JPH09270342A - Electronic part and method of producing the same - Google Patents

Electronic part and method of producing the same

Info

Publication number
JPH09270342A
JPH09270342A JP7672896A JP7672896A JPH09270342A JP H09270342 A JPH09270342 A JP H09270342A JP 7672896 A JP7672896 A JP 7672896A JP 7672896 A JP7672896 A JP 7672896A JP H09270342 A JPH09270342 A JP H09270342A
Authority
JP
Japan
Prior art keywords
electronic component
electrode
electroless
film
base electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7672896A
Other languages
Japanese (ja)
Inventor
Kenji Sato
健治 佐藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokin Corp
Original Assignee
Tokin Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokin Corp filed Critical Tokin Corp
Priority to JP7672896A priority Critical patent/JPH09270342A/en
Publication of JPH09270342A publication Critical patent/JPH09270342A/en
Pending legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To provide an electronic part and a method of producing the same, in which the production process can be simplified and which can be produced without polluting the environment. SOLUTION: Insulating layers and conductive patterns are formed on a substrate 1, thereby forming an electronic part body 10. An external electrode 8 is so formed as to cover at least a part of a side face. The external electrode 8 has an underlying electrode 5 electrically connected to a conductive layer and a surface electrode covering the underlying electrode 5. This surface electrode is formed in such a manner that an electroless plating Ni film 6 is formed on the underlying electrode 5 formed by applying a conductive resin, and an electroless Pd plating film 7 is formed on the electroless plating Ni film 6.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は,電子部品及びその
製造方法に関し,詳しくは,インダクタンス(L),キ
ャパシタンス(C),電気抵抗(R)素子,薄膜EMI
フィルタ,コモンモードチョークコイル,信号用トラン
ス,カレントセンサ,複合部品等の表面実装部品やリー
ド部品として用いられる電子部品とその製造方法に関す
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electronic component and a method of manufacturing the same, and more specifically, an inductance (L), a capacitance (C), an electric resistance (R) element, a thin film EMI.
The present invention relates to an electronic component used as a surface mount component or a lead component such as a filter, a common mode choke coil, a signal transformer, a current sensor, a composite component, and a manufacturing method thereof.

【0002】[0002]

【従来の技術】従来のチップ型電子部品は,絶縁性を備
えた基板上に,導体パターン,絶縁層,電極部を互いに
重畳し,焼付銀あるいは,スパッタリングによって端子
用の下地電極とし,これに半田めっきして外部電極とす
ることによって形成されている。
2. Description of the Related Art In a conventional chip type electronic component, a conductor pattern, an insulating layer, and an electrode portion are superposed on a substrate having an insulating property and used as a base electrode for a terminal by baking silver or sputtering. It is formed by solder plating to form external electrodes.

【0003】一方,図9に示すように,絶縁性を備えた
基板1上に,導体層2及びポリイミドからなる絶縁層3
を交互に重畳し,上面一端部に電極部4を設け,この電
極部4に接続されるように,端面部に導電性樹脂をディ
ップ塗布し,乾燥して下地電極5を形成し,この下地電
極5に,電気めっき法によってNi膜,半田膜を形成
し,外部電極6を形成したものである(特願平7−16
6929号公報,参照)。
On the other hand, as shown in FIG. 9, a conductor layer 2 and an insulating layer 3 made of polyimide are provided on an insulating substrate 1.
Are alternately superposed, an electrode portion 4 is provided on one end of the upper surface, a conductive resin is dip-coated on the end surface portion so as to be connected to the electrode portion 4, and the base electrode 5 is formed by drying. The Ni film and the solder film are formed on the electrode 5 by an electroplating method, and the external electrode 6 is formed (Japanese Patent Application No. 7-16).
6929 publication).

【0004】[0004]

【発明が解決しようとする課題】しかしながら,従来技
術の外部電極を形成する方法では,電子部品の下地電極
上に金属めっき膜を施す際,メディアを混合して行うバ
レル電気めっき法を採用しているために,装置の大型化
やメディアの分離工程を有するために,製造コスト上問
題があった。
However, the prior art method of forming the external electrode employs the barrel electroplating method in which the media are mixed when the metal plating film is applied on the base electrode of the electronic component. Therefore, there is a problem in terms of manufacturing cost due to the large size of the device and the separation process of media.

【0005】さらに,外部電極を形成するために半田め
っき浴に使用される鉛成分が,めっき廃液に含まれた
り,廃棄物として出されるために,環境汚染の問題を生
じる。
Further, the lead component used in the solder plating bath for forming the external electrode is contained in the plating waste liquid or discharged as a waste, which causes a problem of environmental pollution.

【0006】そこで,本発明の技術的課題は,製造工程
が簡略化できるとともに,製造に際して環境汚染の問題
のない電子部品及びその製造方法とを提供することにあ
る。
Therefore, a technical object of the present invention is to provide an electronic component which can simplify the manufacturing process and has no problem of environmental pollution during the manufacturing, and a manufacturing method thereof.

【0007】[0007]

【課題を解決するための手段】本発明によれば,基板上
に,絶縁層と導体パターンとを積層して電子部品本体を
形成し,前記電子部品本体の少なくとも側面の一部を覆
うように外部電極を形成した電子部品において,前記外
部電極は,前記導体パターンに電気接続された下地電極
と,前記下地電極を覆う表面電極とを備え,前記表面電
極は,無電解Niめっき膜と,前記無電解Niめっき膜
上に形成された貴金属膜とを備えていることを特徴とす
る電子部品が得られる。
According to the present invention, an electronic component body is formed by laminating an insulating layer and a conductor pattern on a substrate, and at least a part of a side surface of the electronic component body is covered. In an electronic component having an external electrode formed thereon, the external electrode includes a base electrode electrically connected to the conductor pattern, and a surface electrode covering the base electrode, and the surface electrode includes an electroless Ni plating film and the surface electrode. An electronic component having a noble metal film formed on an electroless Ni plating film is obtained.

【0008】また,本発明によれば,前記電子部品にお
いて,前記下地電極は,導電性の金属粉を樹脂に混入さ
せて,塗布し,硬化させたものからなることを特徴とす
る電子部品が得られる。
Further, according to the present invention, in the electronic component, the base electrode is formed by mixing a conductive metal powder in a resin, coating the resin, and curing the powder. can get.

【0009】ここで,本発明の電子部品において,前記
貴金属膜は,金,銀,及び白金族(Ru,Rh,Pd,
Os,Ir,Pt)の内の単体又は合金からなる金属膜
の単層又は複層の内のいずれも選択できるが,無電解め
っき法によって形成された無電解Pdめっき膜からなる
ことが好ましい。
Here, in the electronic component of the present invention, the noble metal film is formed of gold, silver, or platinum group (Ru, Rh, Pd,
Any of a single layer or a multi-layer of a metal film made of a simple substance or an alloy of Os, Ir, Pt) can be selected, but an electroless Pd plated film formed by an electroless plating method is preferable.

【0010】また,本発明によれば,基板上に,絶縁層
と導体層とを積層して電子部品本体を形成し,前記電子
部品本体の少なくとも側面の一部を覆うように外部電極
を形成する電子部品の製造方法において,前記導体層に
電気接続するように下地電極を形成し,前記下地電極上
に無電解Niめっき膜を形成し,さらに,前記無電解N
iめっき膜上に貴金属膜を形成することによって前記外
部電極を形成することを特徴とする電子部品の製造方法
が得られる。
Further, according to the present invention, an electronic component body is formed by laminating an insulating layer and a conductor layer on a substrate, and an external electrode is formed so as to cover at least a part of a side surface of the electronic component body. In the method of manufacturing an electronic component, a base electrode is formed so as to be electrically connected to the conductor layer, an electroless Ni plating film is formed on the base electrode, and the electroless N
A method of manufacturing an electronic component is obtained in which the external electrode is formed by forming a noble metal film on the i-plated film.

【0011】また,本発明によれば,前記電子部品の製
造方法において,前記下地電極は,導電性の金属粉を樹
脂に混入させて塗布することによって形成されているこ
とを特徴とする電子部品の製造方法が得られる。
Further, according to the present invention, in the method of manufacturing an electronic component, the base electrode is formed by mixing conductive metal powder in resin and applying the powder. Can be obtained.

【0012】ここで,本発明の電子部品の製造方法にお
いて,前記貴金属膜は,金,銀,及び白金族(Ru,R
h,Pd,Os,Ir,Pt)の内の単体もしくは合金
からなる金属膜の単層又は複層の内のいずれも選択でき
るが,無電解めっき法によって形成された無電解Pdめ
っき膜からなることが好ましい。
Here, in the method of manufacturing an electronic component of the present invention, the noble metal film is formed of gold, silver, or platinum group (Ru, R).
h, Pd, Os, Ir, Pt) can be selected from a single layer or a multi-layer of a metal film consisting of a simple substance or an alloy, but is composed of an electroless Pd plating film formed by an electroless plating method. It is preferable.

【0013】[0013]

【発明の実施の形態】以下,本発明の実施の形態につい
て,図面を参照して説明する。
Embodiments of the present invention will be described below with reference to the drawings.

【0014】図1は本発明の実施の形態による電子部品
を示す部分概略断面図である。図1を参照すると,電子
部品10は,基板1上に形成された絶縁樹脂からなる絶
縁層2と導体からなる導体パターン3とを交互に積層し
て,積層体を形成し,積層体の上側端部に電極部4とそ
れの一部を含めて下面端部を覆うように,下地電極5と
を形成し,さらに,電極部4と下地電極5とを覆うよう
に,無電解Niめっき膜6を形成し,さらにそれを覆う
ように無電解パラジウムめっき膜を形成してなる。
FIG. 1 is a partial schematic sectional view showing an electronic component according to an embodiment of the present invention. Referring to FIG. 1, an electronic component 10 includes an insulating layer 2 made of an insulating resin and a conductor pattern 3 made of a conductor, which are formed on a substrate 1, and are alternately laminated to form a laminated body. The base electrode 5 is formed so as to cover the lower surface end including the electrode portion 4 and a part thereof at the end portion, and further, the electroless Ni plating film is formed so as to cover the electrode portion 4 and the base electrode 5. 6 is formed, and an electroless palladium plating film is further formed so as to cover it.

【0015】図1においては,導体パターンが2層,絶
縁層が3層しか示されてはいないが,実際には,導体パ
ターン,絶縁層合わせて8層程度で構成されている。
Although only two conductor patterns and three insulating layers are shown in FIG. 1, the conductor pattern and the insulating layers are actually about eight layers in total.

【0016】図2は本発明の実施の形態による電子部品
本体の構成を示す分解組立斜視図である。図2を参照す
ると,快削性を有する絶縁性のセラミックス材料からな
る基板1上をアセトンメタノール混合液で洗浄後,ベン
ゾシクロブテン(BCB)からなる絶縁樹脂を塗布し,
完全に硬化させて,絶縁層2aを形成する。尚,本発明
の実施の形態において,絶縁樹脂としては,上記BCB
の他に,ポリイミド樹脂等も使用することができる。
FIG. 2 is an exploded perspective view showing the structure of the electronic component body according to the embodiment of the present invention. Referring to FIG. 2, a substrate 1 made of an insulating ceramic material having a free-cutting property is washed with a mixed solution of acetone and methanol, and then an insulating resin made of benzocyclobutene (BCB) is applied,
It is completely cured to form the insulating layer 2a. In the embodiment of the present invention, the insulating resin is BCB.
Besides, a polyimide resin or the like can also be used.

【0017】次に,この絶縁層2aの表面を逆スパッタ
法によって洗浄し,続いてスパッタ法によって,チタン
0.05〜0.15μm程度,Cu0.25〜0.3μ
m程度の薄膜を形成し,スパイラル状のパターンを形成
するように,レジストを塗布し,フォトリソグラフィ法
によって凹部パターンを形成する。次に,この凹部パタ
ーンを埋めるように,電解Cuめっきを施し,レジスト
を剥離する。次に,ウエットエッチング(ドライエッチ
ングでも可)によって,孤立パターンからなる導体パタ
ーン3aとする。導体パターン3aの端部において,電
極部が形成されている。次に,導体パターン3a上にB
CBを塗布し,フォトリソグラフィー法によって,所望
する切り欠き13又は貫通孔部14を形成し,適切な条
件にて硬化を行い,導体パターン3aと同様に,導体パ
ターン3b,絶縁層2bと同様に,絶縁層2c,導体パ
ターン3c,絶縁層2d,導体パターン3dを夫々形成
して積層し,図3に示す電子部品本体11となる。
Next, the surface of the insulating layer 2a is cleaned by the reverse sputtering method, and subsequently by the sputtering method, titanium is about 0.05 to 0.15 μm and Cu is 0.25 to 0.3 μm.
A thin film of about m is formed, a resist is applied so as to form a spiral pattern, and a recess pattern is formed by photolithography. Next, electrolytic Cu plating is performed so as to fill this concave pattern, and the resist is peeled off. Next, by wet etching (or dry etching is also possible), the conductor pattern 3a is formed as an isolated pattern. An electrode portion is formed at the end of the conductor pattern 3a. Next, B on the conductor pattern 3a
CB is applied, a desired notch 13 or through hole portion 14 is formed by photolithography, and curing is performed under appropriate conditions, and similarly to the conductor pattern 3a, the conductor pattern 3b and the insulating layer 2b are formed. , The insulating layer 2c, the conductor pattern 3c, the insulating layer 2d, and the conductor pattern 3d are respectively formed and laminated to form the electronic component body 11 shown in FIG.

【0018】次に,図3〜図8を参照して,電子部品本
体11に,外部電極8,8を形成する方法について説明
する。上記説明したように,形成された図3に示す電子
部品本体11を,図4に示すように,キャリア18の挿
入孔12に長手方向に挿入する。電子部品本体11は,
図5(a)に示すように,キャリア18の挿入孔12に
挿入される。また,図5(b)に示すように,電子部品
本体11は面出しピン21によって,下方に押し出さ
れ,下端部がキャリアから突出した状態となる。次に,
この状態で,図6に示すように,キャリア18が下降し
て,電子部品本体11の端面部が,定盤22上で定厚に
のばした導電性樹脂20に,押圧され,その端面部に導
電性樹脂をディップ塗布した後,キャリア18が上昇す
る。このように,端面部に導電性樹脂20をディップ塗
布した電子部品本体を120〜200℃の雰囲気中で1
0〜30分間仮乾燥を行うことで,一方の端子用の下地
電極5を形成する。
Next, a method for forming the external electrodes 8 on the electronic component body 11 will be described with reference to FIGS. As described above, the formed electronic component body 11 shown in FIG. 3 is inserted into the insertion hole 12 of the carrier 18 in the longitudinal direction as shown in FIG. The electronic component body 11 is
As shown in FIG. 5A, the carrier 18 is inserted into the insertion hole 12. Further, as shown in FIG. 5 (b), the electronic component body 11 is pushed downward by the face-up pins 21 so that the lower end portion thereof projects from the carrier. next,
In this state, as shown in FIG. 6, the carrier 18 descends, and the end face portion of the electronic component body 11 is pressed by the conductive resin 20 stretched to a constant thickness on the surface plate 22, and the end face portion thereof is pressed. After the conductive resin is applied by dip coating, the carrier 18 rises. In this way, the electronic component main body whose end face is coated with the conductive resin 20 is exposed to the atmosphere of 120 to 200 ° C.
By performing temporary drying for 0 to 30 minutes, the base electrode 5 for one terminal is formed.

【0019】また,他方の端面も同様に面出しピン21
によって,電子部品の他方の端面部を面出しを行い,定
盤22上で定厚にのばした導電性樹脂20を端面部にデ
ィップ塗布し,雰囲気中で仮乾燥して他方の端子下地電
極も形成する。
The other end face is also similarly provided with the surfacing pin 21.
The other end face of the electronic component is chamfered by the surface of the electronic component, and the conductive resin 20 spread to a constant thickness on the surface plate 22 is dip-coated on the end face and temporarily dried in the atmosphere to dry the other terminal base electrode. Also forms.

【0020】また,側面部の外部電極については,図7
(a)に示すように,マイラーテープ24を張り付けた
治具23上のこのマイラーテープ24に,スクリーン版
25を介して導電ペースト26を,配置する電極の間隔
に応じた間隔にて,印刷した後,この上に取り付け治具
27に固定された電子部品本体11を取り付け治具27
とともに,矢印29に示すように下降させて,電子部品
本体11の側面を印刷された導電ペースト28を押圧し
て,電子部品本体11の側面に導電ペーストを転写し
て,下地電極を形成する。尚,電子部品本体11の側面
に,導電ペーストを印刷又は塗布する方法は,その他
に,取り付け治具27に側面が上向きとなるように固定
された電子部品本体11に直接スクリーン印刷しても良
く,又,タンポ印刷のような転写法を用いても良い。
The external electrodes on the side surface are shown in FIG.
As shown in (a), a conductive paste 26 is printed on the mylar tape 24 on the jig 23 to which the mylar tape 24 is attached, via a screen plate 25 at an interval corresponding to the interval of the electrodes to be arranged. Then, the electronic component body 11 fixed to the mounting jig 27 is mounted on the mounting jig 27.
At the same time, it is lowered as shown by an arrow 29 to press the printed conductive paste 28 on the side surface of the electronic component body 11 to transfer the conductive paste to the side surface of the electronic component body 11 to form a base electrode. In addition, as a method of printing or applying the conductive paste on the side surface of the electronic component body 11, the screen may be directly printed on the electronic component body 11 fixed to the mounting jig 27 so that the side surface faces upward. Alternatively, a transfer method such as tampo printing may be used.

【0021】次に,200〜250℃の雰囲気中にて,
20〜30分間硬化するための熱処理を行うことで,電
子部品の両端及び一側に端子用の下地電極5を形成す
る。
Next, in an atmosphere of 200 to 250 ° C.,
By performing heat treatment for curing for 20 to 30 minutes, the base electrode 5 for terminals is formed on both ends and one side of the electronic component.

【0022】次に,端子用の下地電極5を覆うように,
無電解Niめっき膜,無電解Pdめっき膜を次の工程に
て形成する。まず,脱脂し,純水で洗浄し,活性化処理
を行う。触媒付与を行い,純粋洗浄の後,無電解Ni−
Bめっきを厚さ0.2μm程度行う。続いて,純粋洗浄
の後,無電解Ni−Pめっきを厚さ2.0〜5.0μm
程度行う。無電解Ni−Pめっき後,純水で洗浄の後,
無電解Pdめっきを厚さ2.0〜5.0μm程度形成し
た。Pdめっきの後,純水洗浄し,乾燥して,図8に示
す電子部品を形成した。得られた電子部品の外部電極の
はがれはなく,従来技術と同等の信頼性を備えていた。
Next, to cover the base electrode 5 for the terminal,
An electroless Ni plating film and an electroless Pd plating film are formed in the next step. First, degreasing, washing with pure water, and activation treatment are performed. After applying catalyst and pure washing, electroless Ni-
B plating is performed to a thickness of about 0.2 μm. Then, after pure cleaning, electroless Ni-P plating is applied to a thickness of 2.0 to 5.0 μm.
Do about. After electroless Ni-P plating and washing with pure water,
The electroless Pd plating was formed to a thickness of about 2.0 to 5.0 μm. After Pd plating, it was washed with pure water and dried to form the electronic component shown in FIG. The external electrodes of the obtained electronic parts did not come off, and had the same level of reliability as the conventional technology.

【0023】尚,本発明の実施に形態において,電子部
品側面に外部電極端子部を形成したチップ型の電子部品
を示したが,この外部電極端子部にリード線を半田付等
によりもうければ,リード部品が得られることはいうま
でもない。
In the embodiment of the present invention, the chip type electronic component in which the external electrode terminal portion is formed on the side surface of the electronic component is shown. However, if a lead wire is attached to the external electrode terminal portion by soldering or the like. Needless to say, lead parts can be obtained.

【0024】[0024]

【発明の効果】以上,説明したように,本発明によれ
ば,外部電極部分に半田を使用しないので,Pb等の廃
液処理の必要がなく,環境汚染を生じないとともに,バ
レルめっき工程中におけるメディアとの分離工程がない
ので,低コスト化が図れる電子部品とその製造方法とを
提供することができる。
As described above, according to the present invention, since solder is not used for the external electrode portions, there is no need to treat waste liquid such as Pb, environmental pollution does not occur, and during the barrel plating process. Since there is no step of separating from the medium, it is possible to provide an electronic component and a manufacturing method thereof that can reduce the cost.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の実施の形態による電子部品を示す部分
概略断面図である。
FIG. 1 is a partial schematic cross-sectional view showing an electronic component according to an embodiment of the present invention.

【図2】本発明の実施の形態による電子部品本体の構成
を示す分解組立斜視図である。
FIG. 2 is an exploded perspective view showing the configuration of the electronic component body according to the embodiment of the present invention.

【図3】本発明の実施の形態による電子部品本体を示す
斜視図である。
FIG. 3 is a perspective view showing an electronic component body according to an embodiment of the present invention.

【図4】図3の電子部品本体への外部電極形成方法の説
明に供せられる図である。
FIG. 4 is a diagram provided for explaining a method of forming external electrodes on the electronic component body of FIG.

【図5】図3の電子部品本体への外部電極形成方法の説
明に供せられる図である。
5A and 5B are views provided for explaining a method of forming external electrodes on the electronic component body of FIG.

【図6】図3の電子部品本体への外部電極形成方法の説
明に供せられる図である。
FIG. 6 is a diagram which is used for explaining a method of forming external electrodes on the electronic component body of FIG.

【図7】図3の電子部品本体への外部電極形成方法の説
明に供せられる図である。
FIG. 7 is a diagram which is used for explaining a method of forming external electrodes on the electronic component body of FIG.

【図8】図3の電子部品の説明に供せられる斜視図であ
る。
FIG. 8 is a perspective view provided for explaining the electronic component of FIG.

【図9】従来の電子部品本体の一例を示す部分断面図で
ある。
FIG. 9 is a partial cross-sectional view showing an example of a conventional electronic component body.

【符号の説明】[Explanation of symbols]

1 基板 2,2a,2b,2c,2d 絶縁層 3,3a,3b,3c,3d 導体パターン 4 電極部 5 下地電極 6 無電解Niめっき膜 7 無電解Pdめっき膜 8 外部電極 10 電子部品 11 電子部品本体 12 挿入孔 18 キャリア 20 導電性樹脂 21 面出しピン 22 定盤 DESCRIPTION OF SYMBOLS 1 Substrate 2, 2a, 2b, 2c, 2d Insulating layer 3, 3a, 3b, 3c, 3d Conductor pattern 4 Electrode part 5 Base electrode 6 Electroless Ni plating film 7 Electroless Pd plating film 8 External electrode 10 Electronic component 11 Electronic Parts body 12 Insertion hole 18 Carrier 20 Conductive resin 21 Chamfering pin 22 Surface plate

Claims (6)

【特許請求の範囲】[Claims] 【請求項1】 基板上に,絶縁層と導体パターンとを積
層して電子部品本体を形成し,前記電子部品本体の少な
くとも側面の一部を覆うように外部電極を形成した電子
部品において,前記外部電極は,前記導体パターンに電
気接続された下地電極と,前記下地電極を覆う表面電極
とを備え,前記表面電極は,無電解Niめっき膜と,前
記無電解Niめっき膜上に形成された貴金属膜とを備え
ていることを特徴とする電子部品。
1. An electronic component in which an insulating layer and a conductor pattern are laminated on a substrate to form an electronic component body, and an external electrode is formed so as to cover at least a part of a side surface of the electronic component body. The external electrode includes a base electrode electrically connected to the conductor pattern and a surface electrode covering the base electrode, and the surface electrode is formed on the electroless Ni plating film and the electroless Ni plating film. An electronic component having a precious metal film.
【請求項2】 請求項1記載の電子部品において,前記
下地電極は,導電性の金属粉を樹脂に混入させて,塗布
したものからなることを特徴とする電子部品。
2. The electronic component according to claim 1, wherein the base electrode is formed by mixing a conductive metal powder in a resin and coating the resin.
【請求項3】 請求項1又は2記載の電子部品におい
て,前記貴金属膜は,無電解Pdめっき膜からなること
を特徴とする電子部品。
3. The electronic component according to claim 1 or 2, wherein the noble metal film is an electroless Pd plating film.
【請求項4】 基板上に,絶縁層と導体パターンとを積
層して電子部品本体を形成し,前記電子部品本体の少な
くとも側面の一部を覆うように外部電極を形成する電子
部品の製造方法において,前記導体層に電気接続するよ
うに下地電極を形成し,前記下地電極上に無電解Niめ
っき膜を形成し,さらに,前記無電解Niめっき膜上に
貴金属膜を形成することによって前記外部電極を形成す
ることを特徴とする電子部品の製造方法。
4. A method of manufacturing an electronic component, wherein an insulating layer and a conductor pattern are laminated on a substrate to form an electronic component body, and an external electrode is formed so as to cover at least a part of a side surface of the electronic component body. In the above, by forming a base electrode so as to be electrically connected to the conductor layer, forming an electroless Ni plating film on the base electrode, and further forming a noble metal film on the electroless Ni plating film. A method for manufacturing an electronic component, which comprises forming an electrode.
【請求項5】 請求項4記載の電子部品の製造方法にお
いて,前記下地電極は,導電性の金属粉を樹脂に混入さ
せて塗布することによって形成されていることを特徴と
する電子部品の製造方法。
5. The method of manufacturing an electronic component according to claim 4, wherein the base electrode is formed by mixing a conductive metal powder in a resin and applying the powder. Method.
【請求項6】 請求項4記載の電子部品の製造方法にお
いて,前記貴金属膜を無電解Pdめっき膜で形成するこ
とを特徴とする電子部品の製造方法。
6. The method of manufacturing an electronic component according to claim 4, wherein the noble metal film is formed of an electroless Pd plating film.
JP7672896A 1996-03-29 1996-03-29 Electronic part and method of producing the same Pending JPH09270342A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7672896A JPH09270342A (en) 1996-03-29 1996-03-29 Electronic part and method of producing the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7672896A JPH09270342A (en) 1996-03-29 1996-03-29 Electronic part and method of producing the same

Publications (1)

Publication Number Publication Date
JPH09270342A true JPH09270342A (en) 1997-10-14

Family

ID=13613643

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7672896A Pending JPH09270342A (en) 1996-03-29 1996-03-29 Electronic part and method of producing the same

Country Status (1)

Country Link
JP (1) JPH09270342A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001155950A (en) * 1999-09-16 2001-06-08 Murata Mfg Co Ltd Inductor and method of manufacturing therefor
KR20040037276A (en) * 2002-10-23 2004-05-06 가부시키가이샤 무라타 세이사쿠쇼 Method for forming metal coating and method for manufacturing chip electronic components
JP2004300570A (en) * 2003-03-18 2004-10-28 Ngk Spark Plug Co Ltd Wiring board
US7855460B2 (en) 2007-04-25 2010-12-21 Tdk Corporation Electronic component to protect an interface between a conductor and an insulator and method for manufacturing the same
JP2015029050A (en) * 2013-06-27 2015-02-12 株式会社村田製作所 Multilayer ceramic electronic component

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001155950A (en) * 1999-09-16 2001-06-08 Murata Mfg Co Ltd Inductor and method of manufacturing therefor
KR20040037276A (en) * 2002-10-23 2004-05-06 가부시키가이샤 무라타 세이사쿠쇼 Method for forming metal coating and method for manufacturing chip electronic components
JP2004300570A (en) * 2003-03-18 2004-10-28 Ngk Spark Plug Co Ltd Wiring board
JP4699704B2 (en) * 2003-03-18 2011-06-15 日本特殊陶業株式会社 Wiring board
US7855460B2 (en) 2007-04-25 2010-12-21 Tdk Corporation Electronic component to protect an interface between a conductor and an insulator and method for manufacturing the same
JP2015029050A (en) * 2013-06-27 2015-02-12 株式会社村田製作所 Multilayer ceramic electronic component
US9659689B2 (en) 2013-06-27 2017-05-23 Murata Manufacturing Co., Ltd. Monolithic ceramic electronic component

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