JPH09306802A5 - - Google Patents

Info

Publication number
JPH09306802A5
JPH09306802A5 JP1996116249A JP11624996A JPH09306802A5 JP H09306802 A5 JPH09306802 A5 JP H09306802A5 JP 1996116249 A JP1996116249 A JP 1996116249A JP 11624996 A JP11624996 A JP 11624996A JP H09306802 A5 JPH09306802 A5 JP H09306802A5
Authority
JP
Japan
Prior art keywords
substrate
detection area
reference member
alignment
alignment system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1996116249A
Other languages
English (en)
Japanese (ja)
Other versions
JPH09306802A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP8116249A priority Critical patent/JPH09306802A/ja
Priority claimed from JP8116249A external-priority patent/JPH09306802A/ja
Priority to KR1019970015201A priority patent/KR970077111A/ko
Priority to US08/853,389 priority patent/US5920378A/en
Publication of JPH09306802A publication Critical patent/JPH09306802A/ja
Publication of JPH09306802A5 publication Critical patent/JPH09306802A5/ja
Pending legal-status Critical Current

Links

JP8116249A 1995-03-14 1996-05-10 投影露光装置 Pending JPH09306802A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP8116249A JPH09306802A (ja) 1996-05-10 1996-05-10 投影露光装置
KR1019970015201A KR970077111A (ko) 1996-05-10 1997-04-23 투영 노광 장치
US08/853,389 US5920378A (en) 1995-03-14 1997-05-09 Projection exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8116249A JPH09306802A (ja) 1996-05-10 1996-05-10 投影露光装置

Publications (2)

Publication Number Publication Date
JPH09306802A JPH09306802A (ja) 1997-11-28
JPH09306802A5 true JPH09306802A5 (enExample) 2004-11-18

Family

ID=14682467

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8116249A Pending JPH09306802A (ja) 1995-03-14 1996-05-10 投影露光装置

Country Status (2)

Country Link
JP (1) JPH09306802A (enExample)
KR (1) KR970077111A (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102290364B (zh) * 2004-06-09 2016-01-13 尼康股份有限公司 基板保持装置、具备其之曝光装置、元件制造方法
KR101331631B1 (ko) * 2004-10-15 2013-11-20 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
EP1811546A4 (en) * 2004-11-01 2010-01-06 Nikon Corp EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD
NL2010415C2 (en) * 2012-03-08 2013-12-31 Mapper Lithography Ip Bv Lithography system and method for processing a target, such as a wafer.
JP6462993B2 (ja) * 2014-04-02 2019-01-30 キヤノン株式会社 露光装置および物品製造方法

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