JPH10153705A - Dichroic mirror - Google Patents

Dichroic mirror

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Publication number
JPH10153705A
JPH10153705A JP32596196A JP32596196A JPH10153705A JP H10153705 A JPH10153705 A JP H10153705A JP 32596196 A JP32596196 A JP 32596196A JP 32596196 A JP32596196 A JP 32596196A JP H10153705 A JPH10153705 A JP H10153705A
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JP
Japan
Prior art keywords
film
refractive index
tio
dichroic mirror
high refractive
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
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JP32596196A
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Japanese (ja)
Inventor
Yukinori Tsukamoto
征徳 塚本
Original Assignee
Canon Inc
キヤノン株式会社
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Application filed by Canon Inc, キヤノン株式会社 filed Critical Canon Inc
Priority to JP32596196A priority Critical patent/JPH10153705A/en
Publication of JPH10153705A publication Critical patent/JPH10153705A/en
Application status is Pending legal-status Critical

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Abstract

PROBLEM TO BE SOLVED: To provide a dichroic mirror, which functions as an almost total reflection mirror in a reflected wavelength band region, suppresses transmissivity in a transmitted wavelength band region, and functions as a half mirror having a flat spactal transmission characteristic.
SOLUTION: A transmissivity adjustment film 14, which is constituted of a 3-layers film structure: a TiO2 film 12 consisting essentially of TiO2 having the high refractive index, a SiO2 film 13 having the low refractive index and the TiO2 film 12 consisting essentially of TiO2 having the high refractive index, is applied on the surface of an optical glass substrate 11 of BK 7. A multilayer film 15, which is constituted of a 13-layer film structure in which the TiO2 film 12 consisting essentially of TiO2 having the high refractive index and a SiO2 film 13 having the low refractive index are alternately laminated, is applied thereon. The transmissivity adjustment film 14 is a 3-layers transmission film structure, in which the transmissivity in the transmitted wavelength band region is possible to be suppressed to the extent of 90 to 50% due to the optical film thickness of each high refractive index film. If the film thickness is ≤1/50 of the designed center wavelength of the multilayer film 15, the effect of suppression is little. If the film thickness is ≥1/8, some type of the basic structure raises transmissivity. Further, flatness in the transmitted wavelength band region and a restrained wavelength region are controlled by the film thickness of the low refractive index film.
COPYRIGHT: (C)1998,JPO

Description

【発明の詳細な説明】 DETAILED DESCRIPTION OF THE INVENTION

【0001】 [0001]

【発明の属する技術分野】本発明は、カメラ、複写機、 The present invention relates to a camera, a copying machine,
プリンタ等の光学機械に用いられるダイクロイックミラーに関するものである。 It relates dichroic mirror used in optical instruments such as a printer.

【0002】 [0002]

【従来の技術】従来、特定波長域の光を反射して、他の波長域の光を透過するダイクロイックミラーは、高屈折率膜と低屈折率膜の誘電体材料を設計中心波長λのλ/ Conventionally, to reflect light in a specific wavelength range, a dichroic mirror which transmits light in other wavelength bands, the high refractive index film and a low refractive index film of the dielectric material designed center wavelength lambda lambda /
4の光学的膜厚として交互に積層した多層膜により構成されている。 It is constituted by a multilayer film formed by alternately laminating an optical film thickness of 4.

【0003】このような多層膜の最も簡単な膜構成は、 [0003] The simplest film configuration of such a multilayer film,
基板をG、高屈折率膜をH、低屈折率膜をLとして、G The substrate G, a high refractive index film H, as a low refractive index film L, G
+H+L+H+L・・・H+L+Hであり、基本となる構成はタイプ1として(L/2、H、L/2)Mと、タイプ2として(H/2、L、H/2)Mのタイプがある。 + H + a L + H + L ··· H + L + H, underlying structure is (L / 2, H, L / 2) M and, as the type 2 (H / 2, L, H / 2) Type of M as type 1. タイプ1は反射波長域の長波長側を高透過波長帯城とした場合に用いられ、タイプ2は反射波長域の短波長側を高透過波長帯城とした場合に用いられている。 Type 1 is used in the case where the long wavelength side of the reflection wavelength band and high transmission wavelength Obijo, Type 2 is used when a short wavelength side of the reflection wavelength band and high transmission wavelength Obijo.

【0004】図5はこの従来例のダイクロイックミラーの使用形態を示しており、透明基板1の片面に、基本構成タイプ1の12層膜構成のダイクロイックミラー2が設けられ、他面に2層膜構成から成るハーフミラー3が設けられている。 [0004] Figure 5 shows the use form of the dichroic mirror of the conventional example, on one surface of the transparent substrate 1 is provided with a dichroic mirror 2 for 12-layer film structure of the basic structure type 1, two-layer film on the other surface a half mirror 3 is provided having the structure.

【0005】図6はこのダイクロイックミラーの透過率の特性図を示し、Aはダイクロイックミラー2の透過率特性、Bはハーフミラー3の透過率特性、Cはダイクロイックミラー2とハーフミラー3を合成した透過率特性である。 [0005] Figure 6 shows a characteristic diagram of the transmittance of the dichroic mirror, A is the transmittance characteristic of the dichroic mirror 2, B transmittance characteristics of the half mirror 3, C was synthesized through the dichroic mirror 2 and the half mirror 3 it is a transmittance characteristic.

【0006】 [0006]

【発明が解決しようとする課題】しかしながら上述した従来例では、透過波長帯城で高い透過率にするためには、多層膜の積層数の増加に伴う透過波長帯域のリップルを減少させる様々な手法が実施されているが、透過波長帯城の透過率を大幅に抑制することは困難という問題がある。 In However the above-mentioned conventional example [0004] To a high transmittance in the transmission wavelength band Castle, various reducing ripple of a transmission wavelength band with increasing number of stacked layers of the multilayer film techniques Although there has been implemented, there is a problem that it is difficult to significantly suppress the transmittance of the transmission wavelength Obijo.

【0007】このため、前述の従来例のように多層膜のダイクロイックミラー2と他の面等にハーフミラー3を併用して用いた場合は、透過面又は反射面が2面以上になり、ゴーストなどの光学特性の低下や光学系の複雑化によるコスト高の問題が発生する。 [0007] Therefore, in the case of using a combination of the half mirror 3 to the dichroic mirror 2 and other surfaces such as a multilayer film as in the conventional example described above, the transmission surface or reflecting surface is two or more surfaces, ghost high cost problem occurs due to decreased and complexity of the optical system of the optical properties such as.

【0008】本発明の目的は、上述の問題点を解消し、 An object of the present invention is to solve the problems described above,
反射波長帯域では略全反射ミラーとして、透過波長帯域では透過率を抑制し、平坦な分光透過特性のハーフミラーとして機能するダイクロイックミラーを提供することにある。 A substantially total reflection mirror in the reflection wavelength band, the transmission wavelength band to suppress the transmittance is to provide a dichroic mirror that functions as a half mirror flat spectral transmission characteristic.

【0009】 [0009]

【課題を解決するための手段】上記の目的を達成するために本発明に係るダイクロイックミラーは、透明な基板の表面に成膜した透過率調整膜を介して、設計中心波長λのλ/4の光学的膜厚とした高屈折率膜と低屈折率膜の誘電体材料を交互に積層した多層膜から成ることを特徴とする。 A dichroic mirror according to the present invention in order to achieve the above object In order to achieve the above, through the film was formed on the surface of a transparent substrate transmittance adjusting film, the design center wavelength lambda lambda / 4 characterized in that it comprises a dielectric material having a high refractive index film and a low refractive index film with an optical film thickness of a multilayer film formed by alternately laminating.

【0010】 [0010]

【発明の実施の形態】本発明を図1〜図4に図示の実施例に基づいて詳細に説明する。 It will be described in detail with reference to Detailed Description of the Invention The present invention embodiment shown in FIGS. 図1はダイクロイックミラーを示す模式的断面図である。 Figure 1 is a schematic sectional view showing a dichroic mirror. このダイクロイックミラーにおいては、BK7の光学ガラス基板11の表面に、高屈折率のTiO 2を主成分とするTiO 2膜12 In this dichroic mirror, the surface of the optical glass substrate 11 of BK7, TiO 2 film 12 mainly composed of TiO 2 of high refractive index
と、低屈折率のSiO 2膜13と、高屈折率のTiO 2 When a SiO 2 film 13 having a low refractive index, a high refractive index TiO 2
を主成分とするTiO 2膜12の3層膜構成から成る透過率調整膜14が被膜され、その上に高屈折率のTiO Is the transmittance adjusting film 14 film made of three-layered film structure of the TiO 2 film 12 composed mainly of, TiO high refractive index thereon
2を主成分とTiO 2膜12と低屈折率のSiO 2膜1 SiO 2 of 2 as a main component and TiO 2 film 12 low-refractive-index film 1
3を交互に積層した13層膜構成から成る多層膜15が被覆されている。 3 multilayer film 15 made of 13-layer film formed by laminating alternately is covered.

【0011】透過率調整膜14は3層の透過膜構成であり、各高屈折率膜の光学的膜厚により透過波長帯域の透過率を90%〜50%程度に抑制することができる。 [0011] transmittance adjusting film 14 are transparent films constituting a three-layer, the transmittance of the transmission wavelength band can be suppressed to approximately 90% to 50% by the optical film thickness of each of the high refractive index film. 膜厚が多層膜15の設計中心波長をλとすると、高屈折率膜の膜厚がλ/50以下では抑制の効果が少なく、λ/ If the film thickness of the design center wavelength of the multilayer film 15 and lambda, less effect of suppressing the thickness of the high refractive index film is lambda / 50 or less, lambda /
8以上では基本横成のタイプによっては透過率を高くする。 Depending on the type of the basic transverse growth to increase the transmittance is 8 or more. また、低屈折率膜の膜厚により透過波長帯域の平坦性と抑制波長域を制御できる。 Further, it is possible to control the suppression wavelength band and the flatness of the transmission wavelength band by the thickness of the low refractive index film.

【0012】この第1の実施例では、真空蒸着装置にB [0012] In this first embodiment, B in a vacuum deposition apparatus
K7の光学ガラス製基板11を入れ、基板11の表面温度を〜300℃に、真空度を1×10 -3 Pa以下の圧力に真空加熱排気した後に、TiO 2を主成分としたTi Put an optical glass substrate 11 of K7, to to 300 ° C. The surface temperature of the substrate 11, the degree of vacuum after vacuum heat evacuated to 1 × 10 -3 Pa or less pressure, mainly composed of TiO 2 Ti
2膜12を44nm、SiO 2膜13を220nm、 The O 2 film 12 44 nm, a SiO 2 film 13 220 nm,
TiO 2を主成分としたTiO 2膜12を44nmにそれぞれ成膜した3層膜構成から成る透過率調整膜14を成膜する。 Forming a transmittance adjusting film 14 made of a three-layer film structure was formed respectively TiO 2 film 12 having a TiO 2 as a main component to 44 nm. 更に、その上に低屈折率のSiO 2膜13 Further, SiO 2 film 13 having a low refractive index thereon
と、高屈折率のTiO 2を主成分としたTiO 2膜12 If, TiO 2 film 12 of TiO 2 with a high refractive index as a major component
を設計中心波長λを880nmとして、入射角38度でλ/4の膜厚を交互に積層し、13層の最終層は低屈折率のSiO 2膜13をλ/8の膜厚に成膜して13層膜構成の多層膜15を成膜し、合計層数16層膜のダイクロイックミラーを成膜した後に真空蒸着装置から取り出す。 As 880nm design central wavelength lambda a, the film thickness of lambda / 4 at an incident angle of 38 degrees alternately laminated, the 13-layer final layer forming a SiO 2 film 13 having a low refractive index in a film thickness of lambda / 8 to 13 by forming a multilayer film 15 of the layer film structure is removed from the vacuum deposition apparatus after forming the dichroic mirrors a total layer number 16 layer film.

【0013】図2は本実施例のダイクロイックミラーの入射角38度における分光透過率を示す特性図である。 [0013] FIG. 2 is a characteristic diagram showing the spectral transmittance at an incident angle of 38 degrees of the dichroic mirror of the present embodiment.
この図2から分かるように、ダイクロイックミラーは波長880nmで略全反射して、可視光域の波長400n As can be seen from Figure 2, the dichroic mirror is totally reflected substantially at the wavelength 880 nm, the wavelength of the visible light region 400n
m〜700nm間では透過率80%の平坦な分光透過特性となる。 A flat spectral transmission characteristic of the transmittance of 80% is between M~700nm.

【0014】第2の実施例では、真空蒸着装置にBK7 [0014] In the second embodiment, BK7 vacuum evaporation apparatus
の光学ガラス製基板11を入れ、基板11の表面温度を〜300℃に、真空度を1×10 -3 Pa以下の圧力に真空加熱排気した後に、TiO 2を主成分としたTiO 2 Put the optical glass substrate 11, to to 300 ° C. The surface temperature of the substrate 11, the degree of vacuum after vacuum heat evacuated to 1 × 10 -3 Pa or less pressure, TiO 2 mainly composed of TiO 2
膜12を67nm、SiO 2膜13を205nm、Ti The film 12 67 nm, a SiO 2 film 13 205 nm, Ti
2を主成分としたTiO 2膜12を67nmに、それぞれ成膜した3層膜構成から成る透過率調整膜14を成膜し、その上に低屈折率のSiO 2膜13と、高屈折率のTiO 2を主成分としたTiO 2膜12を設計中心波長λを880nmとして入射角38度でλ/4の膜厚を交互に積層し、13層の最終層は低屈折率のSiO 2膜13をλ/8の膜厚に成膜して、13層膜構成の多層膜15を成膜し、合計層数16層膜のダイクロイックミラーを成膜した後に真空蒸着装置から取り出す。 The TiO 2 film 12 of the O 2 as a main component to 67 nm, the transmittance adjusting film 14 made of a three-layer film structure was formed respectively formed, the SiO 2 film 13 having a low refractive index thereon, high refractive stacking a TiO 2 film 12 of TiO 2 rate was mainly composed of the designed center wavelength lambda alternately thickness of lambda / 4 at an incident angle of 38 degrees 880 nm, the final layer the low refractive index of the 13-layer SiO 2 by forming a film 13 to a film thickness of lambda / 8, 13 forming a multi-layer film 15 of the layer film structure is removed from the vacuum deposition apparatus after forming the dichroic mirrors a total layer number 16 layer film.

【0015】図3は本実施例のダイクロイックミラーの入射角38度における分光透過率を示す特性図である。 [0015] FIG. 3 is a characteristic diagram showing the spectral transmittance at an incident angle of 38 degrees of the dichroic mirror of the present embodiment.
この図3から分かるように、本実施例のダイクロイックミラーは波長880nmで略全反射して、可視光域の波長400nm〜700nm間では透過率70%の平坦な分光透過特性が得られる。 As can be seen from FIG. 3, the dichroic mirror of the present embodiment it is totally reflected substantially at the wavelength 880 nm, a flat spectral transmission characteristic of the transmittance of 70% is obtained between the wavelength 400nm~700nm the visible light region.

【0016】第3の実施例では、真空蒸着装置にBK7 [0016] In the third embodiment, BK7 vacuum evaporation apparatus
の光学ガラス製基板11を入れ、基板11の表面温度を〜300℃に、真空度を1×10 -3 Pa以下の圧力に真空加熱排気した後に、TiO 2を主成分としたTiO 2 Put the optical glass substrate 11, to to 300 ° C. The surface temperature of the substrate 11, the degree of vacuum after vacuum heat evacuated to 1 × 10 -3 Pa or less pressure, TiO 2 mainly composed of TiO 2
膜12を30nm、SiO 2膜13を440nmを成膜した2層膜構成から成る透過率調整膜14を成膜し、その上に高屈折率のTiO 2を主成分としたTiO 2膜1 The film 12 30 nm, a SiO 2 film 13 was deposited transmittance adjusting film 14 made of two-layer structure was deposited 440 nm, TiO 2 film mainly containing TiO 2 of high refractive index thereon 1
2と、低屈折率のSiO 2膜13を設計中心波長入を4 2, the designed center wavelength enter the SiO 2 film 13 having a low refractive index 4
40nmとしてλ/4の膜厚を交互に積層し、11層の最終層は高屈折率のTiO 2膜をλ/8の膜厚に成膜して、11層膜構成の多層膜15を成膜し、合計層数13 Lambda / 4 of the thickness are alternately stacked as 40 nm, a final layer of 11 layers of TiO 2 film having a high refractive index and formed into a film having a thickness of lambda / 8, forming the multilayer film 15 of the 11-layer film structure the film, the total layer number 13
層膜のダイクロイックミラーを成膜後に真空蒸着装置より取り出す。 Taken out of the vacuum deposition apparatus-layer film of the dichroic mirror after deposition.

【0017】図4は本実施例のダイクロイックミラーの入射角0度における分光透過率を示す特性図である。 [0017] FIG. 4 is a characteristic diagram showing the spectral transmittance at an incident angle of 0 ° of the dichroic mirror of the present embodiment. この図から分かるように、本実施例のダイクロイックミラーは波長440nmで略全反射して、可視光域の波長5 As can be seen from this figure, the dichroic mirror of the present embodiment are totally reflected substantially at the wavelength 440 nm, the wavelength of the visible light region 5
20nm〜700nm間では透過率80%の平坦な分光透過特性を有している。 Between 20nm~700nm has a flat spectral transmission characteristic of the transmittance of 80%.

【0018】 [0018]

【発明の効果】以上説明したように本発明に係るダイクロイックミラーは、反射波長帯域では略全反射ミラーとして、透過波長帯域では透過率を抑制し、平坦な分光透過特性のハーフミラーとして機能するダイクロイックミラーを実現でき、各種光学機械の高性能化や簡略化等に大きく貢献できる。 A dichroic mirror according to the present invention, as described above, according to the present invention is a substantially total reflection mirror in the reflection wavelength band, suppressing the transmittance in the transmission wavelength band, serves as a half mirror flat spectral transmission characteristic dichroic can be realized mirror, it can contribute greatly to high performance and simplification of various optics.

【図面の簡単な説明】 BRIEF DESCRIPTION OF THE DRAWINGS

【図1】ダイクロイックミラーの膜構成の模式的断面図である。 1 is a schematic cross-sectional view of a film structure of the dichroic mirror.

【図2】第1の実施例のダイクロイックミラーの透過率特性図である。 2 is a transmittance characteristic diagram of a dichroic mirror of the first embodiment.

【図3】第2の実施例のダイクロイックミラーの透過率特性図である。 3 is a transmittance characteristic diagram of a dichroic mirror of the second embodiment.

【図4】第3の実施例のダイクロイックミラーの透過率特性図である。 4 is a transmittance characteristic diagram of a dichroic mirror of the third embodiment.

【図5】従来例のダイクロイックミラーの断面図である。 5 is a cross-sectional view of the dichroic mirrors in the conventional example.

【図6】従来例のダイクロイックミラーの透過率特性図である。 6 is a transmittance characteristic diagram of a dichroic mirror of the conventional example.

【符号の説明】 DESCRIPTION OF SYMBOLS

11 基板 12 TiO 2膜 13 SiO 2膜 14 透過率調整膜 15 多層膜 11 substrate 12 TiO 2 film 13 SiO 2 film 14 transmittance adjusting film 15 multilayer film

Claims (5)

    【特許請求の範囲】 [The claims]
  1. 【請求項1】 透明な基板の表面に成膜した透過率調整膜を介して、設計中心波長λのλ/4の光学的膜厚とした高屈折率膜と低屈折率膜の誘電体材料を交互に積層した多層膜から成ることを特徴とするダイクロイックミラー。 1. A through the film was formed on the surface of a transparent substrate transmittance adjusting film, a dielectric material having a high refractive index film and a low refractive index film with an optical film thickness of lambda / 4 of the design center wavelength lambda a dichroic mirror, characterized by comprising a multilayer film formed by alternately laminating.
  2. 【請求項2】 前記透過率調整膜は高屈折率膜と低屈折率膜の誘電体材料から成る請求項1に記載のダイクロイックミラー。 2. A dichroic mirror according to claim 1 wherein the transmittance adjusting film made of a dielectric material having a high refractive index film and a low refractive index film.
  3. 【請求項3】 前記透過率調整膜の高屈折率膜の光学的膜厚は、前記多層膜の設計中心波長λに対し、λ/50 Wherein optical film thickness of the high refractive index film of the transmittance adjustment film to the designed center wavelength lambda of the multilayer film, lambda / 50
    〜λ/8の範囲とした請求項2に記載のダイクロイックミラー。 The dichroic mirror according to claim 2 in which the range of to [lambda] / 8.
  4. 【請求項4】 前記誘電体材料はMgF 2 、SiO 2 Wherein said dielectric material MgF 2, SiO 2,
    Al 23 、 ZrO 2 、 TiO 2 、 Ta 25 、又はこれらの混合物により構成した請求項1又は2に記載のダイクロイックミラー。 Al 2 O 3, ZrO 2, TiO 2, Ta 2 O 5, or a dichroic mirror according to claim 1 or 2, constituted by mixtures thereof.
  5. 【請求項5】 請求項1〜4のダイクロイックミラーを備えた光学器械。 5. The optical instrument equipped with a dichroic mirror of the preceding claims.
JP32596196A 1996-11-21 1996-11-21 Dichroic mirror Pending JPH10153705A (en)

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JP2015055811A (en) * 2013-09-13 2015-03-23 日油株式会社 Wavelength selective reflection film for transfer, and transfer method and transferred molded article using the same
CN105093377A (en) * 2015-09-17 2015-11-25 京东方科技集团股份有限公司 Blue ray attenuation device and preparation method, base plate, displayer and intelligent wearable product
WO2018054140A1 (en) * 2016-09-23 2018-03-29 京东方科技集团股份有限公司 Display device
CN108973373A (en) * 2018-08-01 2018-12-11 苏州安洁科技股份有限公司 Be cracked after plated film membrane stress removal technique on a kind of ink layer

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JP2009008554A (en) * 2007-06-28 2009-01-15 Hitachi High-Technologies Corp Spectrophotometer and liquid chromatography
US7787120B2 (en) 2007-06-28 2010-08-31 Hitachi High-Technologies Corporation Spectrophotometer and liquid chromatography system
JP4536754B2 (en) * 2007-06-28 2010-09-01 株式会社日立ハイテクノロジーズ Spectrophotometer and liquid chromatography
WO2012002542A1 (en) * 2010-07-01 2012-01-05 株式会社ニコン Optical members and microscope
US8773761B2 (en) 2010-07-01 2014-07-08 Nikon Corporation Optical member and microscope
JP5673679B2 (en) * 2010-07-01 2015-02-18 株式会社ニコン Microscope
JP2015055811A (en) * 2013-09-13 2015-03-23 日油株式会社 Wavelength selective reflection film for transfer, and transfer method and transferred molded article using the same
CN105093377A (en) * 2015-09-17 2015-11-25 京东方科技集团股份有限公司 Blue ray attenuation device and preparation method, base plate, displayer and intelligent wearable product
WO2018054140A1 (en) * 2016-09-23 2018-03-29 京东方科技集团股份有限公司 Display device
CN108973373A (en) * 2018-08-01 2018-12-11 苏州安洁科技股份有限公司 Be cracked after plated film membrane stress removal technique on a kind of ink layer

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