JPH09288991A5 - - Google Patents

Info

Publication number
JPH09288991A5
JPH09288991A5 JP1996101233A JP10123396A JPH09288991A5 JP H09288991 A5 JPH09288991 A5 JP H09288991A5 JP 1996101233 A JP1996101233 A JP 1996101233A JP 10123396 A JP10123396 A JP 10123396A JP H09288991 A5 JPH09288991 A5 JP H09288991A5
Authority
JP
Japan
Prior art keywords
electron beam
electron
optical system
electron optical
exposure apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1996101233A
Other languages
English (en)
Japanese (ja)
Other versions
JP3647136B2 (ja
JPH09288991A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from JP10123396A external-priority patent/JP3647136B2/ja
Priority to JP10123396A priority Critical patent/JP3647136B2/ja
Priority to DE69738276T priority patent/DE69738276T2/de
Priority to EP03077053A priority patent/EP1369897A3/en
Priority to EP97301406A priority patent/EP0794552B1/en
Priority to EP03077051A priority patent/EP1369895B1/en
Priority to US08/811,602 priority patent/US5834783A/en
Priority to EP03077052A priority patent/EP1369896A3/en
Priority to KR1019970007085A priority patent/KR100225335B1/ko
Publication of JPH09288991A publication Critical patent/JPH09288991A/ja
Priority to US09/098,432 priority patent/US5973332A/en
Priority to US09/313,072 priority patent/US6166387A/en
Priority to US09/596,052 priority patent/US6323499B1/en
Publication of JP3647136B2 publication Critical patent/JP3647136B2/ja
Application granted granted Critical
Publication of JPH09288991A5 publication Critical patent/JPH09288991A5/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP10123396A 1996-03-04 1996-04-23 電子ビーム露光装置 Expired - Fee Related JP3647136B2 (ja)

Priority Applications (11)

Application Number Priority Date Filing Date Title
JP10123396A JP3647136B2 (ja) 1996-04-23 1996-04-23 電子ビーム露光装置
EP03077052A EP1369896A3 (en) 1996-03-04 1997-03-04 Electron beam exposure apparatus and method and device manufacturing method
EP03077053A EP1369897A3 (en) 1996-03-04 1997-03-04 Electron beam exposure apparatus and method, and device manufacturing method
EP97301406A EP0794552B1 (en) 1996-03-04 1997-03-04 Electron beam exposure apparatus and method, and device manufacturing method
EP03077051A EP1369895B1 (en) 1996-03-04 1997-03-04 Electron beam exposure apparatus and method, and device manufacturing method
US08/811,602 US5834783A (en) 1996-03-04 1997-03-04 Electron beam exposure apparatus and method, and device manufacturing method
DE69738276T DE69738276T2 (de) 1996-03-04 1997-03-04 Elektronenstrahl-Belichtungsgerät, Belichtungsverfahren und Verfahren zur Erzeugung eines Objekts
KR1019970007085A KR100225335B1 (ko) 1996-03-04 1997-03-04 전자빔노광장치와 그 방법 및 디바이스제조방법
US09/098,432 US5973332A (en) 1996-03-04 1998-06-17 Electron beam exposure method, and device manufacturing method using same
US09/313,072 US6166387A (en) 1996-03-04 1999-05-17 Electron beam exposure apparatus and method
US09/596,052 US6323499B1 (en) 1996-03-04 2000-06-16 Electron beam exposure apparatus and method, and device manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10123396A JP3647136B2 (ja) 1996-04-23 1996-04-23 電子ビーム露光装置

Publications (3)

Publication Number Publication Date
JPH09288991A JPH09288991A (ja) 1997-11-04
JP3647136B2 JP3647136B2 (ja) 2005-05-11
JPH09288991A5 true JPH09288991A5 (enExample) 2005-08-04

Family

ID=14295190

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10123396A Expired - Fee Related JP3647136B2 (ja) 1996-03-04 1996-04-23 電子ビーム露光装置

Country Status (1)

Country Link
JP (1) JP3647136B2 (enExample)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19944857A1 (de) * 1999-09-18 2001-03-22 Ceos Gmbh Elektronenoptische Linsenanordnung mit weit verschiebbarer Achse
EP1171901B1 (en) * 2000-02-09 2008-10-08 Fei Company Multi-column fib for nanofabrication applications
JP2001267221A (ja) * 2000-03-17 2001-09-28 Canon Inc 荷電粒子線露光装置及びデバイス製造方法
US6566664B2 (en) 2000-03-17 2003-05-20 Canon Kabushiki Kaisha Charged-particle beam exposure apparatus and device manufacturing method
JP4947842B2 (ja) * 2000-03-31 2012-06-06 キヤノン株式会社 荷電粒子線露光装置
JP2002100297A (ja) * 2000-09-25 2002-04-05 Hiroshi Saeki イオン生成方法およびイオン生成装置
EP2575144B1 (en) * 2003-09-05 2017-07-12 Carl Zeiss Microscopy GmbH Particle-optical systems and arrangements and particle-optical components for such systems and arrangements
WO2005074001A2 (fr) * 2003-12-30 2005-08-11 Commissariat A L'energie Atomique Dispositif d'emission electronique multifaisceaux hybride a divergence controlee
JP4477436B2 (ja) 2004-06-30 2010-06-09 キヤノン株式会社 荷電粒子線露光装置
JP3803105B2 (ja) * 2004-09-07 2006-08-02 株式会社日立ハイテクノロジーズ 電子ビーム応用装置
DE102004052994C5 (de) * 2004-11-03 2010-08-26 Vistec Electron Beam Gmbh Multistrahlmodulator für einen Partikelstrahl und Verwendung des Multistrahlmodulators zur maskenlosen Substratsstrukturierung
JP2007207764A (ja) * 2007-02-26 2007-08-16 Hitachi Ltd 走査形荷電粒子顕微鏡
JP2010061936A (ja) * 2008-09-03 2010-03-18 Hitachi High-Technologies Corp 荷電粒子ビーム用軌道補正器、および荷電粒子ビーム用軌道補正器の製作方法
JP5886663B2 (ja) * 2012-03-21 2016-03-16 株式会社日立ハイテクノロジーズ 電子線応用装置およびレンズアレイ
JP2016105428A (ja) * 2013-03-08 2016-06-09 株式会社クレステック 電子ビーム照射装置、マルチ電子ビーム照射装置、調整方法、および電子ビーム露光装置
DE102018115012A1 (de) * 2018-06-21 2019-12-24 Carl Zeiss Microscopy Gmbh Teilchenstrahlsystem
EP3893263A1 (en) * 2020-04-06 2021-10-13 ASML Netherlands B.V. Aperture assembly, beam manipulator unit, method of manipulating charged particle beams, and charged particle projection apparatus

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