JPH09508504A - 光応答性装置 - Google Patents
光応答性装置Info
- Publication number
- JPH09508504A JPH09508504A JP8516716A JP51671696A JPH09508504A JP H09508504 A JPH09508504 A JP H09508504A JP 8516716 A JP8516716 A JP 8516716A JP 51671696 A JP51671696 A JP 51671696A JP H09508504 A JPH09508504 A JP H09508504A
- Authority
- JP
- Japan
- Prior art keywords
- polymer
- photoresponsive
- semiconducting
- ppv
- photoresponsive device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229920000642 polymer Polymers 0.000 claims abstract description 259
- 229920002959 polymer blend Polymers 0.000 claims abstract description 9
- 229920000553 poly(phenylenevinylene) Polymers 0.000 claims description 64
- 229920000109 alkoxy-substituted poly(p-phenylene vinylene) Polymers 0.000 claims description 31
- 125000001424 substituent group Chemical group 0.000 claims description 31
- 230000004044 response Effects 0.000 claims description 21
- 125000000217 alkyl group Chemical group 0.000 claims description 16
- 229920001577 copolymer Polymers 0.000 claims description 14
- -1 poly (phenylene) Polymers 0.000 claims description 14
- 239000004065 semiconductor Substances 0.000 claims description 13
- 238000000926 separation method Methods 0.000 claims description 11
- 229910052782 aluminium Inorganic materials 0.000 claims description 9
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 9
- 229920000547 conjugated polymer Polymers 0.000 claims description 9
- 125000006575 electron-withdrawing group Chemical group 0.000 claims description 8
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 claims description 8
- 229920001940 conductive polymer Polymers 0.000 claims description 7
- 125000003545 alkoxy group Chemical group 0.000 claims description 6
- 229920000265 Polyparaphenylene Polymers 0.000 claims description 5
- 150000002825 nitriles Chemical class 0.000 claims description 5
- 125000005556 thienylene group Chemical group 0.000 claims description 5
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 claims description 4
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 4
- 229910052791 calcium Inorganic materials 0.000 claims description 4
- 239000011575 calcium Substances 0.000 claims description 4
- 125000004093 cyano group Chemical group *C#N 0.000 claims description 4
- 229910052749 magnesium Inorganic materials 0.000 claims description 4
- 239000011777 magnesium Substances 0.000 claims description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 3
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 claims description 3
- 239000002322 conducting polymer Substances 0.000 claims description 3
- 125000004185 ester group Chemical group 0.000 claims description 3
- 229910052736 halogen Inorganic materials 0.000 claims description 3
- 150000002367 halogens Chemical class 0.000 claims description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 3
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims description 3
- 230000003287 optical effect Effects 0.000 claims description 3
- 125000005010 perfluoroalkyl group Chemical group 0.000 claims description 3
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 claims description 2
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 claims description 2
- 229910052794 bromium Inorganic materials 0.000 claims description 2
- 229910003437 indium oxide Inorganic materials 0.000 claims description 2
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 claims description 2
- 229910052759 nickel Inorganic materials 0.000 claims description 2
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 claims description 2
- RJSYPKWVIJGNLO-UHFFFAOYSA-N CCOClOC Chemical compound CCOClOC RJSYPKWVIJGNLO-UHFFFAOYSA-N 0.000 claims 1
- 125000002560 nitrile group Chemical group 0.000 claims 1
- 229920002382 photo conductive polymer Polymers 0.000 claims 1
- 239000011148 porous material Substances 0.000 abstract 1
- 238000006862 quantum yield reaction Methods 0.000 description 18
- 239000000126 substance Substances 0.000 description 18
- 239000002904 solvent Substances 0.000 description 15
- 230000005684 electric field Effects 0.000 description 14
- 238000000034 method Methods 0.000 description 14
- 230000003595 spectral effect Effects 0.000 description 14
- 238000010494 dissociation reaction Methods 0.000 description 13
- 230000005593 dissociations Effects 0.000 description 13
- 238000012546 transfer Methods 0.000 description 11
- 239000000203 mixture Substances 0.000 description 10
- 239000000758 substrate Substances 0.000 description 10
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 8
- 239000002800 charge carrier Substances 0.000 description 8
- 239000000463 material Substances 0.000 description 8
- 230000002441 reversible effect Effects 0.000 description 8
- 238000010521 absorption reaction Methods 0.000 description 7
- 229910052751 metal Inorganic materials 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- 230000035515 penetration Effects 0.000 description 7
- 230000001443 photoexcitation Effects 0.000 description 7
- 239000004020 conductor Substances 0.000 description 6
- 230000021615 conjugation Effects 0.000 description 6
- 238000010586 diagram Methods 0.000 description 6
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 6
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical group C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 description 4
- 230000009471 action Effects 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 230000005281 excited state Effects 0.000 description 4
- 238000005286 illumination Methods 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 230000007246 mechanism Effects 0.000 description 4
- 230000007935 neutral effect Effects 0.000 description 4
- YLQBMQCUIZJEEH-UHFFFAOYSA-N Furan Chemical compound C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 3
- 229910021417 amorphous silicon Inorganic materials 0.000 description 3
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000001704 evaporation Methods 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 238000002347 injection Methods 0.000 description 3
- 239000007924 injection Substances 0.000 description 3
- 239000011159 matrix material Substances 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 230000036961 partial effect Effects 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- KBIJVGKRGIADQH-UHFFFAOYSA-N 1-ethynyl-4-hexoxybenzene Chemical group CCCCCCOC1=CC=C(C#C)C=C1 KBIJVGKRGIADQH-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- KAESVJOAVNADME-UHFFFAOYSA-N Pyrrole Chemical compound C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 description 2
- 230000002238 attenuated effect Effects 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 239000000969 carrier Substances 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 230000001419 dependent effect Effects 0.000 description 2
- 150000002148 esters Chemical group 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 230000002349 favourable effect Effects 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 125000000623 heterocyclic group Chemical group 0.000 description 2
- 125000003707 hexyloxy group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])O* 0.000 description 2
- 238000004768 lowest unoccupied molecular orbital Methods 0.000 description 2
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 125000002971 oxazolyl group Chemical group 0.000 description 2
- 238000000059 patterning Methods 0.000 description 2
- 238000005325 percolation Methods 0.000 description 2
- 238000005424 photoluminescence Methods 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 229920000058 polyacrylate Polymers 0.000 description 2
- 229920006267 polyester film Polymers 0.000 description 2
- 230000008707 rearrangement Effects 0.000 description 2
- 230000006798 recombination Effects 0.000 description 2
- 238000005215 recombination Methods 0.000 description 2
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 2
- 125000006850 spacer group Chemical group 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- 125000003396 thiol group Chemical class [H]S* 0.000 description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- XMWRBQBLMFGWIX-UHFFFAOYSA-N C60 fullerene Chemical compound C12=C3C(C4=C56)=C7C8=C5C5=C9C%10=C6C6=C4C1=C1C4=C6C6=C%10C%10=C9C9=C%11C5=C8C5=C8C7=C3C3=C7C2=C1C1=C2C4=C6C4=C%10C6=C9C9=C%11C5=C5C8=C3C3=C7C1=C1C2=C4C6=C2C9=C5C3=C12 XMWRBQBLMFGWIX-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 235000003332 Ilex aquifolium Nutrition 0.000 description 1
- 241000209027 Ilex aquifolium Species 0.000 description 1
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 1
- 206010034972 Photosensitivity reaction Diseases 0.000 description 1
- 229920000292 Polyquinoline Polymers 0.000 description 1
- 101100386054 Saccharomyces cerevisiae (strain ATCC 204508 / S288c) CYS3 gene Proteins 0.000 description 1
- 241000124033 Salix Species 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 125000005577 anthracene group Chemical group 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 238000003491 array Methods 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 125000001246 bromo group Chemical group Br* 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 239000002178 crystalline material Substances 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005670 electromagnetic radiation Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- NSHIYIMHYBAIEY-UHFFFAOYSA-N ethyl hypochlorite Chemical compound CCOCl NSHIYIMHYBAIEY-UHFFFAOYSA-N 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 125000004216 fluoromethyl group Chemical group [H]C([H])(F)* 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- ZZUFCTLCJUWOSV-UHFFFAOYSA-N furosemide Chemical compound C1=C(Cl)C(S(=O)(=O)N)=CC(C(O)=O)=C1NCC1=CC=CO1 ZZUFCTLCJUWOSV-UHFFFAOYSA-N 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 238000003306 harvesting Methods 0.000 description 1
- 125000001072 heteroaryl group Chemical group 0.000 description 1
- 238000004770 highest occupied molecular orbital Methods 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000004807 localization Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000001404 mediated effect Effects 0.000 description 1
- 229910001092 metal group alloy Inorganic materials 0.000 description 1
- 238000004776 molecular orbital Methods 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 229910052755 nonmetal Inorganic materials 0.000 description 1
- 150000002843 nonmetals Chemical class 0.000 description 1
- 230000000269 nucleophilic effect Effects 0.000 description 1
- WCPAKWJPBJAGKN-UHFFFAOYSA-N oxadiazole Chemical compound C1=CON=N1 WCPAKWJPBJAGKN-UHFFFAOYSA-N 0.000 description 1
- 239000000123 paper Substances 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 238000005191 phase separation Methods 0.000 description 1
- 230000036211 photosensitivity Effects 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920003227 poly(N-vinyl carbazole) Polymers 0.000 description 1
- 229920000767 polyaniline Polymers 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- 229920005597 polymer membrane Polymers 0.000 description 1
- 238000005036 potential barrier Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000010791 quenching Methods 0.000 description 1
- 230000000171 quenching effect Effects 0.000 description 1
- 230000002829 reductive effect Effects 0.000 description 1
- 239000013557 residual solvent Substances 0.000 description 1
- 230000027756 respiratory electron transport chain Effects 0.000 description 1
- 238000007788 roughening Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 241000894007 species Species 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 101150035983 str1 gene Proteins 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 230000001502 supplementing effect Effects 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
- 150000005671 trienes Chemical class 0.000 description 1
- 230000005641 tunneling Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K30/00—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
- H10K30/30—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation comprising bulk heterojunctions, e.g. interpenetrating networks of donor and acceptor material domains
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K30/00—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
- H10K30/60—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation in which radiation controls flow of current through the devices, e.g. photoresistors
- H10K30/65—Light-sensitive field-effect devices, e.g. phototransistors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/10—Organic polymers or oligomers
- H10K85/111—Organic polymers or oligomers comprising aromatic, heteroaromatic, or aryl chains, e.g. polyaniline, polyphenylene or polyphenylene vinylene
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/10—Organic polymers or oligomers
- H10K85/111—Organic polymers or oligomers comprising aromatic, heteroaromatic, or aryl chains, e.g. polyaniline, polyphenylene or polyphenylene vinylene
- H10K85/114—Poly-phenylenevinylene; Derivatives thereof
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K30/00—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
- H10K30/50—Photovoltaic [PV] devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/10—Organic polymers or oligomers
- H10K85/151—Copolymers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/60—Organic compounds having low molecular weight
- H10K85/615—Polycyclic condensed aromatic hydrocarbons, e.g. anthracene
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/549—Organic PV cells
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Light Receiving Elements (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Polyoxymethylene Polymers And Polymers With Carbon-To-Carbon Bonds (AREA)
Abstract
Description
Claims (1)
- 【特許請求の範囲】 1.光応答性装置において、第一及び第二の主要面を有する光応答圏域と、光反 応答圏域の第一及び第二の主要面上に夫々設けた第一及び第二の電極とを有し、 光応答圏域が第一半導電性ポリマーの領域と、第一半導電性ポリマーから相分離 された第二半導電性ポリマーの領域とを有するポリマー混和物を有し、第二半導 電性ポリマーが第一半導電性ポリマーよりも大きい電子親和性を有し、従って使 用時には光応答層に入射する光から由来する第一及び第二の電極間の光電流が第 二半導電性ポリマーを支配的に通過する電子と、第一半導電性ポリマーを支配的 に通過する正孔とを有することを特徴とする光反応性装置。 2.請求の範囲第1項記載の光応答性装置において、第一及び第二の半導電性ポ リマーの領域が相互侵入性の網構造を形成する光応答性装置。 3.請求の範囲第1項又は第2項記載の光応答性装置において、第一及び第二の 半導電性ポリマーの少なくとも一者が共役ポリマー鎖を有する光応答性装置。 4.請求の範囲第1項、第2項又は第3項記載の光応答性装置において、第一及 び第二の半導電性ポリマーの少なくとも一者がポリマー鎖の非共役部分により分 離された共役部分を有するポリマー鎖を有する光応答性装置。 5.請求の範囲第1項、第2項、第3項又は第4項記載の光応答性装置において 、第一及び第二の半導電性ポリマーの少なくとも一者が共役側基を有する略々非 共役のポリマー鎖を有する光応答性装置。 6.前述の請求の範囲の何れか一つに記載の光応答性装置において、第一及び第 二の半導電性ポリマーの各々が一つ以上の置換基を有する光応答性装置。 7.請求の範囲第1項又は第2項記載の光応答性装置において、第一及び第二の 半導電性ポリマーが一つ以上の置換基を夫々有するPPVの誘導体を包含する光 応答性装置。 8.請求の範囲第7項記載の光応答性装置において、第一半導電性ポリマーの少 なくとも一つ以上の置換基がアルキル成分、アルコキシ成分、ハロゲン成分、チ オール成分及びニトロ成分から成る群から選択したものである光応答性装置。 9.請求の範囲第7項記載の光応答性装置において、第一半導電性ポリマーの少 なくとも一つ以上の置換基がメチル基、メトキシ基、エトキシ基、塩素、臭素及 びニトロ基から成る群から選択したものである光応答性装置。 10.請求の範囲第7項記載の光応答性装置において、第一半導電性ポリマーがM EH−PPVを包含する光応答性装置。 11.請求の範囲第7項、第8項、第9項又は第10項記載の光応答性装置におい て、第二半導電性ポリマーの少なくとも一つ以上の置換基がシアノ基、ニトリル 基、トリフルオロメチル基及びエステル基から成る群から選択したものである光 応答性装置。 12.請求の範囲第7項、第8項、第9項又は第10項記載の光応答性装置におい て、第二半導電性ポリマーが一つ以上のアルキル側基を有するPPVのシアノ置 換コポリマーを包含する光応答性装置。 13.請求の範囲第1項又は第2項記載の光応答性装置において、第一及び第二の 半導電性ポリマーがポリ(フェニレン)又はポリ(チエニレン)を包含する光応 答性装置。 14.請求の範囲第13項記載の光応答性装置において、第一半導電性ポリマーが アルキルがブチル基以上の長炭素鎖アルキル基であるポリ(3−アルキル チエ ニレン)又はポリ(3,3’−アルキル チエニレン)を包含し、第二半導電性 ポリマーが第一半導電性ポリマーと同様であるがそれに加えてニトリル基、エス テル基又はペルフルオロアルキル基等の電子引出し基を少なくとも一つ以上有す るポリマーを包含する光応答性装置。 15.前述の請求の範囲の何れか一つに記載の光応答性装置において、第一及び第 二の電極の少なくとも一方が光透過性である光応答性装置。 16.前述の請求の範囲の何れか一つに記載の光応答性装置において、第一及び第 二の電極の一方が酸化インジウム又は酸化錫インジウムを含有し、他方がアルミ ニウム、マグネシウム又はカルシウムを含有する光応答性装置。 17.光応答性半導体において、第一半導電性ポリマーの領域と第一半導電性ポリ マーから相分離され第一半導電性ポリマーよりも大きな電子親和力を有する第二 半導電性ポリマーの領域とを有するポリマー混和物を含有し、これにより第一及 び第二の半導電性ポリマー間の荷電分離を容易としたことを特徴とする光 応答性半導体。 18.光応答性半導体において、アルキル成分、アルコキシ成分、ハロゲン成分及 びニトロ成分から成る群から選択した値運気を一つ以上有するPPVを包含する 第一半導電性ポリマーの領域と、第一半導電性ポリマーよりも電子親和力が大き いPPVのシアノ置換コポリマーを包含する第二半導電性ポリマーの領域とを有 するポリマー混和物を有し、これにより第一及び第二の半導電性ポリマー間の荷 電分離を容易としたことを特徴とする光応答性半導体。 19.請求の範囲第18項記載の光応答性半導体において、第一半導電性ポリマー がMEH−PPVを包含し、第二半導電性ポリマーが一つ以上のアルキル側基を 有するPPVのシアノ置換コポリマーを包含する光応答性半導体。 20.請求の範囲第18項記載の光応答性半導体において、第一半導電性ポリマー が図1bに示す構造式を有し、第二半導電性ポリマーが図1cに示す構造式を有 する光応答性半導体。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
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GB9423692.4 | 1994-11-23 | ||
GB9423692A GB9423692D0 (en) | 1994-11-23 | 1994-11-23 | A photoresponsive device |
PCT/IB1995/001042 WO1996016449A1 (en) | 1994-11-23 | 1995-11-21 | A photoresponsive device |
Publications (2)
Publication Number | Publication Date |
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JPH09508504A true JPH09508504A (ja) | 1997-08-26 |
JP4053590B2 JP4053590B2 (ja) | 2008-02-27 |
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Application Number | Title | Priority Date | Filing Date |
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JP51671696A Expired - Lifetime JP4053590B2 (ja) | 1994-11-23 | 1995-11-21 | 光応答性装置及び光応答性半導体 |
Country Status (6)
Country | Link |
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US (1) | US5670791A (ja) |
EP (1) | EP0740855B1 (ja) |
JP (1) | JP4053590B2 (ja) |
DE (1) | DE69527039T2 (ja) |
GB (1) | GB9423692D0 (ja) |
WO (1) | WO1996016449A1 (ja) |
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- 1995-11-21 JP JP51671696A patent/JP4053590B2/ja not_active Expired - Lifetime
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WO2007015503A1 (ja) * | 2005-08-02 | 2007-02-08 | Adeka Corporation | 光電変換素子 |
JP2011507303A (ja) * | 2007-12-18 | 2011-03-03 | ティ. ミハレヴィチュ,マレク | 量子トンネル効果光検出器アレイ |
JP2014099632A (ja) * | 2013-12-27 | 2014-05-29 | T Michalewicz Marek | 量子トンネル効果光検出器アレイ |
Also Published As
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EP0740855B1 (en) | 2002-06-12 |
WO1996016449A1 (en) | 1996-05-30 |
EP0740855A1 (en) | 1996-11-06 |
DE69527039D1 (de) | 2002-07-18 |
JP4053590B2 (ja) | 2008-02-27 |
GB9423692D0 (en) | 1995-01-11 |
US5670791A (en) | 1997-09-23 |
DE69527039T2 (de) | 2003-01-02 |
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