JPH10135102A5 - - Google Patents

Info

Publication number
JPH10135102A5
JPH10135102A5 JP1996283814A JP28381496A JPH10135102A5 JP H10135102 A5 JPH10135102 A5 JP H10135102A5 JP 1996283814 A JP1996283814 A JP 1996283814A JP 28381496 A JP28381496 A JP 28381496A JP H10135102 A5 JPH10135102 A5 JP H10135102A5
Authority
JP
Japan
Prior art keywords
electron beam
pattern
electron
optical system
exposure apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1996283814A
Other languages
English (en)
Japanese (ja)
Other versions
JPH10135102A (ja
JP3728031B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from JP28381496A external-priority patent/JP3728031B2/ja
Priority to JP28381496A priority Critical patent/JP3728031B2/ja
Priority to US08/954,520 priority patent/US6225637B1/en
Priority to DE69727112T priority patent/DE69727112T2/de
Priority to EP97118465A priority patent/EP0838837B1/en
Priority to KR1019970055139A priority patent/KR100278045B1/ko
Publication of JPH10135102A publication Critical patent/JPH10135102A/ja
Publication of JPH10135102A5 publication Critical patent/JPH10135102A5/ja
Publication of JP3728031B2 publication Critical patent/JP3728031B2/ja
Application granted granted Critical
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP28381496A 1996-10-25 1996-10-25 電子ビーム露光装置及び電子ビーム露光用マスク Expired - Fee Related JP3728031B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP28381496A JP3728031B2 (ja) 1996-10-25 1996-10-25 電子ビーム露光装置及び電子ビーム露光用マスク
US08/954,520 US6225637B1 (en) 1996-10-25 1997-10-20 Electron beam exposure apparatus
DE69727112T DE69727112T2 (de) 1996-10-25 1997-10-23 Elektronenstrahl-Belichtungsgerät und Belichtungsverfahren
EP97118465A EP0838837B1 (en) 1996-10-25 1997-10-23 Electron beam exposure apparatus and method
KR1019970055139A KR100278045B1 (ko) 1996-10-25 1997-10-25 전자빔노광장치 및 전자빔노광방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP28381496A JP3728031B2 (ja) 1996-10-25 1996-10-25 電子ビーム露光装置及び電子ビーム露光用マスク

Publications (3)

Publication Number Publication Date
JPH10135102A JPH10135102A (ja) 1998-05-22
JPH10135102A5 true JPH10135102A5 (enExample) 2004-07-15
JP3728031B2 JP3728031B2 (ja) 2005-12-21

Family

ID=17670503

Family Applications (1)

Application Number Title Priority Date Filing Date
JP28381496A Expired - Fee Related JP3728031B2 (ja) 1996-10-25 1996-10-25 電子ビーム露光装置及び電子ビーム露光用マスク

Country Status (1)

Country Link
JP (1) JP3728031B2 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6376847B1 (en) 1998-08-24 2002-04-23 Matsushia Electric Industrial Co., Ltd. Charged particle lithography method and system
JP2000173889A (ja) 1998-12-02 2000-06-23 Canon Inc 電子線露光装置、電子レンズ、ならびにデバイス製造方法
JP2000173900A (ja) 1998-12-08 2000-06-23 Canon Inc 電子ビーム照明装置、および該照明装置を用いた電子ビーム露光装置
JP2000182550A (ja) 1998-12-18 2000-06-30 Canon Inc 電子銃および電子銃を用いる照明装置または電子ビーム露光装置
EP1565769A1 (en) * 2002-11-21 2005-08-24 Carl Zeiss SMT AG Projection lens with non- round diaphragm for microlithography
JP4843425B2 (ja) * 2006-09-06 2011-12-21 エルピーダメモリ株式会社 可変成形型電子ビーム描画装置
JP2017053888A (ja) * 2015-09-07 2017-03-16 キヤノン株式会社 露光方法および露光装置、ならびに物品の製造方法

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