会社 filed Critical Dainippon Screen Mfg Co Ltd
Priority to JP33701995A priority Critical patent/JP3343012B2/en
Publication of JPH09173945A publication Critical patent/JPH09173945A/en
Application granted granted Critical
Publication of JP3343012B2 publication Critical patent/JP3343012B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Abstract

PROBLEM TO BE SOLVED: To provide a rotary type substrate treating device which is capable of carrying in and out a substrate by means of a transporting arm without the occurrence of an unequal treatment by the generation of whistling. SOLUTION: A substrate holding table 1 is composed of a circular bottom plate 3 and an annular substrate supporting frame 4. Plural transferring and receiving pins 6a respectively have supporting pins 7 and pin holding parts 8. The supporting pins 7 are elastically supported by means of elastic members 8a freely movably into and out of the pin holding parts 8. These actions are gently executed by a damper 8b. The bottom plate 3 is formed with a through hole 5. This throughhole 5 is formed to an oblong hole to allow the simultaneous passing of two pieces of the adjacent transferring and receiving pins 6a. As a result, at least three pieces of the transferring and receiving pins 6a may be passed through the throughhole 5 even if the substrate holding table 1 stops at an arbitrary rotating position.

Description

【発明の詳細な説明】Detailed Description of the Invention
【0001】[0001]
【発明の属する技術分野】本発明は、回転式塗布装置や
回転式洗浄装置等、基板を水平に保持して回転させなが
ら基板上に所定の処理を行うための回転式基板処理装置
に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a rotary substrate processing apparatus such as a rotary coating apparatus and a rotary cleaning apparatus for holding a substrate horizontally and rotating it to perform a predetermined process on the substrate.
【0002】[0002]
【従来の技術】回転式塗布装置、回転式現像装置等の回
転式基板処理装置においては、半導体ウエハ等の基板を
水平に保持して回転させる必要がある。基板を保持する
装置として、従来より基板の裏面を真空吸着して保持す
る吸引式スピンチャックが用いられている。
2. Description of the Related Art In a rotary substrate processing apparatus such as a rotary coating apparatus and a rotary developing apparatus, it is necessary to hold a substrate such as a semiconductor wafer horizontally and rotate it. 2. Description of the Related Art As a device for holding a substrate, a suction type spin chuck that vacuum-holds and holds the back surface of the substrate has been conventionally used.
【0003】ところが、吸引式スピンチャックでは、基
板を強固に保持するために強力な吸引を行っており、こ
のために基板の裏面に吸着跡が生じて、後工程の処理に
悪影響を及ぼす場合がある。また、基板の裏面を全面に
渡って洗浄できないといった問題もある。
However, in the suction type spin chuck, strong suction is carried out in order to firmly hold the substrate, which may cause an adsorption mark on the back surface of the substrate, which may adversely affect the processing in the subsequent steps. is there. There is also a problem that the back surface of the substrate cannot be entirely cleaned.
【0004】そこで、基板の周縁部分を保持して基板を
回転させる外周端縁保持型の基板回転保持装置(機械式
スピンチャック)が提案されている。図5は、従来の外
周端縁保持型の基板回転保持装置の一例を示す断面構造
図である。基板回転保持装置は、基板10を保持するた
めの基板保持台13を備える。基板保持台13は、円板
状の底板12と、底板12の周縁部に固定された複数の
基板支持部材11とから構成されている。基板支持部材
11は、基板10の周縁部の裏面を支持する水平面と、
基板10の水平方向の位置を規制する垂直面とからなる
鉤型形状に形成されている。この基板支持部材11は基
板10の外周に沿って複数個配置されている。基板10
は、これらの基板支持部材11に外周端縁が保持された
状態で回転される。
Therefore, an outer peripheral edge holding type substrate rotation holding device (mechanical spin chuck) for holding the peripheral portion of the substrate and rotating the substrate has been proposed. FIG. 5 is a cross-sectional structural view showing an example of a conventional peripheral edge holding type substrate rotation holding device. The substrate rotation holding device includes a substrate holding table 13 for holding the substrate 10. The substrate holding table 13 includes a disc-shaped bottom plate 12 and a plurality of substrate support members 11 fixed to the peripheral edge of the bottom plate 12. The substrate support member 11 includes a horizontal surface that supports the back surface of the peripheral edge of the substrate 10,
It is formed in a hook shape including a vertical surface that regulates the horizontal position of the substrate 10. A plurality of substrate supporting members 11 are arranged along the outer periphery of the substrate 10. Substrate 10
Are rotated with their outer peripheral edges held by these substrate supporting members 11.
【0005】図6は、基板回転保持装置から基板を搬出
する動作を説明するための平面図である。基板10の搬
出時には、搬送アーム15が基板10と底板12との隙
間に挿入される。このため、基板支持部材11は、搬送
アーム15の挿入を妨げない位置に配置されている。
FIG. 6 is a plan view for explaining the operation of unloading the substrate from the substrate rotation holding device. When the substrate 10 is unloaded, the transfer arm 15 is inserted into the gap between the substrate 10 and the bottom plate 12. Therefore, the substrate support member 11 is arranged at a position where it does not hinder the insertion of the transfer arm 15.
【0006】基板10と底板12との間に挿入された搬
送アーム15は、上昇して基板10の裏面を支持し、さ
らに後退移動して基板回転保持装置から基板10を搬出
する。
The transfer arm 15 inserted between the substrate 10 and the bottom plate 12 rises to support the back surface of the substrate 10, and further moves backward to carry the substrate 10 out of the substrate rotation holding device.
【0007】[0007]
【発明が解決しようとする課題】上記の基板回転保持装
置では、搬送アーム15の出し入れを可能とするため
に、基板支持部材11が基板10の周囲に分散して配置
されている。このために、基板保持台13を回転させる
と、各々の基板支持部材11が風切り現象を生じさせ、
基板10の周縁部近傍の気流に複雑な乱れを生じさせ
る。
In the above-described substrate rotation holding device, the substrate supporting members 11 are dispersedly arranged around the substrate 10 so that the transfer arm 15 can be taken in and out. For this reason, when the substrate holder 13 is rotated, each substrate supporting member 11 causes a wind breaking phenomenon,
A complicated turbulence is generated in the air flow near the peripheral portion of the substrate 10.
【0008】このために、例えば回転式塗布装置におい
ては、この気流の乱れによって基板10の周縁部分で塗
布液の塗布むらが生じるといった問題が生じる。また、
他の回転式基板処理装置においても、同様に基板支持部
材11による気流の乱れによって処理むらが発生すると
いう問題がある。
For this reason, for example, in a rotary coating apparatus, there arises a problem that the turbulence of the air flow causes uneven coating of the coating liquid on the peripheral portion of the substrate 10. Also,
Also in other rotary substrate processing apparatuses, there is a problem in that processing irregularities similarly occur due to the turbulence of the air flow due to the substrate supporting member 11.
【0009】本発明の目的は、回転時の風切りによる処
理むらが生じることなく、かつ搬送アームによる基板の
搬入搬出動作が可能な回転式基板処理装置を提供するこ
とである。
An object of the present invention is to provide a rotary substrate processing apparatus capable of carrying in and out a substrate by a transfer arm without causing unevenness in processing due to wind cutting during rotation.
【0010】[0010]
【課題を解決するための手段および発明の効果】第1の
発明に係る回転式基板処理装置は、基板を水平に保持し
て回転させつつ基板上に所定の処理を行う回転式基板処
理装置であって、基板を水平に保持して回転する基板保
持部材と、基板保持部材に保持された基板を上方に押し
上げるための3本以上の基板押し上げ部材とを備えてお
り、基板保持部材は、任意の停止位置で少なくとも3本
の基板押し上げ部材が通過可能な貫通部を有する底板
と、底板上に設けられかつ基板の周縁部分を支持する環
状枠部材とから構成されているものである。
A rotary substrate processing apparatus according to the first invention is a rotary substrate processing apparatus for holding a substrate horizontally and rotating it to perform a predetermined process on the substrate. The substrate holding member includes a substrate holding member that holds the substrate horizontally and rotates, and three or more substrate pushing members that push up the substrate held by the substrate holding member upward. Of the bottom plate having a penetrating portion through which at least three substrate pushing-up members can pass, and an annular frame member provided on the bottom plate and supporting a peripheral portion of the substrate.
【0011】第2の発明に係る回転式基板処理装置は、
第1の発明に係る回転式基板処理装置の構成において、
基板押し上げ部材が、底板の回転軸を中心とする円周上
に等間隔で少なくとも6本配置されており、貫通部が底
板の回転軸を中心とする円周上に等間隔で配置された少
なくとも3個の貫通孔からなり、貫通孔の各々が、隣接
する少なくとも2本の基板押し上げ部材が同時に通過し
うる大きさに形成されたことを特徴としている。
A rotary substrate processing apparatus according to the second invention is
In the configuration of the rotary substrate processing apparatus according to the first invention,
At least six substrate pushing-up members are arranged at equal intervals on a circumference centered on the rotation axis of the bottom plate, and at least penetrating parts are arranged at equal intervals on a circumference centered on the rotation axis of the bottom plate. It is characterized in that it is composed of three through-holes, and each of the through-holes is formed in such a size that at least two adjacent substrate pushing-up members can pass through at the same time.
【0012】第3の発明に係る回転式基板処理装置は、
第1または第2の発明に係る回転式基板処理装置の構成
において、基板押し上げ部材が、昇降自在に設けられた
ピン保持部と、ピン保持部の先端に取り付けられかつ基
板の裏面に当接して基板を押し上げる支持ピンと、ピン
保持部と支持ピンとの間に設けられ、ピン保持部に対し
て支持ピンを弾性支持する弾性部材と、ピン保持部と支
持ピンとの間に設けられ、支持ピンの動作を緩慢に行わ
せる動作抑制部材とを備えたことを特徴としている。
The rotary substrate processing apparatus according to the third invention is
In the configuration of the rotary substrate processing apparatus according to the first or second aspect of the invention, the substrate pushing-up member is attached to the tip of the pin holding portion that is provided to be able to move up and down and is in contact with the back surface of the substrate. A support pin that pushes up the substrate, an elastic member that is provided between the pin holding portion and the support pin, and elastically supports the support pin with respect to the pin holding portion, and a pin that is provided between the pin holding portion and the support pin, and operates the support pin. And a motion restraining member for slowly performing
【0013】第1の発明に係る回転式基板処理装置にお
いては、基板は環状枠部材によって保持されている。環
状枠部材は、基板の周縁部分を取り囲む連続体から構成
されている。このため、環状枠部材は、回転時に風切り
をほとんど発生させない。それゆえ、基板の周縁部分の
気流が乱れることが抑制され、塗布むら等の処理むらの
発生を防止することができる。
In the rotary substrate processing apparatus according to the first aspect of the invention, the substrate is held by the annular frame member. The annular frame member is composed of a continuous body that surrounds the peripheral portion of the substrate. For this reason, the annular frame member hardly causes wind cutting when rotating. Therefore, the air flow in the peripheral portion of the substrate is prevented from being disturbed, and it is possible to prevent the occurrence of uneven processing such as uneven coating.
【0014】また、基板保持部材の底板には、貫通部が
形成され、この貫通部を通過して基板押し上げ部材が昇
降しうるように構成されている。したがって、基板を搬
出する際には、基板押し上げ部材が底板の貫通部を通過
して上昇することによって基板を上方に押し上げ、搬送
アームへの引き渡しを可能とする。また、搬送アームか
ら基板を受け取る際には、上記と逆の動作を行うことに
よって基板が基板保持部材に搬入される。
Further, a penetrating portion is formed on the bottom plate of the substrate holding member, and the substrate pushing-up member can be moved up and down through the penetrating portion. Therefore, when the substrate is carried out, the substrate pushing-up member passes through the penetrating portion of the bottom plate and rises to push the substrate upward, so that the substrate can be handed over to the transfer arm. Further, when receiving the substrate from the transfer arm, the substrate is carried into the substrate holding member by performing the operation reverse to the above.
【0015】しかも、底板の貫通部は、基板保持部材が
任意の位置で停止しても、少なくとも3本の基板押し上
げ部材を通過させるように形成されている。このため、
基板保持部材が任意の回転位置で回転を停止しても少な
くとも3本の基板押し上げ部材によって基板が安定して
昇降され、基板の搬入搬出動作が可能となる。
Moreover, the penetrating portion of the bottom plate is formed so that at least three substrate pushing-up members can pass even if the substrate holding member stops at any position. For this reason,
Even if the substrate holding member stops rotating at an arbitrary rotation position, the substrate is stably moved up and down by at least three substrate pushing-up members, and the substrate loading / unloading operation becomes possible.
【0016】したがって、回転終了時の基板保持部材の
停止位置が所定の位置となるように基板保持部材の回転
量を制御するための手段、例えばエンコーダ等の装置を
設けることが不要となり、回転式基板処理装置の構成を
簡素化することができる。
Therefore, it is not necessary to provide means for controlling the amount of rotation of the substrate holding member such that the stopping position of the substrate holding member at the end of rotation is a predetermined position, for example, an apparatus such as an encoder, and the rotary type The configuration of the substrate processing apparatus can be simplified.
【0017】特に、第2の発明に係る回転式基板処理装
置においては、貫通部を構成する貫通孔が、隣接する少
なくとも2本の基板押し上げ部材を同時に通過させる大
きさに形成されている。このため、基板の回転処理時に
基板保持部材が回転方向の任意の位置で停止しても、隣
接する少なくとも2本の基板押し上げ部材のうち、少な
くとも1本は必ず貫通孔を通過しうることになる。しか
も、貫通孔は、少なくとも3個配置されている。したが
って、少なくとも6本の基板押し上げ部材が配置された
場合、少なくとも3本の基板押し上げ部材がこの貫通孔
を通過して基板の搬入搬出動作を行わせることができ
る。
In particular, in the rotary substrate processing apparatus according to the second aspect of the present invention, the through-holes forming the through-holes are formed in a size that allows at least two adjacent substrate pushing-up members to pass through at the same time. Therefore, even when the substrate holding member stops at any position in the rotation direction during the substrate rotation process, at least one of the at least two adjacent substrate pushing-up members can pass through the through hole without fail. . Moreover, at least three through holes are arranged. Therefore, when at least 6 substrate pushing-up members are arranged, at least 3 substrate pushing-up members can pass through the through holes to carry in / out the substrate.
【0018】特に、第3の発明に係る回転式基板処理装
置においては、基板押し上げ部材は、支持ピンが弾性部
材によって支持されている。ある基板押し上げ部材が貫
通孔を通過することができない位置に基板保持部材が停
止した場合、その基板押し上げ部材は、上昇する際に支
持ピンが底板の裏面に衝突して静止する。さらに、その
基板押し上げ部材のピン保持部が上昇させられると、弾
性部材が弾性変形することによってピン保持部の上昇移
動量を吸収する。このような動作によってこの基板押し
上げ部材の支持ピンは基板保持部材の底板に当接した位
置に止まり、他の基板押し上げ部材は貫通孔を通過して
基板を上方に押し上げる。
Particularly, in the rotary substrate processing apparatus according to the third aspect of the present invention, the substrate pushing-up member has the support pin supported by the elastic member. When the substrate holding member stops at a position where a certain substrate pushing-up member cannot pass through the through hole, when the substrate pushing-up member rises, the supporting pins collide with the back surface of the bottom plate and stand still. Further, when the pin holding portion of the substrate pushing-up member is raised, the elastic member elastically deforms to absorb the amount of upward movement of the pin holding portion. By such an operation, the support pins of the substrate pushing-up member stop at the position where they abut the bottom plate of the substrate holding member, and the other substrate pushing-up members pass through the through holes to push the substrate upward.
【0019】また、この時、底板によって上昇が阻止さ
れている支持ピンに接続された弾性部材は、変形によっ
て支持ピンを上方へ付勢する付勢力が蓄積されている。
そして、例えば支持ピンが貫通孔の縁に引っ掛かるよう
にして係止されていたような場合に、その係止が外れる
と、支持ピンは弾性部材に蓄積された付勢力を受けて上
方に勢いよく突出する。支持ピンがそのまま突出して基
板の裏面に衝突すると、基板を損傷するおそれがある。
Further, at this time, the elastic member connected to the support pin, which is prevented from rising by the bottom plate, accumulates the urging force for urging the support pin upward due to the deformation.
Then, for example, when the support pin is locked so as to be caught on the edge of the through hole, when the lock is released, the support pin receives the biasing force accumulated in the elastic member and vigorously moves upward. Project. If the support pins protrude and collide with the back surface of the substrate, the substrate may be damaged.
【0020】このために、動作抑制部材を設け、支持ピ
ンの突出動作を緩やかに行わせるようにしている。これ
により、支持ピンの突出動作によって基板が損傷するの
を防止することができる。
For this reason, a motion suppressing member is provided so that the projecting motion of the support pin can be performed gently. Accordingly, it is possible to prevent the substrate from being damaged by the protruding operation of the support pin.
【0021】[0021]
【発明の実施の形態】図1は、本発明の一実施例による
回転式基板処理装置の断面構造図であり、主に基板回転
保持装置の構造を示している。また、図2は、基板回転
保持装置の底面図である。
1 is a sectional structural view of a rotary substrate processing apparatus according to an embodiment of the present invention, which mainly shows the structure of a substrate rotation holding apparatus. 2 is a bottom view of the substrate rotation holding device.
【0022】図1において、基板回転保持装置は、基板
10を水平に保持して回転する基板保持台1を備えてい
る。基板保持台1は、円形底板3と、円形底板3の上面
の周縁部に固定された基板支持枠4とから構成されてい
る。
In FIG. 1, the substrate rotation holding device is provided with a substrate holding table 1 which holds a substrate 10 horizontally and rotates it. The substrate holder 1 is composed of a circular bottom plate 3 and a substrate support frame 4 fixed to the peripheral edge of the upper surface of the circular bottom plate 3.
【0023】円形底板3の中心には回転軸2が固定され
ている。回転軸2には、基板保持台1を回転させるため
の駆動モータ(図示省略)が接続されている。円形底板
3には、貫通孔5が複数箇所設けられている。
The rotary shaft 2 is fixed to the center of the circular bottom plate 3. A drive motor (not shown) for rotating the substrate holder 1 is connected to the rotary shaft 2. The circular bottom plate 3 has a plurality of through holes 5 formed therein.
【0024】基板支持枠4は、基板10の周囲を取り囲
むように形成された環状の連続部材から構成されてい
る。環状の基板支持枠4は、基板10の周縁部の底面を
支持するための水平部分と、基板10の水平方向の位置
を規制するための垂直部分とを有する断面L字形に形成
されている。基板支持枠4の水平部分の上面には複数の
基板底面支持ピン4aが形成されており、この基板底面
支持ピン4aによって基板10が支持されている。
The substrate support frame 4 is composed of an annular continuous member formed so as to surround the periphery of the substrate 10. The annular substrate support frame 4 is formed in an L-shaped cross section having a horizontal portion for supporting the bottom surface of the peripheral edge of the substrate 10 and a vertical portion for restricting the horizontal position of the substrate 10. A plurality of substrate bottom surface support pins 4a are formed on the upper surface of the horizontal portion of the substrate support frame 4, and the substrate 10 is supported by the substrate bottom surface support pins 4a.
【0025】基板保持台1の下方には、複数の受け渡し
ピン6a〜6fが配置されている。ただし、図1には1
本の受け渡しピン6aのみが示されている。複数の受け
渡しピン6a〜6fは共通の支持体(図示省略)に固定
されており、この支持体は鉛直方向に昇降可能に構成さ
れている。例えば、支持体はエアシリンダ等の駆動源に
よって動作される。基板10の搬入搬出時には、基板1
0を昇降させるために受け渡しピン6aが円形底板3の
貫通孔5を通過して昇降する。
Below the substrate holding table 1, a plurality of transfer pins 6a to 6f are arranged. However, in FIG.
Only the delivery pin 6a of the book is shown. The plurality of transfer pins 6a to 6f are fixed to a common support (not shown), and the support is configured to be vertically movable. For example, the support is operated by a drive source such as an air cylinder. When loading and unloading the substrate 10, the substrate 1
In order to move 0 up and down, the transfer pin 6a passes through the through hole 5 of the circular bottom plate 3 and moves up and down.
【0026】受け渡しピン6aは、基板10の裏面を支
持する支持ピン7と、支持ピン7を保持するピン保持部
8とから構成されている。ピン保持部8には、支持ピン
7を弾性支持するばね等からなる弾性部材8aと、弾性
部材8aの弾性力による支持ピン7の動作を緩慢にさせ
るためのダンパー8bとを備えている。なお、図1は、
この弾性部材8aとダンパー8bとを模式的に示してお
り、その取り付け方法は当該技術分野における適当な方
法を種々適用することができる。また、図2に示される
受け渡しピン6b〜6fも上記の受け渡しピン6aと同
様の構成を有している。
The transfer pin 6a is composed of a support pin 7 for supporting the back surface of the substrate 10 and a pin holding portion 8 for holding the support pin 7. The pin holding portion 8 is provided with an elastic member 8a made of a spring or the like for elastically supporting the support pin 7, and a damper 8b for slowing the operation of the support pin 7 by the elastic force of the elastic member 8a. In addition, in FIG.
The elastic member 8a and the damper 8b are schematically shown, and various suitable methods in the technical field can be applied to the mounting method. The transfer pins 6b to 6f shown in FIG. 2 also have the same configuration as the transfer pin 6a.
【0027】ここで、円形底板3の貫通孔5と受け渡し
ピン6との関係について図2を参照して説明する。図2
において、受け渡しピン6a〜6fは回転軸2を中心と
する円周上に等間隔に6本配置されている。また、貫通
孔5は、6本の受け渡しピン6a〜6fと同一の円周上
に延びる円弧状の長孔から形成されている。貫通孔5は
隣接する2つの受け渡しピン(6a,6d)が同時に通
過し得る大きさ(長さ)に形成されている。例えば、図
2の例では、隣接する受け渡しピン6c,6fの間の角
度は60°であるため、貫通孔5はその両端部を通る半
径方向の直線に挟まれる角度θが80°となるように形
成されている。したがって、貫通孔5と受け渡しピン6
a〜6fが図示の位置関係にある場合では、6本の受け
渡しピン6a〜6fの全てが貫通孔5を通過して基板1
0を上方へ押し上げることができる。
Now, the relationship between the through hole 5 of the circular bottom plate 3 and the transfer pin 6 will be described with reference to FIG. FIG.
In, the six transfer pins 6a to 6f are arranged at equal intervals on the circumference centered on the rotary shaft 2. Further, the through hole 5 is formed of an arc-shaped elongated hole extending on the same circumference as the six transfer pins 6a to 6f. The through hole 5 is formed in a size (length) through which two adjacent transfer pins (6a, 6d) can simultaneously pass. For example, in the example of FIG. 2, the angle between the transfer pins 6c and 6f that are adjacent to each other is 60 °, so that the angle θ sandwiched by the radial straight lines passing through both ends of the through hole 5 is 80 °. Is formed in. Therefore, the through hole 5 and the transfer pin 6
When a to 6f are in the illustrated positional relationship, all of the six transfer pins 6a to 6f pass through the through hole 5 and the substrate 1
You can push 0 upwards.
【0028】次に、上記のような構成を有する基板回転
保持装置における基板の搬入搬出時の動作について説明
する。図3は、基板の搬出時の基板回転保持装置の断面
構造図であり、図4はその底面図である。
Next, the operation of loading and unloading a substrate in the substrate rotation holding device having the above-mentioned structure will be described. FIG. 3 is a sectional structural view of the substrate rotation holding device when the substrate is carried out, and FIG. 4 is a bottom view thereof.
【0029】この基板回転保持装置では基板保持台1が
停止する回転方向の位置は制御されていない。したがっ
て、基板100の回転処理が終了すると、基板保持台1
は任意の回転位置で停止する。例えば図4に示すような
状態で基板保持台1が停止したとする。この場合、3本
の受け渡しピン6a〜6cはそれぞれ貫通孔5を通過し
得る位置にあり、残りの3本の受け渡しピン6d〜6f
は貫通孔5から外れた位置にある。
In this substrate rotation holding device, the position in the rotation direction where the substrate holding table 1 stops is not controlled. Therefore, when the rotation processing of the substrate 100 is completed, the substrate holder 1
Stops at any rotational position. For example, it is assumed that the substrate holder 1 stops in the state shown in FIG. In this case, the three transfer pins 6a to 6c are at positions where they can pass through the through holes 5, respectively, and the remaining three transfer pins 6d to 6f.
Is located outside the through hole 5.
【0030】この状態で受け渡しピン6a〜6fの上昇
動作が開始される。貫通孔5を通過し得る位置にある受
け渡しピン6a〜6cは、支持ピン7a〜7cが貫通孔
5を通過して基板10の裏面を支持しつつ上昇する。こ
のとき、貫通孔5を通過する支持ピン7a〜7cは3本
であるため、基板10はこの3本の支持ピン7a〜7c
によって安定に保持されて上方に持ち上げられる。ま
た、残りの3本の受け渡しピン6d〜6fは、上昇の途
中で支持ピン7d〜7fが底板3に当接する。さらに、
上昇動作が継続されると、支持ピン7d〜7fは底板3
に当接して停止し、ピン保持部8の弾性部材8aが圧縮
され、支持ピン7d〜7fがピン保持部8の内部に押し
込まれた状態となる。
In this state, the raising operation of the transfer pins 6a to 6f is started. The transfer pins 6a to 6c located at positions where they can pass through the through hole 5 ascend while the support pins 7a to 7c pass through the through hole 5 and support the back surface of the substrate 10. At this time, since the number of the support pins 7a to 7c passing through the through hole 5 is three, the substrate 10 has three support pins 7a to 7c.
It is stably held by and lifted upward. Further, the remaining three transfer pins 6d to 6f are brought into contact with the bottom plate 3 by the support pins 7d to 7f during the ascending. further,
When the ascending operation is continued, the support pins 7d to 7f move to the bottom plate 3
Then, the elastic member 8a of the pin holding portion 8 is compressed, and the support pins 7d to 7f are pushed into the pin holding portion 8.
【0031】3本の受渡しピン6a〜6cによって上方
に押し上げられた基板10の下方には、搬送アームが送
り込まれる。搬送アームは基板10を保持して上昇した
後、回転式基板処理装置の排出口から基板10を外部へ
排出する。その後、受け渡しピン6a〜6fが下降し、
元の位置に復帰する。受け渡しピン6d〜6fの下降時
に、底板3に当接していた受け渡しピン6d〜6fは、
弾性部材8aの弾性復元力によって支持ピン7d〜7f
がピン保持部8から徐々に突出し、元の状態に復帰す
る。
A transfer arm is fed below the substrate 10 pushed upward by the three transfer pins 6a to 6c. The transfer arm holds the substrate 10 and moves up, and then ejects the substrate 10 to the outside from the ejection port of the rotary substrate processing apparatus. After that, the transfer pins 6a to 6f descend,
Return to the original position. When the transfer pins 6d to 6f descend, the transfer pins 6d to 6f that were in contact with the bottom plate 3 are
Support pins 7d to 7f are generated by the elastic restoring force of the elastic member 8a.
Gradually projects from the pin holding portion 8 and returns to the original state.
【0032】図4において、貫通孔5は隣接する2つの
受け渡しピン6を同時に通過し得る形状に形成されてい
る。このため、基板保持台1が図2に示す回転位置に停
止した場合には6本全ての受け渡しピン6a〜6fが貫
通孔5を通過することができる。また、図4に示すよう
に、全ての受け渡しピン6a〜6fが貫通孔5を通過し
得る位置からずれた場合でも、1つの貫通孔5には必ず
1つの受け渡しピン6a〜6cが貫通孔5を通過し得る
ようになる。
In FIG. 4, the through hole 5 is formed in such a shape that two adjacent transfer pins 6 can simultaneously pass therethrough. Therefore, when the substrate holder 1 stops at the rotation position shown in FIG. 2, all six transfer pins 6a to 6f can pass through the through hole 5. Further, as shown in FIG. 4, even when all the transfer pins 6a to 6f are displaced from the positions where they can pass through the through hole 5, one transfer pin 6a to 6c is always included in one through hole 5. Will be able to pass through.
【0033】このように、本実施例の基板保持台1で
は、基板保持台1が停止する回転位置を制御しなくて
も、少なくとも3本の受け渡しピン(6a〜6c)によ
って基板10の受け渡しが可能となるように構成されて
いる。このため、基板保持台1の回転停止位置を制御す
るためのエンコーダ等の装置を設ける必要がない。
As described above, in the substrate holder 1 of this embodiment, the substrate 10 can be delivered by at least three delivery pins (6a-6c) without controlling the rotational position where the substrate holder 1 stops. It is configured to be possible. Therefore, it is not necessary to provide a device such as an encoder for controlling the rotation stop position of the substrate holding table 1.
【0034】また、図1に示したように、受け渡しピン
6a〜6fのピン保持部8にはダンパー8bが取り付け
られている。これにより、弾性部材8aによって弾性支
持された支持ピン7がピン保持部8に押し込まれた状態
から突然解放されて上方に飛び出し、基板10の裏面に
衝突して損傷を与えることが防止される。
Further, as shown in FIG. 1, a damper 8b is attached to the pin holding portion 8 of the transfer pins 6a to 6f. As a result, the support pin 7 elastically supported by the elastic member 8a is prevented from being suddenly released from the state of being pushed into the pin holding portion 8 and popping out upward to collide with the back surface of the substrate 10 to be damaged.
【0035】例えば、受け渡しピン6の支持ピン7の先
端部が回転処理終了時に、貫通孔5の端部に引っ掛かっ
た状態で停止したとする。この場合には、支持ピン7は
貫通孔5を通過することが妨げられ、弾性部材8aを圧
縮しながらピン保持部8の内部に押し込まれることにな
る。ところが、貫通孔5の端部の引っ掛かりが何らかの
要因によって解き放たれると、支持ピン7は弾性部材8
aの弾性復元力によって上方へ飛び出そうとする。この
とき、ダンパー8bが弾性部材8aの弾性復元力を抑制
し、支持ピン7が上方へ飛び出す動作を緩やかに行わせ
る。このため、支持ピン7は基板10の裏面に緩やかに
接触することとなり、基板10の損傷が防止される。
For example, it is assumed that the tip of the support pin 7 of the transfer pin 6 is stopped at the end of the rotation process while being caught by the end of the through hole 5. In this case, the support pin 7 is prevented from passing through the through hole 5, and is pushed into the pin holding portion 8 while compressing the elastic member 8a. However, when the catch at the end of the through hole 5 is released due to some factor, the support pin 7 causes the elastic member 8 to move.
The elastic restoring force of a tries to jump upward. At this time, the damper 8b suppresses the elastic restoring force of the elastic member 8a, and the operation of the support pin 7 jumping out upward is performed gently. For this reason, the support pins 7 come into contact with the back surface of the substrate 10 gently, and damage to the substrate 10 is prevented.
【0036】このように、本実施例による基板回転保持
装置は、基板支持部4によって基板10の周縁部分を保
持して回転させる。このために、吸引式スピンチャック
等で問題となった吸着跡が生じない。また、基板10の
周囲が環状の基板支持枠4によって取り囲まれている。
このために、風切りによる気流の乱れが防止され、処理
むらの発生が防止される。
As described above, in the substrate rotation holding device according to this embodiment, the peripheral edge portion of the substrate 10 is held and rotated by the substrate supporting portion 4. For this reason, there is no occurrence of a suction mark which is a problem in a suction type spin chuck or the like. Further, the periphery of the substrate 10 is surrounded by the annular substrate support frame 4.
For this reason, turbulence of the air flow due to wind cutting is prevented, and uneven processing is prevented.
【0037】さらに、複数の受け渡しピン6a〜6fを
配置し、このうち隣り合う2本の受け渡しピンを通過し
得る大きさの貫通孔を底板3に設けることにより、基板
保持台1が任意の回転位置に停止した場合でも、少なく
とも3本の受け渡しピンを上昇可能とすることによっ
て、基板保持台1の回転停止位置の制御の必要のない簡
素化された機構の回転式基板処理装置を得ることができ
る。
Further, by arranging a plurality of transfer pins 6a to 6f, and by providing the bottom plate 3 with a through hole having a size capable of passing two adjacent transfer pins among them, the substrate holding table 1 is rotated arbitrarily. Even when the substrate is stopped at the position, at least three transfer pins can be lifted to obtain a rotary substrate processing apparatus having a simplified mechanism that does not require control of the rotation stop position of the substrate holder 1. it can.
【0038】なお、受け渡しピンの本数は上記実施例の
ように6本に限定されず、さらに多数本であってもよ
い。例えば、8本の受け渡しピンを設けてもよい。この
場合、隣接する2本の受け渡しピンを通過させる貫通孔
は、4個設ければよい。ただし、貫通孔が3個設けられ
た場合でも、少なくとも3本の受け渡しピンで基板を支
持することができる。
The number of transfer pins is not limited to six as in the above embodiment, but may be more. For example, eight transfer pins may be provided. In this case, it is sufficient to provide four through holes through which the two adjacent transfer pins pass. However, even if three through holes are provided, the substrate can be supported by at least three transfer pins.
【0039】また、貫通孔は隣接する3本以上の受け渡
しピンを同時に通過させ得る大きさに形成されてもよ
い。
Further, the through hole may be formed in such a size that three or more adjacent delivery pins can pass through at the same time.
【図面の簡単な説明】[Brief description of the drawings]
【図1】本実施例の実施例による基板回転保持装置の断
面構造図である。
FIG. 1 is a sectional structural view of a substrate rotation holding device according to an example of the present embodiment.
【図2】図1の基板回転保持装置の底面図である。FIG. 2 is a bottom view of the substrate rotation holding device of FIG.
【図3】基板回転保持装置の動作状態を示す断面構造図
である。
FIG. 3 is a sectional structural view showing an operating state of the substrate rotation holding device.
【図4】図3に示す基板回転保持装置の底面図である。FIG. 4 is a bottom view of the substrate rotation holding device shown in FIG.
【図5】従来の基板回転保持装置の断面構造図である。FIG. 5 is a cross-sectional structure diagram of a conventional substrate rotation holding device.
【図6】図5の基板回転保持装置の基板搬出時の動作を
示す平面図である。
FIG. 6 is a plan view showing an operation of the substrate rotation holding device of FIG. 5 when carrying out a substrate.
【符号の説明】[Explanation of symbols]
1 基板保持台 2 回転軸 3 底板 4 基板支持枠 5 貫通孔 6(6a〜6f) 受け渡しピン 7(7a〜7f) 支持ピン 8 ピン保持部 8a 弾性部材 8b ダンパー 10 基板 DESCRIPTION OF SYMBOLS 1 Substrate holder 2 Rotating shaft 3 Bottom plate 4 Substrate support frame 5 Through hole 6 (6a to 6f) Transfer pin 7 (7a to 7f) Support pin 8 Pin holding part 8a Elastic member 8b Damper 10 Substrate

Claims (3)

    【特許請求の範囲】[Claims]
  1. 【請求項1】 基板を水平に保持して回転させつつ前記
    基板上に所定の処理を行う回転式基板処理装置であっ
    て、 前記基板を水平に保持して回転する基板保持部材と、 前記基板保持部材に保持された前記基板を上方に押し上
    げるための3本以上の基板押し上げ部材とを備えてお
    り、 前記基板保持部材は、任意の停止位置で少なくとも3本
    の前記基板押し上げ部材が通過可能な貫通部を有する底
    板と、前記底板上に設けられかつ前記基板の周縁部分を
    支持する環状枠部材とからなることを特徴とする回転式
    基板処理装置。
    1. A rotary substrate processing apparatus for holding a substrate horizontally and rotating the substrate to perform a predetermined process on the substrate, the substrate holding member rotating the substrate horizontally and rotating the substrate. The substrate holding member is provided with three or more substrate pushing-up members for pushing up the substrate held by the holding member, and the substrate holding member can pass at least three substrate pushing-up members at arbitrary stop positions. A rotary substrate processing apparatus comprising: a bottom plate having a penetrating portion; and an annular frame member provided on the bottom plate and supporting a peripheral portion of the substrate.
  2. 【請求項2】 前記基板押し上げ部材は、前記底板の回
    転軸を中心とする円周上に等間隔で少なくとも6本配置
    されており、 前記貫通部は、前記底板の回転軸を中心とする前記円周
    上に等間隔で配置された少なくとも3個の貫通孔からな
    り、 前記貫通孔の各々は、隣接する少なくとも2本の基板押
    し上げ部材が同時に通過しうる大きさに形成されたこと
    を特徴とする回転式基板処理装置。
    2. The at least six substrate pushing-up members are arranged at equal intervals on a circumference centered on the rotation axis of the bottom plate, and the penetrating portions are arranged on the rotation axis of the bottom plate. It is composed of at least three through holes arranged at equal intervals on the circumference, and each of the through holes is formed in such a size that at least two adjacent substrate pushing-up members can pass through at the same time. Rotating substrate processing equipment.
  3. 【請求項3】 前記基板押し上げ部材は、 昇降自在に設けられたピン保持部と、 前記ピン保持部の先端に取り付けられ、前記基板の裏面
    に当接して前記基板を押し上げる支持ピンと、 前記ピン保持部と前記支持ピンとの間に設けられ、前記
    ピン保持部に対して前記支持ピンを弾性支持する弾性部
    材と、 前記ピン保持部と前記支持ピンとの間に設けられ、前記
    支持ピンの動作を緩慢に行わせる動作抑制部材とを備え
    たことを特徴とする請求項1または2記載の回転式基板
    処理装置。
    3. The substrate pushing-up member includes a pin holding portion that is vertically movable, a support pin that is attached to a tip end of the pin holding portion, and that pushes up the substrate by contacting a back surface of the substrate, and the pin holding portion. An elastic member that is provided between the pin holding portion and the support pin and elastically supports the support pin with respect to the pin holding portion; and is provided between the pin holding portion and the support pin to slow the operation of the support pin. The rotary substrate processing apparatus according to claim 1 or 2, further comprising:
JP33701995A 1995-12-25 1995-12-25 Rotary substrate processing equipment Expired - Fee Related JP3343012B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP33701995A JP3343012B2 (en) 1995-12-25 1995-12-25 Rotary substrate processing equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP33701995A JP3343012B2 (en) 1995-12-25 1995-12-25 Rotary substrate processing equipment

Publications (2)

Publication Number Publication Date
JPH09173945A true JPH09173945A (en) 1997-07-08
JP3343012B2 JP3343012B2 (en) 2002-11-11

Family

ID=18304704

Family Applications (1)

Application Number Title Priority Date Filing Date
JP33701995A Expired - Fee Related JP3343012B2 (en) 1995-12-25 1995-12-25 Rotary substrate processing equipment

Country Status (1)

Country Link
JP (1) JP3343012B2 (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100948759B1 (en) * 2006-03-20 2010-03-23 도쿄 오카 고교 가부시키가이샤 Supporting member for substrate
JP2010087342A (en) * 2008-10-01 2010-04-15 Toray Eng Co Ltd Lift pin
KR100968814B1 (en) * 2008-05-14 2010-07-08 세메스 주식회사 Lift pin structure and substrate treating apparatus with it
WO2012157638A1 (en) * 2011-05-19 2012-11-22 シャープ株式会社 Substrate placing base and substrate processing device
JP2016501445A (en) * 2012-11-21 2016-01-18 イー・ヴィー グループ インコーポレイテッドEV Group Inc. Wafer storage and storage container

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100948759B1 (en) * 2006-03-20 2010-03-23 도쿄 오카 고교 가부시키가이샤 Supporting member for substrate
KR100968814B1 (en) * 2008-05-14 2010-07-08 세메스 주식회사 Lift pin structure and substrate treating apparatus with it
JP2010087342A (en) * 2008-10-01 2010-04-15 Toray Eng Co Ltd Lift pin
WO2012157638A1 (en) * 2011-05-19 2012-11-22 シャープ株式会社 Substrate placing base and substrate processing device
JP2016501445A (en) * 2012-11-21 2016-01-18 イー・ヴィー グループ インコーポレイテッドEV Group Inc. Wafer storage and storage container

Also Published As

Publication number Publication date
JP3343012B2 (en) 2002-11-11

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