JPH1060371A - Resin-coated substrate and production of resin sheet - Google Patents

Resin-coated substrate and production of resin sheet

Info

Publication number
JPH1060371A
JPH1060371A JP21567096A JP21567096A JPH1060371A JP H1060371 A JPH1060371 A JP H1060371A JP 21567096 A JP21567096 A JP 21567096A JP 21567096 A JP21567096 A JP 21567096A JP H1060371 A JPH1060371 A JP H1060371A
Authority
JP
Japan
Prior art keywords
resin
substrate
solvent
sheet
varnish
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP21567096A
Other languages
Japanese (ja)
Inventor
Shozo Kinoshita
昌三 木下
Teruo Katayose
照雄 片寄
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Asahi Chemical Industry Co Ltd
Original Assignee
Asahi Chemical Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Chemical Industry Co Ltd filed Critical Asahi Chemical Industry Co Ltd
Priority to JP21567096A priority Critical patent/JPH1060371A/en
Priority to TW85115709A priority patent/TW449614B/en
Publication of JPH1060371A publication Critical patent/JPH1060371A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/0313Organic insulating material
    • H05K1/032Organic insulating material consisting of one material
    • H05K1/0326Organic insulating material consisting of one material containing O
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/02Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/022Processes for manufacturing precursors of printed circuits, i.e. copper-clad substrates

Landscapes

  • Compositions Of Macromolecular Compounds (AREA)
  • Paints Or Removers (AREA)

Abstract

PROBLEM TO BE SOLVED: To obtain a resin-coated substrate in improved productivity without dusting and without causing the surface of the sheet to be cracked when dried by applying a thermosetting polyphenylene resin varnish to a substrate and drying the varnish under specified conditions. SOLUTION: A thermoplastic polyphenylene ether resin is applied to a substrate (e.g. metallic foil such as a copper foil, an aluminum foil or a tin foil or plastic substrate such as a polyethylene terephthalate film, a polyimide film or a fluororesin film). When used as especially a resin-coated substrate for a wiring board, the substrate used is desirably a copper or aluminum foil having a thickness of 500μm or below and provided with a surface being roughened and/or treated with a coupling agent to improve its adhesion to the resin. The thermosetting polyphenylene ether resin may be used alone or together with a polyfunctional compound and may further contain a filler and additives. This is mixed with a solvent to form a resin varnish. This varnish is applied to a substrate in a coating thickness of 10μm or above and dried at a rate of solvent vaporization of 0.10gr.cm<2> /min or below to obtain a resin-coated substrate. The substrate is removed therefrom to obtain a resin sheet.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は熱硬化性ポリフェニ
レンエーテル系樹脂の膜を有する樹脂付基材および樹脂
シートの製造法に関する。
The present invention relates to a resin-coated substrate having a thermosetting polyphenylene ether-based resin film and a method for producing a resin sheet.

【0002】[0002]

【従来の技術】近年、通信用、民生用、産業用等の電子
機器の分野における実装方法の小型化、高密度化への指
向は著しいものがあり、それに伴って材料の面でもより
優れた耐熱性、高周波領域での電気特性が要求されつつ
ある。電気用配線板産業の分野でも、めっきスルーホー
ル工法よりも高密度な配線を形成しうる積層ビルドアッ
プ工法の確立が急務とされているが、高速ディジタル回
路および高周波アナログ回路に用いることができる適切
な樹脂付基材および樹脂シートがなかった。例えば、熱
硬化性の樹脂膜を有する樹脂付基材および樹脂シートと
しては、従来のエポキシ樹脂を用いたものがあるが、エ
ポキシ樹脂は電気特性、特に高周波領域での電気特性が
悪く、ハンドリングの際に樹脂の粉落ちが起こりやすい
という欠点があった。
2. Description of the Related Art In recent years, there has been a remarkable trend toward miniaturization and high-density mounting methods in the field of electronic devices for communication, consumer use, industrial use, and the like, and accordingly, materials have become more excellent. Heat resistance and electrical characteristics in a high frequency range are being demanded. In the electric wiring board industry, it is urgent to establish a laminated build-up method that can form higher-density wiring than the plated through-hole method, but it can be used for high-speed digital circuits and high-frequency analog circuits. There was no resinous base material and resin sheet. For example, as a resin-attached base material and a resin sheet having a thermosetting resin film, there are those using a conventional epoxy resin, but the epoxy resin has poor electric characteristics, particularly in a high-frequency region, and is difficult to handle. In this case, there is a drawback that resin powder easily falls off.

【0003】[0003]

【発明が解決しようとする課題】本発明は、以上の事情
に鑑みてなされたものであり、粉落ちすることがなく、
かつ、シート表面に乾燥割れをおこすこともない、生産
性の高い、熱硬化性ポリフェニレンエーテル系樹脂の膜
を有する樹脂付基材および樹脂シートの製造法を提供し
ようとするものである。
DISCLOSURE OF THE INVENTION The present invention has been made in view of the above circumstances, and does not cause powder to fall off.
Another object of the present invention is to provide a method for producing a resin-coated base material and a resin sheet having a thermosetting polyphenylene ether-based resin film which does not cause drying cracks on the sheet surface and has high productivity.

【0004】[0004]

【課題を解決するための手段】本発明者らは、上述のよ
うな課題を解決するため鋭意検討を重ねた結果、塗布膜
を乾燥するにあたって、溶剤の蒸発速度の条件、および
特定の残存溶媒量に達するまでの溶剤の蒸発速度の条件
を特定することにより、本発明の目的に沿った製造法を
見出し本発明を完成するに至った。すなわち、本発明
は、以下の通りである。
Means for Solving the Problems The present inventors have made intensive studies to solve the above-mentioned problems, and as a result, when drying the coating film, the conditions of the evaporation rate of the solvent and the specific residual solvent By specifying the conditions of the evaporation rate of the solvent until the amount is reached, a production method meeting the purpose of the present invention has been found, and the present invention has been completed. That is, the present invention is as follows.

【0005】(1)基材に熱硬化性ポリフェニレンエー
テル系樹脂の膜を有する樹脂付基材の製造法において、
熱硬化性ポリフェニレンエーテル系樹脂と溶剤からなる
樹脂ワニスを基材に塗布し、得られた塗布膜を乾燥する
にあたって、溶剤の蒸発速度が0.10gr・cm2/
分以下となる条件下で乾燥することを特徴とする樹脂付
基材の製造法。
(1) In a method for producing a resin-coated substrate having a thermosetting polyphenylene ether resin film on the substrate,
When a resin varnish comprising a thermosetting polyphenylene ether-based resin and a solvent is applied to a substrate and the obtained coating film is dried, the solvent evaporation rate is 0.10 gr · cm 2 /
A method for producing a substrate with resin, comprising drying under a condition of not more than one minute.

【0006】(2)熱硬化性ポリフェニレンエーテル系
樹脂の膜を有する樹脂基材の製造法において、熱硬化性
ポリフェニレンエーテル系樹脂と溶剤からなる樹脂ワニ
スを基材に塗布し、得られた塗布膜を乾燥するにあたっ
て、溶剤の蒸発速度が0.10gr・cm2/分以下と
なる条件下で乾燥し、その後、該基材を除去することを
特徴とする樹脂シートの製造法。
(2) In a method for producing a resin substrate having a film of a thermosetting polyphenylene ether resin, a resin varnish comprising a thermosetting polyphenylene ether resin and a solvent is applied to the substrate, and the resulting coating film is obtained. A method for producing a resin sheet, comprising drying the solvent under conditions where the evaporation rate of the solvent is 0.10 gr · cm 2 / min or less, and then removing the base material.

【0007】(3)塗布膜の残存溶媒濃度が20000
0ppmに達するまでの溶剤の蒸発速度が0.10gr
・cm2/分以下となる条件下で乾燥することを特徴と
する前記(1)の樹脂付基材の製造法。 (4)塗布膜の残存溶媒濃度が200000ppmに達
するまでの溶剤の蒸発速度が0.10gr・cm2/分
以下となる条件下で乾燥することを特徴とする前記
(2)の樹脂シートの製造法。
(3) The residual solvent concentration of the coating film is 20,000
The evaporation rate of the solvent until it reaches 0 ppm is 0.10 gr
-The method for producing a substrate with a resin according to the above (1), wherein the substrate is dried under a condition of not more than cm2 / min. (4) The method for producing a resin sheet according to the above (2), wherein the drying is performed under the condition that the evaporation rate of the solvent until the residual solvent concentration of the coating film reaches 200000 ppm is 0.10 gr · cm 2 / min or less. .

【0008】以下にこの発明を詳しく説明する。本発明
に用いられる基材としては、例えば、銅箔、アルミ箔、
錫箔、金箔などの金属箔やポリエチレンテレフタレート
フイルム、ポリブチレンテレフタレートフイルム、ポリ
イミドフイルム、ポリフエチレンサルファイドフイル
ム、弗素樹脂フイルム等のプラスチックフイルムが挙げ
られが、特に限定するものではない。
Hereinafter, the present invention will be described in detail. As the substrate used in the present invention, for example, copper foil, aluminum foil,
Examples include, but are not particularly limited to, metal foils such as tin foil and gold foil, and plastic films such as polyethylene terephthalate film, polybutylene terephthalate film, polyimide film, polyethylene sulfide film, and fluororesin film.

【0009】配線板用に本発明の樹脂付基材を用いる場
合、その樹脂付基材に用いる基材としては、導電性の金
属箔が好ましい。このような金属箔としては、容易に入
手できかつ容易にエッチングできることから考えて、銅
箔、アルミ箔が好ましく、その中でも銅箔は最も好まし
い。金属箔の厚みは特に限定されないが、扱い易さの点
から500μm以下が好ましく、200μm以下がより
好ましく、105μm以下が最も好ましい。金属箔にお
いて熱硬化性樹脂の膜が形成される側の面は、該樹脂と
の密着性を強めるため粗面化および/またはカップリン
グ処理されていてもよい。配線板製造用として製造販売
されている粗化処理電解銅箔は本発明の樹脂付基材の製
造にそのまま用いることができる。
When the substrate with resin of the present invention is used for a wiring board, the substrate to be used for the substrate with resin is preferably a conductive metal foil. Considering that such a metal foil is easily available and can be easily etched, a copper foil and an aluminum foil are preferable, and among them, a copper foil is most preferable. The thickness of the metal foil is not particularly limited, but is preferably 500 μm or less, more preferably 200 μm or less, and most preferably 105 μm or less from the viewpoint of ease of handling. The surface of the metal foil on which the thermosetting resin film is formed may be roughened and / or subjected to a coupling treatment in order to enhance the adhesion to the resin. The roughened electrolytic copper foil manufactured and sold for manufacturing a wiring board can be used as it is in the manufacture of the resin-coated base material of the present invention.

【0010】また、基材を除去した樹脂シートを支持、
又は保護するために用いられる支持体としては、使用前
に速やかに樹脂シートの状態にできるように、上記のプ
ラスチックフィルム類、銅箔の光沢面など容易に離型し
やすい支持体が好ましい。このような樹脂シートは、例
えば、接着シート、厚みコントロール用シート、多層配
線板用のビアホール、スルーホールの穴埋めシート、逐
次積層用シートとして使用できる。
In addition, the resin sheet from which the base material has been removed is supported,
As the support used for protection, a support that is easy to release, such as the above-mentioned plastic film or a glossy surface of a copper foil, is preferable so that a resin sheet can be quickly formed before use. Such a resin sheet can be used as, for example, an adhesive sheet, a sheet for controlling thickness, a via hole for a multilayer wiring board, a sheet for filling in through holes, and a sheet for sequential lamination.

【0011】本発明で用いられる熱硬化性ポリフェニレ
ンエーテル系樹脂は、単独および/または熱硬化樹脂と
多官能化合物との混合物であってもよい。またポリフェ
ニレンエーテル樹脂と熱硬化樹脂および/または多官能
化合物との混合物であってもよく、樹脂の種類は特に限
定はしない。本発明では熱硬化性樹脂に、その用途に応
じて所望の性能を付与させる目的で本来の性質を損なわ
ない範囲の量の充填剤や添加剤を配合して用いることが
できる。充填剤は繊維状であっても粉末状であってもよ
く、シリカ、アルミナ、タルク、雲母、ガラスビーズ、
ガラス中空球等を挙げることができる。また、添加剤と
しては、難燃剤、酸化防止剤、熱安定剤、帯電防止剤、
可塑剤、顔料、染料、着色剤等が挙げられる。
The thermosetting polyphenylene ether resin used in the present invention may be a single resin and / or a mixture of a thermosetting resin and a polyfunctional compound. Also, a mixture of a polyphenylene ether resin and a thermosetting resin and / or a polyfunctional compound may be used, and the type of the resin is not particularly limited. In the present invention, the thermosetting resin may be blended with a filler or an additive in an amount that does not impair the original properties for the purpose of imparting desired performance according to the use. The filler may be fibrous or powdery, and may be silica, alumina, talc, mica, glass beads,
Glass hollow spheres and the like can be given. In addition, as additives, flame retardants, antioxidants, heat stabilizers, antistatic agents,
Plasticizers, pigments, dyes, coloring agents, and the like are included.

【0012】熱硬化性ポリフェニレンエーテル系樹脂膜
の厚さは、ハンドリングのしやすさから乾燥後の厚さが
10μm以上が好ましく、20μm以上がより好まし
く、30μm以上が最も好ましい。ワニスの製作に用い
る溶剤としては、ベンゼン、トルエン、キシレンなどの
芳香族系炭化水素、ジクロロメタン、クロロホルム、ト
リクロロエチレンなどのハロゲン系溶剤、さらにはTH
F等があげられるが、これらは単体もしくは混合して使
用できる。熱硬化性ポリフェニレンエーテル樹脂と溶剤
とからなるワニスを塗布する方法としては、エアードコ
ータ、ブレードコータ、ロッドコータ、ナイフコータ、
グラビアコータ、リバースコータ、キャストコータなど
の装置を用いる方法が挙げられる。塗布膜を乾燥する方
法としては、熱風乾燥、ロール加熱乾燥、赤外線乾燥、
遠赤外線乾燥等の装置を用いる方法が挙げられ、実施に
あたってはこれらの装置が単独で、あるいは2種以上を
組み合わせて用いてもよい。
The thickness of the thermosetting polyphenylene ether-based resin film is preferably 10 μm or more, more preferably 20 μm or more, and most preferably 30 μm or more from the viewpoint of easy handling. Examples of the solvent used for producing the varnish include aromatic hydrocarbons such as benzene, toluene, and xylene; halogen solvents such as dichloromethane, chloroform, and trichloroethylene;
F and the like, which can be used alone or as a mixture. As a method of applying a varnish comprising a thermosetting polyphenylene ether resin and a solvent, an aired coater, a blade coater, a rod coater, a knife coater,
A method using a device such as a gravure coater, a reverse coater, or a cast coater may be used. Hot air drying, roll heating drying, infrared drying,
A method using a device such as far-infrared drying may be mentioned, and in practice, these devices may be used alone or in combination of two or more.

【0013】次に、熱硬化性ポリフェニレンエーテル系
樹脂と溶剤からなる樹脂ワニスを塗布し、塗布膜を乾燥
するにあたっての蒸発速度について説明する。本発明に
おける塗布膜を乾燥するにあたっての蒸発速度の具体的
コントロール方法としては、例えば、乾燥するための熱
風の温度、風量を調節することが挙げられる。また、蒸
発温度をコントロールするため、高沸点溶剤をワニスに
添加しても良い。このような高沸点溶剤としては、クロ
ルベンゼン、テトラリン、アニソール等が挙げられる。
Next, the evaporation rate when a resin varnish comprising a thermosetting polyphenylene ether-based resin and a solvent is applied and the applied film is dried will be described. As a specific method for controlling the evaporation rate in drying the coating film in the present invention, for example, adjusting the temperature and the amount of hot air for drying may be mentioned. In order to control the evaporation temperature, a high boiling solvent may be added to the varnish. Examples of such high-boiling solvents include chlorobenzene, tetralin, anisole and the like.

【0014】本発明において、蒸発温度は、0.10g
r・cm2/分以下であることが必要であるが、好まし
くは、蒸発速度が0.0010gr・cm2/分以上、
0.10gr・cm2/分以下である。0.10gr・
cm2/分を越えるとシート面に乾燥割れをおこす。一
方、塗布膜を乾燥するにあたっての蒸発速度が0.00
1gr・cm2/分を下回るとシートの生産性が低下す
ることがあるので好ましくない。
In the present invention, the evaporation temperature is 0.10 g
r · cm 2 / min or less, but preferably, the evaporation rate is 0.0010 gr · cm 2 / min or more,
0.10 gr · cm 2 / min or less. 0.10 gr
If it exceeds cm2 / min, dry cracking will occur on the sheet surface. On the other hand, the evaporation rate for drying the coating film is 0.00
If it is less than 1 gr · cm 2 / min, the productivity of the sheet may decrease, which is not preferable.

【0015】[0015]

【発明の実施の形態】BEST MODE FOR CARRYING OUT THE INVENTION

【0016】[0016]

【実施例】以下、本発明をさらに明確にするために実施
例を挙げて説明する。
EXAMPLES Hereinafter, the present invention will be described with reference to examples to further clarify the present invention.

【0017】[0017]

【実施例1〜3】厚さ12μmのプリント基板用電解銅
箔の片面に、乾燥後の樹脂厚さが50μmとなるように
熱硬化性ポリフェニレンエーテル系樹脂とトルエン溶剤
からなる樹脂ワニスを塗布した。塗布膜を乾燥するにあ
たっては、熱風乾燥機を用い、塗布膜の残存溶媒濃度が
200000ppmに達するまでの溶剤の蒸発速度が
0.005gr・cm2/分、0.01gr・cm2/
分、0.05gr・cm2/分となるように熱風の温度
・風量を調節した。得られた樹脂付シートは、塗布面の
乾燥割れもなく、樹脂付シートのカットなどの加工時や
逐次積層による多層配線板を作製する際のハンドリング
において粉落ちはなく、信頼性の高い多層配線板を作製
することができた。
Examples 1 to 3 A resin varnish comprising a thermosetting polyphenylene ether-based resin and a toluene solvent was applied to one side of a 12 μm-thick electrolytic copper foil for printed circuit boards so that the resin thickness after drying was 50 μm. . In drying the coating film, the evaporation rate of the solvent until the residual solvent concentration of the coating film reaches 200,000 ppm is 0.005 gr · cm 2 / min, 0.01 gr · cm 2 / using a hot air drier.
The temperature and air volume of the hot air were adjusted so as to be 0.05 gr · cm 2 / min. The obtained resin-attached sheet has no drying cracks on the coated surface, and does not fall off during handling such as cutting of the resin-attached sheet or when manufacturing a multilayer wiring board by successive lamination, and has a highly reliable multilayer wiring. A plate could be made.

【0018】[0018]

【比較例1】実施例1の塗布膜を乾燥するにあたって、
溶剤の蒸発速度が0.2gr・cm2/分になるように
熱風の温度・風量を調節する以外は、実施例1〜3と同
様に樹脂付シートを作製した。得られたシートは、塗布
面には乾燥割れが見られ、樹脂付シートのカットなどの
加工時や逐次積層による多層配線板を作製する際のハン
ドリングにおいて粉落ちが見られた。作製した多層配線
板の断面を観察したところ回路部に樹脂の埋込み不良が
発生していた。
Comparative Example 1 In drying the coating film of Example 1,
A sheet with resin was produced in the same manner as in Examples 1 to 3, except that the temperature and the amount of hot air were adjusted so that the evaporation rate of the solvent was 0.2 gr · cm 2 / min. In the obtained sheet, dry cracks were observed on the coated surface, and powder dropping was observed at the time of processing such as cutting of a sheet with a resin and at the time of handling when manufacturing a multilayer wiring board by successive lamination. Observation of the cross section of the manufactured multilayer wiring board showed that resin embedding failure occurred in the circuit portion.

【0019】[0019]

【発明の効果】本発明の樹脂付基材および樹脂シート
は、乾燥割れもなく、加工時およびハンドリングに際し
て粉落ちのしない、生産性が高い特徴を有する。従っ
て、本発明の樹脂付基材は、高速ディジタル回路および
高周波アナログ回路に用いることができる配線板用樹脂
付基材として好適に用いられ、樹脂シートは、配線板用
のみならず、接着シート、厚みコントロールシートとし
て好適に用いられる。
The resin-coated base material and the resin sheet of the present invention have no drying cracks, do not fall off during processing and handling, and have high productivity. Therefore, the resin-coated substrate of the present invention is suitably used as a resin-coated substrate for a wiring board that can be used for high-speed digital circuits and high-frequency analog circuits, and a resin sheet is used not only for a wiring board but also for an adhesive sheet, It is suitably used as a thickness control sheet.

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 基材に熱硬化性ポリフェニレンエーテル
系樹脂の膜を有する樹脂付基材の製造法において、熱硬
化性ポリフェニレンエーテル系樹脂と溶剤からなる樹脂
ワニスを基材に塗布し、得られた塗布膜を乾燥するにあ
たって、溶剤の蒸発速度が0.10gr・cm2/分以
下となる条件下で乾燥することを特徴とする樹脂付基材
の製造法。
1. A method for producing a resin-coated base material having a thermosetting polyphenylene ether-based resin film on the base material, the method comprising applying a resin varnish comprising a thermosetting polyphenylene ether-based resin and a solvent to the base material. A method for producing a substrate with resin, characterized in that when drying the applied film, the solvent is evaporated under conditions such that the evaporation rate of the solvent is 0.10 gr · cm 2 / min or less.
【請求項2】 熱硬化性ポリフェニレンエーテル系樹脂
の膜を有する樹脂シートの製造法において、熱硬化性ポ
リフェニレンエーテル系樹脂と溶剤からなる樹脂ワニス
を基材に塗布し、得られた塗布膜を乾燥するにあたっ
て、溶剤の蒸発速度が0.10gr・cm2/分以下と
なる条件下で乾燥し、その後、該基材を除去することを
特徴とする樹脂シートの製造法。
2. A method for producing a resin sheet having a film of a thermosetting polyphenylene ether resin, wherein a resin varnish comprising a thermosetting polyphenylene ether resin and a solvent is applied to a substrate, and the obtained coating film is dried. In doing so, a method for producing a resin sheet, characterized in that the solvent is evaporated under conditions where the evaporation rate of the solvent is 0.10 gr · cm 2 / min or less, and then the substrate is removed.
【請求項3】塗布膜の残存溶媒濃度が200000pp
mに達するまでの溶剤の蒸発速度が0.10gr・cm
2/分以下となる条件下で乾燥することを特徴とする請
求項1の樹脂付基材の製造法。
3. The method according to claim 1, wherein the residual solvent concentration of the coating film is 200,000 pp.
m until the solvent evaporation rate reaches 0.10 gr · cm
2. The method for producing a resin-coated substrate according to claim 1, wherein the substrate is dried under a condition of 2 / min or less.
【請求項4】塗布膜の残存溶媒濃度が200000pp
mに達するまでの溶剤の蒸発速度が0.10gr・cm
2/分以下となる条件下で乾燥することを特徴とする請
求項2の樹脂シートの製造法。
4. A coating film having a residual solvent concentration of 200,000 pp.
m until the solvent evaporation rate reaches 0.10 gr · cm
The method for producing a resin sheet according to claim 2, wherein the drying is performed under a condition of 2 / min or less.
JP21567096A 1995-06-20 1996-08-15 Resin-coated substrate and production of resin sheet Withdrawn JPH1060371A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP21567096A JPH1060371A (en) 1996-08-15 1996-08-15 Resin-coated substrate and production of resin sheet
TW85115709A TW449614B (en) 1995-06-20 1996-12-19 Resin-carrying metal foil for multilayered wiring board, process for manufacturing the same, multilayered wiring board, and electronic device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21567096A JPH1060371A (en) 1996-08-15 1996-08-15 Resin-coated substrate and production of resin sheet

Publications (1)

Publication Number Publication Date
JPH1060371A true JPH1060371A (en) 1998-03-03

Family

ID=16676230

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21567096A Withdrawn JPH1060371A (en) 1995-06-20 1996-08-15 Resin-coated substrate and production of resin sheet

Country Status (1)

Country Link
JP (1) JPH1060371A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999042523A1 (en) * 1998-02-23 1999-08-26 Asahi Kasei Kogyo Kabushiki Kaisha Thermosetting polyphenylene ether resin composition, cured resin composition obtained therefrom, and laminated structure

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999042523A1 (en) * 1998-02-23 1999-08-26 Asahi Kasei Kogyo Kabushiki Kaisha Thermosetting polyphenylene ether resin composition, cured resin composition obtained therefrom, and laminated structure
US6558783B1 (en) 1998-02-23 2003-05-06 Asahi Kasei Kabushiki Kaisha Thermosetting polyphenylene ether resin composition, cured resin composition obtained therefrom, and laminated structure

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