JP2566634B2 - Multi-layer antireflection film - Google Patents
Multi-layer antireflection filmInfo
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- JP2566634B2 JP2566634B2 JP63250162A JP25016288A JP2566634B2 JP 2566634 B2 JP2566634 B2 JP 2566634B2 JP 63250162 A JP63250162 A JP 63250162A JP 25016288 A JP25016288 A JP 25016288A JP 2566634 B2 JP2566634 B2 JP 2566634B2
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- refractive index
- film
- low
- antireflection film
- index film
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Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は透明基板の表面での光の反射を減少させるた
めに、この透明基板上に形成される多層反射防止膜に関
するものであって、特にカメラ等の光学機器に使用され
るレンズ等に適用するものである。Description: TECHNICAL FIELD The present invention relates to a multilayer antireflection film formed on a transparent substrate in order to reduce reflection of light on the surface of the transparent substrate, In particular, it is applied to lenses used in optical devices such as cameras.
従来より光学機器に使用されている反射防止膜は、単
層,2層,3層のものである。単層として最も一般的なもの
はフッ化マグネシウム（MgF2屈折率ｎ＝1.38）を形成す
る方法である。２層反射防止膜は高屈折率膜と低屈折率
膜の構成により反射防止帯域をやや拡げることができ
る。３層反射防止膜は可視域で用いられる最も一般的な
反射防止膜であり、２層反射防止膜に比較してさらに反
射防止帯域を拡げることもできる。Conventionally, antireflection films used for optical devices are single-layer, two-layer, and three-layer. The most common single layer is a method of forming magnesium fluoride (MgF 2 refractive index n = 1.38). The antireflection band of the two-layer antireflection film can be slightly widened by the configuration of the high refractive index film and the low refractive index film. The three-layer antireflection film is the most general antireflection film used in the visible region, and can further extend the antireflection band as compared with the two-layer antireflection film.
ところで可視光の波長領域（400〜700nm）に対する反
射防止効果は３層構造のものではカメラ等のレンズ用に
対しては十分得ることができない。ガラス基板の屈折率
が種々異なるものに可視光の波長領域で十分な反射防止
効果を得るためには、３層構造の中屈折率膜を高屈折率
膜と低屈折率膜で置換し、更に高屈折率膜を高屈折率
膜，低屈折率膜，高屈折率膜に置換した６層構造のもの
が開発されている。このような６層構造にすることによ
り可視光全域に渡ってほぼ良好な反射防止効果を得るこ
とができる。By the way, the antireflection effect in the visible light wavelength region (400 to 700 nm) cannot be sufficiently obtained for a lens such as a camera with a three-layer structure. In order to obtain a sufficient antireflection effect in the visible light wavelength range for glass substrates having different refractive indexes, the medium-refractive-index film with a three-layer structure is replaced with a high-refractive-index film and a low-refractive-index film. A 6-layer structure in which a high refractive index film is replaced with a high refractive index film, a low refractive index film, and a high refractive index film has been developed. With such a 6-layer structure, a substantially good antireflection effect can be obtained over the entire visible light range.
次に第４図，第５図により従来の６層反射防止膜の構
成及び分光反射特性について説明する。Next, the structure and spectral reflection characteristics of the conventional 6-layer antireflection film will be described with reference to FIGS.
まず第４図は従来の６層反射防止膜を示すものであっ
てこの場合低屈折率膜材料としてはMgF2（ｎ＝1.38）お
よびAl2O3（ｎ＝1.63）が用いられている。図中１はガ
ラス基板（ｎ＝1.62）、２は膜厚120ÅのZrO2からなる
第１の高屈折率膜、２は膜厚370ÅのAl2O3からなる第１
の低屈折率膜、４は膜厚650ÅのZrO2からなる第２の高
屈折率膜、５は膜厚120ÅのAl2O3からなる第２の低屈折
率膜、６は膜厚320ÅのZrO2からなる第３の高屈折率
膜、７は膜厚960ÅのMgF2からなる第３の低屈折率膜で
ある。First, FIG. 4 shows a conventional 6-layer antireflection film, in which MgF 2 (n = 1.38) and Al 2 O 3 (n = 1.63) are used as the low refractive index film material. In the figure, 1 is a glass substrate (n = 1.62), 2 is a first high-refractive-index film made of ZrO 2 having a film thickness of 120 Å, 2 is a first high refractive index film made of Al 2 O 3 having a film thickness of 370 Å
Low refraction index film, 4 is a second high refraction index film made of ZrO 2 having a film thickness of 650Å, 5 is a second low refraction index film made of Al 2 O 3 having a film thickness of 120Å, and 6 is a film having a film thickness of 320Å A third high-refractive index film made of ZrO 2 and a third low-refractive index film 7 made of MgF 2 having a film thickness of 960Å.
第５図は上記の如く構成された従来例の分光反射特性
を示したものである。これらからわかるように従来例の
場合可視光のほぼ全域に渡って優れた特徴を有してい
る。FIG. 5 shows the spectral reflection characteristics of the conventional example configured as described above. As can be seen from these, the conventional example has excellent characteristics over almost the entire visible light range.
このように従来の真空蒸着法による多層反射防止の技
術は光学特性上ほぼ完成されたものであると考えてよ
い。As described above, it can be considered that the conventional technique for preventing multilayer reflection by the vacuum evaporation method is almost completed in terms of optical characteristics.
ところで最近の生産形態の多様化にともなって、真空
蒸着法による多層反射防止膜形成から他の成膜方法、特
にスパッタリングによる多層反射防止膜形成の技術が検
討されている。スパッタ法による多層反射防止膜の技術
的メリットとして、 自動化への対応がしやすい 膜特性の向上が計れる（膜硬度、密着性向上） 基板温度を上げなくても屈折率の高い膜が得られる。By the way, with the recent diversification of production forms, various techniques for forming a multilayer antireflection film by a vacuum vapor deposition method, in particular, a technique for forming a multilayer antireflection film by sputtering have been investigated. As a technical advantage of the multi-layer antireflection film by the sputtering method, it is easy to adapt to automation. It is possible to improve the film characteristics (improvement of film hardness and adhesion). A film with a high refractive index can be obtained without raising the substrate temperature.
等があげられる。Etc.
従来スパッタリングによる反射防止膜の提案として特
開昭63−131101がある。この提案の目的はブラウン管等
への反射防止膜への適用であり、カメラ等のレンズ用は
基板の屈折率が多様なため、この提案では対応できず十
分な反射防止特性が得られない。As a conventional proposal of an antireflection film by sputtering, there is JP-A-63-131101. The purpose of this proposal is to apply it to an antireflection film for cathode ray tubes and the like, and for lenses for cameras and the like, the refractive index of the substrate is various, so this proposal cannot be applied and sufficient antireflection characteristics cannot be obtained.
上述したように真空蒸着法による従来の多層反射防止
膜はその反射特性はほぼ完成されたところまできてい
る。ところが従来の反射防止膜の構成にはスパッタリン
グ法を適用することはできない。As described above, the reflection characteristics of the conventional multilayer antireflection film formed by the vacuum evaporation method are almost completed. However, the sputtering method cannot be applied to the conventional structure of the antireflection film.
その理由は、低屈折率膜の材料として使用されるMgF2
はその結合エネルギーが低く、スパッタリングしようと
しても解離してしまうため、スパッタリングによりMgF2
の膜を形成するのが不可能であることである。The reason is that MgF 2 used as a material for low refractive index films
Since its binding energy is low and it dissociates even when attempting sputtering, MgF 2
It is impossible to form a film.
すなわち真空蒸着法による多層反射防止膜に匹敵する
特性を持つ反射防止膜をスパタリングによって得る技術
はこれまで実現されていなかった。That is, a technique for obtaining an antireflection film having a characteristic comparable to that of a multilayer antireflection film by the vacuum deposition method by sputtering has not been realized so far.
本発明は透明基板上にこの透明基板から遠ざかる方向
に向って、第１の高屈折率膜，第１の低屈折率膜，第２
の高屈折率膜，第２の低屈折率膜，第３の高屈折率膜，
第３の低屈折率膜がこの順に積層された６層構造の多層
反射防止膜において、第1,第２及び第３の高屈折率膜が
すべて反応性スパッタリングにより形成されたことを特
徴とする多層反射防止膜である。The present invention provides a first high refractive index film, a first low refractive index film, a second low refractive index film, and a second high refractive index film on a transparent substrate in a direction away from the transparent substrate.
High refractive index film, second low refractive index film, third high refractive index film,
A multilayer antireflection film having a six-layer structure in which a third low-refractive index film is laminated in this order, characterized in that the first, second and third high-refractive index films are all formed by reactive sputtering. It is a multilayer antireflection film.
MgF2に代わる低屈折率膜材料であってスパッタリング
法も適用できる材料としてSiO2,Al2O3が好適である。こ
れらの材料は低屈折率といってもMgF2より屈折率が高
く、SiO2では1.46〜1.50、Al2O3では1.50〜1.63であ
る。SiO2とAl2O3を混合して用いることもできる。この
場合はSiO2とAl2O3の中間の屈折率になる。またこの他
の材料であっても屈折率がSiO2やAl2O3と同程度であれ
ば本発明の反射防止膜に適用できる。SiO 2 and Al 2 O 3 are suitable as a low-refractive-index film material that replaces MgF 2 and a material to which the sputtering method can also be applied. Although these materials have a low refractive index, they have a higher refractive index than MgF 2 , which is 1.46 to 1.50 for SiO 2 and 1.50 to 1.63 for Al 2 O 3 . It is also possible to use a mixture of SiO 2 and Al 2 O 3 . In this case, the refractive index is between that of SiO 2 and Al 2 O 3 . Also, other materials can be applied to the antireflection film of the present invention as long as the refractive index is about the same as that of SiO 2 or Al 2 O 3 .
低屈折率材料としてはMgF2よりは高屈折の材料を使わ
ざるを得ないため、これと組み合わせて用いる高屈折率
材料として従来の高屈折率材料（例えばZrO2,n＝2.0〜
2.3）より高い屈折率を持つTiO2（ｎ＝2.3〜2.5）を用
いることが必要となる。Since a material having a higher refractive index than MgF 2 must be used as the low refractive index material, a conventional high refractive index material (eg, ZrO 2 , n = 2.0 ~
It is necessary to use TiO 2 (n = 2.3 to 2.5) having a higher refractive index than 2.3).
ところが高屈折率膜の材料として使用されるTiO2には
問題点がある。TiO2は高屈折率膜材料としては屈折率が
最も高いものの１つであるが、TiO2をスパッタした場
合、蒸着膜と比較して400nm前後での屈折率が急激に高
くなっていることが実験で確かめられた。その結果スパ
ッタリングで多層反射防止膜を形成しようとした場合、
高屈折率膜としてTiO2のみを使用すると分光特性のバン
ド巾が狭くなることがわかった。さらにTiO2は400〜450
nmでの吸収がやや多い、スパッタリングレートが低いと
いう、特性上，生産上の問題点を持っている。However, TiO 2 used as a material for the high refractive index film has a problem. TiO 2 is one of the materials with the highest refractive index as a high-refractive index film material, but when TiO 2 is sputtered, the refractive index around 400 nm is suddenly higher than that of the evaporated film. Confirmed by experiment. As a result, when trying to form a multilayer antireflection film by sputtering,
It was found that the band width of the spectral characteristic was narrowed when only TiO 2 was used as the high refractive index film. Furthermore, TiO 2 is 400-450
There are problems in production due to the characteristics that absorption at nm is a little high and the sputtering rate is low.
第２の高屈折率膜として屈折率が2.0〜2.3の材料を用
い、第１および第３の高屈折率膜材料として屈折率2.3
〜2.5であるTiO2を用いることは本発明の特徴である。
ただし2.0〜2.3以上の屈折率を持つ材料であればTiO2以
外の物質でも良好な特性をもつ多層反射防止膜を実現す
ることは可能である。A material having a refractive index of 2.0 to 2.3 is used as the second high refractive index film, and a refractive index of 2.3 as the first and third high refractive index film materials.
It is a feature of the present invention to use TiO 2 which is ˜2.5.
However, as long as the material has a refractive index of 2.0 to 2.3 or more, it is possible to realize a multilayer antireflection film having good characteristics even with substances other than TiO 2 .
この特徴により第1,第２及び第３の高屈折率膜を屈折
率をすべて2.3〜2.5とした場合に比べ良好な反射特性が
得られ、特にバンド巾が拡がることがわかった。Due to this feature, it was found that better reflection characteristics were obtained and the band width was particularly widened as compared with the case where the first, second and third high refractive index films all had a refractive index of 2.3 to 2.5.
さらに６層反射防止膜の光学設計から、膜厚は第２の
高屈折率膜が最も厚くなるが、ここで第２の高屈折率膜
としてスパッタリングレートの低いTiO2を使用しないた
め生産の効率化が計れる。そして高屈折率膜すべてをメ
タルターゲットを反応性スパッタリングして形成する方
法により、酸化物ターゲットを使用する際に発生するタ
ーゲットの割れの問題を回避することが可能になり、製
造上有利になる。Furthermore, due to the optical design of the 6-layer antireflection film, the second high-refractive index film has the largest film thickness, but since TiO 2 having a low sputtering rate is not used as the second high-refractive index film, the production efficiency is improved. Can be measured. The method of forming all the high refractive index films by reactive sputtering of a metal target makes it possible to avoid the problem of target cracking that occurs when using an oxide target, which is advantageous in manufacturing.
また本発明では６層構成による多層防止膜としたた
め、ガラス基板の屈折率が種々変ってもそれに対応して
可視域で優れた分光反射特性を得ることができる。特に
ガラス基板の屈折率が高い（ｎ＝1.8）場合には特に有
効である。Further, in the present invention, since the multi-layered film having a six-layer structure is used, even if the refractive index of the glass substrate is variously changed, it is possible to obtain an excellent spectral reflection characteristic in the visible region. This is particularly effective when the glass substrate has a high refractive index (n = 1.8).
第1,第３の高屈折率膜としてTiO2の他に屈折率が2.3
〜2.5の他の透明材料を用いることができる。またその
膜厚は選択される材料により適宜設定することができ
る。The first and third high refractive index films have a refractive index of 2.3 in addition to TiO 2.
Other transparent materials of ~ 2.5 can be used. Further, the film thickness can be appropriately set depending on the selected material.
又第２の高屈折率膜としてはZrO2の他、Ta2O5,InO3,S
nO2,Nb2O5もしくはYb2O3又はこれらの混合物でその屈折
率が2.0〜2.3にある透明材料を用いることができる。膜
厚は、選択される材料により適宜設定することができ
る。As the second high refractive index film, in addition to ZrO 2 , Ta 2 O 5 , InO 3 , S
A transparent material having a refractive index of 2.0 to 2.3, which is nO 2 , Nb 2 O 5, Yb 2 O 3, or a mixture thereof, can be used. The film thickness can be appropriately set depending on the selected material.
更に第１の屈折率膜としては上記SiO2の他Al2O3また
はこれら両者の混合物またはこれらの一方もしくは両方
を主成分とする透明材料で屈折率が1.46〜1.63のものが
用いることができる。Further, as the first refractive index film, in addition to the above SiO 2 , Al 2 O 3 or a mixture of both of them, or a transparent material having one or both of them as a main component and having a refractive index of 1.46 to 1.63 can be used. .
又第2,第３の低屈折率膜としては、SiO2の他SiO2とAl
2O3との混合物、あるいはSiO2を主成分とする透明材料
でその屈折率が1.46〜1.50のものを適宜選択して用いる
ことができる。The second, the third low refractive index film, another SiO 2 and Al SiO 2
A mixture with 2 O 3 or a transparent material containing SiO 2 as a main component and having a refractive index of 1.46 to 1.50 can be appropriately selected and used.
以下第１図及び第２図によって本発明の一実施例を詳
細に説明する。An embodiment of the present invention will be described in detail below with reference to FIGS. 1 and 2.
第１図において１はガラス基板（ｎ＝1.52）からなる
透明基板、2,3は膜厚80ÅのTiO2（ｎ＝2.5）からなる第
１の高屈折率膜及び膜厚350ÅのSiO2（ｎ＝1.47）から
なる第１の低屈折率膜である。4,5は膜厚1100ÅのZrO2
（ｎ＝2.1）からなる第２の高屈折率膜及び膜厚15ÅのS
iO2からなる第２の低屈折率膜である。そして6,7は膜厚
100ÅのTiO2からなる第３の高屈折率膜及び膜厚890Åの
SiO2からなる第３の低屈折率膜である。In FIG. 1, 1 is a transparent substrate made of a glass substrate (n = 1.52), 2 and 3 are a first high refractive index film made of TiO 2 (n = 2.5) with a film thickness of 80 Å and SiO 2 (350 Å film with a film thickness of 350 Å). It is a first low refractive index film made of n = 1.47). 4,5 are ZrO 2 with a film thickness of 1100Å
Second high refractive index film consisting of (n = 2.1) and S of 15Å film thickness
It is a second low refractive index film made of iO 2 . And 6,7 is the film thickness
The third high-refractive index film made of 100 Å TiO 2 and the film thickness of 890 Å
This is a third low refractive index film made of SiO 2 .
この６層反射防止膜において、上記膜2,3,4,5,6,7を
構成する材料は、可視光の波長領域で反射率を０もしく
は極めて小さくする為に、反射光の位相条件及び振幅条
件を所望する如く満たすよう材料選択されると共に膜厚
が各々設定されている。In this 6-layer antireflection film, the materials forming the films 2, 3, 4, 5, 6, and 7 have a phase condition of the reflected light and a very small value in order to make the reflectance 0 or extremely small in the visible light wavelength region. The material is selected and the film thickness is set so as to satisfy the amplitude condition as desired.
また主なスパッタリング条件としては反応性マグネト
ロンスパッタリング法を用いて次のようである。The main sputtering conditions are as follows using the reactive magnetron sputtering method.
O2分圧： 20〜30％ スパッタ圧力： 0.3〜0.8pa 次にこの６層反射防止膜の分光反射特性を第２図に示
す。同図から明らかなように本実施例における６層反射
防止膜は可視光のほぼ全域（400〜700nm）に割り優れた
特性を有している。O 2 partial pressure: 20 to 30% Sputtering pressure: 0.3 to 0.8 pa Next, FIG. 2 shows the spectral reflection characteristics of this 6-layer antireflection film. As is clear from the figure, the six-layer antireflection film in this example has excellent characteristics, which is almost the entire visible light range (400 to 700 nm).
比較例として第２の高屈折率膜をTiO2で構成した場合
の分光反射特性を第３図に示す。第３図の分光反射特性
と本発明による層構成の分光反射特性とを比較すると明
らかにTiO2−SiO2系のバンド巾が狭いことがわかる。As a comparative example, FIG. 3 shows the spectral reflection characteristics when the second high refractive index film is made of TiO 2 . By comparing the spectral reflection characteristics of FIG. 3 with the spectral reflection characteristics of the layer structure according to the present invention, it is apparent that the band width of the TiO 2 —SiO 2 system is narrow.
このように、本実施例によれば、スパッタリングレー
トの遅いTiO2を最も膜厚の厚い第２の高屈折率膜に使用
しないことにより製造上有利でありかつ分光反射特性も
優れたものが得られる。As described above, according to the present embodiment, by not using TiO 2 having a slow sputtering rate for the second thickest high-refractive-index film, it is possible to obtain a product which is advantageous in manufacturing and has excellent spectral reflection characteristics. To be
以上説明したように、本発明によれば、分光反射特性
に優れた多層反射防止膜をスパッタリング法により高効
率に作成できるため低コストで提供でき実用的である。As described above, according to the present invention, a multilayer antireflection film having excellent spectral reflection characteristics can be produced with high efficiency by a sputtering method, and thus it can be provided at low cost and is practical.
第１図は本発明の一実施例における多層反射防止膜を示
す断面図、第２図は第１図に示す多層反射防止膜の分光
反射特性図、第３図はTiO2/SiO2系の６層反射防止膜の
分光反射特性図、第４図は従来の６層反射防止膜を示す
断面図、第５図は第４図に示す多層反射防止膜の分光反
射特性図である。 １……ガラス基板 ２……第１の高屈折率膜 ３……第１の低屈折率膜 ４……第２の高屈折率膜 ５……第２の低屈折率膜 ６……第３の高屈折率膜 ７……第３の低屈折率膜FIG. 1 is a cross-sectional view showing a multilayer antireflection film in one embodiment of the present invention, FIG. 2 is a spectral reflection characteristic diagram of the multilayer antireflection film shown in FIG. 1, and FIG. 3 is a TiO 2 / SiO 2 system. FIG. 4 is a spectral reflection characteristic diagram of the 6-layer antireflection film, FIG. 4 is a sectional view showing a conventional 6-layer antireflection film, and FIG. 5 is a spectral reflection characteristic diagram of the multilayer antireflection film shown in FIG. 1 ... Glass substrate 2 ... First high-refractive index film 3 ... First low-refractive index film 4 ... Second high-refractive index film 5 ... Second low-refractive index film 6 ... Third High Refractive Index Film 7 ... Third Low Refractive Index Film
Claims (6)
に向かって、第１の高屈折率膜、第１の低屈折率膜、第
２の高屈折率膜、第２の低屈折率膜、第３の高屈折率
膜、第３の低屈折率膜がこの順に積層された６層構造の
多層反射防止膜において、第１、第２及び第３の高屈折
率膜がすべて反応性スパッタリングによい形成され、第
１及び第３の高屈折率膜が屈折率2.3〜2.5のTiO2であっ
て、第２の高屈折率膜の屈折率が2.0〜2.3である多層反
射防止膜。1. A first high-refractive-index film, a first low-refractive-index film, a second high-refractive-index film, and a second low-refractive-index film on a transparent substrate in a direction extending from the transparent film. In a 6-layered multilayer antireflection film in which a film, a third high refractive index film, and a third low refractive index film are laminated in this order, the first, second, and third high refractive index films are all reactive. A multi-layer antireflection film which is well formed for sputtering, wherein the first and third high refractive index films are TiO 2 having a refractive index of 2.3 to 2.5 , and the second high refractive index film has a refractive index of 2.0 to 2.3.
あり上記第２及び第３の低屈折率膜の屈折率が1.46〜1.
50である請求項１に記載の多層反射防止膜。2. The first low refractive index film has a refractive index of 1.46 to 1.63, and the second and third low refractive index films have a refractive index of 1.46 to 1.3.
The multilayer antireflection film according to claim 1, which has a thickness of 50.
がいずれも1.46〜1.50である請求項２記載の多層反射防
止膜。3. The multilayer antireflection film according to claim 2, wherein each of the first, second and third low refractive index films has a refractive index of 1.46 to 1.50.
2,Nb2O5もしくはYb2O3又はこれらの混合物からなること
を特徴とする請求項１、２または３に記載の多層反射防
止膜。4. The second high refractive index film is Ta 2 O 5 , ZrO 2 , In 2 O 3 , SnO.
The multilayer antireflection film according to claim 1, 2 or 3, comprising 2 , Nb 2 O 5 or Yb 2 O 3 or a mixture thereof.
もしくはこれらの混合物、またはこれらの一方もしくは
両方を主成分とする物質からなることを特徴とする請求
項１に記載の多層反射防止膜。5. The first low refractive index film is made of one of SiO 2 and Al 2 O 3 , or a mixture thereof, or a substance containing one or both of these as a main component. The multilayer antireflection film as described in 1.
l2O3との混合物、またはSiO2を主成分とする物質からな
ることを特徴とする請求項１に記載の多層反射防止膜。6. The second and third low-refractive-index films are SiO 2 , SiO 2 and A.
The multilayer antireflection film according to claim 1, which is made of a mixture with l 2 O 3 or a substance containing SiO 2 as a main component.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63250162A JP2566634B2 (en) | 1988-10-04 | 1988-10-04 | Multi-layer antireflection film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63250162A JP2566634B2 (en) | 1988-10-04 | 1988-10-04 | Multi-layer antireflection film |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0296701A JPH0296701A (en) | 1990-04-09 |
| JP2566634B2 true JP2566634B2 (en) | 1996-12-25 |
Family
ID=17203745
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63250162A Expired - Fee Related JP2566634B2 (en) | 1988-10-04 | 1988-10-04 | Multi-layer antireflection film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2566634B2 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20170094416A (en) | 2015-02-27 | 2017-08-17 | 제이엑스금속주식회사 | Oxide sintered compact, oxide sputtering target, and oxide thin film |
| WO2018194348A1 (en) * | 2017-04-17 | 2018-10-25 | 주식회사 케이씨씨 | Lamination system |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2730990B1 (en) * | 1995-02-23 | 1997-04-04 | Saint Gobain Vitrage | TRANSPARENT SUBSTRATE WITH ANTI-REFLECTIVE COATING |
| JP4701528B2 (en) * | 2001-04-17 | 2011-06-15 | ソニー株式会社 | Antireflection film |
| JP5170009B2 (en) * | 2009-06-24 | 2013-03-27 | 住友金属鉱山株式会社 | Indium oxide sputtering target and method for producing the same |
| JP5614214B2 (en) * | 2010-10-01 | 2014-10-29 | リコーイメージング株式会社 | Antireflection film and optical member having antireflection film |
| JP6995491B2 (en) | 2017-04-21 | 2022-01-14 | キヤノン株式会社 | Manufacturing method of optical thin film, optical element, optical element |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58221811A (en) * | 1982-06-17 | 1983-12-23 | Fuji Photo Optical Co Ltd | Heat-resistant antireflection film |
| JPS6381405A (en) * | 1986-09-26 | 1988-04-12 | Minolta Camera Co Ltd | Preparation of optical element |
| JPH07111482B2 (en) * | 1986-11-21 | 1995-11-29 | 日本板硝子株式会社 | Multi-layer antireflection film |
-
1988
- 1988-10-04 JP JP63250162A patent/JP2566634B2/en not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20170094416A (en) | 2015-02-27 | 2017-08-17 | 제이엑스금속주식회사 | Oxide sintered compact, oxide sputtering target, and oxide thin film |
| WO2018194348A1 (en) * | 2017-04-17 | 2018-10-25 | 주식회사 케이씨씨 | Lamination system |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0296701A (en) | 1990-04-09 |
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