JPH0951173A - Manufacture of copper clad laminated board - Google Patents
Manufacture of copper clad laminated boardInfo
- Publication number
- JPH0951173A JPH0951173A JP20090395A JP20090395A JPH0951173A JP H0951173 A JPH0951173 A JP H0951173A JP 20090395 A JP20090395 A JP 20090395A JP 20090395 A JP20090395 A JP 20090395A JP H0951173 A JPH0951173 A JP H0951173A
- Authority
- JP
- Japan
- Prior art keywords
- copper clad
- plate
- thickness
- clad laminate
- clad laminated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Production Of Multi-Layered Print Wiring Board (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は銅張積層板の製造方法に
関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a copper clad laminate.
【従来の技術】従来、銅張積層板は、クッション、保持
鏡面板、鏡面板、積層材、鏡面板、積層材、鏡面板、・
・・・鏡面板、積層材、保持鏡面板、クッションの如
く、積層材を鏡面板で挟んで配置し、これを積層成形用
プレスに仕込み、加熱、加圧により積層成形して製造さ
れるが、このとき、鏡面板には、厚み1〜5mmのステン
レス板が通常使用されていたが、多数枚の銅張積層板を
熱効率良く製造するために、厚み30〜500 μmのアルミ
ニウム等の金属箔も使用されるようになった(特公平7-
16963 号公報参照)。2. Description of the Related Art Conventionally, a copper clad laminate is a cushion, a holding mirror surface plate, a mirror surface plate, a laminated material, a mirror surface plate, a laminated material, a mirror surface plate, ...
... Manufactured by stacking laminated materials such as mirror plate, laminated material, holding mirror surface plate, and cushion, and sandwiching them between mirror surface plates, placing them in a laminating molding press, and laminating and molding by heating and pressing. At this time, a stainless plate having a thickness of 1 to 5 mm was usually used as the mirror plate, but in order to efficiently manufacture a large number of copper-clad laminates, a metal foil such as aluminum having a thickness of 30 to 500 μm was used. Also came to be used (Patent Fair 7-
(See 16963 publication).
【0002】[0002]
【発明が解決しようとする課題】しかし、全ての鏡面板
に金属箔を使用して製造した銅張積層板は板厚精度が低
下するため、全ての鏡面板を金属箔にすることはでき
ず、剛性のある1〜3mm程度のステンレス板との組み合
わせで積層成形する必要があった。However, since the copper clad laminate manufactured by using the metal foil for all the mirror-finished plates has a reduced plate thickness accuracy, it is not possible to use all the mirror-finished plates as the metal foil. It was necessary to form a laminate by combining with a rigid stainless steel plate of about 1 to 3 mm.
【0003】また、金属箔を使用して製造した内層回路
入り銅張積層板では、内層回路の隆起が発生するため、
外観が著しく劣り、外層回路形成時の欠陥が生じる可能
性があった。Further, in a copper clad laminate with an inner layer circuit manufactured by using a metal foil, swelling of the inner layer circuit occurs, so that
The appearance was remarkably inferior, and defects could occur during the formation of the outer layer circuit.
【0004】本発明では、軽量で剛性の高い金属板を全
ての鏡面板に使用することにより金属箔を使用した場合
より表面が平滑で板厚精度の良い銅張積層板を得られる
製造方法の提供を目的としている。In the present invention, a light-weight and high-rigidity metal plate is used for all mirror-finished plates to obtain a copper clad laminate having a smoother surface and more accurate plate thickness than the case where metal foil is used. It is intended to be provided.
【0005】[0005]
【課題を解決するための手段】本発明は、上記目的を達
成するため、前記した金属板を全ての鏡面板に使用する
ことを特徴とする銅張積層板の製造方法である。本発明
で使用される金属板は、厚さ 0.1mm〜0.5mm 、ロックウ
ェルT硬さ(HR30T) で50以上のものである。具体的には
ステンレス、チタン、鋼、ぶりき等である。In order to achieve the above object, the present invention is a method for producing a copper clad laminate, characterized in that the above-mentioned metal plate is used for all mirror surface plates. The metal plate used in the present invention has a thickness of 0.1 mm to 0.5 mm and a Rockwell T hardness (HR30T) of 50 or more. Specifically, it is stainless steel, titanium, steel, tin plate or the like.
【0006】本発明で用いられる積層材は銅張積層板成
形に使用するプリプレグ、内層回路入り銅張積層板成形
に使用する内層板と多層化接着や外層形成に使用するプ
リプレグおよび銅箔あるいは片面銅張積層板などの従来
公知の概念にはいるものであればいずれも使用できるも
のであり、特に限定されないものである。The laminated material used in the present invention includes a prepreg used for forming a copper clad laminate, an inner layer used for forming a copper clad laminate with an inner layer circuit, a prepreg used for multilayer adhesion and an outer layer formation, and a copper foil or one side. Any material such as a copper clad laminate can be used as long as it is within the conventionally known concept, and is not particularly limited.
【0007】また、積層成形方法も従来公知の概念には
いるものであればいずれも使用できるものであり、熱盤
プレス、熱盤真空プレス、オートクレーブ成形、連続プ
レスなどが例示される。Any lamination molding method can be used as long as it is within the conventionally known concept, and examples thereof include hot plate press, hot plate vacuum press, autoclave molding and continuous press.
【0008】[0008]
【作用】全ての鏡面板に、前記した金属板を使用するこ
とにより、金属箔を使用したものより表面が平滑とな
り、板厚精度のある銅張積層板が得られる。By using the above-mentioned metal plates for all mirror-finished plates, the surface becomes smoother than that using metal foils, and a copper clad laminate having a precise plate thickness can be obtained.
【0009】[0009]
実施例1 両面銅張積層板をぶりき板の使用で作成した実施例を図
1を用いて説明する。両面銅張積層板の構成品4は、厚
さ 0.2mm、500mm 角のガラス布エポキシプリプレグを4
枚重ねて合計 0.8mmの厚さとし、重ねたプリプレグの上
下に厚さ35μmの銅箔を配置した。熱盤1の上にクッシ
ョン2、保持鏡面板5(厚さ1.5mm のステンレス板:SU
S304) を順番に置き、その上にぶりき板(厚さ0.25mm、
ロックウェルT硬さ73) 、構成品4を交互に10個重ね
て、その上にぶりき板(厚さ0.25mm、ロックウェルT硬
さ73) 、保持鏡面板5(厚さ1.5mm のステンレス板:SU
S304) 、とクッション2を順番に重ね、真空プレス中で
圧力 20kg/cm2 、温度 175℃の条件で90分間加熱加圧
し、その後圧力 20kg/cm2 、温度20℃で40分間冷却を行
い10枚の両面銅張積層板を得た。Example 1 An example in which a double-sided copper-clad laminate is prepared by using a tin plate will be described with reference to FIG. Component 4 of the double-sided copper clad laminate is a glass cloth epoxy prepreg with a thickness of 0.2 mm and 500 mm square.
A total thickness of 0.8 mm was obtained by stacking the sheets, and a copper foil having a thickness of 35 μm was placed above and below the stacked prepregs. Cushion 2, holding mirror surface plate 5 (stainless steel plate of thickness 1.5 mm: SU
S304) in order, and a tin plate (thickness 0.25 mm,
Rockwell T hardness 73), 10 components 4 are stacked alternately, and a tin plate (0.25 mm thick, Rockwell T hardness 73), holding mirror surface plate 5 (1.5 mm thick stainless steel) Board: SU
S304), and cushion 2 in that order, and heat and pressurize for 90 minutes in a vacuum press at a pressure of 20 kg / cm 2 and a temperature of 175 ° C., and then cool at a pressure of 20 kg / cm 2 and a temperature of 20 ° C. for 40 minutes. A double-sided copper clad laminate was obtained.
【0010】該両面銅張積層板の板厚をマイクロメータ
ーで測定し、その結果を(表1)に示す。また、表面う
ねりを表面粗さ計で測定し、その結果を(表2)に示
す。The thickness of the double-sided copper-clad laminate was measured with a micrometer, and the results are shown in (Table 1). The surface waviness was measured by a surface roughness meter, and the results are shown in (Table 2).
【0011】実施例2 厚さ35μmの銅箔で内層回路が形成されている内層回路
入り銅張積層板をぶりき板の使用で作成した実施例を図
1を用いて説明する。内層回路入り銅張積層板(4層
板)の構成品4は銅残が約50%のパターンが形成されて
いる厚さ 0.8mm、500mm 角の両面銅張積層板(銅箔厚さ
35μm)の上下に厚さ 0.1mm、500mm 角のガラス布エポ
キシプリプレグを2枚ずつ重ね、さらにその上下に厚さ
18μmの銅箔を配置した。熱盤1の上にクッション2、
保持鏡面板5(厚さ 1.5mmのステンレス板:SUS304) を
順番に置き、その上にぶりき板(厚さ0.25mm、ロックウ
ェルT硬さ73) 、構成品4を交互に10個重ねて、その上
にぶりき板(厚さ0.25mm、ロックウェルT硬さ73)と、
保持鏡面板5(厚さ 1.5mmのステンレス板:SUS304) 、
クッション2を順番に重ね、真空プレス中で圧力20kg/c
m2、温度 175℃の条件で90分間加熱加圧し、その後圧力
20kg/cm2、温度20℃で40分間冷却を行い10枚の内層回
路入り銅張積層板を得た。Example 2 An example in which a copper clad laminate with an inner layer circuit in which an inner layer circuit is formed of a copper foil having a thickness of 35 μm was prepared by using a tin plate will be described with reference to FIG. Component 4 of the copper clad laminate with inner layer circuit (4 layer plate) has a pattern with about 50% of copper residue on the thickness 0.8 mm, 500 mm square double-sided copper clad laminate (copper foil thickness
(35μm) 0.1mm and 500mm square glass cloth epoxy prepregs are stacked on top of each other, and the thickness is further above and below
An 18 μm copper foil was placed. Cushion 2 on the hot platen 1,
Place the holding mirror surface plate 5 (stainless steel plate with a thickness of 1.5 mm: SUS304) in that order, and stack the tin plate (thickness: 0.25 mm, Rockwell T hardness: 73) and component 4 alternately on top of it. , And a tin plate (0.25 mm thick, Rockwell T hardness 73) on it,
Holding mirror surface plate 5 (stainless steel plate with a thickness of 1.5 mm: SUS304),
Cushion 2 is piled up in order and pressure is 20kg / c in a vacuum press.
Heat and pressurize for 90 minutes at m 2 and temperature of 175 ℃, then press
It was cooled at 20 kg / cm 2 and a temperature of 20 ° C. for 40 minutes to obtain 10 copper clad laminates with inner layer circuits.
【0012】該内層回路入り銅張積層板の内層パターン
隆起量を表面粗さ計で測定し、(表3)に示す。The amount of protrusion of the inner layer pattern of the copper clad laminate containing the inner layer circuit was measured by a surface roughness meter and is shown in (Table 3).
【0013】実施例3 厚さ70μmの銅箔で内層回路が形成されている内層回路
入り銅張積層板をぶりき板の使用で作成した実施例を図
1を用いて説明する。内層回路を形成する銅箔の厚みが
70μmであること以外は実施例2と同一とした。Example 3 An example in which a copper clad laminate with an inner layer circuit in which an inner layer circuit is formed of a copper foil having a thickness of 70 μm was prepared by using a tin plate will be described with reference to FIG. The thickness of the copper foil forming the inner layer circuit
The same as Example 2 except that it was 70 μm.
【0014】該内層回路入り銅張積層板の内層パターン
隆起量を表面粗さ計で測定し、(表3)に示す。The amount of protrusion of the inner layer pattern of the copper clad laminate containing the inner layer circuit was measured by a surface roughness meter and is shown in (Table 3).
【0015】比較例1 両面銅張積層板をアルミニウムの使用で作成した比較例
を図1を用いて説明する。両面銅張積層板の構成品4
は、実施例1と同一にした。熱盤1の上にクッション
2、保持鏡面板5(厚さ 1.5mmのステンレス板:SUS30
4) を順番に置き、その上にアルミニウム(厚さ 0.25mm
、アルミニウム仕様:3004-H19) 、構成品4を交互に1
0個重ねて、その上にアルミニウム(厚さ0.25mm、アル
ミニウム仕様:3004-H19) 、保持鏡面板5(厚さが 1.5
mmのステンレス板:SUS304) 、クッション2を順番に重
ね、真空プレス中で圧力 20kg/cm2 、温度 175℃の条件
で90分間加熱加圧し、その後圧力 20kg/cm2 、温度20℃
で40分間冷却を行い10枚の両面銅張積層板を得た。Comparative Example 1 A comparative example in which a double-sided copper-clad laminate is made of aluminum will be described with reference to FIG. Double-sided copper clad laminate component 4
Was the same as in Example 1. Cushion 2, holding mirror plate 5 (stainless steel plate with a thickness of 1.5 mm: SUS30) on the hot platen 1.
4) are placed in order, and aluminum (thickness 0.25mm
, Aluminum specification: 3004-H19), component 4 alternately 1
0 pieces are piled up and aluminum (thickness 0.25mm, aluminum specification: 3004-H19), holding mirror surface plate 5 (thickness 1.5
mm stainless plate: SUS304), cushion 2 are stacked in order, and heated and pressed for 90 minutes in a vacuum press under the conditions of pressure 20 kg / cm 2 and temperature 175 ° C., then pressure 20 kg / cm 2 and temperature 20 ° C.
After cooling for 40 minutes, 10 double-sided copper-clad laminates were obtained.
【0016】該両面銅張積層板の板厚をマイクロメータ
ーで測定し、その結果を(表1)に示す。また、表面う
ねりを表面粗さ計で測定し、その結果を(表2)に示
す。The plate thickness of the double-sided copper-clad laminate was measured with a micrometer, and the results are shown in (Table 1). The surface waviness was measured by a surface roughness meter, and the results are shown in (Table 2).
【0017】比較例2 厚さ35μmの銅箔で内層回路が形成されている内層回路
入り銅張積層板をアルミニウムの使用で作成した実施例
を図1を用いて説明する。内層回路入り銅張積層板(4
層板)の構成品4は実施例2と同一にした。熱盤1の上
にクッション2、保持鏡面板5(厚さ1.5mm のステンレ
ス板:SUS304) を順番に置き、その上にアルミニウム板
(厚さ 0.25mm 、アルミニウム仕様:3004-H19) 、構成
品4を交互に10個重ねて、その上にアルミニウム(厚さ
0.25mm 、アルミニウム仕様:3004-H19)、保持鏡面板
5(厚さが 1.5mmのステンレス板:SUS304) 、クッショ
ン2を順番に重ね、真空プレス中で圧力 20kg/cm2 、温
度 175℃の条件で90分間加熱加圧し、その後圧力 20kg/
cm2 、温度20℃で40分間冷却を行い10枚の内層回路入り
銅張積層板を得た。Comparative Example 2 An example in which a copper clad laminate with an inner layer circuit in which an inner layer circuit is formed of a copper foil having a thickness of 35 μm was made by using aluminum will be described with reference to FIG. Copper clad laminate with inner layer circuit (4
The component 4 of the layer plate) was the same as in Example 2. Cushion 2 and holding mirror surface plate 5 (1.5 mm thick stainless steel plate: SUS304) are placed in this order on the hot platen 1, and the aluminum plate (thickness 0.25 mm, aluminum specification: 3004-H19) is placed on top of it. 10 pieces of 4 are piled up alternately, and aluminum (thickness
0.25 mm, aluminum specification: 3004-H19), holding mirror plate 5 (stainless steel plate with a thickness of 1.5 mm: SUS304), cushion 2 are stacked in this order, and pressure is 20 kg / cm 2 in vacuum press, and temperature is 175 ° C. And pressurize for 90 minutes, then pressure 20kg /
It was cooled at cm 2 at a temperature of 20 ° C. for 40 minutes to obtain 10 copper clad laminates with inner layer circuits.
【0018】該内層回路入り銅張積層板の内層パターン
隆起量を表面粗さ計で測定し、(表3)に示す。The amount of protrusion of the inner layer pattern of the copper clad laminate containing the inner layer circuit was measured by a surface roughness meter and is shown in (Table 3).
【0019】比較例3 厚さ70μmの銅箔で内層回路が形成されている内層回路
入り銅張積層板をアルミニウムの使用で作成した実施例
を図1を用いて説明する。内層回路を形成する銅箔の厚
みが70μmであること以外は比較例2と同一とした。Comparative Example 3 An example in which a copper clad laminate with an inner layer circuit in which an inner layer circuit is formed of a copper foil having a thickness of 70 μm was made by using aluminum will be described with reference to FIG. The same as Comparative Example 2 except that the thickness of the copper foil forming the inner layer circuit was 70 μm.
【0020】該内層回路入り銅張積層板の内層パターン
隆起量を表面粗さ計で測定し、(表3)に示す。The amount of protrusion of the inner layer pattern of the copper clad laminate containing the inner layer circuit was measured by a surface roughness meter and is shown in (Table 3).
【0021】[0021]
【表1】 実施例と比較例における両面銅張積層板の板厚測定結果項 目 実施例1 比較例1 平均値 (mm) 0.874 0.875 最大値 (mm) 0.911 0.920 最小値 (mm) 0.843 0.828 最大値−最小値 (mm) 0.068 0.092 標準偏差 (mm) 0.016 0.026 [Table 1] Sheet thickness measurement results of double-sided copper clad laminates in Examples and Comparative Examples Item Example 1 Comparative Example 1 Average value (mm) 0.874 0.875 Maximum value (mm) 0.911 0.920 Minimum value (mm) 0.843 0.828 Maximum Value-Minimum value (mm) 0.068 0.092 Standard deviation (mm) 0.016 0.026
【0022】[0022]
【表2】 実施例と比較例における両面銅張積層板の表面うねり測定結果項 目 実施例1 比較例1 表面うねり (μm) 2.5 10.0 [Table 2] Surface waviness measurement results of double-sided copper clad laminates in Examples and Comparative Examples Item Example 1 Comparative Example 1 Surface waviness (μm) 2.5 10.0
【0023】[0023]
【表3】 実施例と比較例における内層パターン隆起量[μm]の測定結果項 目 実施例2 比較例2 実施例3 比較例3 内層銅箔厚み (μm) 35 35 70 70内層パターン隆起量 (μm) 1.5 4.3 3.0 9.0 [Table 3] Results of measurement of inner layer pattern protrusion amount [μm] in Examples and Comparative Examples Item Example 2 Comparative Example 2 Example 3 Comparative Example 3 Inner layer copper foil thickness (μm) 35 35 70 70 Inner layer pattern protrusion amount ( μm) 1.5 4.3 3.0 9.0
【0024】[0024]
【発明の効果】本発明により、従来の金属箔を使用した
製造法より、表面が平滑で板厚精度の良い銅張積層板を
生産性良く得ることができる。According to the present invention, a copper clad laminate having a smooth surface and good plate thickness accuracy can be obtained with high productivity, as compared with the conventional manufacturing method using a metal foil.
【図1】積層材の積層構成を示す模式図である。鏡面板
3は、実施例ではぶりき板を示し、比較例ではアルミニ
ウム板を示すものである。FIG. 1 is a schematic view showing a laminated structure of laminated materials. The specular plate 3 is a tin plate in the examples, and is an aluminum plate in the comparative examples.
1: 熱盤、 2: クッション、 3: 鏡面板、 4: 構成品、 5: 保持鏡面板。 1: Hot plate, 2: Cushion, 3: Mirror surface plate, 4: Components, 5: Holding mirror surface plate.
Claims (1)
層材を仕込み積層成形して銅張積層板を製造する方法に
おいて、全ての鏡面板に厚さ 0.1mm〜0.5mm、ロックウ
ェルT硬さ(HR30T) で50以上の金属板を使用することを
特徴とする銅張積層板の製造方法。1. A method for producing a copper clad laminate by laminating and laminating laminated materials which are laminated via a mirror surface plate between press heating plates, wherein all mirror surface plates have a thickness of 0.1 mm to 0.5 mm and Rockwell. A method for producing a copper-clad laminate, which comprises using a metal plate having a T hardness (HR30T) of 50 or more.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20090395A JPH0951173A (en) | 1995-08-07 | 1995-08-07 | Manufacture of copper clad laminated board |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20090395A JPH0951173A (en) | 1995-08-07 | 1995-08-07 | Manufacture of copper clad laminated board |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0951173A true JPH0951173A (en) | 1997-02-18 |
Family
ID=16432185
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP20090395A Pending JPH0951173A (en) | 1995-08-07 | 1995-08-07 | Manufacture of copper clad laminated board |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0951173A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6977348B2 (en) | 2002-05-28 | 2005-12-20 | Via Technologies, Inc. | High density laminated substrate structure and manufacture method thereof |
-
1995
- 1995-08-07 JP JP20090395A patent/JPH0951173A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6977348B2 (en) | 2002-05-28 | 2005-12-20 | Via Technologies, Inc. | High density laminated substrate structure and manufacture method thereof |
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