JPH1070065A - 露光装置 - Google Patents

露光装置

Info

Publication number
JPH1070065A
JPH1070065A JP8225474A JP22547496A JPH1070065A JP H1070065 A JPH1070065 A JP H1070065A JP 8225474 A JP8225474 A JP 8225474A JP 22547496 A JP22547496 A JP 22547496A JP H1070065 A JPH1070065 A JP H1070065A
Authority
JP
Japan
Prior art keywords
photosensitive substrate
stage
substrate
displacement
leveling
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP8225474A
Other languages
English (en)
Japanese (ja)
Other versions
JPH1070065A5 (enExample
Inventor
Masayuki Murayama
正幸 村山
Yuji Imai
裕二 今井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP8225474A priority Critical patent/JPH1070065A/ja
Priority to KR1019970041270A priority patent/KR19980019031A/ko
Priority to EP97114842A priority patent/EP0833208A3/en
Publication of JPH1070065A publication Critical patent/JPH1070065A/ja
Priority to US09/419,771 priority patent/US6172373B1/en
Publication of JPH1070065A5 publication Critical patent/JPH1070065A5/ja
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/7026—Focusing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP8225474A 1996-08-27 1996-08-27 露光装置 Withdrawn JPH1070065A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP8225474A JPH1070065A (ja) 1996-08-27 1996-08-27 露光装置
KR1019970041270A KR19980019031A (ko) 1996-08-27 1997-08-26 스테이지 장치(a stage apparatus)
EP97114842A EP0833208A3 (en) 1996-08-27 1997-08-27 A stage apparatus
US09/419,771 US6172373B1 (en) 1996-08-27 1999-10-18 Stage apparatus with improved positioning capability

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8225474A JPH1070065A (ja) 1996-08-27 1996-08-27 露光装置

Publications (2)

Publication Number Publication Date
JPH1070065A true JPH1070065A (ja) 1998-03-10
JPH1070065A5 JPH1070065A5 (enExample) 2005-07-21

Family

ID=16829889

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8225474A Withdrawn JPH1070065A (ja) 1996-08-27 1996-08-27 露光装置

Country Status (1)

Country Link
JP (1) JPH1070065A (enExample)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0867776A3 (en) * 1997-03-26 2000-02-23 Nikon Corporation Exposure method, exposure apparatus and method for making an exposure apparatus
US6411387B1 (en) 1996-12-16 2002-06-25 Nikon Corporation Stage apparatus, projection optical apparatus and exposure method
JP2007535170A (ja) * 2004-04-28 2007-11-29 ライテル・インストルメンツ 動的走査フィールド湾曲の判定用装置及び方法
US9301869B2 (en) 2009-11-06 2016-04-05 Hollister Incorporated Multi-layer film and ostomy product made therefrom
CN118778381A (zh) * 2024-09-13 2024-10-15 上海芯东来半导体科技有限公司 一种高精度的调平装置、调平台以及调平方法

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6411387B1 (en) 1996-12-16 2002-06-25 Nikon Corporation Stage apparatus, projection optical apparatus and exposure method
EP0867776A3 (en) * 1997-03-26 2000-02-23 Nikon Corporation Exposure method, exposure apparatus and method for making an exposure apparatus
JP2007535170A (ja) * 2004-04-28 2007-11-29 ライテル・インストルメンツ 動的走査フィールド湾曲の判定用装置及び方法
US9301869B2 (en) 2009-11-06 2016-04-05 Hollister Incorporated Multi-layer film and ostomy product made therefrom
CN118778381A (zh) * 2024-09-13 2024-10-15 上海芯东来半导体科技有限公司 一种高精度的调平装置、调平台以及调平方法
CN118778381B (zh) * 2024-09-13 2025-02-07 上海芯东来半导体科技有限公司 一种高精度的调平装置、调平台以及调平方法

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