JPH09292503A - Beam splitting film, nd filter and beam splitter - Google Patents

Beam splitting film, nd filter and beam splitter

Info

Publication number
JPH09292503A
JPH09292503A JP8105272A JP10527296A JPH09292503A JP H09292503 A JPH09292503 A JP H09292503A JP 8105272 A JP8105272 A JP 8105272A JP 10527296 A JP10527296 A JP 10527296A JP H09292503 A JPH09292503 A JP H09292503A
Authority
JP
Japan
Prior art keywords
film
thin film
film layer
transmittance
reflectance
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8105272A
Other languages
Japanese (ja)
Other versions
JP3679500B2 (en
Inventor
Motokatsu Kato
元勝 加藤
Kiyoshi Araki
清 荒木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Pentax Corp
Original Assignee
Asahi Kogaku Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Kogaku Kogyo Co Ltd filed Critical Asahi Kogaku Kogyo Co Ltd
Priority to JP10527296A priority Critical patent/JP3679500B2/en
Publication of JPH09292503A publication Critical patent/JPH09292503A/en
Application granted granted Critical
Publication of JP3679500B2 publication Critical patent/JP3679500B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To obtain a beam splitting film which has smooth transmittance and reflectance characteristics for the all visible ray region and can easily be produced by laminating a Ni thin film layer and a Cr thin film layer, and to obtain a ND filter and a beam splitter using the beam splitting film. SOLUTION: As for this beam splitter (a light flux splitter), the beam splitting film is formed by laminating a Ni single layer coating film 12 and a Cr single layer coating film 13 on a transparent substrate 11. The transmittance- reflectance characteristics can be changed by changing the film thickness ratio of the Ni single layer film 12 to the Cr single layer film 13, and smooth transmittance-reflectance characteristics can be obtd in wavelengths in a visible ray region with any ratio of the transmittance to the reflectance. Especially, smooth transmittance-reflectance characteristics can be obtd. within the range of (2.5:1) to (3.0:1) in film thickness ratio of Ni to Cr. The order of the Ni single layer film 212 and the Cr single layer film 13 in the film forming process may be reversed.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【技術分野】本発明は、光学系のビームスプリッタやハ
ーフミラー等の光分割素子に用いられる光分割膜、この
光分割膜を用いたND(Neutral Density )フィルタ
ー、及び光分割素子に関する。
TECHNICAL FIELD The present invention relates to a light splitting film used for a light splitting device such as a beam splitter or a half mirror of an optical system, an ND (Neutral Density) filter using the light splitting film, and a light splitting device.

【0002】[0002]

【従来技術およびその問題点】ビームスプリッタやハー
フミラー等の光分割素子、あるいはNDフィルターは、
ガラスまたはプラスチックからなる透明基板上に光分割
膜を付着させて形成されている。この光分割膜は、可及
的に平滑な透過率、反射率特性を有することが好ましい
が、従来の光分割膜は、これが困難であった。すなわ
ち、光分割膜としては、金、銀、アルミニウム、銅、各
種合金などの金属薄膜、誘電体コート材料を積層した誘
電体薄膜、あるいは金属薄膜と誘電体薄膜の合成薄膜が
知られているが、誘電体光分割膜は、透過率−反射率特
性にばらつきがあり、特に可視域における短波長側、長
波長側の両端では、平滑性が得られない。金属光分割膜
は、可視域の中間においては誘電体膜に比べてより好ま
しい平滑性が得られるが、その短波長側、長波長側の両
端で透過率と反射率の大きさが逆転し、平滑性が得られ
ない。金属合金光分割膜は、透過率、反射率特性自体
は、誘電体薄膜、金属薄膜より優れているが、成膜を行
う場合に、膜の合金の組成比を一定に保持することが困
難で、製造が困難という問題がある。
2. Description of the Related Art Light splitting devices such as beam splitters and half mirrors, or ND filters,
It is formed by adhering a light splitting film on a transparent substrate made of glass or plastic. It is preferable that the light splitting film has transmittance and reflectance characteristics as smooth as possible, but it is difficult for the conventional light splitting film. That is, as the light splitting film, a metal thin film of gold, silver, aluminum, copper, various alloys, a dielectric thin film in which a dielectric coating material is laminated, or a composite thin film of a metal thin film and a dielectric thin film is known. The dielectric light splitting film has variations in transmittance-reflectance characteristics, and smoothness cannot be obtained especially at both ends on the short wavelength side and the long wavelength side in the visible region. The metal light splitting film can obtain more preferable smoothness in the middle of the visible range as compared with the dielectric film, but the transmissivity and the reflectance are reversed at both ends of the short wavelength side and the long wavelength side, Smoothness cannot be obtained. The metal alloy light-splitting film is superior to the dielectric thin film and the metal thin film in transmittance and reflectance characteristics, but it is difficult to keep the composition ratio of the film alloy constant when forming a film. However, there is a problem that it is difficult to manufacture.

【0003】[0003]

【発明の目的】本発明は、可視域の全域にわたり、より
平滑な透過率、反射率特性が得られ、しかもその製造も
容易な光分割膜、NDフィルター、及び光分割素子を得
ることを目的とする。
It is an object of the present invention to obtain a light splitting film, an ND filter, and a light splitting element which can obtain smoother transmittance and reflectance characteristics over the entire visible range and can be easily manufactured. And

【0004】[0004]

【発明の概要】本発明は、Ni薄膜とCr薄膜の透過率
−反射率特性に着目したところ、短波長側から長波長側
への反射率−透過率特性がちょうど逆の傾向を示し、両
者を組み合わせると、可視域全域で平滑な反射率−透過
率特性が得られることを見出して完成されたものであ
る。すなわち、本発明の光分割膜は、Ni薄膜層と、C
r薄膜層とを積層してなることを特徴とするものであ
る。反射率/透過率の比は、Ni薄膜層とCr薄膜層の
膜厚比を変えることで変化させることができる。特にN
i薄膜層とCr薄膜層の膜厚比を2.5:1〜3.0:
1とすると、可視域の波長において反射率/透過率≒一
定の特性が得られる。
SUMMARY OF THE INVENTION In the present invention, focusing on the transmittance-reflectance characteristics of Ni thin film and Cr thin film, the reflectance-transmittance characteristics from the short wavelength side to the long wavelength side show the opposite tendency. It has been completed by finding out that a combination of the above-mentioned items can obtain a smooth reflectance-transmittance characteristic in the entire visible range. That is, the light splitting film of the present invention comprises a Ni thin film layer and a C
It is characterized by being laminated with an r thin film layer. The reflectance / transmittance ratio can be changed by changing the film thickness ratio of the Ni thin film layer and the Cr thin film layer. Especially N
The film thickness ratio of the i thin film layer and the Cr thin film layer is 2.5: 1 to 3.0:
When it is set to 1, a characteristic in which reflectance / transmittance ≈ constant is obtained at a wavelength in the visible region.

【0005】本発明のNDフィルターは、透明基板上
に、Ni薄膜層と、Cr薄膜層とを積層してなることを
特徴とするものである。また、本発明の光分割素子は、
Ni薄膜層とCr薄膜層とを積層してなる光分割膜を有
することを特徴とするものである。本発明のNDフィル
ター、光分割素子は、Ni薄膜層とCr薄膜層の基板上
への積層の順序は、問わない。
The ND filter of the present invention is characterized in that a Ni thin film layer and a Cr thin film layer are laminated on a transparent substrate. Further, the light splitting element of the present invention,
It is characterized by having a light splitting film formed by laminating a Ni thin film layer and a Cr thin film layer. In the ND filter and the light splitting element of the present invention, the order of laminating the Ni thin film layer and the Cr thin film layer on the substrate does not matter.

【0006】[0006]

【発明の実施形態】図2と図3は、Crの単層コート膜
の基準波長に対する可視域での透過率と反射率のそれぞ
れの比を示し、図4と図5は、Niの単層コート膜の基
準波長に対する可視域での透過率と反射率のそれぞれの
比を示している。これらの図において、Rは任意の波長
の光の反射率、Tは同透過率、R550は波長550n
mでの反射率、T550は波長550nmでの透過率、
λは任意の波長(nm)、λ550は基準波長が550
nmであることを意味する。
2 and 3 show the respective ratios of the transmittance and the reflectance in the visible region with respect to the reference wavelength of a Cr single-layer coating film, and FIGS. 4 and 5 show the Ni single-layer coating. The respective ratios of the transmittance and the reflectance in the visible region with respect to the reference wavelength of the coating film are shown. In these figures, R is the reflectance of light of an arbitrary wavelength, T is the same transmittance, R550 is the wavelength of 550n.
reflectance at m, T550 is transmittance at a wavelength of 550 nm,
λ is an arbitrary wavelength (nm), λ550 is a reference wavelength of 550
means nm.

【0007】図2と図3から明らかなように、Cr単層
コート膜は、透過率に着目すると、短波長側で低くて長
波長側では逆に高く、しかもその変化は、波長の増減に
対してほぼ単調である。反射率に着目すると、短波長側
で高くて長波長側では逆に低く、しかもその変化は、波
長の増減に対してほぼ単調である。
As is clear from FIGS. 2 and 3, when the transmittance of the Cr single-layer coating film is focused, it is low on the short wavelength side and high on the long wavelength side. On the other hand, it is almost monotonous. Focusing on the reflectance, it is high on the short wavelength side and low on the long wavelength side, and the change is almost monotonous with the increase and decrease of the wavelength.

【0008】他方、図4と図5から明らかなように、N
i単層コート膜は、透過率に着目すると、短波長側で高
くて長波長側では逆に低く、しかもその変化は、波長の
増減に対してほぼ単調である。反射率に着目すると、短
波長側で低くて長波長側では逆に高く、しかもその変化
は、波長の増減に対してほぼ単調である。
On the other hand, as is clear from FIGS. 4 and 5, N
Focusing on the transmittance, the i single-layer coat film has a high value on the short wavelength side and a low value on the long wavelength side, and the change is almost monotonous with the increase and decrease in the wavelength. Focusing on the reflectance, the reflectance is low on the short wavelength side and high on the long wavelength side, and the change is almost monotonous with the increase and decrease in the wavelength.

【0009】本発明は、このCr単層コート膜とNi単
層コートの反射率−透過率特性を利用して、平滑な反射
率−透過率特性を得たものである。図1は、透明基板1
1上にNi単層コート膜12とCr単層コート膜13を
積層形成した平行平面板タイプのビームスプリッタ(光
束分割素子)の模式図である。Ni単層コート膜12と
Cr単層コート膜13の成膜の順序は、逆でもよい。こ
のビームスプリッタは、例えば次のように製造される。
真空蒸着装置内に、透明蒸着基板(平行平面ガラスまた
は樹脂材料)をセットし、同装置内のルツボ内に、Ni
とCrのコート材料をセットする。蒸着釜内部を真空ポ
ンプを用いて排気して、釜内部の真空度が高真空状態
(例えば1.5×10-5Torr程度)に至ったとき、電子
ビーム蒸着法により、NiとCrの成膜を行なう。上述
のように、成膜の順序は、一層目にNi、二層目にCr
でも、一層目にCr、二層目にNiのいずれでもよい。
The present invention obtains smooth reflectance-transmittance characteristics by utilizing the reflectance-transmittance characteristics of the Cr single-layer coat film and the Ni single-layer coat. FIG. 1 shows a transparent substrate 1.
FIG. 2 is a schematic diagram of a parallel-plane plate type beam splitter (beam splitting element) in which a Ni single-layer coat film 12 and a Cr single-layer coat film 13 are laminated and formed on 1; The Ni single-layer coat film 12 and the Cr single-layer coat film 13 may be formed in the reverse order. This beam splitter is manufactured as follows, for example.
A transparent vapor deposition substrate (parallel flat glass or resin material) is set in the vacuum vapor deposition device, and Ni is placed in the crucible in the same device.
And Cr coating materials are set. When the inside of the evaporation chamber is evacuated using a vacuum pump and the degree of vacuum inside the evaporation chamber reaches a high vacuum state (for example, about 1.5 × 10 −5 Torr), Ni and Cr are formed by an electron beam evaporation method. Do the membrane. As described above, the order of film formation is Ni for the first layer and Cr for the second layer.
However, Cr may be used for the first layer and Ni for the second layer.

【0010】図6は、透明基板11としてガラス(BK
7、波長550nmでの屈折率1.518)を用い、こ
の透明基板上に、約7nmのNi単層コート膜12と、
約2.3nmのCr単層コート膜13を積層形成したビ
ームスプリッタを、光軸に対して45゜をなす角度でお
いたときの反射率−透過率特性を示している。また、図
7、図8は、基準波長(550nm)に対する可視域に
おける透過率比と反射率との比を示している。これらの
図から明らかなように、可視域での透過率と反射率の分
光比は、ほぼ1:1であり、きわめて平滑な透過率−反
射率特性が得られる。ほぼ1:1の透過率:反射率比を
得るには、Ni膜厚を6.0〜7.5nm、Cr膜厚を
2.0〜2.4nmにするとよい。
FIG. 6 shows a transparent substrate 11 made of glass (BK
7, a refractive index of 1.518 at a wavelength of 550 nm), and a Ni single-layer coating film 12 of about 7 nm on the transparent substrate,
The reflectance-transmittance characteristics are shown when the beam splitter in which the Cr single-layer coat film 13 having a thickness of about 2.3 nm is laminated is placed at an angle of 45 ° with respect to the optical axis. 7 and 8 show the ratio of the transmittance and the reflectance in the visible range with respect to the reference wavelength (550 nm). As is clear from these figures, the spectral ratio between the transmittance and the reflectance in the visible region is approximately 1: 1 and extremely smooth transmittance-reflectance characteristics can be obtained. To obtain a transmittance: reflectance ratio of about 1: 1, the Ni film thickness should be 6.0 to 7.5 nm and the Cr film thickness should be 2.0 to 2.4 nm.

【0011】以上のNiとCrのコート膜の厚さは、可
視域での透過率と反射率の分光比をほぼ1:1とするた
めの例であり、他の分光比を得ることも勿論可能であ
る。すなわち、透過率−反射率特性は、NiとCrの膜
厚比を変えることにより変化させることができ、いずれ
の分光比でも、可視域の波長における平滑な透過率−反
射率特性を得ることができる。特に、NiとCrの膜厚
比が2.5:1〜3.0:1の範囲で、平滑な分光特性
が得られる。
The thicknesses of the Ni and Cr coat films described above are examples for making the spectral ratio of the transmittance and the reflectance in the visible region approximately 1: 1, and other spectral ratios can of course be obtained. It is possible. That is, the transmittance-reflectance characteristic can be changed by changing the film thickness ratio of Ni and Cr, and any spectral ratio can obtain a smooth transmittance-reflectance characteristic in the visible wavelength range. it can. In particular, smooth spectral characteristics can be obtained when the film thickness ratio of Ni and Cr is in the range of 2.5: 1 to 3.0: 1.

【0012】[0012]

【発明の効果】本発明の光分割膜によれば、可視域全域
に渡り、より平滑な透過率、反射率特性が得られる。し
かも、その膜構成は、NiとCrの2つの膜だけからな
るから、製造も容易であり、NDフィルターや光分割素
子を安価に得ることができる。
According to the light splitting film of the present invention, smoother transmittance and reflectance characteristics can be obtained over the entire visible range. Moreover, since the film structure is composed of only two films of Ni and Cr, it is easy to manufacture and the ND filter and the light splitting element can be obtained at low cost.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明によるビームスプリッタの模式図であ
る。
FIG. 1 is a schematic diagram of a beam splitter according to the present invention.

【図2】Cr単層コート膜のある波長における反射率特
性を示す図である。
FIG. 2 is a diagram showing reflectance characteristics of a Cr single-layer coating film at a certain wavelength.

【図3】Cr単層コート膜のある波長における透過率特
性を示す図である。
FIG. 3 is a diagram showing transmittance characteristics of a Cr single-layer coat film at a certain wavelength.

【図4】Ni単層コート膜のある波長における反射率特
性を示す図である。
FIG. 4 is a diagram showing reflectance characteristics of a Ni single-layer coating film at a certain wavelength.

【図5】Ni単層コート膜のある波長における透過率特
性を示す図である。
FIG. 5 is a diagram showing transmittance characteristics of a Ni single-layer coating film at a certain wavelength.

【図6】本発明による光分割膜の反射率−透過率特性の
一例を示す図である。
FIG. 6 is a diagram showing an example of reflectance-transmittance characteristics of a light splitting film according to the present invention.

【図7】同透過率特性を示す図である。FIG. 7 is a diagram showing the same transmittance characteristic.

【図8】同反射率特性を示す図である。FIG. 8 is a diagram showing the same reflectance characteristic.

【符号の説明】[Explanation of symbols]

11 透明基板 12 Ni単層コート膜 13 Cr単層コート膜 11 Transparent Substrate 12 Ni Single Layer Coat Film 13 Cr Single Layer Coat Film

Claims (10)

【特許請求の範囲】[Claims] 【請求項1】 Ni薄膜層と、Cr薄膜層とを積層して
なる光分割膜。
1. A light splitting film formed by stacking a Ni thin film layer and a Cr thin film layer.
【請求項2】 請求項1において、Ni薄膜層とCr薄
膜層の膜厚比は、2.5:1〜3.0:1である光分割
膜。
2. The light splitting film according to claim 1, wherein a film thickness ratio of the Ni thin film layer and the Cr thin film layer is 2.5: 1 to 3.0: 1.
【請求項3】 透明基板上に、Ni薄膜層と、Cr薄膜
層とを積層してなるNDフィルター。
3. An ND filter formed by laminating a Ni thin film layer and a Cr thin film layer on a transparent substrate.
【請求項4】 請求項3において、Ni薄膜層とCr薄
膜層は、基板側から、Ni薄膜層、Cr薄膜層の順に形
成されているNDフィルター。
4. The ND filter according to claim 3, wherein the Ni thin film layer and the Cr thin film layer are formed in this order from the substrate side to the Ni thin film layer and the Cr thin film layer.
【請求項5】 請求項3において、Ni薄膜層とCr薄
膜層は、基板側から、Cr薄膜層、Ni薄膜層の順に形
成されているNDフィルター。
5. The ND filter according to claim 3, wherein the Ni thin film layer and the Cr thin film layer are formed in order of the Cr thin film layer and the Ni thin film layer from the substrate side.
【請求項6】 請求項3ないし5のいずれか1項におい
て、Ni薄膜層とCr薄膜層の膜厚比は、2.5:1〜
3.0:1であるNDフィルター。
6. The film thickness ratio between the Ni thin film layer and the Cr thin film layer according to claim 3, wherein the film thickness ratio is 2.5: 1 to 1: 1.
ND filter that is 3.0: 1.
【請求項7】 Ni薄膜層とCr薄膜層とを積層してな
る光分割膜を有する光分割素子。
7. A light splitting element having a light splitting film formed by stacking a Ni thin film layer and a Cr thin film layer.
【請求項8】 請求項7において、Ni薄膜層とCr薄
膜層は、基板側から、Ni薄膜層、Cr薄膜層の順に形
成されている光分割素子。
8. The light splitting element according to claim 7, wherein the Ni thin film layer and the Cr thin film layer are formed in this order from the substrate side to the Ni thin film layer and the Cr thin film layer.
【請求項9】 請求項7において、Ni薄膜層とCr薄
膜層は、基板側から、Cr薄膜層、Ni薄膜層の順に形
成されている光分割素子。
9. The light splitting element according to claim 7, wherein the Ni thin film layer and the Cr thin film layer are formed in this order from the substrate side to the Cr thin film layer and the Ni thin film layer.
【請求項10】 請求項5ないし7のいずれか1項にお
いて、Ni薄膜層とCr薄膜層の膜厚比は、2.5:1
〜3.0:1である光分割素子。
10. The film thickness ratio between the Ni thin film layer and the Cr thin film layer according to claim 5, wherein the film thickness ratio is 2.5: 1.
~ 3.0: 1 light splitting element.
JP10527296A 1996-04-25 1996-04-25 Light splitting film, ND filter, and light splitting element Expired - Fee Related JP3679500B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10527296A JP3679500B2 (en) 1996-04-25 1996-04-25 Light splitting film, ND filter, and light splitting element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10527296A JP3679500B2 (en) 1996-04-25 1996-04-25 Light splitting film, ND filter, and light splitting element

Publications (2)

Publication Number Publication Date
JPH09292503A true JPH09292503A (en) 1997-11-11
JP3679500B2 JP3679500B2 (en) 2005-08-03

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Country Status (1)

Country Link
JP (1) JP3679500B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106501892A (en) * 2016-12-29 2017-03-15 北京同生科技有限公司 A kind of new neutral attenuating filters preparation method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106501892A (en) * 2016-12-29 2017-03-15 北京同生科技有限公司 A kind of new neutral attenuating filters preparation method
CN106501892B (en) * 2016-12-29 2019-03-05 北京同生科技有限公司 A kind of neutrality attenuating filters preparation method

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