JPH10163002A - Chip electronic component and its manufacture - Google Patents

Chip electronic component and its manufacture

Info

Publication number
JPH10163002A
JPH10163002A JP8334658A JP33465896A JPH10163002A JP H10163002 A JPH10163002 A JP H10163002A JP 8334658 A JP8334658 A JP 8334658A JP 33465896 A JP33465896 A JP 33465896A JP H10163002 A JPH10163002 A JP H10163002A
Authority
JP
Japan
Prior art keywords
conductor film
internal conductor
protective layer
electronic component
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8334658A
Other languages
Japanese (ja)
Inventor
Shigeru Nishiyama
西山  茂
Shuichi Ishida
修一 石田
Kuniaki Watanabe
邦昭 渡辺
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toko Inc
Original Assignee
Toko Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toko Inc filed Critical Toko Inc
Priority to JP8334658A priority Critical patent/JPH10163002A/en
Publication of JPH10163002A publication Critical patent/JPH10163002A/en
Pending legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To ensure good connection of an inner conductor film to terminal electrodes, and prevent peeling thereof due to soldering by forming the film so that an exposed part of the film at the end face inclines to a cut face. SOLUTION: An inner conductor film 11 is formed on the surface of an insulative substrate 10 and covered with a protective layer 12. A conductor film 16 is formed at a cut face to make electrode electrodes. A plated layer 17 is formed so that an exposed part of the conductor film of the film 11 at the end face inclines to the cut face. A terminal electrode 16 is formed at that part to connect the conductor film 11 to the terminal electrode 16. Trenches are formed into the surface of the protective layer of a wafer having the inner conductor film and protective layer at the insulative substrate surface, deep enough to reach the substrate through the inner conductor film. The substrate is divided at the trenches into separate elements and terminal electrodes are formed thereafter.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、インダクタ、コン
デンサや抵抗器等のチップ型電子部品の構造とその製造
方法に係るもので、特に、外部端子電極の強度を改善し
て信頼性を高めるものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a structure of a chip-type electronic component such as an inductor, a capacitor or a resistor and a method of manufacturing the same, and more particularly, to a method of improving the strength of external terminal electrodes to enhance reliability. It is.

【0002】[0002]

【従来の技術】各種の電子部品でチップ化の要求があ
り、抵抗、コンデンサ、インダクタといった受動素子の
分野でも各種のチップ型の素子が用いられている。ま
た、絶縁性の基板の表面に内部導体膜を一層または薄膜
を介して多層に形成してコンデンサやインダクタなどを
形成する技術も利用されている。
2. Description of the Related Art Various electronic parts are required to be formed into chips, and various chip-type elements are used in the field of passive elements such as resistors, capacitors and inductors. In addition, a technique of forming a capacitor, an inductor, and the like by forming an internal conductor film on the surface of an insulating substrate in a single layer or in multiple layers via a thin film has also been used.

【0003】そのような電子部品は一枚の絶縁基板上に
多数の素子となる内部導体膜を形成し、表面をガラス等
の保護層で覆った後に個々の素子に分割している。分割
した際に内部導体膜の端部が切断面に露出するので、こ
の端面に端子電極を形成して、内部導体膜と外部回路と
を接続している。
[0003] In such an electronic component, an internal conductor film serving as a large number of elements is formed on one insulating substrate, and the surface is covered with a protective layer such as glass, and then divided into individual elements. Since the end of the internal conductor film is exposed on the cut surface when the division is performed, a terminal electrode is formed on this end surface to connect the internal conductor film to the external circuit.

【0004】[0004]

【発明が解決しようとする課題】図3は、上記のような
タイプのチップ型電子部品の正面断面図で、アルミナ等
の絶縁性の基板30の表面に素子を構成する内部導体膜31
を形成し、これをガラス等の保護層32で覆ったものであ
る。切断面に銀等の導体膜36を形成して端子電極とし、
通常更に錫等のメッキ層37を形成している。
FIG. 3 is a front sectional view of a chip-type electronic component of the type described above. An internal conductor film 31 constituting an element is formed on a surface of an insulating substrate 30 such as alumina.
Is formed, and this is covered with a protective layer 32 such as glass. A conductor film 36 of silver or the like is formed on the cut surface to form a terminal electrode,
Usually, a plating layer 37 of tin or the like is further formed.

【0005】しかし、個々の素子への分割時に、ガラス
の保護層32の部分の形状が安定しないために、後の外部
端子電極36の形成のための銀の塗布が困難となったり、
印刷基板への実装の半田付け時に応力が集中して端子電
極のクラックの発生や剥離といった問題を生じている。
半田41の熱収縮による応力は図4に破線で示した部分に
クラックを発生させたり、剥離を生じさせている。した
がって、内部導体膜と端子電極の導体との接続ができな
くなったり、不安定となることが多かった。
However, at the time of division into individual elements, the shape of the glass protective layer 32 is not stable, so that it becomes difficult to apply silver for forming the external terminal electrodes 36 later,
Stress is concentrated at the time of soldering for mounting on a printed circuit board, causing problems such as cracking and peeling of terminal electrodes.
The stress due to the thermal shrinkage of the solder 41 causes cracks or peeling at the portions shown by the broken lines in FIG. Therefore, the connection between the internal conductor film and the conductor of the terminal electrode cannot be often made or becomes unstable.

【0006】本発明は、上記のような問題を解決して、
内部導体膜の引出し部に応力が集中することを防止し
て、内部導体膜と端子電極との接続が良好で、かつ半田
付けによる剥離等を防止できるチップ型電子部品とその
製造方法を提供するものである。
[0006] The present invention solves the above problems,
Provided is a chip-type electronic component capable of preventing stress from being concentrated on a lead-out portion of an internal conductor film, providing good connection between the internal conductor film and a terminal electrode, and preventing peeling or the like due to soldering, and a method of manufacturing the same. Things.

【0007】[0007]

【課題を解決するための手段】本発明は、内部導体膜が
端面に露出する部分を切断面に対して傾斜するように形
成することによって、上記の課題を解決するものであ
る。
The present invention solves the above-mentioned problems by forming a portion where the internal conductor film is exposed at the end face so as to be inclined with respect to a cut surface.

【0008】すなわち、絶縁性の基板の表面に内部導体
膜を具え、その導体膜が絶縁材料による保護層に覆われ
るとともに、その内部導体膜の端部が切断面に引き出さ
れるチップ型電子部品において、その内部導体膜が引き
出される端面の部分が、切断面に対して傾斜しているこ
とに特徴を有するものである。
That is, in a chip-type electronic component in which an internal conductive film is provided on the surface of an insulating substrate, the conductive film is covered with a protective layer made of an insulating material, and an end of the internal conductive film is drawn out to a cut surface. The feature is that a portion of the end surface from which the internal conductor film is drawn is inclined with respect to the cut surface.

【0009】また、絶縁性の基板の表面に内部導体膜を
形成し、その内部導体膜を絶縁材料による保護層で覆
い、基板を個々の素子に分割してそれぞれの素子に端子
電極を形成するチップ型電子部品の製造方法において、
内部導体膜を保護層で覆った後に保護層から絶縁性の基
板に達する溝を形成し、その後に溝の部分でそれぞれの
素子に分割し、溝の部分を含む切断面に端子電極を形成
することに特徴を有するものである。
In addition, an internal conductor film is formed on the surface of an insulating substrate, the internal conductor film is covered with a protective layer made of an insulating material, and the substrate is divided into individual elements to form terminal electrodes on each element. In a method of manufacturing a chip-type electronic component,
After covering the internal conductor film with the protective layer, a groove is formed from the protective layer to the insulating substrate, and then divided into respective elements at the groove portion, and a terminal electrode is formed on a cut surface including the groove portion. In particular, it has features.

【0010】[0010]

【発明の実施の形態】本発明によるチップ型電子部品の
製造方法のプロセスは以下の通りである。 基板表面への内部導体膜の形成 保護層の形成 切断部への溝の形成 切断(分割) 端面への端子電極の形成 必要があればメッキ
DESCRIPTION OF THE PREFERRED EMBODIMENTS The process of the method for manufacturing a chip-type electronic component according to the present invention is as follows. Formation of internal conductor film on substrate surface Formation of protective layer Formation of groove in cut section Cutting (division) Formation of terminal electrode on end face Plating if necessary

【0011】[0011]

【実施例】以下、図面を参照して、本発明の実施例につ
いて説明する。
Embodiments of the present invention will be described below with reference to the drawings.

【0012】図1は本発明によるチップ型電子部品の一
例を示す正面断面図(a)と平面図(b)である。従来
と構造は基本的には変わりがなく、アルミナ等の絶縁性
の基板10の表面に内部導体膜11を形成し、これをガラス
等の保護層12で覆ったものである。切断面に銀等の導体
膜16を形成して端子電極とし、通常更に錫等のメッキ層
17を形成している。
FIG. 1 is a front sectional view (a) and a plan view (b) showing an example of a chip-type electronic component according to the present invention. The structure is basically the same as that of the related art. An internal conductor film 11 is formed on the surface of an insulating substrate 10 such as alumina, and this is covered with a protective layer 12 such as glass. A conductor film 16 of silver or the like is formed on the cut surface to form a terminal electrode, and usually a plating layer of tin or the like.
17 are formed.

【0013】本発明においては、内部導体膜11の導体膜
が露出する端面を図に示したように、端子電極が形成さ
れる切断面に対して傾斜するように形成してある。そし
てこの部分にも端子電極16を形成して、内部導体膜11と
端子電極16との接続を行っている。
In the present invention, the end surface of the internal conductor film 11 where the conductor film is exposed is formed so as to be inclined with respect to the cut surface on which the terminal electrode is formed, as shown in the figure. The terminal electrode 16 is also formed on this portion, and the connection between the internal conductor film 11 and the terminal electrode 16 is performed.

【0014】次に、本発明による、チップ型電子部品の
製造方法について説明する。図2は製造方法を示す正面
断面図である。アルミナ等の絶縁性の基板20の表面に内
部導体膜21とガラス等の保護層22を形成したウェハを用
意する(a)。このウェハの保護層22を形成した表面側
から溝24を形成する。この溝24は保護膜22、内部導体膜
21を突き抜けて基板20まで達するように形成しておく
(b)。
Next, a method of manufacturing a chip-type electronic component according to the present invention will be described. FIG. 2 is a front sectional view showing the manufacturing method. A wafer is prepared in which an internal conductor film 21 and a protective layer 22 such as glass are formed on the surface of an insulating substrate 20 such as alumina (a). A groove 24 is formed from the front side of the wafer on which the protective layer 22 is formed. The groove 24 is formed by the protective film 22 and the internal conductor film.
It is formed so as to penetrate 21 and reach the substrate 20 (b).

【0015】この溝の部分で基板を個々の素子に分割す
る(c)。この後に端子電極を形成するが、その方法は
通常の方法によればよい。
The substrate is divided into individual elements at the grooves (c). Thereafter, a terminal electrode is formed, and the method may be a conventional method.

【0016】なお、溝の形状は任意とすることができる
が、分割を容易にするとともに切断面の形状を安定させ
るためには、図2のようなU字状とするか、あるいはV
字状にするとよい。深さも任意であるが、少なくとも内
部導体膜21が溝に露出するような深さとする必要はあ
る。
The shape of the groove can be arbitrarily set. However, in order to facilitate the division and stabilize the shape of the cut surface, the groove may be formed in a U-shape as shown in FIG.
It is good to make it letter-shaped. The depth is also arbitrary, but it is necessary that the depth is at least such that the internal conductor film 21 is exposed in the groove.

【0017】本発明は、抵抗器、インダクタ、コンデン
サ等の受動部品だけでなく、基板表面に内部導体膜を形
成し、その端部を端面の端子に接続する電子部品全体に
応用できる。
The present invention can be applied not only to passive components such as resistors, inductors and capacitors, but also to entire electronic components in which an internal conductor film is formed on the surface of a substrate and its end is connected to a terminal on the end surface.

【0018】[0018]

【発明の効果】本発明によれば、素子に分割した場合に
内部導体膜の端面に露出する部分の形状を一定にするこ
とが可能となる。したがって、この部分に確実に外部端
子電極を形成して接続することができる。
According to the present invention, it is possible to make the shape of the portion exposed to the end face of the internal conductor film constant when divided into elements. Therefore, external terminal electrodes can be reliably formed and connected to this portion.

【0019】また、内部導体膜が露出する端面部分に半
田の熱収縮による応力が集中することを防止できるの
で、端子電極のクラックや剥がれを防止することが容易
となり、信頼性の高い電子部品が得られる。
Further, since stress due to the thermal shrinkage of the solder can be prevented from being concentrated on the end face portion where the internal conductor film is exposed, cracking and peeling of the terminal electrode can be easily prevented, and a highly reliable electronic component can be obtained. can get.

【図面の簡単な説明】[Brief description of the drawings]

【図1】 本発明の実施例を示す正面断面図FIG. 1 is a front sectional view showing an embodiment of the present invention.

【図2】 本発明の実施例を示す正面断面図FIG. 2 is a front sectional view showing an embodiment of the present invention.

【図3】 従来のチップ型電子部品を示す(a)は正面
断面図、(b)は平面図
3A and 3B are front sectional views and FIG. 3B is a plan view showing a conventional chip-type electronic component.

【図4】 従来のチップ型電子部品を示す部分斜視図FIG. 4 is a partial perspective view showing a conventional chip-type electronic component.

【符号の説明】[Explanation of symbols]

10、20、30:アルミナ基板 11、21、31:内部導体膜 12、22、32:保護層 24:溝 16、26:端子電極 17、27、37:半田めっき層 10, 20, 30: Alumina substrate 11, 21, 31: Internal conductor film 12, 22, 32: Protective layer 24: Groove 16, 26: Terminal electrode 17, 27, 37: Solder plating layer

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 絶縁性の基板の表面に内部導体膜を具
え、その内部導体膜が絶縁材料による保護層に覆われる
とともに、その内部導体膜の端部が切断面に引き出され
るチップ型電子部品において、その内部導体膜が引き出
される端面の部分が、切断面に対して傾斜していること
を特徴とするチップ型電子部品。
1. A chip-type electronic component having an internal conductor film on a surface of an insulating substrate, wherein the internal conductor film is covered with a protective layer made of an insulating material, and an end of the internal conductor film is drawn out to a cut surface. 2. The chip-type electronic component according to claim 1, wherein a portion of the end surface from which the internal conductor film is drawn out is inclined with respect to the cut surface.
【請求項2】 絶縁性の基板の表面に内部導体膜を形成
し、その内部導体膜を絶縁材料による保護層で覆い、基
板を個々の素子に分割してそれぞれの素子に端子電極を
形成するチップ型電子部品の製造方法において、内部導
体膜を保護層で覆った後に保護層から絶縁性の基板に達
する溝を形成し、その後に溝の部分でそれぞれの素子に
分割し、溝の部分を含む切断面に端子電極を形成するこ
とを特徴とするチップ型電子部品の製造方法。
2. An internal conductor film is formed on a surface of an insulating substrate, the internal conductor film is covered with a protective layer made of an insulating material, and the substrate is divided into individual elements to form terminal electrodes on each element. In the method of manufacturing a chip-type electronic component, after covering the internal conductor film with a protective layer, a groove is formed from the protective layer to the insulating substrate, and then divided into respective elements at the groove portion. A method of manufacturing a chip-type electronic component, comprising forming a terminal electrode on a cut surface including the same.
JP8334658A 1996-11-29 1996-11-29 Chip electronic component and its manufacture Pending JPH10163002A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8334658A JPH10163002A (en) 1996-11-29 1996-11-29 Chip electronic component and its manufacture

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8334658A JPH10163002A (en) 1996-11-29 1996-11-29 Chip electronic component and its manufacture

Publications (1)

Publication Number Publication Date
JPH10163002A true JPH10163002A (en) 1998-06-19

Family

ID=18279823

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8334658A Pending JPH10163002A (en) 1996-11-29 1996-11-29 Chip electronic component and its manufacture

Country Status (1)

Country Link
JP (1) JPH10163002A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7489036B2 (en) 2006-02-17 2009-02-10 Tdk Corporation Thin-film device
US7649251B2 (en) 2006-02-17 2010-01-19 Tdk Corporation Thin-film device
US7675136B2 (en) 2006-03-31 2010-03-09 Tdk Corporation Thin-film device including a terminal electrode connected to respective end faces of conductor layers

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7489036B2 (en) 2006-02-17 2009-02-10 Tdk Corporation Thin-film device
US7649251B2 (en) 2006-02-17 2010-01-19 Tdk Corporation Thin-film device
US7675136B2 (en) 2006-03-31 2010-03-09 Tdk Corporation Thin-film device including a terminal electrode connected to respective end faces of conductor layers
US8242575B2 (en) 2006-03-31 2012-08-14 Tdk Corporation Thin-film device including a terminal electrode connected to respective end faces of conductor layers

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