JPH09270327A - Electronic part and manufacture thereof - Google Patents

Electronic part and manufacture thereof

Info

Publication number
JPH09270327A
JPH09270327A JP7791896A JP7791896A JPH09270327A JP H09270327 A JPH09270327 A JP H09270327A JP 7791896 A JP7791896 A JP 7791896A JP 7791896 A JP7791896 A JP 7791896A JP H09270327 A JPH09270327 A JP H09270327A
Authority
JP
Japan
Prior art keywords
electronic component
resin layer
insulating
insulating substrate
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7791896A
Other languages
Japanese (ja)
Inventor
Kazuya Kimura
一弥 木村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokin Corp
Original Assignee
Tokin Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokin Corp filed Critical Tokin Corp
Priority to JP7791896A priority Critical patent/JPH09270327A/en
Publication of JPH09270327A publication Critical patent/JPH09270327A/en
Pending legal-status Critical Current

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  • Details Of Resistors (AREA)
  • Manufacturing Cores, Coils, And Magnets (AREA)
  • Coils Or Transformers For Communication (AREA)

Abstract

PROBLEM TO BE SOLVED: To enhance the yield of production and reliability, by a method wherein one surface of an insulated substrate and the surface of a laminated body to be formed on the above-mentioned surface are covered by a resin layer. SOLUTION: The main body 21 of this electronic part is provided with an insulated substrate 11 and a laminated body 3 formed on the insulated substrate 11. On the insulated substrate 11, a conductor pattern 13a and an insulating resin layer 12a, which is formed so as to cover the conductor pattern 13a, are formed. Besides, insulating resin layers 12b and 12c and conductor patterns 13b, 13c and 13d are formed in such a manner that they are alternately laminated. At this point, the insulated substrate 11 is composed of a ceramic substrate 2 and a resin layer 1 which is formed on one surface of the ceramic substrate 2. The ceramic having machinability is used for the ceramic substrate 2, and polyimide resin is used for the resin layer 1. Also, benzocyclobutene resin is used for the insulating resin layers 12a, 12b and 12c. As a result, the electronic part can be manufactured easily, chippings and the like are not generated when cutting, and the yield of production can be improved.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、電子部品及びその
製造方法に関し、詳しくは、インダクタ(L)、キャパ
シタ(C)、電気抵抗素子(R)、薄膜EMIフィル
タ、コモンモードチョークコイル、カレントセンサ、信
号用トランス、及びこれらを一つの部品に構成した複合
電子部品等の表面実装部品もしくはリード部品である電
子部品とその製造方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electronic component and a method of manufacturing the same, and more specifically, to an inductor (L), a capacitor (C), an electric resistance element (R), a thin film EMI filter, a common mode choke coil, a current sensor. The present invention relates to a signal transformer, an electronic component that is a surface-mounted component or a lead component such as a composite electronic component in which these components are combined into a single component, and a manufacturing method thereof.

【0002】[0002]

【従来の技術】従来、図6に示される電子部品が知られ
ている(特開平3−201417号公報参照)。この電
子部品は、図6の部分断面図に示すように、絶縁基板1
01上に、ポリイミド樹脂からなる絶縁樹脂層102お
よびスパッタ法によって形成されたTi、Ti−Ag、
Agからなる内部導体パターン103、104を交互に
積層させて積層体105を形成し、絶縁樹脂層102の
端部を取り除くことによって最上部の導体パターン10
4の端部を、露出させて電子部品100を形成してい
る。
2. Description of the Related Art Conventionally, an electronic component shown in FIG. 6 has been known (see Japanese Patent Laid-Open No. 3-201417). As shown in the partial cross-sectional view of FIG.
01, an insulating resin layer 102 made of a polyimide resin, and Ti, Ti-Ag formed by a sputtering method,
The inner conductor patterns 103 and 104 made of Ag are alternately laminated to form a laminate 105, and the uppermost conductor pattern 10 is formed by removing the end portion of the insulating resin layer 102.
The end portion 4 is exposed to form the electronic component 100.

【0003】尚、導体パターン104の端部に接続する
ように端子下地部を電子部品100の側面に形成し、こ
の端子下地を覆うように、電子部品本体の上面端部か
ら、側面を介して下面端部に至る外部電極端子部を形成
して用いられている。
A terminal base portion is formed on a side surface of the electronic component 100 so as to be connected to an end portion of the conductor pattern 104, and the terminal base portion is covered with the side surface from the top end portion of the electronic component body so as to cover the terminal base. The external electrode terminal portion reaching the lower end portion is formed and used.

【0004】上記電子部品において、通常は、絶縁基板
からなる一枚板の上に、上記積層体105を複数縦横に
並べて形成した後、絶縁基板を切断することによって個
々に切り離すことによって形成されている。
In the above electronic component, it is usually formed by forming a plurality of the laminates 105 on a single plate made of an insulating substrate side by side in the vertical and horizontal directions and then cutting the insulating substrate into individual pieces. There is.

【0005】[0005]

【発明が解決しようとする課題】しかしながら、絶縁基
板の表面は、凹凸があるために、その上に形成される積
層体に反映されるので、表面を鏡面加工しなければなら
ず、工数を要するという欠点があった。
However, since the surface of the insulating substrate has irregularities and is reflected in the laminated body formed thereon, the surface must be mirror-finished, which requires man-hours. There was a drawback.

【0006】また、絶縁基板を切断して個々の電子部品
本体とする際に、角部にかけや割れを生じたり、チッピ
ングが発生するなど、歩留まりが良くなかった。
Further, when the insulating substrate is cut into individual electronic component bodies, chipping or cracking occurs at the corners, chipping occurs, and the yield is not good.

【0007】さらに、上記電子部品を高湿中において使
用する場合、樹脂層や導体パターンの隙間から水分が侵
入して、導体パターンが腐食して特性を著しく変化さ
せ、品質の低下をもたらした。
Furthermore, when the above-mentioned electronic component is used in high humidity, water penetrates through the gaps between the resin layer and the conductor pattern, corrodes the conductor pattern and remarkably changes the characteristics, resulting in deterioration of quality.

【0008】そこで、本発明の技術的課題は、製造が容
易であり、切断の際にチッピング等を発生せず、また、
歩留まりに優れるとともに、信頼性の高められた電子部
品とその製造方法とを提供することにある。
Therefore, the technical problem of the present invention is that it is easy to manufacture, does not cause chipping or the like during cutting, and
An object of the present invention is to provide an electronic component having excellent yield and high reliability, and a manufacturing method thereof.

【0009】[0009]

【課題を解決するための手段】本発明によれば、絶縁基
板と、前記絶縁基板の一面側に複数の絶縁層と複数の導
体パターンとを交互に積層した積層体と備えた電子部品
において、前記絶縁基板の一面と前記積層体との間に形
成された第1の樹脂層と、前記積層体の表面を覆う第2
の樹脂層とを備えていることを特徴とする電子部品が得
られる。
According to the present invention, there is provided an electronic component comprising an insulating substrate, and a laminated body in which a plurality of insulating layers and a plurality of conductor patterns are alternately laminated on one surface side of the insulating substrate, A first resin layer formed between one surface of the insulating substrate and the laminated body, and a second resin layer covering the surface of the laminated body.
An electronic component having the resin layer of 1.

【0010】また、本発明によれば、前記電子部品にお
いて、前記第1及び第2の樹脂層はポリイミドからなる
ことを特徴とする電子部品が得られる。
Further, according to the present invention, in the electronic component, the electronic component is obtained in which the first and second resin layers are made of polyimide.

【0011】また、本発明によれば、絶縁基板の一面に
第1の樹脂層を形成し、その上に複数の絶縁層と複数の
導体パターンとを交互に積層して積層体を形成し、前記
積層体の表面を第2の樹脂層で覆うことを特徴とする電
子部品の製造方法が得られる。
Further, according to the present invention, a first resin layer is formed on one surface of the insulating substrate, and a plurality of insulating layers and a plurality of conductor patterns are alternately laminated on the first resin layer to form a laminate, A method of manufacturing an electronic component is obtained, which comprises covering the surface of the laminate with a second resin layer.

【0012】さらに、本発明によれば、前記電子部品の
製造方法において、前記第1及び第2の樹脂層はポリイ
ミドからなることを特徴とする電子部品の製造方法が得
られる。
Further, according to the present invention, there is provided a method of manufacturing an electronic component, wherein the first and second resin layers are made of polyimide.

【0013】[0013]

【発明の実施の形態】以下、本発明の実施の形態につい
て説明する。
BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described below.

【0014】図1は本発明の第1の実施の形態による電
子部品を示す斜面視図である。また、図2は、図1の電
子部品本体21の絶縁樹脂層と導体パターン層の積層体
の各層を模式的に分離して示した斜視図である。本発明
の第1の実施の形態では、電子部品21として、ローパ
スフィルタを例示している。
FIG. 1 is a perspective view showing an electronic component according to a first embodiment of the present invention. Further, FIG. 2 is a perspective view schematically showing each layer of the laminated body of the insulating resin layer and the conductor pattern layer of the electronic component body 21 of FIG. 1 as separated. In the first embodiment of the present invention, a low-pass filter is illustrated as the electronic component 21.

【0015】図1を参照して、電子部品10は、電子部
品本体21と、この電子部品本体21の両端面及び側面
の一部を覆うように、外部電極端子部22が形成されて
いる。
Referring to FIG. 1, the electronic component 10 has an electronic component main body 21 and an external electrode terminal portion 22 formed so as to cover both end faces and part of the side faces of the electronic component main body 21.

【0016】電子部品本体は、絶縁基板11とこの上に
形成された積層体3とを備えている。
The electronic component body comprises an insulating substrate 11 and a laminated body 3 formed thereon.

【0017】図2を参照して、電子部品本体21は、絶
縁基板11と、絶縁基板11上に形成された積層体3と
を備えている。積層体3は、絶縁基板11上に、導体パ
ターン13aと、導体パターン13aを覆うように形成
された絶縁樹脂層12aと、更に、絶縁樹脂層12b、
12c及び導体パターン13b、13c、13dを交互
に積層することによって形成されている。尚、導体パタ
ーン13aの代わりに導体パターン13c´を用いるこ
とができる。
Referring to FIG. 2, the electronic component body 21 includes an insulating substrate 11 and a laminated body 3 formed on the insulating substrate 11. The laminated body 3 includes a conductor pattern 13a, an insulating resin layer 12a formed so as to cover the conductor pattern 13a, and an insulating resin layer 12b on the insulating substrate 11.
12c and conductor patterns 13b, 13c and 13d are alternately laminated. The conductor pattern 13c 'can be used instead of the conductor pattern 13a.

【0018】ここで、本発明の実施の形態において、絶
縁基板11は、セラミックス基板2と、セラミックス基
板2の一面に形成された樹脂層1とからなる。セラミッ
クス基板2は、快削性を有するセラミックス(三井鉱山
マテリアル社製商品名マセライト)を用いており、ま
た、樹脂層1にはポリイミド樹脂を用いている。
Here, in the embodiment of the present invention, the insulating substrate 11 is composed of the ceramic substrate 2 and the resin layer 1 formed on one surface of the ceramic substrate 2. The ceramics substrate 2 is made of free-cutting ceramics (trade name: Macerite manufactured by Mitsui Mining Materials Co., Ltd.), and the resin layer 1 is made of polyimide resin.

【0019】また、絶縁樹脂層12a、12b、12c
は、平坦化が容易であり、且つ紫外線感光性のベンゾシ
クロブテン樹脂(BCB)を用いている。
Insulating resin layers 12a, 12b, 12c
Uses an ultraviolet-sensitive benzocyclobutene resin (BCB) that is easy to flatten.

【0020】さらに、導体パターン13a、13b、1
3cとして、Ti膜又はTi膜上にCu膜をスパッタ形
成し、さらに、電解Cuめっきによって形成した電解C
uめっき膜を使用している。
Further, the conductor patterns 13a, 13b, 1
As 3c, a Ti film or a Cu film is sputtered on the Ti film, and electrolytic C is formed by electrolytic Cu plating.
u plating film is used.

【0021】図3は本発明の実施の形態による電子部品
本体21の絶縁基板11を主に示す部分断面図であり、
積層構造の一部は省略されている。図3に示すように、
絶縁基板11は、セラミックス基板2と両面に形成され
たポリイミドからなる樹脂層1とからなる。この樹脂層
1を設けることによって、セラミックス基板2の表面の
面粗さを平坦化するとともに、セラミックス基板2の強
度を増すことができる。
FIG. 3 is a partial sectional view mainly showing the insulating substrate 11 of the electronic component body 21 according to the embodiment of the present invention.
A part of the laminated structure is omitted. As shown in FIG.
The insulating substrate 11 comprises a ceramic substrate 2 and a resin layer 1 made of polyimide formed on both surfaces. By providing this resin layer 1, it is possible to flatten the surface roughness of the surface of the ceramic substrate 2 and increase the strength of the ceramic substrate 2.

【0022】図2及び図3に示された導体パターン13
a、13b、13c、13dは、Ti膜のみ、又はTi
膜とこの上にCu膜を形成して下地パターン層とし、こ
の上に形成された電解Cuめっき膜からなる。この導体
パターン13a、13b、13c、13dを形成する工
程は次の通りである。
The conductor pattern 13 shown in FIGS. 2 and 3.
a, 13b, 13c and 13d are Ti films only or Ti
A film and a Cu film are formed on the film to form a base pattern layer, and an electrolytic Cu plating film is formed on the film. The steps of forming the conductor patterns 13a, 13b, 13c and 13d are as follows.

【0023】一面にポリイミドからなる樹脂層1を備え
たセラミックス基板2からなる絶縁基板11に、スパッ
タ法によって、Ti膜及びCu膜を下地層としてスパッ
タ形成し、ホトリソグラフィを用いて、所望の導体パタ
ーンに一致した凹部を備えたレジストのパターンを得
る。表面処理後、凹部内に電解Cuめっき層を形成し、
レジストのパターンを剥離して、下地層を底部として連
続している中間導体パターンを得る。次に、中間導体パ
ターンにウエットエッチング(ドライエッチングでも
可)を施し、下地層の露出部を除去し、洗浄して絶縁基
板11上に形成された導体パターン13a、13b、1
3c、13dを得る。
A Ti film and a Cu film are formed as an underlying layer by sputtering on an insulating substrate 11 made of a ceramic substrate 2 having a resin layer 1 made of polyimide on one surface, and a desired conductor is formed by photolithography. Obtain a resist pattern with recesses that match the pattern. After the surface treatment, an electrolytic Cu plating layer is formed in the recess,
The resist pattern is peeled off to obtain a continuous intermediate conductor pattern having the underlayer as the bottom. Next, the intermediate conductor pattern is subjected to wet etching (may be dry etching) to remove the exposed portion of the underlying layer and washed to form the conductor patterns 13a, 13b, 1 formed on the insulating substrate 11.
3c and 13d are obtained.

【0024】また、絶縁樹脂層12a、12b、12c
を形成する工程は次の通りである。
Insulating resin layers 12a, 12b, 12c
The steps of forming the are as follows.

【0025】絶縁基板11上に形成された導体パターン
13aを覆うように、スピンコーティングによって、紫
外線感光性BCB樹脂を塗布して、絶縁樹脂層12aを
形成し、フォトリソグラフィを用い、絶縁樹脂層12a
に任意に下層の導体パターン12aとのコンタクトを得
るための貫通孔を形成する。次に、窒素雰囲気中で21
0℃、30分ハーフキュアして、導体パターン13aを
埋設した絶縁樹脂層12aを得る。
An ultraviolet-sensitive BCB resin is applied by spin coating so as to cover the conductor pattern 13a formed on the insulating substrate 11, an insulating resin layer 12a is formed, and the insulating resin layer 12a is formed by photolithography.
Through holes are optionally formed to obtain contact with the lower conductor pattern 12a. Next, in a nitrogen atmosphere,
Half-curing is performed at 0 ° C. for 30 minutes to obtain the insulating resin layer 12a in which the conductor pattern 13a is embedded.

【0026】また、絶縁樹脂層12a、12b、12c
上に形成された他の導体パターン13b、13c、13
dに関しては、上記絶縁基板11の代わりに、紫外線感
光性BCB樹脂を硬化させた絶縁樹脂層を用いれば、夫
々の導体パターンを同様に形成することができる。
Insulating resin layers 12a, 12b, 12c
Other conductor patterns 13b, 13c, 13 formed on the top
Regarding d, if an insulating resin layer obtained by curing a UV-sensitive BCB resin is used instead of the insulating substrate 11, the respective conductor patterns can be similarly formed.

【0027】また、導体パターン13b、13cを覆う
絶縁樹脂層に関しては、次のように製造される。絶縁樹
脂層12a上に形成された導体パターン13bを覆うよ
うに、スピンコーティングによって、紫外線感光性BC
B樹脂を塗布して、絶縁樹脂層12aを得る。次に、必
要に応じてフォトリソグラフィを用い、絶縁樹脂層12
aに貫通孔を形成する。次に、窒素雰囲気中で210
℃、30分ハーフキュアして、導体パターン13bを埋
設した絶縁樹脂層12bを得る。
The insulating resin layer covering the conductor patterns 13b and 13c is manufactured as follows. The UV-sensitive BC is formed by spin coating so as to cover the conductor pattern 13b formed on the insulating resin layer 12a.
The B resin is applied to obtain the insulating resin layer 12a. Next, the insulating resin layer 12 is formed by using photolithography as needed.
A through hole is formed in a. Next, in a nitrogen atmosphere, 210
Half-curing is performed at 30 ° C. for 30 minutes to obtain an insulating resin layer 12b in which the conductor pattern 13b is embedded.

【0028】大寸法絶縁基板11の上の複数箇所に対し
て、以上の工程を繰り返すことによって、図2及び図3
に示す積層体3の複数個を絶縁基板上に縦横に配した状
態で形成する。これらの積層体をポリイミド樹脂で覆う
とともに、金属パターン16を設けて内部の導体パター
ンに通じる貫通穴を塞いで、図4に示す複数の電子部品
構造体23が完成される。
2 and 3 by repeating the above steps for a plurality of locations on the large-sized insulating substrate 11.
A plurality of the laminated bodies 3 shown in FIG. These laminated bodies are covered with a polyimide resin, and the metal patterns 16 are provided to close the through holes communicating with the internal conductor patterns, whereby the plurality of electronic component structures 23 shown in FIG. 4 are completed.

【0029】図5は、図4の電子部品構造体の平面図で
ある。図5に示すように、絶縁基板11上に電子部品構
造体23が縦横に連設配置されている。
FIG. 5 is a plan view of the electronic component structure shown in FIG. As shown in FIG. 5, the electronic component structures 23 are vertically and horizontally arranged on the insulating substrate 11.

【0030】図4及び図5を参照して、ダイシングソー
によって、絶縁基板11を切りしろ24に沿って切断
し、電子部品構造体を個々に分割する。図4に示すよう
に、SiO2 成分の多いマセライトは、切断の際にチッ
ピングが発生しやすいが、ポリイミドからなる樹脂層1
を一面につけ、また積層体の表面をポリイミドからなる
樹脂層5で覆ってあるために、ポリイミドと共に絶縁基
板を断することで、切断応力が緩和され、チッピング発
生やパターンの剥離、欠け等を防止することができる。
Referring to FIGS. 4 and 5, the insulating substrate 11 is cut along the cutting margin 24 by a dicing saw to divide the electronic component structure into individual parts. As shown in FIG. 4, macerite containing a large amount of SiO 2 components is apt to cause chipping during cutting, but the resin layer 1 made of polyimide is used.
Since the surface of the laminate is covered with the resin layer 5 made of polyimide, cutting stress is relieved by cutting the insulating substrate together with the polyimide, and chipping, pattern peeling, chipping, etc. are prevented. can do.

【0031】次に、電子部品構造体23に外部電極端子
部を形成するには、最上層に絶縁樹脂層を設け、この絶
縁樹脂層に設けられた貫通穴からなる電極取り出し部を
導電性の金属、例えば、Cuで封じて電極取り出しパタ
ーンを形成する。更に、電極取り出しパターンに覆われ
ていない表面層に保護層を設ける。次に、電子部品構造
体23に、Ni粉を含むエポキシ樹脂等からなるNi導
電ペーストを、電極取り出しパターンの端部から側面を
通って電子部品構造体23の下面に至るように塗布して
熱硬化させる。次に、めっき前処理後、電解バレルめっ
き法にてNiめっき膜を下地層として形成する。次に、
この下地層上に、電解バレルめっきによって、外部接続
膜として半田めっき膜を形成し、図1に示すように、電
子部品本体21の両端及び中央部に外部電極端子22を
備えた電子部品10を得ることができる。
Next, in order to form the external electrode terminal portion in the electronic component structure 23, an insulating resin layer is provided on the uppermost layer, and the electrode lead-out portion formed of the through hole provided in the insulating resin layer is made conductive. An electrode extraction pattern is formed by sealing with metal, for example, Cu. Further, a protective layer is provided on the surface layer not covered with the electrode extraction pattern. Next, a Ni conductive paste made of epoxy resin or the like containing Ni powder is applied to the electronic component structure 23 so as to reach the lower surface of the electronic component structure 23 from the end of the electrode extraction pattern through the side surface and heat. Let it harden. Next, after the plating pretreatment, a Ni plating film is formed as a base layer by electrolytic barrel plating. next,
On this base layer, a solder plating film is formed as an external connection film by electrolytic barrel plating, and as shown in FIG. 1, an electronic component 10 having external electrode terminals 22 at both ends and a central portion of an electronic component body 21 is provided. Obtainable.

【0032】ここで、絶縁樹脂層を形成するBCBは、
脆性を有するので、切断の際、クラック等が生じ、基板
全面を平坦化するのに不向きである。BCBの代わり
に、ポリイミド樹脂にて、絶縁基板11の平坦化を予め
行い、その上に、Cuの導体パターンと、Cuと相性の
良い、CuマイグレーションのないBCBとを用いて、
積層体を形成し、積層体表面を再度ポリイミドにより、
完全密封することで、切断性も良く、高湿度中でも、導
体パターンの腐食をおこさず、安定品質である電子部品
を実現することができる。
Here, the BCB forming the insulating resin layer is
Since it has brittleness, cracks or the like are generated during cutting, which makes it unsuitable for flattening the entire surface of the substrate. Instead of BCB, planarization of the insulating substrate 11 is performed in advance with a polyimide resin, and a Cu conductor pattern and a BCB that is compatible with Cu and is free of Cu migration are used thereon.
Form a laminate, the surface of the laminate again with polyimide,
By completely sealing, it is possible to realize an electronic component that has good cuttability, does not corrode the conductor pattern even in high humidity, and has stable quality.

【0033】尚、本発明の実施の形態においては、電子
部品としてローパスフィルタを例示したが、コモンモー
ドチョークコイル、トランス、カレントセンサ、LCR
回路素子等にも適用できることは明白である。
In the embodiment of the present invention, the low-pass filter is exemplified as the electronic component, but the common mode choke coil, transformer, current sensor, LCR are used.
Obviously, it can be applied to circuit elements and the like.

【0034】[0034]

【発明の効果】以上、説明したように、本発明によれ
ば、絶縁基板の一面とこの上に形成される積層体の表面
を樹脂層で覆ったので、製造が容易であり、切断の際に
チッピング等を発生せず、また、歩留まりに優れるとと
もに、内部への湿気の侵入を防止し、信頼性の高められ
た電子部品とその製造方法とを提供することができる。
As described above, according to the present invention, since one surface of the insulating substrate and the surface of the laminate formed on the insulating substrate are covered with the resin layer, the manufacturing is easy, and the It is possible to provide an electronic component which does not cause chipping and the like, has an excellent yield, prevents moisture from entering the inside, and has high reliability, and a manufacturing method thereof.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の実施の形態による電子部品を示す斜視
図である。
FIG. 1 is a perspective view showing an electronic component according to an embodiment of the present invention.

【図2】図1の電子部品本体21の絶縁樹脂層と導体パ
ターン層の積層体の各層を模式的に分離して示した斜視
図である。
FIG. 2 is a perspective view schematically showing each layer of a laminate of an insulating resin layer and a conductor pattern layer of the electronic component body 21 of FIG. 1 in a separated state.

【図3】本発明の実施の形態による電子部品本体の絶縁
基板を主に示す部分断面図である。
FIG. 3 is a partial cross-sectional view mainly showing the insulating substrate of the electronic component body according to the embodiment of the present invention.

【図4】本発明の実施の形態による電子部品構造体を示
す断面図である。
FIG. 4 is a sectional view showing an electronic component structure according to an embodiment of the present invention.

【図5】本発明の実施の形態による電子部品構造体の切
断の状態を示す平面図である。
FIG. 5 is a plan view showing a cut state of the electronic component structure according to the embodiment of the present invention.

【図6】従来の電子部品の一例を示す断面図である。FIG. 6 is a cross-sectional view showing an example of a conventional electronic component.

【符号の説明】[Explanation of symbols]

1、5 樹脂層 2 セラミックス基板 3 積層体 10 電子部品 11 絶縁基板 12a、12b、12c 絶縁樹脂層 13a、13b、13c、13d 導体パターン 16 金属パターン 21 電子部品本体 22 外部電極端子部 23 電子部品構造体 24 切り代 101 絶縁基板 102 絶縁樹脂層 103、104 内部導体パターン 105 積層体 100 電子部品 1, 5 Resin layer 2 Ceramics substrate 3 Laminated body 10 Electronic component 11 Insulating substrate 12a, 12b, 12c Insulating resin layer 13a, 13b, 13c, 13d Conductor pattern 16 Metal pattern 21 Electronic component body 22 External electrode terminal portion 23 Electronic component structure Body 24 Cutting margin 101 Insulating substrate 102 Insulating resin layers 103, 104 Internal conductor pattern 105 Laminated body 100 Electronic component

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 絶縁基板と、前記絶縁基板の一面側に複
数の絶縁層と複数の導体パターンとを交互に積層した積
層体と備えた電子部品において、前記絶縁基板の一面と
前記積層体との間に形成された第1の樹脂層と、前記積
層体の表面を覆う第2の樹脂層とを備えていることを特
徴とする電子部品。
1. An electronic component comprising: an insulating substrate; and a laminated body in which a plurality of insulating layers and a plurality of conductor patterns are alternately laminated on one surface side of the insulating substrate, the one surface of the insulating substrate and the laminated body. An electronic component comprising: a first resin layer formed between the first and second resin layers; and a second resin layer that covers the surface of the laminate.
【請求項2】 請求項1記載の電子部品において、前記
第1及び第2の樹脂層はポリイミドからなることを特徴
とする電子部品。
2. The electronic component according to claim 1, wherein the first and second resin layers are made of polyimide.
【請求項3】 絶縁基板の一面に第1の樹脂層を形成
し、その上に複数の絶縁層と複数の導体パターンとを交
互に積層して積層体を形成し、前記積層体の表面を第2
の樹脂層で覆うことを特徴とする電子部品の製造方法。
3. A first resin layer is formed on one surface of an insulating substrate, a plurality of insulating layers and a plurality of conductor patterns are alternately laminated on the first resin layer to form a laminate, and a surface of the laminate is formed. Second
A method for manufacturing an electronic component, which is characterized by covering with a resin layer.
【請求項4】 請求項3記載の電子部品の製造方法にお
いて、前記第1及び第2の樹脂層はポリイミドからなる
ことを特徴とする電子部品の製造方法。
4. The method of manufacturing an electronic component according to claim 3, wherein the first and second resin layers are made of polyimide.
JP7791896A 1996-03-29 1996-03-29 Electronic part and manufacture thereof Pending JPH09270327A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7791896A JPH09270327A (en) 1996-03-29 1996-03-29 Electronic part and manufacture thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7791896A JPH09270327A (en) 1996-03-29 1996-03-29 Electronic part and manufacture thereof

Publications (1)

Publication Number Publication Date
JPH09270327A true JPH09270327A (en) 1997-10-14

Family

ID=13647468

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7791896A Pending JPH09270327A (en) 1996-03-29 1996-03-29 Electronic part and manufacture thereof

Country Status (1)

Country Link
JP (1) JPH09270327A (en)

Cited By (2)

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JP2012175104A (en) * 2011-02-18 2012-09-10 Asml Netherlands Bv Substrate holder, lithographic apparatus, device manufacturing method, and method of manufacturing substrate holder
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