JPH11142623A - Prism type beam splitter - Google Patents
Prism type beam splitterInfo
- Publication number
- JPH11142623A JPH11142623A JP9310306A JP31030697A JPH11142623A JP H11142623 A JPH11142623 A JP H11142623A JP 9310306 A JP9310306 A JP 9310306A JP 31030697 A JP31030697 A JP 31030697A JP H11142623 A JPH11142623 A JP H11142623A
- Authority
- JP
- Japan
- Prior art keywords
- prism
- beam splitter
- dielectric layer
- refractive index
- type beam
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明はカメラ、複写機、プ
リンター、顕微鏡、望遠鏡等の各種光学製品、光ディス
ク、光導波路結合・分岐用の主要光学部品に用いられる
プリズム式ビームスプリッタに関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a prism type beam splitter used for various optical products such as a camera, a copying machine, a printer, a microscope, a telescope, etc., an optical disk, and a main optical part for coupling / branching an optical waveguide.
【０００２】[0002]
【従来の技術】プリズム式ビームスプリッタ(ハーフミ
ラーと呼ばれることもある)としては２個のプリズムを
使用し、該接合面に光半透過用の薄膜部（光半透膜）を
設ける構成が採られている。このようなビームスプリッ
タは一般に、１）透過率および反射率に対して波長依存
性が小さいこと、２）吸収率が小さいこと等の光学的特
性が要求される。2. Description of the Related Art Two prisms are used as a prism type beam splitter (sometimes called a half mirror), and a thin film portion for transmitting light (semi-transmissive film) is provided on the joint surface. Have been. In general, such a beam splitter is required to have optical characteristics such as 1) small wavelength dependency with respect to transmittance and reflectance, and 2) small absorptance.
【０００３】これらの要求を満たすために、光半透膜
は、金属層のみを用いたもの、単元素半導体を用いたも
の、金属膜と誘電体膜を用いたもの等の色々な構成のも
のが知られている。金属膜としては銀、アルミニウム、
金、クロムなどの各種の膜が提案されているが、広い波
長域に渡って、透過率と反射率の波長依存性を小さくし
ようとする観点から、一般には銀もしくはアルミニウム
が使用されている。耐環境性を考慮して、銀よりもアル
ミニウムが用いられることが多い。しかしながら、アル
ミニウムを用いた構成は、銀を用いた構成よりも金属薄
膜の膜厚が薄くなり、製造工程における膜厚制御が難し
いという問題がある。そのため、制度の高い光学特性を
要求される場合には銀が用いられることが多い。[0003] In order to satisfy these requirements, the light semi-transmissive film has various structures such as a film using only a metal layer, a film using a single element semiconductor, and a film using a metal film and a dielectric film. It has been known. Silver, aluminum,
Various films such as gold and chromium have been proposed, but silver or aluminum is generally used from the viewpoint of reducing the wavelength dependence of transmittance and reflectance over a wide wavelength range. Aluminum is often used rather than silver in consideration of environmental resistance. However, the configuration using aluminum has a problem that the thickness of the metal thin film is thinner than the configuration using silver, and it is difficult to control the thickness in the manufacturing process. For this reason, silver is often used when high optical characteristics are required.
【０００４】特公昭６２−３９４０１号公報には； プリズム／Ｌ＋Ａｇ＋Ｈ／プリズム （Ｌ：低屈折率誘電体薄膜、Ｈ：高屈折率誘電体薄膜、
特に断らない限り、以下同じ） なる構成の半透過鏡が開示されている。また特公平５−
２８３６１号公報は； プリズム／Ｌ＋Ｈ＋Ｌ＋Ｈ＋Ａｕ＋Ｈ＋Ｌ＋Ｈ＋Ｌ／プ
リズム なる金薄膜を用いた構成の赤外域ハーフミラーが開示さ
れている。特開昭５５−４１４１５号公報は； プリズム／Ａｇ＋Ｈ／プリズム プリズム／Ｈ＋Ｌ＋Ａｇ／プリズム プリズム／Ｈ＋Ｌ＋Ａｇ＋Ｈ／プリズム プリズム／Ｈ＋Ｌ＋Ａｇ＋Ｈ＋Ｌ／プリズム のような金属材料にアルミニウムを用いた構成の半透過
鏡が開示されている。さらに特開昭６０−２８６０３号
公報には： プリズム／Ｍ＋Ａｇ＋Ｈ／プリズム （Ｍは中屈折率誘電体薄膜、以下、特に断らない限り、
以下同じ）なる構成のプリズム式ビームスプリッタを開
示している。Japanese Patent Publication No. 62-39401 discloses a prism / L + Ag + H / prism (L: low refractive index dielectric thin film, H: high refractive index dielectric thin film,
Unless otherwise specified, the same applies hereinafter). In addition,
No. 28361 discloses an infrared half mirror having a configuration using a gold thin film of: prism / L + H + L + H + Au + H + L + H + L / prism. JP-A-55-41415 discloses a semi-transmissive mirror having a structure in which aluminum is used for a metal material such as: prism / Ag + H / prism prism / H + L + Ag / prism prism / H + L + Ag + H / prism prism / H + L + Ag + H + L / prism. . Further, JP-A-60-28603 discloses: Prism / M + Ag + H / prism (M is a medium refractive index dielectric thin film; hereinafter, unless otherwise specified,
The same applies hereinafter) to a prism type beam splitter.
【０００５】加えて、近年、デジタルカメラ等の普及に
伴い、光吸収が少なく、透過率と反射率が必要とされる
波長領域でほぼ等しく、その率の変化がその波長領域で
小さい（フラットな）特性を有するプリズム式ビームス
プリッタが望まれている。In addition, in recent years, with the spread of digital cameras and the like, light absorption is small, and transmittance and reflectance are almost equal in a required wavelength region, and a change in the ratio is small (flat) in the wavelength region. A) A prism type beam splitter having characteristics is desired.
【０００６】[0006]
【発明が解決しようとする課題】本発明は上記事情に鑑
みなされたもので、透過率と反射率が広い波長域に渡
り、ほぼ等しく、またフラットな特性を有するプリズム
式ビームスプリッタを提供することを目的とする。SUMMARY OF THE INVENTION The present invention has been made in view of the above circumstances, and it is an object of the present invention to provide a prism type beam splitter having substantially equal and flat characteristics in transmittance and reflectance over a wide wavelength range. With the goal.
【０００７】[0007]
【課題を解決するための手段】すなわち本発明は屈折率
のほぼ等しいガラスからなる第１および第２プリズムの
間に光半透膜が形成されているプリズム式ビームスプリ
ッタであって、該光半透膜が、第１プリズム側から第２
プリズム側へ順に、第１誘電体層、第２誘電体層、Ａｇ
からなる金属層、第３誘電体層、および第４誘電体層の
５層積層構成されているプリズム式ビームスプリッタに
関する。図１に本発明のプリズム式ビームスプリッタの
概略断面図を示している。１は第１プリズム、２は第２
プリズムを示し、第１プリズムおよび第２プリズムは屈
折率がほぼ等しい、好ましくは等しいガラスからなる直
角プリズムであり、該直角プリズム１および２の接合面
３に光半透膜が形成されている。この半透膜は、第１プ
リズム側から第２プリズム側へ順に、第１誘電体層、第
２誘電体層、Ａｇからなる金属層、第３誘電体層、およ
び第４誘電体層の５層が積層構成されている。That is, the present invention relates to a prism type beam splitter in which a light semi-permeable film is formed between first and second prisms made of glass having substantially the same refractive index. The permeable membrane is second from the first prism side.
The first dielectric layer, the second dielectric layer, and the Ag
The present invention relates to a prism type beam splitter having a five-layer structure of a metal layer, a third dielectric layer, and a fourth dielectric layer. FIG. 1 shows a schematic sectional view of a prism type beam splitter of the present invention. 1 is the first prism, 2 is the second prism
A first prism and a second prism are right-angle prisms made of glass having substantially the same refractive index, preferably the same refractive index, and an optical semi-permeable film is formed on a joint surface 3 of the right-angle prisms 1 and 2. The semi-permeable membrane includes, in order from the first prism side to the second prism side, a first dielectric layer, a second dielectric layer, a metal layer made of Ag, a third dielectric layer, and a fourth dielectric layer. The layers are stacked.
【０００８】本発明においては金属層をはさんで積層さ
れる第２誘電体層および第３誘電体層はプリズムより低
い屈折率を発現しうる低屈折率材料で構成され、屈折率
が１.３８から１.８０、好ましくは１.４５〜１.７０を
有するように形成される。低屈折率材料としてはＡｌ2
Ｏ3、ＳｉＯ2、ＭｇＦ2、を使用することが可能で、こ
れらの中でも充填密度の高いＡｌ2Ｏ3またはＳｉＯ2を
使用することが好ましい。In the present invention, the second dielectric layer and the third dielectric layer laminated with a metal layer interposed therebetween are made of a low refractive index material capable of exhibiting a lower refractive index than the prism, and have a refractive index of 1. 38 to 1.80, preferably 1.45 to 1.70. Al 2 as a low refractive index material
O 3 , SiO 2 , and MgF 2 can be used, and among them, Al 2 O 3 or SiO 2 having a high packing density is preferably used.
【０００９】第１誘電体層および第４誘電体層はプリズ
ムより高い屈折率を発現しうる高屈折率材料で構成さ
れ、屈折率が１.８０〜２.４０、好ましくは１.９０〜
２.３０を有するように形成される。高屈折率材料とし
ては酸化ジルコニウム(ＺｒＯ2)と酸化チタン(ＴｉＯ2)
との混合物、酸化タンタル(Ｔａ2Ｏ5)、ＴｉＯ2を使用
することが可能で、これらの中でも酸化ジルコニウム
(ＺｒＯ2)と酸化チタン(ＴｉＯ2)との混合物または酸化
タンタル(Ｔａ2Ｏ5)が好ましい。さらに好ましくは第２
誘電体層または第３誘電体層にＡｌ2Ｏ3層を用いた場
合、第１誘電体層および第４誘電体層は酸化ジルコニウ
ム(ＺｒＯ2)と酸化チタン(ＴｉＯ2)との混合物で形成
し、第２誘電体層または第３誘電体層にＳｉＯ2層を用
いた場合、第１誘電体層および第４誘電体層はＴａ2Ｏ5
で構成することが好ましい。The first dielectric layer and the fourth dielectric layer are made of a material having a high refractive index capable of expressing a higher refractive index than the prism, and have a refractive index of 1.80 to 2.40, preferably 1.90 to
It is formed to have 2.30. As high refractive index materials, zirconium oxide (ZrO 2 ) and titanium oxide (TiO 2 )
, Tantalum oxide (Ta 2 O 5 ), and TiO 2 , among which zirconium oxide
A mixture of (ZrO 2 ) and titanium oxide (TiO 2 ) or tantalum oxide (Ta 2 O 5 ) is preferred. More preferably the second
When the Al 2 O 3 layer is used for the dielectric layer or the third dielectric layer, the first and fourth dielectric layers are formed of a mixture of zirconium oxide (ZrO 2 ) and titanium oxide (TiO 2 ). However, when an SiO 2 layer is used for the second or third dielectric layer, the first and fourth dielectric layers are made of Ta 2 O 5.
It is preferable to configure
【００１０】各層を形成するには真空蒸着法で形成する
ことができ、第１誘電体層は厚さ１０〜１２０ｎｍ、好
ましくは３０〜９０ｎｍ、第２誘電体層は厚さ１０〜１
８０ｎｍ、好ましくは３０〜１５０ｎｍ、金属層は厚さ
５〜３０ｎｍ、好ましくは１０〜１７ｎｍ、第３誘電体
層は厚さ１０〜１８０ｎｍ、好ましくは２０〜１７０ｎ
ｍ、第４誘電体層は厚さ１０〜１２０ｎｍ、好ましくは
４５〜１００ｎｍに形成する。積層順序は第１プリズム
表面上に第１誘電体層から第４誘電体層に順に積層して
もよいし、また、第２プリズム表面上に第４誘電体層か
ら第１誘電体層に順に積層してもよい。Each layer can be formed by a vacuum deposition method, wherein the first dielectric layer has a thickness of 10 to 120 nm, preferably 30 to 90 nm, and the second dielectric layer has a thickness of 10 to 1 nm.
80 nm, preferably 30 to 150 nm, the metal layer has a thickness of 5 to 30 nm, preferably 10 to 17 nm, and the third dielectric layer has a thickness of 10 to 180 nm, preferably 20 to 170 n.
m, the fourth dielectric layer is formed to a thickness of 10 to 120 nm, preferably 45 to 100 nm. The stacking order may be such that the first dielectric layer is sequentially stacked on the first prism surface from the fourth dielectric layer, or the fourth dielectric layer is sequentially stacked on the second prism surface from the first dielectric layer. They may be stacked.
【００１１】入射光線Ｉは接合面で反射光線Ｉｒと透過
光線Ｉｔに分けられる。入射光線は第１あるいは第２プ
リズムいずれのプリズム側から入射させてもよいが、光
半透膜が積層されているプリズム側から入射することが
好ましい。The incident light beam I is divided at the joint surface into a reflected light beam Ir and a transmitted light beam It. The incident light beam may be incident from either the first or second prism side, but is preferably incident from the prism side on which the light semi-permeable film is laminated.
【００１２】[0012]
【実施例】実施例１ 下記表１に示した構成のビームスプリッタを作製した。
なお、５層の光半透膜は第１プリズム上に第１誘電体層
から順次、真空蒸着法により形成し、第２プリズムを接
着剤を用いて接合し、本発明のプリズム式ビームスプリ
ッタを形成した。Example 1 A beam splitter having the structure shown in Table 1 below was manufactured.
The five light semi-transmissive films are formed on the first prism sequentially from the first dielectric layer by a vacuum deposition method, and the second prism is joined by using an adhesive, so that the prism type beam splitter of the present invention is formed. Formed.
【００１３】[0013]
【表１】 [Table 1]
【００１４】本実施例の分光特性を図２に示す。図中、
Ｒ％はプリズム１側からの入射光の接合面での反射率
（％）、Ｔ％は入射光の接合面での透過率（％）であ
る。図２からわかるように、本発明のビームスプリッタ
は反射率と透過率の両者は可視波長域全域に渡って比較
的フラットであり、それぞれ約５０％でその差も小さ
く、光損失も少ない。FIG. 2 shows the spectral characteristics of this embodiment. In the figure,
R% is the reflectance (%) of the incident light from the prism 1 side at the junction surface, and T% is the transmittance (%) of the incident light at the junction surface. As can be seen from FIG. 2, in the beam splitter of the present invention, both the reflectance and the transmittance are relatively flat over the entire visible wavelength range, and each difference is small at about 50%, and the light loss is small.
【００１５】実施例２ 下記表２に示した構成のビームスプリッタを作製した。
なお、５層の光半透膜は第１プリズム上に第１誘電体層
から順次、真空蒸着法により形成し、第２プリズムを接
着剤を用いて接合し、本発明のプリズム式ビームスプリ
ッタを形成した。Example 2 A beam splitter having the configuration shown in Table 2 below was manufactured.
The five light semi-transmissive films are formed on the first prism sequentially from the first dielectric layer by a vacuum deposition method, and the second prism is joined by using an adhesive, so that the prism type beam splitter of the present invention is formed. Formed.
【００１６】[0016]
【表２】 [Table 2]
【００１７】本実施例の分光特性を図３に示す。図中、
Ｒ％はプリズム１側からの入射光の接合面での反射率
（％）、Ｔ％は入射光の接合面での透過率（％）であ
る。図３からわかるように、本発明のビームスプリッタ
は反射率と透過率の両者は可視波長域全域に渡って比較
的フラットであり、それぞれ約５０％でその差も小さ
く、光損失も少ない。FIG. 3 shows the spectral characteristics of this embodiment. In the figure,
R% is the reflectance (%) of the incident light from the prism 1 side at the junction surface, and T% is the transmittance (%) of the incident light at the junction surface. As can be seen from FIG. 3, in the beam splitter of the present invention, both the reflectance and the transmittance are relatively flat over the entire visible wavelength range, and each difference is small at about 50%, and the light loss is small.
【００１８】実施例３ 下記表３に示した構成のビームスプリッタを作製した。
なお、５層の光半透膜は第１プリズム上に第１誘電体層
から順次、真空蒸着法により形成し、第２プリズムを接
着剤を用いて接合し、本発明のプリズム式ビームスプリ
ッタを形成した。Example 3 A beam splitter having the configuration shown in Table 3 below was manufactured.
The five light semi-transmissive films are formed on the first prism sequentially from the first dielectric layer by a vacuum deposition method, and the second prism is joined by using an adhesive, so that the prism type beam splitter of the present invention is formed. Formed.
【００１９】[0019]
【表３】 [Table 3]
【００２０】本実施例の分光特性を図４に示す。図中、
Ｒ％はプリズム１側からの入射光の接合面での反射率
（％）、Ｔ％は入射光の接合面での透過率（％）であ
る。図４からわかるように、本発明のビームスプリッタ
は反射率と透過率の両者は可視波長域全域に渡って比較
的フラットであり、それぞれ約５０％でその差も小さ
く、光損失も少ない。FIG. 4 shows the spectral characteristics of this embodiment. In the figure,
R% is the reflectance (%) of the incident light from the prism 1 side at the junction surface, and T% is the transmittance (%) of the incident light at the junction surface. As can be seen from FIG. 4, in the beam splitter of the present invention, both the reflectance and the transmittance are relatively flat over the entire visible wavelength range, and each difference is small at about 50%, and the light loss is small.
【００２１】実施例４ 下記表４に示した構成のビームスプリッタを作製した。
なお、５層の光半透膜は第１プリズム上に第１誘電体層
から順次、真空蒸着法により形成し、第２プリズムを接
着剤を用いて接合し、本発明のプリズム式ビームスプリ
ッタを形成した。Example 4 A beam splitter having the structure shown in Table 4 below was manufactured.
The five light semi-transmissive films are formed on the first prism sequentially from the first dielectric layer by a vacuum deposition method, and the second prism is joined by using an adhesive, so that the prism type beam splitter of the present invention is formed. Formed.
【００２２】[0022]
【表４】 [Table 4]
【００２３】本実施例の分光特性を図５に示す。図中、
Ｒ％はプリズム１側からの入射光の接合面での反射率
（％）、Ｔ％は入射光の接合面での透過率（％）であ
る。図５からわかるように、本発明のビームスプリッタ
は反射率と透過率の両者は可視波長域全域に渡って比較
的フラットであり、それぞれ約５０％でその差も小さ
く、光損失も少ない。FIG. 5 shows the spectral characteristics of this embodiment. In the figure,
R% is the reflectance (%) of the incident light from the prism 1 side at the junction surface, and T% is the transmittance (%) of the incident light at the junction surface. As can be seen from FIG. 5, in the beam splitter of the present invention, both the reflectance and the transmittance are relatively flat over the entire visible wavelength range, and each difference is small at about 50%, and the light loss is small.
【００２４】[0024]
【発明の効果】本発明のプリズム式ビームスプリッタ
は、プリズム＋Ｈ＋＜ＬまたはＭ＞＋Ａｇ＋＜Ｌまたは
Ｍ＞＋Ｈ＋プリズム（Ｈ：高屈折率物質、Ｍ：中屈折率
物質、Ｌ：低屈折率物質）の５層構成を有しており、光
吸収が少なく、反射率と透過率がほぼ同じ特性を有して
いる。The prism type beam splitter according to the present invention comprises a prism + H + <L or M> + Ag + <L or M> + H + prism (H: high refractive index material, M: medium refractive index material, L: low refractive index material) ), Has low light absorption, and has substantially the same characteristics as reflectance and transmittance.
【図面の簡単な説明】[Brief description of the drawings]
【図１】 本発明のプリズム式ビームスプリッタの概略
断面図FIG. 1 is a schematic sectional view of a prism type beam splitter of the present invention.
【図２】 本発明プリズム式ビームスプリッタ（実施例
１）の分光特性FIG. 2 shows the spectral characteristics of the prism type beam splitter of the present invention (Example 1).
【図３】 本発明プリズム式ビームスプリッタ（実施例
２）の分光特性FIG. 3 shows spectral characteristics of a prism type beam splitter according to the present invention (Example 2).
【図４】 本発明プリズム式ビームスプリッタ（実施例
３）の分光特性FIG. 4 shows spectral characteristics of a prism type beam splitter of the present invention (Example 3).
【図５】 本発明プリズム式ビームスプリッタ（実施例
４）の分光特性FIG. 5 shows spectral characteristics of a prism type beam splitter of the present invention (Example 4).
１：第１プリズム、２：第２プリズム、３：接合面、
Ｉ：入射光線、Ｉｒ：反射光線、Ｉｔ：透過光線1: first prism, 2: second prism, 3: bonding surface,
I: incident light, Ir: reflected light, It: transmitted light
Claims (4)
および第２プリズムの間に光半透膜が形成されているプ
リズム式ビームスプリッタであって、該光半透膜が、第
１プリズム側から第２プリズム側へ順に、第１誘電体
層、第２誘電体層、Ａｇからなる金属層、第３誘電体
層、および第４誘電体層の５層積層構成されているプリ
ズム式ビームスプリッタ。A first glass member having a substantially equal refractive index;
And a prism type beam splitter in which a light semi-permeable film is formed between the first prism layer and the second prism in the order from the first prism side to the second prism side. A prism type beam splitter having a five-layer structure including two dielectric layers, a metal layer made of Ag, a third dielectric layer, and a fourth dielectric layer.
および第２プリズムの間に光半透膜が形成されているプ
リズム式ビームスプリッタであって、該半透膜は、第１
プリズム側から第２プリズム側へ順に、屈折率が１.８
０から２.４０である第１誘電体層、屈折率が１.３８か
ら１.８０である第２誘電体層、Ａｇからなる金属層、
屈折率が１.３８から１.８０である第３誘電体層、およ
び屈折率が１.８０から２.４０である第４誘電体層の５
層積層構成されているプリズム式ビームスプリッタ。2. A method according to claim 1, wherein said first and second glasses are made of glass having substantially the same refractive index.
And a prism type beam splitter in which a light semi-permeable film is formed between the second prism and the second prism.
The refractive index is 1.8 in order from the prism side to the second prism side.
A first dielectric layer having a refractive index of 0 to 2.40, a second dielectric layer having a refractive index of 1.38 to 1.80, a metal layer made of Ag,
A third dielectric layer having a refractive index of 1.38 to 1.80 and a fourth dielectric layer having a refractive index of 1.80 to 2.40;
A prism type beam splitter having a multilayer structure.
2Ｏ3またはＳｉＯ2で構成されている請求項１または請
求項２に記載のビームスプリッタ。3. The method according to claim 1, wherein the second dielectric layer and the third dielectric layer are made of Al.
3. The beam splitter according to claim 1, wherein the beam splitter is made of 2 O 3 or SiO 2 .
および第２プリズムの間に光半透膜が形成されているプ
リズム式ビームスプリッタであって、該半透膜は、第１
プリズム側から第２プリズム側へ順に、酸化ジルコニウ
ム(ＺｒＯ2)と酸化チタン(ＴｉＯ2)との混合物または酸
化タンタル(Ｔａ2Ｏ5)からなる第１誘電体層、Ａｌ2Ｏ3
またはＳｉＯ2からなる第２誘電体層、Ａｇからなる金
属層、Ａｌ2Ｏ3またはＳｉＯ2からなる第３誘電体層、
および酸化ジルコニウム(ＺｒＯ2)と酸化チタン(ＴｉＯ
2)との混合物または酸化タンタル(Ｔａ2Ｏ5)からなる第
４誘電体層の５層積層構成されているプリズム式ビーム
スプリッタ。4. A first glass made of glass having substantially the same refractive index.
And a prism type beam splitter in which a light semi-permeable film is formed between the second prism and the second prism.
A first dielectric layer made of a mixture of zirconium oxide (ZrO 2 ) and titanium oxide (TiO 2 ) or tantalum oxide (Ta 2 O 5 ), Al 2 O 3 , in order from the prism side to the second prism side
Or a second dielectric layer made of SiO 2 , a metal layer made of Ag, a third dielectric layer made of Al 2 O 3 or SiO 2 ,
And zirconium oxide (ZrO 2 ) and titanium oxide (TiO
2 ) or a prism type beam splitter having a laminated structure of five layers of a fourth dielectric layer made of tantalum oxide (Ta 2 O 5 ).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP31030697A JP3531444B2 (en) | 1997-11-12 | 1997-11-12 | Prism beam splitter |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP31030697A JP3531444B2 (en) | 1997-11-12 | 1997-11-12 | Prism beam splitter |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH11142623A true JPH11142623A (en) | 1999-05-28 |
| JP3531444B2 JP3531444B2 (en) | 2004-05-31 |
Family
ID=18003644
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP31030697A Expired - Fee Related JP3531444B2 (en) | 1997-11-12 | 1997-11-12 | Prism beam splitter |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3531444B2 (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012108508A (en) * | 2010-11-15 | 2012-06-07 | Leica Microsystems Cms Gmbh | Optical element for light distribution |
| JP2013109301A (en) * | 2011-11-24 | 2013-06-06 | Seiko Epson Corp | Half mirror and image display device |
| US10061133B2 (en) | 2013-05-16 | 2018-08-28 | Seiko Epson Corporation | Optical element and display apparatus |
-
1997
- 1997-11-12 JP JP31030697A patent/JP3531444B2/en not_active Expired - Fee Related
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012108508A (en) * | 2010-11-15 | 2012-06-07 | Leica Microsystems Cms Gmbh | Optical element for light distribution |
| JP2013109301A (en) * | 2011-11-24 | 2013-06-06 | Seiko Epson Corp | Half mirror and image display device |
| US10061133B2 (en) | 2013-05-16 | 2018-08-28 | Seiko Epson Corporation | Optical element and display apparatus |
| US10324302B2 (en) | 2013-05-16 | 2019-06-18 | Seiko Epson Corporation | Optical element and display apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3531444B2 (en) | 2004-05-31 |
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