JPH10326698A5 - - Google Patents
Info
- Publication number
- JPH10326698A5 JPH10326698A5 JP1997140982A JP14098297A JPH10326698A5 JP H10326698 A5 JPH10326698 A5 JP H10326698A5 JP 1997140982 A JP1997140982 A JP 1997140982A JP 14098297 A JP14098297 A JP 14098297A JP H10326698 A5 JPH10326698 A5 JP H10326698A5
- Authority
- JP
- Japan
- Prior art keywords
- waveform
- frequency
- synthesis circuit
- setting register
- mhz
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14098297A JP3808973B2 (ja) | 1996-05-15 | 1997-05-14 | プラズマ処理装置 |
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14659196 | 1996-05-15 | ||
| JP9-95099 | 1997-03-28 | ||
| JP9509997 | 1997-03-28 | ||
| JP8-146591 | 1997-03-28 | ||
| JP14098297A JP3808973B2 (ja) | 1996-05-15 | 1997-05-14 | プラズマ処理装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPH10326698A JPH10326698A (ja) | 1998-12-08 |
| JPH10326698A5 true JPH10326698A5 (enrdf_load_html_response) | 2005-03-17 |
| JP3808973B2 JP3808973B2 (ja) | 2006-08-16 |
Family
ID=27307746
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14098297A Expired - Lifetime JP3808973B2 (ja) | 1996-05-15 | 1997-05-14 | プラズマ処理装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3808973B2 (enrdf_load_html_response) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3377773B2 (ja) * | 2000-03-24 | 2003-02-17 | 三菱重工業株式会社 | 放電電極への給電方法、高周波プラズマ発生方法および半導体製造方法 |
| TW507256B (en) | 2000-03-13 | 2002-10-21 | Mitsubishi Heavy Ind Ltd | Discharge plasma generating method, discharge plasma generating apparatus, semiconductor device fabrication method, and semiconductor device fabrication apparatus |
| US7431857B2 (en) * | 2003-08-15 | 2008-10-07 | Applied Materials, Inc. | Plasma generation and control using a dual frequency RF source |
| US7510665B2 (en) | 2003-08-15 | 2009-03-31 | Applied Materials, Inc. | Plasma generation and control using dual frequency RF signals |
| EP1753011B1 (de) | 2005-08-13 | 2012-10-03 | HÜTTINGER Elektronik GmbH + Co. KG | Verfahren zur Erzeugung von Ansteuersignalen für HF-Leistungsgeneratoren |
| JP4478111B2 (ja) * | 2006-01-16 | 2010-06-09 | アドバンス・デザイン株式会社 | 高周波電源装置 |
| DE102006052061B4 (de) * | 2006-11-04 | 2009-04-23 | Hüttinger Elektronik Gmbh + Co. Kg | Verfahren zur Ansteuerung von zumindest zwei HF-Leistungsgeneratoren |
| JP2013250231A (ja) | 2012-06-04 | 2013-12-12 | Daihen Corp | 位相差検出装置、位相差検出プログラム及び位相差検出装置を用いたプラズマ処理システム |
| CN104871430B (zh) * | 2012-12-18 | 2018-01-12 | 通快许廷格两合公司 | 用于产生高频功率的方法和具有用于给负载供送功率的功率转换器的功率供送系统 |
| WO2015029937A1 (ja) * | 2013-08-26 | 2015-03-05 | 株式会社日立国際電気 | プラズマ生成用電源装置 |
| JP6541623B2 (ja) * | 2016-06-20 | 2019-07-10 | 東京エレクトロン株式会社 | プラズマ処理装置、及び波形補正方法 |
-
1997
- 1997-05-14 JP JP14098297A patent/JP3808973B2/ja not_active Expired - Lifetime