JPH1079337A - 投影露光装置 - Google Patents

投影露光装置

Info

Publication number
JPH1079337A
JPH1079337A JP8234158A JP23415896A JPH1079337A JP H1079337 A JPH1079337 A JP H1079337A JP 8234158 A JP8234158 A JP 8234158A JP 23415896 A JP23415896 A JP 23415896A JP H1079337 A JPH1079337 A JP H1079337A
Authority
JP
Japan
Prior art keywords
light
illumination
optical system
polarizing plate
projection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP8234158A
Other languages
English (en)
Japanese (ja)
Other versions
JPH1079337A5 (enExample
Inventor
Sumio Hashimoto
純夫 橋本
Shintaro Kudo
慎太郎 工藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP8234158A priority Critical patent/JPH1079337A/ja
Priority to EP19970113696 priority patent/EP0823662A2/en
Publication of JPH1079337A publication Critical patent/JPH1079337A/ja
Publication of JPH1079337A5 publication Critical patent/JPH1079337A5/ja
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP8234158A 1996-08-07 1996-09-04 投影露光装置 Withdrawn JPH1079337A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP8234158A JPH1079337A (ja) 1996-09-04 1996-09-04 投影露光装置
EP19970113696 EP0823662A2 (en) 1996-08-07 1997-08-07 Projection exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8234158A JPH1079337A (ja) 1996-09-04 1996-09-04 投影露光装置

Publications (2)

Publication Number Publication Date
JPH1079337A true JPH1079337A (ja) 1998-03-24
JPH1079337A5 JPH1079337A5 (enExample) 2004-11-11

Family

ID=16966571

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8234158A Withdrawn JPH1079337A (ja) 1996-08-07 1996-09-04 投影露光装置

Country Status (1)

Country Link
JP (1) JPH1079337A (enExample)

Cited By (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003532281A (ja) * 2000-04-25 2003-10-28 エーエスエムエル ユーエス，インコーポレイテッド 照明偏光の制御を備えた光学縮小システム
JP2006332197A (ja) * 2005-05-24 2006-12-07 Nikon Corp 鏡筒、露光装置及び光学素子の検出方法並びにデバイスの製造方法
JP2008135742A (ja) * 2006-11-27 2008-06-12 Asml Netherlands Bv リソグラフィ装置、デバイス製造方法およびコンピュータプログラム製品
JP2009010346A (ja) * 2007-05-17 2009-01-15 Asml Netherlands Bv リソグラフィ装置およびデバイス製造方法
JP2009033191A (ja) * 2004-05-25 2009-02-12 Asml Holding Nv 偏光のパタンを供給するための方法
JP2009088358A (ja) * 2007-10-01 2009-04-23 Canon Inc 照明光学系、露光装置およびデバイス製造方法
JP2010010701A (ja) * 2002-12-03 2010-01-14 Nikon Corp 照明光学装置、露光装置および露光方法
JP2010091839A (ja) * 2008-10-09 2010-04-22 V Technology Co Ltd 近接露光装置
US7903234B2 (en) 2006-11-27 2011-03-08 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and computer program product
US20130271945A1 (en) 2004-02-06 2013-10-17 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US8861084B2 (en) 2004-01-16 2014-10-14 Carl Zeiss Smt Ag Polarization-modulating optical element
JP2015065441A (ja) * 2003-10-28 2015-04-09 株式会社ニコン 照明光学装置及び投影露光装置
KR20150060992A (ko) * 2005-01-21 2015-06-03 가부시키가이샤 니콘 조명 광학계 및 노광 장치
US9341954B2 (en) 2007-10-24 2016-05-17 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9581911B2 (en) 2004-01-16 2017-02-28 Carl Zeiss Smt Gmbh Polarization-modulating optical element
US9678332B2 (en) 2007-11-06 2017-06-13 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
US9678437B2 (en) 2003-04-09 2017-06-13 Nikon Corporation Illumination optical apparatus having distribution changing member to change light amount and polarization member to set polarization in circumference direction
US9885872B2 (en) 2003-11-20 2018-02-06 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical integrator and polarization member that changes polarization state of light
US9891539B2 (en) 2005-05-12 2018-02-13 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US10101666B2 (en) 2007-10-12 2018-10-16 Nikon Corporation Illumination optical apparatus, exposure apparatus, and device manufacturing method

Cited By (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003532281A (ja) * 2000-04-25 2003-10-28 エーエスエムエル ユーエス，インコーポレイテッド 照明偏光の制御を備えた光学縮小システム
JP2010010701A (ja) * 2002-12-03 2010-01-14 Nikon Corp 照明光学装置、露光装置および露光方法
US9678437B2 (en) 2003-04-09 2017-06-13 Nikon Corporation Illumination optical apparatus having distribution changing member to change light amount and polarization member to set polarization in circumference direction
US9885959B2 (en) 2003-04-09 2018-02-06 Nikon Corporation Illumination optical apparatus having deflecting member, lens, polarization member to set polarization in circumference direction, and optical integrator
US9423698B2 (en) 2003-10-28 2016-08-23 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
JP2015065441A (ja) * 2003-10-28 2015-04-09 株式会社ニコン 照明光学装置及び投影露光装置
US9760014B2 (en) 2003-10-28 2017-09-12 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US10281632B2 (en) 2003-11-20 2019-05-07 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical member with optical rotatory power to rotate linear polarization direction
US9885872B2 (en) 2003-11-20 2018-02-06 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical integrator and polarization member that changes polarization state of light
US9581911B2 (en) 2004-01-16 2017-02-28 Carl Zeiss Smt Gmbh Polarization-modulating optical element
US9316772B2 (en) 2004-01-16 2016-04-19 Carl Zeiss Smt Gmbh Producing polarization-modulating optical element for microlithography system
US8861084B2 (en) 2004-01-16 2014-10-14 Carl Zeiss Smt Ag Polarization-modulating optical element
US20130271945A1 (en) 2004-02-06 2013-10-17 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10007194B2 (en) 2004-02-06 2018-06-26 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10234770B2 (en) 2004-02-06 2019-03-19 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10241417B2 (en) 2004-02-06 2019-03-26 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
JP2009033191A (ja) * 2004-05-25 2009-02-12 Asml Holding Nv 偏光のパタンを供給するための方法
KR20150060992A (ko) * 2005-01-21 2015-06-03 가부시키가이샤 니콘 조명 광학계 및 노광 장치
US9891539B2 (en) 2005-05-12 2018-02-13 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
JP2006332197A (ja) * 2005-05-24 2006-12-07 Nikon Corp 鏡筒、露光装置及び光学素子の検出方法並びにデバイスの製造方法
US7903234B2 (en) 2006-11-27 2011-03-08 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and computer program product
JP2008135742A (ja) * 2006-11-27 2008-06-12 Asml Netherlands Bv リソグラフィ装置、デバイス製造方法およびコンピュータプログラム製品
JP2009010346A (ja) * 2007-05-17 2009-01-15 Asml Netherlands Bv リソグラフィ装置およびデバイス製造方法
JP2009088358A (ja) * 2007-10-01 2009-04-23 Canon Inc 照明光学系、露光装置およびデバイス製造方法
US10101666B2 (en) 2007-10-12 2018-10-16 Nikon Corporation Illumination optical apparatus, exposure apparatus, and device manufacturing method
US9341954B2 (en) 2007-10-24 2016-05-17 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9857599B2 (en) 2007-10-24 2018-01-02 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9678332B2 (en) 2007-11-06 2017-06-13 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
JP2010091839A (ja) * 2008-10-09 2010-04-22 V Technology Co Ltd 近接露光装置

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