JP2000243337A5 - - Google Patents

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Publication number
JP2000243337A5
JP2000243337A5 JP1999041510A JP4151099A JP2000243337A5 JP 2000243337 A5 JP2000243337 A5 JP 2000243337A5 JP 1999041510 A JP1999041510 A JP 1999041510A JP 4151099 A JP4151099 A JP 4151099A JP 2000243337 A5 JP2000243337 A5 JP 2000243337A5
Authority
JP
Japan
Prior art keywords
electron optics
charged particle
particle beam
exposure apparatus
beam exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1999041510A
Other languages
English (en)
Japanese (ja)
Other versions
JP4143204B2 (ja
JP2000243337A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP04151099A priority Critical patent/JP4143204B2/ja
Priority claimed from JP04151099A external-priority patent/JP4143204B2/ja
Publication of JP2000243337A publication Critical patent/JP2000243337A/ja
Publication of JP2000243337A5 publication Critical patent/JP2000243337A5/ja
Application granted granted Critical
Publication of JP4143204B2 publication Critical patent/JP4143204B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP04151099A 1999-02-19 1999-02-19 荷電粒子線露光装置及び該装置を用いたデバイス製造方法 Expired - Fee Related JP4143204B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP04151099A JP4143204B2 (ja) 1999-02-19 1999-02-19 荷電粒子線露光装置及び該装置を用いたデバイス製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP04151099A JP4143204B2 (ja) 1999-02-19 1999-02-19 荷電粒子線露光装置及び該装置を用いたデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2000243337A JP2000243337A (ja) 2000-09-08
JP2000243337A5 true JP2000243337A5 (enExample) 2007-03-01
JP4143204B2 JP4143204B2 (ja) 2008-09-03

Family

ID=12610380

Family Applications (1)

Application Number Title Priority Date Filing Date
JP04151099A Expired - Fee Related JP4143204B2 (ja) 1999-02-19 1999-02-19 荷電粒子線露光装置及び該装置を用いたデバイス製造方法

Country Status (1)

Country Link
JP (1) JP4143204B2 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4017935B2 (ja) 2002-07-30 2007-12-05 株式会社日立ハイテクノロジーズ マルチビーム型電子線描画方法及び装置
JP3803105B2 (ja) * 2004-09-07 2006-08-02 株式会社日立ハイテクノロジーズ 電子ビーム応用装置
JP2008066359A (ja) * 2006-09-05 2008-03-21 Canon Inc 荷電ビームレンズアレイ、露光装置及びデバイス製造方法
JP2010061936A (ja) * 2008-09-03 2010-03-18 Hitachi High-Technologies Corp 荷電粒子ビーム用軌道補正器、および荷電粒子ビーム用軌道補正器の製作方法
DE102020107738B3 (de) * 2020-03-20 2021-01-14 Carl Zeiss Multisem Gmbh Teilchenstrahl-System mit einer Multipol-Linsen-Sequenz zur unabhängigen Fokussierung einer Vielzahl von Einzel-Teilchenstrahlen, seine Verwendung und zugehöriges Verfahren

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