JP4143204B2 - 荷電粒子線露光装置及び該装置を用いたデバイス製造方法 - Google Patents

荷電粒子線露光装置及び該装置を用いたデバイス製造方法 Download PDF

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JP4143204B2
JP4143204B2 JP04151099A JP4151099A JP4143204B2 JP 4143204 B2 JP4143204 B2 JP 4143204B2 JP 04151099 A JP04151099 A JP 04151099A JP 4151099 A JP4151099 A JP 4151099A JP 4143204 B2 JP4143204 B2 JP 4143204B2
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optical system
electron
electron optical
charged particle
particle beam
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JP2000243337A5 (enExample
JP2000243337A (ja
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真人 村木
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Canon Inc
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Canon Inc
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JP04151099A 1999-02-19 1999-02-19 荷電粒子線露光装置及び該装置を用いたデバイス製造方法 Expired - Fee Related JP4143204B2 (ja)

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JP04151099A JP4143204B2 (ja) 1999-02-19 1999-02-19 荷電粒子線露光装置及び該装置を用いたデバイス製造方法

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JP04151099A JP4143204B2 (ja) 1999-02-19 1999-02-19 荷電粒子線露光装置及び該装置を用いたデバイス製造方法

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JP2000243337A JP2000243337A (ja) 2000-09-08
JP2000243337A5 JP2000243337A5 (enExample) 2007-03-01
JP4143204B2 true JP4143204B2 (ja) 2008-09-03

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Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4017935B2 (ja) 2002-07-30 2007-12-05 株式会社日立ハイテクノロジーズ マルチビーム型電子線描画方法及び装置
JP3803105B2 (ja) * 2004-09-07 2006-08-02 株式会社日立ハイテクノロジーズ 電子ビーム応用装置
JP2008066359A (ja) * 2006-09-05 2008-03-21 Canon Inc 荷電ビームレンズアレイ、露光装置及びデバイス製造方法
JP2010061936A (ja) * 2008-09-03 2010-03-18 Hitachi High-Technologies Corp 荷電粒子ビーム用軌道補正器、および荷電粒子ビーム用軌道補正器の製作方法
DE102020107738B3 (de) * 2020-03-20 2021-01-14 Carl Zeiss Multisem Gmbh Teilchenstrahl-System mit einer Multipol-Linsen-Sequenz zur unabhängigen Fokussierung einer Vielzahl von Einzel-Teilchenstrahlen, seine Verwendung und zugehöriges Verfahren

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