JPH09270330A - Electronic part - Google Patents

Electronic part

Info

Publication number
JPH09270330A
JPH09270330A JP10369996A JP10369996A JPH09270330A JP H09270330 A JPH09270330 A JP H09270330A JP 10369996 A JP10369996 A JP 10369996A JP 10369996 A JP10369996 A JP 10369996A JP H09270330 A JPH09270330 A JP H09270330A
Authority
JP
Japan
Prior art keywords
electronic component
conductor pattern
film
layer
magnetic film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10369996A
Other languages
Japanese (ja)
Inventor
Kazuhiro Seto
一弘 瀬戸
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokin Corp
Original Assignee
Tokin Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokin Corp filed Critical Tokin Corp
Priority to JP10369996A priority Critical patent/JPH09270330A/en
Publication of JPH09270330A publication Critical patent/JPH09270330A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/02Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets
    • H01F41/04Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets for manufacturing coils
    • H01F41/041Printed circuit coils

Abstract

PROBLEM TO BE SOLVED: To provide an electronic part such as noise filter structured so that its attenuation characteristic can be a wide band one at low cost in a simple structure, without providing any other circuit arrangement. SOLUTION: This electronic part has an insulation substrate 11, a laminate 15 composed of alternately laminated insulation resin layers 12a-d and conductor patterns 13a-d on the substrate 11, and external electrode terminals which are electrically connected to the patterns 13a-d and run between the substrate 11 and the laminate 15. The conductor patterns 13a-d has a lower layer formed on the insulation layers 12a-d or substrate 11, conductive film made of a conductive metal formed on this lower layer, and magnetic film made of a Ni-contained metal or alloy formed between the lower layer and conductive film or on this film.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は,チップ部品等の電
子部品に関し,詳しくは,LCR素子,薄膜EMIフィ
ルタ,コモンモードチョークコイル,信号用トランス,
カレントセンサ,複合部品等の表面実装部品,リード部
品等の電子部品及びその製造方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electronic component such as a chip component, and more particularly to an LCR element, a thin film EMI filter, a common mode choke coil, a signal transformer,
The present invention relates to a current sensor, a surface mount component such as a composite component, an electronic component such as a lead component, and a manufacturing method thereof.

【0002】[0002]

【従来の技術】従来,図10に示される電子部品が知ら
れている(特開平3−201417号公報参照)。この
電子部品は,絶縁基板101上に,ポリイミド樹脂から
なる絶縁樹脂層102およびスパッタ法によって形成さ
れたTi,Ti−Ag,Agからなる内部導体パターン
103,104を交互に積層させ,絶縁樹脂層102の
端部を取り除くことによって最上部の導体パターン10
4の端部を,露出させて電子部品100を形成してい
る。
2. Description of the Related Art Conventionally, an electronic component shown in FIG. 10 is known (see Japanese Patent Laid-Open No. 3-201417). In this electronic component, an insulating resin layer 102 made of a polyimide resin and internal conductor patterns 103, 104 made of Ti, Ti-Ag, Ag formed by a sputtering method are alternately laminated on an insulating substrate 101 to form an insulating resin layer. The uppermost conductor pattern 10 is formed by removing the ends of 102.
The electronic component 100 is formed by exposing the end portion of No. 4.

【0003】尚,導体パターン104の端部に接続する
ように端子下地部を電子部品100の側面に形成し,こ
の端子下地を覆うように,電子部品本体の上面端部か
ら,側面を介して下面端部に至る外部電極端子部を形成
して用いられている。
A terminal base portion is formed on a side surface of the electronic component 100 so as to be connected to an end portion of the conductor pattern 104, and the terminal base portion is covered from the upper end portion of the electronic component body through the side surface. The external electrode terminal portion reaching the lower end portion is formed and used.

【0004】[0004]

【発明が解決しようとする課題】しかしながら,上記電
子部品をノイズフィルタとして使用した場合におい
て,,小型化されるにしたがって,所望する減衰特性を
備えた周波数帯域幅が狭くなるという不具合を生じた。
However, when the above electronic component is used as a noise filter, the frequency band width with a desired attenuation characteristic becomes narrower as the size is reduced.

【0005】この欠点を補うためには,別の回路素子を
設ければ良いのであるが,回路段数が増大し,構成が複
雑となり,構成が簡素で製造が容易であるという小型で
ある利点を損なうという欠点を生じた。
In order to make up for this drawback, it is sufficient to provide another circuit element. However, the number of circuit stages increases, the configuration becomes complicated, and the advantage that the device is simple and easy to manufacture is small. It has the disadvantage of damaging it.

【0006】そこで,本発明の技術的課題は,例えば,
ノイズフィルタにおいて,別段に回路構成等を設けなく
とも減衰特性を簡単な構成で安価に広帯域化することが
できる電子部品を提供することにある。
Therefore, the technical problem of the present invention is, for example,
An object of the present invention is to provide an electronic component capable of inexpensively broadening a band in a noise filter with a simple configuration even if a circuit configuration or the like is not separately provided.

【0007】[0007]

【課題を解決するための手段】本発明によれば,絶縁基
板と,前記絶縁基板上に,導体パターンと絶縁層とを交
互に積層して形成した積層体と,前記導体パターンに電
気接続されるとともに前記絶縁基板と前記積層体とに渡
って前記導体パターンに電気接続されるように形成され
た外部電極端子部とを備えた電子部品において,前記導
体パターンは,少なくともその一部に磁性膜を備えてい
ることを特徴とする電子部品が得られる。
According to the present invention, an insulating substrate, a laminate formed by alternately laminating a conductor pattern and an insulating layer on the insulating substrate, and an electrical connection to the conductor pattern are provided. In the electronic component including the insulating substrate and the external electrode terminal portion formed so as to be electrically connected to the conductor pattern across the laminated body, the conductor pattern has a magnetic film on at least a part thereof. An electronic component characterized by comprising:

【0008】また,本発明によれば,前記電子部品にお
いて,前記磁性膜は,強磁性を備えた金属又は合金から
なることを特徴とする電子部品が得られる。
Further, according to the present invention, in the electronic component, the magnetic film is made of a metal or an alloy having ferromagnetism.

【0009】また,本発明によれば,前記いずれかの電
子部品において,前記導体パターンは,前記絶縁基板又
は前記絶縁層上に形成された下地層と前記下地層の上部
に形成された導電層とを備えていることを特徴とする電
子部品が得られる。
Further, according to the present invention, in any one of the electronic components, the conductor pattern includes an underlayer formed on the insulating substrate or the insulating layer and a conductive layer formed on the underlayer. An electronic component characterized by comprising:

【0010】また,本発明によれば,前記いずれかの電
子部品において,前記磁性膜は,前記下地層と前記導電
層との間に介在して設けられていることを特徴とする電
子部品が得られる。
According to the present invention, in any one of the electronic parts, the magnetic film is provided between the underlayer and the conductive layer. can get.

【0011】また,本発明によれば,前記いずれかの電
子部品において,前記磁性膜は,前記導電層上に設けら
れていることを特徴とする電子部品が得られる。
Further, according to the present invention, in any one of the above electronic components, the electronic component is obtained in which the magnetic film is provided on the conductive layer.

【0012】また,本発明によれば,前記いずれかの電
子部品において,前記導体層は,Cu,Al,又はそれ
らの合金からなることを特徴とする電子部品が得られ
る。
Further, according to the present invention, in any one of the electronic components, the electronic component is obtained in which the conductor layer is made of Cu, Al, or an alloy thereof.

【0013】また,本発明によれば,前記いずれかの電
子部品において,前記磁性膜は,Niを含む金属または
合金からなることを特徴とする電子部品が得られる。こ
こで,本発明において,Niを含む金属又は合金とし
て,Ni,FeNiなどが例示できるがこれらに限定さ
れるものではない。
Further, according to the present invention, in any one of the electronic components, there is obtained an electronic component characterized in that the magnetic film is made of a metal or alloy containing Ni. Here, in the present invention, examples of the metal or alloy containing Ni include Ni and FeNi, but the present invention is not limited thereto.

【0014】また,本発明によれば,前記いずれかの電
子部品において,前記下地層は,Ti,又はCrからな
ることを特徴とする電子部品が得られる。
Further, according to the present invention, in any one of the electronic components, the electronic component can be obtained in which the underlayer is made of Ti or Cr.

【0015】[0015]

【発明の実施の形態】以下,本発明の実施の形態につい
て図面を参照して説明する。
Embodiments of the present invention will be described below with reference to the drawings.

【0016】図1は本発明の実施の形態による電子部品
を示す斜視図である。図1を参照すると,本発明の実施
の形態による電子部品10は,ノイズフィルタであり,
電子部品本体1と,電子部品本体1の両端面及び側面部
の一部を覆うように形成された3個の外部電極端子部
2,2,及び2を備えている。
FIG. 1 is a perspective view showing an electronic component according to an embodiment of the present invention. Referring to FIG. 1, an electronic component 10 according to an embodiment of the present invention is a noise filter,
The electronic component body 1 is provided with three external electrode terminal portions 2, 2, and 2 formed so as to cover both end faces and a part of the side surface portion of the electronic component body 1.

【0017】図2は,図1の電子部品本体を示す分解組
立斜視図である。また,図3は,図2の電子部品本体の
完成図である。
FIG. 2 is an exploded perspective view showing the electronic component body of FIG. 3 is a completed view of the electronic component body of FIG.

【0018】図2及び図3を参照すると,電子部品本体
1は,快削性を備えたセラミックス材料からなる絶縁性
基板11上に,絶縁層としてベンゾシクロブテン樹脂
(BCB)からなる絶縁樹脂層12aを同じ材料からな
る絶縁樹脂層12a,12b,12c,及び12dと導
体パターン13a,13b,13c,及び13dとを交
互に積層して積層体15形成することによって得られて
いる。絶縁樹脂層12a〜dには,貫通穴若しくは切欠
き14が設けられている。また,導体パターン13cの
代わりに導体パターン13c´を用いても良い。ここ
で,絶縁樹脂として,BCBを用いているが,ポリイミ
ドを使用することができる。さらに,導体パターンは,
下地層としてTi膜又はCr膜を形成し,その上にNi
又はFeNi合金膜からなる磁性膜及び導電膜として電
解Cuめっき膜をこの順又は逆の順に重合わせて形成し
てなる。
Referring to FIGS. 2 and 3, the electronic component body 1 comprises an insulating substrate 11 made of a ceramic material having a free-cutting property and an insulating resin layer made of benzocyclobutene resin (BCB) as an insulating layer. 12a is obtained by alternately laminating insulating resin layers 12a, 12b, 12c and 12d made of the same material and conductor patterns 13a, 13b, 13c and 13d to form a laminate 15. Through holes or notches 14 are provided in the insulating resin layers 12a to 12d. Further, the conductor pattern 13c 'may be used instead of the conductor pattern 13c. Here, BCB is used as the insulating resin, but polyimide can be used. Furthermore, the conductor pattern is
A Ti film or Cr film is formed as an underlayer, and Ni is formed on top of it.
Alternatively, an electrolytic Cu plating film is formed as a magnetic film and a conductive film made of a FeNi alloy film in this order or in the reverse order.

【0019】図4及び図5は図2の導体パターンを形成
する方法の一例を模式的に示す断面図である。まず,図
4(a)に示すように,絶縁基板を有機洗浄後,紫外線
感光性のBCBからなる絶縁樹脂層12aを塗布して,
紫外線感光させ,キュアリングの後,図4(b)に示す
ように,逆スパッタで表面を洗浄し,続いて導体パター
ンの下地層3aとしてTi膜を形成し,さらに,その上
に図4(c)に示すように,磁性膜3bとしてNi膜3
bをスパッタ法によって形成した。ここで,第1の実施
の形態においては,下地層3aとしてTi膜を使用して
いるが,Cr膜でも良い。また,磁性膜3bであるNi
膜は,無電解めっき法または電解めっき法によっても形
成することができる。
4 and 5 are sectional views schematically showing an example of a method for forming the conductor pattern of FIG. First, as shown in FIG. 4A, after the insulating substrate is organically washed, the insulating resin layer 12a made of UV-sensitive BCB is applied,
After UV exposure and curing, as shown in FIG. 4 (b), the surface is cleaned by reverse sputtering, and then a Ti film is formed as the underlying layer 3a of the conductor pattern. As shown in c), the Ni film 3 is used as the magnetic film 3b.
b was formed by the sputtering method. Here, in the first embodiment, the Ti film is used as the underlayer 3a, but a Cr film may be used. In addition, the magnetic film 3b, Ni
The film can also be formed by an electroless plating method or an electrolytic plating method.

【0020】次に図4(d)に示すように,レジスト4
を塗布した後,図4(e)に示すように,フォトトリソ
グラフィを用いて,マスク5を介して,露光し,現像し
て,図5(a)に示すレジストのパターン4´を得た。
Next, as shown in FIG.
Then, as shown in FIG. 4 (e), the resist pattern 4 ′ shown in FIG. 5 (a) was obtained by exposing and developing it through the mask 5 using photolithography. .

【0021】次に,図5(b)に示すように,電解Cu
めっきによって,電解Cuめっき層6を得る。電解Cu
めっきは,表面処理の後に行った。次に,レジストのパ
ターン4´を剥離して,図5(c)に示す形状の中間導
体パターン7を得た。次に,図5(c)に示す中間導体
パターン7中のNi膜及びTi膜に,希硫酸及びフッ化
水素酸によるウエットエッチング(ドライエッチングも
可)を施し,図5(d)に示すように,絶縁樹脂層12
a上に形成された孤立した導電パターン13aを得た。
Next, as shown in FIG. 5B, electrolytic Cu
An electrolytic Cu plating layer 6 is obtained by plating. Electrolytic Cu
Plating was performed after the surface treatment. Next, the resist pattern 4'was peeled off to obtain an intermediate conductor pattern 7 having the shape shown in FIG. 5 (c). Next, the Ni film and the Ti film in the intermediate conductor pattern 7 shown in FIG. 5C are subjected to wet etching with dry sulfuric acid and hydrofluoric acid (dry etching is also possible), as shown in FIG. Insulating resin layer 12
An isolated conductive pattern 13a formed on a was obtained.

【0022】得られた導体パターン13aは,下地層3
aである厚さ約0.05μmのTi膜と,磁性膜3bで
ある厚さ約0.25〜0.3μmのNi膜と,電解Cu
めっき層からなる導電膜6のパターンとからなり,厚さ
約3〜5μm,幅約30μmで,洗浄,フォトリソグラ
フィ,エッチング,洗浄工程等において,製作プロセス
中に不具合は発生しなかった。尚,上記において,絶縁
基板11上に,絶縁樹脂層12aを介して,導体パター
ン13aを形成したが,絶縁基板11上にも,図4
(b)〜(e)及び図5(a)〜(d)の絶縁樹脂層1
2aを絶縁基板11とすることで同様に直接導体パター
ンを形成することができる。
The conductor pattern 13a thus obtained is based on the underlayer 3
a Ti film with a thickness of about 0.05 μm, a magnetic film 3b with a Ni film of about 0.25 to 0.3 μm, and electrolytic Cu.
It has a pattern of the conductive film 6 made of a plating layer, and has a thickness of about 3 to 5 μm and a width of about 30 μm. Although the conductor pattern 13a is formed on the insulating substrate 11 via the insulating resin layer 12a in the above description, the insulating substrate 11 is also formed on the insulating substrate 11 as shown in FIG.
Insulating resin layer 1 of (b) to (e) and FIGS. 5 (a) to (d)
By using 2a as the insulating substrate 11, a conductor pattern can be directly formed in the same manner.

【0023】図6は,図2に示す絶縁樹脂層を形成する
方法を模式的に示す断面図である。図6を参照して,図
5(d)に示す絶縁層12a上に形成された導体パター
ン13aを覆うように,図6(a)に示すように,スピ
ンコーティングによって,紫外線感光型BCB樹脂を塗
布して,絶縁樹脂層8を得た。次に,図6(b)に示す
ように,フォトリソグラフィを用い,マスク9を介して
露光して,図6(c)に示すように,絶縁層8に貫通孔
14を形成した。尚,貫通孔14は,絶縁樹脂層8の上
部に形成される導体と電気的コンタクトを得るためのも
のであり,必ずしも,全ての導体パターン13a上に設
ける必要のないことはいうまでもない。次に,加熱して
ハーフキュアすることで,図6(d)に示す絶縁樹脂層
12bを得た。
FIG. 6 is a sectional view schematically showing a method of forming the insulating resin layer shown in FIG. Referring to FIG. 6, as shown in FIG. 6A, the UV-sensitive BCB resin is spin-coated so as to cover the conductor pattern 13a formed on the insulating layer 12a shown in FIG. 5D. By coating, an insulating resin layer 8 was obtained. Next, as shown in FIG. 6B, photolithography was used to perform exposure through the mask 9 to form through holes 14 in the insulating layer 8 as shown in FIG. 6C. It is needless to say that the through holes 14 are for obtaining electrical contact with the conductors formed on the insulating resin layer 8 and need not necessarily be provided on all the conductor patterns 13a. Next, by heating and half-curing, an insulating resin layer 12b shown in FIG. 6D was obtained.

【0024】また,図2における他の導体パターン13
b,13c,13dも図4及び図5に示した工程と同様
にして得られる。また,絶縁樹脂層12b,12c,1
2dも,図6に示した工程と同様に得られる。
Further, another conductor pattern 13 in FIG.
b, 13c and 13d are also obtained in the same manner as the steps shown in FIGS. Also, the insulating resin layers 12b, 12c, 1
2d is also obtained in the same manner as the step shown in FIG.

【0025】図3に示す電子部品本体10の引出電極部
22を覆うとともに絶縁基板11の側面を横断して下面
に至るまで,エポキシ樹脂にNi粉を混合した導電性ペ
ーストを塗布,乾燥硬化後,電解バレルめっきにより,
Niめっき膜,更に,その上に半田めっき膜を形成し
て,図1に示す電子部品の外部電極端子部2が形成さ
れ,電子部品1が完成される。
After coating the lead-out electrode portion 22 of the electronic component body 10 shown in FIG. 3 and across the side surface of the insulating substrate 11 to the lower surface, a conductive paste in which Ni powder is mixed with epoxy resin is applied, dried and cured. , By electrolytic barrel plating,
By forming a Ni plating film and a solder plating film thereon, the external electrode terminal portion 2 of the electronic component shown in FIG. 1 is formed, and the electronic component 1 is completed.

【0026】図7及び図8は,図2の導体パターンを形
成する方法の他の例を模式的に示す断面図である。ま
ず,図7(a)に示すように,絶縁基板を有機洗浄後,
紫外線感光性のBCBからなる絶縁樹脂層12aを塗布
して,紫外線感光させ,キュアリングの後,図7(b)
に示すように,逆スパッタの表面洗浄,続いて下地層3
aとしてTi膜を形成する。ここで,下地層3aとして
Ti膜を使用しているが,Cr膜でも良い。
7 and 8 are sectional views schematically showing another example of the method for forming the conductor pattern of FIG. First, as shown in FIG. 7A, after the insulating substrate is organically washed,
An insulating resin layer 12a made of UV-sensitive BCB is applied, exposed to UV light, and after curing, as shown in FIG.
As shown in Fig. 3, the surface of the reverse sputter is cleaned, followed by the underlayer 3
A Ti film is formed as a. Here, the Ti film is used as the underlayer 3a, but a Cr film may be used.

【0027】次に図7(c)に示すように,レジスト4
を塗布した後,図7(d)に示すように,フォトリソグ
ラフィを用いて,マスク5を介して,露光し,現像し
て,図8(a)に示すレジストのパターン4´を得た。
Next, as shown in FIG. 7C, the resist 4
Then, as shown in FIG. 7D, the resist pattern 4 ′ shown in FIG. 8A was obtained by exposing and developing it through the mask 5 using photolithography.

【0028】次に,図8(b)に示すように,電解Cu
めっきによって,電解Cuめっき膜からなる導電膜6を
得る。更に,電解Cuめっき膜の導電膜6上にFeNi
合金層からなる磁性層3bを電解FeNi合金めっきに
よって形成する。ここで,本発明の第2の実施の形態に
おいて,磁性層3bとしてFeNi合金層を用いたが,
電解Niめっき膜も使用することができる。
Next, as shown in FIG. 8B, electrolytic Cu
A conductive film 6 made of an electrolytic Cu plating film is obtained by plating. Further, FeNi is formed on the conductive film 6 of the electrolytic Cu plating film.
The magnetic layer 3b made of an alloy layer is formed by electrolytic FeNi alloy plating. Although the FeNi alloy layer is used as the magnetic layer 3b in the second embodiment of the present invention,
An electrolytic Ni plated film can also be used.

【0029】次に,レジストのパターン4´を剥離し
て,図8(c)に示す形状の中間導体パターン7を得
た。次に,図5(c)に示す中間導体パターン7中のT
i膜に,フッ化水素酸によるウエットエッチング(ドラ
イエッチングも可)を施し,図5(d)に示すように,
絶縁樹脂層12a上に形成された孤立した導電パターン
13aを得た。
Next, the resist pattern 4'is peeled off to obtain an intermediate conductor pattern 7 having the shape shown in FIG. 8 (c). Next, T in the intermediate conductor pattern 7 shown in FIG.
The i film was subjected to wet etching with hydrofluoric acid (dry etching is also possible), and as shown in FIG.
An isolated conductive pattern 13a formed on the insulating resin layer 12a was obtained.

【0030】得られた導体パターン13aは,下地層3
aである厚さ約0.05μmのTi膜と,電解Cuめっ
き膜からなる導電膜6のパターンと,この上に形成され
たFeNi合金めっき膜からなる磁性膜3bからなり,
厚さ約3〜5μm,幅約30μmで,洗浄,フォトリソ
グラフィ,エッチング,洗浄工程等において,製作プロ
セス中に不具合は発生しなかった。尚,上記において,
絶縁基板11上に,絶縁樹脂層12aを介して,導体パ
ターン13aを形成したが,絶縁基板11上にも,図8
(b)〜(d)及び図9(a)〜(d)の絶縁樹脂層1
2aを絶縁基板11とすることで同様に直接導体パター
ンを形成することができる。
The conductor pattern 13a thus obtained is based on the underlayer 3
a Ti film having a thickness of about 0.05 μm, a pattern of a conductive film 6 made of an electrolytic Cu plating film, and a magnetic film 3b made of a FeNi alloy plating film formed on the pattern.
With a thickness of about 3 to 5 μm and a width of about 30 μm, no defects occurred during the manufacturing process in the cleaning, photolithography, etching, cleaning steps, etc. In the above,
Although the conductor pattern 13a is formed on the insulating substrate 11 via the insulating resin layer 12a, the conductive pattern 13a is formed on the insulating substrate 11 as shown in FIG.
Insulating resin layer 1 of (b)-(d) and FIGS. 9 (a)-(d)
By using 2a as the insulating substrate 11, a conductor pattern can be directly formed in the same manner.

【0031】図10は,図2に示す絶縁樹脂層を形成す
る方法の他の例を模式的に示す断面図である。図10を
参照して,図9(d)に示す絶縁層12a上に形成され
た導体パターン13aを覆うように,図10(a)に示
すように,スピンコーティングによって,紫外線感光性
BCB樹脂を塗布して,絶縁樹脂層8を得た。次に,図
10(b)に示すように,フォトリソグラフィを用い,
マスク9を介して露光して,図10(c)に示すよう
に,絶縁樹脂層8に貫通孔14を形成した。尚,貫通孔
14は,絶縁樹脂層8の上部に形成される導体と電気的
コンタクトを得るためのものであり,必ずしも,全ての
導体パターン13a上に設ける必要のないことはいうま
でもない。次に,加熱してハーフキュアすることで,図
10(d)に示す絶縁樹脂層12bを得た。
FIG. 10 is a sectional view schematically showing another example of the method of forming the insulating resin layer shown in FIG. Referring to FIG. 10, the UV-sensitive BCB resin is spin-coated as illustrated in FIG. 10A so as to cover the conductor pattern 13a formed on the insulating layer 12a illustrated in FIG. 9D. By coating, an insulating resin layer 8 was obtained. Next, as shown in FIG. 10B, using photolithography,
By exposing through the mask 9, a through hole 14 was formed in the insulating resin layer 8 as shown in FIG. It is needless to say that the through holes 14 are for obtaining electrical contact with the conductors formed on the insulating resin layer 8 and need not necessarily be provided on all the conductor patterns 13a. Next, by heating and half-curing, an insulating resin layer 12b shown in FIG. 10 (d) was obtained.

【0032】また,図2における他の導体パターン13
b,13c,13dも図8及び図9に示した工程と同様
にして得られる。また,絶縁樹脂層12b,12c,1
2dも,図10に示した工程と同様に得られる。
The other conductor pattern 13 in FIG.
b, 13c and 13d are also obtained in the same manner as the steps shown in FIGS. Also, the insulating resin layers 12b, 12c, 1
2d is also obtained in the same manner as the step shown in FIG.

【0033】以上説明したように,本発明の実施の形態
においては,導体パターンの下地層の上層又は導電膜上
に強磁性体からなる磁性膜を形成することで,所望する
周波数帯域において,この導体パターンを流れる電流に
おいて,磁性膜の面方向の磁界によるμ''(損失)特性
が増大するように,適宜材料を選択すれば,広帯域減衰
特性のフィルタ素子を形成する等の機能を呈する。
As described above, according to the embodiment of the present invention, by forming the magnetic film made of a ferromagnetic material on the upper layer or the conductive film of the conductor pattern, in the desired frequency band, If the material is appropriately selected so that the μ ″ (loss) characteristic due to the magnetic field in the surface direction of the magnetic film is increased in the current flowing through the conductor pattern, it has a function of forming a filter element having a broadband attenuation characteristic.

【0034】尚,本発明の実施の形態において,電子部
品として3端子を備えたローパスフィルタを例示した
が,2端子を備えたLCR素子,4端子を備えたコモン
モードチョークコイル,トランス,カレントセンサ等の
電子部品も,絶縁樹脂層及び導体パターンの形状を変え
るだけで同様の工程で製造することができる。
In the embodiment of the present invention, a low-pass filter having three terminals is illustrated as an electronic component, but an LCR element having two terminals, a common mode choke coil having four terminals, a transformer, a current sensor. The electronic parts such as can be manufactured in the same process only by changing the shapes of the insulating resin layer and the conductor pattern.

【0035】また,本発明の実施の形態において,電子
部品としてチップ型のものを示したが,外部電極端子部
にリード線を半田付等によって,設ければ,リード部品
を構成できることは,言うまでもない。
Further, in the embodiment of the present invention, the chip type is shown as the electronic component, but it goes without saying that the lead component can be constructed by providing a lead wire to the external electrode terminal portion by soldering or the like. Yes.

【0036】[0036]

【発明の効果】以上,説明したように,本発明において
は,例えば,ノイズフィルタにおいて,別段に回路構成
等を設けなくとも減衰特性を簡単な構成で安価に広帯域
化することができる電子部品を提供することができる。
As described above, according to the present invention, for example, in a noise filter, there is provided an electronic component which has a simple attenuation characteristic and can be used for a wide band at low cost without separately providing a circuit configuration or the like. Can be provided.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の実施の形態による電子部品を示す斜視
図である。
FIG. 1 is a perspective view showing an electronic component according to an embodiment of the present invention.

【図2】図1の電子部品本体を示す分解組立斜視図であ
る。
FIG. 2 is an exploded perspective view showing the electronic component body shown in FIG.

【図3】図2の電子部品本体の完成した状態を示す斜視
図である。
FIG. 3 is a perspective view showing a completed state of the electronic component body of FIG.

【図4】(a),(b),(c),(d)及び(e)は
図2の導体パターンを形成する工程を順に示す断面図で
ある。
4 (a), (b), (c), (d) and (e) are cross-sectional views sequentially showing steps of forming the conductor pattern of FIG.

【図5】(a),(b),(c),及び(d)は図2の
導体パターンを形成する方法の一例を模式的に示す断面
図である。
5 (a), (b), (c), and (d) are cross-sectional views schematically showing an example of a method for forming the conductor pattern of FIG.

【図6】(a),(b),(c),及び(d)は図2の
絶縁樹脂層を形成する方法の一例を模式的に示す断面図
である。
6 (a), (b), (c), and (d) are cross-sectional views schematically showing an example of a method of forming the insulating resin layer of FIG.

【図7】(a),(b),(c),及び(d)は図2の
導体パターンを形成する方法の他の例を模式的に示す断
面図である。
7 (a), (b), (c), and (d) are cross-sectional views schematically showing another example of the method of forming the conductor pattern of FIG.

【図8】(a),(b),(c),及び(d)は図2の
導体パターンを形成する方法の他の例を模式的に示す断
面図である。
8 (a), (b), (c), and (d) are cross-sectional views schematically showing another example of the method of forming the conductor pattern of FIG.

【図9】(a),(b),(c),及び(d)は図2の
絶縁樹脂層を形成する方法の他の例を模式的に示す断面
図である。
9 (a), (b), (c), and (d) are cross-sectional views schematically showing another example of the method of forming the insulating resin layer of FIG.

【図10】従来の電子部品の一例を示す断面図である。FIG. 10 is a sectional view showing an example of a conventional electronic component.

【符号の説明】[Explanation of symbols]

1 電子部品 2 外部電極端子部 3a 下地層 3b 磁性膜 4 レジスト 4´ パターン 5 マスク 6 導電膜 7 中間導体パターン 8 絶縁樹脂層 9 マスク 10 電子部品本体 11 絶縁基板 12a,12b,12c,12d 絶縁樹脂層 13a,13b,13c,13c´,及び13d 導
体パターン 14 貫通穴又は切欠き 15 積層体 22 引出電極部 100 電子部品 101 絶縁基板 102 絶縁樹脂層 103,104 内部導体パターン
DESCRIPTION OF SYMBOLS 1 Electronic component 2 External electrode terminal part 3a Underlayer 3b Magnetic film 4 Resist 4'Pattern 5 Mask 6 Conductive film 7 Intermediate conductor pattern 8 Insulating resin layer 9 Mask 10 Electronic component main body 11 Insulating substrate 12a, 12b, 12c, 12d Insulating resin Layers 13a, 13b, 13c, 13c ', and 13d Conductor pattern 14 Through hole or notch 15 Laminated body 22 Extraction electrode part 100 Electronic component 101 Insulating substrate 102 Insulating resin layer 103, 104 Internal conductor pattern

Claims (8)

【特許請求の範囲】[Claims] 【請求項1】 絶縁基板と,前記絶縁基板上に,導体パ
ターンと絶縁層とを交互に積層して形成した積層体と,
前記導体パターンに電気接続されるとともに前記絶縁基
板と前記積層体とに渡って前記導体パターンに電気接続
されるように形成された外部電極端子部とを備えた電子
部品において,前記導体パターンは,少なくともその一
部に磁性膜を備えていることを特徴とする電子部品。
1. An insulating substrate, and a laminated body formed by alternately laminating conductive patterns and insulating layers on the insulating substrate,
In an electronic component that is electrically connected to the conductor pattern and includes an external electrode terminal portion that is formed so as to be electrically connected to the conductor pattern across the insulating substrate and the laminated body, the conductor pattern is An electronic component having a magnetic film on at least a part thereof.
【請求項2】 請求項1記載の電子部品において,前記
磁性膜は,強磁性を備えた金属又は合金からなることを
特徴とする電子部品。
2. The electronic component according to claim 1, wherein the magnetic film is made of a metal or an alloy having ferromagnetism.
【請求項3】 請求項1又は2記載の電子部品におい
て,前記導体パターンは,前記絶縁基板又は前記絶縁層
上に形成された下地層と前記下地層の上部に形成された
導電層とを備えていることを特徴とする電子部品。
3. The electronic component according to claim 1, wherein the conductor pattern includes a base layer formed on the insulating substrate or the insulating layer and a conductive layer formed on the base layer. An electronic component characterized by being.
【請求項4】 請求項1乃至3の内のいずれかに記載の
電子部品において,前記磁性膜は,前記下地層と前記導
電層との間に介在して設けられていることを特徴とする
電子部品。
4. The electronic component according to claim 1, wherein the magnetic film is provided between the base layer and the conductive layer. Electronic components.
【請求項5】 請求項1乃至3の内のいずれかに記載の
電子部品において,前記磁性膜は,前記導電層上に設け
られていることを特徴とする電子部品。
5. The electronic component according to claim 1, wherein the magnetic film is provided on the conductive layer.
【請求項6】 請求項1乃至5の内のいずれかに記載の
電子部品において,前記導体層は,Cu,Al,又はそ
れらの合金からなることを特徴とする電子部品。
6. The electronic component according to claim 1, wherein the conductor layer is made of Cu, Al, or an alloy thereof.
【請求項7】 請求項1乃至6の内のいずれかに記載の
電子部品において,前記磁性膜は,Niを含む金属また
は合金からなることを特徴とする電子部品。
7. The electronic component according to claim 1, wherein the magnetic film is made of a metal or alloy containing Ni.
【請求項8】 請求項1乃至7の内のいずれかに記載の
電子部品において,前記下地層は,Ti,又はCrから
なることを特徴とする電子部品。
8. The electronic component according to claim 1, wherein the underlayer is made of Ti or Cr.
JP10369996A 1996-03-29 1996-03-29 Electronic part Pending JPH09270330A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10369996A JPH09270330A (en) 1996-03-29 1996-03-29 Electronic part

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10369996A JPH09270330A (en) 1996-03-29 1996-03-29 Electronic part

Publications (1)

Publication Number Publication Date
JPH09270330A true JPH09270330A (en) 1997-10-14

Family

ID=14361019

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10369996A Pending JPH09270330A (en) 1996-03-29 1996-03-29 Electronic part

Country Status (1)

Country Link
JP (1) JPH09270330A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11186040A (en) * 1997-12-22 1999-07-09 Tdk Corp Laminated noise filter
JP2009117546A (en) * 2007-11-05 2009-05-28 Asahi Kasei Electronics Co Ltd Planar coil, and manufacturing method thereof
JP2014032978A (en) * 2012-07-31 2014-02-20 Ibiden Co Ltd Inductor component, manufacturing method of inductor component, and wiring board
JPWO2014125895A1 (en) * 2013-02-13 2017-02-02 株式会社村田製作所 Electronic components
JP2017199774A (en) * 2016-04-27 2017-11-02 株式会社村田製作所 Multilayer board
JP2020113674A (en) * 2019-01-15 2020-07-27 凸版印刷株式会社 Electronic substrate for high frequency module

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11186040A (en) * 1997-12-22 1999-07-09 Tdk Corp Laminated noise filter
JP2009117546A (en) * 2007-11-05 2009-05-28 Asahi Kasei Electronics Co Ltd Planar coil, and manufacturing method thereof
JP2014032978A (en) * 2012-07-31 2014-02-20 Ibiden Co Ltd Inductor component, manufacturing method of inductor component, and wiring board
JPWO2014125895A1 (en) * 2013-02-13 2017-02-02 株式会社村田製作所 Electronic components
JP2017199774A (en) * 2016-04-27 2017-11-02 株式会社村田製作所 Multilayer board
JP2020113674A (en) * 2019-01-15 2020-07-27 凸版印刷株式会社 Electronic substrate for high frequency module

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