JPH10189455A - 成膜装置および成膜方法 - Google Patents
成膜装置および成膜方法Info
- Publication number
- JPH10189455A JPH10189455A JP35814796A JP35814796A JPH10189455A JP H10189455 A JPH10189455 A JP H10189455A JP 35814796 A JP35814796 A JP 35814796A JP 35814796 A JP35814796 A JP 35814796A JP H10189455 A JPH10189455 A JP H10189455A
- Authority
- JP
- Japan
- Prior art keywords
- gas
- film forming
- flow rate
- hole nozzle
- nozzle
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims abstract description 19
- 239000007789 gas Substances 0.000 claims abstract description 239
- 239000012159 carrier gas Substances 0.000 claims abstract description 24
- 239000000758 substrate Substances 0.000 claims abstract description 23
- 230000015572 biosynthetic process Effects 0.000 claims description 15
- 230000007423 decrease Effects 0.000 claims 1
- 235000012431 wafers Nutrition 0.000 abstract description 47
- 239000010408 film Substances 0.000 description 57
- 238000000151 deposition Methods 0.000 description 13
- 230000008021 deposition Effects 0.000 description 13
- 239000011295 pitch Substances 0.000 description 7
- 238000004518 low pressure chemical vapour deposition Methods 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 229910052698 phosphorus Inorganic materials 0.000 description 4
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 4
- 229920005591 polysilicon Polymers 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 238000011144 upstream manufacturing Methods 0.000 description 4
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 3
- 239000011574 phosphorus Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 238000007664 blowing Methods 0.000 description 2
- 229910001873 dinitrogen Inorganic materials 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP35814796A JPH10189455A (ja) | 1996-12-27 | 1996-12-27 | 成膜装置および成膜方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP35814796A JPH10189455A (ja) | 1996-12-27 | 1996-12-27 | 成膜装置および成膜方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH10189455A true JPH10189455A (ja) | 1998-07-21 |
| JPH10189455A5 JPH10189455A5 (cg-RX-API-DMAC7.html) | 2004-12-02 |
Family
ID=18457793
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP35814796A Pending JPH10189455A (ja) | 1996-12-27 | 1996-12-27 | 成膜装置および成膜方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH10189455A (cg-RX-API-DMAC7.html) |
-
1996
- 1996-12-27 JP JP35814796A patent/JPH10189455A/ja active Pending
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A977 | Report on retrieval |
Effective date: 20040921 Free format text: JAPANESE INTERMEDIATE CODE: A971007 |
|
| A131 | Notification of reasons for refusal |
Effective date: 20041005 Free format text: JAPANESE INTERMEDIATE CODE: A131 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20041203 |
|
| A131 | Notification of reasons for refusal |
Effective date: 20050111 Free format text: JAPANESE INTERMEDIATE CODE: A131 |
|
| A02 | Decision of refusal |
Effective date: 20050517 Free format text: JAPANESE INTERMEDIATE CODE: A02 |