JP3728031B2 - 電子ビーム露光装置及び電子ビーム露光用マスク - Google Patents

電子ビーム露光装置及び電子ビーム露光用マスク Download PDF

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Publication number
JP3728031B2
JP3728031B2 JP28381496A JP28381496A JP3728031B2 JP 3728031 B2 JP3728031 B2 JP 3728031B2 JP 28381496 A JP28381496 A JP 28381496A JP 28381496 A JP28381496 A JP 28381496A JP 3728031 B2 JP3728031 B2 JP 3728031B2
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JP
Japan
Prior art keywords
electron beam
electron
optical system
beam exposure
exposure apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP28381496A
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English (en)
Japanese (ja)
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JPH10135102A (ja
JPH10135102A5 (enExample
Inventor
茂 寺島
真人 村木
紳 松井
明 三宅
昌彦 奥貫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
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Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP28381496A priority Critical patent/JP3728031B2/ja
Priority to US08/954,520 priority patent/US6225637B1/en
Priority to DE69727112T priority patent/DE69727112T2/de
Priority to EP97118465A priority patent/EP0838837B1/en
Priority to KR1019970055139A priority patent/KR100278045B1/ko
Publication of JPH10135102A publication Critical patent/JPH10135102A/ja
Publication of JPH10135102A5 publication Critical patent/JPH10135102A5/ja
Application granted granted Critical
Publication of JP3728031B2 publication Critical patent/JP3728031B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electron Beam Exposure (AREA)
JP28381496A 1996-10-25 1996-10-25 電子ビーム露光装置及び電子ビーム露光用マスク Expired - Fee Related JP3728031B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP28381496A JP3728031B2 (ja) 1996-10-25 1996-10-25 電子ビーム露光装置及び電子ビーム露光用マスク
US08/954,520 US6225637B1 (en) 1996-10-25 1997-10-20 Electron beam exposure apparatus
DE69727112T DE69727112T2 (de) 1996-10-25 1997-10-23 Elektronenstrahl-Belichtungsgerät und Belichtungsverfahren
EP97118465A EP0838837B1 (en) 1996-10-25 1997-10-23 Electron beam exposure apparatus and method
KR1019970055139A KR100278045B1 (ko) 1996-10-25 1997-10-25 전자빔노광장치 및 전자빔노광방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP28381496A JP3728031B2 (ja) 1996-10-25 1996-10-25 電子ビーム露光装置及び電子ビーム露光用マスク

Publications (3)

Publication Number Publication Date
JPH10135102A JPH10135102A (ja) 1998-05-22
JPH10135102A5 JPH10135102A5 (enExample) 2004-07-15
JP3728031B2 true JP3728031B2 (ja) 2005-12-21

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ID=17670503

Family Applications (1)

Application Number Title Priority Date Filing Date
JP28381496A Expired - Fee Related JP3728031B2 (ja) 1996-10-25 1996-10-25 電子ビーム露光装置及び電子ビーム露光用マスク

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JP (1) JP3728031B2 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6376847B1 (en) 1998-08-24 2002-04-23 Matsushia Electric Industrial Co., Ltd. Charged particle lithography method and system
JP2000173889A (ja) 1998-12-02 2000-06-23 Canon Inc 電子線露光装置、電子レンズ、ならびにデバイス製造方法
JP2000173900A (ja) 1998-12-08 2000-06-23 Canon Inc 電子ビーム照明装置、および該照明装置を用いた電子ビーム露光装置
JP2000182550A (ja) 1998-12-18 2000-06-30 Canon Inc 電子銃および電子銃を用いる照明装置または電子ビーム露光装置
EP1565769A1 (en) * 2002-11-21 2005-08-24 Carl Zeiss SMT AG Projection lens with non- round diaphragm for microlithography
JP4843425B2 (ja) * 2006-09-06 2011-12-21 エルピーダメモリ株式会社 可変成形型電子ビーム描画装置
JP2017053888A (ja) * 2015-09-07 2017-03-16 キヤノン株式会社 露光方法および露光装置、ならびに物品の製造方法

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Publication number Publication date
JPH10135102A (ja) 1998-05-22

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