JPH1079337A5 - - Google Patents

Info

Publication number
JPH1079337A5
JPH1079337A5 JP1996234158A JP23415896A JPH1079337A5 JP H1079337 A5 JPH1079337 A5 JP H1079337A5 JP 1996234158 A JP1996234158 A JP 1996234158A JP 23415896 A JP23415896 A JP 23415896A JP H1079337 A5 JPH1079337 A5 JP H1079337A5
Authority
JP
Japan
Prior art keywords
optical system
projection
light
light beam
projection optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP1996234158A
Other languages
English (en)
Japanese (ja)
Other versions
JPH1079337A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP8234158A priority Critical patent/JPH1079337A/ja
Priority claimed from JP8234158A external-priority patent/JPH1079337A/ja
Priority to EP19970113696 priority patent/EP0823662A2/en
Publication of JPH1079337A publication Critical patent/JPH1079337A/ja
Publication of JPH1079337A5 publication Critical patent/JPH1079337A5/ja
Withdrawn legal-status Critical Current

Links

JP8234158A 1996-08-07 1996-09-04 投影露光装置 Withdrawn JPH1079337A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP8234158A JPH1079337A (ja) 1996-09-04 1996-09-04 投影露光装置
EP19970113696 EP0823662A2 (en) 1996-08-07 1997-08-07 Projection exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8234158A JPH1079337A (ja) 1996-09-04 1996-09-04 投影露光装置

Publications (2)

Publication Number Publication Date
JPH1079337A JPH1079337A (ja) 1998-03-24
JPH1079337A5 true JPH1079337A5 (enExample) 2004-11-11

Family

ID=16966571

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8234158A Withdrawn JPH1079337A (ja) 1996-08-07 1996-09-04 投影露光装置

Country Status (1)

Country Link
JP (1) JPH1079337A (enExample)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001081977A2 (en) * 2000-04-25 2001-11-01 Silicon Valley Group, Inc. Optical reduction system with control of illumination polarization
TW200412617A (en) * 2002-12-03 2004-07-16 Nikon Corp Optical illumination device, method for adjusting optical illumination device, exposure device and exposure method
KR101503992B1 (ko) 2003-04-09 2015-03-18 가부시키가이샤 니콘 노광 방법 및 장치, 그리고 디바이스 제조 방법
TWI609409B (zh) 2003-10-28 2017-12-21 尼康股份有限公司 照明光學裝置、曝光裝置、曝光方法以及元件製造方法
TW201809801A (zh) 2003-11-20 2018-03-16 日商尼康股份有限公司 光學照明裝置、曝光裝置、曝光方法、以及元件製造方法
US20070019179A1 (en) 2004-01-16 2007-01-25 Damian Fiolka Polarization-modulating optical element
KR101295438B1 (ko) 2004-01-16 2013-08-09 칼 짜이스 에스엠티 게엠베하 편광변조 광학소자
TWI511182B (zh) 2004-02-06 2015-12-01 尼康股份有限公司 光學照明裝置、曝光裝置、曝光方法以及元件製造方法
US7324280B2 (en) * 2004-05-25 2008-01-29 Asml Holding N.V. Apparatus for providing a pattern of polarization
TW200923418A (en) * 2005-01-21 2009-06-01 Nikon Corp Exposure device, exposure method, fabricating method of device, exposure system, information collecting device, and measuring device
KR101455551B1 (ko) 2005-05-12 2014-10-27 가부시키가이샤 니콘 투영 광학계, 노광 장치 및 노광 방법
JP2006332197A (ja) * 2005-05-24 2006-12-07 Nikon Corp 鏡筒、露光装置及び光学素子の検出方法並びにデバイスの製造方法
US7903234B2 (en) 2006-11-27 2011-03-08 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and computer program product
SG143178A1 (en) * 2006-11-27 2008-06-27 Asml Netherlands Bv Lithographic apparatus, device manufacturing method and computer program product
US20080285000A1 (en) * 2007-05-17 2008-11-20 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP4971932B2 (ja) * 2007-10-01 2012-07-11 キヤノン株式会社 照明光学系、露光装置、デバイス製造方法および偏光制御ユニット
JP5267029B2 (ja) 2007-10-12 2013-08-21 株式会社ニコン 照明光学装置、露光装置及びデバイスの製造方法
US8379187B2 (en) 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9116346B2 (en) 2007-11-06 2015-08-25 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
JP5164007B2 (ja) * 2008-10-09 2013-03-13 株式会社ブイ・テクノロジー 近接露光装置

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