JPH09306802A - 投影露光装置 - Google Patents

投影露光装置

Info

Publication number
JPH09306802A
JPH09306802A JP8116249A JP11624996A JPH09306802A JP H09306802 A JPH09306802 A JP H09306802A JP 8116249 A JP8116249 A JP 8116249A JP 11624996 A JP11624996 A JP 11624996A JP H09306802 A JPH09306802 A JP H09306802A
Authority
JP
Japan
Prior art keywords
substrate
alignment
substrate stage
reference member
mark
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8116249A
Other languages
English (en)
Japanese (ja)
Other versions
JPH09306802A5 (enExample
Inventor
Masakazu Murakami
雅一 村上
Hiroshi Shirasu
廣 白数
Tomohide Hamada
智秀 浜田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP8116249A priority Critical patent/JPH09306802A/ja
Priority to KR1019970015201A priority patent/KR970077111A/ko
Priority to US08/853,389 priority patent/US5920378A/en
Publication of JPH09306802A publication Critical patent/JPH09306802A/ja
Publication of JPH09306802A5 publication Critical patent/JPH09306802A5/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70791—Large workpieces, e.g. glass substrates for flat panel displays or solar panels
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP8116249A 1995-03-14 1996-05-10 投影露光装置 Pending JPH09306802A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP8116249A JPH09306802A (ja) 1996-05-10 1996-05-10 投影露光装置
KR1019970015201A KR970077111A (ko) 1996-05-10 1997-04-23 투영 노광 장치
US08/853,389 US5920378A (en) 1995-03-14 1997-05-09 Projection exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8116249A JPH09306802A (ja) 1996-05-10 1996-05-10 投影露光装置

Publications (2)

Publication Number Publication Date
JPH09306802A true JPH09306802A (ja) 1997-11-28
JPH09306802A5 JPH09306802A5 (enExample) 2004-11-18

Family

ID=14682467

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8116249A Pending JPH09306802A (ja) 1995-03-14 1996-05-10 投影露光装置

Country Status (2)

Country Link
JP (1) JPH09306802A (enExample)
KR (1) KR970077111A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015513219A (ja) * 2012-03-08 2015-04-30 マッパー・リソグラフィー・アイピー・ビー．ブイ． ウェーハなどのターゲットを処理するためのリソグラフィシステム及び方法
JP2015198202A (ja) * 2014-04-02 2015-11-09 キヤノン株式会社 露光装置および物品製造方法

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2637061B1 (en) * 2004-06-09 2018-07-18 Nikon Corporation Exposure apparatus, exposure method and method for producing a device
JP4488006B2 (ja) * 2004-10-15 2010-06-23 株式会社ニコン 露光装置及びデバイス製造方法
US8330939B2 (en) * 2004-11-01 2012-12-11 Nikon Corporation Immersion exposure apparatus and device manufacturing method with a liquid recovery port provided on at least one of a first stage and second stage

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015513219A (ja) * 2012-03-08 2015-04-30 マッパー・リソグラフィー・アイピー・ビー．ブイ． ウェーハなどのターゲットを処理するためのリソグラフィシステム及び方法
JP2015198202A (ja) * 2014-04-02 2015-11-09 キヤノン株式会社 露光装置および物品製造方法

Also Published As

Publication number Publication date
KR970077111A (ko) 1997-12-12

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