JPH11150366A - Production of sequential multilayer wiring board - Google Patents

Production of sequential multilayer wiring board

Info

Publication number
JPH11150366A
JPH11150366A JP31736497A JP31736497A JPH11150366A JP H11150366 A JPH11150366 A JP H11150366A JP 31736497 A JP31736497 A JP 31736497A JP 31736497 A JP31736497 A JP 31736497A JP H11150366 A JPH11150366 A JP H11150366A
Authority
JP
Japan
Prior art keywords
resin
metal foil
wiring board
thermosetting
thermosetting resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP31736497A
Other languages
Japanese (ja)
Inventor
Hisami Tanda
久美 反田
Shozo Kinoshita
昌三 木下
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Asahi Chemical Industry Co Ltd
Original Assignee
Asahi Chemical Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Chemical Industry Co Ltd filed Critical Asahi Chemical Industry Co Ltd
Priority to JP31736497A priority Critical patent/JPH11150366A/en
Publication of JPH11150366A publication Critical patent/JPH11150366A/en
Withdrawn legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To improve accuracy of the thickness of a wiring board by specifying the range of the lowest molten viscosity of thermosetting resin being employed in a metal foil with resin or a resin sheet at the time of laminating a sequential multilayer wiring board thereby sustaining a correct resin flow at the time of molding. SOLUTION: A metal foil having a film of thermosetting resin, e.g. thermosetting polyphenylene ether resin, having lowest molten viscosity of 500-100000 poise is superposed on the surface of an inner layer material or a thermosetting resin is superposed on the surface of an inner layer material, a metal foil is placed thereon and then they are hot pressed to produce a bonded metal foil pattern. Furthermore, a metal foil is hot pressed on the circuit pattern through a thermosetting resin and the operation is repeated one time or more thus completing a sequential multilayer wiring board.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、複数の金属箔を熱
硬化性樹脂を介して逐次に積層し接着しつつ多層に成形
する逐次多層配線板の製造方法に関する。更に詳しく
は、成形時の樹脂付き金属箔または樹脂シートの樹脂の
最低溶融粘度を所定の範囲に規定することにより、板厚
精度及び回路埋め込み性に優れた逐次多層配線板を得る
逐次多層配線板の製造方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a multilayer wiring board in which a plurality of metal foils are sequentially laminated via a thermosetting resin and formed into a multilayer while bonding. More specifically, by defining the minimum melt viscosity of the resin with the metal foil or resin sheet at the time of molding in a predetermined range, a sequential multilayer wiring board having excellent thickness accuracy and circuit embedding property can be obtained. And a method for producing the same.

【0002】[0002]

【従来の技術】近年、通信用、民生用、産業用等の電子
機器の分野における実装方法の小型化、高密度化への指
向は著しいものがあり、それに伴って電気用配線板産業
の分野でも高密度な配線を形成しうる積層ビルドアップ
工法の確立が急務とされている。そのため、この積層ビ
ルドアップ工法に用いる材料として、より優れた耐熱性
及び高周波領域での電気特性を有する樹脂付き基材乃至
樹脂シートの開発が行われている。
2. Description of the Related Art In recent years, there has been a remarkable trend toward miniaturization and high-density mounting methods in the field of electronic devices for communication, consumer use, industrial use, etc. However, there is an urgent need to establish a laminated build-up method capable of forming high-density wiring. Therefore, as a material to be used for the lamination build-up method, a base material with a resin or a resin sheet having more excellent heat resistance and electric characteristics in a high frequency region is being developed.

【0003】樹脂付き基材は金属箔の片面に熱硬化性の
樹脂膜を有するもので、従来は例えばエポキシ樹脂付銅
箔がある。この樹脂付き基材に用いられるエポキシ樹脂
は銅張積層板製造用のものであり、一般に溶融粘度が低
く樹脂フローが非常に大きい。また、積層時に金属箔の
片面に当てて一体に加熱加圧される樹脂シートに用いる
熱硬化性の樹脂の場合も、製造条件のコントロール等が
難しかった。
[0003] A base material with a resin has a thermosetting resin film on one side of a metal foil. For example, a copper foil with an epoxy resin is conventionally used. The epoxy resin used for the resin-attached substrate is for producing a copper-clad laminate, and generally has a low melt viscosity and a very large resin flow. Also, in the case of a thermosetting resin used for a resin sheet that is integrally heated and pressed against one surface of a metal foil during lamination, it is difficult to control production conditions and the like.

【0004】[0004]

【発明が解決しようとする課題】このように溶融粘度が
低くフローが非常に大きいエポキシ樹脂のような熱硬化
性樹脂を多層配線板の製造に用いると、特にその熱硬化
性樹脂を介して複数枚の金属箔を繰り返し接着しつつ多
層に積層していく逐次多層配線板の製造方法いわゆる高
次積層ビルドアップ工法においては、電気絶縁体として
機能する熱硬化性樹脂の膜厚を配線板内のどこでも一定
として、配線の特性インピーダンスを一定範囲内に収め
るということは難しいという問題点があった。
When a thermosetting resin such as an epoxy resin having a low melt viscosity and a very large flow is used for the production of a multilayer wiring board, a plurality of thermosetting resins, particularly via the thermosetting resin, are used. In a so-called high-order lamination build-up method, in which a plurality of metal foils are repeatedly bonded and laminated in multiple layers while being repeatedly bonded, the thickness of a thermosetting resin functioning as an electrical insulator is determined within the wiring board. There has been a problem that it is difficult to keep the characteristic impedance of the wiring within a certain range while keeping it constant everywhere.

【0005】そこで本発明は、このような従来技術の問
題点に着目してなされたものであり、その目的とすると
ころは、使用する熱硬化性樹脂の成形性を改善して板厚
精度及び回路埋め込み性に優れた信頼性の高い逐次多層
配線板の製造方法を提供することにある。
Accordingly, the present invention has been made in view of such problems of the prior art, and an object of the present invention is to improve the moldability of a thermosetting resin to be used to improve the thickness accuracy and the thickness. An object of the present invention is to provide a method for manufacturing a reliable sequential multilayer wiring board having excellent circuit embedding properties.

【0006】[0006]

【課題を解決するための手段】本発明者らは、上述のよ
うな課題を解決するため鋭意検討を重ねた結果、逐次多
層配線板を積層成形するに際し、樹脂付き金属箔または
樹脂シートに用いる熱硬化性樹脂の最低溶融粘度をある
範囲に規定することにより、本発明の目的に沿った逐次
多層配線板が得られることを見出し本発明を完成するに
至った。
Means for Solving the Problems The inventors of the present invention have conducted intensive studies to solve the above-mentioned problems, and as a result, when sequentially laminating and forming a multilayer wiring board, they are used for a metal foil with a resin or a resin sheet. By defining the minimum melt viscosity of the thermosetting resin in a certain range, it was found that a multilayer wiring board in accordance with the object of the present invention could be obtained sequentially, and the present invention was completed.

【0007】すなわち、本発明の請求項1に係る逐次多
層配線板の製造方法は、プレス熱板間に、内層材と熱硬
化性樹脂付き金属箔または熱硬化性樹脂シート及び金属
箔からなる積層体とを重ねて成形するに際し、前記熱硬
化性樹脂の最低溶融粘度を500ポイズ以上10000
0ポイズ以下の範囲とすることを特徴とするものであ
る。
That is, according to the method for manufacturing a sequential multilayer wiring board according to the first aspect of the present invention, a laminate comprising an inner layer material and a metal foil with a thermosetting resin or a thermosetting resin sheet and a metal foil between press hot plates is provided. When the body is laminated and molded, the minimum melt viscosity of the thermosetting resin is set to 500 poise or more and 10,000 or more.
It is characterized by being within a range of 0 poise or less.

【0008】また、本発明の請求項2に係る逐次多層配
線板の製造方法は、上記請求項1に係る発明である逐次
多層配線板の製造方法において、熱硬化性樹脂付き金属
箔または熱硬化性樹脂シートの樹脂が熱硬化性ポリフェ
ニレンエーテル系樹脂組成物であることを特徴とするも
のである。
According to a second aspect of the present invention, there is provided a method for manufacturing a sequential multilayer wiring board according to the first aspect of the present invention, wherein the metal foil with thermosetting resin or the thermosetting resin is used. The resin of the conductive resin sheet is a thermosetting polyphenylene ether-based resin composition.

【0009】[0009]

【発明の実施の形態】以下に、本発明の実施形態の詳細
を説明する。本発明の多層配線板の製造方法の基本は、
内層材(表面に回路が形成されたものでもよい)の表面
に、金属箔の片面に熱硬化性樹脂の膜を有する金属箔を
重ねるか、もしくは内層材の表面に熱硬化性樹脂シート
を重ね更にその上に金属箔を重ねて、プレス熱板間に置
き加熱加圧することにより接着し、その接着した金属箔
を必要に応じて加工して回路パターンを作成した後、そ
の上にさらに熱硬化性樹脂を介して金属箔を加熱加圧し
て接着する操作を1回以上繰り返して逐次多層積層板と
するものである。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, embodiments of the present invention will be described in detail. The basis of the method for manufacturing a multilayer wiring board of the present invention is as follows.
A metal foil having a thermosetting resin film on one side of the metal foil is laminated on the surface of the inner layer material (a circuit may be formed on the surface), or a thermosetting resin sheet is laminated on the surface of the inner layer material. Further, a metal foil is placed thereon, placed between press hot plates and bonded by heating and pressing, and the bonded metal foil is processed as necessary to form a circuit pattern, and then heat-cured thereon. The operation of heating and pressurizing the metal foil via the conductive resin to bond the metal foil is repeated one or more times to sequentially form a multilayer laminate.

【0010】本発明における内層材とは金属張積層板を
指す。通常は、金属箔と、ガラス布あるいは芳香族ポリ
アミド繊維等の合成繊維から得られる織布または不織布
の基材に熱硬化性樹脂を含浸してなるプリプレグとを用
い、これらを重ねて加熱、加圧することにより製造され
ている。必要に応じてその表面に回路を形成することが
できる。
The inner layer material in the present invention refers to a metal-clad laminate. Normally, a metal foil and a prepreg obtained by impregnating a thermosetting resin into a woven or nonwoven fabric substrate obtained from a synthetic fiber such as a glass cloth or an aromatic polyamide fiber are used. Manufactured by pressing. If necessary, a circuit can be formed on the surface.

【0011】本発明で用いられる金属箔の材質として
は、導電性の金属箔であれば特に限定する必要はない
が、容易に入手できかつ容易にエッチングできることか
ら、銅箔、アルミ箔が好ましく、その中でも銅箔は最も
好ましい。
The material of the metal foil used in the present invention is not particularly limited as long as it is a conductive metal foil, but copper foil and aluminum foil are preferable because they are easily available and can be easily etched. Among them, copper foil is most preferable.

【0012】また、金属箔の厚みも特に限定されない
が、扱い易さの点から500μm以下が好ましく、20
0μm以下がより好ましく、105μm以下が最も好ま
しい。上記金属箔において、熱硬化性樹脂の膜が形成さ
れる側の面または熱硬化性樹脂シートに接する面は、当
該樹脂との密着性を強めるために粗面化及び/またはカ
ップリング処理されていてもよい。配線板製造用として
製造販売されている粗化処理電解銅箔は本発明の樹脂付
基材の製造にそのまま用いることができる。
The thickness of the metal foil is not particularly limited, but is preferably 500 μm or less from the viewpoint of easy handling.
0 μm or less is more preferable, and 105 μm or less is most preferable. In the metal foil, the surface on which the thermosetting resin film is formed or the surface in contact with the thermosetting resin sheet has been subjected to roughening and / or coupling treatment in order to enhance the adhesion to the resin. You may. The roughened electrolytic copper foil manufactured and sold for manufacturing a wiring board can be used as it is in the manufacture of the resin-coated base material of the present invention.

【0013】本発明で用いられる熱硬化性樹脂付き金属
箔の樹脂あるいは樹脂シートに用いられる熱硬化性樹脂
は、積層成形条件下での最低溶融粘度が500ポイズ以
上100000ポイズ以下の範囲であることが必須であ
る。このように規制することにより、本発明の所望の効
果、即ち板厚精度に優れかつ埋め込み性が良好な多層配
線板を得ることができる。
[0013] The resin of the metal foil with a thermosetting resin used in the present invention or the thermosetting resin used for the resin sheet has a minimum melt viscosity of 500 to 100,000 poise under lamination molding conditions. Is required. By regulating in this way, it is possible to obtain a desired effect of the present invention, that is, a multilayer wiring board having excellent thickness accuracy and good embedding.

【0014】当該粘度が500ポイズ未満では樹脂が流
れすぎて、絶縁層の厚みを配線板内で一定に保つことが
できず、したがって配線の特性インピーダンスを一定に
保つことができない。一方、100000ポイズを越え
る場合は、内層回路の埋め込み不良を発生し、多層配線
板の形成が困難である。好ましい最低溶融粘度は、板厚
精度の点から1000ポイズ以上、回路埋め込み性の点
から60000ポイズ以下であり、より好ましくは20
00ポイズ以上40000ポイズ以下とする。
If the viscosity is less than 500 poise, the resin flows too much, and the thickness of the insulating layer cannot be kept constant in the wiring board, so that the characteristic impedance of the wiring cannot be kept constant. On the other hand, when the poise exceeds 100,000 poise, defective embedding of the inner layer circuit occurs, and it is difficult to form a multilayer wiring board. Preferred minimum melt viscosity is 1000 poise or more from the viewpoint of plate thickness accuracy, and 60,000 poise or less from the viewpoint of circuit embedding, more preferably 20 poise.
More than 00 poise and not more than 40000 poise.

【0015】本発明でいう樹脂の溶融粘度の測定は、例
えば、ダイナミックアナライザーRAD (レオメトリ
ックス社製)にて、φ25mmのパラレルプレートを使
用し、樹脂をφ25mmのディスク状に成形したものを
成形時と同条件で温度掃引して行うことができる。最低
溶融粘度とは、成形条件下での溶融粘度の最小値であ
り、そのときの温度を最低溶融粘度を示す温度とする。
The melt viscosity of the resin in the present invention is measured, for example, by using a dynamic analyzer RAD (manufactured by Rheometrics) using a φ25 mm parallel plate and molding the resin into a φ25 mm disk. The temperature can be swept under the same conditions as described above. The minimum melt viscosity is the minimum value of the melt viscosity under molding conditions, and the temperature at that time is defined as the temperature at which the minimum melt viscosity is exhibited.

【0016】本発明に用いられる熱硬化性樹脂としては
例えば、熱硬化性ポリフェニレンエーテル樹脂、フェノ
ール樹脂、低誘電率化エポキシ樹脂等の熱硬化性樹脂が
挙げられる。このような熱硬化性樹脂は、樹脂自体に変
性が施されたものであってもよく、樹脂単独及び/ また
は樹脂と多官能化合物との混合物であってもよい。ま
た、上記の熱硬化性樹脂の中でも、熱硬化性ポリフェニ
レンエーテル樹脂は溶融粘度の制御及び電気特性の観点
から特に好ましい。このような熱硬化性ポリフェニレン
エーテル樹脂としては、例えば特開平7−165846
号公報記載の組成物、特開平7−166049号公報記
載の組成物、特公平7−37567号公報記載の組成
物、特公平7−26013号公報記載の組成物等が挙げ
られる。
Examples of the thermosetting resin used in the present invention include thermosetting resins such as thermosetting polyphenylene ether resin, phenol resin, and epoxy resin having a low dielectric constant. Such a thermosetting resin may be a resin obtained by modifying the resin itself, or may be a resin alone and / or a mixture of a resin and a polyfunctional compound. Among the above thermosetting resins, a thermosetting polyphenylene ether resin is particularly preferable from the viewpoint of control of melt viscosity and electric characteristics. Examples of such a thermosetting polyphenylene ether resin include, for example, JP-A-7-165846.
JP-A-7-16649, a composition described in JP-B-7-37567, a composition described in JP-B-7-26013, and the like.

【0017】本発明では熱硬化性樹脂に、その用途に応
じて所望の性能を付与させる目的で本来の性質を損なわ
ない範囲の量の充填剤や添加剤を配合して用いることが
できる。充填剤は繊維状であっても粉末状であってもよ
く、シリカ、アルミナ、タルク、雲母、ガラスビーズ、
ガラス中空球等を挙げることができる。また、添加剤と
しては、難燃剤、酸化防止剤、熱安定剤、帯電防止剤、
顔料、染料、着色剤等が挙げられる。成形時の溶融粘度
を調節する目的で、可塑剤、増粘剤等を添加しても良
い。
In the present invention, the thermosetting resin may be mixed with fillers and additives in an amount not to impair the original properties, for the purpose of imparting a desired performance according to its use. The filler may be fibrous or powdery, and may be silica, alumina, talc, mica, glass beads,
Glass hollow spheres and the like can be given. In addition, as additives, flame retardants, antioxidants, heat stabilizers, antistatic agents,
Pigments, dyes, coloring agents, and the like are included. For the purpose of adjusting the melt viscosity during molding, a plasticizer, a thickener and the like may be added.

【0018】また本発明では、熱硬化性樹脂に成膜性を
付与する等の目的により、ポリスチレン系重合体、ある
いはジエン系樹脂等の熱可塑性樹脂をブレンドすること
ができる。
In the present invention, a thermoplastic resin such as a polystyrene-based polymer or a diene-based resin can be blended for the purpose of imparting a film-forming property to the thermosetting resin.

【0019】樹脂付き金属箔の樹脂膜あるいは樹脂シー
トの樹脂膜の厚さは、ハンドリングのしやすさから乾燥
後の厚さが10μm以上が好ましく、20μm以上がよ
り好ましく、30μm以上が最も好ましい。この膜厚が
極端に小さいと、積層ビルドアップ工法を行うことが困
難になる。
The thickness of the resin film of the resin-attached metal foil or the resin film of the resin sheet is preferably 10 μm or more, more preferably 20 μm or more, and most preferably 30 μm or more from the viewpoint of easy handling. When the film thickness is extremely small, it becomes difficult to perform the lamination build-up method.

【0020】熱硬化性樹脂膜を形成する方法としては、
どのような手段によっても良いが、好ましい方法として
は例えば、当該樹脂を溶剤に溶解もしくは分散させたワ
ニスを塗布、乾燥させる方法が挙げられる。溶剤は樹脂
の選択に応じて適したものが選ばれる。また、別の好ま
しい方法として、無溶剤で溶融成膜する方法も挙げられ
る。
As a method for forming a thermosetting resin film,
Although any method may be used, a preferable method is, for example, a method of applying and drying a varnish in which the resin is dissolved or dispersed in a solvent. A suitable solvent is selected according to the selection of the resin. Further, as another preferable method, a method of forming a melt film without using a solvent can also be mentioned.

【0021】内層材、樹脂付き金属箔あるいは樹脂シー
トに回路を形成する方法としては、どのような手段によ
っても良いが、通常、金属箔のエッチングあるいはめっ
きにより行われる。導電性ペースト等を用いた印刷によ
り、樹脂表面に回路を形成することもできる。
The circuit may be formed on the inner layer material, the resin-attached metal foil or the resin sheet by any means, but is usually performed by etching or plating of the metal foil. A circuit can be formed on the resin surface by printing using a conductive paste or the like.

【0022】本発明における樹脂の最低溶融粘度を50
0ポイズ以上100000ポイズ以下、好ましくは10
00ポイズ以上60000ポイズ以下、より好ましくは
2000ポイズ以上40000ポイズ以下に調節する方
法は特に制限されない。例えば樹脂の化学構造、分子量
あるいは組成の調節による方法が挙げられる。溶融粘度
が極端に低い熱硬化性樹脂を熱処理あるいは光化学的処
理等各樹脂に適した方法により部分的に硬化させ、溶融
粘度を調節することも有効な手段として挙げられる。例
えば、エポキシ樹脂のような溶融粘度の低い樹脂はBス
テージ状態として、最低溶融粘度を規定の範囲内に調節
することができる。
The minimum melt viscosity of the resin in the present invention is 50
0 poise to 100000 poise, preferably 10 poise
There is no particular limitation on the method of adjusting the pressure from 00 poise to 60000 poise, more preferably from 2000 poise to 40000 poise. For example, a method by adjusting the chemical structure, molecular weight, or composition of the resin may be used. Adjusting the melt viscosity by partially curing a thermosetting resin having an extremely low melt viscosity by a method suitable for each resin such as heat treatment or photochemical treatment is also an effective means. For example, a resin having a low melt viscosity such as an epoxy resin can be in a B-stage state and the minimum melt viscosity can be adjusted within a specified range.

【0023】また、成形条件により最低溶融粘度を変化
させることもできる。最低溶融粘度は昇温速度により変
化する。また昇温中に保持温度を設ける場合は、保持温
度及び、保持時間によっても最低溶融粘度を変化させる
ことができる。成形条件は樹脂の組成によって考慮すれ
ばよい。
Further, the minimum melt viscosity can be changed depending on molding conditions. The minimum melt viscosity changes depending on the heating rate. When the holding temperature is provided during the temperature rise, the minimum melt viscosity can be changed depending on the holding temperature and the holding time. The molding conditions may be considered depending on the composition of the resin.

【0024】樹脂付き金属箔あるいは樹脂シートの樹脂
が熱硬化性ポリフェニレンエーテル系樹脂組成物である
場合は、成形を以下の条件で行うことが望ましい。すな
わち、成形温度は150〜250℃が好ましい。より好
ましくは160〜230℃、更に好ましくは170〜2
20℃とする。150℃未満では樹脂が充分に硬化する
までに時間がかかり好ましくない。一方、250℃を超
えると、銅箔の酸化変質等が起こる場合があり、信頼性
に影響を与えるために好ましくない。
When the resin of the resin-attached metal foil or the resin sheet is a thermosetting polyphenylene ether-based resin composition, it is desirable to perform molding under the following conditions. That is, the molding temperature is preferably from 150 to 250 ° C. More preferably 160 to 230 ° C, still more preferably 170 to 2
20 ° C. If the temperature is lower than 150 ° C., it takes time until the resin is sufficiently cured, which is not preferable. On the other hand, if the temperature exceeds 250 ° C., the copper foil may be oxidized and deteriorated, which is not preferable because it affects reliability.

【0025】成形圧力は5〜60kg/cm2 が好まし
い。5kg/cm2 未満では埋め込み不良を生じたり、
板厚精度が損なわれる場合がある。一方、60kg/c
2を超えると、樹脂が流れすぎたり、成形ひずみが生
じて信頼性を損なう場合がある。
The molding pressure is preferably 5 to 60 kg / cm 2 . If it is less than 5 kg / cm 2 , poor filling may occur,
The thickness accuracy may be impaired. On the other hand, 60kg / c
If it exceeds m 2 , the resin may flow too much, or molding distortion may occur, thereby impairing reliability.

【0026】また、昇温速度は1〜10℃/分が好まし
い。より好ましくは3〜7℃/分とする。1℃/分未満
では溶融粘度が充分に低くならず、埋め込み不良を生じ
る場合があり、10℃/分を越える場合は最低溶融粘度
が低くなりすぎて、板厚精度が損なわれる場合がある。
The heating rate is preferably 1 to 10 ° C./min. More preferably, it is 3 to 7 ° C./min. If it is less than 1 ° C./min, the melt viscosity may not be sufficiently low, resulting in poor embedding. If it is more than 10 ° C./min, the minimum melt viscosity may be too low and the plate thickness accuracy may be impaired.

【0027】また昇温中に保持温度を設けることによ
り、溶融粘度を調節する場合は、樹脂温度が(最低溶融
粘度を示す温度−50℃)以上(最低溶融粘度を示す温
度+30℃)以下の温度範囲の温度において、10分以
上定温で保持した後、硬化温度まで昇温することが好ま
しい。このように最低溶融粘度に達する前に一定温度で
保持することにより、溶融粘度が低くなる前に硬化反応
を進め、最低溶融粘度を高くすることができる。また最
低溶融粘度付近で保持することにより、急激な硬化を抑
制し、適当な溶融粘度で充分な埋め込み性を得ることが
できる。保持温度及び時間は樹脂の組成及び目的に応じ
て考慮すればよい。
When the melt viscosity is adjusted by providing a holding temperature during the heating, the resin temperature must be not less than (the temperature at which the lowest melt viscosity is −50 ° C.) or more (the temperature at which the lowest melt viscosity is + 30 ° C.) or less. After maintaining the temperature at a constant temperature for 10 minutes or more at a temperature in the temperature range, it is preferable to raise the temperature to the curing temperature. By maintaining the temperature at a constant temperature before reaching the minimum melt viscosity, the curing reaction can be advanced before the melt viscosity decreases, and the minimum melt viscosity can be increased. In addition, by maintaining the viscosity around the minimum melt viscosity, rapid hardening can be suppressed, and sufficient filling properties can be obtained with an appropriate melt viscosity. The holding temperature and time may be considered according to the composition and purpose of the resin.

【0028】成形圧力については、樹脂温度が(最低溶
融粘度を示す温度−80℃)以上最低溶融粘度を示す温
度以下の温度範囲の温度に達するまで5〜20kg/c
2、この温度を越えた温度では20〜60kg/cm
2 で加圧して成形することもできる。樹脂の溶融が不十
分な状態では低圧とし、溶融粘度が充分低くなったら加
圧することにより、板厚精度及び埋め込み性に優れた多
層配線板を得ることができる。
The molding pressure is from 5 to 20 kg / c until the resin temperature reaches a temperature in a temperature range from (the temperature at which the lowest melt viscosity is −80 ° C.) to the temperature at which the lowest melt viscosity is attained.
m 2 , 20-60 kg / cm at temperatures above this temperature
Pressing at 2 can also be used for molding. By applying a low pressure when the resin is not sufficiently melted and applying a pressure when the melt viscosity becomes sufficiently low, it is possible to obtain a multilayer wiring board having excellent thickness accuracy and embedding property.

【0029】一般に、積層成形には絶縁層内のボイドの
発生を防ぎ、信頼性の高い基板を得るため真空プレスが
よく用いられる。この場合、真空度は50torr以下
とすることが好ましい。
In general, a vacuum press is often used for lamination molding to prevent the occurrence of voids in the insulating layer and to obtain a highly reliable substrate. In this case, the degree of vacuum is preferably set to 50 torr or less.

【0030】樹脂付き金属箔の樹脂あるいは樹脂シート
の樹脂を成形すると同時に、内層スルーホールを樹脂で
充填する場合については、樹脂が最低溶融粘度に達した
ときに、スルーホールを樹脂で埋め込むに十分な圧力が
かかるように行う。厚み精度等の観点から、昇温中に保
持温度を設けてもよい。
In the case where the resin of the metal foil with resin or the resin of the resin sheet is formed and the inner through hole is filled with the resin at the same time, when the resin reaches the minimum melt viscosity, the through hole is sufficiently filled with the resin. It is performed so that an appropriate pressure is applied. From the viewpoint of thickness accuracy and the like, a holding temperature may be provided during the temperature rise.

【0031】〔実施例〕以下、本発明の実施例を比較例
と対比して説明し、本発明の効果を明確にする。
[Embodiments] Hereinafter, embodiments of the present invention will be described in comparison with comparative examples to clarify the effects of the present invention.

【0032】この比較試験における樹脂の溶融粘度測定
法及び基板の評価法を以下に示す。 (1)樹脂の溶融粘度 レオメトリックス社製ダイナミックアナライザーRAD
にて、φ25mmのパラレルプレートを使用して行っ
た。 (2)板厚精度 510mm*340mmの基板5枚について、それ
ぞれ10ヶ所の厚みをマイクロメーターを用いて測定し
た。
The method for measuring the melt viscosity of the resin and the method for evaluating the substrate in this comparative test are described below. (1) Melt viscosity of resin Dynamic analyzer RAD manufactured by Rheometrics
, Using a parallel plate of φ25 mm. (2) Plate Thickness Accuracy The thickness of each of ten substrates of 510 mm * 340 mm was measured at 10 locations using a micrometer.

【0033】板厚ばらつきR:最大厚みと最小厚みの差 基板をエポキシ樹脂で包埋し、研磨した後、断面を
観察し、絶縁層厚み(樹脂付き銅箔樹脂部)を測定し
た。
Thickness variation R: difference between maximum thickness and minimum thickness After embedding and polishing the substrate with epoxy resin, the cross section was observed and the thickness of the insulating layer (the resin-coated copper foil resin portion) was measured.

【0034】厚みばらつきr:最大厚みと最小厚みの差 (3)埋め込み性 基板をエポキシ樹脂で包埋し、研磨した後、断面を観察
した。 (4)はんだ耐熱試験 基板を50mm角に切り出し、片面は銅箔全て、片面は
半分の銅箔を除去した。これを沸騰蒸留水中で1時間煮
沸し、冷却した後、290℃のはんだ浴に2分間、浸積
した。
Thickness variation r: difference between maximum thickness and minimum thickness (3) Embedding property After embedding and polishing a substrate with an epoxy resin, a cross section was observed. (4) Solder heat resistance test The substrate was cut out into a 50 mm square, and one side of the copper foil was removed, and one side was removed of half the copper foil. This was boiled in boiling distilled water for 1 hour, cooled, and immersed in a solder bath at 290 ° C. for 2 minutes.

【0035】(実施例1)熱硬化性樹脂として、熱硬化
性ポリフェニレンエーテル系樹脂を用い、金属箔として
厚さ12μmのプリント基板用電解銅箔を用いて、多層
配線板用樹脂付き銅箔を作成した。樹脂の厚さは60μ
mとした。一方、内層材として、18μmの銅箔を両面
に張った0.7mm厚の両面銅張り積層板(ガラスクロ
スに熱硬化性ポリフェニレンエーテル系樹脂を含浸して
得られたプリプレグ使用)を作成し、この内層材の両面
に残銅率50%の回路をそれぞれ形成した。
Example 1 A thermosetting polyphenylene ether-based resin was used as the thermosetting resin, and a 12 μm thick electrolytic copper foil for a printed circuit board was used as a metal foil. Created. Resin thickness is 60μ
m. On the other hand, as an inner layer material, a 0.7 mm thick double-sided copper-clad laminate (using a prepreg obtained by impregnating a glass cloth with a thermosetting polyphenylene ether-based resin) having 18 μm copper foil stretched on both sides was prepared. Circuits having a residual copper ratio of 50% were formed on both surfaces of the inner layer material.

【0036】その内層材の両面に上記樹脂付き銅箔を積
層し、プレスした。プレスは昇温速度3℃/分で、20
0℃まで昇温し、60分硬化させて行った。成形圧力は
30kg/cm2 とした。このときの樹脂の最低溶融粘
度は31000ポイズであった。
The resin-coated copper foil was laminated on both surfaces of the inner layer material and pressed. The press was heated at a rate of 3 ° C / min.
The temperature was raised to 0 ° C., and curing was performed for 60 minutes. The molding pressure was 30 kg / cm 2 . At this time, the minimum melt viscosity of the resin was 31,000 poise.

【0037】(実施例2)熱硬化性樹脂として、実施例
1とは異なる組成の熱硬化性ポリフェニレンエーテル系
樹脂を用い、金属箔として厚さ12μmのプリント基板
用電解銅箔を用いて、多層配線板用樹脂付き銅箔を作成
した。樹脂の厚さは60μmとした。実施例1で得られ
た残銅率50%の回路を形成した両面銅張り積層板(内
層板)の両面に上記樹脂付き銅箔を積層し、プレスし
た。プレスは昇温速度3℃/分で、200℃まで昇温
し、60分硬化させて行った。成形圧力は30kg/c
2 とした。このときの樹脂の最低溶融粘度は1400
0ポイズであった。
(Example 2) As a thermosetting resin, a thermosetting polyphenylene ether resin having a composition different from that of Example 1 was used, and a 12 µm-thick electrolytic copper foil for a printed board was used as a metal foil. A copper foil with a resin for a wiring board was prepared. The thickness of the resin was 60 μm. The copper foil with resin was laminated on both surfaces of the double-sided copper-clad laminate (inner plate) on which a circuit having a residual copper ratio of 50% obtained in Example 1 was formed, and pressed. The press was carried out at a heating rate of 3 ° C./min, by heating to 200 ° C. and curing for 60 minutes. Molding pressure is 30kg / c
It was m 2. The minimum melt viscosity of the resin at this time was 1400
It was 0 poise.

【0038】(実施例3)熱硬化性樹脂として、実施例
1及び実施例2とは異なる組成の熱硬化性ポリフェニレ
ンエーテル系樹脂を用い、金属箔として厚さ12μmの
プリント基板用電解銅箔を用いて、多層配線板用樹脂付
き銅箔を作成した。樹脂の厚さは60μmとした。実施
例1で得られた残銅率50%の回路を形成した両面銅張
り積層板の両面に上記樹脂付き銅箔を積層し、プレスし
た。プレスは昇温速度3℃/分で、165℃まで昇温
し、20分保持した後、再び3℃/分で200℃まで昇
温して、60分硬化させて行った。成形圧力は樹脂温度
が110℃に達するまでは10kg/cm2 とし、その
後30kg/cm2 に昇圧した。このときの樹脂の最低
溶融粘度は7000ポイズ、最低溶融粘度点温度は16
3℃であった。
Example 3 A thermosetting polyphenylene ether resin having a composition different from that of Examples 1 and 2 was used as the thermosetting resin, and a 12 μm-thick electrolytic copper foil for a printed board was used as a metal foil. This was used to prepare a copper foil with resin for a multilayer wiring board. The thickness of the resin was 60 μm. The copper foil with resin was laminated on both sides of the double-sided copper-clad laminate on which a circuit having a residual copper ratio of 50% obtained in Example 1 was formed, and pressed. The press was heated at a rate of 3 ° C./min to 165 ° C., held for 20 minutes, then again heated to 200 ° C. at 3 ° C./min and cured for 60 minutes. The molding pressure was 10 kg / cm 2 until the resin temperature reached 110 ° C., and then increased to 30 kg / cm 2 . At this time, the minimum melt viscosity of the resin was 7000 poise, and the minimum melt viscosity point temperature was 16
3 ° C.

【0039】(比較例1)熱硬化性樹脂として、銅張り
積層板用エポキシ樹脂を用い、金属箔として厚さ12μ
mのプリント基板用電解銅箔を用いて、多層配線板用樹
脂付き銅箔を作成した。樹脂の厚さは60μmとした。
実施例1で得られた残銅率50%の回路を形成した両面
銅張り積層板の両面に上記樹脂付き銅箔を積層し、プレ
スした。プレスは昇温速度1.5℃/分で、170℃ま
で昇温して、120分硬化させて行った。成形圧力は2
0kg/cm2 とした。このときの樹脂の最低溶融粘度
は200ポイズであった。
Comparative Example 1 An epoxy resin for a copper-clad laminate was used as a thermosetting resin, and a 12 μm thick metal foil was used.
m, a resin-coated copper foil for a multilayer wiring board was prepared using the m. The thickness of the resin was 60 μm.
The copper foil with resin was laminated on both sides of the double-sided copper-clad laminate on which a circuit having a residual copper ratio of 50% obtained in Example 1 was formed, and pressed. The press was carried out at a heating rate of 1.5 ° C./min, by heating to 170 ° C. and curing for 120 minutes. Molding pressure is 2
0 kg / cm 2 . At this time, the minimum melt viscosity of the resin was 200 poise.

【0040】(比較例2)熱硬化性樹脂として、実施例
とは異なる組成の熱硬化性ポリフェニレンエーテル系樹
脂を用い、金属箔として厚さ12μmのプリント基板用
電解銅箔を用いて、多層配線板用樹脂付き銅箔を作成し
た。樹脂の厚さは60μmとした。プレスは昇温速度
0.5℃/分で、200℃まで昇温して、60分硬化さ
せて行った。成形圧力は30kg/cm2 とした。この
ときの樹脂の最低溶融粘度は120000ポイズであっ
た。
(Comparative Example 2) A multilayer wiring using a thermosetting polyphenylene ether-based resin having a composition different from that of the embodiment as the thermosetting resin and an electrolytic copper foil for a printed board having a thickness of 12 μm as a metal foil. A copper foil with board resin was prepared. The thickness of the resin was 60 μm. The press was carried out at a heating rate of 0.5 ° C./min, by heating to 200 ° C. and curing for 60 minutes. The molding pressure was 30 kg / cm 2 . At this time, the minimum melt viscosity of the resin was 120,000 poise.

【0041】これらの実施例及び比較例について、
(1)〜(4)の項目について評価した結果を表1に示
した。実施例1〜3は、板厚精度と回路埋め込み性の両
方に優れるばかりでなく、逐次多層配線板として実用に
耐え得るはんだ耐熱性を有している。
With respect to these examples and comparative examples,
Table 1 shows the results of the evaluation of the items (1) to (4). Examples 1 to 3 are not only excellent in both thickness accuracy and circuit embedding property, but also have soldering heat resistance enough to withstand practical use as a sequential multilayer wiring board.

【0042】[0042]

【表1】 [Table 1]

【0043】[0043]

【発明の効果】以上説明したように、本発明の請求項1
に係る逐次多層配線板の製造方法によれば、内層材に積
層体を重ねて熱硬化性樹脂で接着しつつ多層に成形する
に際し、当該熱硬化性樹脂の最低溶融粘度を500ポイ
ズ以上100000ポイズ以下の範囲に規制したため、
成形時の樹脂の流れを適正に維持できて、板厚精度に優
れ、かつ埋め込み性が良好である信頼性の高い多層配線
板を得られるという効果を奏する。
As described above, according to the first aspect of the present invention,
According to the method for manufacturing a sequential multilayer wiring board according to the above, when forming a multilayer while laminating the laminate on the inner layer material and bonding with a thermosetting resin, the minimum melt viscosity of the thermosetting resin is 500 poise to 100,000 poise Because we restricted to the following range,
The flow of the resin at the time of molding can be appropriately maintained, and the effect of obtaining a highly reliable multilayer wiring board having excellent thickness accuracy and good embedding property can be obtained.

【0044】また、請求項2に係る発明によれば、当該
熱硬化性樹脂として熱硬化性ポリフェニレンエーテル系
樹脂組成物を用いることで、上記効果をより確実に得る
ことができる。
According to the second aspect of the present invention, the above effects can be more reliably obtained by using a thermosetting polyphenylene ether-based resin composition as the thermosetting resin.

【0045】従って、本発明により製造される逐次多層
配線板は、高速ディジタル回路及び高周波アナログ回路
に好適である。
Accordingly, the sequential multilayer wiring board manufactured according to the present invention is suitable for high-speed digital circuits and high-frequency analog circuits.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 プレス熱板間に、内層材と熱硬化性樹脂
付き金属箔または熱硬化性樹脂シート及び金属箔からな
る積層体とを重ねて成形するに際し、前記熱硬化性樹脂
の最低溶融粘度を500ポイズ以上100000ポイズ
以下の範囲とすることを特徴とする逐次多層配線板の製
造方法。
When the inner layer material and a metal foil with a thermosetting resin or a laminate made of a thermosetting resin sheet and a metal foil are stacked and molded between press hot plates, a minimum melting of the thermosetting resin is performed. A method for manufacturing a sequential multilayer wiring board, wherein the viscosity is in the range of 500 poise to 100,000 poise.
【請求項2】 熱硬化性樹脂付き金属箔または熱硬化性
樹脂シートの樹脂が熱硬化性ポリフェニレンエーテル系
樹脂組成物であることを特徴とする請求項1記載の逐次
多層配線板の製造方法。
2. The method according to claim 1, wherein the resin of the metal foil with thermosetting resin or the thermosetting resin sheet is a thermosetting polyphenylene ether-based resin composition.
JP31736497A 1997-11-18 1997-11-18 Production of sequential multilayer wiring board Withdrawn JPH11150366A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP31736497A JPH11150366A (en) 1997-11-18 1997-11-18 Production of sequential multilayer wiring board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP31736497A JPH11150366A (en) 1997-11-18 1997-11-18 Production of sequential multilayer wiring board

Publications (1)

Publication Number Publication Date
JPH11150366A true JPH11150366A (en) 1999-06-02

Family

ID=18087427

Family Applications (1)

Application Number Title Priority Date Filing Date
JP31736497A Withdrawn JPH11150366A (en) 1997-11-18 1997-11-18 Production of sequential multilayer wiring board

Country Status (1)

Country Link
JP (1) JPH11150366A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002271019A (en) * 2001-03-08 2002-09-20 Ibiden Co Ltd Manufacturing method for laminated wiring board
JP2002353583A (en) * 2001-05-23 2002-12-06 Matsushita Electric Works Ltd Resin-attached metal foil and multilayered printed wiring board
JP2012104521A (en) * 2010-11-05 2012-05-31 Fujitsu Ltd Method of manufacturing circuit board
JP2017057352A (en) * 2015-09-18 2017-03-23 三菱瓦斯化学株式会社 Prepreg

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002271019A (en) * 2001-03-08 2002-09-20 Ibiden Co Ltd Manufacturing method for laminated wiring board
JP2002353583A (en) * 2001-05-23 2002-12-06 Matsushita Electric Works Ltd Resin-attached metal foil and multilayered printed wiring board
JP2012104521A (en) * 2010-11-05 2012-05-31 Fujitsu Ltd Method of manufacturing circuit board
JP2017057352A (en) * 2015-09-18 2017-03-23 三菱瓦斯化学株式会社 Prepreg

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