JPH0974064A5 - - Google Patents

Info

Publication number
JPH0974064A5
JPH0974064A5 JP1996144404A JP14440496A JPH0974064A5 JP H0974064 A5 JPH0974064 A5 JP H0974064A5 JP 1996144404 A JP1996144404 A JP 1996144404A JP 14440496 A JP14440496 A JP 14440496A JP H0974064 A5 JPH0974064 A5 JP H0974064A5
Authority
JP
Japan
Prior art keywords
charged particle
particle beam
mask
small
region
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1996144404A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0974064A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP8144404A priority Critical patent/JPH0974064A/ja
Priority claimed from JP8144404A external-priority patent/JPH0974064A/ja
Priority to US08/670,436 priority patent/US5989753A/en
Publication of JPH0974064A publication Critical patent/JPH0974064A/ja
Publication of JPH0974064A5 publication Critical patent/JPH0974064A5/ja
Pending legal-status Critical Current

Links

JP8144404A 1995-06-26 1996-06-06 荷電粒子線によるパターン転写方法及び転写装置 Pending JPH0974064A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP8144404A JPH0974064A (ja) 1995-06-26 1996-06-06 荷電粒子線によるパターン転写方法及び転写装置
US08/670,436 US5989753A (en) 1995-06-26 1996-06-26 Method, apparatus, and mask for pattern projection using a beam of charged particles

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP7-159580 1995-06-26
JP15958095 1995-06-26
JP8144404A JPH0974064A (ja) 1995-06-26 1996-06-06 荷電粒子線によるパターン転写方法及び転写装置

Publications (2)

Publication Number Publication Date
JPH0974064A JPH0974064A (ja) 1997-03-18
JPH0974064A5 true JPH0974064A5 (https=) 2004-07-08

Family

ID=26475822

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8144404A Pending JPH0974064A (ja) 1995-06-26 1996-06-06 荷電粒子線によるパターン転写方法及び転写装置

Country Status (2)

Country Link
US (1) US5989753A (https=)
JP (1) JPH0974064A (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11329945A (ja) * 1998-05-08 1999-11-30 Nikon Corp 荷電粒子ビーム転写方法及び荷電粒子ビーム転写装置
EP0969326B1 (en) * 1998-07-01 2012-10-17 ASML Netherlands B.V. Lithographic apparatus
US6376847B1 (en) 1998-08-24 2002-04-23 Matsushia Electric Industrial Co., Ltd. Charged particle lithography method and system
US6617585B1 (en) 2000-05-24 2003-09-09 Nikon Corporation Optimized curvilinear variable axis lens doublet for charged particle beam projection system

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5260151A (en) * 1991-12-30 1993-11-09 At&T Bell Laboratories Device manufacture involving step-and-scan delineation
US5376505A (en) * 1992-03-16 1994-12-27 At&T Corp. Device fabrication entailing submicron imaging
US5523580A (en) * 1993-12-23 1996-06-04 International Business Machines Corporation Reticle having a number of subfields

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